JPH1197806A - Surface-mounting wiring substrate and manufacture thereof - Google Patents

Surface-mounting wiring substrate and manufacture thereof

Info

Publication number
JPH1197806A
JPH1197806A JP25056197A JP25056197A JPH1197806A JP H1197806 A JPH1197806 A JP H1197806A JP 25056197 A JP25056197 A JP 25056197A JP 25056197 A JP25056197 A JP 25056197A JP H1197806 A JPH1197806 A JP H1197806A
Authority
JP
Japan
Prior art keywords
epoxy resin
heat
wiring board
layer
resin layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25056197A
Other languages
Japanese (ja)
Inventor
Katsuyoshi Watanabe
勝好 渡邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP25056197A priority Critical patent/JPH1197806A/en
Publication of JPH1197806A publication Critical patent/JPH1197806A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/426Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates without metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/44Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits
    • H05K3/445Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits having insulated holes or insulated via connections through the metal core

Abstract

PROBLEM TO BE SOLVED: To provide a surface-mounting wiring substrate where thermal radiation is readily performed and the required functions can be performed all the time, even when the semiconductor element having the large amount of heat radiation accompanied by operation is provided and mounted, and a manufacturing method thereof. SOLUTION: A substrate has at least one layer of heat-radiating substrate, which has an inter-layer connecting hole 2 that penetrates in the thickness direction and connects the wiring patterns on both main-surface, a thin epoxy resin layer 3 covering the surface of a heat radiating plate 1 including the inner wall surface of the inter-layer connecting hole 2, and a conductor plated layer 4 that is formed on the epoxy resin layer 3 at inner wall surface of the inter-layer connecting hole 2, and electrically connects the corresponding wiring patterns.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は面実装用配線基板お
よびその製造方法に係り、さらに詳しくは高速動作型
で、発熱量の大きい半導体素子の搭載・実装に適する面
実装用配線基板およびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface mounting wiring board and a method for manufacturing the same, and more particularly, to a high-speed operation type wiring board for surface mounting suitable for mounting and mounting a semiconductor element having a large amount of heat generation and a method for manufacturing the same. About the method.

【0002】[0002]

【従来の技術】高速な動作が要求される半導体素子を主
面に搭載・実装して成るメモリモジュールなどは、各種
の電子機器類において広く実用に供されている。そし
て、この種のモジュール用配線基板としては、通常、ガ
ラス・エポキシ樹脂を絶縁基材とした面実装用配線基板
が重用されている。すなわち、メモリモジュールなどの
回路装置においては、短小・軽量化あるいはコンパクト
化とともに、低コスト化などが要求されている。そし
て、このような要望に対して、高い電気絶縁性および機
械的な強度を有するガラス・エポキシ樹脂系の配線基板
が一般的に使用されている。
2. Description of the Related Art Memory modules and the like in which a semiconductor element requiring high-speed operation is mounted and mounted on a main surface are widely used in various electronic devices. As this kind of module wiring board, a surface mounting wiring board using glass / epoxy resin as an insulating base material is generally used. That is, circuit devices such as memory modules are required to be shorter, smaller, lighter, more compact, and lower in cost. In response to such demands, glass-epoxy resin-based wiring boards having high electrical insulation and mechanical strength are generally used.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、上記構
成の面実装用配線基板においては、次のような不都合な
問題が認められる。一般的に、物質の電気伝導度と熱伝
導度とは比例関係にあるため、電気絶縁性の高い(低電
気伝導度)絶縁基材、すなわちガラス・エポキシ樹脂系
基板の場合、一方では、熱伝導度が低く、放熱性が劣っ
ているということになる。
However, the following inconvenience is recognized in the surface mounting wiring board having the above-mentioned structure. In general, since the electrical conductivity of a substance is proportional to the thermal conductivity, in the case of an insulating substrate having a high electrical insulation (low electrical conductivity), that is, a glass-epoxy resin-based substrate, This means that the conductivity is low and the heat dissipation is inferior.

