JPH1199765A - Aluminum alloy carrier for ps plate and manufacture thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To control the coarse enlargement of recrystallized grains during hot rolling, and raise the burning characteristic by allowing a trace element Cu contained in an aluminum alloy carrier for a PS plate to be a specific wt.%, and effecting middle annealing, cold rolling, and low temperature annealing for dispersing a simple element Si. SOLUTION: This is Cu: 0.001-0.05% (wherein, excluding 0.001%) by wt.%, and hot rolling is carried out In the range of temperature at 200-500 deg.C. When coming over 500 deg.C, the recrystallized grains enlarge coarsely, as a result, streaks are prone to be generated by a rough surface treatment. Middle annealing is implemented in the range of temperature of 330-570 deg.C, and this is executed for the purpose of putting Si in solution once so as to attempt the improvement of burning characteristic by a solution and trace deposition of Fe and trace deposition of a simple substance Si by subsequent low temperature annealing. Following this, distortion is conducted in the metal constitution by the cold rolling, and this accelerates the deposition of the simple substance Si by the subsequent low temperature annealing. Thus, the cold rolling is carried out by a rolling rate of 30%. In the next place, low temperature annealing is conducted in the range of temperature of 100-370% for 1 hr or longer for permitting the simple element Si to be deposited.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum alloy support for a PS plate used for lithographic printing.

[0002]

2. Description of the Related Art In lithographic printing, a PS plate (Presensitized Plate) comprising a support made of an aluminum alloy and a photoreceptor using a diazo compound or the like as a photosensitive material is subjected to plate making processes such as image exposure and development to form an image portion. The formed plate is wrapped around the cylindrical plate cylinder of the printing press, ink is applied to the image area in the presence of the dampening solution attached to the non-image area, this ink is transferred to a rubber blanket, and printed on paper. Is what you do.

As a support of the PS plate, an aluminum alloy plate which has been subjected to surface treatment such as surface roughening treatment (graining) by electrolytic etching and anodic oxidation treatment is used.
Initially, JIS1050 (pure Al having a purity of 99.5% or more) and JIS1100 (Al-
0.05 to 0.20% Cu alloy), JIS3003 (A
1-0.05 to 0.20% Cu-1.5% Mn alloy) has been mainly used.

[0004] The aluminum alloy support (1) has a uniform roughened surface by electrolytic etching. (2) Good adhesion of the photosensitive agent. (3) Various characteristics are required, such as that the image portion is not stained during printing. However, JIS1050, JIS1
100, JIS 3003 itself could not sufficiently satisfy the above requirements, and various improvements have been made.

[0005] For example, Japanese Patent Application Laid-Open No. 58-221254 discloses that Si 0.02 to 0.15%, Fe 0.1 to 1.0%.
%, Cu 0.003% or less, and a blank for offset printing comprising the balance Al and inevitable impurities are disclosed.
Japanese Patent Application Laid-Open No. 62-148295 discloses Fe0.
Aluminum alloy support for lithographic printing, comprising 0.05 to 1.0%, Si 0.2% or less, Cu 0.05% or less, the balance being Al and unavoidable impurities, and 0.012% or less of simple Si distributed in the metal structure. The body is disclosed.

[0006]

SUMMARY OF THE INVENTION The above-mentioned JP-A-58-22
No. 1254 proposes to regulate the Cu content to 0.003% or less because the corrosion resistance decreases with an increase in the Cu content, and the contamination of the non-image area increases during printing due to the influence. I have. Further, according to Japanese Patent Application Laid-Open No. 62-148295, a rough surface having uniform pits due to electrolytic etching is obtained, no streak (streak-like unevenness) is observed, and a stain on a non-image portion is suppressed during printing. It has the effect of being able to.

In recent years, however, it has been required to improve the printing durability of PS plates, and it is required that the aluminum alloy support for lithographic printing have a fatigue strength to withstand this. JP-A-58-22254 and JP-A-62-14829
The conventional aluminum alloy support described in No. 5 was insufficient in this fatigue strength.

The improvement of fatigue strength is described in
No. 42493, 0.15-1% of Fe, 0.1% of Si0.
An aluminum alloy ingot consisting of 0.5 to 0.3%, with the balance being Al and ordinary impurities, is soaked and subjected to hot rolling or hot rolling followed by cold rolling and intermediate annealing.
A manufacturing method has been proposed in which the above-described cold rolling is performed and then low-temperature annealing is performed.

