JPS4840810B1 - - Google Patents
Info
- Publication number
- JPS4840810B1 JPS4840810B1 JP45073917A JP7391770A JPS4840810B1 JP S4840810 B1 JPS4840810 B1 JP S4840810B1 JP 45073917 A JP45073917 A JP 45073917A JP 7391770 A JP7391770 A JP 7391770A JP S4840810 B1 JPS4840810 B1 JP S4840810B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/15—Silicon on sapphire SOS
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86203969A | 1969-09-29 | 1969-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4840810B1 true JPS4840810B1 (ja) | 1973-12-03 |
Family
ID=25337473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP45073917A Pending JPS4840810B1 (ja) | 1969-09-29 | 1970-08-25 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3679502A (ja) |
| JP (1) | JPS4840810B1 (ja) |
| BE (1) | BE756807A (ja) |
| DE (1) | DE2046956A1 (ja) |
| FR (1) | FR2062802A5 (ja) |
| GB (1) | GB1305625A (ja) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4052251A (en) * | 1976-03-02 | 1977-10-04 | Rca Corporation | Method of etching sapphire utilizing sulfur hexafluoride |
| US4039357A (en) * | 1976-08-27 | 1977-08-02 | Bell Telephone Laboratories, Incorporated | Etching of III-V semiconductor materials with H2 S in the preparation of heterodiodes to facilitate the deposition of cadmium sulfide |
| US4131496A (en) * | 1977-12-15 | 1978-12-26 | Rca Corp. | Method of making silicon on sapphire field effect transistors with specifically aligned gates |
| US4213818A (en) * | 1979-01-04 | 1980-07-22 | Signetics Corporation | Selective plasma vapor etching process |
| US4214946A (en) * | 1979-02-21 | 1980-07-29 | International Business Machines Corporation | Selective reactive ion etching of polysilicon against SiO2 utilizing SF6 -Cl2 -inert gas etchant |
| US4331504A (en) * | 1981-06-25 | 1982-05-25 | International Business Machines Corporation | Etching process with vibrationally excited SF6 |
| US4364793A (en) * | 1981-08-28 | 1982-12-21 | Graves Clinton G | Method of etching silicon and polysilicon substrates |
| US4498953A (en) * | 1983-07-27 | 1985-02-12 | At&T Bell Laboratories | Etching techniques |
| US4615764A (en) * | 1984-11-05 | 1986-10-07 | Allied Corporation | SF6/nitriding gas/oxidizer plasma etch system |
| US4582581A (en) * | 1985-05-09 | 1986-04-15 | Allied Corporation | Boron trifluoride system for plasma etching of silicon dioxide |
| JPH086184B2 (ja) * | 1985-06-12 | 1996-01-24 | 株式会社日立製作所 | 表面処理方法 |
| US6355564B1 (en) * | 1999-08-26 | 2002-03-12 | Advanced Micro Devices, Inc. | Selective back side reactive ion etch |
| GB2399311B (en) * | 2003-03-04 | 2005-06-15 | Xsil Technology Ltd | Laser machining using an active assist gas |
| GB2404280B (en) * | 2003-07-03 | 2006-09-27 | Xsil Technology Ltd | Die bonding |
| US8906248B2 (en) | 2011-12-13 | 2014-12-09 | Lam Research Corporation | Silicon on insulator etch |
| US20160351733A1 (en) | 2015-06-01 | 2016-12-01 | International Business Machines Corporation | Dry etch method for texturing silicon and device |
-
0
- BE BE756807D patent/BE756807A/xx unknown
-
1969
- 1969-09-29 US US862039A patent/US3679502A/en not_active Expired - Lifetime
-
1970
- 1970-08-25 JP JP45073917A patent/JPS4840810B1/ja active Pending
- 1970-09-09 GB GB4318470A patent/GB1305625A/en not_active Expired
- 1970-09-23 DE DE19702046956 patent/DE2046956A1/de active Pending
- 1970-09-29 FR FR7035244A patent/FR2062802A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2046956A1 (de) | 1971-05-06 |
| US3679502A (en) | 1972-07-25 |
| BE756807A (fr) | 1971-03-29 |
| FR2062802A5 (ja) | 1971-06-25 |
| GB1305625A (ja) | 1973-02-07 |