JPS4841708A - - Google Patents

Info

Publication number
JPS4841708A
JPS4841708A JP46074842A JP7484271A JPS4841708A JP S4841708 A JPS4841708 A JP S4841708A JP 46074842 A JP46074842 A JP 46074842A JP 7484271 A JP7484271 A JP 7484271A JP S4841708 A JPS4841708 A JP S4841708A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP46074842A
Other languages
Japanese (ja)
Other versions
JPS559814B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7484271A priority Critical patent/JPS559814B2/ja
Publication of JPS4841708A publication Critical patent/JPS4841708A/ja
Publication of JPS559814B2 publication Critical patent/JPS559814B2/ja
Expired legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Hard Magnetic Materials (AREA)
JP7484271A 1971-09-25 1971-09-25 Expired JPS559814B2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7484271A JPS559814B2 (de) 1971-09-25 1971-09-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7484271A JPS559814B2 (de) 1971-09-25 1971-09-25

Publications (2)

Publication Number Publication Date
JPS4841708A true JPS4841708A (de) 1973-06-18
JPS559814B2 JPS559814B2 (de) 1980-03-12

Family

ID=13558972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7484271A Expired JPS559814B2 (de) 1971-09-25 1971-09-25

Country Status (1)

Country Link
JP (1) JPS559814B2 (de)

Cited By (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4828533A (de) * 1971-08-18 1973-04-16
JPS494798A (de) * 1972-04-26 1974-01-16
JPS4930468A (de) * 1972-04-25 1974-03-18
JPS4932702A (de) * 1972-07-26 1974-03-26
JPS4948777A (de) * 1972-05-16 1974-05-11
JPS5098318A (de) * 1973-12-25 1975-08-05
JPS5034964B1 (de) * 1970-03-30 1975-11-12
JPS51137797A (en) * 1975-05-24 1976-11-27 Toyobo Co Ltd Process for preparing a u rethane modified acrylate resin
JPS5651165B1 (de) * 1971-01-08 1981-12-03
JPS57109128A (en) * 1980-12-26 1982-07-07 Nippon Gakki Seizo Kk Magnetic tape
JPS6485268A (en) * 1987-09-25 1989-03-30 Kemitetsuku Kk Ultraviolet ray and moisture curable adhesive composition
US6514657B1 (en) 2000-07-19 2003-02-04 Kodak Polychrome Graphics, L.L.C. Photosensitive composition for lithographic printing plate and photosensitive lithographic printing plate
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate
EP1925954A2 (de) 2006-11-21 2008-05-28 FUJIFILM Corporation Verfahren zur Herstellung eines strukturierten, doppelbrechenden Produkts
EP1975701A2 (de) 2007-03-29 2008-10-01 Fujifilm Corporation Farbfilter und Herstellungsverfahren dafür
EP1980901A1 (de) 2007-04-12 2008-10-15 Fujifilm Corporation Verfahren zur Herstellung eines Flüssigkristallanzeige-Vorrichtung-Substrats, welches einen optisch strukturierten Verzögerer beinhaltet
WO2009038038A1 (ja) 2007-09-19 2009-03-26 Fujifilm Corporation アセチレン化合物、その塩、その縮合物、及びその組成物
EP2105298A1 (de) 2008-03-28 2009-09-30 Fujifilm Corporation Negativ arbeitender Lithografiedruckplattenvorläufer und Lithografiedruckverfahren damit