The proposal of JP-A-58-42493 is as follows.
The purpose of the present invention is to improve the fatigue strength by uniformly dispersing the intermetallic compound of Fe and Si by cold rolling with a surface reduction rate of 70% or more, and to impart appropriate strength and fatigue strength by low-temperature annealing. As a result, the fatigue strength was improved to some extent, but the burning characteristics required for the PS plate were not considered at all. In addition, the surface uniformity after the surface roughening treatment was insufficient.

Accordingly, an object of the present invention is to provide an aluminum alloy support for a PS plate which is excellent in uniformity of a rough surface by electrolytic etching, and is excellent in fatigue strength and burning characteristics.

[0011]

In order to solve the above-mentioned problems, the present inventors investigated trace elements contained in an aluminum alloy support for a PS plate, and found that Cu suppressed coarsening of recrystallized grains during hot rolling. It has been found that streak, which is a surface defect at the time of electrolytic etching caused by coarse crystal grains, can be prevented, and uniformity of a rough surface can be ensured. Also,
In order to improve fatigue resistance and burning characteristics, it is effective to actively disperse elemental Si in the metal structure. For that purpose, low-temperature annealing is performed after cold rolling after intermediate annealing. We found that it was effective.

The present invention is based on the above findings,
By weight%, Fe 0.05-1%, Si 0.01-0.2
%, Cu 0.001-0.05% (However, 0.001%
), An aluminum alloy consisting of the balance of Al and unavoidable impurities and distributed in the metal structure
Is not less than 0.015%.

The aluminum alloy support for a PS plate of the present invention is 0.05 to 1% by weight of Fe,
Aluminum alloy ingot consisting of 0.01-0.2%, Cu 0.001-0.05% (but not including 0.001%), balance Al and unavoidable impurities, homogenized, then hot-rolled Cold rolling, then intermediate annealing at a temperature of 330 ° C. to 570 ° C., then cold rolling at a rolling ratio of 30% or more, and then low temperature annealing at a temperature of 100 ° C. to 370 ° C. for 1 hour or more. Thus, the elemental Si is added to the metal structure in an amount of 0.1.
It can be produced by a method for producing an aluminum alloy support for a PS plate, characterized by being distributed at 015% or more.

According to the present invention, a uniform rough surface free from streaks can be obtained after electrolytic etching, the fatigue strength is 580 × 10 ² times or more, and the burning strength is 125 N.
/ Mm ² or more. Note that the fatigue strength and the burning strength in the present invention are determined by the measuring methods described in the examples below. In the present invention, the temperature rising rate in the intermediate annealing is from 10 ° C./sec.
It is desirable to carry out in the range of 60 ° C./sec. In addition, low-temperature annealing is performed in a temperature range of 100 ° C. to 370 ° C., but when annealing is performed in a high temperature range in this range, after low-temperature annealing,
It is desirable to perform cold rolling at a rolling ratio of 30% to 80%.

[0015]

The reasons for limiting the components of the present invention will be described below. <Fe: 0.05 to 1%> Fe mainly forms an Al-Fe intermetallic compound which is Al ₃ Fe, improves fatigue resistance, and refines crystal grains to make the structure uniform. Has an effect. However, if it is less than 0.05%, this effect is insufficient, and if it exceeds 1%, the compound tends to be coarse and the uniformity of the rough surface due to electrolytic etching tends to be impaired. And Desirable Fe content is 0.1 to 0.5%.

<Si: 0.015 to 0.2%>
If it is less than 0.015%, it is difficult to secure the precipitation of elemental Si required in the present invention, but if it exceeds 0.2%, uniformity of the rough surface by electrolytic etching is impaired.
The range is 15 to 0.2%. Desirable Si content is 0.03 to 0.1%.

<Cu: 0.001 to 0.05% (however,
0.001%)> Cu is an element that suppresses coarsening of recrystallized grains during hot rolling as described above.
%, The effect is small, and if it exceeds 0.5%, a non-uniform etching surface is formed during electrolytic etching. Therefore, 0.001 to 0.05% (however, 0.001%
% Is not included). Desirable Cu content is 0.01 to
0.04%.

