JPS50147878A - - Google Patents

Info

Publication number
JPS50147878A
JPS50147878A JP5515174A JP5515174A JPS50147878A JP S50147878 A JPS50147878 A JP S50147878A JP 5515174 A JP5515174 A JP 5515174A JP 5515174 A JP5515174 A JP 5515174A JP S50147878 A JPS50147878 A JP S50147878A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5515174A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5515174A priority Critical patent/JPS50147878A/ja
Publication of JPS50147878A publication Critical patent/JPS50147878A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP5515174A 1974-05-17 1974-05-17 Pending JPS50147878A (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5515174A JPS50147878A (de) 1974-05-17 1974-05-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5515174A JPS50147878A (de) 1974-05-17 1974-05-17

Publications (1)

Publication Number Publication Date
JPS50147878A true JPS50147878A (de) 1975-11-27

Family

ID=12990742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5515174A Pending JPS50147878A (de) 1974-05-17 1974-05-17

Country Status (1)

Country Link
JP (1) JPS50147878A (de)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50156382A (de) * 1974-06-05 1975-12-17
JPS51147283A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Manufacturing process of semiconductor device
JPS5834942A (ja) * 1981-08-27 1983-03-01 Toshiba Corp 半導体装置の製造方法
JPS5848437A (ja) * 1981-09-17 1983-03-22 Toshiba Corp 半導体装置の製造方法
JPS5871640A (ja) * 1981-10-26 1983-04-28 Nippon Telegr & Teleph Corp <Ntt> 半導体集積回路の形成方法
JPS5967647A (ja) * 1982-10-09 1984-04-17 Mitsubishi Electric Corp 半導体装置の製造方法
JPS59107534A (ja) * 1982-12-13 1984-06-21 Nec Corp 半導体装置の製造方法
JPS59188141A (ja) * 1984-03-26 1984-10-25 Hitachi Ltd 半導体集積回路

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50156382A (de) * 1974-06-05 1975-12-17
JPS51147283A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Manufacturing process of semiconductor device
JPS5834942A (ja) * 1981-08-27 1983-03-01 Toshiba Corp 半導体装置の製造方法
JPS5848437A (ja) * 1981-09-17 1983-03-22 Toshiba Corp 半導体装置の製造方法
JPH0363220B2 (de) * 1981-09-17 1991-09-30 Tokyo Shibaura Electric Co
JPS5871640A (ja) * 1981-10-26 1983-04-28 Nippon Telegr & Teleph Corp <Ntt> 半導体集積回路の形成方法
JPS5967647A (ja) * 1982-10-09 1984-04-17 Mitsubishi Electric Corp 半導体装置の製造方法
JPS59107534A (ja) * 1982-12-13 1984-06-21 Nec Corp 半導体装置の製造方法
JPS59188141A (ja) * 1984-03-26 1984-10-25 Hitachi Ltd 半導体集積回路

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