【0004】したがって、前記面実装用配線基板に対す
る高密度実装化、あるいは動作発熱の大きい半導体素子
の搭載・実装による全体的な発熱量の増大もしくは発熱
密度の向上に伴って、所要の機能を十分に発揮できなく
なる恐れがある。つまり、部品自体の表面(露出面)か
らだけで、その部品個々の発熱を十分に放熱できないの
で、部品自体の温度上昇を招来し、必然的に性能低下が
起こることになる。
[0004] Therefore, with the high density mounting on the surface mounting wiring board, or the increase in the overall heat generation or the improvement of the heat generation density due to the mounting and mounting of the semiconductor element having a large operating heat generation, the required functions are sufficiently provided. May not be able to be fully demonstrated. That is, the heat generated by each component cannot be sufficiently radiated only from the surface (exposed surface) of the component itself, so that the temperature of the component itself rises, and the performance inevitably decreases.

【0005】本発明は上記事情に対処してなされたもの
で、動作に伴う発熱量が大きい半導体素子を搭載・実装
した場合でも、放熱が容易になされ、所要の機能を常時
発揮させることが可能な面実装用配線基板、およびその
製造方法の提供を目的とする。
The present invention has been made in view of the above circumstances. Even when a semiconductor element generating a large amount of heat during operation is mounted and mounted, heat is easily dissipated, and required functions can be constantly exerted. It is an object of the present invention to provide a wiring board for surface mounting and a method for manufacturing the same.

【0006】[0006]

【課題を解決するための手段】請求項1の発明は、厚さ
方向に貫通し、かつ両主面側の配線パターン間を接続す
る層間接続用孔を有する放熱性板と、前記層間接続用孔
の内壁面を含む放熱性板表面を被覆する薄いエポキシ樹
脂層と、前記層間接続用孔内壁面のエポキシ樹脂層面上
に形設され、かつ対応する配線パターン間を電気的に接
続する導体メッキ層と、を有する放熱性配線基板を少な
くとも一層備えたことを特徴とする表面実装用配線基板
である。
According to a first aspect of the present invention, there is provided a heat dissipating plate having an interlayer connection hole penetrating in a thickness direction and connecting between wiring patterns on both main surfaces, A thin epoxy resin layer covering the surface of the heat-radiating plate including the inner wall surface of the hole, and a conductor plating formed on the epoxy resin layer surface of the inner wall surface of the interlayer connection hole and electrically connecting the corresponding wiring patterns. And a heat-radiating wiring board having at least one layer.

【0007】請求項2の発明は、請求項1記載の表面実
装用配線基板において、放熱性配線基板が外層側に配置
されていることを特徴とする。
According to a second aspect of the present invention, in the wiring board for surface mounting according to the first aspect, the heat dissipating wiring board is disposed on the outer layer side.

【0008】請求項3の発明は、放熱性板にその厚さ方
向に貫通する層間接続用孔を穿設する工程と、前記放熱
性板の表面に厚さがほぼ一様なエポキシ樹脂層を被覆形
成する工程と、 前記層間接続用孔内を含むエポキシ樹
脂層面上に、層間接続部および配線パターンを形成する
工程と、を有することを特徴とする表面実装用配線基板
の製造方法である。
According to a third aspect of the present invention, there is provided a heat radiating plate, in which a hole for interlayer connection penetrating in a thickness direction thereof is formed, and an epoxy resin layer having a substantially uniform thickness is formed on the surface of the heat radiating plate. A method of manufacturing a surface mounting wiring board, comprising: a step of forming a coating; and a step of forming an interlayer connection portion and a wiring pattern on an epoxy resin layer surface including the inside of the interlayer connection hole.

