JPS4938295A - - Google Patents
Info
- Publication number
- JPS4938295A JPS4938295A JP8217072A JP8217072A JPS4938295A JP S4938295 A JPS4938295 A JP S4938295A JP 8217072 A JP8217072 A JP 8217072A JP 8217072 A JP8217072 A JP 8217072A JP S4938295 A JPS4938295 A JP S4938295A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8217072A JPS4938295A (ja) | 1972-08-18 | 1972-08-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8217072A JPS4938295A (ja) | 1972-08-18 | 1972-08-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4938295A true JPS4938295A (ja) | 1974-04-09 |
Family
ID=13766942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8217072A Pending JPS4938295A (ja) | 1972-08-18 | 1972-08-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4938295A (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58164135A (ja) * | 1982-03-25 | 1983-09-29 | Agency Of Ind Science & Technol | 収束イオンビ−ムを用いた半導体加工装置 |
| JPS61224319A (ja) * | 1985-03-29 | 1986-10-06 | Hitachi Ltd | イオンビ−ム加工方法およびその装置 |
| JPS6285253A (ja) * | 1986-09-12 | 1987-04-18 | Hitachi Ltd | マスクの欠陥修正方法 |
| US7435973B2 (en) | 2002-02-25 | 2008-10-14 | Carl Zeiss Nts Gmbh | Material processing system and method |
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1972
- 1972-08-18 JP JP8217072A patent/JPS4938295A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58164135A (ja) * | 1982-03-25 | 1983-09-29 | Agency Of Ind Science & Technol | 収束イオンビ−ムを用いた半導体加工装置 |
| JPS6352429B2 (ja) * | 1982-03-25 | 1988-10-19 | Kogyo Gijutsuin | |
| JPS61224319A (ja) * | 1985-03-29 | 1986-10-06 | Hitachi Ltd | イオンビ−ム加工方法およびその装置 |
| JPS6285253A (ja) * | 1986-09-12 | 1987-04-18 | Hitachi Ltd | マスクの欠陥修正方法 |
| JPS6237387B2 (ja) * | 1986-09-12 | 1987-08-12 | Hitachi Ltd | |
| US7435973B2 (en) | 2002-02-25 | 2008-10-14 | Carl Zeiss Nts Gmbh | Material processing system and method |