JPH1178392A - Embossed decorative material - Google Patents

Embossed decorative material

Info

Publication number
JPH1178392A
JPH1178392A JP26296797A JP26296797A JPH1178392A JP H1178392 A JPH1178392 A JP H1178392A JP 26296797 A JP26296797 A JP 26296797A JP 26296797 A JP26296797 A JP 26296797A JP H1178392 A JPH1178392 A JP H1178392A
Authority
JP
Japan
Prior art keywords
point
embossed
decorative material
lattice
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP26296797A
Other languages
Japanese (ja)
Inventor
Masaru Okamoto
優 岡本
Yoshiaki Kakinuma
良明 柿沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP26296797A priority Critical patent/JPH1178392A/en
Publication of JPH1178392A publication Critical patent/JPH1178392A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve scratch resistance by forming an irregular pattern of a base material of an irregular surface having a continuously high and low change, and respectively disposing a highest point at the intersection of a two-dimensional lattice, a lowest point at a central point of a unit lattice for constituting the lattice and a saddle point at the mid-point of a side of the lattice, in the two-dimensional position coordinates of the surface. SOLUTION: A resist pattern P has a resist part 1 and a non-resist part 2. A center of the part 2 is part to become a highest point A of a irregular surface of the embossed decorative material, and arrayed at an intersection of a lattice. And, an intermediate point (intermediate point of one side of a unit lattice) of the adjacent parts 2 is part to become a saddle point B of the angularities. A resist photosensitive layer 4 is formed on a surface of an embossed cylinder 3. Part directly under the part 2 is corroded in a depth d1 with a solution such as ferric chloride or the like. And, further corroding in a depth d3, a bank indicated by B is started to be corroded. Corroded in a depth d4, the bank becomes a smooth hill state. Arriving at this state, maximum point A' in depth and maximum saddle point B' are alternately arranged to provide irregular pattern having irregularities of continuously high and low changes.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、表面が粗面化され
たエンボス化粧材に関する。
The present invention relates to an embossed decorative material having a roughened surface.

【0002】[0002]

【従来の技術】内装材、家具等の化粧材には質感、高級
感、意匠性を高めるためにプラスチック仕上げ面を粗面
化して艶を制御し、さらに耐スクラッチ性を付与した製
品が多用されている。従来の、ポリ塩化ビニルあるいは
ポリオレフィン系樹脂等の熱可塑性樹脂層を表面に有す
る化粧材が最終的に有する艶を制御するには、微細な凹
凸形状のあるエンボス版によって加熱、加圧して賦型す
ることが一般に行われている。図6は、サンドブラスト
法によって粗面化された従来のエンボス化粧材最表面の
断面形状の一態様を示す拡大図である。これまでのエン
ボス化粧材20の表面の凹凸形状は、図6に示すよう
に、いわゆる梨地と称する不規則な凹凸からなるもので
あって、これは、一般にサンドブラスト法によって、エ
ンボスシリンダー表面に投射材料を吹きつけて形成され
た凹凸形状が熱可塑性樹脂面にエンボスによって賦型さ
れてなるものである。図6に示すように、実線で示す凸
状部は、カバレージが100を越えないまでの間に形成
された一回目の投射によって形成された部分であり、点
線で示す凸状部はカバレージが100を越す時点で形成
された凸状部である。また、エンボスシリンダー表面に
マットクロムメッキを施して得られる凹凸形状によって
賦型される場合もある。さらに、化粧シート加工の最終
段階で、化粧シートの方にシリカ等の光拡散剤の微粒子
を含有するマットOPニスをコートすることによって艶
を制御することがある。さらに、このような粗面化され
たプラスチック加工面の耐スクラッチ性を高めるため
に、比較的硬質の保護膜を薄く設ける方法も行われてい
る。
2. Description of the Related Art For decorative materials such as interior materials and furniture, products which have a roughened plastic finish surface to control gloss and enhance scratch resistance in order to enhance texture, luxury and design are often used. ing. In order to control the final gloss of a conventional decorative material having a thermoplastic resin layer such as polyvinyl chloride or polyolefin resin on the surface, heat and pressure are applied by embossing plates with fine irregularities to form It is generally done. FIG. 6 is an enlarged view showing one embodiment of a cross-sectional shape of a conventional embossed decorative material outermost surface roughened by a sandblast method. As shown in FIG. 6, the uneven shape of the surface of the embossed decorative material 20 is made up of irregular unevenness called a so-called satin finish, which is generally formed by a sand blast method on the surface of the embossed cylinder. Is formed by embossing the surface of the thermoplastic resin by embossing. As shown in FIG. 6, a convex portion shown by a solid line is a portion formed by the first projection formed before the coverage does not exceed 100, and a convex portion shown by a dotted line has a coverage of 100. Is a convex portion formed at the point in time when it exceeds. In some cases, the embossed cylinder is shaped by a concavo-convex shape obtained by applying matte chrome plating to the surface. Further, in the final stage of the decorative sheet processing, the gloss may be controlled by coating the decorative sheet with a matte OP varnish containing fine particles of a light diffusing agent such as silica. Further, in order to enhance the scratch resistance of such a roughened plastic processed surface, a method of providing a relatively hard protective film thinly has been performed.