【0009】請求項1および請求項2の発明では、電気
的な絶縁性をエポキシ樹脂層で確保する一方、熱伝導性
および機械的な強度を放熱性板で維持するため、表面実
装用配線基板の短小・軽量化が容易に図られる。つま
り、コンパクトで高性能を保持・発揮するメモリモジュ
ルなどの構成に適する実装用配線基板として機能する。
請求項3の発明では、前記コンパクトで高性能を保持・
発揮するメモリモジュルなどの構成に適する実装用配線
基板を低コストで、かつ容易に提供できる。
According to the first and second aspects of the present invention, while the electrical insulation is ensured by the epoxy resin layer, the thermal conductivity and the mechanical strength are maintained by the heat radiating plate. Can be easily reduced in size and weight. In other words, it functions as a mounting wiring board suitable for a configuration such as a memory module that is compact and maintains and exhibits high performance.
According to the third aspect of the present invention, the compact and high performance is maintained.
A mounting wiring board suitable for a configuration such as a memory module to be exhibited can be easily provided at low cost.

【0010】[0010]

【発明の実施の形態】以下、図1,図2および図3を参
照して実施例を説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment will be described below with reference to FIGS. 1, 2 and 3. FIG.

【0011】図1は、第1の実施例に係る面実装用配線
基板の要部構成を示す断面図である。図1において、1
は厚さ方向に貫通し、かつ両主面側の配線パターン間を
接続する層間接続用孔2を有する放熱性板である。ここ
で、放熱性板1は、たとえば鉄、アルミニウム板など熱
伝導性が良好で、適度の機械的強度を有する金属類を素
材とした板であり、面実装用配線基板の用途や大きさに
もよるが、一般的に、その厚さは0.05〜 0.3mm程度であ
り、層間接続用孔2の径は 0.2〜 0.4mm程度である。
また、3は前記層間接続用孔2の内壁面を含む放熱性板
1表面を被覆する薄いエポキシ樹脂層である。ここで、
エポキシ樹脂層3は、たとえばエピコート系樹脂である
が、シリカ粉末などを含有したものでもよく、その厚さ
は10〜30μm 程度である。そして、このエポキシ樹脂層
3の被覆形成は、たとえばエポキシ樹脂類を溶液化し、
この溶液の塗布・乾燥、要すれば焼き付け処理などによ
って行われる。
FIG. 1 is a sectional view showing the structure of a main part of a wiring board for surface mounting according to a first embodiment. In FIG. 1, 1
Is a heat radiating plate having an interlayer connection hole 2 penetrating in the thickness direction and connecting between the wiring patterns on both main surfaces. Here, the heat radiating plate 1 is a plate made of a metal having good thermal conductivity such as an iron or aluminum plate and having a suitable mechanical strength, and is suitable for use and size of the surface mounting wiring board. Generally, however, the thickness is about 0.05 to 0.3 mm, and the diameter of the interlayer connection hole 2 is about 0.2 to 0.4 mm.
Reference numeral 3 denotes a thin epoxy resin layer covering the surface of the heat radiation plate 1 including the inner wall surface of the interlayer connection hole 2. here,
The epoxy resin layer 3 is, for example, an epicoat resin, but may contain silica powder or the like, and has a thickness of about 10 to 30 μm. The coating of the epoxy resin layer 3 is formed by, for example, converting epoxy resins into a solution,
This solution is applied and dried, and if necessary, baked.

【0012】さらに、4は前記層間接続用孔2内壁面の
エポキシ樹脂層3面上に形設され、かつ対応する配線パ
ターン(図示省略)間を電気的に接続する導体メッキ層
である。ここで、層間接続用孔2内壁面に、エポキシ樹
脂層(絶縁体層)3を介して形成する導体メッキ層4
は、たとえば (a)化学メッキ層、 (b)化学メッキ層およ
び電気メッキ層の複層型、 (c)半田メッキ層などであ
る。そして、この配線パターン層間を接続する形態は、
多層型配線中内層の配線パターン層同士の接続、もしく
は内層の配線パターン層と外層配線パターンとの接続で
あるビア接続、両面側に貫通するスルホール接続が挙げ
られる。
Reference numeral 4 denotes a conductor plating layer formed on the epoxy resin layer 3 on the inner wall surface of the interlayer connection hole 2 and electrically connecting corresponding wiring patterns (not shown). Here, a conductor plating layer 4 formed on the inner wall surface of the interlayer connection hole 2 with an epoxy resin layer (insulator layer) 3 interposed therebetween.
Are, for example, (a) a chemical plating layer, (b) a multi-layer type of a chemical plating layer and an electroplating layer, and (c) a solder plating layer. And the form of connecting between the wiring pattern layers is as follows:
Connections between the inner wiring pattern layers in the multilayer wiring, via connections as a connection between the inner wiring pattern layer and the outer wiring pattern, and through-hole connections penetrating both sides are exemplified.