WO2009119827A1 (ja) 2008-03-27 2009-10-01 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作製方法
WO2010038795A1 (ja) 2008-09-30 2010-04-08 富士フイルム株式会社 平版印刷版原版、平版印刷版の製版方法及び重合性モノマー
WO2010038625A1 (ja) 2008-09-30 2010-04-08 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
EP2177357A2 (de) 2008-08-29 2010-04-21 Fujifilm Corporation Negativ arbeitender Lithografiedruckplattenvorläufer und Lithografiedruckverfahren damit
EP2309339A1 (de) 1999-01-19 2011-04-13 Dai Nippon Printing Co., Ltd. Übertragungsfolie für Hologramme
EP2362266A2 (de) 2010-02-26 2011-08-31 Fujifilm Corporation Gefärbte härtbare Zusammensetzung, Farbfilter und Verfahren zur Herstellung eines Farbfilters, Festkörperbildsensor und Flüssigkristallanzeigevorrichtung
WO2012137452A1 (en) 2011-04-08 2012-10-11 Canon Kabushiki Kaisha Optical element and multilayer diffractive optical element
EP2568339A2 (de) 2011-08-24 2013-03-13 Fujifilm Corporation Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte
WO2013080798A1 (ja) 2011-11-30 2013-06-06 富士フイルム株式会社 光拡散性転写材料、光拡散層の形成方法、有機電界発光装置、及び有機電界発光装置の製造方法
EP2610673A2 (de) 2011-12-26 2013-07-03 Fujifilm Corporation Verfahren zur Herstellung von Lithografiedruckplatten
US8540837B2 (en) 2009-02-26 2013-09-24 Fujifilm Corporation Functional film and method for manufacturing the functional film
US8591688B2 (en) 2009-10-15 2013-11-26 Fujifilm Corporation Functional film and method for producing the same
WO2014087900A1 (ja) 2012-12-03 2014-06-12 富士フイルム株式会社 固体撮像素子用保持基板及びその製造方法、固体撮像装置
WO2014087901A1 (ja) 2012-12-03 2014-06-12 富士フイルム株式会社 Ｉｒカットフィルタ及びその製造方法、固体撮像装置、遮光膜の形成方法
WO2014104136A1 (ja) 2012-12-28 2014-07-03 富士フイルム株式会社 赤外線反射膜形成用の硬化性樹脂組成物、赤外線反射膜及びその製造方法、並びに赤外線カットフィルタ及びこれを用いた固体撮像素子
WO2014157272A1 (ja) 2013-03-29 2014-10-02 富士フイルム株式会社 人工爪組成物、人工爪、人工爪の形成方法、及び、ネイルアートキット
US9393740B2 (en) 2014-03-14 2016-07-19 Seiko Epson Corporation Method of producing three-dimensional structure, apparatus for producing three-dimensional structure, and three-dimensional structure
US9463614B2 (en) 2014-01-09 2016-10-11 Seiko Epson Corporation Three-dimensional shaped article manufacturing method
US9481162B2 (en) 2014-01-09 2016-11-01 Seiko Epson Corporation Three-dimensional shaped article manufacturing method
US9597838B2 (en) 2014-03-14 2017-03-21 Seiko Epson Corporation Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure
US9623606B2 (en) 2014-06-27 2017-04-18 Seiko Epson Corporation Method of manufacturing three-dimensional structure and three-dimensional structure
US9630339B2 (en) 2014-03-17 2017-04-25 Seiko Epson Corporation Manufacturing method of three-dimensional structure and three-dimensional structure
US9676144B2 (en) 2014-03-26 2017-06-13 Seiko Epson Corporation Three-dimensional structure manufacturing apparatus, method of manufacturing three-dimensional structure, and three-dimensional structure
US10493655B2 (en) 2014-03-26 2019-12-03 Seiko Epson Corporation Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure

Cited By (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034964B1 (de) * 1970-03-30 1975-11-12
JPS5651165B1 (de) * 1971-01-08 1981-12-03
JPS4828533A (de) * 1971-08-18 1973-04-16
JPS4930468A (de) * 1972-04-25 1974-03-18
JPS494798A (de) * 1972-04-26 1974-01-16
JPS5617368B2 (de) * 1972-04-26 1981-04-22
JPS4948777A (de) * 1972-05-16 1974-05-11
JPS5513017B2 (de) * 1972-07-26 1980-04-05
JPS4932702A (de) * 1972-07-26 1974-03-26
JPS5098318A (de) * 1973-12-25 1975-08-05
JPS5342248B2 (de) * 1973-12-25 1978-11-10
JPS558013B2 (de) * 1975-05-24 1980-03-01
JPS51137797A (en) * 1975-05-24 1976-11-27 Toyobo Co Ltd Process for preparing a u rethane modified acrylate resin
JPS57109128A (en) * 1980-12-26 1982-07-07 Nippon Gakki Seizo Kk Magnetic tape
JPS6485268A (en) * 1987-09-25 1989-03-30 Kemitetsuku Kk Ultraviolet ray and moisture curable adhesive composition
EP2309339A1 (de) 1999-01-19 2011-04-13 Dai Nippon Printing Co., Ltd. Übertragungsfolie für Hologramme
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate
US6514657B1 (en) 2000-07-19 2003-02-04 Kodak Polychrome Graphics, L.L.C. Photosensitive composition for lithographic printing plate and photosensitive lithographic printing plate
EP1925954A2 (de) 2006-11-21 2008-05-28 FUJIFILM Corporation Verfahren zur Herstellung eines strukturierten, doppelbrechenden Produkts
EP1975701A2 (de) 2007-03-29 2008-10-01 Fujifilm Corporation Farbfilter und Herstellungsverfahren dafür
EP1980901A1 (de) 2007-04-12 2008-10-15 Fujifilm Corporation Verfahren zur Herstellung eines Flüssigkristallanzeige-Vorrichtung-Substrats, welches einen optisch strukturierten Verzögerer beinhaltet
WO2009038038A1 (ja) 2007-09-19 2009-03-26 Fujifilm Corporation アセチレン化合物、その塩、その縮合物、及びその組成物
WO2009119827A1 (ja) 2008-03-27 2009-10-01 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作製方法
EP2105298A1 (de) 2008-03-28 2009-09-30 Fujifilm Corporation Negativ arbeitender Lithografiedruckplattenvorläufer und Lithografiedruckverfahren damit
EP2177357A2 (de) 2008-08-29 2010-04-21 Fujifilm Corporation Negativ arbeitender Lithografiedruckplattenvorläufer und Lithografiedruckverfahren damit
WO2010038795A1 (ja) 2008-09-30 2010-04-08 富士フイルム株式会社 平版印刷版原版、平版印刷版の製版方法及び重合性モノマー
WO2010038625A1 (ja) 2008-09-30 2010-04-08 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
US8540837B2 (en) 2009-02-26 2013-09-24 Fujifilm Corporation Functional film and method for manufacturing the functional film
US8591688B2 (en) 2009-10-15 2013-11-26 Fujifilm Corporation Functional film and method for producing the same
EP2362266A2 (de) 2010-02-26 2011-08-31 Fujifilm Corporation Gefärbte härtbare Zusammensetzung, Farbfilter und Verfahren zur Herstellung eines Farbfilters, Festkörperbildsensor und Flüssigkristallanzeigevorrichtung
WO2012137452A1 (en) 2011-04-08 2012-10-11 Canon Kabushiki Kaisha Optical element and multilayer diffractive optical element
EP2568339A2 (de) 2011-08-24 2013-03-13 Fujifilm Corporation Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte
WO2013080798A1 (ja) 2011-11-30 2013-06-06 富士フイルム株式会社 光拡散性転写材料、光拡散層の形成方法、有機電界発光装置、及び有機電界発光装置の製造方法
EP2610673A2 (de) 2011-12-26 2013-07-03 Fujifilm Corporation Verfahren zur Herstellung von Lithografiedruckplatten
WO2014087901A1 (ja) 2012-12-03 2014-06-12 富士フイルム株式会社 Ｉｒカットフィルタ及びその製造方法、固体撮像装置、遮光膜の形成方法
WO2014087900A1 (ja) 2012-12-03 2014-06-12 富士フイルム株式会社 固体撮像素子用保持基板及びその製造方法、固体撮像装置
WO2014104136A1 (ja) 2012-12-28 2014-07-03 富士フイルム株式会社 赤外線反射膜形成用の硬化性樹脂組成物、赤外線反射膜及びその製造方法、並びに赤外線カットフィルタ及びこれを用いた固体撮像素子
WO2014157272A1 (ja) 2013-03-29 2014-10-02 富士フイルム株式会社 人工爪組成物、人工爪、人工爪の形成方法、及び、ネイルアートキット
US9463614B2 (en) 2014-01-09 2016-10-11 Seiko Epson Corporation Three-dimensional shaped article manufacturing method
US9481162B2 (en) 2014-01-09 2016-11-01 Seiko Epson Corporation Three-dimensional shaped article manufacturing method
US10286578B2 (en) 2014-01-09 2019-05-14 Seiko Epson Corporation Three-dimensional shaped article manufacturing apparatus
US9393740B2 (en) 2014-03-14 2016-07-19 Seiko Epson Corporation Method of producing three-dimensional structure, apparatus for producing three-dimensional structure, and three-dimensional structure
US9597838B2 (en) 2014-03-14 2017-03-21 Seiko Epson Corporation Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure
US9630339B2 (en) 2014-03-17 2017-04-25 Seiko Epson Corporation Manufacturing method of three-dimensional structure and three-dimensional structure
US9676144B2 (en) 2014-03-26 2017-06-13 Seiko Epson Corporation Three-dimensional structure manufacturing apparatus, method of manufacturing three-dimensional structure, and three-dimensional structure
US10493655B2 (en) 2014-03-26 2019-12-03 Seiko Epson Corporation Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure
US9623606B2 (en) 2014-06-27 2017-04-18 Seiko Epson Corporation Method of manufacturing three-dimensional structure and three-dimensional structure

Also Published As

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