JPH115888A - Resin composition for sealing semiconductor - Google Patents
Resin composition for sealing semiconductorInfo
- Publication number
- JPH115888A JPH115888A JP16284697A JP16284697A JPH115888A JP H115888 A JPH115888 A JP H115888A JP 16284697 A JP16284697 A JP 16284697A JP 16284697 A JP16284697 A JP 16284697A JP H115888 A JPH115888 A JP H115888A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- resin composition
- resin
- inorganic filler
- epoxy resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、低温輸送及び低温
保管、使用前の常温放置が不要の半導体封止用樹脂組成
物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for semiconductor encapsulation which does not require low-temperature transportation, low-temperature storage, and standing at room temperature before use.
【0002】[0002]
【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品は、熱硬化性樹脂で封止されている
が、特に集積回路は耐湿性や電気特性に優れるエポキシ
樹脂をフェノール樹脂で硬化させるエポキシ樹脂組成物
(以下、樹脂組成物という)が用いられている。ところ
がこれらの樹脂組成物は、硬化促進剤を均一に混合して
あり、常温だと緩やかに反応が進行し、時間の経過と共
に流動性が損なわれるので、樹脂組成物の輸送、及び保
管は低温で行われ、又、開封時の吸湿を避けるため使用
前に8〜24時間の常温放置が必要である。更に、常温
放置後の使用期限は1週間以内のものが多く、常温放置
して1週間以内に使用し切れない場合は、やむなく廃棄
することも少なくなかった。このような理由から、低温
輸送や低温保管、使用前の常温放置が不要な半導体封止
用樹脂組成物の開発が強く望まれているが、この課題を
解決する有効な手段、樹脂組成物の例はいまだ報告され
ていない。2. Description of the Related Art Conventionally, electronic components such as diodes, transistors, and integrated circuits are sealed with a thermosetting resin. In particular, an integrated circuit is obtained by curing an epoxy resin having excellent moisture resistance and electric characteristics with a phenol resin. An epoxy resin composition (hereinafter, referred to as a resin composition) is used. However, these resin compositions have a curing accelerator uniformly mixed therein, and the reaction proceeds slowly at room temperature, and the fluidity is impaired with the passage of time. In order to avoid moisture absorption at the time of opening, it is necessary to leave at room temperature for 8 to 24 hours before use. Furthermore, the shelf life after standing at room temperature is often within one week, and when the shelf life is not enough within one week after standing at room temperature, it is not uncommon to discard it without necessity. For these reasons, there is a strong demand for the development of a resin composition for semiconductor encapsulation that does not require low-temperature transport, low-temperature storage, or standing at room temperature before use. No examples have been reported yet.
【0003】[0003]
【発明が解決しようとする課題】本発明は、低温輸送及
び低温保管、使用前の常温放置が不要の半導体封止用樹
脂組成物を提供するものである。SUMMARY OF THE INVENTION The present invention provides a resin composition for semiconductor encapsulation which does not require low-temperature transportation, low-temperature storage, and standing at room temperature before use.
【0004】[0004]
【課題を解決するための手段】本発明は、(A)エポキ
シ樹脂、(B)フェノール樹脂硬化剤、(C)硬化促進
剤、(D)無機充填材を必須成分とする樹脂組成物にお
いて、(A)と、(D)の一部又は全部を溶融混練して
得られる最大粒径が3mm以下の粉体(E)と、
(B)、(C)、及び(D)の残部を溶融混練して得ら
れる最大粒径が1.5mm以下の粉体(F)を別々に分
けて梱包し、成形前に(E)と(F)を混合して用いる
ことを特徴とする半導体封止用樹脂組成物であり、この
樹脂組成物は常温輸送や常温保管しても、諸特性を損な
わないものである。The present invention provides a resin composition comprising (A) an epoxy resin, (B) a phenolic resin curing agent, (C) a curing accelerator, and (D) an inorganic filler as essential components. (A) and powder (E) having a maximum particle size of 3 mm or less obtained by melting and kneading a part or all of (D);
Powders (F) having a maximum particle size of 1.5 mm or less obtained by melting and kneading the remainder of (B), (C), and (D) are separately packaged, and before molding, (F) and (E) are mixed. A resin composition for encapsulating a semiconductor, characterized in that (F) is mixed and used, and this resin composition does not impair various properties even when transported or stored at room temperature.