【0013】次に、上記構成の表面実装用配線基板の製
造例について説明する。
Next, a description will be given of an example of manufacturing the surface mounting wiring board having the above configuration.

【0014】先ず、厚さ 0.2mm程度、 100×30mm角の鉄
板を用意し、たとえばドリル加工によって、所定の位置
に、厚さ方向に貫通する 0.3mm程度の孔を穿設した。こ
のドリル加工した鉄板に、予め用意しておいたエポキシ
樹脂溶液の塗布・乾燥を施して、穿設孔内壁面を含む全
面に、50μm 程度の厚さがほぼ一様なエポキシ樹脂層を
被覆形成する。
First, an iron plate having a thickness of about 0.2 mm and a square of 100 × 30 mm was prepared, and a hole of about 0.3 mm penetrating in a thickness direction was formed at a predetermined position by, for example, drilling. The drilled iron plate is coated with an epoxy resin solution prepared in advance and dried to form an epoxy resin layer with a thickness of approximately 50 μm and a uniform thickness on the entire surface including the inner wall surface of the drilled hole. I do.

【0015】その後、前記エポキシ樹脂層面に、化学メ
ッキ用の前処理(たとえば塩化パラジウム水溶液処理)
を施してから、化学銅メッキ液中に浸漬して厚さ 5μm
程度の銅層を全面的に被覆形成する。さらに、前記形成
した化学銅メッキ層を一方の電極として電気銅メッキ処
理を施し、全体的に、銅のメッキ層を厚く成長させる。
次いで、前記両主面の銅メッキ層面にエッチングレジ
スト膜を形成し、露光・現像処理を順次施して、穿設孔
内壁面を含めてエッチングレジストパターンを形成す
る。このようにレジストマスクを行った状態で、前記形
成し、かつ露出させてある銅メッキ層を選択的にエッチ
ング除去し、両面の配線パターン層が、穿設孔内壁面に
形成されている銅メッキ層により電気的に接続された配
線基板5が得られる。
Thereafter, a pretreatment for chemical plating (for example, an aqueous solution of palladium chloride) is applied to the surface of the epoxy resin layer.
And then immersed in a chemical copper plating solution to a thickness of 5 μm.
A copper layer of a degree is entirely formed. Further, an electrolytic copper plating process is performed using the formed chemical copper plating layer as one electrode, and a copper plating layer is grown thick as a whole.
Next, an etching resist film is formed on the copper plating layers on both the main surfaces, and is sequentially subjected to exposure and development to form an etching resist pattern including the inner wall surface of the perforated hole. With the resist mask applied in this way, the formed and exposed copper plating layer is selectively etched away, so that the wiring pattern layers on both surfaces are formed on the inner wall surface of the drilled hole. A wiring board 5 electrically connected by the layers is obtained.

