JP3664856B2 - Rotary substrate processing equipment - Google Patents

Rotary substrate processing equipment Download PDF

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Publication number
JP3664856B2
JP3664856B2 JP23489697A JP23489697A JP3664856B2 JP 3664856 B2 JP3664856 B2 JP 3664856B2 JP 23489697 A JP23489697 A JP 23489697A JP 23489697 A JP23489697 A JP 23489697A JP 3664856 B2 JP3664856 B2 JP 3664856B2
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JP
Japan
Prior art keywords
rotating shaft
substrate
motor
holding
rotary
Prior art date
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Expired - Fee Related
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JP23489697A
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Japanese (ja)
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JPH1176904A (en
Inventor
彰彦 森田
正美 大谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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Priority to JP23489697A priority Critical patent/JP3664856B2/en
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Description

【0001】
【発明の属する技術分野】
本発明は、基板を吸引保持して回転させながら基板に対して所定の処理を行う回転式基板処理装置に関する。
【0002】
【従来の技術】
半導体ウエハ、液晶表示装置用ガラス基板、フォトマスク用ガラス基板、光ディスク用ガラス基板等の基板にフォトレジスト液等の塗布液を塗布するために回転式基板処理装置が用いられている。
【0003】
図3は従来の回転式基板処理装置の一例を示す概略断面図である。図3において、回転式基板処理装置は、基板Wを水平姿勢で保持する基板保持部4を備える。基板保持部4はモータ1の回転軸2の先端に取り付けられ、鉛直軸の回りで回転駆動される。
【0004】
基板保持部4に保持された基板Wの周囲には、処理液の飛散防止用のカップ6が配置されている。
【0005】
モータ1は回転軸2が鉛直方向に向くようにモータ保持部材7によりベース部材8に固定されている。また、モータ保持部材7は、モータ1の上面を保持する保持フランジ7aと、保持フランジ7aをベース部材8に固定する固定部材7bとから構成されている。
【0006】
基板保持部4は基板Wの裏面を吸引して保持する真空チャックから構成される。基板保持部4の中央には吸引口5が形成されており、吸引口5はモータ1の回転軸2内に形成された吸引路3に連通している。回転軸2の吸引路3は連結部材30を介して吸気管路33に接続されている。さらに、吸気管路33は工場内の真空吸引用力設備に接続されている。
【0007】
連結部材30は回転軸2の吸引路3の端部と吸気管路33の端部とを連通させる環状の連通空間32を有し、この連通空間32の上下両側にオイルシールからなる接触式のシール部材31が配置されている。このシール部材31により連結部材30の連通空間32の気密が保持される。
【0008】
上記の吸引口5、回転軸2の吸引路3および吸気管路33を通して吸気することにより、基板Wの裏面が基板保持部4の上面に吸引保持される。
【0009】
【発明が解決しようとする課題】
しかしながら、上記従来の回転式基板処理装置では、接触式のシール部材31を用いて連結部材30の連通空間32の気密を保持している。モータ1の回転軸2は毎分数百〜数千回の高速回転動作を行う。このため、接触式のシール部材31では、高速回転する回転軸2に接触する部分の磨耗が激しい。
【0010】
磨耗によってシール部材31の気密性が低下すると、基板保持部4による基板Wの保持力が低下する。特に、近年では基板Wが大型化しかつ重量化している。このため、基板Wの保持力の低下は基板保持部4からの基板Wの離脱事故を招き易くなる。大型化した基板は高価であり、基板Wの離脱事故が生ずると、その損害も大きくなる。このため、シール部材31を定期的に交換して気密性を維持する必要があり、保守作業が煩雑であった。
