GB1463818A - Diazo-unsaturated monomer light sensitive compositions - Google Patents
Diazo-unsaturated monomer light sensitive compositionsInfo
- Publication number
- GB1463818A GB1463818A GB5770673A GB5770673A GB1463818A GB 1463818 A GB1463818 A GB 1463818A GB 5770673 A GB5770673 A GB 5770673A GB 5770673 A GB5770673 A GB 5770673A GB 1463818 A GB1463818 A GB 1463818A
- Authority
- GB
- United Kingdom
- Prior art keywords
- compound
- active hydrogen
- diazo
- compounds
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 5
- 239000000178 monomer Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 8
- 229910052739 hydrogen Inorganic materials 0.000 abstract 8
- 239000001257 hydrogen Substances 0.000 abstract 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 6
- 150000008049 diazo compounds Chemical class 0.000 abstract 3
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 150000001989 diazonium salts Chemical class 0.000 abstract 2
- 150000002148 esters Chemical class 0.000 abstract 2
- -1 hydrogen compound Chemical class 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 abstract 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 abstract 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 abstract 1
- PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 abstract 1
- 239000004971 Cross linker Substances 0.000 abstract 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 abstract 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 239000007822 coupling agent Substances 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000011256 inorganic filler Substances 0.000 abstract 1
- 229910003475 inorganic filler Inorganic materials 0.000 abstract 1
- 239000012948 isocyanate Substances 0.000 abstract 1
- 150000002513 isocyanates Chemical class 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 239000004014 plasticizer Substances 0.000 abstract 1
- 229920001228 polyisocyanate Polymers 0.000 abstract 1
- 239000005056 polyisocyanate Substances 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 150000008442 polyphenolic compounds Polymers 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31520772A | 1972-12-14 | 1972-12-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1463818A true GB1463818A (en) | 1977-02-09 |
Family
ID=23223361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5770673A Expired GB1463818A (en) | 1972-12-14 | 1973-12-13 | Diazo-unsaturated monomer light sensitive compositions |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS543727B2 (enrdf_load_stackoverflow) |
| BR (1) | BR7309820D0 (enrdf_load_stackoverflow) |
| CH (1) | CH587500A5 (enrdf_load_stackoverflow) |
| DE (1) | DE2361931A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2327569A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1463818A (enrdf_load_stackoverflow) |
| IT (1) | IT1000315B (enrdf_load_stackoverflow) |
| NL (1) | NL7317180A (enrdf_load_stackoverflow) |
| SE (1) | SE404094B (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4316949A (en) * | 1979-12-14 | 1982-02-23 | Minnesota Mining And Manufacturing Company | Photoreactive oligomer composition and printing plate |
| US4337307A (en) * | 1979-12-03 | 1982-06-29 | Hoechst Aktiengesellschaft | Light-sensitive diazo composition and material with branched polyurethane resin |
| GB2263906A (en) * | 1992-01-21 | 1993-08-11 | Du Pont | Polyunsaturated diazonium compounds |
| US5466789A (en) * | 1992-01-21 | 1995-11-14 | Du Pont (Uk) Limited | Polyunsaturated diazonium compounds |
| US5534623A (en) * | 1993-01-21 | 1996-07-09 | Du Pont (Uk) Limited | Process for preparing a polyunsaturated diazonium compounds |
| EP1788431A3 (en) * | 2005-11-18 | 2007-07-18 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| LU75749A1 (enrdf_load_stackoverflow) * | 1976-09-08 | 1978-04-27 | ||
| NL8001085A (nl) * | 1979-02-27 | 1980-08-29 | Minnesota Mining & Mfg | Fotogevoelige materialen en voorwerpen. |
| JPS5938747A (ja) * | 1982-08-27 | 1984-03-02 | Okamoto Kagaku Kogyo Kk | 感光性平版印刷版 |
| JPS6471114A (en) * | 1987-05-02 | 1989-03-16 | Hope Seiki | Assembly and manufacturing device for tip type electrolytic capacitor |
| DE3824146A1 (de) * | 1988-07-16 | 1990-02-22 | Hoechst Ag | Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten |
| WO1993006528A1 (en) * | 1991-09-13 | 1993-04-01 | Sun Chemical Corporation | Positive-working coating compositions |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2102382B2 (de) * | 1970-01-19 | 1973-02-01 | Dainippon Ink and Chemicals, Ine , Tokio | Photopolymerisierbare, polyurethanformmassen einschliesslich ueberzugsmassen und klebemittel |