【0016】上記面実装用配線基板5は、鉄板を支持基
体とし、薄いエポキシ樹脂層を絶縁体層として介挿しな
がら、所要の配線パターンおよびスルホール接続部を有
する構造と成っている。つまり、電気的絶縁性の高いエ
ポキシ樹脂を絶縁体層とし、放熱性の良好な金属板面に
所要の配線パターンが形成された構造を採っている。こ
の構成においては、前記エポキシ樹脂層が比較的薄く設
定されているため、配線パターン領域に搭載・実装され
た半導体素子の動作・発熱は、それ自体の表面からだけ
でなく、支持基板(金属板)側へ容易に伝熱し、速やか
に放熱される。 なお、上記では、放熱性板1両主面に
銅メッキ層を成長させ、この銅メッキ層のホォトエッチ
ングにより配線パターンを形成したが、銅メッキ層の代
りに、たとえば厚さ18μm 銅箔を張り合わせる構成を採
ってもよい。
The wiring board 5 for surface mounting has a structure having a required wiring pattern and a through-hole connection portion while using an iron plate as a support base and a thin epoxy resin layer as an insulator layer. In other words, a structure in which a required wiring pattern is formed on a metal plate surface having good heat dissipation properties is employed as an insulating layer of epoxy resin having high electrical insulation properties. In this configuration, since the epoxy resin layer is set to be relatively thin, the operation and heat generation of the semiconductor element mounted and mounted in the wiring pattern region are caused not only from the surface of the semiconductor element itself but also from the support substrate (metal plate). ) Side, heat is easily dissipated. In the above description, a copper plating layer was grown on both main surfaces of the heat radiating plate 1 and a wiring pattern was formed by photo-etching the copper plating layer. Instead of the copper plating layer, for example, a copper foil having a thickness of 18 μm was laminated. May be adopted.

【0017】図2は、第2の実施例に係る面実装用配線
基板の要部構成を示す断面図で、放熱性板1同士を積層
した構造例である。すなわち、上記第1の実施例に係る
面実装用配線基板5に準じた構成の面実装用配線基板5a
同士を位置合わせし、接着性エポキシ樹脂6を介して接
合一体化した構造と成っている。そして、両主面側の配
線パターン間を接続するため、厚さ方向に貫通させた層
間接続用孔2内壁面のエポキシ樹脂層3面および接着性
エポキシ樹脂層6端面上に、配線パターン(図示省略)
間を電気的に接続する導体メッキ層4が形設されてい
る。
FIG. 2 is a cross-sectional view showing a main part of a wiring board for surface mounting according to a second embodiment, which is an example of a structure in which heat radiation plates 1 are laminated. That is, the surface mounting wiring board 5a having a configuration similar to that of the surface mounting wiring board 5 according to the first embodiment.
The structure is such that they are aligned with each other and joined and integrated via an adhesive epoxy resin 6. Then, in order to connect the wiring patterns on both main surfaces, a wiring pattern (shown in the drawing) is provided on the inner surface of the interlayer connection hole 2 penetrated in the thickness direction on the surface of the epoxy resin layer 3 and the end surface of the adhesive epoxy resin layer 6. Omitted)
A conductor plating layer 4 for electrically connecting between them is formed.

【0018】図2に図示した構成の場合は、両面の配線
パターン領域に、半導体素子をそれぞれ搭載・実装した
構成を採っても、それら半導体素子の動作・発熱が、そ
れ自体の表面からだけでなく、近接・配置されている両
支持基板(金属板)1を介して、容易に伝熱し、速やか
に放熱される。
In the case of the configuration shown in FIG. 2, even if a configuration is adopted in which semiconductor elements are respectively mounted and mounted on the wiring pattern regions on both sides, the operation and heat generation of these semiconductor elements are limited only from the surface of the semiconductor elements themselves. Instead, heat is easily transmitted through the two supporting substrates (metal plates) 1 arranged close to each other, and the heat is quickly radiated.

