JPH11307422A - Method for registering mask of semiconductor manufacture system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To realize a mask registration method for preventing the erroneous registration of a mask. SOLUTION: When a worker sets a mask in an exposing device (S1), and inputs a mask name to a system managing device (S2), a system managing device communicates the inputted mask name to the exposing device, and transmits a collation instruction (S3). The exposing device receives the collation instruction, reads a mask name bar code printed on the set mask, and collates the read mask with the communicated mask name (S4). When both the mask names are not made coincident, the aligner transmits incoincidence communication (S5), and the system managing device operates error display(S6), mask set retry (S7), mask name re-input (S8), and re-collation instruction (S9), and the exposing device collates the mask names again (S10), and when both the mask names are made coincident, the exposing device transmits coincidence communication (S11). The system managing device receives the coincidence communication, and registers the inputted mask name (S12).

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an IC pattern mask (hereinafter, simply referred to as an "exposure apparatus") set in an exposure apparatus of a semiconductor manufacturing system having an exposure apparatus and a system management apparatus. The present invention relates to a mask registration method of a semiconductor manufacturing system for registering a mask (hereinafter simply referred to as a mask) in the system management apparatus.

[0002]

2. Description of the Related Art As a semiconductor manufacturing system to which a conventional mask registration method is applied, a system (automatic transport) having a plurality of exposure apparatuses, a system management apparatus, and an automatic transport vehicle for transporting a lot of semiconductor wafers to the exposure apparatus is known. System). Here, the lot refers to a predetermined number of semiconductor wafers, and is a management unit of the semiconductor wafer.

An exposure apparatus uses a mask IC on a semiconductor wafer.
It transfers a pattern (exposes a semiconductor wafer) and has a plurality of slots for setting masks, so that a plurality of different masks can be set at the same time. Note that a plurality of slots are assigned slot numbers for identification. Further, a plurality of exposure apparatuses are assigned an apparatus number for identification, and, for example, the exposure apparatus of the apparatus number 1 is referred to as a first apparatus.

The system management apparatus manages all masks set in all exposure apparatuses and all lots in the system. This system management device includes mask management data in which the names of the masks set are registered for each of the exposure devices and for each slot number of each exposure device, and progress management data for each lot (for each lot). Data that manages the processing steps that have already been completed and the processing steps that will be performed next)
According to the mask management data and the progress management data, the operations of the automatic transport vehicle and the exposure apparatus are controlled by online communication, and the lot is exposed.

FIG. 6 is a diagram showing a communication and operation sequence of a semiconductor manufacturing system to which a conventional mask registration method is applied. MP3 in the figure indicates a mask registration process, and EP3
Indicates a lot exposure step.

[0006] The mask registration step MP3 will be described below.
The operator sets the mask in the slot of the exposure apparatus (step S41), and on the mask registration input screen of the system management apparatus, the name of the set mask, the apparatus number of the exposure apparatus in which the mask is set, and the slot in which the mask is set. When the number is input (step S42), the system management device registers the input mask name, device number, and slot number in the mask management data (step S42).
43). As described above, the mask name set in the exposure apparatus is registered in the mask management data of the system management apparatus.

Next, the lot exposure process EP3 will be described below. Based on the mask management data and the progress management data of the lot, the system management device aligns the exposure process and the lot, that is, the exposure process that can be performed with the set mask and the next exposure process that is performed. Exposure equipment and lot to be selected (step S44),
A lot transport instruction for setting the selected lot in the selected exposure apparatus is sent to the automatic transport vehicle (step S45). The automatic transporter transports the designated lot, and when the lot is set in the designated exposure apparatus (step S4).
6), and notifies the system management device of the end of the transport (step S47).

[0008] When the system management device receives the above-mentioned transport end notification, it notifies the selected exposure device of the name of the mask used for exposure and the slot number in which the mask is set, and sends a processing start instruction. Upon receiving the processing start instruction, the exposure apparatus loads the mask set in the notified slot number into the processing chamber, reads the mask name barcode printed on the mask, and reads the read mask name. Is compared with the notified mask name (step S49). The exposure apparatus starts exposure of the lot when the two mask names match.
If the two mask names do not match, the exposure apparatus notifies the system management apparatus that the result of the comparison of the mask names does not match (step S5).
0), an error occurs without starting the exposure of the lot, and the operator waits for a retry operation (waits for an error release operation) (step S51). Upon receiving the above-described mismatch notification, the system management apparatus performs an error display indicating that the mask set in the exposure apparatus is different from the registered mask, re-enters the mask name to the operator, and sets the set mask. (Step S52).