<Amount of Single Si> Single Si has the effect of improving the fatigue resistance and burning characteristics of the alloy support by being precipitated in the metal structure. In order to obtain this effect, the distribution needs to be 0.015% or more, preferably 0.020% or more. However, if there is too much, it tends to harm the uniformity after the surface roughening treatment.
It is desirable to set it to 4% or less. In order to make the amount of the elemental Si within the range of the present invention, intermediate annealing, cold rolling, and low-temperature annealing may be set as the conditions of the present invention, which will be described later in detail.

<Other Impurity Elements> The aluminum alloy support for a PS plate of the present invention contains impurity elements in addition to the above-mentioned elements. Mg: 0.02% or less, Zn: 0.02% or less, Ti:
0.03% or less V: 0.01% or less, B: 0.002% or less

Next, the method for producing the aluminum alloy support for PS plate of the present invention will be described. <Casting> Casting is not particularly limited in producing the aluminum alloy support for a PS plate of the present invention, and a conventionally known casting method such as a DC casting method can be applied.

<Homogenization Treatment> The ingot obtained by casting is subjected to a homogenization treatment in a temperature range of 500 ° C. to 610 ° C. By this homogenization treatment, Fe, Si and the like are dissolved, and the Al-Fe intermetallic compound is uniformly and finely dispersed. The holding time of the heat treatment may be appropriately determined depending on the size of the ingot and the like. After the homogenization treatment, the ingot can be cooled once and then subjected to a soaking treatment for the next step of hot rolling. Alternatively, the hot rolling can be performed directly from the homogenization treatment.

<Hot rolling> Hot rolling is performed after the homogenization treatment. The hot rolling is suitably performed in a temperature range of 200 to 500 ° C. If the temperature exceeds 500 ° C., the recrystallized grains become coarse, and streaks tend to occur due to the surface roughening treatment.

<Cold Rolling> After hot rolling, cold rolling is performed. This cold rolling disperses the Al-Fe intermetallic compound and makes the crystal structure uniform and fine. In order to obtain this effect, it is necessary to reduce the area by 50%, preferably 70% or more.

<Intermediate Annealing> After cold rolling, the temperature ranges from 330 ° C. to 5 ° C.
Intermediate annealing is performed in a temperature range of 70 ° C. This intermediate annealing
Improvement of burning characteristics by solid solution and fine precipitation of Fe,
This is performed for the purpose of once forming a solid solution of Si in order to achieve fine precipitation of elemental Si in the subsequent low-temperature annealing. If the temperature is lower than 330 ° C., this object cannot be achieved. If the temperature is higher than 570 ° C., the oxidation of the surface becomes remarkable. A desirable temperature range is from 330C to 570C.

The annealing may be carried out in either a continuous annealing furnace or a batch annealing furnace. In the case of a continuous annealing furnace, it is desirable that the heating rate be in the range of 10 ° C./sec to 60 ° C./sec. . If the temperature is less than 10 ° C./sec, the effect of solid solution and fine precipitation of Fe cannot be sufficiently obtained.
This is because if the temperature exceeds ec, the heating device needs to be increased in size in terms of equipment, which causes a cost increase.

<Cold Rolling> After the intermediate annealing, cold rolling is performed again. This cold rolling introduces strain into the metal structure and promotes the precipitation of elemental Si by subsequent low-temperature annealing. In order to obtain this effect, cold rolling is performed at a rolling reduction of 30%.

<Low temperature annealing> After cold rolling, 100 ° C to 37 ° C
Perform low temperature annealing for 1 hr or more in a temperature range of 0 ° C.
Deposit i. If the temperature is lower than 100 ° C., the precipitation of elemental Si is very slow, resulting in poor productivity. If the temperature exceeds 350 ° C., a solid solution is formed.

<Cold rolling> Since the strength is reduced by low-temperature annealing, 30% is required to satisfy the strength required as a product.
% To 80% cold rolling. In particular, when low-temperature annealing is performed in a high temperature range, specifically, 200 to
In the case of 350 ° C., it is recommended to perform this final cold rolling.

<Surface Treatment> After the finish cold rolling is completed, the surface is immersed in an electrolytic solution such as hydrochloric acid or nitric acid to perform a surface roughening treatment by electrolytic etching. The surface roughening treatment is performed to improve the adhesion to the photosensitive layer in the image area and to improve the hydrophilicity and water retention in the non-image area. After performing the surface roughening treatment, the surface may be subjected to an anodic oxidation treatment to improve the wear resistance and hydrophilicity of the surface.

