JPS4873380A - - Google Patents

Info

Publication number
JPS4873380A
JPS4873380A JP47130359A JP13035972A JPS4873380A JP S4873380 A JPS4873380 A JP S4873380A JP 47130359 A JP47130359 A JP 47130359A JP 13035972 A JP13035972 A JP 13035972A JP S4873380 A JPS4873380 A JP S4873380A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP47130359A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4873380A publication Critical patent/JPS4873380A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Plasma Technology (AREA)
JP47130359A 1971-12-29 1972-12-28 Pending JPS4873380A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB6050171 1971-12-29

Publications (1)

Publication Number Publication Date
JPS4873380A true JPS4873380A (fr) 1973-10-03

Family

ID=10485691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47130359A Pending JPS4873380A (fr) 1971-12-29 1972-12-28

Country Status (5)

Country Link
US (1) US3838028A (fr)
JP (1) JPS4873380A (fr)
DE (1) DE2263737A1 (fr)
FR (1) FR2170570A5 (fr)
IT (1) IT974360B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03177572A (ja) * 1979-12-21 1991-08-01 Varian Assoc Inc ウェーハを熱処理する装置

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4109157A (en) * 1975-12-18 1978-08-22 Kawasaki Jukogyo Kabushiki Kaisha Apparatus for ion-nitriding
US4298444A (en) * 1978-10-11 1981-11-03 Heat Mirror Associates Method for multilayer thin film deposition
US4204942A (en) * 1978-10-11 1980-05-27 Heat Mirror Associates Apparatus for multilayer thin film deposition
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
US4333814A (en) * 1979-12-26 1982-06-08 Western Electric Company, Inc. Methods and apparatus for improving an RF excited reactive gas plasma
DE4302851A1 (de) * 1993-02-02 1994-08-04 Leybold Ag Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat
JP3973112B2 (ja) * 1995-06-07 2007-09-12 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド ウェーハの向き整合システム
US5985115A (en) * 1997-04-11 1999-11-16 Novellus Systems, Inc. Internally cooled target assembly for magnetron sputtering
CN104404463B (zh) * 2014-11-14 2017-02-22 河海大学 一种平面磁控溅射靶

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03177572A (ja) * 1979-12-21 1991-08-01 Varian Assoc Inc ウェーハを熱処理する装置
JPH0633457B2 (ja) * 1979-12-21 1994-05-02 バリアン・アソシエイツ・インコーポレイテッド ウェーハを熱処理する装置

Also Published As

Publication number Publication date
DE2263737A1 (de) 1973-07-12
US3838028A (en) 1974-09-24
FR2170570A5 (fr) 1973-09-14
IT974360B (it) 1974-06-20

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