JPH11330774A - Electromagnetic wave shielding body - Google Patents

Electromagnetic wave shielding body

Info

Publication number
JPH11330774A
JPH11330774A JP13159698A JP13159698A JPH11330774A JP H11330774 A JPH11330774 A JP H11330774A JP 13159698 A JP13159698 A JP 13159698A JP 13159698 A JP13159698 A JP 13159698A JP H11330774 A JPH11330774 A JP H11330774A
Authority
JP
Japan
Prior art keywords
electromagnetic wave
wave shield
pattern
conductive material
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13159698A
Other languages
Japanese (ja)
Inventor
Yoshinori Suga
義訓 菅
Tomomi Nakano
智美 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP13159698A priority Critical patent/JPH11330774A/en
Publication of JPH11330774A publication Critical patent/JPH11330774A/en
Pending legal-status Critical Current

Links

Landscapes

  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the electromagnetic wave shielding performance and the see-through property of an image display device by providing a thin-film layer which consists of a transparent conductive material and a pattern layer consisting of a conductive material. SOLUTION: A plurality of straight line groups, that do not cross one another or a mesh-shaped pattern where the straight line groups cross form a continuous conductive layer in which region consisting of a low-resistance conductive material is continuous over the entire surface of a shielding body. Since the generation of a moire fringe or the like which adversely affects a display image can be suppressed, mutually discrete figures whose surface area is equal to or less than 1 cm2 can be formed. No pattern can be seen in those with a line width 10 of 5-20 μm and a pitch of 50-200 μm, thus preventing a display image from being affected. Either glass or resin can be used for a transparent base. With the transparent resin base, the resins can be formed in a film or sheet shape by extrusion molding or the like. By randomly changing the shape and a pitch 11 of the patterns, the interference with the scanning line fringe, stripe, or the like of the display image with a periodical property can be suppressed, thus highly maintaining the quality of the display image.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本願発明は、電磁波遮蔽体に
関する。詳しくは、電磁波遮蔽性はもとより、透視性に
優れ、画像表示装置の電磁波遮蔽フィルターに好適に用
いられる電磁波遮蔽体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetic wave shield. More specifically, the present invention relates to an electromagnetic wave shield having excellent electromagnetic wave shielding properties as well as excellent transparency, and which is suitably used for an electromagnetic wave shielding filter of an image display device.

【0002】[0002]

【従来の技術】従来より透視性を保ちながら電磁波を遮
蔽する方法として、導電性繊維や金属蒸着膜のエッチン
グ等によって得られる導電性メッシュを用いる方法、酸
化インジウム錫(以下ITOと略す)等の物質を、スパ
ッタリング等によって蒸着して得られる、透明導電性薄
膜を用いる方法等が知られている。しかしながら、CR
T、プラズマディスプレー等の画像表示装置に導電性メ
ッシュからなる電磁波遮蔽体を用いた場合には、輝度値
が大幅に低下し、特に高輝度化の困難なプラズマディス
プレーでは消費電力量増加、パネル短寿命化等を招き、
好ましくない。また、同時に狭視野角化やモアレ稿の発
生など、表示画像を著しく劣化させる問題も生じる。
2. Description of the Related Art Conventionally, as a method of shielding an electromagnetic wave while maintaining transparency, a method using a conductive mesh obtained by etching a conductive fiber or a metal deposition film, a method using indium tin oxide (hereinafter abbreviated as ITO), and the like. There is known a method of using a transparent conductive thin film obtained by evaporating a substance by sputtering or the like. However, CR
When an electromagnetic wave shield made of a conductive mesh is used for an image display device such as a plasma display or a plasma display, the luminance value is significantly reduced, and the power consumption is increased, especially in a plasma display in which it is difficult to increase the luminance, and the panel is short. Inviting longer life, etc.
Not preferred. At the same time, there is also a problem that the displayed image is significantly deteriorated, such as narrowing of the viewing angle and occurrence of moire.

【0003】一方、透明導電性薄膜による方法では表示
画像の劣化は比較的小さいものの、電磁波の遮蔽性が不
十分であり、十分な遮蔽性を得るためには膜厚を厚くす
る必要が生じ、輝度値の低下を招く問題がある。これら
の問題に対して、Ag等の高導電性金属を含んだ低抵抗
薄膜を使用し、解決しようとする試みあるが、複雑な蒸
着工程を必要とするためコスト増加を招いている。ま
た、正反射性の高導電性金属は、反射率を増加させる問
題も生じるため、簡便に、高効率かつ低コストで、表示
画像を劣化させることなく、電磁波を遮蔽する技術の出
現が待ち望まれていた。
On the other hand, in the method using a transparent conductive thin film, although the deterioration of a displayed image is relatively small, the shielding property against electromagnetic waves is insufficient, and it is necessary to increase the film thickness in order to obtain a sufficient shielding property. There is a problem that the brightness value is reduced. Attempts have been made to solve these problems by using a low-resistance thin film containing a highly conductive metal such as Ag, but this requires a complicated vapor deposition process, resulting in an increase in cost. In addition, since a highly reflective highly conductive metal causes a problem of increasing the reflectance, the emergence of a technology for shielding electromagnetic waves simply, at a high efficiency and at a low cost without deteriorating a display image is awaited. I was

