JPH11327145A5 - - Google Patents

Info

Publication number
JPH11327145A5
JPH11327145A5 JP1998132291A JP13229198A JPH11327145A5 JP H11327145 A5 JPH11327145 A5 JP H11327145A5 JP 1998132291 A JP1998132291 A JP 1998132291A JP 13229198 A JP13229198 A JP 13229198A JP H11327145 A5 JPH11327145 A5 JP H11327145A5
Authority
JP
Japan
Prior art keywords
acid
resin composition
photosensitive resin
positive photosensitive
action
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998132291A
Other languages
English (en)
Japanese (ja)
Other versions
JP3901342B2 (ja
JPH11327145A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP13229198A priority Critical patent/JP3901342B2/ja
Priority claimed from JP13229198A external-priority patent/JP3901342B2/ja
Publication of JPH11327145A publication Critical patent/JPH11327145A/ja
Publication of JPH11327145A5 publication Critical patent/JPH11327145A5/ja
Application granted granted Critical
Publication of JP3901342B2 publication Critical patent/JP3901342B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP13229198A 1998-05-14 1998-05-14 ポジ型感光性樹脂組成物 Expired - Fee Related JP3901342B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13229198A JP3901342B2 (ja) 1998-05-14 1998-05-14 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13229198A JP3901342B2 (ja) 1998-05-14 1998-05-14 ポジ型感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JPH11327145A JPH11327145A (ja) 1999-11-26
JPH11327145A5 true JPH11327145A5 (cg-RX-API-DMAC10.html) 2005-02-24
JP3901342B2 JP3901342B2 (ja) 2007-04-04

Family

ID=15077863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13229198A Expired - Fee Related JP3901342B2 (ja) 1998-05-14 1998-05-14 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JP3901342B2 (cg-RX-API-DMAC10.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
JP2002062667A (ja) * 2000-08-23 2002-02-28 Sumitomo Chem Co Ltd 微粒子量の低減されたフォトレジスト組成物の製造方法
JP4067284B2 (ja) * 2001-03-12 2008-03-26 富士フイルム株式会社 ポジ型レジスト組成物
JP4710193B2 (ja) * 2001-08-01 2011-06-29 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP3874092B2 (ja) 2001-12-26 2007-01-31 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
DE60238029D1 (de) 2001-12-27 2010-12-02 Shinetsu Chemical Co Resistzusammensetzung und Musterübertragungsverfahren
JP3912516B2 (ja) 2002-08-09 2007-05-09 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
US7189490B2 (en) * 2002-10-21 2007-03-13 Shipley Company, L.L.C. Photoresists containing sulfonamide component
JP4724465B2 (ja) 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
CN111393336A (zh) * 2020-03-09 2020-07-10 华东师范大学 磺胺类化合物及其无金属催化的构建方法和应用

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