JPH11340114A - Substrate heat-treating device and its maintenance method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the efficiency of the maintenance work of the heat-treating section of a substrate heat-treating device. SOLUTION: When a worker presses a maintenance mode button, the evacuation of the atmosphere in an exterior cover 20 is started and, at the same time, a shutter 24 is opened to open a substrate passing port 23. Consequently, outside air flows in each treating section 3-6 in the cover 20 from the port 23 and the chambers 31 and hot plates 32 in the sections 3-6 are quickly cooled. When the temperatures in the sections 3-6 become a maintenance-possible temperature or lower, it is informed that maintenance work can be conducted on the sections 3-6 by actuating an alarm. Since the outside air is introduced, the treating sections 3-6 can be cooled quickly.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate heat treatment apparatus for performing heat treatment on substrates to be processed such as a semiconductor wafer, a glass substrate for a liquid crystal display device, and a glass substrate for a plasma display panel (PDP), and maintenance thereof. About the method.

[0002]

2. Description of the Related Art For example, in a manufacturing process of a liquid crystal display device, there are a process of drying a substrate having moisture or a substrate after applying a photoresist, and a process of exposing or developing a photoresist film. A step of performing a baking process on the substrate is included. Therefore, in a manufacturing process of a liquid crystal display device, a substrate heat treatment apparatus having a heat treatment section for performing heat treatment on a substrate may be used.

[0003] The heat processing section is provided with a hot plate having a built-in heating element such as a planar heater. The hot plate is housed in a chamber that can be pulled out from the inside of the apparatus cover. The substrate to be processed is
It is carried into the chamber and placed on a hot plate,
In this state, a heat treatment is performed by the heat generated from the hot plate.

[0004] Therefore, after the substrate is subjected to the heat treatment, the temperature of the hot plate, the chamber, and the like are high. Therefore, the worker who performs maintenance of the heat treatment unit stops the power supply to the hot plate, pulls out the chamber from the inside of the apparatus cover, and performs maintenance work by wearing thick heat-resistant gloves. .

[0005] When heat-resistant gloves are not worn,
The maintenance work is started after the temperature of the high-temperature hot plate or the chamber is naturally radiated to lower the temperature to such a degree that the fingers are not burned (hereinafter referred to as “maintenance temperature”), for example, about 40 to 50 ° C. Was.

[0006]

However, when wearing thick heat-resistant gloves, it is difficult to pick up small parts such as screws, so that it is difficult to replace / adjust or clean the small parts, and the maintenance work is troublesome. Will take. on the other hand,
If a high-temperature hot plate, a chamber, or the like is naturally radiated and the temperature is lowered, it takes a long time from the end of the heat treatment to the start of the maintenance work. In any case, in the conventional substrate heat treatment apparatus, the efficiency of the operation when performing maintenance of the heat treatment section was very poor.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a substrate heating apparatus capable of solving the above-mentioned technical problems and improving the work efficiency during maintenance of a heating section, and a maintenance method thereof.

[0008]

Means for Solving the Problems and Effects of the Invention According to the first aspect of the present invention, there is provided a substrate heating processing section for heating a substrate, and a substrate heating section in the substrate heating processing section. A cooling fluid introduction unit for introducing a cooling fluid into the substrate heating unit before the substrate heating unit is maintained after the heating process is completed. It is.

According to this configuration, prior to the start of the maintenance of the substrate heating section, the cooling fluid is introduced into the substrate heating section by the cooling fluid introducing means. Thus, the high-temperature substrate heat-treated portion after the heat treatment can be quickly cooled. Therefore, compared with the case where the temperature of the substrate heat treatment unit is lowered by natural heat radiation, it is possible to shorten the time required for lowering the substrate heat treatment unit to a temperature at which an operator does not burn after the heat treatment is completed. Can,
Work efficiency during maintenance can be improved.

[0010] In addition, the maintenance worker starts the maintenance work of the substrate heat treatment section after the substrate heat treatment section is sufficiently cooled, thereby performing the work without wearing thick heat-resistant gloves. Can be. Therefore,
Replacement / adjustment and cleaning of small parts such as screws can be easily performed, and the labor required for maintenance work can be reduced.

The cooling fluid introduction means starts the introduction of the cooling fluid to the substrate heating processing section in response to pressing of a maintenance mode button for instructing the start of cooling of the substrate heating processing section. It may be. Further, after the heating of a fixed number of substrates is completed in the substrate heating unit, the introduction of the cooling fluid into the substrate heating unit may be automatically started. When the latter configuration is adopted, the labor for instructing the start of cooling of the substrate heating processing unit is omitted, so that the labor required for maintenance can be further reduced.