【0004】[0004]

【発明が解決しようとする課題】本発明は、電磁波遮蔽
体に関する従来技術における前述の課題を解決すべくな
されたものであって、電磁波遮蔽性はもとより、透視性
に優れ、画像表示装置の電磁波遮蔽フィルター等に好適
に用いられる電磁波遮蔽体を提供することを目的とす
る。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems in the prior art relating to an electromagnetic wave shield, and has excellent electromagnetic wave shielding properties as well as excellent transparency. It is an object of the present invention to provide an electromagnetic wave shield suitably used for a shielding filter or the like.

【0005】[0005]

【課題を解決するための手段】本発明の要旨は透明基材
表面に、透明導電性物質からなる薄膜層と導電性物質か
らなる模様層とが設けられていることを特徴とする電磁
波遮蔽体に存する。
The gist of the present invention is to provide an electromagnetic wave shield characterized in that a thin film layer made of a transparent conductive material and a pattern layer made of a conductive material are provided on the surface of a transparent substrate. Exists.

【0006】[0006]

【発明の実施の形態】本発明において用いられる透明基
材としてはガラス、樹脂いずれも使用可能であるが、特
に軽量で加工性に優れた透明樹脂の利用が好適である。
具体的には、ポリエステル系樹脂、ポリカーボネート系
樹脂、ポリ(メタ)アクリル酸エステル系樹脂、脂環式
ポリオレフィン系樹脂、ポリスチレン系樹脂、ポリ塩化
ビニル系樹脂、ポリ酢酸ビニル系樹脂、ポリアリレート
系樹脂、ポリエーテルサルホン系樹脂等の熱可塑性樹脂
が挙げられる。
BEST MODE FOR CARRYING OUT THE INVENTION As the transparent substrate used in the present invention, any of glass and resin can be used, but it is particularly preferable to use a transparent resin which is lightweight and has excellent workability.
Specifically, polyester resin, polycarbonate resin, poly (meth) acrylate resin, alicyclic polyolefin resin, polystyrene resin, polyvinyl chloride resin, polyvinyl acetate resin, polyarylate resin And thermoplastic resins such as polyethersulfone resins.

【0007】本発明における透明樹脂基材は、これらの
樹脂を押し出し成形、カレンダー成形、圧縮成形、射出
成形等により溶融成形する方法や、溶剤に溶解させてキ
ャスティングする方法等の公知の方法によりフィルム状
またはシート状に成形したもので、その厚みは10μm
〜5mm程度である。なお、これら透明樹脂基材には、
一般に用いられている添加剤、例えば、フェノール系、
燐系等の酸化防止剤、ハロゲン系、燐系等の難燃剤、耐
熱安定剤、紫外線吸収剤、赤外線吸収剤、滑材、帯電防
止剤等が添加、コーティングされていても良い。
[0007] The transparent resin substrate in the present invention can be formed into a film by a known method such as extrusion molding, calender molding, compression molding, injection molding or the like, or a method of casting by dissolving in a solvent. Molded into a shape or sheet, the thickness is 10μm
About 5 mm. In addition, these transparent resin base materials include
Commonly used additives, for example, phenolic,
A phosphorus-based antioxidant, a halogen-based or phosphorus-based flame retardant, a heat stabilizer, an ultraviolet absorber, an infrared absorber, a lubricant, an antistatic agent, etc. may be added and coated.

【0008】本発明において用いられる透明導電性物質
からなる薄膜層として、代表的には酸化錫、酸化インジ
ウム、酸化アンチモン錫、アルミニウム酸化亜鉛、フッ
化酸化錫等の金属酸化物、金、銀、白金−パラジウム合
金等の金属からなる薄膜等を挙げることが出来る。コー
ティング法としては抵抗加熱蒸着、スパッタリング、イ
オンプレーティング、ケミカルベーパーデポジション等
の乾式プロセスを用いた薄膜、導電性微粒子分散液のス
プレーコーティング、スピンコーティング、ディップコ
ーティング、マイヤーバーコーティング、ロールコーテ
ィング等による湿式プロセスを用いた薄膜等いずれも使
用可能である。
As a thin film layer made of a transparent conductive material used in the present invention, typically, metal oxides such as tin oxide, indium oxide, antimony tin oxide, aluminum zinc oxide, tin fluoride oxide, gold, silver, Examples include a thin film made of a metal such as a platinum-palladium alloy. Coating methods include thin film using dry process such as resistance heating evaporation, sputtering, ion plating, chemical vapor deposition, spray coating of conductive fine particle dispersion, spin coating, dip coating, Mayer bar coating, roll coating, etc. Any of thin films using a wet process can be used.

