JPS4945322B1 - - Google Patents

Info

Publication number
JPS4945322B1
JPS4945322B1 JP45042824A JP4282470A JPS4945322B1 JP S4945322 B1 JPS4945322 B1 JP S4945322B1 JP 45042824 A JP45042824 A JP 45042824A JP 4282470 A JP4282470 A JP 4282470A JP S4945322 B1 JPS4945322 B1 JP S4945322B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45042824A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4945322B1 publication Critical patent/JPS4945322B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
JP45042824A 1969-05-20 1970-05-20 Pending JPS4945322B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82628969A 1969-05-20 1969-05-20

Publications (1)

Publication Number Publication Date
JPS4945322B1 true JPS4945322B1 (fr) 1974-12-03

Family

ID=25246155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45042824A Pending JPS4945322B1 (fr) 1969-05-20 1970-05-20

Country Status (13)

Country Link
US (1) US3679419A (fr)
JP (1) JPS4945322B1 (fr)
AT (1) AT305024B (fr)
BE (1) BE750694A (fr)
CH (1) CH569994A5 (fr)
DE (1) DE2024243C3 (fr)
ES (1) ES379774A1 (fr)
FI (1) FI53898C (fr)
FR (1) FR2048536A5 (fr)
GB (1) GB1302717A (fr)
NL (1) NL7006702A (fr)
SE (1) SE385876B (fr)
ZA (1) ZA703393B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5567214U (fr) * 1978-10-30 1980-05-09
EP0565006A2 (fr) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Méthode pour la préparation d'une plaque présensibilisée

