JPS4915619A - - Google Patents

Info

Publication number
JPS4915619A
JPS4915619A JP48037478A JP3747873A JPS4915619A JP S4915619 A JPS4915619 A JP S4915619A JP 48037478 A JP48037478 A JP 48037478A JP 3747873 A JP3747873 A JP 3747873A JP S4915619 A JPS4915619 A JP S4915619A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP48037478A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4915619A publication Critical patent/JPS4915619A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP48037478A 1972-04-04 1973-04-03 Pending JPS4915619A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00241085A US3809571A (en) 1972-04-04 1972-04-04 Process for making silicon metal

Publications (1)

Publication Number Publication Date
JPS4915619A true JPS4915619A (ja) 1974-02-12

Family

ID=22909188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48037478A Pending JPS4915619A (ja) 1972-04-04 1973-04-03

Country Status (7)

Country Link
US (1) US3809571A (ja)
JP (1) JPS4915619A (ja)
BE (1) BE797694A (ja)
CA (1) CA986686A (ja)
DE (1) DE2316602C3 (ja)
FR (1) FR2179047B1 (ja)
IT (1) IT981862B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4444812A (en) * 1980-07-28 1984-04-24 Monsanto Company Combination gas curtains for continuous chemical vapor deposition production of silicon bodies
DE3338852C2 (de) * 1982-12-11 1987-02-26 Man Technologie Gmbh, 8000 Muenchen Verfahren zum oxidativen Beschichten von metallischen Werkstoffen
US5246734A (en) * 1986-05-05 1993-09-21 Dow Corning Corporation Amorphous silicon hermetic coatings for optical wave guides
US5082696A (en) * 1986-10-03 1992-01-21 Dow Corning Corporation Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
US7033561B2 (en) 2001-06-08 2006-04-25 Dow Corning Corporation Process for preparation of polycrystalline silicon
CN101724895B (zh) * 2009-12-17 2011-12-21 江苏中能硅业科技发展有限公司 一种多晶硅的生产工艺
JP5969230B2 (ja) 2012-03-16 2016-08-17 株式会社トクヤマ 多結晶シリコンロッド
US10208381B2 (en) 2014-12-23 2019-02-19 Rec Silicon Inc Apparatus and method for managing a temperature profile using reflective energy in a thermal decomposition reactor

Also Published As

Publication number Publication date
IT981862B (it) 1974-10-10
DE2316602B2 (de) 1975-11-27
DE2316602C3 (de) 1979-12-20
FR2179047A1 (ja) 1973-11-16
FR2179047B1 (ja) 1977-04-29
CA986686A (en) 1976-04-06
US3809571A (en) 1974-05-07
BE797694A (fr) 1973-10-03
DE2316602A1 (de) 1973-10-18

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