JPS4918721B1 - - Google Patents
Info
- Publication number
- JPS4918721B1 JPS4918721B1 JP11199870A JP11199870A JPS4918721B1 JP S4918721 B1 JPS4918721 B1 JP S4918721B1 JP 11199870 A JP11199870 A JP 11199870A JP 11199870 A JP11199870 A JP 11199870A JP S4918721 B1 JPS4918721 B1 JP S4918721B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US88676769A | 1969-12-19 | 1969-12-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4918721B1 true JPS4918721B1 (ja) | 1974-05-13 |
Family
ID=25389726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11199870A Pending JPS4918721B1 (ja) | 1969-12-19 | 1970-12-16 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS4918721B1 (ja) |
| CA (1) | CA930231A (ja) |
| CH (1) | CH558816A (ja) |
| DE (1) | DE2062563A1 (ja) |
| GB (1) | GB1312492A (ja) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51116893A (en) * | 1975-04-08 | 1976-10-14 | Ube Ind Ltd | Photo-setting compositions |
| CA1116919A (en) * | 1976-10-27 | 1982-01-26 | Joseph E. Gervay | Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder |
| JPS53127004A (en) * | 1977-04-11 | 1978-11-06 | Asahi Chemical Ind | Photosensitive elastomer composition |
| US4234676A (en) | 1978-01-23 | 1980-11-18 | W. R. Grace & Co. | Polythiol effect curable polymeric composition |
| DE2834768A1 (de) * | 1977-08-23 | 1979-03-08 | Grace W R & Co | Verfahren zur herstellung einer druckplatte und sie enthaltende haertbare polymerzusammensetzung |
| US4179531A (en) | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
| US4177074A (en) * | 1978-01-25 | 1979-12-04 | E. I. Du Pont De Nemours And Company | Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates |
| US4264708A (en) | 1978-03-31 | 1981-04-28 | E. I. Du Pont De Nemours And Company | Radiation sensitive element having a thin photopolymerizable layer |
| US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
| JPS607261B2 (ja) * | 1978-10-02 | 1985-02-23 | 旭化成株式会社 | 感光性エラストマ−組成物 |
| US4308338A (en) | 1980-03-26 | 1981-12-29 | E. I. Du Pont De Nemours And Company | Methods of imaging photopolymerizable materials containing diester polyether |
| CA1203107A (en) * | 1982-08-31 | 1986-04-15 | Uniroyal, Inc. | Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent |
| DE3327523A1 (de) * | 1983-07-30 | 1985-02-07 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches mehrschichtenmaterial |
| JPS61128243A (ja) * | 1984-11-28 | 1986-06-16 | Asahi Chem Ind Co Ltd | 感光性樹脂組成物 |
| US5252428A (en) * | 1988-03-31 | 1993-10-12 | Asahi Kasei Kogyo Kabushiki Kaisha | Photoresin relief printing plate |
-
1970
- 1970-11-18 GB GB5476170A patent/GB1312492A/en not_active Expired
- 1970-12-07 CA CA099962A patent/CA930231A/en not_active Expired
- 1970-12-16 JP JP11199870A patent/JPS4918721B1/ja active Pending
- 1970-12-18 DE DE19702062563 patent/DE2062563A1/de active Pending
- 1970-12-18 CH CH1880270A patent/CH558816A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB1312492A (en) | 1973-04-04 |
| DE2062563A1 (de) | 1971-09-02 |
| CH558816A (de) | 1975-02-14 |
| CA930231A (en) | 1973-07-17 |