【0011】
また、接触式のシール部材31では、回転軸2との接触部分からパーティクルが発生しやすい。発生したパーティクルは雰囲気中を浮遊し、基板Wの表面に付着して基板Wを汚染するおそれがある。このため、図3に示すように、ベース部材8上に排気装置10を設け、排気口10aから吸引することによって浮遊するパーティクルを除去する必要があり、回転式基板処理装置の構造が複雑化するという不都合があった。
【0012】
本発明の目的は、モータの回転軸内の吸引路と吸気管路との接続部の保守性に優れた回転式基板処理装置を提供することである。
【0013】
【課題を解決するための手段および発明の効果】
第1の発明に係る回転式基板処理装置は、鉛直方向に配設され、上端から下端にまで貫通する吸引路を有する回転軸を備えたモータと、回転軸の上端に取り付けられ、吸引路に連通する吸引口を有し、基板を吸引保持する基板保持部と、回転軸の下端部の下方に配設された吸気口を有し、吸引路の下端から空気を外部に導く吸気管路と、吸気管路の吸気口が連結されるとともに回転軸の下端部が遊嵌された連通空間を有する連結部材と、連結部材の連通空間を形成する内周面と回転軸の下端部の外周面との隙間に設けられた磁性流体シールとを備え、連結部材は、回転軸の下端部の周囲を取り囲みかつ磁性流体シールを保持する環状の凹部を有し、モータの下端面に取り付けられるシール保持部材と、シール保持部材の下端に連結され、吸気管路の吸気口と回転軸の吸引路とを連通させる空間を有する接続部材とを含むものである。
【0014】
第1の発明に係る回転式基板処理装置においては、高速回転する回転軸の吸引路と吸気管路とが連結部材により連結され、吸引路と吸気管路の吸気口との間の気密が磁性流体シールにより保持される。磁性流体シールは非接触式のシール部材であり、回転軸との接触により磨耗する部分がない。このため、定期的にシール部材を交換する必要がなくなり、回転式基板処理装置の保守性が向上する。また、磁性流体シールは回転軸との接触によって発塵するおそれがない。これにより、磁性流体シールからの発塵物質により基板が汚染されることが防止される。
【0015】
さらに、回転軸の下端部に連結部材を配置したことにより、モータの上端面から基板保持部に至る回転軸周辺の構成が簡素化される。
【0016】
また、磁性流体シールを保持したシール保持部材をモータの下端面に取り付け、磁性流体シールの取り付け状態を調整した後、シール保持部材に接続部材を取り付けることによってモータの回転軸の吸引路と吸気管路の吸気口とが連通される。これにより、磁性流体シールの取り付け位置の調整を容易に行うことができる。
【0017】
第2の発明に係る回転式基板処理装置は、第1の発明に係る回転式基板処理装置の構成において、雰囲気を上下に仕切る平板状のベース部材をさらに備え、モータは、ベース部材より下方側の雰囲気中に回転軸の下端部が位置するようにベース部材に固定されたものである。
【0018】
この場合、回転式基板処理装置内の雰囲気がベース部材によって上下方向に仕切られ、ベース部材の上方側の雰囲気中には基板保持部が配置され、ベース部材より下方側の雰囲気中には連結部材および磁性流体シールが配置される。そのため、基板保持部周辺に浮遊する溶剤が磁性流体シールの磁性流体に作用して磁性流体シールが劣化することが防止される。
【0019】
【発明の実施の形態】
図1は本発明の実施例による回転式基板処理装置の概略断面図であり、図2は図1の回転式基板処理装置の部分拡大断面図である。
【0020】
図1および図2において、回転式基板処理装置は、基板Wを水平姿勢で保持する基板保持部4を備える。基板保持部4は、モータ1の回転軸2の先端に取り付けられており、鉛直軸の周りで回転駆動される。基板保持部4に保持された基板Wの周囲には、処理液の飛散防止用のカップ6が配置されている。
【0021】
モータ1はモータ保持部材7によりベース部材8に固定されている。また、モータ保持部材7はモータ1の上面を保持する保持フランジ7aと、モータ1の本体部外周を取り囲み、かつ保持フランジ7aをベース部材8に固定する円筒状の固定部材7bとから構成される。ベース部材8は、回転式基板処理装置内の雰囲気を上下に隔離するような平板状に形成されている。そして、ベース部材8およびモータ保持部材7により、モータ1の本体部はベース部材8より上の雰囲気と遮断されている。
【0022】
上記の基板保持部4は基板Wの裏面を吸引して保持する真空チャックからなる。この基板保持部4からの真空吸引経路は、基板保持部4の吸引口5、モータ1の回転軸2を貫通する吸引路3および吸気管路25から構成され、工場に設置された真空吸引用力設備(図示せず)に接続される。また、回転軸2の吸引路3と吸気管路25とは連結部材14を介して接続されている。
【0023】
図2に示すように、連結部材14は、モータ1の下端面に接続されるシール保持部材15と、シール保持部材15に接続される接続部材21とから構成される。
【0024】