Further, the cooling fluid introduced into the substrate heating section may be a gas such as relatively low-temperature air / nitrogen gas or room temperature outside air, or a liquid such as relatively low-temperature cooling water. There may be. In other words, if the cooling fluid is lower in temperature than the members constituting the substrate heating section or the atmosphere inside the substrate heating section, the cooling fluid is transferred to the members constituting the substrate heating section or the atmosphere inside the substrate heating section. With the introduction, the members constituting the substrate heating section or the atmosphere inside the substrate heating section can be cooled, and the maintenance of the substrate heating section can be performed.

According to a second aspect of the present invention, in the substrate heating apparatus according to the first aspect, the cooling fluid introducing means includes an exhaust means for exhausting the substrate from the substrate heating section. is there.

According to this structure, the cooling fluid can be introduced into the substrate heating section by exhausting the atmosphere of the substrate heating section by the exhaust means. For example, if an opening communicating the substrate heating unit with the outside thereof is provided, the substrate heating unit can be cooled to room temperature by the exhaust unit without providing a gas supply unit for forcibly supplying a cooling gas inside the substrate heating unit. Outside air can be introduced, and the substrate heating section can be cooled with a simpler configuration.

According to a third aspect of the present invention, there is provided a substrate passing port through which a substrate passes when loading or unloading a substrate from or to the substrate heating processing section, and opening and closing means for opening and closing the substrate passing port. 3. The substrate heating apparatus according to claim 2, wherein the exhaust unit exhausts the gas from the substrate heating unit in a state where the substrate passage opening is opened by the opening / closing unit. It is.

According to this structure, by operating the exhaust means with the substrate passage opening open, outside air can be introduced from the substrate passage opening into the substrate heating processing section. The part can be cooled. Therefore, the apparatus configuration can be simplified as compared with a configuration in which a dedicated cooling fluid is supplied to the substrate heating section, and the apparatus cost can be reduced.

Preferably, the exhaust means exhausts air through an exhaust port facing the internal space of the substrate heating section at a position opposed to the substrate passage port. The outside air that has flowed in from the mouth passes through substantially the entire area of the substrate heating unit and is guided to the exhaust unit, so that the substrate heating unit can be cooled more quickly.

According to a fourth aspect of the present invention, in the substrate heating apparatus according to any one of the first to third aspects, the apparatus further comprises a temperature detecting means for detecting a temperature of the substrate heating section. is there.

According to this configuration, the temperature of the substrate heating section can be detected by the temperature detecting means. For example, an apparatus according to claims 5 to 7 can be provided based on the temperature of the substrate heating section detected by the temperature detecting means. In addition, when the temperature detected by the temperature detecting means is equal to or higher than a predetermined maintenance-possible temperature, a lock mechanism of a maintenance opening provided in the substrate heating unit is operated, and In response to the detected temperature dropping to a predetermined maintenance-possible temperature, the lock mechanism may be released to allow maintenance inside the substrate heating unit.

According to a fifth aspect of the present invention, the cooling fluid introduction unit introduces a cooling fluid into the substrate heating unit based on the temperature of the substrate heating unit detected by the temperature detecting unit. 5. The substrate heating apparatus according to claim 4, further comprising an introduction termination control unit that terminates the process.

The introduction completion control unit responds to the temperature of the substrate heating processing unit detected by the temperature detection unit having decreased to a predetermined maintenance-possible temperature. The introduction of the cooling fluid to the processing section may be terminated.

According to this configuration, in response to the temperature of the substrate heating processing unit dropping to the predetermined maintenance-possible temperature, the introduction of the cooling fluid into the substrate heating processing unit by the cooling fluid introducing means is automatically performed. Can be terminated.

When the introduction of the cooling fluid into the substrate heating section has been completed, the temperature of the substrate heating section has fallen to the maintenance possible temperature. The operator is not burned in the substrate heating section. Therefore, the worker
Since the work can be performed without wearing thick heat-resistant gloves, fine parts such as screws can be easily replaced / adjusted and cleaned, and the labor required for maintenance work can be reduced.

According to a sixth aspect of the present invention, there is provided a notifying means for notifying that maintenance of the substrate heating section can be started based on the temperature of the substrate heating section detected by the temperature detecting section. The substrate heating apparatus according to claim 4, further comprising:

The notifying means is capable of starting maintenance of the substrate heating processing unit in response to the temperature of the substrate heating processing unit detected by the temperature detecting means having fallen to a predetermined maintainable temperature. It may be a notification of the fact.