【0019】図3は、第3の実施例に係る面実装用配線
基板の要部構成を示す断面図で、樹脂系配線板7の両主
面側に、放熱性板1を積層した構造例である。すなわ
ち、上記第1の実施例に係る面実装用配線基板5に準じ
た構成の面実装用配線基板5aの間に、ガラス・エポキシ
樹脂系配線板7を介挿・位置合わせし、接着性エポキシ
樹脂6を介して接合一体化した構造と成っている。そし
て、両主面側の配線パターン間を接続するため、厚さ方
向に貫通させた層間接続用孔2内壁面のエポキシ樹脂層
3面、ガラス・エポキシ樹脂系配線板7端面および接着
性エポキシ樹脂層6端面上に、配線パターン(図示省
略)間を電気的に接続する導体メッキ層4が形設されて
いる。
FIG. 3 is a cross-sectional view showing the structure of a main part of a wiring board for surface mounting according to a third embodiment, in which a heat dissipation plate 1 is laminated on both main surfaces of a resin-based wiring board 7. It is. That is, the glass / epoxy resin-based wiring board 7 is interposed and aligned between the surface-mounting wiring boards 5a having a configuration similar to the surface-mounting wiring board 5 according to the first embodiment, and the adhesive epoxy It has a structure in which it is joined and integrated via the resin 6. In order to connect the wiring patterns on both main surfaces, the surface of the epoxy resin layer 3 on the inner wall surface of the interlayer connection hole 2 penetrated in the thickness direction, the end surface of the glass / epoxy resin wiring board 7 and the adhesive epoxy resin On the end face of the layer 6, a conductor plating layer 4 for electrically connecting wiring patterns (not shown) is formed.

【0020】図3に図示した構成の場合は、両面の配線
パターン領域に、半導体素子をそれぞれ搭載・実装した
構成を採っても、それら半導体素子の動作・発熱が、そ
れ自体の表面からだけでなく、近接・配置されている両
支持基板(金属板)1を介して、容易に伝熱し、速やか
に放熱される。すなわち、少なくとも半導体素子などを
搭載・実装する面に近接した位置(外側)に、放熱性板
1を配置した構成を採ることにより、前記搭載・実装し
た電子部品の動作・発熱が、前記放熱性板1を介して容
易に放熱される。したがって、搭載・実装された半導体
素子などは、電子回路要素として所要の性能を十分に発
揮することになり、信頼性の高い実装回路装置として機
能する。
In the case of the configuration shown in FIG. 3, even if a configuration is adopted in which semiconductor elements are respectively mounted and mounted on the wiring pattern areas on both sides, the operation and heat generation of those semiconductor elements are limited only from the surface of the semiconductor elements themselves. Instead, heat is easily transmitted through the two supporting substrates (metal plates) 1 arranged close to each other, and the heat is quickly radiated. That is, by adopting a configuration in which the heat radiating plate 1 is arranged at least at a position (outside) close to the surface on which the semiconductor element or the like is mounted / mounted, the operation / heat generation of the mounted / mounted electronic component is reduced by the heat radiation Heat is easily dissipated through the plate 1. Therefore, the mounted and mounted semiconductor element and the like sufficiently exhibit required performance as an electronic circuit element, and function as a highly reliable mounted circuit device.

【0021】なお、本発明は、上記実施例に限定される
ものでなく、発明の趣旨を逸脱しない範囲でいろいろの
変形を採ることができる。たとえば、放熱性板として鉄
板の代りにアルミニウム板を、さらに、放熱性板の厚さ
などを薄くして、より多層型に構成してもよい。
It should be noted that the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the invention. For example, an aluminum plate may be used in place of the iron plate as the heat dissipating plate, and the thickness of the heat dissipating plate or the like may be reduced to form a multilayer structure.

【0022】[0022]

【発明の効果】請求項1および請求項2の発明によれ
ば、電気的な絶縁性をエポキシ樹脂層で確保する一方、
熱伝導性および機械的な強度を放熱性板で維持する構成
としているため、面実装用配線基板の短小・軽量化が容
易に図られる。つまり、コンパクトで高性能を保持・発
揮するメモリモジュルなどの構成に適する面実装用配線
基板が提供される。
According to the first and second aspects of the present invention, while electrical insulation is ensured by the epoxy resin layer,
Since the heat conductivity and the mechanical strength are maintained by the heat radiating plate, the size and weight of the surface mounting wiring board can be easily reduced. That is, a surface mounting wiring board suitable for a configuration such as a memory module that is compact and maintains and exhibits high performance is provided.

