JPS4974236A - - Google Patents
Info
- Publication number
- JPS4974236A JPS4974236A JP48068375A JP6837573A JPS4974236A JP S4974236 A JPS4974236 A JP S4974236A JP 48068375 A JP48068375 A JP 48068375A JP 6837573 A JP6837573 A JP 6837573A JP S4974236 A JPS4974236 A JP S4974236A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0217—Polyurethanes; Epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29782972A | 1972-10-16 | 1972-10-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4974236A true JPS4974236A (pt) | 1974-07-17 |
Family
ID=23147914
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48068375A Pending JPS4974236A (pt) | 1972-10-16 | 1973-06-19 |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS4974236A (pt) |
| AU (1) | AU5801973A (pt) |
| BE (1) | BE801150A (pt) |
| BR (1) | BR7305113D0 (pt) |
| DE (1) | DE2329407A1 (pt) |
| FR (2) | FR2245252A5 (pt) |
| IL (1) | IL42266A0 (pt) |
| NL (1) | NL7307880A (pt) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51108902A (pt) * | 1975-03-18 | 1976-09-27 | Nippon Paint Co Ltd | |
| JPS5285475A (en) * | 1976-01-09 | 1977-07-15 | Nippon Telegr & Teleph Corp <Ntt> | Formation method of high molecular film patterns by high energy beams |
| JPS5513780A (en) * | 1978-05-09 | 1980-01-30 | Dynachem Corp | Fluoran coupler containing phototropic photosensitive composition |
| JPH02973A (ja) * | 1988-03-15 | 1990-01-05 | Sumitomo Chem Co Ltd | 硬化性樹脂組成物 |
| JPH0572727A (ja) * | 1991-09-10 | 1993-03-26 | Toyobo Co Ltd | ホログラム記録材料 |
-
1973
- 1973-05-14 IL IL42266A patent/IL42266A0/xx unknown
- 1973-06-06 NL NL7307880A patent/NL7307880A/xx unknown
- 1973-06-08 DE DE2329407A patent/DE2329407A1/de active Pending
- 1973-06-19 BE BE7000447A patent/BE801150A/xx unknown
- 1973-06-19 JP JP48068375A patent/JPS4974236A/ja active Pending
- 1973-06-26 FR FR7323372A patent/FR2245252A5/fr not_active Expired
- 1973-07-10 BR BR5113/73A patent/BR7305113D0/pt unknown
- 1973-07-12 AU AU58019/73A patent/AU5801973A/en not_active Expired
-
1974
- 1974-03-08 FR FR7408067A patent/FR2209783A1/fr not_active Withdrawn
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51108902A (pt) * | 1975-03-18 | 1976-09-27 | Nippon Paint Co Ltd | |
| JPS5753946B2 (pt) * | 1975-03-18 | 1982-11-16 | ||
| JPS5285475A (en) * | 1976-01-09 | 1977-07-15 | Nippon Telegr & Teleph Corp <Ntt> | Formation method of high molecular film patterns by high energy beams |
| JPS566531B2 (pt) * | 1976-01-09 | 1981-02-12 | ||
| JPS5513780A (en) * | 1978-05-09 | 1980-01-30 | Dynachem Corp | Fluoran coupler containing phototropic photosensitive composition |
| JPS6352369B2 (pt) * | 1978-05-09 | 1988-10-18 | Dynachem Corp | |
| JPH02973A (ja) * | 1988-03-15 | 1990-01-05 | Sumitomo Chem Co Ltd | 硬化性樹脂組成物 |
| JPH0572727A (ja) * | 1991-09-10 | 1993-03-26 | Toyobo Co Ltd | ホログラム記録材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| NL7307880A (pt) | 1974-04-18 |
| FR2209783A1 (pt) | 1974-07-05 |
| DE2329407A1 (de) | 1974-04-18 |
| BE801150A (nl) | 1973-12-19 |
| AU5801973A (en) | 1975-01-16 |
| FR2245252A5 (pt) | 1975-04-18 |
| IL42266A0 (en) | 1973-07-30 |
| BR7305113D0 (pt) | 1974-07-18 |