【0003】[0003]

【発明が解決しようとする課題】一般に、エンボス版に
よるプラスチック面への加熱圧着による凹凸形状の賦型
においては、一旦賦型された形状が若干元にもどる傾向
がみられ、その度合が、プラスチックの種類によって異
なる。従って、種々なプラスチックが使用されるエンボ
ス化粧材の最表面を所定の表面あらさに加工するには、
凹凸深度の異なるエンボス版を何本も用意しておき、そ
れらを使い分ける必要がある。一般に、従来のエンボス
版はサンドブラスト法により加工されているが、エンボ
ス版によって賦型されたエンボス化粧材の表面あらさR
a (中心線平均あらさ)は、同一の投射材料を使用して
エンボスシリンダーを加工する限りにおいて、カバレー
ジ100(投射材料が総ての面に投射された状態)以上
では、略一定の値に収斂する。従って仕上がり面の表面
あらさRa を変えようとするならば、異なる平均直径を
有する投射材料を何種も用意しておき、目的とする表面
あらさRa に応じて交換して使用しなければならないと
いう加工上の煩雑さがある。また、サンドブラストで形
成される版表面形状は、確立現象としてバラツキを有す
るため、エンボス版を再版する場合、再版されたエンボ
ス版によるエンボス化粧材最表面の質感が微妙に前回の
ものと異なるという再現性の問題がある。また、エンボ
ス化粧材の最表面の耐スクラッチ性は、凹凸形状によっ
て大きく影響される。サンドブラスト法によって形成さ
れる微小凹凸形状は、凸部が鋭く突出したり、ケバ立っ
た形状になり、磨耗の外力を受け易く、且つその外力に
よって破壊され易いので、保護層を設けることだけでは
解決にはならないという問題がある。さらに、サンドブ
ラスト法は、エンボス版作成工程からみて、異質の加工
方法であり、インライン化が難しく、完成までに時間が
かかりすぎ、納期が長期化するという問題がある。一方
において、エンボスシリンダー表面にマットクロムメッ
キを行う方法は自由度のある凹凸形状が形成出来ないと
いう問題がある。また、エンボス化粧材の方にOPニス
コートを施す方法は、光拡散剤微粒子の分散のムラによ
って艶の再現性が不安定となり易く、繊細な質感のある
仕上がりを得ることが難しいという問題がある。 本発
明は、前述の問題点に鑑みてなされたもので、耐スクラ
ッチ性があり、表面あらさRa が、所定の値に制御され
た艶の再現性が良好なエンボス化粧材の提供を目的とす
る。
In general, when shaping an uneven shape by heating and press-fitting a plastic surface with an embossing plate, there is a tendency that the shape once shaped tends to slightly return to the original shape. Depends on the type. Therefore, in order to process the outermost surface of the embossed decorative material using various plastics to a predetermined surface roughness,
It is necessary to prepare several embossed plates with different depths of unevenness and use them properly. Generally, a conventional embossing plate is processed by a sand blast method. However, the surface roughness R of the embossed decorative material formed by the embossing plate is used.
a (center line average roughness) converges to a substantially constant value over coverage 100 (state in which the projected material is projected on all surfaces) as long as the embossed cylinder is processed using the same projected material. I do. Therefore if you try to change the surface roughness R a of the finished surface, not different mean leave the projection material having a diameter prepared nothing or, if replaced and used according to the surface roughness R a of interest There is a complicated processing. In addition, since the surface shape of the plate formed by sandblasting has a variation as an established phenomenon, when reprinting the embossed plate, the texture of the outermost surface of the embossed decorative material due to the reprinted embossed plate is slightly different from the previous one There is a problem of sex. Further, the scratch resistance of the outermost surface of the embossed decorative material is greatly affected by the uneven shape. The fine irregularities formed by the sandblasting method have sharp protrusions or bulges, and are easily affected by external force of abrasion and easily broken by the external force. There is a problem that should not be. Furthermore, the sandblasting method is a heterogeneous processing method in view of the embossing plate making process, and has a problem that it is difficult to in-line, takes too much time to complete, and prolongs the delivery date. On the other hand, the method of performing matte chrome plating on the surface of the emboss cylinder has a problem in that it is not possible to form an uneven shape having a high degree of freedom. Further, the method of applying the OP varnish coat to the embossed decorative material has a problem that the reproducibility of gloss tends to be unstable due to uneven dispersion of the light diffusing agent particles, and it is difficult to obtain a delicate finish. The present invention has been made in view of the above-described problems, and has an object of providing an embossed decorative material having scratch resistance, surface roughness Ra , and good gloss reproducibility controlled to a predetermined value. I do.

