JPS5018585A - - Google Patents

Info

Publication number
JPS5018585A
JPS5018585A JP13892273A JP13892273A JPS5018585A JP S5018585 A JPS5018585 A JP S5018585A JP 13892273 A JP13892273 A JP 13892273A JP 13892273 A JP13892273 A JP 13892273A JP S5018585 A JPS5018585 A JP S5018585A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13892273A
Other languages
Japanese (ja)
Other versions
JPS543727B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5018585A publication Critical patent/JPS5018585A/ja
Publication of JPS543727B2 publication Critical patent/JPS543727B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polyurethanes Or Polyureas (AREA)
JP13892273A 1972-12-14 1973-12-14 Expired JPS543727B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31520772A 1972-12-14 1972-12-14

Publications (2)

Publication Number Publication Date
JPS5018585A true JPS5018585A (enrdf_load_stackoverflow) 1975-02-27
JPS543727B2 JPS543727B2 (enrdf_load_stackoverflow) 1979-02-26

Family

ID=23223361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13892273A Expired JPS543727B2 (enrdf_load_stackoverflow) 1972-12-14 1973-12-14

Country Status (9)

Country Link
JP (1) JPS543727B2 (enrdf_load_stackoverflow)
BR (1) BR7309820D0 (enrdf_load_stackoverflow)
CH (1) CH587500A5 (enrdf_load_stackoverflow)
DE (1) DE2361931A1 (enrdf_load_stackoverflow)
FR (1) FR2327569A1 (enrdf_load_stackoverflow)
GB (1) GB1463818A (enrdf_load_stackoverflow)
IT (1) IT1000315B (enrdf_load_stackoverflow)
NL (1) NL7317180A (enrdf_load_stackoverflow)
SE (1) SE404094B (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120028A (en) * 1979-02-27 1980-09-16 Minnesota Mining & Mfg Photooreactive composition and image forming system including same
JPS5938747A (ja) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk 感光性平版印刷版
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU75749A1 (enrdf_load_stackoverflow) * 1976-09-08 1978-04-27
DE2948554A1 (de) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
DE3824146A1 (de) * 1988-07-16 1990-02-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
DE602005012590D1 (de) * 2005-11-18 2009-03-19 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2102382B2 (de) * 1970-01-19 1973-02-01 Dainippon Ink and Chemicals, Ine , Tokio Photopolymerisierbare, polyurethanformmassen einschliesslich ueberzugsmassen und klebemittel

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120028A (en) * 1979-02-27 1980-09-16 Minnesota Mining & Mfg Photooreactive composition and image forming system including same
JPS5938747A (ja) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk 感光性平版印刷版
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor

Also Published As

Publication number Publication date
NL7317180A (enrdf_load_stackoverflow) 1974-06-18
SE404094B (sv) 1978-09-18
JPS543727B2 (enrdf_load_stackoverflow) 1979-02-26
AU6328473A (en) 1975-06-12
FR2327569A1 (fr) 1977-05-06
CH587500A5 (enrdf_load_stackoverflow) 1977-05-13
DE2361931A1 (de) 1974-06-20
BR7309820D0 (pt) 1974-09-24
FR2327569B1 (enrdf_load_stackoverflow) 1978-03-24
IT1000315B (it) 1976-03-30
GB1463818A (en) 1977-02-09

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