JPH1176904A - Rotary type substrate treating device - Google Patents

Rotary type substrate treating device

Info

Publication number
JPH1176904A
JPH1176904A JP23489697A JP23489697A JPH1176904A JP H1176904 A JPH1176904 A JP H1176904A JP 23489697 A JP23489697 A JP 23489697A JP 23489697 A JP23489697 A JP 23489697A JP H1176904 A JPH1176904 A JP H1176904A
Authority
JP
Japan
Prior art keywords
rotating shaft
suction
motor
substrate
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23489697A
Other languages
Japanese (ja)
Other versions
JP3664856B2 (en
Inventor
Akihiko Morita
彰彦 森田
Masami Otani
正美 大谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP23489697A priority Critical patent/JP3664856B2/en
Publication of JPH1176904A publication Critical patent/JPH1176904A/en
Application granted granted Critical
Publication of JP3664856B2 publication Critical patent/JP3664856B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a rotary type substrate treating device which is excellent in the maintenance characteristic of a juncture between the suction path and air suction pipeline in the revolving shaft of a motor. SOLUTION: A substrate holding part is mounted at the front end of the revolving shaft 2 extending in a perpendicular direction. The suction port of the substrate holding part and a suction path 3 penetrating the revolving shaft 2 are communicated. A connecting member 14 is mounted at the bottom end 2a of the revolving shaft 2. The suction path 3 of the revolving shaft 2 is connected via a communicating space 22 in the connecting member 14 to the air suction pipeline 25. A magnetic fluid seal 17 is held at the seal holding member 15 of the connecting member 14. This magnetic fluid seal 17 is inserted to the circumference of the revolving shaft 2 to hermetically seal the communicating space 22 on the outlet side of the suction path 3.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、基板を吸引保持し
て回転させながら基板に対して所定の処理を行う回転式
基板処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate processing apparatus for performing a predetermined processing on a substrate while rotating the substrate while sucking and holding the substrate.

【0002】[0002]

【従来の技術】半導体ウエハ、液晶表示装置用ガラス基
板、フォトマスク用ガラス基板、光ディスク用ガラス基
板等の基板にフォトレジスト液等の塗布液を塗布するた
めに回転式基板処理装置が用いられている。
2. Description of the Related Art A rotary substrate processing apparatus is used to apply a coating liquid such as a photoresist liquid to a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a glass substrate for an optical disk. I have.

【0003】図3は従来の回転式基板処理装置の一例を
示す概略断面図である。図3において、回転式基板処理
装置は、基板Wを水平姿勢で保持する基板保持部4を備
える。基板保持部4はモータ1の回転軸2の先端に取り
付けられ、鉛直軸の回りで回転駆動される。
FIG. 3 is a schematic sectional view showing an example of a conventional rotary type substrate processing apparatus. 3, the rotary substrate processing apparatus includes a substrate holding unit 4 that holds a substrate W in a horizontal posture. The substrate holding unit 4 is attached to the tip of the rotating shaft 2 of the motor 1 and is driven to rotate around a vertical axis.

【0004】基板保持部4に保持された基板Wの周囲に
は、処理液の飛散防止用のカップ6が配置されている。
Around the substrate W held by the substrate holding section 4, a cup 6 for preventing the processing liquid from scattering is arranged.

【0005】モータ1は回転軸2が鉛直方向に向くよう
にモータ保持部材7によりベース部材8に固定されてい
る。また、モータ保持部材7は、モータ1の上面を保持
する保持フランジ7aと、保持フランジ7aをベース部
材8に固定する固定部材7bとから構成されている。
[0005] The motor 1 is fixed to a base member 8 by a motor holding member 7 so that the rotating shaft 2 is oriented vertically. The motor holding member 7 includes a holding flange 7 a for holding the upper surface of the motor 1 and a fixing member 7 b for fixing the holding flange 7 a to the base member 8.

