JPS4928270A - - Google Patents

Info

Publication number
JPS4928270A
JPS4928270A JP6839872A JP6839872A JPS4928270A JP S4928270 A JPS4928270 A JP S4928270A JP 6839872 A JP6839872 A JP 6839872A JP 6839872 A JP6839872 A JP 6839872A JP S4928270 A JPS4928270 A JP S4928270A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6839872A
Other languages
Japanese (ja)
Other versions
JPS523775B2 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6839872A priority Critical patent/JPS523775B2/ja
Priority to GB3238173A priority patent/GB1398940A/en
Priority to DE2334658A priority patent/DE2334658C3/de
Priority to FR7325121A priority patent/FR2192378B1/fr
Publication of JPS4928270A publication Critical patent/JPS4928270A/ja
Publication of JPS523775B2 publication Critical patent/JPS523775B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/20Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials

Landscapes

  • Drying Of Semiconductors (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Dicing (AREA)
JP6839872A 1972-07-08 1972-07-08 Expired JPS523775B2 (https=)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6839872A JPS523775B2 (https=) 1972-07-08 1972-07-08
GB3238173A GB1398940A (en) 1972-07-08 1973-07-06 Method of dividing semiconductor wafers
DE2334658A DE2334658C3 (de) 1972-07-08 1973-07-07 Verfahren zum Zerteilen von Halbleiterscheiben
FR7325121A FR2192378B1 (https=) 1972-07-08 1973-07-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6839872A JPS523775B2 (https=) 1972-07-08 1972-07-08

Publications (2)

Publication Number Publication Date
JPS4928270A true JPS4928270A (https=) 1974-03-13
JPS523775B2 JPS523775B2 (https=) 1977-01-29

Family

ID=13372538

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6839872A Expired JPS523775B2 (https=) 1972-07-08 1972-07-08

Country Status (4)

Country Link
JP (1) JPS523775B2 (https=)
DE (1) DE2334658C3 (https=)
FR (1) FR2192378B1 (https=)
GB (1) GB1398940A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61102046A (ja) * 1984-10-25 1986-05-20 Nec Corp 半導体装置の製造方法
JP2019220581A (ja) * 2018-06-20 2019-12-26 株式会社ディスコ チップの製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6642127B2 (en) * 2001-10-19 2003-11-04 Applied Materials, Inc. Method for dicing a semiconductor wafer
CN103341692A (zh) 2013-06-26 2013-10-09 京东方科技集团股份有限公司 切割不规则图形基板的方法和显示装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615956A (en) * 1969-03-27 1971-10-26 Signetics Corp Gas plasma vapor etching process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61102046A (ja) * 1984-10-25 1986-05-20 Nec Corp 半導体装置の製造方法
JP2019220581A (ja) * 2018-06-20 2019-12-26 株式会社ディスコ チップの製造方法

Also Published As

Publication number Publication date
JPS523775B2 (https=) 1977-01-29
FR2192378A1 (https=) 1974-02-08
FR2192378B1 (https=) 1977-09-02
GB1398940A (en) 1975-06-25
DE2334658B2 (de) 1978-03-30
DE2334658C3 (de) 1978-11-23
DE2334658A1 (de) 1974-01-24

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