シール保持部材15は、円筒状の凹部15aにモータ1の回転軸2の下端部2aが挿入される磁性流体シール17を保持し、ねじ16によってモータ1の下端面に固定されている。磁性流体シール17は、回転軸2の下端部2aの外径よりも僅かに大きい内径を有する環状の複数の磁極片18と、磁極片18の間に挿入された環状の複数の永久磁石19と、回転軸2の下端部2aの表面と磁極片18との隙間に注入された磁性流体20とから構成される。磁性流体20は、強磁性体の固体微粒子を液体中に高密度に分散させたコロイド溶液からなる。
【0025】
磁性流体シール17では、永久磁石19が磁極片18と磁性材料からなる回転軸2との間に磁場を形成する。そして、その磁場によって磁性流体20を磁極片18と回転軸2との隙間に保持する。このため、回転軸2が高速で回転した場合でも、磁極片18と回転軸2との隙間に磁性流体20が止まり、回転軸2と磁極片18との隙間を密封する。
【0026】
接続部材21は、回転軸2の下端部2aを受け入れる連通空間22を構成する空間を有し、ねじ24によってシール保持部材15に固定される。また、シール保持部材15と接続部材21との接合面にはOリング23が装着されている。これにより、連通空間22と外部との気密が保持される。また、接続部材21内の連通空間22には吸気管路25が接続されている。このような構造により、モータ1の回転軸2の吸引路3と吸気管路25の吸気口とが連通空間22を介して気密に連通する。
【0027】
上記構成を有する回転式基板処理装置において、基板Wが基板保持部4上に載置されると、基板保持部4の吸引口5、回転軸2の吸引路3、連結部材14の連通空間22および吸気管路25を通り、真空吸引用力設備に向けて吸気される。これにより、基板Wの裏面が基板保持部4に真空吸引されて保持される。このとき、連結部材14の磁性流体シール17は外気が回転軸2の下端部2aに沿って連通空間22内に侵入して真空度が低下することを防止する。
【0028】
上記のように、本発明の回転式基板処理装置では、モータ1の下端面において、連結部材14を介して回転軸2内の吸引路3と吸気管路25とが接続されている。このため、回転軸2内の吸引路3は回転軸2を直線状に貫通して形成され、これにより吸引路3の加工が容易となる。
【0029】
また、磁性流体シール17により回転軸2の吸引路3と吸気管路25とを接続する連通空間22の気密が保持されている。磁性流体シール17は、回転軸2との接触により磨耗する部分を有しない。このため、磨耗による気密性の劣化が生じることがなく、磁性流体シール17の交換等の保守作業が不要となる。
【0030】
また、磁性流体シール17は発塵のおそれがない。このため、磁性流体シール17からの発塵物質によって基板保持部4に保持された基板Wが汚染されることが防止される。したがって、磁性流体シールからの発塵を除去するためにベース部材8上に図3に示すような排気装置10を設ける必要がない。
【0031】
さらに、連結部材14は、シール保持部材15と接続部材21とから構成されている。このため、まずシール保持部材15をモータ1の下端面に取り付け、磁性流体シール17の磁極片18とモータ1の回転軸2の下端部2aとの隙間が均等となるように調整し、その後、この隙間に磁性流体20を注入する。しかる後、接続部材21を固定することができる。このため、磁性流体シール17とモータ1の回転軸2との調整作業が容易となり、組み立て作業が簡素化される。
【0032】
さらに、連結部材14はベース部材8の下部に配置される。また、モータ1はモータ保持部材7によりベース部材8上の雰囲気から隔離されている。このため、カップ6周辺に漏洩する溶剤が磁性流体シール17に到達して悪影響を及ぼすことが防止される。
【0033】
なお、図2は、磁性流体シールの構造を原理的に示したものであり、磁極片18、永久磁石19等の形状や個数は気密条件等によって適宜選択される。また、回転軸2が磁性材料でない場合には、回転軸2側に磁性材料からなる中空軸部材を取り付け、その周囲に磁性流体シールを装着してもよい。
【0034】
また、本発明は、基板Wを吸引保持する基板保持部4を有する回転式塗布装置、回転式洗浄装置、回転式現像装置等の回転式基板処理装置に適用することができる。
【図面の簡単な説明】
【図1】本発明の実施例による回転式基板処理装置の概略断面図である。
【図2】図1の回転式基板処理装置の要部拡大断面図である。
【図3】従来の回転式基板処理装置の概略断面図である。
【符号の説明】
1 モータ
2 回転軸
3 吸引路
4 基板保持部
5 吸引口
7 モータ保持部材
8 ベース部材
14 連結部材
15 シール保持部材
17 磁性流体シール
18 磁極片
19 永久磁石
20 磁性流体
21 接続部材
22 連通空間
25 吸気管路
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a rotary substrate processing apparatus that performs predetermined processing on a substrate while rotating the substrate while sucking and holding the substrate.
