JPS4980976A - - Google Patents
Info
- Publication number
- JPS4980976A JPS4980976A JP47123450A JP12345072A JPS4980976A JP S4980976 A JPS4980976 A JP S4980976A JP 47123450 A JP47123450 A JP 47123450A JP 12345072 A JP12345072 A JP 12345072A JP S4980976 A JPS4980976 A JP S4980976A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47123450A JPS4980976A (en:Method) | 1972-12-11 | 1972-12-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47123450A JPS4980976A (en:Method) | 1972-12-11 | 1972-12-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4980976A true JPS4980976A (en:Method) | 1974-08-05 |
Family
ID=14860893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47123450A Pending JPS4980976A (en:Method) | 1972-12-11 | 1972-12-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4980976A (en:Method) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5648631A (en) * | 1979-09-28 | 1981-05-01 | Hitachi Ltd | Photomask inspecting apparatus |
| JPS56110923A (en) * | 1980-02-04 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Reduction, projection and exposure device |
| JPS5740926A (en) * | 1980-08-26 | 1982-03-06 | Nec Corp | Device for projection and exposure |
| JPS597954A (ja) * | 1982-07-06 | 1984-01-17 | Nec Corp | 縮小投影式露光装置 |
-
1972
- 1972-12-11 JP JP47123450A patent/JPS4980976A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5648631A (en) * | 1979-09-28 | 1981-05-01 | Hitachi Ltd | Photomask inspecting apparatus |
| JPS56110923A (en) * | 1980-02-04 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Reduction, projection and exposure device |
| JPS5740926A (en) * | 1980-08-26 | 1982-03-06 | Nec Corp | Device for projection and exposure |
| JPS597954A (ja) * | 1982-07-06 | 1984-01-17 | Nec Corp | 縮小投影式露光装置 |