【0006】基板保持部4は基板Wの裏面を吸引して保
持する真空チャックから構成される。基板保持部4の中
央には吸引口5が形成されており、吸引口5はモータ1
の回転軸2内に形成された吸引路3に連通している。回
転軸2の吸引路3は連結部材30を介して吸気管路33
に接続されている。さらに、吸気管路33は工場内の真
空吸引用力設備に接続されている。
[0006] The substrate holding section 4 comprises a vacuum chuck for sucking and holding the back surface of the substrate W. A suction port 5 is formed at the center of the substrate holding unit 4, and the suction port 5 is connected to the motor 1.
Is connected to a suction path 3 formed in the rotary shaft 2. The suction passage 3 of the rotating shaft 2 is connected to an intake pipe 33 via a connecting member 30.
It is connected to the. Further, the intake pipe 33 is connected to a vacuum suction facility in the factory.

【0007】連結部材30は回転軸2の吸引路3の端部
と吸気管路33の端部とを連通させる環状の連通空間3
2を有し、この連通空間32の上下両側にオイルシール
からなる接触式のシール部材31が配置されている。こ
のシール部材31により連結部材30の連通空間32の
気密が保持される。
The connecting member 30 is an annular communication space 3 for connecting the end of the suction passage 3 of the rotary shaft 2 to the end of the intake pipe 33.
The contact-type seal member 31 composed of an oil seal is disposed on both upper and lower sides of the communication space 32. The sealing member 31 keeps the communication space 32 of the connecting member 30 airtight.

【0008】上記の吸引口5、回転軸2の吸引路3およ
び吸気管路33を通して吸気することにより、基板Wの
裏面が基板保持部4の上面に吸引保持される。
By sucking air through the suction port 5, the suction passage 3 of the rotating shaft 2 and the suction pipe 33, the back surface of the substrate W is suction-held on the upper surface of the substrate holding unit 4.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、上記従
来の回転式基板処理装置では、接触式のシール部材31
を用いて連結部材30の連通空間32の気密を保持して
いる。モータ1の回転軸2は毎分数百〜数千回の高速回
転動作を行う。このため、接触式のシール部材31で
は、高速回転する回転軸2に接触する部分の磨耗が激し
い。
However, in the above-mentioned conventional rotary type substrate processing apparatus, the contact type sealing member 31 is used.
Is used to maintain the airtightness of the communication space 32 of the connecting member 30. The rotating shaft 2 of the motor 1 performs high speed rotation operation several hundred to several thousand times per minute. For this reason, in the contact-type seal member 31, the portion in contact with the rotating shaft 2 rotating at a high speed is greatly worn.

【0010】磨耗によってシール部材31の気密性が低
下すると、基板保持部4による基板Wの保持力が低下す
る。特に、近年では基板Wが大型化しかつ重量化してい
る。このため、基板Wの保持力の低下は基板保持部4か
らの基板Wの離脱事故を招き易くなる。大型化した基板
は高価であり、基板Wの離脱事故が生ずると、その損害
も大きくなる。このため、シール部材31を定期的に交
換して気密性を維持する必要があり、保守作業が煩雑で
あった。
When the airtightness of the seal member 31 decreases due to wear, the holding force of the substrate W by the substrate holding portion 4 decreases. In particular, in recent years, the substrate W has become larger and heavier. For this reason, a decrease in the holding power of the substrate W tends to cause an accident of detachment of the substrate W from the substrate holding unit 4. A large-sized substrate is expensive, and when an accident of detaching the substrate W occurs, the damage is increased. For this reason, it is necessary to periodically exchange the seal member 31 to maintain the airtightness, and the maintenance work is complicated.

【0011】また、接触式のシール部材31では、回転
軸2との接触部分からパーティクルが発生しやすい。発
生したパーティクルは雰囲気中を浮遊し、基板Wの表面
に付着して基板Wを汚染するおそれがある。このため、
図3に示すように、ベース部材8上に排気装置10を設
け、排気口10aから吸引することによって浮遊するパ
ーティクルを除去する必要があり、回転式基板処理装置
の構造が複雑化するという不都合があった。
In the contact-type seal member 31, particles are easily generated from the contact portion with the rotating shaft 2. The generated particles may float in the atmosphere, adhere to the surface of the substrate W, and contaminate the substrate W. For this reason,
As shown in FIG. 3, it is necessary to provide the exhaust device 10 on the base member 8 and remove the floating particles by suctioning from the exhaust port 10 a, which disadvantageously complicates the structure of the rotary substrate processing apparatus. there were.