[0002]
[Prior art]
A rotary substrate processing apparatus is used to apply a coating solution such as a photoresist solution to a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, or a glass substrate for an optical disk.
[0003]
FIG. 3 is a schematic sectional view showing an example of a conventional rotary substrate processing apparatus. In FIG. 3, the rotary substrate processing apparatus includes a substrate holding unit 4 that holds a substrate W in a horizontal posture. The substrate holder 4 is attached to the tip of the rotating shaft 2 of the motor 1 and is driven to rotate about the vertical axis.
[0004]
Around the substrate W held by the substrate holding unit 4, a cup 6 for preventing the processing liquid from scattering is disposed.
[0005]
The motor 1 is fixed to the base member 8 by a motor holding member 7 so that the rotating shaft 2 faces in the vertical direction. The motor holding member 7 includes a holding flange 7 a that holds the upper surface of the motor 1 and a fixing member 7 b that fixes the holding flange 7 a to the base member 8.
[0006]
The substrate holding unit 4 includes a vacuum chuck that sucks and holds the back surface of the substrate W. A suction port 5 is formed at the center of the substrate holder 4, and the suction port 5 communicates with a suction path 3 formed in the rotating shaft 2 of the motor 1. The suction path 3 of the rotary shaft 2 is connected to an intake pipe line 33 via a connecting member 30. Further, the intake pipe 33 is connected to a vacuum suction power facility in the factory.
[0007]
The connecting member 30 has an annular communication space 32 that communicates the end of the suction passage 3 of the rotating shaft 2 and the end of the intake pipe 33, and is a contact type comprising oil seals on both upper and lower sides of the communication space 32. A seal member 31 is disposed. The sealing member 31 keeps the airtightness of the communication space 32 of the connecting member 30.
[0008]
By sucking air through the suction port 5, the suction path 3 of the rotating shaft 2 and the suction pipe 33, the back surface of the substrate W is sucked and held on the upper surface of the substrate holding part 4.
