JPS50138776A - - Google Patents

Info

Publication number
JPS50138776A
JPS50138776A JP4432474A JP4432474A JPS50138776A JP S50138776 A JPS50138776 A JP S50138776A JP 4432474 A JP4432474 A JP 4432474A JP 4432474 A JP4432474 A JP 4432474A JP S50138776 A JPS50138776 A JP S50138776A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4432474A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4432474A priority Critical patent/JPS50138776A/ja
Priority to GB1516775A priority patent/GB1507701A/en
Priority to CA224,731A priority patent/CA1023480A/en
Priority to DE19752517049 priority patent/DE2517049C3/de
Priority to FR7511963A priority patent/FR2268363B1/fr
Publication of JPS50138776A publication Critical patent/JPS50138776A/ja
Priority to US05/793,969 priority patent/US4075652A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • H01L21/30612Etching of AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/802Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with heterojunction gate, e.g. transistors with semiconductor layer acting as gate insulating layer, MIS-like transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP4432474A 1974-04-17 1974-04-17 Pending JPS50138776A (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP4432474A JPS50138776A (de) 1974-04-17 1974-04-17
GB1516775A GB1507701A (en) 1974-04-17 1975-04-14 Semiconductor devices
CA224,731A CA1023480A (en) 1974-04-17 1975-04-16 Junction gate type gaas field-effect transistor and method of forming
DE19752517049 DE2517049C3 (de) 1974-04-17 1975-04-17 Sperrschicht-Feldeffekttransistor aus m-V Halbleitermaterial
FR7511963A FR2268363B1 (de) 1974-04-17 1975-04-17
US05/793,969 US4075652A (en) 1974-04-17 1977-05-05 Junction gate type gaas field-effect transistor and method of forming

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4432474A JPS50138776A (de) 1974-04-17 1974-04-17

Publications (1)

Publication Number Publication Date
JPS50138776A true JPS50138776A (de) 1975-11-05

Family

ID=12688304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4432474A Pending JPS50138776A (de) 1974-04-17 1974-04-17

Country Status (5)

Country Link
JP (1) JPS50138776A (de)
CA (1) CA1023480A (de)
DE (1) DE2517049C3 (de)
FR (1) FR2268363B1 (de)
GB (1) GB1507701A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533776A (en) * 1976-06-30 1978-01-13 Matsushita Electric Ind Co Ltd Semiconducotr device and its production
JPS5342682A (en) * 1976-09-30 1978-04-18 Matsushita Electric Ind Co Ltd Junction type field effect transistor and its production
JPS60110175A (ja) * 1983-08-23 1985-06-15 アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド 電界効果トランジスタおよびその製造方法
JPS63228672A (ja) * 1987-03-18 1988-09-22 Fujitsu Ltd 化合物半導体集積回路装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4075651A (en) * 1976-03-29 1978-02-21 Varian Associates, Inc. High speed fet employing ternary and quarternary iii-v active layers
FR2465317A2 (fr) * 1979-03-28 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
FR2452791A1 (fr) * 1979-03-28 1980-10-24 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
JPS55153377A (en) * 1979-05-18 1980-11-29 Matsushita Electronics Corp Production of semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533776A (en) * 1976-06-30 1978-01-13 Matsushita Electric Ind Co Ltd Semiconducotr device and its production
JPS587071B2 (ja) * 1976-06-30 1983-02-08 松下電器産業株式会社 半導体装置の製造方法
JPS5342682A (en) * 1976-09-30 1978-04-18 Matsushita Electric Ind Co Ltd Junction type field effect transistor and its production
JPS588151B2 (ja) * 1976-09-30 1983-02-14 松下電器産業株式会社 接合型電界効果トランジスタの製造方法
JPS60110175A (ja) * 1983-08-23 1985-06-15 アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド 電界効果トランジスタおよびその製造方法
JPS63228672A (ja) * 1987-03-18 1988-09-22 Fujitsu Ltd 化合物半導体集積回路装置

Also Published As

Publication number Publication date
DE2517049C3 (de) 1979-05-10
GB1507701A (en) 1978-04-19
DE2517049B2 (de) 1978-09-14
DE2517049A1 (de) 1975-10-30
FR2268363B1 (de) 1978-06-23
CA1023480A (en) 1977-12-27
FR2268363A1 (de) 1975-11-14

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