【0009】特に、電磁波遮蔽性に優れた、低抵抗の、
均質な薄膜層を得るためには、乾式プロセスの利用が好
適である。透明導電性物質からなる薄膜層の膜厚は、要
求される物性、用途などにより異なるが、透明性から1
0〜500nm、より好ましくは50〜300nmであ
る。またスパッタリング等による薄膜の形成に際して、
透明基材との密着性を向上させるため、予め被薄膜形成
面にベースコート剤をコーティングしておくことが望ま
しい。
In particular, a low-resistance,
In order to obtain a uniform thin film layer, it is preferable to use a dry process. The thickness of the thin film layer made of a transparent conductive material varies depending on the required physical properties, applications, and the like.
It is 0 to 500 nm, more preferably 50 to 300 nm. When forming a thin film by sputtering or the like,
In order to improve the adhesiveness to the transparent substrate, it is desirable to coat the base coat agent on the surface on which the thin film is to be formed in advance.

【0010】本発明における導電性物質からなる模様は
金、銀、白金、パラジウム、ニッケル、銅、アルミニウ
ム等の金属単体、および、カーボンブラック、グラファ
イト等の炭素材等が用いられ、模様を構成する線の幅は
5〜500μm、より好ましくは5〜100μm、さら
に好ましくは5〜25μm、模様のピッチは10〜50
00μm、より好ましくは30〜3000μm、さらに
好ましくは50〜2000μmである。
In the present invention, the pattern made of a conductive substance is composed of a simple metal such as gold, silver, platinum, palladium, nickel, copper, or aluminum, or a carbon material such as carbon black or graphite. The line width is 5 to 500 μm, more preferably 5 to 100 μm, still more preferably 5 to 25 μm, and the pattern pitch is 10 to 50 μm.
The thickness is 00 μm, more preferably 30 to 3000 μm, and still more preferably 50 to 2000 μm.

【0011】また、これらの線の高さは、2〜15μm
程度であるのが、電磁波遮蔽性の面から好ましい。模様
の形成法は特に限定されず、導電性ペーストや導電性イ
ンキからなる塗料の印刷、導電性繊維の貼付、蒸着膜の
エッチング等を用いることが出来るが、特に、導電性微
粉末とバインダー樹脂からなる導電性塗料のスクリーン
印刷が模様の均一性、制御性に優れ、生産性に優れるこ
とから最も好適である。ここで、導電性微粉末としては
前記の材質が用いられ、これらの平均粒径は、通常、
0.01〜10μm程度である。
The height of these lines is 2 to 15 μm.
It is preferable from the viewpoint of electromagnetic wave shielding properties. The method of forming the pattern is not particularly limited, and printing of a paint made of a conductive paste or a conductive ink, sticking of a conductive fiber, etching of a deposited film, and the like can be used. Screen printing of a conductive paint made of is most preferable because of excellent pattern uniformity, controllability, and productivity. Here, the above-mentioned materials are used as the conductive fine powder, and their average particle size is usually
It is about 0.01 to 10 μm.

【0012】また、バインダー樹脂としては、アクリル
系樹脂、ポリエステル系樹脂、ポリ塩化ビニル系樹脂等
が用いられ、この導電部における導電性微粉末の含有量
は、バインダー樹脂との合計量に対して75〜95重量
%程度である。スクリーン印刷は、例えば、前記導電性
微粉末75〜95重量%、前記バインダー樹脂25〜5
重量%と、それらの100重量部に対して、トルエン、
キシレン、メチルエチルケトン、シクロヘキサノン等の
溶媒3〜65重量部、および、アニオン系、ノニオン系
界面活性剤等の分散剤1〜10重量部とから、1000
〜100000cps、好ましくは3000〜2000
0cps程度の粘度の導電性塗料を調製し、前記線幅お
よび模様ピッチの角形状等模様を焼き付けたレジスト被
膜を有するスクリーンを用いて、前記透明基材上に印刷
するという方法で行うことが出来る。
Further, as the binder resin, an acrylic resin, a polyester resin, a polyvinyl chloride resin or the like is used, and the content of the conductive fine powder in the conductive portion is based on the total amount with the binder resin. It is about 75 to 95% by weight. Screen printing is performed by, for example, 75 to 95% by weight of the conductive fine powder, 25 to 5% of the binder resin.
% By weight and 100 parts by weight thereof, toluene,
From 3 to 65 parts by weight of a solvent such as xylene, methyl ethyl ketone, or cyclohexanone, and 1 to 10 parts by weight of a dispersant such as an anionic or nonionic surfactant, is used as a solvent.
~ 100,000 cps, preferably 3000-2000
A conductive paint having a viscosity of about 0 cps is prepared, and a printing is performed on the transparent base material by using a screen having a resist coating obtained by printing a pattern such as the square of the line width and the pattern pitch. .