【0012】本発明の目的は、モータの回転軸内の吸引
路と吸気管路との接続部の保守性に優れた回転式基板処
理装置を提供することである。
An object of the present invention is to provide a rotary substrate processing apparatus which is excellent in maintainability of a connection portion between a suction path and a suction pipe in a rotary shaft of a motor.

【0013】[0013]

【課題を解決するための手段および発明の効果】第1の
発明に係る回転式基板処理装置は、鉛直方向に配設さ
れ、上端から下端にまで貫通する吸引路を有する回転軸
を備えたモータと、回転軸の上端に取り付けられ、吸引
路に連通する吸引口を有し、基板を吸引保持する基板保
持部と、回転軸の下端部の下方に配設された吸気口を有
し、吸引路の下端から空気を外部に導く吸気管路と、吸
気管路の吸気口が連結されるとともに回転軸の下端部が
遊嵌された連通空間を有する連結部材と、連結部材の連
通空間を形成する内周面と回転軸の下端部の外周面との
隙間に設けられた磁性流体シールとを備えたものであ
る。
Means for Solving the Problems and Effects of the Invention A rotary substrate processing apparatus according to a first aspect of the present invention has a motor provided with a rotary shaft having a suction path vertically disposed and penetrating from an upper end to a lower end. A suction port attached to the upper end of the rotating shaft, having a suction port communicating with the suction path, and having a substrate holding portion for sucking and holding the substrate; and a suction port disposed below the lower end portion of the rotating shaft. An intake pipe that guides air to the outside from the lower end of the passage, a connecting member having a communication space in which an intake port of the intake pipe is connected and a lower end of the rotating shaft is loosely fitted, and a communication space of the connecting member is formed And a magnetic fluid seal provided in a gap between the inner peripheral surface and the outer peripheral surface at the lower end of the rotating shaft.

【0014】第1の発明に係る回転式基板処理装置にお
いては、高速回転する回転軸の吸引路と吸気管路とが連
結部材により連結され、吸引路と吸気管路の吸気口との
間の気密が磁性流体シールにより保持される。磁性流体
シールは非接触式のシール部材であり、回転軸との接触
により磨耗する部分がない。このため、定期的にシール
部材を交換する必要がなくなり、回転式基板処理装置の
保守性が向上する。また、磁性流体シールは回転軸との
接触によって発塵するおそれがない。これにより、磁性
流体シールからの発塵物質により基板が汚染されること
が防止される。
In the rotary substrate processing apparatus according to the first aspect of the present invention, the suction path of the rotating shaft rotating at high speed and the suction pipe are connected by a connecting member, and the connection between the suction path and the suction port of the suction pipe is established. Hermeticity is maintained by the magnetic fluid seal. The magnetic fluid seal is a non-contact type seal member, and there is no portion worn by contact with the rotating shaft. Therefore, it is not necessary to periodically replace the seal member, and the maintainability of the rotary substrate processing apparatus is improved. In addition, the magnetic fluid seal does not generate dust due to contact with the rotating shaft. As a result, the substrate is prevented from being contaminated by dust generated from the magnetic fluid seal.

【0015】さらに、回転軸の下端部に連結部材を配置
したことにより、モータの上端面から基板保持部に至る
回転軸周辺の構成が簡素化される。
Further, by arranging the connecting member at the lower end of the rotating shaft, the configuration around the rotating shaft from the upper end surface of the motor to the substrate holding portion is simplified.

【0016】第2の発明に係る回転式基板処理装置は、
第1の発明に係る回転式基板処理装置の構成において、
雰囲気を上下に仕切る平板状のベース部材をさらに備
え、モータは、ベース部材より下方側の雰囲気中に回転
軸の下端部が位置するようにベース部材に固定されたも
のである。
A rotary substrate processing apparatus according to a second aspect of the present invention
In the configuration of the rotary substrate processing apparatus according to the first invention,
The motor further includes a flat base member that partitions the atmosphere up and down, and the motor is fixed to the base member such that the lower end of the rotating shaft is located in the atmosphere below the base member.