【0005】[0005]
【発明の実施の形態】本発明の樹脂組成物は、エポキシ
樹脂と、フェノール樹脂硬化剤及び硬化促進剤を別々に
梱包することを最大の特徴としており、エポキシ樹脂の
エポキシ基と、フェノール樹脂のフェノール性水酸基及
び硬化促進剤とを接触させないように別々に梱包するこ
とにより、常温での輸送、保管を可能としている。従っ
て、それぞれの原材料の種類、特性等については特に限
定するものではないが、成分(A)と成分(B)、又は
成分(A)と成分(C)を溶融混練したり、同一の梱包
内に保存してはならない。この両者を接触させると、常
温でも緩やかにエポキシ基とフェノール性水酸基の反応
が進み、適正な流動性を維持することができなくなるた
め、冷蔵保管が必要となる。又、無機充填材は、粉体
(E)と粉体(F)のどちらか一方と溶融混練しても、
両方に分けて溶融混練しても差し支えないが、成形前の
混合の際の粉体(E)と粉体(F)の偏析や分級を避け
るためには両方に分けて混練した方が好ましい。これら
の粉体の粒度としては、粉体(E)の最大粒径が3mm
以下、粉体(F)の最大粒径が1.5mm以下が好まし
い。粉体(E)の最大粒径が3mmを越えると、小型の
成形機を用いて混合した粉体を少量ずつ使用する場合、
1成分の偏析が大きくなり、均一な硬化反応が起こら
ず、離型不良や信頼性の低下につながるので好ましくな
い。又、粉体(F)の最大粒径が1.5mmを越える
と、局所的に硬化促進剤が多くなり、金型内での均一な
流動及び硬化挙動が得られず、充填不良、離型性不良、
信頼性不良等につながるので好ましくない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The resin composition of the present invention is characterized in that an epoxy resin, a phenol resin curing agent and a curing accelerator are separately packaged. By separately packing the phenolic hydroxyl group and the curing accelerator so that they do not come into contact with each other, transport and storage at room temperature are possible. Therefore, the types and properties of the respective raw materials are not particularly limited, but the components (A) and (B), or the components (A) and (C) are melt-kneaded or mixed in the same package. Must not be saved. When both are brought into contact with each other, the reaction between the epoxy group and the phenolic hydroxyl group proceeds slowly even at room temperature, and it becomes impossible to maintain proper fluidity. Therefore, refrigerated storage is required. Moreover, even if the inorganic filler is melt-kneaded with either the powder (E) or the powder (F),
It is possible to melt and knead both parts separately, but it is preferable to knead both parts separately in order to avoid segregation and classification of powder (E) and powder (F) during mixing before molding. As the particle size of these powders, the maximum particle size of the powder (E) is 3 mm.
Hereinafter, the maximum particle size of the powder (F) is preferably 1.5 mm or less. When the maximum particle size of the powder (E) exceeds 3 mm, when the powder mixed using a small molding machine is used little by little,
One component is undesirably segregated, and a uniform curing reaction does not occur, leading to poor mold release and reduced reliability. If the maximum particle size of the powder (F) exceeds 1.5 mm, the amount of the curing accelerator locally increases, so that uniform flow and curing behavior in the mold cannot be obtained, poor filling, and mold release. Poor sex,
This is not preferable because it leads to poor reliability and the like.
【0006】これらの粉体(E)と粉体(F)の粒子形
状については特に限定しないが、混合の際の偏析や分級
を考慮すると、両者の粒子形状は近似するものが好まし
い。梱包形態は、樹脂組成物が湿気や光にさらされなけ
れば特に限定しないが、梱包材としては、取り扱い作業
性に優れていることから、アルミ袋等が好ましい。The particle shapes of the powder (E) and the powder (F) are not particularly limited. However, in consideration of segregation and classification at the time of mixing, it is preferable that both have similar particle shapes. The packaging form is not particularly limited as long as the resin composition is not exposed to moisture or light, but as the packaging material, an aluminum bag or the like is preferable because of excellent handling efficiency.