[0009]
[Problems to be solved by the invention]
However, in the conventional rotary substrate processing apparatus, the contact-type seal member 31 is used to keep the communication space 32 of the connection member 30 airtight. The rotating shaft 2 of the motor 1 performs a high-speed rotation operation several hundred to several thousand times per minute. For this reason, in the contact-type seal member 31, the portion in contact with the rotating shaft 2 rotating at high speed is heavily worn.
[0010]
When the airtightness of the seal member 31 is reduced due to wear, the holding force of the substrate W by the substrate holding part 4 is reduced. In particular, in recent years, the substrate W has become larger and heavier. For this reason, a decrease in the holding power of the substrate W easily causes an accident of detachment of the substrate W from the substrate holding portion 4. A large-sized substrate is expensive, and if a substrate W detachment accident occurs, the damage becomes large. For this reason, it is necessary to periodically replace the seal member 31 to maintain airtightness, and maintenance work is complicated.
[0011]
In the contact-type seal member 31, particles are likely to be generated from the contact portion with the rotating shaft 2. The generated particles float in the atmosphere and may adhere to the surface of the substrate W and contaminate the substrate W. For this reason, as shown in FIG. 3, it is necessary to provide an exhaust device 10 on the base member 8 and remove floating particles by suctioning from the exhaust port 10a, which complicates the structure of the rotary substrate processing apparatus. There was an inconvenience.
[0012]
An object of the present invention is to provide a rotary substrate processing apparatus excellent in maintainability of a connection portion between a suction path and an intake pipe line in a rotation shaft of a motor.
[0013]
[Means for Solving the Problems and Effects of the Invention]
A rotary substrate processing apparatus according to a first aspect of the present invention is a motor having a rotary shaft that is disposed in a vertical direction and has a suction path that penetrates from the upper end to the lower end, and is attached to the upper end of the rotary shaft. A substrate holding portion that has a suction port that communicates and sucks and holds the substrate; an intake port that is disposed below the lower end portion of the rotating shaft; and an intake pipe that guides air to the outside from the lower end of the suction passage; A connection member having a communication space in which the intake port of the intake pipe is connected and the lower end portion of the rotating shaft is loosely fitted, an inner peripheral surface forming a communication space of the connecting member, and an outer peripheral surface of the lower end portion of the rotating shaft And a magnetic fluid seal provided in a clearance between the rotating shaft and the connecting member, which has an annular recess surrounding the lower end of the rotating shaft and holding the magnetic fluid seal, and is attached to the lower end surface of the motor Connected to the lower end of the member and the seal holding member, A suction passage of the inlet of the road and the rotary shaft is intended to include a connection member having a space for communicating.
[0014]
In the rotary substrate processing apparatus according to the first aspect of the invention, the suction path of the rotating shaft that rotates at high speed and the intake pipe are connected by a connecting member, and the airtightness between the suction path and the intake port of the intake pipe is magnetic. It is held by a fluid seal. The magnetic fluid seal is a non-contact type seal member, and there is no portion to be worn by contact with the rotating shaft. For this reason, it is not necessary to periodically replace the seal member, and the maintainability of the rotary substrate processing apparatus is improved. Further, the magnetic fluid seal has no possibility of generating dust due to contact with the rotating shaft. This prevents the substrate from being contaminated by the dusting material from the magnetic fluid seal.
[0015]
Furthermore, by arranging the connecting member at the lower end portion of the rotating shaft, the configuration around the rotating shaft from the upper end surface of the motor to the substrate holding portion is simplified.
[0016]
In addition, after attaching the seal holding member holding the magnetic fluid seal to the lower end surface of the motor, adjusting the attachment state of the magnetic fluid seal, attaching the connecting member to the seal holding member, the suction path and the intake pipe of the rotating shaft of the motor The inlet of the road is communicated. Thereby, the attachment position of the magnetic fluid seal can be easily adjusted.
