JPS4879181A - - Google Patents
Info
- Publication number
- JPS4879181A JPS4879181A JP423373A JP423373A JPS4879181A JP S4879181 A JPS4879181 A JP S4879181A JP 423373 A JP423373 A JP 423373A JP 423373 A JP423373 A JP 423373A JP S4879181 A JPS4879181 A JP S4879181A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB6050371 | 1971-12-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4879181A true JPS4879181A (ko) | 1973-10-24 |
Family
ID=10485694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP423373A Pending JPS4879181A (ko) | 1971-12-29 | 1972-12-29 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS4879181A (ko) |
| DE (1) | DE2263784A1 (ko) |
| FR (1) | FR2170572A5 (ko) |
| IT (1) | IT974362B (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991004352A1 (en) * | 1989-09-13 | 1991-04-04 | Sony Corporation | Sputtering apparatus and sputtering processing system using the same |
-
1972
- 1972-12-27 FR FR7246311A patent/FR2170572A5/fr not_active Expired
- 1972-12-28 DE DE19722263784 patent/DE2263784A1/de active Pending
- 1972-12-28 IT IT5508672A patent/IT974362B/it active
- 1972-12-29 JP JP423373A patent/JPS4879181A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991004352A1 (en) * | 1989-09-13 | 1991-04-04 | Sony Corporation | Sputtering apparatus and sputtering processing system using the same |
| US5183547A (en) * | 1989-09-13 | 1993-02-02 | Sony Corporation | Sputtering apparatus and system for sputtering employing same |
Also Published As
| Publication number | Publication date |
|---|---|
| IT974362B (it) | 1974-06-20 |
| FR2170572A5 (ko) | 1973-09-14 |
| DE2263784A1 (de) | 1973-07-12 |