【0004】[0004]

【課題を解決するための手段】前記課題を解決するため
に本発明では、基材の最表面が凹凸模様によって粗面化
される化粧材において、前記凹凸模様を、基材の最表面
内において2次元方向に交互に配列する凸状部と凹状部
とによる連続的な高低変化のある凹凸面から形成し、基
材最表面内での2次元位置座標において、前記凹凸面の
最高点Aを2次元格子の交点に、最低点Cを前記2次元
格子を構成する単位格子の中心点に、鞍点Bを前記単位
格子の辺の中心にそれぞれ位置させ、前記鞍点Bを、前
記最高点A及び鞍点Bを含む断面内においては高度の極
小点とし、且つ最低点C及び鞍点Bを含む断面内におい
ては高度の極大点とする。
According to the present invention, there is provided a decorative material in which the outermost surface of a base material is roughened by an uneven pattern. It is formed from a concavo-convex surface having a continuous height change by a convex portion and a concave portion alternately arranged in a two-dimensional direction, and in a two-dimensional position coordinate within the outermost surface of the base material, the highest point A of the concavo-convex surface is determined. At the intersection of the two-dimensional lattice, the lowest point C is located at the center point of the unit lattice constituting the two-dimensional lattice, and the saddle point B is located at the center of the side of the unit lattice, and the saddle point B is located at the highest point A and In the cross section including the saddle point B, the altitude is the minimum point, and in the cross section including the lowest point C and the saddle point B, the altitude is the maximum point.

【0005】[0005]

【発明の実施の形態】エンボス化粧材とは、基材表面に
エンボス加工等の方法で凹凸模様が施された物である。
尚、本発明で謂う「エンボス」の語は所謂狭義のエンボ
ス即ち凹凸模様を有する型で基材を押圧して賦型する方
法に限らず、型に液状物を流し込んで固化せしめて型か
ら脱型する方法等、各種の凹凸形成方法の総称として用
いる。本発明における凹凸模様は、後述の如き光拡散性
の微小凹凸である。基材の形状は、代表的にはシート或
いは板であるが、その他の形状でもよい。本発明による
エンボス化粧材の用途としては、壁、床、天井等の建築
物の内装材、扉、窓枠、手摺等の建具、家電製品の筐
体、箪笥等の家具、箱等の容器、車両等の内装材、船舶
内装材等であって、必要に応じて更に任意の素材が裏打
ちして使用される。また、本発明の凹凸模様(エンボス
パターンとも言う)による艶、質感の再現の対象となる
代表的なものは、天然木材板表面の木肌表面ではある
が、無論、本発明の凹凸模様は、木肌表面以外にも煉瓦
配列の目地溝や天面、花崗岩、大理石等の石目の表面、
布、皮絞等の表面艶、テクスチュアの再現にも適用が可
能である。
BEST MODE FOR CARRYING OUT THE INVENTION An embossed decorative material is a material in which the surface of a base material is provided with an embossed pattern by a method such as embossing.
The term "emboss" in the present invention is not limited to a method of embossing in a narrow sense, i.e., a method having a pattern having a concavo-convex pattern, in which a substrate is pressed and shaped, and a liquid material is poured into the mold, solidified, and removed from the mold. It is used as a general term for various methods of forming unevenness such as a molding method. The concavo-convex pattern in the present invention is a light-diffusing fine irregularity as described later. The shape of the substrate is typically a sheet or a plate, but may be another shape. Examples of applications of the embossed decorative material according to the present invention include walls, floors, interior materials of buildings such as ceilings, doors, window frames, fittings such as handrails, housings of home appliances, furniture such as chests, containers such as boxes, and the like. An interior material for a vehicle or the like, an interior material for a ship, or the like, and an optional material is further used as a backing if necessary. A typical object to be reproduced with gloss and texture by the uneven pattern (also referred to as an embossed pattern) of the present invention is a wooden surface of a natural wood board surface, but of course, the uneven pattern of the present invention is a wooden surface. In addition to the surface, the surface of the brick array joints and ceilings, granite, marble, etc.
It can also be applied to the reproduction of surface gloss and texture of cloth and squeezed leather.

【0006】本発明を図面によりさらに詳細に説明す
る。図1は、本発明によるエンボス化粧材の表面の一部
の拡大斜視図である。 本発明によるエンボス化粧材1
0の表面の凹凸模様は、基材最表面内において2次元方
向に交互に配列する凸状部と凹状部とによる連続的な高
低変化のある凹凸面によって形成されている。 図2
は、本発明によるエンボス化粧材表面の凸状部と凹状部
の配列状態の説明図である。図2に示すように、基材最
表面内の2次元位置座標において、本発明の凹凸模様を
特徴付ける点は、最高点A,最低点C,及び鞍点Bの3
種類である。(以下点A、点B、点Cとも呼称する)凹
凸面の高度の最大値に相当する最高点Aは、2次元格子
の交点に位置している。この格子は図2のような正方格
子のほか、長方形格子、斜方格子等でもよい。この格子
格子点Aを基準として最低点Cは、2次元格子を構成す
る単位格子の中心点(単位格子の対角線の交点)に位置
している。無論、この両者の位置関係を入れ換えてもよ
い。さらに鞍点Bが、単位格子の一辺の中間点に位置し
ている。この鞍点Bは、図2の2次元格子において、点
A,点Bを含む断面内で見たときは高度の極小点とな
る。(図3(b)参照)尚且つ、この鞍点Bは、点B
及び点Cを含む断面内で見たときは高度の極大点とな
る。各点の高度の大小(高低)関係は、 点A > 点B > 点C である。この最高点A、最低点C、鞍点B部Bのレベル
差であるが、鞍点Bと最高点Aのレベル差の方が、鞍点
Bと最低点Cのレベル差よりも大きくなるように凹凸面
が形成されている。また、前記格子間隔(格子定数)
は、後述する本発明によるエンボス化粧材の製造に使用
されるグラビア製版用スクリーンの線数によって定ま
り、そのスクリーン線数は、100〜400線/インチ
の範囲にあることが好ましい。すなわち、単位格子の一
辺の長さは、63〜250μmの範囲にあることが好ま
しい。
The present invention will be described in more detail with reference to the drawings. FIG. 1 is an enlarged perspective view of a part of the surface of the embossed decorative material according to the present invention. Embossed decorative material 1 according to the present invention
The uneven surface pattern of the surface 0 is formed by an uneven surface having a continuous change in height due to convex portions and concave portions alternately arranged in a two-dimensional direction in the outermost surface of the base material. FIG.
FIG. 4 is an explanatory view of an arrangement state of convex portions and concave portions on the surface of the embossed decorative material according to the present invention. As shown in FIG. 2, in the two-dimensional position coordinates in the outermost surface of the base material, the points characterizing the concavo-convex pattern of the present invention are the highest point A, the lowest point C, and the saddle point B.
Kind. The highest point A corresponding to the maximum value of the height of the uneven surface (hereinafter also referred to as point A, point B, and point C) is located at the intersection of the two-dimensional lattice. This grid may be a rectangular grid, an oblique grid, or the like in addition to the square grid as shown in FIG. With reference to the lattice point A, the lowest point C is located at the center point of the unit lattice constituting the two-dimensional lattice (the intersection of the diagonal lines of the unit lattice). Of course, the positional relationship between the two may be interchanged. Further, the saddle point B is located at an intermediate point on one side of the unit cell. The saddle point B is a minimum point of altitude when viewed in a cross section including the points A and B in the two-dimensional lattice of FIG. (See FIG. 3 (b).) The saddle point B is
When viewed in a cross section including the point C and the point C, the maximum point is obtained. The relation of the height (high / low) of the height of each point is as follows: point A> point B> point C. The level difference between the highest point A, the lowest point C and the saddle point B portion B is such that the level difference between the saddle point B and the highest point A is larger than the level difference between the saddle point B and the lowest point C. Are formed. In addition, the lattice spacing (lattice constant)
Is determined by the number of lines of a gravure plate making screen used in the production of an embossed decorative material according to the present invention described later, and the number of lines of the screen is preferably in the range of 100 to 400 lines / inch. That is, the length of one side of the unit cell is preferably in the range of 63 to 250 μm.

【0007】図3は、本発明によるエンボス化粧材の凹
凸模様形成原理の1例を示す説明図である。 図3
(a)は、エンボスシリンダー表面に形成されるレジス
トパターンPであって、レジスト部分1と非レジスト部
分2とから構成され、非レジスト部分2の中心はエンボ
ス化粧材の凹凸面の最高点Aになる部分であって、格子
の交点に位置するよう配列されている。また、隣接する
非レジスト部分2同志の中間点、すなわち単位格子の1
辺の中間点は、凹凸面の鞍点Bになる部分である。この
ような、レジストパターンPは、グラビア製版における
中間調の無地網によるレジストパターンと略同等であ
る。従って、このレジストパターンPのエンボスシリン
ダー面における形成は、従来のグラビア印刷版の製版方
法と同一方法で可能であり、表面が銅メッキ層からなる
エンボスシリンダー上に予めコーティングによって形成
されたレジスト感光層に対してフィルム上に形成された
中間調の無地網点を露光して焼き付けるか、あるいは、
このような網点画像データを一旦コンピュータに入力し
ておき、画像データで変調されたレーザービーム走査に
よる直接露光装置を用いてエンボスシリンダー面に直接
出力して焼き付けてもよい。
FIG. 3 is an explanatory view showing an example of the principle of forming an embossed pattern on an embossed decorative material according to the present invention. FIG.
(A) is a resist pattern P formed on the surface of the embossed cylinder, which is composed of a resist portion 1 and a non-resist portion 2, and the center of the non-resist portion 2 is located at the highest point A of the uneven surface of the embossed decorative material. And are arranged so as to be located at the intersections of the lattice. Also, the midpoint between adjacent non-resist portions 2, that is, 1 of the unit cell
The midpoint of the side is the portion that becomes the saddle point B on the uneven surface. Such a resist pattern P is substantially the same as a resist pattern formed by a plain halftone net in gravure printing. Therefore, the resist pattern P can be formed on the embossed cylinder surface by the same method as the conventional gravure printing plate making method, and the resist photosensitive layer is formed by coating the embossed cylinder having a copper plating layer on the surface in advance. Exposure and printing of halftone solid halftone dots formed on the film, or
Such halftone image data may be once input to a computer, and may be directly output to the emboss cylinder surface using a direct exposure device by laser beam scanning modulated with the image data and printed.

【0008】図3(b)は、レジストパターンPのx−
x’断面による本発明によるエンボス化粧材の凹凸模様
形成原理の説明図である。は、レジスト感光層4がエ
ンボスシリンダー3の表面に形成された状態図である。
この非レジスト部分2直下を塩化第2鉄等の溶液を用い
てサイドエッチングが激しく起こるような腐食条件で腐
食を行うと、で示すように深度d1だけ腐食され、こ
れは、通常のダイレクトグラビア印刷版における中間調
のセルに近いものが得られる。本発明ではさらに腐食を
進め、深度がd2のの状態を経て、深度が、最初のレ
ベルからd3に至るの状態になると、Bで示される土
手部が腐食され初めて、深度d4に至ると、に示すよ
うに土手部はなだらかな丘陵状態となる。この段階での
深度d4は、d1の凡そ3倍に達している。そして、こ
のの状態に至り版深の最大の点A’と鞍点B’(但し
化粧材の鞍点とは極大、極小が逆)とが交互に配列し
て、凹凸形状の高低が連続的に変化した凹凸模様を有す
るエンボス版Eが得られる。最後に、エンボス版Eの寿
命を長くするためのクロムメッキを施して仕上げる。図
3(b)に示すように、本発明のエンボス版Eの腐食深
度d4は、150線/インチのスクリーン線数による通
常のグラビア製版の場合の中間調の網点の約30μmに
対して凡そその3倍の90〜100μmにまで達するも
のである。
FIG. 3 (b) shows the x-
It is explanatory drawing of the uneven | corrugated pattern formation principle of the embossed decorative material by this invention by x 'cross section. FIG. 3 is a view showing a state in which the resist photosensitive layer 4 is formed on the surface of the emboss cylinder 3.
When the non-resist portion 2 is corroded under a corrosive condition in which side etching occurs violently using a solution of ferric chloride or the like under the non-resist portion 2, the corroded portion is corroded by a depth d1 as shown in FIG. What is close to a halftone cell in a plate is obtained. In the present invention, the corrosion is further promoted, and after the depth reaches the state of d2 from the initial level to the state of d3, the bank indicated by B is eroded for the first time, and reaches the depth d4. As shown, the bank becomes gentle hills. The depth d4 at this stage has reached about three times d1. In this state, the maximum point A 'of the plate depth and the saddle point B' (however, the maximum and the minimum are opposite to the saddle point of the decorative material) are alternately arranged, and the height of the uneven shape changes continuously. An embossing plate E having a roughened pattern is obtained. Lastly, chrome plating is applied to extend the life of the embossing plate E and finished. As shown in FIG. 3 (b), the corrosion depth d4 of the embossing plate E of the present invention is about 30 μm of halftone halftone dots in the case of ordinary gravure plate making with a screen ruling of 150 lines / inch. It reaches 90 to 100 μm which is three times as large as that.

【0009】図4も、同じく本発明によるエンボス化粧
材の凹凸模様形成原理の1例の説明図である。図4
(a)は、図3(a)と同様のエンボスシリンダー表面
に形成されるレジストパターンPであって、図4(b)
は、レジストパターンPのy−y’断面による本発明に
よるエンボス化粧材の凹凸模様形成原理の説明図であ
る。図4(a)に示すように配列する非レジスト部分2
を斜めに過るy−y’断面の形状変化は、x−x’断面
変化と同時に起こるものであるが、化粧材の凹凸形状の
最高点Aに相当する非レジスト部分2の中心点とその中
間に位置する化粧材の凹凸形状の最低点Cに相当する部
分の腐食による凹陥形状は、前述のx−x’断面とは異
なり、に示すように最低点Cに相当する点C’部分が
やや尖った形状となる。それは、点C’部分 の土手部
の腐食は、前述の鞍点Bに相当する点B’部分の土手部
よりも腐食(サイドエッチ)が遅れて入るためで、そう
なる理由は、点C’部分の方が点B’部分よりもサイド
エッチングが始まる非レジスト部のエッジから遠いため
である。従って図4(b)に示すエンボス版Eにおけ
るy−y’断面形状の最浅部の点C’部分の方が、x−
x’断面形状における鞍点Bに相当する点B’部分より
も高いレベルにある。この両者のレベル差は、腐食がさ
らに進行すれば同一レベルに収斂する。しかし、過度な
腐食は凹凸面の高低差を無くすばかりか、徒に厚い銅メ
ッキ層を必要とするので、図3、図4のの状態で止め
ることが望ましい。なお、図3、図4からも分かるよう
に、エンボス版Eの凹凸とエンボス化粧材10の凹凸と
は、凹と凸とが逆転し、エンボス版上の点A’,点B’
がエンボス化粧材上の点A,点Bに対応する。以上の腐
食によるエンボス版の製造方法は、毎回同一のレジスト
パターンPをエンボスシリンダー面に形成することがで
き、腐食条件さえ精度良く制御すれば、繰り返し製造し
ても再現性には問題がなく殆ど同一の凹凸形状を有する
エンボス版が得られる。また腐食条件、主として腐食時
間を制御することによって何種類かの所望の深度を有す
るエンボス版を容易に準備することができ、表面基材シ
ートのプラスチックの賦型性の違いによって使い分ける
ことが可能である。
FIG. 4 is also an explanatory view of one example of the principle of forming an embossed pattern on the embossed decorative material according to the present invention. FIG.
FIG. 4A shows a resist pattern P formed on the surface of an embossed cylinder similar to that shown in FIG.
FIG. 4 is an explanatory view of a principle of forming an embossed pattern of an embossed decorative material according to the present invention by using a yy ′ cross section of a resist pattern P. Non-resist portions 2 arranged as shown in FIG.
The shape change of the yy 'cross section obliquely passing through occurs simultaneously with the change of the xx' cross section, but the center point of the non-resist portion 2 corresponding to the highest point A of the uneven shape of the decorative material and its The concave shape due to corrosion of the portion corresponding to the lowest point C of the uneven shape of the decorative material located in the middle is different from the above-mentioned xx 'cross section, and the point C' portion corresponding to the lowest point C as shown in FIG. It has a slightly pointed shape. The reason is that the corrosion of the bank at the point C 'is delayed more than that of the bank at the point B' corresponding to the saddle point B. Is farther from the edge of the non-resist part where the side etching starts than the point B ′. Therefore, the point C ′ at the shallowest part of the yy ′ cross-sectional shape of the embossing plate E shown in FIG.
It is at a higher level than the point B ′ corresponding to the saddle point B in the x ′ cross-sectional shape. The difference between the two levels converges to the same level as the corrosion progresses further. However, excessive corrosion not only eliminates the difference in elevation of the uneven surface, but also necessitates a thick copper plating layer. Therefore, it is desirable to stop the corrosion in the state shown in FIGS. As can be seen from FIGS. 3 and 4, the concavity and convexity of the embossed plate E and the concavity and convexity of the embossed decorative material 10 are reversed, and points A ′ and B ′ on the embossed plate are reversed.
Correspond to points A and B on the embossed decorative material. According to the method for producing an embossing plate by the above-described corrosion, the same resist pattern P can be formed on the surface of the embossed cylinder every time. An embossing plate having the same concavo-convex shape is obtained. Also, by controlling the corrosion conditions, mainly the corrosion time, it is possible to easily prepare an embossing plate having several kinds of desired depths, and it is possible to use differently according to the difference in the moldability of the plastic of the surface base sheet. is there.

【0010】最後に、図3(b)、図4(b)に示
すように、以上のエンボス版Eを用いて、エンボス化粧
材を構成する2層積層体の基材最表面層をなす熱可塑性
樹脂シートからなる基材5にエンボスによって賦型する
と同時に、あるいはオフラインで着色シート6をラミネ
ーし、最後に透明な保護層7を全面に薄くコートして耐
スクラッチ性を高めることができる。また必要に応じて
使用目的に応じた裏打ち材(図示せず)を貼り合わせる
ようにしてもよい。例えば、エンボス化粧材10がドア
ーの場合には、ハニカム構造を有するドアの芯材等を強
力接着材で貼り合わせればよい。
Finally, as shown in FIGS. 3 (b) and 4 (b), using the above-described embossing plate E, the heat forming the outermost surface layer of the base material of the two-layer laminate constituting the embossed decorative material. At the same time as embossing the base material 5 made of a plastic resin sheet by embossing, or laminating the colored sheet 6 off-line, and finally, a transparent protective layer 7 is thinly coated on the entire surface to improve the scratch resistance. If necessary, a backing material (not shown) according to the purpose of use may be attached. For example, when the embossed decorative material 10 is a door, a core material of a door having a honeycomb structure may be bonded with a strong adhesive.

【0011】なお、以上の例では、エンボス版を用い
て、加熱軟化させた熱可塑性樹脂表面に押圧して賦型す
る狭義のエンボス加工の例を記した。しかし、本発明に
よるエンボス化粧材の製法は、これに限定されるもので
はなく、その他の方法で製造することもできる。例え
ば、上記方法で製版したエンボス版の表面に不飽和アク
リレートオリゴマー等の未硬化の液状組成物を塗布して
凹凸模様の少なくとも凹部内に液状組成物を充填し、次
いで該液状組成物に樹脂等のシートを重ねて密着させた
状態でシート側から紫外線又は電子線を照射して該樹脂
層を硬化(固化)せしめ、該シートとその表面に接着
し、且つエンボス版の凹凸模様が賦型された硬化物層と
をエンボス版から離型する方法(特開平2−13117
5号公報等に開示)を用いることもできる。また、本発
明において凹凸模様を賦型する基材は、ポリエチレン、
ポリプロピレン、オレフィン系熱可塑性エラストマー等
のポリオレフィン系樹脂、ポリ塩化ビニル、アクリル樹
脂、ポリエステル樹脂等の熱可塑性樹脂、メラミン樹脂
等の熱硬化性樹脂、不飽和アクリレート等からなる紫外
線、又は、電子線硬化性樹脂の硬化物等の材料が用いら
れ、単層でも2層以上の積層体でもよい。必要に応じ、
表面から目視可能な位置に、木目柄、石目柄等の絵柄層
を設けてもよい。
In the above example, an example of embossing in a narrow sense is described in which an embossing plate is used to press and shape a heat-softened thermoplastic resin surface. However, the method for producing the embossed decorative material according to the present invention is not limited to this, and it can be produced by other methods. For example, an uncured liquid composition such as an unsaturated acrylate oligomer is applied to the surface of an embossing plate made by the above method, and the liquid composition is filled into at least the concave portions of the concavo-convex pattern. The resin layer is cured (solidified) by irradiating ultraviolet rays or an electron beam from the sheet side in a state where the sheets are stacked and adhered to each other, and the resin layer is adhered to the sheet and the surface thereof, and the concavo-convex pattern of the emboss plate is formed. Of releasing the cured product layer from the embossing plate (Japanese Patent Laid-Open No. 2-1117)
No. 5 publication) can also be used. Further, in the present invention, the substrate for forming the uneven pattern is polyethylene,
Polyolefin resins such as polypropylene and olefin-based thermoplastic elastomers, thermoplastic resins such as polyvinyl chloride, acrylic resin and polyester resin, thermosetting resins such as melamine resin, and ultraviolet rays made of unsaturated acrylate or the like, or electron beam curing A material such as a cured resin is used, and it may be a single layer or a laminate of two or more layers. As needed,
A pattern layer such as a grain pattern or a stone pattern may be provided at a position visible from the surface.

【0012】図5は,耐スクラッチ性の比較説明図であ
る。図5(a)は本発明によるエンボス化粧材10のx
−x’、y−y’断面形状であり、図5(b)は、従来
のサンドブラストによる表面加工の場合の断面形状の一
態様を示すものである。なお、両図において、保護層7
は図面を分かり易くするために省略されている。この図
5(a)と図5(b)を比較すると明らかなように、硬
いもので表面が擦られて生じる傷痕8は、従来のサンド
ブラストによるエンボス化粧材20の場合には、かなり
広い面積にわたっているのに対して、本発明によるエン
ボス化粧材10の場合は狭い範囲におさまる。それは、
本発明によるエンボス化粧材10の場合は、比較的大き
めなピッチで連続的に高低変化する丸みを持った凹凸形
状にあって、最高部Aのみが擦れ、他の部分は影響を受
け難いからである。また、表面がこのようななだらかな
丘陵状態にあっては、表面が汚染しにくく、たとえ汚染
してもクリーンな元の状態に戻すことが容易である。
FIG. 5 is a comparative explanatory diagram of scratch resistance. FIG. 5A shows x of the embossed decorative material 10 according to the present invention.
FIG. 5B shows one mode of the cross-sectional shape in the case of the conventional surface processing by sandblasting. In both figures, the protective layer 7
Have been omitted for clarity. As apparent from a comparison between FIG. 5A and FIG. 5B, the scar 8 caused by the rubbing of the surface with a hard material has a relatively large area in the case of the embossed decorative material 20 by the conventional sandblast. On the other hand, in the case of the embossed decorative material 10 according to the present invention, it falls within a narrow range. that is,
In the case of the embossed decorative material 10 according to the present invention, the embossed decorative material 10 has a rounded uneven shape that continuously changes in height at a relatively large pitch, and only the highest portion A is rubbed, and the other portions are hardly affected. is there. Further, when the surface is in such a gentle hill state, the surface is less likely to be contaminated, and even if it is contaminated, it is easy to return to the original clean state.

【0013】[0013]

【発明の効果】本発明によれば、エンボス化粧材の最表
面の基材の凹凸模様を、前記の如く、交互に配列する凸
状部と凹状部とによって連続的な高低変化のある凹凸面
で形成し、該凹凸面の2次元位置座標において、最高点
Aを2次元格子の交点に、最低点Cを前記格子を構成す
る単位格子の中心点に、又鞍点Bを前記格子の辺の中点
にそれぞれ位置させることによって、艶のムラ、バラツ
キが少なく、耐スクラッチ性、耐汚染性において優れ、
また同一のレジストパターンPから腐食法によって凹凸
面を形成することにより、エンボス版の製造が安定し
て、再版における再現性に優れたエンボス化粧材を提供
することができる。
According to the present invention, the concave and convex pattern of the outermost substrate of the embossed decorative material is continuously formed by the convex and concave portions arranged alternately as described above. In the two-dimensional position coordinates of the uneven surface, the highest point A is at the intersection of the two-dimensional grid, the lowest point C is at the center point of the unit grid constituting the grid, and the saddle point B is at the side of the grid. By positioning each at the midpoint, there is little unevenness and unevenness of gloss, and excellent in scratch resistance and stain resistance,
Further, by forming an uneven surface from the same resist pattern P by a corrosion method, it is possible to stably manufacture an embossing plate and to provide an embossed decorative material having excellent reproducibility in a reprinting plate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明によるエンボス化粧の表面の一部の拡大
斜視図
FIG. 1 is an enlarged perspective view of a part of the surface of an embossed makeup according to the present invention.

【図2】本発明によるエンボス化粧材表面の凸状部と凹
状部の配列状態の説明図
FIG. 2 is an explanatory view of an arrangement state of convex portions and concave portions on the surface of an embossed decorative material according to the present invention.

【図3】本発明によるエンボス化粧材の凹凸模様形成原
理の1例を示す説明図
FIG. 3 is an explanatory view showing an example of a principle of forming an uneven pattern of an embossed decorative material according to the present invention.

【図4】本発明によるエンボス化粧材の凹凸模様形成原
理の1例を示す説明図
FIG. 4 is an explanatory view showing an example of a principle of forming an uneven pattern of an embossed decorative material according to the present invention.

【図5】耐スクラッチ性の比較説明図FIG. 5 is a comparative explanatory diagram of scratch resistance.

【符号の説明】 1 レジスト部分 2 非レジスト部分 3 エンボスシリンダー 4 レジスト層 5 透明熱可塑性樹脂シートからなる基材 6 着色シートからなる基材 7 保護層 8 傷痕 10 本発明によるエンボス化粧材 20 従来のエンボス化粧材 A 最高点 B 鞍点 C 最低点 E エンボス版DESCRIPTION OF SYMBOLS 1 Resist part 2 Non-resist part 3 Emboss cylinder 4 Resist layer 5 Substrate made of transparent thermoplastic resin sheet 6 Substrate made of colored sheet 7 Protective layer 8 Scar 10 Embossed decorative material according to the present invention 20 Conventional Embossed cosmetic material A Highest point B Saddle point C Lowest point E Embossed version

─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成9年11月18日[Submission date] November 18, 1997

【手続補正1】[Procedure amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】図面の簡単な説明[Correction target item name] Brief description of drawings

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明によるエンボス化粧の表面の一部の拡大
斜視図
FIG. 1 is an enlarged perspective view of a part of the surface of an embossed makeup according to the present invention.

【図2】本発明によるエンボス化粧材表面の凸状部と凹
状部の配列状態の説明図
FIG. 2 is an explanatory view of an arrangement state of convex portions and concave portions on the surface of an embossed decorative material according to the present invention.

【図3】本発明によるエンボス化粧材の凹凸模様形成原
理の1例を示す説明図
FIG. 3 is an explanatory view showing an example of a principle of forming an uneven pattern of an embossed decorative material according to the present invention.

【図4】本発明によるエンボス化粧材の凹凸模様形成原
理の1例を示す説明図
FIG. 4 is an explanatory view showing an example of a principle of forming an uneven pattern of an embossed decorative material according to the present invention.

【図5】耐スクラッチ性の比較説明図FIG. 5 is a comparative explanatory diagram of scratch resistance.

【図6】サンドブラスト法によって粗面化された従来の
エンボス化粧材最表面の断面形状の一態様を示す拡大
図。
FIG. 6 is an enlarged view showing one embodiment of a cross-sectional shape of a conventional embossed decorative material outermost surface roughened by a sandblast method.

【符号の説明】 1 レジスト部分 2 非レジスト部分 3 エンボスシリンダー 4 レジスト層 5 透明熱可塑性樹脂シートからなる基材 6 着色シートからなる基材 7 保護層 8 傷痕 10 本発明によるエンボス化粧材 20 従来のエンボス化粧材 A 最高点 B 鞍点 C 最低点 E エンボス版DESCRIPTION OF SYMBOLS 1 Resist part 2 Non-resist part 3 Emboss cylinder 4 Resist layer 5 Substrate made of transparent thermoplastic resin sheet 6 Substrate made of colored sheet 7 Protective layer 8 Scar 10 Embossed decorative material according to the present invention 20 Conventional Embossed cosmetic material A Highest point B Saddle point C Lowest point E Embossed version

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基材の最表面が凹凸模様によって粗面化
される化粧材において、前記凹凸模様が、基材の最表面
内において2次元方向に交互に配列する凸状部と凹状部
とによる連続的な高低変化のある凹凸面からなり、基材
最表面内での2次元位置座標において、前記凹凸面の最
高点Aが2次元格子の交点に、最低点Cが前記2次元格
子を構成する単位格子の中心点に、鞍点Bが前記単位格
子の辺の中心にそれぞれ位置してなり、前記鞍点Bは、
前記最高点A及び鞍点Bを含む断面内においては高度の
極小点となり、且つ最低点C及び鞍点Bを含む断面内に
おいては高度の極大点となることを特徴とするエンボス
化粧材。
1. A decorative material in which the outermost surface of a base material is roughened by an uneven pattern, wherein the uneven pattern has a convex portion and a concave portion alternately arranged in a two-dimensional direction in the outermost surface of the base material. In the two-dimensional position coordinates within the outermost surface of the base material, the highest point A of the uneven surface is located at the intersection of the two-dimensional grid, and the lowest point C is located at the intersection of the two-dimensional grid. The saddle point B is located at the center point of the unit cell to be configured, at the center of the side of the unit lattice, and the saddle point B is
An embossed decorative material characterized in that it is an extremely minimal point in a cross section including the highest point A and the saddle point B, and is an extremely maximal point in a cross section including the lowest point C and the saddle point B.
JP26296797A 1997-09-11 1997-09-11 Embossed decorative material Withdrawn JPH1178392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26296797A JPH1178392A (en) 1997-09-11 1997-09-11 Embossed decorative material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26296797A JPH1178392A (en) 1997-09-11 1997-09-11 Embossed decorative material

Publications (1)

Publication Number Publication Date
JPH1178392A true JPH1178392A (en) 1999-03-23

Family

ID=17383043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26296797A Withdrawn JPH1178392A (en) 1997-09-11 1997-09-11 Embossed decorative material

Country Status (1)

Country Link
JP (1) JPH1178392A (en)

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