【0013】なお、この際、印刷に先立ち、透明基材表
面に、コロナ放電処理、プラズマ放電処理、火炎処理、
化学薬品処理、およびプライマー処理等の公知の表面処
理を施すことも出来る。薄膜と模様はいずれを先に設け
ても良い。本発明において、用いられている導電性物質
からなる模様とは、1つ以上の直線、または曲線から構
成される、前記の線幅、ピッチを有したものであれば、
パターンが見えず、表示画像に悪影響がないため、この
範囲において特に制限は無い。
At this time, prior to printing, a corona discharge treatment, a plasma discharge treatment, a flame treatment,
Known surface treatments such as a chemical treatment and a primer treatment can also be performed. Either the thin film or the pattern may be provided first. In the present invention, the pattern made of a conductive material used is composed of one or more straight lines, or curves, as long as it has the line width and the pitch,
There is no particular limitation in this range because the pattern is not visible and there is no adverse effect on the displayed image.

【0014】一例としては、図1、図2に示す、複数の
交差しない直線群または直線群が交差して得られるメッ
シュ状の模様が挙げられ、メッシュ状の模様は低抵抗の
導電性物質からなる領域が遮蔽体全面に渡って連続した
導電層を形成するため、高い電磁波遮蔽性を有した遮蔽
体を得るのに特に好適である。勿論直線のみならず曲線
群を用いても良い。
One example is a mesh-like pattern obtained by intersecting a plurality of non-intersecting straight line groups or straight line groups as shown in FIGS. 1 and 2. The mesh-like pattern is made of a low-resistance conductive material. Since the conductive region forms a continuous conductive layer over the entire surface of the shield, it is particularly suitable for obtaining a shield having high electromagnetic wave shielding properties. Of course, not only a straight line but also a curve group may be used.

【0015】また、表示画像に悪影響を及ぼすモアレ縞
等の発生を抑える為には、表面積1cm2 以下の互いに
離散化した図形の利用が好適である。ここで言う図形と
は例えば図3、図4、図5、図6に示す様な多数の角形
または円形からなる模様のことであり、さらに詳しく
は、多数の平行な直線群とそれらに交差する多数の平行
な直線群の少なくとも二つの直線群によって、三角形、
または正方形、長方形、菱形等の四角形の角形が隣接し
て描かれたもの等の他、例えば、亀甲状の角形の各々が
隣接して描かれたものであっても良く、さらに、種々の
角形または円形の各々が独立して描かれたものも含む。
In order to suppress the occurrence of moire fringes or the like which adversely affect the displayed image, it is preferable to use mutually discrete figures having a surface area of 1 cm 2 or less. The figure referred to here is, for example, a pattern composed of a large number of squares or circles as shown in FIGS. 3, 4, 5, and 6, and more specifically, a large number of parallel straight lines and intersecting them. A triangle, by at least two of a number of parallel straight lines,
Or, in addition to those in which squares such as squares, rectangles, and rhombuses are drawn adjacent to each other, for example, each of the turtle-shaped squares may be drawn adjacent to each other. Or, each of the circles includes one drawn independently.

【0016】特に、これらの模様の形状、ピッチをラン
ダムに変化させることにより、周期性を有する表示画像
の走査線縞、ストライプ等との干渉を抑え、表示画像の
品質を高く保つことが可能である。また、これらの模様
は入射電磁波に対して、一種のアンテナとしての役割を
果たし、電磁波遮蔽効果を発現しているため、サイズ、
形状を工夫することにより、特定の周波数帯域をより多
く遮蔽するように特性を変化させることも出来る。
In particular, by randomly changing the shape and pitch of these patterns, it is possible to suppress the interference of the display image having periodicity with scanning line stripes, stripes, and the like, and to keep the quality of the display image high. is there. In addition, these patterns play a role as a kind of antenna against the incident electromagnetic wave, and express the electromagnetic wave shielding effect, so the size,
By devising the shape, the characteristics can be changed so as to shield a specific frequency band more.