【0017】この場合、回転式基板処理装置内の雰囲気
がベース部材によって上下方向に仕切られ、ベース部材
の上方側の雰囲気中には基板保持部が配置され、ベース
部材より下方側の雰囲気中には連結部材および磁性流体
シールが配置される。そのため、基板保持部周辺に浮遊
する溶剤が磁性流体シールの磁性流体に作用して磁性流
体シールが劣化することが防止される。
In this case, the atmosphere in the rotary substrate processing apparatus is vertically divided by the base member, and the substrate holding portion is disposed in the atmosphere above the base member, and the atmosphere is located below the base member. Is provided with a connecting member and a magnetic fluid seal. Therefore, it is possible to prevent the solvent floating around the substrate holding portion from acting on the magnetic fluid of the magnetic fluid seal and deteriorating the magnetic fluid seal.

【0018】第3の発明に係る回転式基板処理装置は、
第1または第2の発明に係る回転式基板処理装置の構成
において、連結部材は、回転軸の下端部の周囲を取り囲
みかつ磁性流体シールを保持する環状の凹部を有し、モ
ータの下端面に取り付けられるシール保持部材と、シー
ル保持部材の下端に連結され、吸気管路の吸気口と回転
軸の吸引路とを連通させる空間を有する接続部材とを含
むものである。
According to a third aspect of the present invention, there is provided a rotary substrate processing apparatus.
In the configuration of the rotary substrate processing apparatus according to the first or second invention, the connecting member has an annular concave portion surrounding the lower end of the rotary shaft and holding a magnetic fluid seal, and is provided on the lower end surface of the motor. It includes a seal holding member to be attached, and a connecting member connected to a lower end of the seal holding member and having a space for communicating the suction port of the intake pipe with the suction path of the rotating shaft.

【0019】この場合、磁性流体シールを保持したシー
ル保持部材をモータの下端面に取り付け、磁性流体シー
ルの取り付け状態を調整した後、シール保持部材に接続
部材を取り付けることによってモータの回転軸の吸引路
と吸気管路の吸気口とが連通される。これにより、磁性
流体シールの取り付け位置の調整を容易に行うことがで
きる。
In this case, the seal holding member holding the magnetic fluid seal is attached to the lower end surface of the motor, and after the state of attachment of the magnetic fluid seal is adjusted, the connection member is attached to the seal holding member to thereby attract the rotating shaft of the motor. The road and the intake port of the intake pipe are communicated. This makes it possible to easily adjust the mounting position of the magnetic fluid seal.

【0020】[0020]

【発明の実施の形態】図1は本発明の実施例による回転
式基板処理装置の概略断面図であり、図2は図1の回転
式基板処理装置の部分拡大断面図である。
1 is a schematic sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention, and FIG. 2 is a partially enlarged sectional view of the rotary substrate processing apparatus of FIG.

【0021】図1および図2において、回転式基板処理
装置は、基板Wを水平姿勢で保持する基板保持部4を備
える。基板保持部4は、モータ1の回転軸2の先端に取
り付けられており、鉛直軸の周りで回転駆動される。基
板保持部4に保持された基板Wの周囲には、処理液の飛
散防止用のカップ6が配置されている。
1 and 2, the rotary substrate processing apparatus includes a substrate holding section 4 for holding a substrate W in a horizontal position. The substrate holding unit 4 is attached to the tip of the rotating shaft 2 of the motor 1 and is driven to rotate around a vertical axis. Around the substrate W held by the substrate holding unit 4, a cup 6 for preventing the treatment liquid from scattering is arranged.