[0017]
A rotary substrate processing apparatus according to a second aspect of the present invention is the rotary substrate processing apparatus according to the first aspect of the present invention, further comprising a flat base member that divides the atmosphere up and down, and the motor is located below the base member. It is fixed to the base member so that the lower end of the rotating shaft is located in the atmosphere.
[0018]
In this case, the atmosphere in the rotary substrate processing apparatus is partitioned in the vertical direction by the base member, the substrate holding part is disposed in the atmosphere above the base member, and the connecting member is disposed in the atmosphere below the base member. And a magnetic fluid seal is disposed. Therefore, it is possible to prevent the magnetic fluid seal from deteriorating due to the solvent floating around the substrate holder acting on the magnetic fluid of the magnetic fluid seal.
[0019]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a schematic sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention, and FIG. 2 is a partially enlarged sectional view of the rotary substrate processing apparatus of FIG.
[0020]
1 and 2, the rotary substrate processing apparatus includes a substrate holding unit 4 that holds a substrate W in a horizontal posture. The substrate holding unit 4 is attached to the tip of the rotating shaft 2 of the motor 1 and is driven to rotate around the vertical axis. Around the substrate W held by the substrate holding unit 4, a cup 6 for preventing the processing liquid from scattering is disposed.
[0021]
The motor 1 is fixed to the base member 8 by a motor holding member 7. The motor holding member 7 includes a holding flange 7 a that holds the upper surface of the motor 1 and a cylindrical fixing member 7 b that surrounds the outer periphery of the main body of the motor 1 and fixes the holding flange 7 a to the base member 8. . The base member 8 is formed in a flat plate shape that isolates the atmosphere in the rotary substrate processing apparatus vertically. The base member 8 and the motor holding member 7 block the main body of the motor 1 from the atmosphere above the base member 8.
[0022]
The substrate holding unit 4 includes a vacuum chuck that sucks and holds the back surface of the substrate W. The vacuum suction path from the substrate holding unit 4 includes a suction port 5 of the substrate holding unit 4, a suction path 3 that penetrates the rotating shaft 2 of the motor 1, and an intake pipe 25, and is a vacuum suction force installed in a factory. Connected to equipment (not shown). Further, the suction path 3 and the intake pipe 25 of the rotating shaft 2 are connected via a connecting member 14.
[0023]
As shown in FIG. 2, the connecting member 14 includes a seal holding member 15 connected to the lower end surface of the motor 1 and a connecting member 21 connected to the seal holding member 15.
[0024]
The seal holding member 15 holds a magnetic fluid seal 17 into which the lower end 2 a of the rotating shaft 2 of the motor 1 is inserted into a cylindrical recess 15 a and is fixed to the lower end surface of the motor 1 by a screw 16. The magnetic fluid seal 17 includes a plurality of annular magnetic pole pieces 18 having an inner diameter slightly larger than the outer diameter of the lower end portion 2 a of the rotating shaft 2, and a plurality of annular permanent magnets 19 inserted between the magnetic pole pieces 18. The magnetic fluid 20 is injected into the gap between the surface of the lower end 2 a of the rotating shaft 2 and the magnetic pole piece 18. The magnetic fluid 20 is made of a colloidal solution in which solid fine particles of a ferromagnetic material are dispersed in a liquid at a high density.
[0025]
In the magnetic fluid seal 17, the permanent magnet 19 forms a magnetic field between the pole piece 18 and the rotating shaft 2 made of a magnetic material. The magnetic fluid 20 is held in the gap between the magnetic pole piece 18 and the rotating shaft 2 by the magnetic field. For this reason, even when the rotating shaft 2 rotates at a high speed, the magnetic fluid 20 stops in the gap between the magnetic pole piece 18 and the rotating shaft 2, and the gap between the rotating shaft 2 and the magnetic pole piece 18 is sealed.