【0017】本発明の電磁波遮蔽体は、透明基材表面に
形成された導電性物質からなる層や模様の上に更に保護
フィルムが積層されているのが好ましく、その保護フィ
ルムとしては、前記透明樹脂基材の材料として挙げた樹
脂が好適に用いられ、それら樹脂をドライラミネート、
ウェットラミネート、押し出しラミネート等の公知の方
法により積層する。
In the electromagnetic wave shield of the present invention, it is preferable that a protective film is further laminated on a layer or pattern made of a conductive substance formed on the surface of the transparent base material. The resins mentioned as materials for the resin base material are preferably used, and these resins are dry-laminated,
Lamination is performed by a known method such as wet lamination or extrusion lamination.

【0018】上記の様にして得られた、本発明における
電磁波遮蔽体は、それのみでは電磁波遮蔽性が不十分
で、抵抗率の高い透明導電性物質からなるコート層が、
電磁波遮蔽性が高い導電性物質からなる模様と、オーム
接触を果たしているために、表面輝度や画質にほとんど
影響を与えない程度の微細な模様であっても、導電層全
体で見た平均抵抗率を著しく低減させる効果を発揮し、
高い電磁波遮蔽性を発現することが可能となる。
The electromagnetic wave shield of the present invention obtained as described above has a coating layer made of a transparent conductive material having a high resistivity and insufficient electromagnetic wave shielding properties by itself.
The average resistivity of the conductive layer as a whole, even if the pattern is made of a conductive material with high electromagnetic wave shielding and has a small pattern that has little effect on surface brightness or image quality due to ohmic contact. Has the effect of significantly reducing
It is possible to exhibit high electromagnetic wave shielding properties.

【0019】したがって、高い電磁波遮蔽性を備えなが
ら、透過画像への悪影響を小さく抑え、尚かつ、高い透
過性を有する電磁波遮蔽体を提供することが可能であ
り、これらの特徴は、CRT、プラズマディスプレイ、
エレクトロルミネッセンスディスプレイ、液晶ディスプ
レイ等の画像表示装置に用いる電磁波遮蔽フィルターと
して、特に、好適に使用可能である。また、近赤外線吸
収層、反射防止層、傷つき防止層等を、適宜、積層して
さらに高機能なフィルターを提供することも可能であ
る。
Therefore, it is possible to provide an electromagnetic wave shield having a high electromagnetic wave shielding property while suppressing the adverse effect on the transmitted image while having a high electromagnetic wave shielding property, and having a high transparency. display,
As an electromagnetic wave shielding filter used for an image display device such as an electroluminescence display and a liquid crystal display, it can be particularly suitably used. Further, a near-infrared absorbing layer, an antireflection layer, an anti-scratch layer, and the like can be appropriately laminated to provide a more sophisticated filter.

【0020】[0020]

【実施例】以下、本願発明を実施例によりさらに詳細に
説明するが、本願発明はその要旨を越えない限り、以下
の実施例に限定されるものではない。
EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist.

【0021】実施例1 ポリエチレンテレフタレート樹脂フィルム(厚み100
μm)の表面に、酸化インジウム(高純度化学社製ター
ゲット)をスパッタリングによって蒸着し、全光線透過
率80%の透明導電性物質からなるコート層を得た。該
コート層の表面にスクリーン印刷機(マイクロテック社
製)で、ステンレス製金網スクリーン(目開き25μ
m)を用いて、金微粉末を含有するデュポン社製特殊金
インクをスクリーン印刷することにより、線幅15μ
m、模様ピッチ1000μm、線高さ5μmで正方形模
様を分散して描いた導電性物質からなるパターン(図
4)を形成した。
Example 1 A polyethylene terephthalate resin film (thickness 100
μm), indium oxide (a target manufactured by Kojundo Chemical Co., Ltd.) was deposited by sputtering to obtain a coat layer made of a transparent conductive material having a total light transmittance of 80%. A stainless steel wire mesh screen (aperture 25 μm) was applied to the surface of the coat layer using a screen printing machine (manufactured by Microtec).
m), by screen-printing a special gold ink manufactured by DuPont containing gold fine powder, to obtain a line width of 15 μm.
m, a pattern pitch of 1000 μm, a line height of 5 μm, and a pattern (FIG. 4) made of a conductive material formed by dispersing and drawing a square pattern.