【0023】請求項3の発明によれば、前記コンパクト
で高性能を保持・発揮するメモリモジュルなどの構成に
適する実装用配線基板を低コストで、かつ歩留まりよく
容易に提供できる。
According to the third aspect of the present invention, it is possible to easily provide a low-cost, high-yield mounting wiring board suitable for a configuration such as a memory module which retains and exhibits high performance with a compact size.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1の実施例に係る面実装用配線基板の要部構
成を示す断面図。
FIG. 1 is a cross-sectional view showing a main configuration of a surface mounting wiring board according to a first embodiment.

【図2】第2の実施例に係る面実装用配線基板の要部構
成を示す断面図。
FIG. 2 is a cross-sectional view illustrating a main configuration of a surface mounting wiring board according to a second embodiment.

【図3】第3の実施例に係る面実装用配線基板の要部構
成を示す断面図。
FIG. 3 is a sectional view showing a configuration of a main part of a wiring board for surface mounting according to a third embodiment.

【符号の説明】[Explanation of symbols]

1……放熱性板 2……層間接続用孔 3……エポキシ樹脂層 4……導体メッキ層 5,5a……面実装用配線基板 6……接着性エポキシ樹脂層 7……ガラス・エポキシ樹脂系配線板 DESCRIPTION OF SYMBOLS 1 ... Heat dissipation plate 2 ... Interlayer connection hole 3 ... Epoxy resin layer 4 ... Conductor plating layer 5, 5a ... Surface mounting wiring board 6 ... Adhesive epoxy resin layer 7 ... Glass epoxy resin System wiring board

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 厚さ方向に貫通し、かつ両主面側の配線
パターン間を接続する層間接続用孔を有する放熱性板
と、 前記層間接続用孔の内壁面を含む放熱性板表面を被覆す
る薄いエポキシ樹脂層と、 前記層間接続用孔内壁面のエポキシ樹脂層面上に形設さ
れ、かつ対応する配線パターン間を電気的に接続する導
体メッキ層と、を有する放熱性配線基板を少なくとも一
層備えたことを特徴とする面実装用配線基板。
1. A heat dissipation plate having an interlayer connection hole penetrating in a thickness direction and connecting between wiring patterns on both main surfaces, and a heat dissipation plate surface including an inner wall surface of the interlayer connection hole. At least a heat-dissipating wiring board having a thin epoxy resin layer to cover, and a conductive plating layer formed on the epoxy resin layer surface of the inner wall surface of the interlayer connection hole and electrically connecting corresponding wiring patterns. A wiring board for surface mounting, comprising a single layer.
【請求項2】 放熱性配線基板が外層側に配置されてい
ることを特徴とする請求項1記載の面実装用配線基板。
2. The surface mounting wiring board according to claim 1, wherein the heat-dissipating wiring board is arranged on an outer layer side.
【請求項3】 放熱性板にその厚さ方向に貫通する層間
接続用孔を穿設する工程と、 前記放熱性板の表面に厚さがほぼ一様なエポキシ樹脂層
を被覆形成する工程と、 前記層間接続用孔内を含むエポキシ樹脂層面上に、層間
接続部および配線パターンを形成する工程と、を有する
ことを特徴とする面実装用配線基板の製造方法。
3. A step of forming a hole for interlayer connection penetrating in a thickness direction of the heat radiation plate, and a step of forming a substantially uniform thickness epoxy resin layer on a surface of the heat radiation plate. Forming an interlayer connection portion and a wiring pattern on the surface of the epoxy resin layer including the inside of the hole for interlayer connection.
JP25056197A 1997-09-16 1997-09-16 Surface-mounting wiring substrate and manufacture thereof Withdrawn JPH1197806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25056197A JPH1197806A (en) 1997-09-16 1997-09-16 Surface-mounting wiring substrate and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25056197A JPH1197806A (en) 1997-09-16 1997-09-16 Surface-mounting wiring substrate and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH1197806A true JPH1197806A (en) 1999-04-09

Family

ID=17209736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25056197A Withdrawn JPH1197806A (en) 1997-09-16 1997-09-16 Surface-mounting wiring substrate and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH1197806A (en)

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Effective date: 20041207