JPS4974929A - - Google Patents

Info

Publication number
JPS4974929A
JPS4974929A JP47115641A JP11564172A JPS4974929A JP S4974929 A JPS4974929 A JP S4974929A JP 47115641 A JP47115641 A JP 47115641A JP 11564172 A JP11564172 A JP 11564172A JP S4974929 A JPS4974929 A JP S4974929A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47115641A
Other languages
Japanese (ja)
Other versions
JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47115641A priority Critical patent/JPS523293B2/ja
Priority to US05/416,184 priority patent/US3951662A/en
Priority to GB5321073A priority patent/GB1415426A/en
Priority to DE2357408A priority patent/DE2357408A1/de
Priority to BR9083/73A priority patent/BR7309083D0/pt
Publication of JPS4974929A publication Critical patent/JPS4974929A/ja
Publication of JPS523293B2 publication Critical patent/JPS523293B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • C08G59/06Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
    • C08G59/08Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols from phenol-aldehyde condensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/04Epoxynovolacs
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/89Macromolecular substances therefor
    • G03C1/895Polyalkylene oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP47115641A 1972-11-20 1972-11-20 Expired JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP47115641A JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-11-20 1972-11-20
US05/416,184 US3951662A (en) 1972-11-20 1973-11-15 Method of antistatic treatment for silver halide photosensitive materials
GB5321073A GB1415426A (en) 1972-11-20 1973-11-16 Method of antistatic treatment for photosensitive silver halide materials
DE2357408A DE2357408A1 (de) 1972-11-20 1973-11-16 Lichtempfindliches, photographisches silberhalogenid-aufzeichnungsmaterial
BR9083/73A BR7309083D0 (pt) 1972-11-20 1973-11-20 Processo de tratamento antestatico para materiais fotossensiveis de halogeneto

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47115641A JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-11-20 1972-11-20

Publications (2)

Publication Number Publication Date
JPS4974929A true JPS4974929A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-07-19
JPS523293B2 JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1977-01-27

Family

ID=14667656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47115641A Expired JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-11-20 1972-11-20

Country Status (5)

Country Link
US (1) US3951662A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR7309083D0 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2357408A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1415426A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07299181A (ja) * 1994-05-09 1995-11-14 Koichiro Nakama パターヘッド方向決め装置およびパターの振り規正装置
JP2002348564A (ja) * 2001-05-28 2002-12-04 Asahi Denka Kogyo Kk 帯電防止剤
JP2009280683A (ja) * 2008-05-21 2009-12-03 Showa Highpolymer Co Ltd モノマー、ポリマー及び感光性樹脂組成物

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4200465A (en) * 1974-11-12 1980-04-29 Konishiroku Photo Industry Co., Ltd. Antistatic light-sensitive silver halide photographic element
US4073776A (en) * 1975-01-28 1978-02-14 Schenectady Chemicals, Inc. Tackifiers for elastomers
JPS5459926A (en) * 1977-10-21 1979-05-15 Konishiroku Photo Ind Co Ltd Photographic material having antistatic layer
US4529790A (en) * 1983-08-12 1985-07-16 Sumitomo Chemical Company, Limited Epoxy resin composition
US5330823A (en) * 1993-03-19 1994-07-19 Xerox Corporation Transparent recording sheets
US6872501B2 (en) * 2001-05-11 2005-03-29 Eastman Kodak Company Antistat of onium salt and polyether polymer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551152A (en) * 1968-06-17 1970-12-29 Gaf Corp Antistatic photographic film
JPS494853B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1969-03-14 1974-02-04
JPS519610B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1971-07-15 1976-03-29

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07299181A (ja) * 1994-05-09 1995-11-14 Koichiro Nakama パターヘッド方向決め装置およびパターの振り規正装置
JP2002348564A (ja) * 2001-05-28 2002-12-04 Asahi Denka Kogyo Kk 帯電防止剤
JP2009280683A (ja) * 2008-05-21 2009-12-03 Showa Highpolymer Co Ltd モノマー、ポリマー及び感光性樹脂組成物

Also Published As

Publication number Publication date
DE2357408A1 (de) 1974-05-30
BR7309083D0 (pt) 1974-09-05
JPS523293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1977-01-27
US3951662A (en) 1976-04-20
GB1415426A (en) 1975-11-26

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