【0022】さらに、導電層の上に、ポリエチレンテレ
フタレート樹脂からなる厚み100μmの保護フィルム
を積層して電磁波遮蔽体とした。得られた電磁波遮蔽体
について、電磁波遮蔽性と透視性を評価し、結果を表1
に示した。なお、電磁波遮蔽性は、周波数30〜500
MHzの範囲での減衰量(dB)を測定した。また、透
視性は立てた電磁波遮蔽体を1m離れて目視で観察し、
模様が確認できない場合を○、確認できる場合を×とし
て評価した。
Further, a protective film made of polyethylene terephthalate resin and having a thickness of 100 μm was laminated on the conductive layer to obtain an electromagnetic wave shield. With respect to the obtained electromagnetic wave shielding body, the electromagnetic wave shielding property and the transparency were evaluated.
It was shown to. In addition, the electromagnetic wave shielding property has a frequency of 30 to 500.
The attenuation (dB) in the MHz range was measured. In addition, see through the electromagnetic wave shield that stands up 1m away visually,
The case where the pattern could not be confirmed was evaluated as ○, and the case where it could be confirmed was evaluated as ×.

【0023】実施例2 銀微粉末を含有する十条加工社製銀インク(JELCO
M SH−1)を用いたこと、正方形模様を線幅20μ
m、模様ピッチ1000μm、線高さ3μmで描いたこ
との他は実施例1と同様にして電磁波遮蔽体を製造し、
電磁波遮蔽性と透視性を測定し、結果を表1に示した。
Example 2 Silver ink (JELCO manufactured by Jujo Kako) containing fine silver powder
M SH-1) was used, and a square pattern was formed with a line width of 20 μm.
m, a pattern pitch of 1000 μm, and a line height of 3 μm, except that the electromagnetic wave shield was manufactured in the same manner as in Example 1,
The electromagnetic wave shielding property and the transparency were measured, and the results are shown in Table 1.

【0024】実施例3 線幅12μm、ピッチ1000μm、線高さ5μmなる
直線群と、これと直交する、同一形状を有する直線群と
からなるメッシュを導電性物質からなる模様として設け
たことの他は、実施例1と同様にして電磁波遮蔽体を製
造し、電磁波遮蔽性と透視性を測定し、結果を表1に示
した。
Embodiment 3 In addition to providing a mesh made up of a straight line group having a line width of 12 μm, a pitch of 1000 μm, and a line height of 5 μm, and a straight line group having the same shape and orthogonal to this, as a pattern made of a conductive material In the same manner as in Example 1, an electromagnetic wave shielding body was manufactured, and the electromagnetic wave shielding property and the transparency were measured. The results are shown in Table 1.

【0025】比較例1 導電性物質からなる模様を設けなかったことの他は、実
施例1と同様にして電磁波遮蔽体を製造し、電磁波遮蔽
性と透視性を測定し、結果を表1に示した。 比較例2 酸化インジウム錫(高純度化学社製ターゲット)のスパ
ッタリングを行なわずに、線幅100μm、模様ピッチ
を約6670μmとした正方形模様を設け、他の条件に
ついては実施例1と同様にして電磁波遮蔽体を製造し、
電磁波遮蔽性と透視性を測定し、結果を表1に示した。
Comparative Example 1 An electromagnetic wave shield was manufactured in the same manner as in Example 1 except that the pattern made of a conductive material was not provided, and the electromagnetic wave shield and the transparency were measured. The results are shown in Table 1. Indicated. Comparative Example 2 A square pattern having a line width of 100 μm and a pattern pitch of about 6670 μm was provided without performing sputtering of indium tin oxide (a target manufactured by Kojundo Chemical Co., Ltd.). Manufacturing shields,
The electromagnetic wave shielding property and the transparency were measured, and the results are shown in Table 1.

【0026】[0026]

【表1】 [Table 1]

【0027】[0027]

【発明の効果】本発明によれば、電磁波遮蔽性はもとよ
り、透視性に優れ、画像表示装置の電磁波遮蔽フィルタ
ー等に好適に用いられる電磁波遮蔽体を提供することが
出来る。
According to the present invention, it is possible to provide an electromagnetic wave shielding body which is excellent not only in electromagnetic wave shielding properties but also in transparency, and is suitably used for an electromagnetic wave shielding filter of an image display device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 導電性物質からなる模様の一例を示す。FIG. 1 shows an example of a pattern made of a conductive material.

【図2】 導電性物質からなる模様の一例を示す。FIG. 2 shows an example of a pattern made of a conductive material.

【図3】 導電性物質からなる模様の一例を示す。FIG. 3 shows an example of a pattern made of a conductive material.

【図4】 導電性物質からなる模様の一例を示す。FIG. 4 shows an example of a pattern made of a conductive material.