[0030]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments. Table 1
Was obtained by DC casting. Casting speed is 30mm / min, slab thickness is 200m
m. This slab is made 500 to 550 depending on the alloy composition.
After applying a homogeneous and uniform heat treatment of heating and holding at 1 ° C for 1 hour,
Hot rolling and cold rolling were performed, and then intermediate annealing was performed. Table 2 shows the conditions of the sheet thickness and the intermediate annealing (continuous annealing) during the intermediate annealing. After the intermediate annealing, cold rolling shown in Table 2 was performed, and then low-temperature annealing was also performed under the conditions shown in Table 2. Then, about Example 2, cold rolling of 50% was further performed.

(Table 1) No. FeSiCuSiSiSi Example 1 0.05 0.22 0.0031 0.026 Remaining Example 2 0.05 0.22 0.0031 0.026 Remaining Example 3 0.16 0.08 0.014 0.025 Remaining Example 4 0.40 0.05 0.032 0.033 Remaining Example 5 0.52 0.03 0.022 0.028 Remaining Example 6 0.81 0.02 0.040 0.022 Remaining Comparative Example 1 0.08 0.16 0.012 0.010 Remaining Comparative Example 2 0.32 0.07 0.005 0.003 Remaining Comparative Example 3 0.80 0.005 0.023 0.007 Remaining Comparative Example 4 1.2 0.06 0.012 0.024 Remaining Comparative Example 5 0.32 0.4 0.038 0.25 Remaining Comparative Example 6 0.21 0.06 0.075 0.012 Remaining

After subjecting each test material to electrolytic etching under the following conditions, the rough surface was observed and evaluated by SEM, and a sample having no streak and excellent uniformity of the rough surface was evaluated as good. X. Electroetching conditions Degreasing: immersion in a 20% Na ₃ PO ₄ aqueous solution at 70 ° C. for 5 minutes Smut removal: immersion in 70% HNO ₃ for 1 minute Electrolytic etching: 2 in a 1.5% HCl aqueous solution at 30 ° C.
AC electrolysis at 0A / dm ² or more

Regarding the fatigue strength, the width was 20 mm,
Using a test piece with a length of 100 mm, fix one end and bend it downward to an angle of 30 ° with respect to the fixed end, and then return to the original straight state again. Was measured. Further, the burning strength was measured after a heat treatment at 250 ° C. × 15 min corresponding to the burning treatment. Table 3 shows the above measurement results.

(Table 2) Intermediate annealing Intermediate annealing Cold rolling rate Low-temperature annealing Sheet thickness (mm) Temperature, heating rate (%) Example 1 5.2 375 ° C, 15 ° C / sec 90 (0.5 mm) 300 ° C × 4hr Example 2 5.2 375 ℃, 15 ℃ / sec 90 (0.5mm) 300 ℃ × 4hr Example 3 4.5 400 ℃, 30 ℃ / sec 87 (0.6mm) 350 ℃ × 2hr Example 4 3.2 400 ℃, 35 ℃ / sec 72 (0.9mm) 215 ℃ × 4hr Example 5 3.2 550 ℃, 45 ℃ / sec 72 (0.9mm) 250 ℃ × 12hr Example 6 1.0 515 ℃, 47 ℃ / sec 30 (0.7mm) 145 ℃ × 12hr Comparative Example 1 3.0 320 ° C, 1 ° C / sec 73 (0.8mm) 400 ° C × 2hr Comparative Example 2 − − 0 (1.0mm) 250 ° C × 4hr Comparative Example 3 4.8 435 ° C, 1.6 ° C / sec 25 (3.75mm) ) 300 ° C x 4hr Comparative Example 4 4.0 450 ° C, 1.1 ° C / sec 88 (1.2mm) 200 ° C x 8hr Comparative Example 5 4.0 450 ° C, 7 ° C / sec 80 (0.8mm) 250 ° C x 4hr Comparative Example 6 4.0 450 ° C, 1 ° C / sec 90 (0.4 mm) 300 ° C × 4 hours * In Example 2, 50% cold rolling was performed after low-temperature annealing.