According to this configuration, it is notified that the maintenance of the substrate heating unit can be started, so that the maintenance worker can start the maintenance operation in a state where the substrate heating unit is not sufficiently cooled. Can be prevented.

The notification means may sound to notify that the maintenance of the substrate heating section can be started, or may indicate that the maintenance of the substrate heating section can be started. It may be displayed.
In the case where a configuration in which the maintenance can be started is notified by sound, even if the maintenance worker is away from the substrate heat treatment apparatus, it is possible to recognize that the maintenance work can be started. .

[0028] The invention according to claim 7 further comprises a temperature display means for displaying the temperature of the substrate heating section detected by the temperature detection means. 4. The substrate heating apparatus according to item 1.

According to this configuration, since the temperature of the substrate heating unit is displayed, the maintenance worker can determine whether or not the substrate heating unit has been sufficiently cooled based on the display. . Therefore, by starting the maintenance work after confirming that the substrate heating section has been sufficiently cooled, it is possible to eliminate the risk of the operator being burned by the high-temperature substrate heating section.

The invention according to claim 8 is characterized in that after the substrate heating processing in the substrate heating apparatus is completed, a cooling fluid is introduced into the substrate heating apparatus to cool the substrate heating apparatus, and then the substrate heating apparatus is cooled. A maintenance method for a substrate heat treatment apparatus, wherein the maintenance of the treatment apparatus is performed.

According to this method, the same effect as that of the first aspect can be obtained.

[0032]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view showing an external configuration of a substrate heat treatment apparatus to which a substrate heat treatment apparatus according to one embodiment of the present invention is applied. FIG. 2 is a cross-sectional view showing a simplified internal configuration of the substrate heat treatment apparatus shown in FIG. This substrate heat treatment apparatus is an apparatus for performing a heating process and a cooling process on a substrate S such as a glass substrate for a liquid crystal display device, and an operation panel 1 including operation keys and a display is disposed on the front surface. The lower part 2 of the apparatus, the six processing units 3, 4, 5, 6, 7, 8 installed on the upper surface of the lower part 2, and the loading / unloading of the substrate S to / from these processing units 3 to 8. And the transfer robot 9.

The processing units 3 to 8 are accommodated in the outer cover 20 in a state where the processing units 3 to 8 are stacked in two rows in three stages. The exterior cover 20 is formed in a rectangular parallelepiped shape whose front surface (the surface opposite to the surface facing the transfer robot 9) is open. The internal space of the exterior cover 20 is divided into two parts by a partition plate 21 along the vertical plane, and each divided part is further divided into three upper and lower stages by two shelf plates 22 arranged horizontally. It is divided into six parts. The processing units 3 to 8 are respectively housed in six divided parts in the exterior cover 20.

Upper and middle processing units 3, 4, 5, 6
Are substrate heating processing units for performing a heating process on the substrate S, and each include a substantially rectangular parallelepiped chamber 31 and a hot plate 32 disposed in the chamber 31.

The chamber 31 is disposed on a slide plate 33 which can be pulled out from the front surface of the exterior cover 20 to the near side. When maintenance of each of the processing units 3, 4, 5, and 6 is performed, By pulling out the slide plate 33, the chamber 31 can be pulled out from the exterior cover 20 to perform an operation. Slide plate 3
A front plate 34 extending in the vertical direction is connected to the front edge of the front cover 3. The front plate 34 is provided on the open front surface of the exterior cover 20 with the slide plate 33 accommodated in the exterior cover 20. Portions facing the processing units 3, 4, 5, and 6 can be closed.

On the right side of the chamber 31 in FIG.
A slot-shaped chamber opening 35 for loading / unloading the substrate S into / from the chamber 31 is formed. Correspondingly, a portion of the exterior cover 20 facing the chamber opening 35 is provided with the substrate S for each of the processing units 3, 4, 5, and 6.
A slot-like substrate passage port 23 for carrying in / out the substrate is formed. Each processing unit 3 by the transfer robot 9
The substrates S carried in / out to 4, 5, and 6 are placed in the substrate passage 2
Through the chamber 3 and the chamber opening 35, it is placed on or removed from the hot plate 32 in the chamber 31. Hot plate 32
Has a built-in heating means such as a planar heater, and the substrate S placed on the hot plate 32 is subjected to a heating process by heat generated from the heating means.