【0007】以下、各成分について説明する。本発明に
用いるエポキシ樹脂、フェノール樹脂硬化剤、硬化促進
剤及び無機充填材は、半導体封止用エポキシ樹脂組成物
に、通常用いられるものと同一のものでよい。本発明に
用いるエポキシ樹脂としては、1分子中に2個以上のエ
ポキシ基を有し、常温で固形のものであれば特に限定す
るものではないが、例えば、ビスフェノール型エポキシ
化合物、ビフェニル型エポキシ化合物、フェノールノボ
ラック型エポキシ樹脂、クレゾールノボラック型エポキ
シ樹脂、アルキル変性トリフェノールメタン型エポキシ
樹脂等が挙げられ、これらは単独でも混合して用いても
よい。Hereinafter, each component will be described. The epoxy resin, phenolic resin curing agent, curing accelerator and inorganic filler used in the present invention may be the same as those usually used in epoxy resin compositions for semiconductor encapsulation. The epoxy resin used in the present invention is not particularly limited as long as it has two or more epoxy groups in one molecule and is a solid at room temperature. For example, a bisphenol type epoxy compound, a biphenyl type epoxy compound Phenol novolak type epoxy resin, cresol novolak type epoxy resin, alkyl-modified triphenolmethane type epoxy resin, and the like, and these may be used alone or in combination.
【0008】本発明に用いるフェノール樹脂硬化剤とし
ては、常温で固形のものであれば特に限定するものでは
ないが、例えば、フェノールノボラック樹脂、クレゾー
ルノボラック樹脂、ジシクロペンタジエン変性フェノー
ル樹脂、キシリレン変性フェノール樹脂、テルペン変性
フェノール樹脂等が挙げられ、これらは単独でも混合し
て用いてもよい。The phenolic resin curing agent used in the present invention is not particularly limited as long as it is solid at room temperature. Resins, terpene-modified phenolic resins and the like, which may be used alone or as a mixture.
【0009】粉体(E)と粉体(F)を混合した混合物
中のフェノール樹脂硬化剤の配合量としては、エポキシ
樹脂のエポキシ基数とフェノール樹脂のフェノール性水
酸基数の比が、0.8〜1.3となるようにするのが好
ましい。The amount of the phenol resin curing agent in the mixture of the powder (E) and the powder (F) is such that the ratio of the number of epoxy groups of the epoxy resin to the number of phenolic hydroxyl groups of the phenol resin is 0.8. It is preferable to set it to 1.3.
【0010】本発明に用いる無機充填材としては、例え
ば、溶融シリカ粉末、結晶シリカ粉末、アルミナ、窒化
珪素等が挙げられ、これらは単独でも混合して用いても
よい。粉体(E)と粉体(F)を混合した混合物中の無
機充填材の配合量は、成形性と信頼性のバランスから、
全樹脂組成物中に60〜90重量%が好ましい。The inorganic filler used in the present invention includes, for example, fused silica powder, crystalline silica powder, alumina, silicon nitride and the like, and these may be used alone or as a mixture. The amount of the inorganic filler in the mixture of the powder (E) and the powder (F) is determined based on the balance between moldability and reliability.
60 to 90% by weight of the total resin composition is preferred.
【0011】本発明に用いる硬化促進剤としては、エポ
キシ樹脂のエポキシ基とフェノール樹脂のフェノール性
水酸基との硬化反応を促進させるものであればよく、一
般に封止材料に使用されているものを広く使用すること
ができる。例えば、1,8−ジアザビシクロ(5,4,
0)ウンデセン−7、トリフェニルホスフィン、2−メ
チルイミダゾール等が挙げられ、これらは単独でも混合
して用いてもよい。The curing accelerator used in the present invention may be any one which promotes the curing reaction between the epoxy group of the epoxy resin and the phenolic hydroxyl group of the phenol resin. Can be used. For example, 1,8-diazabicyclo (5,4,
0) Undecene-7, triphenylphosphine, 2-methylimidazole, etc., and these may be used alone or in combination.