【0022】モータ1はモータ保持部材7によりベース
部材8に固定されている。また、モータ保持部材7はモ
ータ1の上面を保持する保持フランジ7aと、モータ1
の本体部外周を取り囲み、かつ保持フランジ7aをベー
ス部材8に固定する円筒状の固定部材7bとから構成さ
れる。ベース部材8は、回転式基板処理装置内の雰囲気
を上下に隔離するような平板状に形成されている。そし
て、ベース部材8およびモータ保持部材7により、モー
タ1の本体部はベース部材8より上の雰囲気と遮断され
ている。
The motor 1 is fixed to a base member 8 by a motor holding member 7. The motor holding member 7 includes a holding flange 7 a for holding the upper surface of the motor 1 and a motor 1.
And a cylindrical fixing member 7b for surrounding the outer periphery of the main body and fixing the holding flange 7a to the base member 8. The base member 8 is formed in a flat plate shape that vertically separates the atmosphere in the rotary substrate processing apparatus. The main body of the motor 1 is isolated from the atmosphere above the base member 8 by the base member 8 and the motor holding member 7.

【0023】上記の基板保持部4は基板Wの裏面を吸引
して保持する真空チャックからなる。この基板保持部4
からの真空吸引経路は、基板保持部4の吸引口5、モー
タ1の回転軸2を貫通する吸引路3および吸気管路25
から構成され、工場に設置された真空吸引用力設備(図
示せず)に接続される。また、回転軸2の吸引路3と吸
気管路25とは連結部材14を介して接続されている。
The substrate holding section 4 comprises a vacuum chuck for sucking and holding the back surface of the substrate W. This substrate holding unit 4
The vacuum suction path from the suction port 5 of the substrate holding unit 4, the suction path 3 penetrating the rotary shaft 2 of the motor 1, and the suction pipe 25
And is connected to a vacuum suction facility (not shown) installed in the factory. Further, the suction passage 3 of the rotating shaft 2 and the intake pipe 25 are connected via the connecting member 14.

【0024】図2に示すように、連結部材14は、モー
タ1の下端面に接続されるシール保持部材15と、シー
ル保持部材15に接続される接続部材21とから構成さ
れる。
As shown in FIG. 2, the connecting member 14 includes a seal holding member 15 connected to the lower end surface of the motor 1 and a connecting member 21 connected to the seal holding member 15.

【0025】シール保持部材15は、円筒状の凹部15
aにモータ1の回転軸2の下端部2aが挿入される磁性
流体シール17を保持し、ねじ16によってモータ1の
下端面に固定されている。磁性流体シール17は、回転
軸2の下端部2aの外径よりも僅かに大きい内径を有す
る環状の複数の磁極片18と、磁極片18の間に挿入さ
れた環状の複数の永久磁石19と、回転軸2の下端部2
aの表面と磁極片18との隙間に注入された磁性流体2
0とから構成される。磁性流体20は、強磁性体の固体
微粒子を液体中に高密度に分散させたコロイド溶液から
なる。
The seal holding member 15 has a cylindrical recess 15.
The magnetic fluid seal 17 into which the lower end portion 2a of the rotating shaft 2 of the motor 1 is inserted is held at a, and is fixed to the lower end surface of the motor 1 by screws 16. The magnetic fluid seal 17 includes a plurality of annular magnetic pole pieces 18 having an inner diameter slightly larger than the outer diameter of the lower end 2 a of the rotating shaft 2, and a plurality of annular permanent magnets 19 inserted between the magnetic pole pieces 18. , Lower end 2 of rotating shaft 2
a magnetic fluid 2 injected into the gap between the surface of
0. The magnetic fluid 20 is composed of a colloidal solution in which ferromagnetic solid fine particles are dispersed at a high density in a liquid.

【0026】磁性流体シール17では、永久磁石19が
磁極片18と磁性材料からなる回転軸2との間に磁場を
形成する。そして、その磁場によって磁性流体20を磁
極片18と回転軸2との隙間に保持する。このため、回
転軸2が高速で回転した場合でも、磁極片18と回転軸
2との隙間に磁性流体20が止まり、回転軸2と磁極片
18との隙間を密封する。
In the magnetic fluid seal 17, a permanent magnet 19 forms a magnetic field between the pole piece 18 and the rotating shaft 2 made of a magnetic material. The magnetic fluid holds the magnetic fluid 20 in the gap between the pole piece 18 and the rotating shaft 2. Therefore, even when the rotating shaft 2 rotates at a high speed, the magnetic fluid 20 stops in the gap between the pole piece 18 and the rotating shaft 2, and seals the gap between the rotating shaft 2 and the pole piece 18.