The lower processing units 7 and 8 are substrate cooling processing units for performing cooling processing on the substrate S, and include a substantially rectangular parallelepiped chamber 41 and a cool plate 42 disposed in the chamber 41. I have.

The chamber 41 is disposed on a slide plate 43 which can be pulled out from the front surface of the exterior cover 20 to the near side. When the maintenance of the processing units 7 and 8 is performed, the slide plate 43 is moved. By pulling out, the chamber 41 can be pulled out from the exterior cover 20 to perform an operation. A front plate 44 extending in the vertical direction is connected to the front end edge of the slide plate 43. The front plate 44 connects the slide plate 43 to the exterior cover 2.
In the state where the outer cover 20 is accommodated, the portions of the open front surface of the exterior cover 20 facing the processing units 7 and 8 can be closed.

On the right side of the chamber 41 in FIG.
A slot-shaped chamber opening 45 for loading / unloading the substrate S into / from the chamber 41 is formed. Correspondingly, the substrate S is loaded / unloaded into each of the processing units 7 and 8 in a portion of the exterior cover 20 facing the chamber opening 45.
A slot-like substrate passage port 23 for carrying out is formed. The substrate S carried into / out of each of the processing units 7 and 8 by the transfer robot 9 is transferred to the cool plate 4 in the chamber 41 through the substrate passage port 23 and the chamber opening 45.
2 or removed from the cool plate 42. The cool plate 42 incorporates a cooling means such as a cooling water pipe or an electronic cooling / heating element (for example, a Peltier element), and performs a cooling process on the substrate S mounted on the cool plate 42.

In connection with each substrate passage opening 23 formed in the outer cover 20, a shutter 24 for opening and closing the substrate passage opening 23 is provided. The shutter 24 is opened and closed by an opening / closing drive mechanism including an air cylinder, for example, to open and close the substrate passage opening 23 and to close and close the substrate passage opening 23. When the substrate S is carried in / out of each of the processing units 3 to 8, the shutter 24 is opened and the substrate passage opening 23 is opened,
During the substrate processing in each of the processing units 3 to 8, the shutter 24 is closed and the substrate passage opening 23 is closed, so that the inside of each of the processing units 3 to 8 is substantially closed.

An exhaust port 25 for exhausting the atmosphere in the exterior cover 20 is formed on the bottom surface of the exterior cover 20 near the end opposite to the transfer robot 9 (front side). This exhaust port 25 is connected to exhaust equipment via an exhaust pipe 26. Each of the processing units 3 to 8 (the exterior cover 2)
An opening 33A for atmosphere circulation is formed in the slide plate 33 so that the atmosphere can be circulated between each of the divided portions within 0. In other words, the opening 33 </ b> A formed in the slide plate 33 is the processing unit 3 that houses the slide plate 33.
4, 5, 6 and the processing units 4, 7, 6, 8 immediately below them, respectively. Further, an opening 43A is formed in the slide plate 43 at a portion facing the exhaust port 25.

With this structure, the exhaust equipment is operated with the front plates 34 and 44 closing the front surface of the exterior cover 20 and the shutter 24 closing the substrate passage opening 23, whereby each of the processing units 3 to 8 is operated. The inside can be made negative pressure.
Thereby, the atmosphere in each of the processing units 3 to 8 is changed to the external cover 2.
0 can be prevented from leaking outside. In addition, by operating the exhaust equipment with the shutter 24 opened and the substrate passage opening 23 opened, outside air can be introduced from the substrate passage 23 into each of the processing units 3 to 8.

FIG. 3 is a block diagram showing a main part of an electrical configuration of the substrate heat treatment apparatus. This substrate heat treatment apparatus includes a control unit 51 including a CPU, a RAM, and a ROM. The operation of each part of the substrate heat treatment apparatus is controlled based on, for example, a program stored in a ROM.

An operation panel 1 provided on the front of the lower part 2 of the apparatus is connected to the control unit 51, and a command signal from the operation panel 1 is inputted. More specifically, the operation panel 1 includes a plurality of operation keys 11 including keys for instructing processing conditions in each of the processing units 3 to 8, and maintenance of the processing units 3, 4, 5, and 6. Prior to the start, a maintenance mode button 12 for instructing the start of cooling of the processing units 3, 4, 5, and 6 is provided. Command signals from a plurality of operation keys 11 and a maintenance mode button 12 are input to the control unit 51.