【0012】本発明の樹脂組成物は、(A)〜(D)成
分を必須成分とするが、これ以外に必要に応じて、シラ
ンカップリング剤、カーボンブラック等の着色剤、カル
ナバワックス等の離型剤、シリコーンオイル等の低応力
剤、三酸化アンチモン等の難燃剤等、種々の添加剤を適
宜配合しても差し支えない。本発明の樹脂組成物の内、
粉体(E)として、例えば、エポキシ樹脂、無機充填材
の一部又は全部、及び種々の添加剤の一部又は全部、粉
体(F)として、例えば、フェノール樹脂硬化剤、硬化
促進剤、無機充填材の残部、及び種々の添加剤の残部に
分け、各々をミキサー等を用いて十分に均一に混合した
後、更に加熱ロール、又はニーダー等で溶融混練し、冷
却後粉砕して得られ、その後、粉体(E)、粉体(F)
を別々に梱包する。粉体(E)、粉体(F)は常温に保
管し、半導体を封止する直前に両者を所定量ずつ混合
し、タブレット化して用いてもよいし、混合された状態
で用いてもよい。各々の粉体の製造方法については、特
に限定するものではない。以下、本発明を実施例で具体
的に説明する。本発明は、エポキシ樹脂と、フェノール
樹脂硬化剤及び硬化促進剤とを非接触の状態で梱包する
ことを特徴とするものであるが、以下の実施例に限定さ
れるものではない。The resin composition of the present invention contains the components (A) to (D) as essential components. In addition, if necessary, a silane coupling agent, a coloring agent such as carbon black, a carnauba wax or the like. Various additives such as a release agent, a low-stress agent such as silicone oil, and a flame retardant such as antimony trioxide may be appropriately compounded. Among the resin composition of the present invention,
As the powder (E), for example, epoxy resin, part or all of an inorganic filler, and part or all of various additives, as the powder (F), for example, a phenol resin curing agent, a curing accelerator, The remainder of the inorganic filler, and the rest of the various additives, after each is mixed sufficiently uniformly using a mixer, etc., further melt-kneaded with a heating roll, or a kneader, etc., cooled and then pulverized. , Then powder (E), powder (F)
Packing separately. The powder (E) and the powder (F) may be stored at room temperature, mixed with each other by a predetermined amount immediately before sealing the semiconductor, and used as a tablet or may be used in a mixed state. . The method for producing each powder is not particularly limited. Hereinafter, the present invention will be described specifically with reference to Examples. The present invention is characterized in that an epoxy resin, a phenol resin curing agent and a curing accelerator are packed in a non-contact state, but the present invention is not limited to the following examples.
【0013】 実施例1 1.配合A(粉体A) オルソクレゾールノボラック型エポキシ樹脂(軟化点55℃、エポキシ当量2 05)(以下、エポキシ樹脂という) 12.0重量部 溶融シリカ粉末(平均粒径13μm) 40.0重量部 カーボンブラック 0.1重量部 カルナバワックス 0.3重量部 2.配合B(粉体B) フェノールノボラック樹脂(軟化点65℃、水酸基当量104) 6.0重量部 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(以下、DBUという ) 0.2重量部 溶融シリカ粉末(平均粒径13μm) 40.0重量部 カーボンブラック 0.1重量部 シリコーンオイル 0.3重量部 三酸化アンチモン 1.0重量部 各々の配合A、配合Bをそれぞれミキサーを用いて常温
混合し、80〜100℃の加熱ロールで溶融混練し、冷
却後粉砕し、粉体A、粉体Bを得た。粉体Aの粒度は、
9メッシュオンが4重量%、9メッシュパス〜32メッ
シュオンが54重量%、32メッシュパスが42重量
%、最大粒径が2.7mmで、粉体Bの粒度は16メッ
シュオンが3重量%、16メッシュパス〜32メッシュ
オンが61重量%、32メッシュパスが36重量%、最
大粒径が1.2mmであった。最大粒径は、ふるい上に
残った粉体のうち、最大のものをノギスで測定して求め
た。Embodiment 1 1. Formulation A (powder A) Orthocresol novolak type epoxy resin (softening point 55 ° C., epoxy equivalent 205) (hereinafter referred to as epoxy resin) 12.0 parts by weight Fused silica powder (average particle size 13 μm) 40.0 parts by weight Carbon black 0.1 parts by weight Carnauba wax 0.3 parts by weight 2. Formulation B (powder B) Phenol novolak resin (softening point 65 ° C., hydroxyl equivalent 104) 6.0 parts by weight 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU) 0.2 part by weight Parts Fused silica powder (average particle size 13 μm) 40.0 parts by weight Carbon black 0.1 part by weight Silicone oil 0.3 part by weight Antimony trioxide 1.0 part by weight Each of compounding A and compounding B was mixed using a mixer The mixture was mixed at room temperature, melt-kneaded with a heating roll at 80 to 100 ° C., cooled and pulverized to obtain powder A and powder B. The particle size of the powder A is
