JPS50122936A - - Google Patents
Info
- Publication number
- JPS50122936A JPS50122936A JP50025551A JP2555175A JPS50122936A JP S50122936 A JPS50122936 A JP S50122936A JP 50025551 A JP50025551 A JP 50025551A JP 2555175 A JP2555175 A JP 2555175A JP S50122936 A JPS50122936 A JP S50122936A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Holo Graphy (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US447267 | 1974-03-01 | ||
| US447267A US3925077A (en) | 1974-03-01 | 1974-03-01 | Photoresist for holography and laser recording with bleachout dyes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50122936A true JPS50122936A (US07321065-20080122-C00160.png) | 1975-09-26 |
| JPS5942294B2 JPS5942294B2 (ja) | 1984-10-13 |
Family
ID=23775660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50025551A Expired JPS5942294B2 (ja) | 1974-03-01 | 1975-02-28 | 感光性組成物 |
Country Status (5)
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58169152A (ja) * | 1982-03-31 | 1983-10-05 | Ricoh Co Ltd | 光記録用媒体 |
| JPS6076735A (ja) * | 1983-10-04 | 1985-05-01 | Agency Of Ind Science & Technol | 光硬化樹脂組成物 |
| JPH023082A (ja) * | 1988-01-15 | 1990-01-08 | E I Du Pont De Nemours & Co | 光重合性層中に反射ホログラムを作る方法 |
| JPH06230564A (ja) * | 1992-12-30 | 1994-08-19 | Minnesota Mining & Mfg Co <3M> | 感光性システムにおける染料の漂白 |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3967963A (en) * | 1974-04-22 | 1976-07-06 | Hughes Aircraft Company | Bleached holographic material and process for the fabrication thereof using halogens |
| DE2558812C2 (de) * | 1975-12-27 | 1987-04-30 | Hoechst Ag, 6230 Frankfurt | Photopolymerisierbares Gemisch |
| JPS5315153A (en) * | 1976-07-27 | 1978-02-10 | Canon Inc | Hologram |
| JPS5315152A (en) * | 1976-07-27 | 1978-02-10 | Canon Inc | Hologram |
| US4374189A (en) * | 1979-12-17 | 1983-02-15 | The United States Of America As Represented By The Secretary Of The Navy | Process of making a holographic optical article |
| US4278753A (en) * | 1980-02-25 | 1981-07-14 | Horizons Research Incorporated | Plasma developable photoresist composition with polyvinyl formal binder |
| US4348471A (en) * | 1981-06-15 | 1982-09-07 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff |
| IE56082B1 (en) * | 1982-11-01 | 1991-04-10 | Microsi Inc | Photobleachable compositions |
| US5108874A (en) * | 1982-11-01 | 1992-04-28 | Microsi, Inc. | Composite useful in photolithography |
| US4509817A (en) * | 1983-08-01 | 1985-04-09 | Ncr Corporation | Method for correcting volume-phase-gelatin holograms Bragg's angle deviation |
| US4578344A (en) * | 1984-12-20 | 1986-03-25 | General Electric Company | Photolithographic method using a two-layer photoresist and photobleachable film |
| US4698286A (en) * | 1985-06-03 | 1987-10-06 | Hercules Incorporated | Plasma developable photoresist compositions containing perylene coumarin photosensitizer |
| CA1315591C (en) * | 1986-02-20 | 1993-04-06 | Takeshi Ishitsuka | Visible ray-recording hologram material |
| US4942112A (en) * | 1988-01-15 | 1990-07-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements for refractive index imaging |
| US4917977A (en) * | 1988-12-23 | 1990-04-17 | E. I. Du Pont De Nemours And Company | Visible sensitizers for photopolymerizable compositions |
| JP2661317B2 (ja) * | 1990-03-27 | 1997-10-08 | 松下電器産業株式会社 | パターン形成方法 |
| US5206110A (en) * | 1991-02-04 | 1993-04-27 | Ocg Microelectronic Materials, Inc. | Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye |
| US5250392A (en) * | 1991-02-04 | 1993-10-05 | Ocg Microelectronic Materials, Inc. | Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye |
| US5219703A (en) * | 1992-02-10 | 1993-06-15 | Eastman Kodak Company | Laser-induced thermal dye transfer with bleachable near-infrared absorbing sensitizers |
| FR2690255A1 (fr) * | 1992-04-17 | 1993-10-22 | Digipress Sa | Composition photosensible, notamment pour application au stockage d'informations ou à la réalisation d'éléments optiques holographiques. |
| US6103331A (en) * | 1997-09-26 | 2000-08-15 | Fuji Electric Co., Ltd. | Optical recording medium comprising organic dye thin film |
| US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| WO2000077575A1 (en) | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| KR20040075866A (ko) | 2001-11-15 | 2004-08-30 | 허니웰 인터내셔날 인코포레이티드 | 포토리소그래피용 스핀-온 무반사 코팅 |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| EP2562599B1 (en) | 2009-01-29 | 2014-12-10 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| JP2012083409A (ja) * | 2010-10-07 | 2012-04-26 | Tdk Corp | カラーホログラム画像記録用フォトポリマー媒体及びカラーホログラム画像記録方法 |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| CN116790134A (zh) * | 2023-06-21 | 2023-09-22 | 复旦大学 | 一种近红外小分子染料及其制备方法和应用 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2875047A (en) * | 1955-01-19 | 1959-02-24 | Oster Gerald | Photopolymerization with the formation of coherent plastic masses |
| US3000833A (en) * | 1959-01-26 | 1961-09-19 | American Cyanamid Co | Color salts of fluoren-9-ols as infrared absorbers |
| US3102027A (en) * | 1960-08-19 | 1963-08-27 | Horizons Inc | Direct positive dye bleach process and merocyanine composition therefor |
| DE1572137B1 (de) * | 1965-06-03 | 1970-09-24 | Du Pont | Fotopolymerisierbares Aufzeichnungsmaterial |
| US3495987A (en) * | 1965-09-03 | 1970-02-17 | Du Pont | Photopolymerizable products |
| US3620748A (en) * | 1966-01-07 | 1971-11-16 | Horizons Research Inc | N-vinyl amine/halogen liberating composition sensitized with 9-vinyl carbazoles or polyacenes, or transannular peroxides of polyacenes |
| BE755251A (fr) * | 1969-08-25 | 1971-02-25 | Du Pont | Enregistrement holographique dans des couches photopoly- merisables |
| US3667946A (en) * | 1970-09-23 | 1972-06-06 | Holotron Corp | Surface treatment of photopolymer film used for recording holograms |
| US3712817A (en) * | 1971-03-01 | 1973-01-23 | Horizons Inc | Dry working photosensitive compositions comprising organic halogen compounds,ethylene compounds and carbinol compounds |
| US3769023A (en) * | 1971-05-07 | 1973-10-30 | Horizons Inc | Light sensitive reproduction and electron beam sensitive material |
| CA994152A (en) * | 1972-02-09 | 1976-08-03 | James M. Lewis | Photoresist and method of making same |
-
1974
- 1974-03-01 US US447267A patent/US3925077A/en not_active Expired - Lifetime
-
1975
- 1975-02-26 CA CA220,806A patent/CA1060251A/en not_active Expired
- 1975-02-28 GB GB8569/75A patent/GB1508911A/en not_active Expired
- 1975-02-28 JP JP50025551A patent/JPS5942294B2/ja not_active Expired
- 1975-03-01 DE DE2509019A patent/DE2509019C2/de not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58169152A (ja) * | 1982-03-31 | 1983-10-05 | Ricoh Co Ltd | 光記録用媒体 |
| JPS6076735A (ja) * | 1983-10-04 | 1985-05-01 | Agency Of Ind Science & Technol | 光硬化樹脂組成物 |
| JPH0336421B2 (US07321065-20080122-C00160.png) * | 1983-10-04 | 1991-05-31 | Kogyo Gijutsuin | |
| JPH023082A (ja) * | 1988-01-15 | 1990-01-08 | E I Du Pont De Nemours & Co | 光重合性層中に反射ホログラムを作る方法 |
| JPH06230564A (ja) * | 1992-12-30 | 1994-08-19 | Minnesota Mining & Mfg Co <3M> | 感光性システムにおける染料の漂白 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1508911A (en) | 1978-04-26 |
| DE2509019C2 (de) | 1986-03-27 |
| JPS5942294B2 (ja) | 1984-10-13 |
| DE2509019A1 (de) | 1975-09-04 |
| US3925077A (en) | 1975-12-09 |
| CA1060251A (en) | 1979-08-14 |