The control section 51 is further connected to six temperature sensors 52 as temperature detecting means for detecting the temperatures in the processing sections 3 to 8. A signal is input. The temperature sensor 52 is provided in the chamber 3 provided in each of the processing units 3 to 8.
1 and 41 or one for the hot plate 32 and one for the cool plate 42.

The control unit 51 controls the operation of the opening / closing drive mechanism 27 for opening and closing the shutter 24 and the exhaust equipment 28 for exhausting the atmosphere in the exterior cover 20 based on the above input signals. Further, based on the detection signals input from the temperature sensors 52 provided in the respective processing units 3 to 8, six temperature indicators 13,
The display of 14, 15, 16, 17, 18 is controlled. That is, each of the processing units 3 to 3 detected by the six temperature sensors 52
The temperature in the display unit 8 is displayed on the temperature display units 13 to 18 corresponding to the processing units 3 to 8, respectively.

The control unit 51 includes processing units 3, 4, 5,
6 is controlled based on the output of the temperature sensor 52 provided for each of the processing units 3, 4, 5, and 6. . The temperature display lamps 36, 37, and 38 are configured by green, yellow, and red lamps, respectively. Control unit 51
When the temperature detected by the temperature sensor 52 is equal to or lower than the temperature at which maintenance is possible (for example, 40 ° C.), the temperature sensor 5
A green temperature display lamp 36 disposed on the front plate 34 of the processing unit provided with 2 is turned on. When the temperature detected by the temperature sensor 52 is within a temperature range of, for example, 40 ° C. to 50 ° C., the yellow temperature display lamp 3 provided on the front plate 34 of the processing unit provided with the temperature sensor 52
7 is turned on. For example, when the temperature is equal to or higher than 50 ° C., the red temperature display lamp 38 provided on the front plate 34 of the processing unit provided with the temperature sensor 52 is turned on.

The control section 51 further controls the operation of the alarm 19 provided on the operation panel 1. Alarm 19
Is for notifying that maintenance of the processing units 3, 4, 5, and 6 can be started. The control unit 51 presses the maintenance mode button 12 and
After the cooling of the processing units 5 and 6 is started, the alarm 19 is activated in response to the fact that the temperature in the processing units 3, 4, 5 and 6 has become equal to or lower than the maintenance possible temperature.

When the maintenance mode button 12 is pressed, the control unit 51 prohibits the heating means incorporated in the hot plate 32 and the operation of the transfer robot 9 from entering the processing units 3 to 8. Thus, during maintenance of the processing units 3 to 8, it is possible to prevent the operator from being burned due to the heat generated by the heating unit, and from contacting the operator with the transfer robot 9.

Referring to FIG. 1 to FIG. 3, prior to the start of the maintenance of the processing units 3, 4, 5, and 6 as the substrate heating processing units, the high-temperature processing units 3, 4, 5, and 6 are cooled. The processing will be described. Immediately after the processing of the substrate S in the processing units 3, 4, 5, and 6, the temperature of the chamber 31 and the hot plate 32 in each of the processing units 3, 4, 5, and 6 becomes high due to heat generated from the hot plate 32. ing. Therefore, when performing maintenance of the processing units 3, 4, 5, and 6, the operator presses the maintenance mode button 12 to start cooling the processing units 3, 4, 5, and 6.

When the maintenance mode button 12 is pressed by the operator, the control unit 51
With reference to the output of the temperature sensor 52 provided in each of the temperature sensors 5 and 6, one of the three color temperature display lamps 36, 37 and 38 is turned on based on the output of the temperature sensor 52.
For example, immediately after the completion of the heat treatment in the processing units 3, 4, 5, and 6, the temperature in each of the processing units 3, 4, 5, and 6 becomes 5 degrees.
Since the temperature is 0 ° C. or more, the red temperature display lamp 38
Lights up. In addition, regardless of whether the maintenance mode button 12 is pressed, the control unit 51 determines whether the maintenance mode button 12 is pressed based on the output of the temperature sensor 52 of each of the processing units 3, 4, 5, and 6.
Any of the three color temperature display lamps 36, 37, 38 may be turned on.

The control section 51 displays the temperatures detected by the temperature sensors 52 provided in the processing sections 3 to 8 on the temperature indicators 13, 14, 15, 16, 17, and 18, respectively. . Thereafter, the display of the temperature indicators 13 to 18 is rewritten according to the change in the temperature detected by each temperature sensor 52.