9 mesh on is 4% by weight, 9 mesh pass to 32 mesh on is 54% by weight, 32 mesh pass is 42% by weight, maximum particle size is 2.7mm, and particle size of powder B is 16 mesh on is 3% by weight. , 16 mesh pass to 32 mesh on were 61% by weight, 32 mesh pass was 36% by weight, and the maximum particle size was 1.2 mm. The maximum particle diameter was determined by measuring the largest one of the powder remaining on the sieve with a caliper.
【0014】評価方法 スパイラルフロー:粉体Aと粉体Bをそれぞれ500g
計量した後、ビニール袋内でよく混合し、EMMI−I
−66に準じた金型を使用し、低圧トランスファー成形
機を用いて、175℃、射出圧力70kgf/cm2、
保圧時間120秒の条件で成形し、製造直後及び30日
後のスパイラルフローを測定した(単位はcm)。30
日後のスパイラルフローは、粉体Aと粉体Bを別々に常
温保管(25℃)して測定した。 スパイラルフロー残存率:製造直後のスパイラルフロー
に対し、常温保管30日後のスパイラルフローが90%
以上のものを合格(○)、90%未満のものを不合格
(×)と判定した。 離型性:スパイラルフロー測定時に、硬化物がエアーを
掛けただけで離型するものを合格(○)、治具を用いて
剥がさなければ離型しないものは不合格(×)と判定し
た。Evaluation method Spiral flow: 500 g each of powder A and powder B
After weighing, mix well in plastic bag, EMMI-I
Using a mold conforming to -66, using a low-pressure transfer molding machine, 175 ° C, injection pressure 70 kgf / cm 2 ,
Molding was performed under the conditions of a dwelling time of 120 seconds, and the spiral flow was measured immediately after production and after 30 days (unit: cm). 30
The spiral flow after the day was measured by storing powder A and powder B separately at room temperature (25 ° C.). Spiral flow residual ratio: Spiral flow after storage for 30 days at room temperature is 90% of spiral flow immediately after production
The above samples were judged as acceptable (○), and those with less than 90% were judged as unacceptable (X). Releasability: When the spiral flow was measured, the cured product that was released only by blowing air was judged as acceptable (O), and the one that did not release without peeling using a jig was judged as unacceptable (X).
【0015】実施例2〜6 、比較例1〜6 実施例1と同様にして、粉体を製造し、実施例1と同様
にして評価した。結果を表1、表2に示す。なお、比較
例2は、配合を粉体Aと粉体Bとに分けずに、一度に混
合して樹脂組成物とするものである。Examples 2 to 6 and Comparative Examples 1 to 6 Powders were produced in the same manner as in Example 1 and evaluated in the same manner as in Example 1. The results are shown in Tables 1 and 2. In Comparative Example 2, the resin composition was mixed at once without dividing the mixture into powder A and powder B.
【表1】 [Table 1]
【0016】[0016]
【表2】 [Table 2]
【0017】[0017]
【発明の効果】本発明に従うと、常温輸送、常温保管が
可能で、従来の冷蔵設備や、吸湿を避けるための常温放
置が不要で、取り扱い作業性に優れた半導体封止用樹脂
組成物が得られる。According to the present invention, a resin composition for semiconductor encapsulation which can be transported at normal temperature and stored at normal temperature, does not require conventional refrigeration equipment, and does not need to be left at normal temperature to avoid moisture absorption, and has excellent workability. can get.
フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 23/29 H01L 23/30 R 23/31 Continued on the front page (51) Int.Cl. 6 Identification code FI H01L 23/29 H01L 23/30 R 23/31
Claims (1)
樹脂硬化剤、(C)硬化促進剤、(D)無機充填材を必
須成分とする樹脂組成物において、(A)と、(D)の
一部又は全部を溶融混練して得られる最大粒径が3mm
以下の粉体(E)と、(B)、(C)、及び(D)の残
部を溶融混練して得られる最大粒径が1.5mm以下の
粉体(F)を別々に分けて梱包し、成形前に(E)と
(F)を混合して用いることを特徴とする半導体封止用
樹脂組成物。1. A resin composition comprising (A) an epoxy resin, (B) a phenolic resin curing agent, (C) a curing accelerator, and (D) an inorganic filler as essential components, wherein (A) and (D) The maximum particle size obtained by melting and kneading part or all of
The following powder (E) and the powder (F) having a maximum particle size of 1.5 mm or less obtained by melting and kneading the rest of (B), (C) and (D) are separately packaged. A resin composition for encapsulating a semiconductor, wherein (E) and (F) are mixed and used before molding.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16284697A JPH115888A (en) | 1997-06-19 | 1997-06-19 | Resin composition for sealing semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16284697A JPH115888A (en) | 1997-06-19 | 1997-06-19 | Resin composition for sealing semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH115888A true JPH115888A (en) | 1999-01-12 |
Family
ID=15762362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16284697A Pending JPH115888A (en) | 1997-06-19 | 1997-06-19 | Resin composition for sealing semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH115888A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8957532B2 (en) | 2010-09-02 | 2015-02-17 | Sumitomo Bakelite Company Limited | Resin compact, method for producing resin compact, resin composition, method for producing resin composition and electronic component device |
-
1997
- 1997-06-19 JP JP16284697A patent/JPH115888A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8957532B2 (en) | 2010-09-02 | 2015-02-17 | Sumitomo Bakelite Company Limited | Resin compact, method for producing resin compact, resin composition, method for producing resin composition and electronic component device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH11269350A (en) | Semiconductor device | |
JPH10130468A (en) | Epoxy resin composition for sealing semiconductor | |
JPH115888A (en) | Resin composition for sealing semiconductor | |
JP2003128759A (en) | Epoxy resin composition and semiconductor device | |
JP2000230110A (en) | Epoxy resin composition and semiconductor device | |
JP2000103938A (en) | Epoxy resin composition for sealing and semiconductor device | |
JPH1180510A (en) | Resin composition for sealing semiconductor | |
JP2951092B2 (en) | Epoxy resin composition | |
JP3582771B2 (en) | Epoxy resin composition and semiconductor device | |
JPH05299537A (en) | Epoxy resin composition | |
JP2991850B2 (en) | Epoxy resin composition | |
JP2954412B2 (en) | Epoxy resin composition | |
JPH115889A (en) | Resin composition for sealing semiconductor | |
JP2954415B2 (en) | Epoxy resin composition | |
JPH10226744A (en) | Resin composition for semiconductor sealing | |
JP2001085576A (en) | Manufacture of epoxy resin composition for sealing semicondcutor, and epoxy resin composition for sealing the semiconductor and semiconductor device obtained thereby | |
JPH08311159A (en) | Epoxy resin composition, its production and semiconductor device using the same | |
JP2000281869A (en) | Epoxy resin composition and semiconductor device | |
JP3032067B2 (en) | Epoxy resin composition | |
JP2534296B2 (en) | Semiconductor device | |
JP2991847B2 (en) | Resin composition for semiconductor encapsulation | |
JP2003277475A (en) | Epoxy resin composition for sealing semiconductor and semiconductor device | |
JPH1180509A (en) | Epoxy resin composition and semiconductor device | |
JP2994127B2 (en) | Epoxy resin composition | |
JP2954413B2 (en) | Epoxy resin composition |