【図5】 導電性物質からなる模様の一例を示す。FIG. 5 shows an example of a pattern made of a conductive material.

【図6】 導電性物質からなる模様の一例を示す。FIG. 6 shows an example of a pattern made of a conductive substance.

【符号の説明】[Explanation of symbols]

10 線幅 11 ピッチ 10 line width 11 pitch

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 透明基材表面に、透明導電性物質からな
る薄膜層と導電性物質からなる模様層とが設けられてい
ることを特徴とする電磁波遮蔽体。
1. An electromagnetic wave shield comprising a transparent base material surface provided with a thin film layer made of a transparent conductive material and a pattern layer made of a conductive material.
【請求項2】 透明基材が透明樹脂であることを特徴と
する請求項1に記載の電磁波遮蔽体。
2. The electromagnetic wave shield according to claim 1, wherein the transparent substrate is a transparent resin.
【請求項3】 透明導電性物質からなる薄膜層が、透明
導電性物質の蒸着膜からなるものである請求項1又は2
に記載の電磁波遮蔽体。
3. The thin film layer made of a transparent conductive material is a film formed by depositing a transparent conductive material.
2. The electromagnetic wave shield according to claim 1.
【請求項4】 透明導電性物質が、酸化錫、酸化インジ
ウム錫、酸化アンチモン錫、アルミニウム酸化亜鉛、お
よびフッ化酸化錫からなる金属酸化物群から選択された
少なくとも1種である請求項1ないし3のいずれかに記
載の電磁波遮蔽体。
4. The transparent conductive substance is at least one selected from the group consisting of metal oxides consisting of tin oxide, indium tin oxide, antimony tin oxide, aluminum zinc oxide, and tin fluorinated oxide. 4. The electromagnetic wave shield according to any one of 3.
【請求項5】 導電性物質からなる模様層が、導電性微
粉末とバインダー樹脂を含有する塗料を線幅を5〜20
μm、ピッチを50〜2000μmとして直線又は曲線
に印刷して設けたものであることを特徴とする請求項1
ないし4のいずれかに記載の電磁波遮蔽体。
5. A pattern layer made of a conductive substance is coated with a paint containing a conductive fine powder and a binder resin so as to have a line width of 5 to 20.
2. A printing method according to claim 1, wherein the printing is performed on a straight line or a curved line with a pitch of 50 to 2000 .mu.m.
5. The electromagnetic wave shield according to any one of items 1 to 4.
【請求項6】 導電性物質からなる模様層が、導電性微
粉末とバインダー樹脂を含有する塗料を線幅を5〜20
μm、模様のピッチを50〜2000μmとして互いに
離散した表面積1cm2 以下の図形として印刷して設け
たものであることを特徴とする請求項1ないし4に記載
の電磁波遮蔽体。
6. A pattern layer made of a conductive substance is coated with a paint containing a conductive fine powder and a binder resin to have a line width of 5 to 20.
[mu] m, the electromagnetic wave shielding member according to claims 1, characterized in that those provided by printing a pitch pattern as discrete surface area 1 cm 2 following figures together as 50 to 2000 m 4.
【請求項7】 導電性物質からなる模様層が、スクリー
ン印刷によって形成されたものである請求項5又は6に
記載の電磁波遮蔽体。
7. The electromagnetic wave shield according to claim 5, wherein the pattern layer made of a conductive substance is formed by screen printing.
【請求項8】 導電性微粉末が、金、銀、白金、パラジ
ウム、およびニッケルからなる金属群から選択された少
なくとも1種である請求項5ないし7のいずれかに記載
の電磁波遮蔽体。
8. The electromagnetic wave shield according to claim 5, wherein the conductive fine powder is at least one selected from the group consisting of gold, silver, platinum, palladium, and nickel.
【請求項9】 導電性物質からなる薄膜層と模様層の上
に、更に保護層が積層されてなる請求項1ないし8のい
ずれかに記載の電磁波遮蔽体。
9. The electromagnetic wave shielding body according to claim 1, wherein a protective layer is further laminated on the thin film layer made of a conductive substance and the pattern layer.
【請求項10】 電磁波遮蔽体が画像表示装置用電磁波
遮蔽フィルターである請求項1ないし9のいずれかに記
載の電磁波遮蔽体。
10. The electromagnetic wave shield according to claim 1, wherein the electromagnetic wave shield is an electromagnetic wave shield filter for an image display device.
JP13159698A 1998-05-14 1998-05-14 Electromagnetic wave shielding body Pending JPH11330774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13159698A JPH11330774A (en) 1998-05-14 1998-05-14 Electromagnetic wave shielding body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13159698A JPH11330774A (en) 1998-05-14 1998-05-14 Electromagnetic wave shielding body