Next, the control unit 51 controls the exhaust equipment 28 to start exhausting the atmosphere in the outer cover 20.
In addition, the control unit 51 controls the opening / closing drive mechanism 27 to open the shutter 24 and open the substrate passage ports 23 of the processing units 3, 4, 5, and 6. As a result, outside air flows into each of the processing units 3, 4, 5, and 6 in the exterior cover 20 from the opened substrate passage opening 23, and the processing unit 3 and the processing unit 3
The chambers 31, 4, and 6 and the hot plate 32 are rapidly cooled. The control unit 51 may always exhaust the atmosphere in the outer cover 20 without controlling the exhaust equipment 28. In this case, during the processing of the substrate, the substrate passage opening 23 and the shutter 24 After the outside air flows into each of the processing units 3, 4, 5, and 6 from the minute gaps, the inside of the processing units is exhausted at a small flow rate. After the substrate processing is completed, after the maintenance mode button 12 is pressed, Substrate passage 2
3 is opened, the inside of the processing section is exhausted at a large flow rate, and outside air as a cooling fluid is introduced into the processing section.

After the introduction of the outside air into the exterior cover 20 starts,
The control unit 51 controls the temperature sensor 5 of each of the processing units 3, 4, 5, and 6.
2 is monitored, and when the detected temperature of the temperature sensor 52 becomes lower than 50 ° C., a red temperature display lamp 38 provided in a processing unit provided with the temperature sensor 52 is provided.
Is turned off, and the yellow temperature display lamp 37 is turned on. Further, the cooling of the processing units 3, 4, 5, and 6 proceeds, and the temperature sensor 52
If the temperature after the detection temperature becomes lower than the maintenance possible temperature of 40 ° C., the yellow temperature display lamp 37 provided in the processing unit provided with the temperature sensor 52 is turned off, and the green temperature display lamp 36 is turned off. Turn on.

Then, when the cooling of each of the processing units 3, 4, 5, and 6 proceeds further, and the temperature after detection by all the temperature sensors 52 provided in the processing units 3, 4, 5, and 6 becomes lower than 40 ° C. The control unit 51 stops the exhaust by the exhaust equipment 28 or controls the opening / closing drive mechanism 27 to close the substrate passage opening 23 with the shutter 24. And alarm 1
9 to notify that the maintenance work of each processing unit 3, 4, 5, 6 can be started. The worker starts the maintenance work after the notification by the alarm 19 is performed.

As described above, according to the configuration of this embodiment, when the maintenance mode button 12 is pressed before the maintenance of the processing units 3, 4, 5, and 6 as the substrate heating processing unit, the exterior cover The evacuation of the atmosphere inside 20 is started and the shutters 2 of the processing units 3, 4, 5, and 6 are opened.
4 is opened, and outside air is introduced from the opened substrate passage opening 23 to each of the processing units 3 to 6 in the exterior cover 20.
Thereby, the high-temperature chamber 31 and the hot plate 32 after the heat treatment can be quickly cooled. Therefore, compared with the case where the chamber 31 and the hot plate 32 are naturally radiated, the temperature of the chamber 31 and the hot plate 32 is set to such a degree that the operator does not get burned after the heat treatment in the processing units 3, 4, 5, 6 is completed. The time required for lowering the temperature to the above temperature can be reduced, and the work efficiency at the time of maintenance can be improved.

The maintenance work of the processing units 3, 4, 5, and 6 is started after the processing units 3, 4, 5, and 6 are sufficiently cooled. The work can be performed without attaching such as. Therefore, the operator can easily perform exchange / adjustment and cleaning of small parts such as screws, and can reduce the labor required for maintenance work.

Further, since the alarm 19 notifies that the maintenance work can be started, the operator can recognize that the maintenance work can be started even if the operator is away from the substrate heat treatment apparatus. it can.

Further, in the configuration of this embodiment, since the temperature indicators 13 to 18 for displaying the temperatures of the processing units 3 to 8 are provided, all the processing units 3 to 8 reach the maintenance-possible temperature. Even without waiting for the temperature to drop, maintenance can be performed in order from the processing unit whose temperature has become equal to or lower than the maintainable temperature based on the display of the temperature indicators 13 to 18. Therefore, work efficiency during maintenance can be further improved. Furthermore, each processing unit 3, 4, 5, 6
The three-color temperature display lamps 36, 37, and 38 for indicating the temperature state in each of the processing units 3, 4, 5, and 6
Are provided, the temperature display lamps 36, 3
On the basis of the blinking of 7, 38, maintenance can be performed in order from the processing unit whose temperature has become equal to or lower than the maintainable temperature.