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4021243A (en) * 1970-08-20 1977-05-03 Hoechst Aktiengesellschaft Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
US3847614A (en) * 1971-09-13 1974-11-12 Scott Paper Co Diazo photopolymer composition and article comprising carboxylated resin
BE789196A (fr) * 1971-09-25 1973-03-22 Kalle Ag Matiere a copier photosensible
US4131466A (en) * 1972-03-05 1978-12-26 Somar Manufacturing Co., Ltd. Photographic method of making relief member with negative dye image
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3891438A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
GB1427932A (en) * 1972-11-03 1976-03-10 Ici Ltd Diazotype materials
GB1450196A (en) * 1972-11-25 1976-09-22 Hoechst Ag Light-sensitive preparations
US4164421A (en) * 1972-12-09 1979-08-14 Fuji Photo Film Co., Ltd. Photocurable composition containing an o-quinonodiazide for printing plate
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
US4113497A (en) * 1973-06-11 1978-09-12 American Can Company Compositions with organohalogen compound and diazonium salts as photoinitiators of epoxy compounds in photo-polymerization
US3923522A (en) * 1973-07-18 1975-12-02 Oji Paper Co Photosensitive composition
JPS527364B2 (fr) * 1973-07-23 1977-03-02
US4093465A (en) * 1973-08-14 1978-06-06 Polychrome Corporation Photosensitive diazo condensate compositions
US4019907A (en) * 1973-10-24 1977-04-26 Hodogaya Chemical Co., Ltd. Photosensitive azido color-forming element
US4099973A (en) * 1973-10-24 1978-07-11 Hitachi, Ltd. Photo-sensitive bis-azide containing composition
JPS5740501B2 (fr) * 1973-10-24 1982-08-27
GB1488005A (en) * 1974-01-25 1977-10-05 Ici Ltd Diazotype materials
US3951769A (en) * 1974-03-01 1976-04-20 American Can Company Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US3958994A (en) * 1974-08-26 1976-05-25 American Hoechst Corporation Photosensitive diazo steel lithoplate structure
JPS5236697B2 (fr) * 1974-09-09 1977-09-17
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
DE2652304A1 (de) * 1976-11-17 1978-05-18 Hoechst Ag Negativ arbeitende, lichtempfindliche kopiermasse und damit hergestelltes kopiermaterial
US4171974A (en) * 1978-02-15 1979-10-23 Polychrome Corporation Aqueous alkali developable negative working lithographic printing plates
DE2822887A1 (de) * 1978-05-26 1979-11-29 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
US4248959A (en) * 1978-12-07 1981-02-03 American Hoechst Corporation Preparation of diazo printing plates using laser exposure
US4414315A (en) * 1979-08-06 1983-11-08 Howard A. Fromson Process for making lithographic printing plate
CA1153611A (fr) * 1980-04-30 1983-09-13 Minnesota Mining And Manufacturing Company Compose photosensible developpable dans l'eau et plaque d'impression
US4408532A (en) * 1980-04-30 1983-10-11 Minnesota Mining And Manufacturing Company Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer
US4401743A (en) * 1980-04-30 1983-08-30 Minnesota Mining And Manufacturing Company Aqueous developable photosensitive composition and printing plate
US4482489A (en) * 1980-11-18 1984-11-13 James River Graphics, Inc. Light-sensitive diazonium trifluoromethane sulfonates
US4403028A (en) * 1981-01-26 1983-09-06 Andrews Paper & Chemical Co., Inc. Light sensitive diazonium salts and diazotype materials
US4436804A (en) 1981-03-20 1984-03-13 American Hoechst Corporation Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith
DE3273849D1 (en) * 1981-03-20 1986-11-20 Hoechst Co American Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same
DE3135804A1 (de) * 1981-09-10 1983-03-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
US4446218A (en) * 1982-03-18 1984-05-01 American Hoechst Corporation Sulfur and/or amide-containing exposure accelerators for light-sensitive coatings with diazonium compounds
US4533619A (en) * 1982-03-18 1985-08-06 American Hoechst Corporation Acid stabilizers for diazonium compound condensation products
US4729935A (en) * 1982-03-18 1988-03-08 Hoechst Celanese Corporation Process for the production of photographic images utilizing a negative working diazo contact film
US4469772A (en) * 1982-06-03 1984-09-04 American Hoechst Corporation Water developable dye coating on substrate with two diazo polycondensation products and water soluble polymeric binder
DE3364925D1 (en) * 1982-06-03 1986-09-04 Hoechst Co American Photosensitive composition developable with water, and photosensitive copying material produced therefrom
US4436807A (en) 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
US4526854A (en) * 1982-09-01 1985-07-02 Tokyo Shibaura Denki Kabushiki Kaisha Photoresist composition with water soluble bisazide and diazo compound
US4501806A (en) * 1982-09-01 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Method for forming pattern and photoresist used therein
US4937170A (en) * 1982-11-19 1990-06-26 Hoechst Celanese Corporation Coupling agents for photographic elements
JPS59101644A (ja) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd 感光性組成物
DE3311435A1 (de) * 1983-03-29 1984-10-04 Hoechst Ag, 6230 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
JPS6061288A (ja) * 1983-09-13 1985-04-09 Fuji Photo Film Co Ltd 感熱記録材料
JPS59222842A (ja) * 1983-06-01 1984-12-14 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
US4543315A (en) * 1983-09-30 1985-09-24 Minnesota Mining And Manufacturing Company Storage-stable photosensitive composition and article with adduct of diazo resin and amorphous sulfopolyester
EP0151191A1 (fr) * 1984-01-25 1985-08-14 American Hoechst Corporation Matériel photosensible pour la fabrication d'originaux
DE3417645A1 (de) * 1984-05-12 1985-11-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial fuer die herstellung von flachdruckplatten
DE3418111A1 (de) * 1984-05-16 1985-11-21 Hoechst Ag, 6230 Frankfurt Verfahren zur nachbehandlung von aluminiumoxidschichten mit phosphoroxo-anionen enthaltenden waessrigen loesungen und deren verwendung bei der herstellung von offsetdruckplattentraegern
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4785062A (en) * 1984-07-31 1988-11-15 W. R. Grace & Co.-Conn. Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups
JPH0782236B2 (ja) * 1984-10-12 1995-09-06 三菱化学株式会社 感光性組成物
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US4946373A (en) * 1985-02-28 1990-08-07 Hoechst Celanese Corporation Radiation-polymerizable composition
US4634652A (en) * 1985-07-25 1987-01-06 American Hoechst Corporation Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4692397A (en) * 1985-11-27 1987-09-08 American Hoechst Corporation Process for developing an aqueous alkaline development diazo photographic element
US5290666A (en) * 1988-08-01 1994-03-01 Hitachi, Ltd. Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt
US5200291A (en) * 1989-11-13 1993-04-06 Hoechst Celanese Corporation Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
US5206349A (en) * 1990-08-10 1993-04-27 Toyo Gosei Kogy Co., Ltd. Aromatic diazo compounds and photosensitive compositions using the same
US5275907A (en) 1992-07-23 1994-01-04 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
IT1264010B (it) * 1993-04-06 1996-09-06 Policondensato fotosensibile per lastre litografiche negative
DE4414897A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen
EP0778292A3 (fr) 1995-12-04 1998-11-04 Bayer Corporation Méthode pour préparer des acétals polyvinyliques modifiés par des anhydrides utilisables dans des compositions photosensibles
CA2191055A1 (fr) 1995-12-04 1997-06-05 Major S. Dhillon Substance photosensible negative developpable a l'eau a contraste ameliore
US6458503B1 (en) 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
CN101813888B (zh) * 2010-04-14 2012-02-01 东莞长联新材料科技有限公司 一种重氮感光胶热稳定性和光化学活性的调控方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5567214U (fr) * 1978-10-30 1980-05-09
EP0565006A2 (fr) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Méthode pour la préparation d'une plaque présensibilisée

Also Published As

Publication number Publication date
US3679419A (en) 1972-07-25
FR2048536A5 (fr) 1971-03-19
ZA703393B (en) 1971-01-27
BE750694A (fr) 1970-11-20
AT305024B (de) 1973-02-12
FI53898B (fi) 1978-05-02
FI53898C (fi) 1978-08-10
ES379774A1 (es) 1973-02-01
CH569994A5 (fr) 1975-11-28
GB1302717A (fr) 1973-01-10
DE2024243C3 (de) 1979-03-01
DE2024243A1 (fr) 1970-12-03
DE2024243B2 (de) 1978-06-22
NL7006702A (fr) 1970-11-24
SE385876B (sv) 1976-07-26

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