JPS49123689A - - Google Patents
Info
- Publication number
- JPS49123689A JPS49123689A JP48036742A JP3674273A JPS49123689A JP S49123689 A JPS49123689 A JP S49123689A JP 48036742 A JP48036742 A JP 48036742A JP 3674273 A JP3674273 A JP 3674273A JP S49123689 A JPS49123689 A JP S49123689A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3674273A JPS5313151B2 (ja) | 1973-04-02 | 1973-04-02 | |
US434061A US3930155A (en) | 1973-01-19 | 1974-01-17 | Ion microprobe analyser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3674273A JPS5313151B2 (ja) | 1973-04-02 | 1973-04-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS49123689A true JPS49123689A (ja) | 1974-11-26 |
JPS5313151B2 JPS5313151B2 (ja) | 1978-05-08 |
Family
ID=12478166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3674273A Expired JPS5313151B2 (ja) | 1973-01-19 | 1973-04-02 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5313151B2 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60101850A (ja) * | 1983-11-08 | 1985-06-05 | Jeol Ltd | イオンビ−ム装置 |
JPS60200449A (ja) * | 1984-03-26 | 1985-10-09 | Hitachi Ltd | イオンビ−ムによるプロセス方法と装置 |
JPH01109350A (ja) * | 1987-10-23 | 1989-04-26 | Seiko Instr & Electron Ltd | マスクの欠陥修正装置 |
JPH01167643A (ja) * | 1987-12-23 | 1989-07-03 | Res Dev Corp Of Japan | マイクロプローブ表面分析装置 |
JPH02199761A (ja) * | 1989-01-30 | 1990-08-08 | Nippon Telegr & Teleph Corp <Ntt> | 二次イオン質量分析装置 |
-
1973
- 1973-04-02 JP JP3674273A patent/JPS5313151B2/ja not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60101850A (ja) * | 1983-11-08 | 1985-06-05 | Jeol Ltd | イオンビ−ム装置 |
JPH0326498B2 (ja) * | 1983-11-08 | 1991-04-11 | Nippon Electron Optics Lab | |
JPS60200449A (ja) * | 1984-03-26 | 1985-10-09 | Hitachi Ltd | イオンビ−ムによるプロセス方法と装置 |
JPH01109350A (ja) * | 1987-10-23 | 1989-04-26 | Seiko Instr & Electron Ltd | マスクの欠陥修正装置 |
JPH0661001B2 (ja) * | 1987-10-23 | 1994-08-10 | セイコー電子工業株式会社 | マスクの欠陥修正装置 |
JPH01167643A (ja) * | 1987-12-23 | 1989-07-03 | Res Dev Corp Of Japan | マイクロプローブ表面分析装置 |
JPH02199761A (ja) * | 1989-01-30 | 1990-08-08 | Nippon Telegr & Teleph Corp <Ntt> | 二次イオン質量分析装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS5313151B2 (ja) | 1978-05-08 |