[0026]
The connecting member 21 has a space that forms a communication space 22 that receives the lower end 2 a of the rotating shaft 2, and is fixed to the seal holding member 15 by screws 24. An O-ring 23 is attached to the joint surface between the seal holding member 15 and the connection member 21. Thereby, airtightness between the communication space 22 and the outside is maintained. An intake pipe 25 is connected to the communication space 22 in the connection member 21. With such a structure, the suction path 3 of the rotating shaft 2 of the motor 1 and the intake port of the intake pipe line 25 communicate in an airtight manner through the communication space 22.
[0027]
In the rotary substrate processing apparatus having the above configuration, when the substrate W is placed on the substrate holding unit 4, the suction port 5 of the substrate holding unit 4, the suction path 3 of the rotating shaft 2, and the communication space 22 of the connecting member 14. Then, the air is sucked through the intake pipe 25 toward the vacuum suction power facility. Thereby, the back surface of the substrate W is vacuum-sucked and held by the substrate holding part 4. At this time, the magnetic fluid seal 17 of the connecting member 14 prevents outside air from entering the communication space 22 along the lower end portion 2a of the rotating shaft 2 and lowering the degree of vacuum.
[0028]
As described above, in the rotary substrate processing apparatus of the present invention, the suction path 3 and the intake pipe 25 in the rotary shaft 2 are connected via the connecting member 14 on the lower end surface of the motor 1. For this reason, the suction path 3 in the rotating shaft 2 is formed so as to penetrate the rotating shaft 2 linearly, whereby the processing of the suction path 3 is facilitated.
[0029]
Further, the magnetic fluid seal 17 maintains the airtightness of the communication space 22 that connects the suction path 3 of the rotating shaft 2 and the intake pipe line 25. The magnetic fluid seal 17 does not have a portion that is worn by contact with the rotating shaft 2. For this reason, deterioration of airtightness due to wear does not occur, and maintenance work such as replacement of the magnetic fluid seal 17 becomes unnecessary.
[0030]
Further, the magnetic fluid seal 17 has no fear of dust generation. For this reason, the substrate W held on the substrate holding part 4 is prevented from being contaminated by the dust generation material from the magnetic fluid seal 17. Therefore, it is not necessary to provide the exhaust device 10 as shown in FIG. 3 on the base member 8 in order to remove dust generated from the magnetic fluid seal.
[0031]
Further, the connecting member 14 includes a seal holding member 15 and a connecting member 21. For this reason, first, the seal holding member 15 is attached to the lower end surface of the motor 1, and the gap between the magnetic pole piece 18 of the magnetic fluid seal 17 and the lower end portion 2a of the rotating shaft 2 of the motor 1 is adjusted to be uniform. The magnetic fluid 20 is injected into this gap. Thereafter, the connecting member 21 can be fixed. For this reason, the adjustment work of the magnetic fluid seal 17 and the rotating shaft 2 of the motor 1 becomes easy, and the assembly work is simplified.
[0032]
Further, the connecting member 14 is disposed below the base member 8. The motor 1 is isolated from the atmosphere on the base member 8 by the motor holding member 7. For this reason, it is prevented that the solvent leaking around the cup 6 reaches the magnetic fluid seal 17 and adversely affects it.
[0033]
FIG. 2 shows the structure of the magnetic fluid seal in principle, and the shape and number of the pole pieces 18 and the permanent magnets 19 are appropriately selected depending on the airtight condition and the like. Further, when the rotating shaft 2 is not a magnetic material, a hollow shaft member made of a magnetic material may be attached to the rotating shaft 2 side, and a magnetic fluid seal may be mounted around the hollow shaft member.
[0034]
Further, the present invention can be applied to a rotary substrate processing apparatus such as a rotary coating apparatus, a rotary cleaning apparatus, and a rotary developing apparatus having a substrate holding unit 4 that sucks and holds the substrate W.