Unlike the configuration according to this embodiment, when the operation panel 1 is provided on the side surface or the rear surface of the substrate heat treatment apparatus, that is, on the surface different from the side on which the maintenance work is performed, the operation panel 1 is not provided. If the temperature indicator lamps 36, 37, 38 are provided on the face plate 34, the processing units 3, 4,
It is convenient for the operator to check the temperatures of 5 and 6 because the operator does not need to go to the near side of the substrate heat treatment apparatus.

The three color temperature display lamps 36, 37,
38, processing units 3, 4,
Temperature conditions within 5 and 6 can also be represented. For example, when the temperature in the processing units 3, 4, 5, and 6 is 50 ° C. or more, the temperature display lamp is always turned on, and when the temperature is 40 ° C. to 50 ° C., the temperature display lamp blinks at a fixed cycle. When the temperature is lower than 40 ° C., the temperature display lamp may be turned off.

Further, in this embodiment, a configuration is described in which the cooling of the processing units 3, 4, 5, and 6 is started in response to the pressing of the maintenance mode button 12, for example. After the processing of the substrate S in all the processing units 3 to 8 is completed, the operation of the exhaust equipment 28 and the opening of the shutter 24 are automatically performed, and the processing units 3, 4, 5, and 6 are processed.
The cooling may be started. When this configuration is adopted, the labor for pressing the maintenance mode button 12 is omitted, so that the labor required for maintenance can be further reduced.

Further, in this embodiment, the processing units 3
After the cooling of 4, 5, 6 is started, each processing unit 3, 4,
In response to the temperature of 5, 6 dropping to the maintenance-possible temperature, the introduction of outside air into the exterior cover 20 is stopped. For example, the cooling of the processing units 3, 4, 5, 6 is started. The introduction of the outside air into the exterior cover 20 may be stopped in response to the elapse of the preset time after the start of the operation.

Further, introduction of outside air into the exterior cover 20 /
The stop is not limited to the configuration for controlling the operation of the exhaust equipment 28,
For example, a solenoid valve or an air valve for starting / stopping the exhaust from the inside of the outer cover 20 is interposed in the middle of the exhaust pipe 26, and the opening and closing of the solenoid valve and the air valve are controlled. May be achieved. As described above, the exhaust system 28 may be operated at all times, and the maintenance mode button 12 may be pressed to open the substrate passage port 23, thereby starting a large-volume exhaust.

Further, in this embodiment, the outside air is introduced into the exterior cover 20 by opening the substrate passage port 23.
An opening different from the opening 3 may be formed in the exterior cover 20, and the inside of the processing chamber 3 may be ventilated by opening and closing the opening. Further, when an opening different from the substrate passage opening 23 is formed, a cooling gas supply pipe for supplying a cooling gas cooled to a predetermined temperature is connected to the opening, and the inside of the outer cover 20 is connected. A configuration in which a cooling gas is introduced into the cooling device may be adopted.

The exterior cover 20 is constructed so that the atmosphere cannot be circulated between the processing units 3 to 8.
By connecting an exhaust pipe to each of the processing units 3 to 8, the atmosphere in each of the processing units 3 to 8 may be individually exhausted. In such a configuration, it is preferable that the exhaust pipe be connected to a position facing the substrate passage port 23 with the chambers 31 and 32 interposed therebetween. More specifically, the exhaust pipe is provided with openings 33A, 43A formed in the slide plates 33, 43.
It is good to be connected to. By doing so, the outside air flowing in from the substrate passage opening 23 passes through the chamber 31 and is guided to the exhaust pipe, so that the chamber 31 can be more appropriately cooled. More preferably, the exhaust pipe is connected to a side surface of the chamber 13 facing the chamber opening 35 with the hot plate 32 interposed therebetween. This allows
Since the outside air flowing from the substrate passage opening 23 passes through the inside of the chamber 31 and is guided to the exhaust pipe, the chamber 31 and the hot plate 32 can be cooled more favorably.

Further, in this embodiment, the processing units 3
Although the configuration in which the cooling units 4, 5, 6 are simultaneously cooled is taken as an example, the processing units 3, 4, 5, 6 may be individually cooled. That is, the maintenance mode button 12 is provided for each of the processing units 3, 4, 5, and 6, and in response to the pressing of the maintenance mode button 12, only the shutter 24 of the processing unit corresponding to the maintenance mode button 12 is opened. It may be constituted so that it may be. In this way, the processing units 3, 4, 5, and 6 can be individually maintained. In this case, in particular, as described above, each of the processing units 3 to 8
It is preferable that the exhaust pipes are connected to each other to individually exhaust the atmosphere in each of the processing units 3 to 8.