Publications (1)

Publication Number Publication Date
JPH11330774A true JPH11330774A (en) 1999-11-30

Family

ID=15061766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13159698A Pending JPH11330774A (en) 1998-05-14 1998-05-14 Electromagnetic wave shielding body

Country Status (1)

Country Link
JP (1) JPH11330774A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006098334A1 (en) * 2005-03-15 2006-09-21 Fujifilm Corporation Light-transmitting electromagnetic shielding film, optical filter and plasma television
JP2008306177A (en) * 2007-05-09 2008-12-18 Fujifilm Corp Electromagnetic wave shield film and optical filter
KR101067753B1 (en) 2008-07-18 2011-09-28 에스에스씨피 주식회사 Apparatus for printing a pattern of crossed portion using offset process and method thereof
JP2012150356A (en) * 2011-01-20 2012-08-09 Dainippon Printing Co Ltd Optical sheet, display device and method for manufacturing optical sheet
US8970515B2 (en) 2009-02-26 2015-03-03 3M Innovative Properties Company Touch screen sensor and patterned substrate having overlaid micropatterns with low visibility

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006098334A1 (en) * 2005-03-15 2006-09-21 Fujifilm Corporation Light-transmitting electromagnetic shielding film, optical filter and plasma television
JPWO2006098334A1 (en) * 2005-03-15 2008-08-21 富士フイルム株式会社 Translucent electromagnetic shielding film, optical filter, and plasma television
US7796327B2 (en) 2005-03-15 2010-09-14 Fujifilm Corporation Light transmitting electromagnetic wave shielding film, optical filter and plasma display panel
JP2008306177A (en) * 2007-05-09 2008-12-18 Fujifilm Corp Electromagnetic wave shield film and optical filter
US8426749B2 (en) 2007-05-09 2013-04-23 Fujifilm Corporation Electromagnetic shielding film and optical filter
US9000309B2 (en) 2007-05-09 2015-04-07 Fujifilm Corporation Electromagnetic shielding film
KR101067753B1 (en) 2008-07-18 2011-09-28 에스에스씨피 주식회사 Apparatus for printing a pattern of crossed portion using offset process and method thereof
US8970515B2 (en) 2009-02-26 2015-03-03 3M Innovative Properties Company Touch screen sensor and patterned substrate having overlaid micropatterns with low visibility
JP2012150356A (en) * 2011-01-20 2012-08-09 Dainippon Printing Co Ltd Optical sheet, display device and method for manufacturing optical sheet

Similar Documents

Publication Publication Date Title
JP5924784B2 (en) Conductive structure and manufacturing method thereof
EP0998182B1 (en) Electromagnetic shield plate
JP5075270B2 (en) Transparent conductive element, method for manufacturing the same, input device, and electronic device
KR101844134B1 (en) Conductive structure body, method for manufacturing thereof and electrode comprising conductive structure body
US20020046851A1 (en) Transparent electromagnetic radiation shield/near infrared ray cut material and methods of producing the same
US6188174B1 (en) Electromagnetic radiation shield panel and method of producing the same
JP5359736B2 (en) Electrode film for touch panel and touch panel
US11293088B2 (en) Conductive structure, method for manufacturing same, and electrode comprising conductive structure
US20020071934A1 (en) Transparent electromagnetic radiation shielding meterial
JP2013152578A (en) Transparent conductive element, input device, electronic apparatus and master disk for producing transparent conductive element
JPH11330774A (en) Electromagnetic wave shielding body
WO2012144643A1 (en) Transparent conductive element, input device, electronic apparatus, and manufacturing method for transparent conductive element
JP2002246788A (en) Transparent electromagnetic radiation shielding material
JP2004241761A (en) Sheet for electromagnetic wave shielding and manufacturing method therefor
JP6448947B2 (en) Multilayer thin film
JP2001196784A (en) Electromagnetic-shielding plate
JP4004161B2 (en) Transparent laminate and display filter using the same
JPH1126984A (en) Electromagnetic wave shield
JP2000077888A (en) Filter for plasma display and panel
CN114853362B (en) Coating method applied to glass panel and glass panel
JP2012064846A (en) Electromagnetic wave shield sheet, method of producing the same, and image display unit
KR20160069823A (en) Conductive structure body and method for manufacturing the same
JP2011071375A (en) Electromagnetic wave shielding material
JP2000323892A (en) Laminated material and electromagnetic shield using the same
JP2005064003A (en) Transparent electromagnetic wave shield and filter for display

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20051124

A131 Notification of reasons for refusal

Effective date: 20051129

Free format text: JAPANESE INTERMEDIATE CODE: A131

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060322