[Brief description of the drawings]
FIG. 1 is a schematic cross-sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is an enlarged cross-sectional view of a main part of the rotary substrate processing apparatus of FIG.
FIG. 3 is a schematic sectional view of a conventional rotary substrate processing apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Motor 2 Rotating shaft 3 Suction path 4 Substrate holding part 5 Suction port 7 Motor holding member 8 Base member 14 Connecting member 15 Seal holding member 17 Magnetic fluid seal 18 Magnetic pole piece 19 Permanent magnet 20 Magnetic fluid 21 Connection member 22 Communication space 25 Intake Pipeline

Claims (2)

鉛直方向に配設され、上端から下端にまで貫通する吸引路を有する回転軸を備えたモータと、
前記回転軸の上端に取り付けられ、前記吸引路に連通する吸引口を有し、基板を吸引保持する基板保持部と、
前記回転軸の下端部の下方に配設された吸気口を有し、前記吸引路の下端から空気を外部に導く吸気管路と、
前記吸気管路の前記吸気口が連結されるとともに前記回転軸の下端部が遊嵌される連通空間を有する連結部材と、
前記連結部材の前記連通空間を形成する内周面と前記回転軸の下端部の外周面との隙間に設けられた磁性流体シールとを備え
前記連結部材は、
前記回転軸の下端部の周囲を取り囲みかつ前記磁性流体シールを保持する環状の凹部を有し、前記モータの下端面に取り付けられるシール保持部材と、
前記シール保持部材の下端に連結され、前記吸気管路の前記吸気口と前記回転軸の前記吸引路とを連通させる空間を有する接続部材とを含むことを特徴とする回転式基板処理装置。
A motor provided with a rotating shaft that is arranged in the vertical direction and has a suction path that penetrates from the upper end to the lower end;
A substrate holding part attached to the upper end of the rotating shaft, having a suction port communicating with the suction path, and holding the substrate by suction;
An intake pipe disposed below a lower end portion of the rotating shaft, and an intake pipe for guiding air to the outside from the lower end of the suction path;
A connecting member having a communication space to which the intake port of the intake pipe is connected and the lower end of the rotating shaft is loosely fitted;
A magnetic fluid seal provided in a gap between an inner peripheral surface forming the communication space of the connecting member and an outer peripheral surface of a lower end portion of the rotating shaft ;
The connecting member is
A seal holding member that has an annular recess surrounding the lower end of the rotating shaft and holding the magnetic fluid seal, and is attached to the lower end surface of the motor;
A rotary substrate processing apparatus comprising: a connecting member connected to a lower end of the seal holding member and having a space for communicating the intake port of the intake pipe and the suction path of the rotary shaft .
雰囲気を上下に仕切る平板状のベース部材をさらに備え、
前記モータは、前記ベース部材より下方側の雰囲気中に前記回転軸の前記下端部が位置するように前記ベース部材に固定されたことを特徴とする請求項1記載の回転式基板処理装置。
It further comprises a flat base member that partitions the atmosphere up and down,
The rotary substrate processing apparatus according to claim 1, wherein the motor is fixed to the base member so that the lower end portion of the rotary shaft is positioned in an atmosphere below the base member.
JP23489697A 1997-08-29 1997-08-29 Rotary substrate processing equipment Expired - Fee Related JP3664856B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23489697A JP3664856B2 (en) 1997-08-29 1997-08-29 Rotary substrate processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23489697A JP3664856B2 (en) 1997-08-29 1997-08-29 Rotary substrate processing equipment

Publications (2)

Publication Number Publication Date
JPH1176904A JPH1176904A (en) 1999-03-23
JP3664856B2 true JP3664856B2 (en) 2005-06-29

Family

ID=16978010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23489697A Expired - Fee Related JP3664856B2 (en) 1997-08-29 1997-08-29 Rotary substrate processing equipment

Country Status (1)

Country Link
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