IT981862B - Processo per la produzione di silicio metallico - Google Patents

Processo per la produzione di silicio metallico

Info

Publication number
IT981862B
IT981862B IT22538/73A IT2253873A IT981862B IT 981862 B IT981862 B IT 981862B IT 22538/73 A IT22538/73 A IT 22538/73A IT 2253873 A IT2253873 A IT 2253873A IT 981862 B IT981862 B IT 981862B
Authority
IT
Italy
Prior art keywords
production
metallic silicon
metallic
silicon
Prior art date
Application number
IT22538/73A
Other languages
English (en)
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Application granted granted Critical
Publication of IT981862B publication Critical patent/IT981862B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
IT22538/73A 1972-04-04 1973-04-03 Processo per la produzione di silicio metallico IT981862B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00241085A US3809571A (en) 1972-04-04 1972-04-04 Process for making silicon metal

Publications (1)

Publication Number Publication Date
IT981862B true IT981862B (it) 1974-10-10

Family

ID=22909188

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22538/73A IT981862B (it) 1972-04-04 1973-04-03 Processo per la produzione di silicio metallico

Country Status (7)

Country Link
US (1) US3809571A (it)
JP (1) JPS4915619A (it)
BE (1) BE797694A (it)
CA (1) CA986686A (it)
DE (1) DE2316602C3 (it)
FR (1) FR2179047B1 (it)
IT (1) IT981862B (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4444812A (en) * 1980-07-28 1984-04-24 Monsanto Company Combination gas curtains for continuous chemical vapor deposition production of silicon bodies
DE3338852A1 (de) * 1982-12-11 1984-06-14 Maschf Augsburg Nuernberg Ag Verfahren und vorrichtung zur beschichtung von werkstuecken mittels chemischer, heterogener gasphasenreaktion
US5246734A (en) * 1986-05-05 1993-09-21 Dow Corning Corporation Amorphous silicon hermetic coatings for optical wave guides
US5082696A (en) * 1986-10-03 1992-01-21 Dow Corning Corporation Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes
US7033561B2 (en) 2001-06-08 2006-04-25 Dow Corning Corporation Process for preparation of polycrystalline silicon
US20020187096A1 (en) * 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
CN101724895B (zh) * 2009-12-17 2011-12-21 江苏中能硅业科技发展有限公司 一种多晶硅的生产工艺
JP5969230B2 (ja) * 2012-03-16 2016-08-17 株式会社トクヤマ 多結晶シリコンロッド
US10208381B2 (en) 2014-12-23 2019-02-19 Rec Silicon Inc Apparatus and method for managing a temperature profile using reflective energy in a thermal decomposition reactor

Also Published As

Publication number Publication date
DE2316602A1 (de) 1973-10-18
BE797694A (fr) 1973-10-03
US3809571A (en) 1974-05-07
FR2179047A1 (it) 1973-11-16
CA986686A (en) 1976-04-06
FR2179047B1 (it) 1977-04-29
DE2316602C3 (de) 1979-12-20
JPS4915619A (it) 1974-02-12
DE2316602B2 (de) 1975-11-27

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