JPS50155423A - - Google Patents
Info
- Publication number
- JPS50155423A JPS50155423A JP5590275A JP5590275A JPS50155423A JP S50155423 A JPS50155423 A JP S50155423A JP 5590275 A JP5590275 A JP 5590275A JP 5590275 A JP5590275 A JP 5590275A JP S50155423 A JPS50155423 A JP S50155423A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Silicon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46917974A | 1974-05-13 | 1974-05-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50155423A true JPS50155423A (it) | 1975-12-15 |
Family
ID=23862763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5590275A Pending JPS50155423A (it) | 1974-05-13 | 1975-05-12 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS50155423A (it) |
| DE (1) | DE2520774A1 (it) |
| FR (1) | FR2271173B1 (it) |
| GB (1) | GB1498266A (it) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52136831A (en) * | 1976-05-11 | 1977-11-15 | Wacker Chemitronic | Producing method of high purity silicon |
| JPS5527890A (en) * | 1978-08-18 | 1980-02-28 | Jiee Shii Shiyumatsuchiyaa Co | Manufacture of highly pure silicon |
| JPH01282194A (ja) * | 1988-01-19 | 1989-11-14 | Osaka Titanium Co Ltd | 単結晶製造方法 |
| JPH0432499U (it) * | 1990-07-12 | 1992-03-17 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR880000618B1 (ko) * | 1985-12-28 | 1988-04-18 | 재단법인 한국화학연구소 | 초단파 가열 유동상 반응에 의한 고순도 다결정 실리콘의 제조 방법 |
| DE10060469A1 (de) * | 2000-12-06 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von hochreinem, granularem Silizium |
| NO329968B1 (no) * | 2007-08-17 | 2011-01-31 | Silansil As | Anordning og fremgangsmate for kompaktering av silisiumpulver |
-
1975
- 1975-05-01 GB GB1816875A patent/GB1498266A/en not_active Expired
- 1975-05-09 DE DE19752520774 patent/DE2520774A1/de not_active Withdrawn
- 1975-05-12 JP JP5590275A patent/JPS50155423A/ja active Pending
- 1975-05-13 FR FR7514887A patent/FR2271173B1/fr not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52136831A (en) * | 1976-05-11 | 1977-11-15 | Wacker Chemitronic | Producing method of high purity silicon |
| JPS5527890A (en) * | 1978-08-18 | 1980-02-28 | Jiee Shii Shiyumatsuchiyaa Co | Manufacture of highly pure silicon |
| JPS6228083B2 (it) * | 1978-08-18 | 1987-06-18 | Schumacher Co J C | |
| JPH01282194A (ja) * | 1988-01-19 | 1989-11-14 | Osaka Titanium Co Ltd | 単結晶製造方法 |
| JPH0477712B2 (it) * | 1988-01-19 | 1992-12-09 | Oosaka Chitaniumu Seizo Kk | |
| JPH0432499U (it) * | 1990-07-12 | 1992-03-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2520774A1 (de) | 1975-11-27 |
| FR2271173B1 (it) | 1979-04-06 |
| FR2271173A1 (it) | 1975-12-12 |
| GB1498266A (en) | 1978-01-18 |