JPS50120825A - - Google Patents
Info
- Publication number
- JPS50120825A JPS50120825A JP1011275A JP1011275A JPS50120825A JP S50120825 A JPS50120825 A JP S50120825A JP 1011275 A JP1011275 A JP 1011275A JP 1011275 A JP1011275 A JP 1011275A JP S50120825 A JPS50120825 A JP S50120825A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US44951874A | 1974-03-08 | 1974-03-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50120825A true JPS50120825A (xx) | 1975-09-22 |
Family
ID=23784454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1011275A Pending JPS50120825A (xx) | 1974-03-08 | 1975-01-23 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS50120825A (xx) |
| DE (1) | DE2509824A1 (xx) |
| GB (1) | GB1502015A (xx) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014032499A1 (zh) * | 2012-08-27 | 2014-03-06 | 珠海市能动科技光学产业有限公司 | 双层涂布的负性光致抗蚀干膜 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
| JPS57183030A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Manufacture of semiconductor device |
| JPH05181281A (ja) * | 1991-11-01 | 1993-07-23 | Fuji Photo Film Co Ltd | フオトレジスト組成物及びエツチング方法 |
| JP3638086B2 (ja) | 1998-08-21 | 2005-04-13 | 東京応化工業株式会社 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
-
1975
- 1975-01-23 JP JP1011275A patent/JPS50120825A/ja active Pending
- 1975-02-05 GB GB491275A patent/GB1502015A/en not_active Expired
- 1975-03-06 DE DE19752509824 patent/DE2509824A1/de active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014032499A1 (zh) * | 2012-08-27 | 2014-03-06 | 珠海市能动科技光学产业有限公司 | 双层涂布的负性光致抗蚀干膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1502015A (en) | 1978-02-22 |
| DE2509824A1 (de) | 1975-09-11 |