【0027】接続部材21は、回転軸2の下端部2aを
受け入れる連通空間22を構成する空間を有し、ねじ2
4によってシール保持部材15に固定される。また、シ
ール保持部材15と接続部材21との接合面にはOリン
グ23が装着されている。これにより、連通空間22と
外部との気密が保持される。また、接続部材21内の連
通空間22には吸気管路25が接続されている。このよ
うな構造により、モータ1の回転軸2の吸引路3と吸気
管路25の吸気口とが連通空間22を介して気密に連通
する。
The connecting member 21 has a space that forms a communication space 22 for receiving the lower end 2 a of the rotating shaft 2.
4 secures it to the seal holding member 15. Further, an O-ring 23 is mounted on a joint surface between the seal holding member 15 and the connection member 21. Thereby, the airtightness between the communication space 22 and the outside is maintained. Further, an intake pipe 25 is connected to the communication space 22 in the connection member 21. With such a structure, the suction passage 3 of the rotating shaft 2 of the motor 1 and the suction port of the suction pipe 25 are air-tightly communicated via the communication space 22.

【0028】上記構成を有する回転式基板処理装置にお
いて、基板Wが基板保持部4上に載置されると、基板保
持部4の吸引口5、回転軸2の吸引路3、連結部材14
の連通空間22および吸気管路25を通り、真空吸引用
力設備に向けて吸気される。これにより、基板Wの裏面
が基板保持部4に真空吸引されて保持される。このと
き、連結部材14の磁性流体シール17は外気が回転軸
2の下端部2aに沿って連通空間22内に侵入して真空
度が低下することを防止する。
In the rotary substrate processing apparatus having the above structure, when the substrate W is placed on the substrate holder 4, the suction port 5 of the substrate holder 4, the suction path 3 of the rotating shaft 2, the connecting member 14
Then, the air is suctioned toward the vacuum suction power facility through the communication space 22 and the suction pipe line 25. As a result, the back surface of the substrate W is suctioned and held by the substrate holding unit 4 in vacuum. At this time, the magnetic fluid seal 17 of the connecting member 14 prevents the outside air from entering the communication space 22 along the lower end 2a of the rotating shaft 2 and lowering the degree of vacuum.

【0029】上記のように、本発明の回転式基板処理装
置では、モータ1の下端面において、連結部材14を介
して回転軸2内の吸引路3と吸気管路25とが接続され
ている。このため、回転軸2内の吸引路3は回転軸2を
直線状に貫通して形成され、これにより吸引路3の加工
が容易となる。
As described above, in the rotary substrate processing apparatus of the present invention, the suction path 3 in the rotary shaft 2 and the intake pipe 25 are connected via the connecting member 14 at the lower end surface of the motor 1. . For this reason, the suction passage 3 in the rotating shaft 2 is formed to penetrate the rotating shaft 2 in a straight line, thereby facilitating the processing of the suction passage 3.

【0030】また、磁性流体シール17により回転軸2
の吸引路3と吸気管路25とを接続する連通空間22の
気密が保持されている。磁性流体シール17は、回転軸
2との接触により磨耗する部分を有しない。このため、
磨耗による気密性の劣化が生じることがなく、磁性流体
シール17の交換等の保守作業が不要となる。
Further, the rotating shaft 2 is provided by the magnetic fluid seal 17.
The airtightness of the communication space 22 connecting the suction passage 3 and the intake pipe 25 is maintained. The magnetic fluid seal 17 has no portion that is worn by contact with the rotating shaft 2. For this reason,
The airtightness does not deteriorate due to wear, and maintenance work such as replacement of the magnetic fluid seal 17 becomes unnecessary.

【0031】また、磁性流体シール17は発塵のおそれ
がない。このため、磁性流体シール17からの発塵物質
によって基板保持部4に保持された基板Wが汚染される
ことが防止される。したがって、磁性流体シールからの
発塵を除去するためにベース部材8上に図3に示すよう
な排気装置10を設ける必要がない。
The magnetic fluid seal 17 does not generate dust. For this reason, contamination of the substrate W held by the substrate holding unit 4 with the dust generated from the magnetic fluid seal 17 is prevented. Therefore, it is not necessary to provide the exhaust device 10 as shown in FIG. 3 on the base member 8 in order to remove dust from the magnetic fluid seal.

【0032】さらに、連結部材14は、シール保持部材
15と接続部材21とから構成されている。このため、
まずシール保持部材15をモータ1の下端面に取り付
け、磁性流体シール17の磁極片18とモータ1の回転
軸2の下端部2aとの隙間が均等となるように調整し、
その後、この隙間に磁性流体20を注入する。しかる
後、接続部材21を固定することができる。このため、
磁性流体シール17とモータ1の回転軸2との調整作業
が容易となり、組み立て作業が簡素化される。
Further, the connecting member 14 includes a seal holding member 15 and a connecting member 21. For this reason,
First, the seal holding member 15 is attached to the lower end surface of the motor 1, and the gap between the magnetic pole piece 18 of the magnetic fluid seal 17 and the lower end 2 a of the rotating shaft 2 of the motor 1 is adjusted to be uniform.
Thereafter, the magnetic fluid 20 is injected into the gap. Thereafter, the connection member 21 can be fixed. For this reason,
Adjustment work between the magnetic fluid seal 17 and the rotating shaft 2 of the motor 1 is facilitated, and assembly work is simplified.

【0033】さらに、連結部材14はベース部材8の下
部に配置される。また、モータ1はモータ保持部材7に
よりベース部材8上の雰囲気から隔離されている。この
ため、カップ6周辺に漏洩する溶剤が磁性流体シール1
7に到達して悪影響を及ぼすことが防止される。
Further, the connecting member 14 is arranged below the base member 8. The motor 1 is isolated from the atmosphere on the base member 8 by the motor holding member 7. For this reason, the solvent leaking to the vicinity of the cup 6 is
7 is prevented from being adversely affected.

【0034】なお、図2は、磁性流体シールの構造を原
理的に示したものであり、磁極片18、永久磁石19等
の形状や個数は気密条件等によって適宜選択される。ま
た、回転軸2が磁性材料でない場合には、回転軸2側に
磁性材料からなる中空軸部材を取り付け、その周囲に磁
性流体シールを装着してもよい。
FIG. 2 shows the structure of the magnetic fluid seal in principle, and the shapes and numbers of the magnetic pole pieces 18, the permanent magnets 19 and the like are appropriately selected according to airtight conditions and the like. When the rotating shaft 2 is not made of a magnetic material, a hollow shaft member made of a magnetic material may be attached to the rotating shaft 2 and a magnetic fluid seal may be attached around the hollow shaft member.

【0035】また、本発明は、基板Wを吸引保持する基
板保持部4を有する回転式塗布装置、回転式洗浄装置、
回転式現像装置等の回転式基板処理装置に適用すること
ができる。
The present invention also relates to a rotary coating device, a rotary cleaning device, and a rotary coating device having a substrate holding section 4 for sucking and holding a substrate W.
The present invention can be applied to a rotary substrate processing apparatus such as a rotary developing apparatus.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例による回転式基板処理装置の概
略断面図である。
FIG. 1 is a schematic sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention.

【図2】図1の回転式基板処理装置の要部拡大断面図で
ある。
FIG. 2 is an enlarged sectional view of a main part of the rotary substrate processing apparatus of FIG.

【図3】従来の回転式基板処理装置の概略断面図であ
る。
FIG. 3 is a schematic sectional view of a conventional rotary substrate processing apparatus.