Further, the processing units 3, 4, 5, and 6 are not limited to a configuration in which a gas is introduced into the exterior cover 20 to cool the processing units 3, 4, 5, and 6. A cooling pipe for circulating the cooling liquid is provided, and in response to the pressing of the maintenance mode button 12, a cooling liquid is circulated through the pipe to cool the processing units 3, 4, 5, and 6. May be adopted. Specifically, each processing unit 3,
The cooling pipe is provided inside or on the surface of the hot plate 32 or the chamber 31 of 4, 5, or 6.

Further, when the temperature detected by the temperature sensor 52 is equal to or higher than a predetermined maintainable temperature (for example, 50 ° C.), the slide plate 33 provided in each of the processing units 3, 4, 5, and 6 slides. A lock mechanism for prohibiting the operation and prohibiting the opening of the front plate 34 is operated, and in response to the detected temperature falling below a predetermined maintenance-possible temperature, the lock mechanism is released and each of the lock mechanisms is released. The interior of the processing units 3, 4, 5, 6 may be maintained. In this way, the safety of the worker can be reliably ensured.

In this embodiment, an apparatus for processing a glass substrate for a liquid crystal display device is taken as an example. However, the present invention is directed to processing a glass substrate for a photomask, a semiconductor wafer, or another type of substrate. It can be applied to an apparatus for performing

In addition, various design changes can be made within the scope of the technical matters described in the claims.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an external configuration of a substrate heat treatment apparatus to which a substrate heat treatment apparatus according to one embodiment of the present invention is applied.

FIG. 2 is a cross-sectional view showing a simplified internal configuration of the substrate heat treatment apparatus.

FIG. 3 is a block diagram showing a main part of an electrical configuration of the substrate heat treatment apparatus.

[Explanation of symbols]

S Substrate 3,4,5,6 Substrate heating section 12 Maintenance mode button 13,14,15,16,17,18 Temperature display (Temperature display means, Notification means) 19 Alarm (Notification means) 23 Substrate passage port ( Cooling fluid introducing means) 24 shutter (opening / closing means, cooling fluid introducing means) 25 exhaust port (exhausting means, cooling fluid introducing means) 26 exhaust pipe (exhausting means, cooling fluid introducing means) 28 exhaust facility (exhausting means) 33A, 43A Openings 36, 37, 38 Temperature display lamps (temperature display means, notification means) 51 Control unit (introduction end control unit) 52 Temperature sensor (temperature detection means)

Claims (8)

[Claims] 1. A substrate heating section for heating a substrate, and after the substrate heating processing in the substrate heating section is completed,
And a cooling fluid introduction unit for introducing a cooling fluid into the substrate heating processing unit before maintenance of the substrate heating processing unit. 2. A substrate heating apparatus according to claim 1, wherein said cooling fluid introducing means includes exhaust means for exhausting said substrate heating processing section. 3. The exhaust system according to claim 1, further comprising a substrate passage opening through which the substrate passes when loading or unloading the substrate from or to the substrate heating section, and an opening / closing means for opening and closing the substrate passage opening. 3. The substrate heating apparatus according to claim 2, wherein the means exhausts gas from the substrate heating section while the substrate passage opening is opened by the opening / closing means. 4. The apparatus according to claim 1, further comprising a temperature detecting means for detecting a temperature of said substrate heating section.
4. The substrate heating apparatus according to any one of items 1 to 3. 5. An introduction end control section for terminating the introduction of a cooling fluid to said substrate heating section by said cooling fluid introduction section based on a temperature of said substrate heating section detected by said temperature detecting section. The substrate heating apparatus according to claim 4, further comprising: 6. A notifying unit for notifying that maintenance of the substrate heating unit can be started based on the temperature of the substrate heating unit detected by the temperature detecting unit. The substrate heat treatment apparatus according to claim 4 or 5, wherein 7. The substrate heating process according to claim 4, further comprising a temperature display unit for displaying the temperature of said substrate heating unit detected by said temperature detection unit. apparatus. 8. After the substrate heating process in the substrate heating apparatus is completed, a cooling fluid is introduced into the substrate heating apparatus to cool the substrate heating apparatus, and then the substrate heating apparatus is maintained. A maintenance method for a substrate heat treatment apparatus, comprising: