JPS488384A - - Google Patents

Info

Publication number
JPS488384A
JPS488384A JP4274871A JP4274871A JPS488384A JP S488384 A JPS488384 A JP S488384A JP 4274871 A JP4274871 A JP 4274871A JP 4274871 A JP4274871 A JP 4274871A JP S488384 A JPS488384 A JP S488384A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4274871A
Other languages
Japanese (ja)
Other versions
JPS51481B1 (cg-RX-API-DMAC7.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46042748A priority Critical patent/JPS51481B1/ja
Priority to CA144,506A priority patent/CA958273A/en
Priority to FR7221370A priority patent/FR2141902A1/fr
Priority to GB2791772A priority patent/GB1392076A/en
Priority to DE2229302A priority patent/DE2229302A1/de
Publication of JPS488384A publication Critical patent/JPS488384A/ja
Publication of JPS51481B1 publication Critical patent/JPS51481B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Furan Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP46042748A 1971-06-16 1971-06-16 Pending JPS51481B1 (cg-RX-API-DMAC7.html)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP46042748A JPS51481B1 (cg-RX-API-DMAC7.html) 1971-06-16 1971-06-16
CA144,506A CA958273A (en) 1971-06-16 1972-06-13 Photosensitive composition
FR7221370A FR2141902A1 (cg-RX-API-DMAC7.html) 1971-06-16 1972-06-14
GB2791772A GB1392076A (en) 1971-06-16 1972-06-14 Photosensitive polymers and elements
DE2229302A DE2229302A1 (de) 1971-06-16 1972-06-15 Lichtempfindliche masse

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46042748A JPS51481B1 (cg-RX-API-DMAC7.html) 1971-06-16 1971-06-16

Publications (2)

Publication Number Publication Date
JPS488384A true JPS488384A (cg-RX-API-DMAC7.html) 1973-02-02
JPS51481B1 JPS51481B1 (cg-RX-API-DMAC7.html) 1976-01-08

Family

ID=12644621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46042748A Pending JPS51481B1 (cg-RX-API-DMAC7.html) 1971-06-16 1971-06-16

Country Status (5)

Country Link
JP (1) JPS51481B1 (cg-RX-API-DMAC7.html)
CA (1) CA958273A (cg-RX-API-DMAC7.html)
DE (1) DE2229302A1 (cg-RX-API-DMAC7.html)
FR (1) FR2141902A1 (cg-RX-API-DMAC7.html)
GB (1) GB1392076A (cg-RX-API-DMAC7.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5187128A (cg-RX-API-DMAC7.html) * 1975-01-28 1976-07-30 Nippon Tungsten
JPS59104262A (ja) * 1982-12-07 1984-06-16 Kubota Ltd 耐摩耗中空複合鋳物及びその製造法
WO2019003682A1 (ja) * 2017-06-30 2019-01-03 富士フイルム株式会社 光配向性共重合体、光配向膜、光学積層体および画像表示装置
WO2024070915A1 (ja) * 2022-09-26 2024-04-04 東ソー株式会社 樹脂、組成物、光架橋物、パターンおよびそれを備えた電子デバイス

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2549303B2 (ja) * 1988-09-21 1996-10-30 富士写真フイルム株式会社 感光性組成物
US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
CN101613276B (zh) * 2009-06-23 2012-12-26 苏州苏大欧罗新材料科技有限公司 彩色滤光片用彩色光阻剂
WO2022210326A1 (ja) 2021-03-30 2022-10-06 東ソー株式会社 フッ素系樹脂、組成物、光架橋物、およびそれを備えた電子デバイス

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5187128A (cg-RX-API-DMAC7.html) * 1975-01-28 1976-07-30 Nippon Tungsten
JPS59104262A (ja) * 1982-12-07 1984-06-16 Kubota Ltd 耐摩耗中空複合鋳物及びその製造法
WO2019003682A1 (ja) * 2017-06-30 2019-01-03 富士フイルム株式会社 光配向性共重合体、光配向膜、光学積層体および画像表示装置
JPWO2019003682A1 (ja) * 2017-06-30 2020-03-19 富士フイルム株式会社 光配向性共重合体、光配向膜、光学積層体および画像表示装置
WO2024070915A1 (ja) * 2022-09-26 2024-04-04 東ソー株式会社 樹脂、組成物、光架橋物、パターンおよびそれを備えた電子デバイス

Also Published As

Publication number Publication date
CA958273A (en) 1974-11-26
DE2229302A1 (de) 1973-01-11
JPS51481B1 (cg-RX-API-DMAC7.html) 1976-01-08
GB1392076A (en) 1975-04-23
FR2141902A1 (cg-RX-API-DMAC7.html) 1973-01-26