【符号の説明】[Explanation of symbols]

1 モータ 2 回転軸 3 吸引路 4 基板保持部 5 吸引口 7 モータ保持部材 8 ベース部材 14 連結部材 15 シール保持部材 17 磁性流体シール 18 磁極片 19 永久磁石 20 磁性流体 21 接続部材 22 連通空間 25 吸気管路 DESCRIPTION OF SYMBOLS 1 Motor 2 Rotating shaft 3 Suction path 4 Substrate holding part 5 Suction port 7 Motor holding member 8 Base member 14 Connecting member 15 Seal holding member 17 Magnetic fluid seal 18 Magnetic pole piece 19 Permanent magnet 20 Magnetic fluid 21 Connecting member 22 Communication space 25 Suction Pipeline

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 鉛直方向に配設され、上端から下端にま
で貫通する吸引路を有する回転軸を備えたモータと、 前記回転軸の上端に取り付けられ、前記吸引路に連通す
る吸引口を有し、基板を吸引保持する基板保持部と、 前記回転軸の下端部の下方に配設された吸気口を有し、
前記吸引路の下端から空気を外部に導く吸気管路と、 前記吸気管路の前記吸気口が連結されるとともに前記回
転軸の下端部が遊嵌される連通空間を有する連結部材
と、 前記連結部材の前記連通空間を形成する内周面と前記回
転軸の下端部の外周面との隙間に設けられた磁性流体シ
ールとを備えたことを特徴とする回転式基板処理装置。
1. A motor having a rotating shaft provided in a vertical direction and having a suction path penetrating from an upper end to a lower end, and a suction port attached to an upper end of the rotating shaft and communicating with the suction path. And a substrate holding unit that sucks and holds the substrate, and has an intake port arranged below a lower end of the rotating shaft,
A suction pipe that guides air to the outside from a lower end of the suction path; a connection member having a communication space to which the suction port of the suction pipe is connected and a lower end of the rotating shaft to be loosely fitted; A rotary substrate processing apparatus, comprising: a magnetic fluid seal provided in a gap between an inner peripheral surface of the member forming the communication space and an outer peripheral surface of a lower end of the rotating shaft.
【請求項2】 雰囲気を上下に仕切る平板状のベース部
材をさらに備え、 前記モータは、前記ベース部材より下方側の雰囲気中に
前記回転軸の前記下端部が位置するように前記ベース部
材に固定されたことを特徴とする請求項1記載の回転式
基板処理装置。
2. A motor according to claim 1, further comprising a flat base member for vertically partitioning the atmosphere, wherein said motor is fixed to said base member such that said lower end of said rotary shaft is located in an atmosphere below said base member. The rotary substrate processing apparatus according to claim 1, wherein:
【請求項3】 前記連結部材は、 前記回転軸の下端部の周囲を取り囲みかつ前記磁性流体
シールを保持する環状の凹部を有し、前記モータの下端
面に取り付けられるシール保持部材と、 前記シール保持部材の下端に連結され、前記吸気管路の
前記吸気口と前記回転軸の前記吸引路とを連通させる空
間を有する接続部材とを含むことを特徴とする請求項1
または2記載の回転式基板処理装置。
3. The motor according to claim 3, wherein the connecting member has an annular recess surrounding the lower end of the rotating shaft and holding the magnetic fluid seal, and a seal holding member attached to a lower end surface of the motor; 2. A connection member connected to a lower end of a holding member and having a space for communicating the suction port of the suction pipe with the suction path of the rotary shaft.
Or the rotary substrate processing apparatus according to 2.
JP23489697A 1997-08-29 1997-08-29 Rotary substrate processing equipment Expired - Fee Related JP3664856B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23489697A JP3664856B2 (en) 1997-08-29 1997-08-29 Rotary substrate processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23489697A JP3664856B2 (en) 1997-08-29 1997-08-29 Rotary substrate processing equipment

Publications (2)

Publication Number Publication Date
JPH1176904A true JPH1176904A (en) 1999-03-23
JP3664856B2 JP3664856B2 (en) 2005-06-29

Family

ID=16978010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23489697A Expired - Fee Related JP3664856B2 (en) 1997-08-29 1997-08-29 Rotary substrate processing equipment

Country Status (1)

Country Link
JP (1) JP3664856B2 (en)

Also Published As

Publication number Publication date
JP3664856B2 (en) 2005-06-29

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