-
1973
- 1973-12-12 IT IT5427573A patent/IT1000315B/it active
- 1973-12-13 GB GB5770673A patent/GB1463818A/en not_active Expired
- 1973-12-13 DE DE19732361931 patent/DE2361931A1/de not_active Ceased
- 1973-12-13 SE SE7316884A patent/SE404094B/xx unknown
- 1973-12-13 FR FR7344539A patent/FR2327569A1/fr active Granted
- 1973-12-14 NL NL7317180A patent/NL7317180A/xx not_active Application Discontinuation
- 1973-12-14 JP JP13892273A patent/JPS543727B2/ja not_active Expired
- 1973-12-14 BR BR982073A patent/BR7309820D0/pt unknown
- 1973-12-14 CH CH1756473A patent/CH587500A5/xx not_active IP Right Cessation
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4337307A (en) * | 1979-12-03 | 1982-06-29 | Hoechst Aktiengesellschaft | Light-sensitive diazo composition and material with branched polyurethane resin |
| US4316949A (en) * | 1979-12-14 | 1982-02-23 | Minnesota Mining And Manufacturing Company | Photoreactive oligomer composition and printing plate |
| GB2263906A (en) * | 1992-01-21 | 1993-08-11 | Du Pont | Polyunsaturated diazonium compounds |
| GB2263906B (en) * | 1992-01-21 | 1995-11-08 | Du Pont | Improvements in or relating to polyunsaturated diazonium compounds |
| US5466789A (en) * | 1992-01-21 | 1995-11-14 | Du Pont (Uk) Limited | Polyunsaturated diazonium compounds |
| US5534623A (en) * | 1993-01-21 | 1996-07-09 | Du Pont (Uk) Limited | Process for preparing a polyunsaturated diazonium compounds |
| EP1788431A3 (en) * | 2005-11-18 | 2007-07-18 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
| WO2007057337A3 (en) * | 2005-11-18 | 2007-08-23 | Agfa Graphics Nv | Method of making a lithographic printing plate |
| US8088558B2 (en) | 2005-11-18 | 2012-01-03 | Agfa Graphics Nv | Method of making a lithographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| CH587500A5 (enrdf_load_stackoverflow) | 1977-05-13 |
| JPS5018585A (enrdf_load_stackoverflow) | 1975-02-27 |
| AU6328473A (en) | 1975-06-12 |
| SE404094B (sv) | 1978-09-18 |
| JPS543727B2 (enrdf_load_stackoverflow) | 1979-02-26 |
| NL7317180A (enrdf_load_stackoverflow) | 1974-06-18 |
| DE2361931A1 (de) | 1974-06-20 |
| BR7309820D0 (pt) | 1974-09-24 |
| IT1000315B (it) | 1976-03-30 |
| FR2327569A1 (fr) | 1977-05-06 |
| FR2327569B1 (enrdf_load_stackoverflow) | 1978-03-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4322491A (en) | Mixture which is polymerizable by radiation, and radiation-sensitive copying material prepared therewith | |
| US4312916A (en) | Process for producing adhesive film | |
| US4174307A (en) | Room-temperature-radiation-curable polyurethane | |
| GB1463818A (en) | Diazo-unsaturated monomer light sensitive compositions | |
| US3887450A (en) | Photopolymerizable compositions containing polymeric binding agents | |
| US4215028A (en) | Thermosetting resin, and its production and use | |
| GB1404497A (en) | Photosensitive coating materials | |
| EP0372778A1 (en) | Photoinitiator | |
| US3725356A (en) | Polymeric n-carbonyl sulfonamides in photopolymerizable compositions and process for preparation | |
| JPS56120718A (en) | Improved polyurethane type photosensitive resin composition | |
| GB1425274A (en) | Photosensitive compositions | |
| GB1441339A (en) | Presensitized planographic printing plate precursor | |
| US3796578A (en) | Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds | |
| US4656217A (en) | Reactive polymer, method for manufacturing thereof and use thereof | |
| US4940647A (en) | Photopolymerizable compositions a leuco dye and a leuco dye stabilizer | |
| AU627177B2 (en) | Photoinitiator copolymers | |
| US5262278A (en) | Storage-stable solution of a carboxyl-containing copolymer and production of photosensitive coatings and offset printing plates | |
| GB2171107A (en) | Photosensitive resin composition | |
| GB1244202A (en) | Bonding photosensitive plates, sheeting or film to metallic supports | |
| JPS6428630A (en) | Resin composition cross linkable by photopolymerization | |
| GB1444610A (en) | Process for the preparation of thermosetting coating compositions | |
| GB1350260A (en) | Photosensitive compositions for the production of printing plates | |
| JPS5911096B2 (ja) | 樹脂凸版用感光性組成物 | |
| JP2755743B2 (ja) | 放射線重合性混合物およびそれから製造された複写材料 | |
| JPS62131006A (ja) | 光硬化性樹脂組成物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |