JPS4996300A - - Google Patents
Info
- Publication number
- JPS4996300A JPS4996300A JP843473A JP843473A JPS4996300A JP S4996300 A JPS4996300 A JP S4996300A JP 843473 A JP843473 A JP 843473A JP 843473 A JP843473 A JP 843473A JP S4996300 A JPS4996300 A JP S4996300A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP843473A JPS4996300A (en) | 1973-01-19 | 1973-01-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP843473A JPS4996300A (en) | 1973-01-19 | 1973-01-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4996300A true JPS4996300A (en) | 1974-09-12 |
Family
ID=11693003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP843473A Pending JPS4996300A (en) | 1973-01-19 | 1973-01-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4996300A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58192330A (en) * | 1982-05-06 | 1983-11-09 | Oak Seisakusho:Kk | Oxidation treating method for surface of silicon wafer |
| JPS6085531A (en) * | 1983-10-17 | 1985-05-15 | Sony Corp | Formation of thin-film |
| JPS61199638A (en) * | 1985-02-28 | 1986-09-04 | Sony Corp | Method for formation of insulating film |
| JPS61253870A (en) * | 1985-05-07 | 1986-11-11 | Hitachi Ltd | Photovoltaic device |
| JPS6482634A (en) * | 1987-09-25 | 1989-03-28 | Nec Corp | Manufacture of semiconductor device |
| US6319759B1 (en) * | 1998-08-10 | 2001-11-20 | International Business Machines Corporation | Method for making oxide |
-
1973
- 1973-01-19 JP JP843473A patent/JPS4996300A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58192330A (en) * | 1982-05-06 | 1983-11-09 | Oak Seisakusho:Kk | Oxidation treating method for surface of silicon wafer |
| JPS6085531A (en) * | 1983-10-17 | 1985-05-15 | Sony Corp | Formation of thin-film |
| JPS61199638A (en) * | 1985-02-28 | 1986-09-04 | Sony Corp | Method for formation of insulating film |
| JPS61253870A (en) * | 1985-05-07 | 1986-11-11 | Hitachi Ltd | Photovoltaic device |
| JPS6482634A (en) * | 1987-09-25 | 1989-03-28 | Nec Corp | Manufacture of semiconductor device |
| US6319759B1 (en) * | 1998-08-10 | 2001-11-20 | International Business Machines Corporation | Method for making oxide |