Table 3 shows that Examples 1 to 6 according to the present invention
Has a uniform electrolytic etching surface and a fatigue strength of 588x
10 ^more than once, burning intensity has a sufficient value and 125N / mm ² or more. In Comparative Example 1, since the intermediate annealing temperature was lower than the range of the present invention, solid solution of Fe, fine precipitation and S
The solid solution of i is insufficient, and the temperature of low-temperature annealing is too high, so that the Si to be precipitated is dissolved, and the amount of elemental Si is below the range of the present invention. As a result, the fatigue strength and the burning strength are insufficient.

Comparative Example 2 was obtained by subjecting a cold-rolled material without intermediate annealing to low-temperature annealing. In order to avoid cold-rolling before intermediate annealing and low-temperature annealing, simple Si was used.
Insufficient quantity, which results in low burning intensity. In Comparative Example 3, the amount of Si contained in the alloy was 0.005.
%, The fatigue strength is inferior. In addition, since the amount of elemental Si is less than the range of the present invention, the burning strength is slightly lower.

In Comparative Examples 4, 5, and 6, the Fe content, the Si content, and the Cu content in the alloys were too large, and a good rough surface was not obtained after electrolytic etching.

(Table 3) Electrolysis Fatigue Strength Burning Comprehensive Evaluation Etching (times) Strength Surface (N / mm ² ) Example 1 ○ 598 × 10 ² 125 ○ Example 2 ○ 603 × 10 ² 132 ○ Example 3 ○ 582 × 10 ² 138 ○ Example 4 ○ 614 × 10 ² 130 ○ Example 5 ○ 633 × 10 ² 141 ○ Example 6 ○ 582 × 10 ² 128 ○ Comparative Example 1 ○ 405 × 10 ² 114 × Comparative Example 2 ○ 622 × 10 ² 108 × Comparative Example 3 ○ 398 × 10 ² 103 × Comparative Example 4 × 607 × 10 ² 135 × Comparative Example 5 × 735 × 10 ² 131 × Comparative Example 6 × 592 × 10 ² 133 ×

[0039]

As described above, according to the present invention, the weight%
And Fe 0.05-1%, Si 0.01-0.2%, C
u of 0.001 to 0.05% (but not including 0.001%), the balance being Al and an aluminum alloy consisting of unavoidable impurities, and the amount of elemental Si distributed in the metal structure is 0.1%.
Since the aluminum alloy support for a PS plate is characterized by being at least 015%, a streak is not generated on the rough surface due to electrolytic etching, and the fatigue strength and the burning strength can be improved. it can.

──────────────────────────────────────────────────の Continuation of front page (51) Int.Cl. ⁶ Identification code FI C22F 1/00 674 C22F 1/00 674 685 685Z 686 686B 691 691B 691C 691A 694 694A (72) Inventor Takeharu Ishihara Hiramatsu, Susono City, Shizuoka Prefecture 85 Inside Mitsubishi Aluminum Co., Ltd.

Claims (6)

[Claims] 1. The composition according to claim 1, wherein 0.05% to 1% of Fe,
0.015-0.2%, Cu 0.001-0.05%
(But not including 0.001%), an aluminum alloy comprising a balance of Al and unavoidable impurities, wherein the amount of elemental Si distributed in the metallographic structure is 0.015% or more. Alloy support. 2. The method according to claim 1, wherein the elemental Si distributed in the metal structure is 0.0%.
The aluminum alloy support for a PS plate according to claim 1, which is 20 to 0.045%. 3. The aluminum alloy support for a PS plate according to claim 1, which has a fatigue strength of 580 × 10 ² times or more and a burning strength of 125 N / mm ² or more. 4. The composition according to claim 1, wherein 0.05 to 1% of Fe,
0.01-0.2%, Cu 0.001% or less, balance Al
After hot-rolling and cold-rolling the aluminum alloy ingot consisting of unavoidable impurities,
Intermediate annealing is performed at a temperature of 570 ° C., then cold rolling is performed at a rolling reduction of 30% or more, and then low-temperature annealing is performed at a temperature of 100 ° C. to 370 ° C. for 1 hour or more to reduce elemental Si to 0% in the metal structure. A method for producing an aluminum alloy support for a PS plate, wherein the aluminum alloy support is distributed at 0.015% or more. 5. The heating rate of the intermediate annealing is from 10 ° C./sec.
The method for producing an aluminum alloy support for a PS plate according to claim 4, wherein the temperature is 60 ° C / sec. 6. The method for producing an aluminum alloy support for a PS plate according to claim 4, wherein cold rolling is performed at a rolling reduction of 30% to 80% after low-temperature annealing.