[0009]

However, in the above-described conventional mask registration step, the name of the mask set by the operator in the exposure apparatus or the slot number in which the mask is set is input to the system management apparatus by the mask. Incorrect mask name, slot number, or device number even if the name or slot number does not match, that is, if the operator enters the wrong mask name, slot number, or device number in the system management device. Is registered as it is in the mask management data.

The collation of whether the mask set in the exposure apparatus matches the mask registered in the system management apparatus is performed in the lot exposure step, and the above error occurs in the mask registration step. In such a case, the exposure apparatus stops operating without starting exposure, and waits for a retry operation by an operator.

When the mask registration step is completed normally, the lot exposure step is performed by automatic operation.
If an erroneous registration occurs in the mask registration process and an error occurs in the exposure process due to the erroneous registration, the retry operation by the operator is delayed because the automatic operation is performed, and the exposure apparatus stops during that time. In addition, there is a problem that the processing capacity of the lot is significantly reduced.

An object of the present invention is to solve such a conventional problem and to provide a mask registration method capable of preventing erroneous registration.

[0013]

In order to achieve the above object, a method for registering a mask in a semiconductor manufacturing system according to the present invention comprises:
In a mask registration method of a semiconductor manufacturing system for registering a mask set in the exposure apparatus of a semiconductor manufacturing system having an exposure apparatus and a system management apparatus in the system management apparatus, a mask is set in the exposure apparatus, and the name of the mask is set. When is input from the outside of the system to the system management device, reading the name barcode attached to the mask by the exposure device, and collating the input mask name with the read mask name, Registering the mask name in the system management apparatus only when both mask names match as a result of the comparison.

According to another aspect of the present invention, there is provided a method for registering a mask in a semiconductor manufacturing system, comprising: a semiconductor manufacturing system having an exposure apparatus and a system management apparatus, wherein the mask set in the exposure apparatus is registered in the system management apparatus. The method for registering a mask includes the steps of: when a mask is set in an exposure apparatus, reading a name barcode attached to the mask by the exposure apparatus; and registering the read mask name in a system management apparatus. It is characterized by the following.

[0015]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 FIG. 2 is a configuration diagram of a semiconductor manufacturing system to which a mask registration method according to the present invention is applied. The semiconductor manufacturing system of FIG.
A plurality of exposure apparatuses 1 (only one is shown in FIG. 2)
, A system management device 7, and an automatic transport vehicle 8 for transporting the lot to the exposure apparatus. The system management device 7 and the exposure device 1 are
(For example, a communication cable), and the system management device 7 and the automatic guided vehicle 8 are online-communicated by the communication transmission unit 11.

FIG. 3 is a schematic configuration diagram of the exposure apparatus 1. The exposure apparatus 1 includes a mask stocker 2 that can set a plurality of masks at the same time because it is necessary to use different masks for each type of semiconductor device to be manufactured and for each exposure step in a series of semiconductor device manufacturing steps. I have. The mask stocker 2 includes a plurality of slots 3, and one mask can be set in each slot 3. The mask stocker 2 in FIG. 3 has seven slots 3 and is assigned a slot number for identification. Here, slot numbers 1 to 7 are set in order from the upper slot 3. Although not shown, the exposure apparatus 1 communicates with the system management device 7 via the communication transmission unit 12 through a unit that reads a mask name barcode printed on the surface of the mask set in the slot 3. Means. It should be noted that a plurality of exposure apparatuses 1 are assigned apparatus numbers for identification. For example, the exposure apparatus of apparatus number 1 is referred to as a first apparatus.

The system management unit 7 manages all masks set in the exposure apparatus 1 and all lots in the system. The system management apparatus 7 includes mask management data in which the names of masks set are registered for each of the exposure apparatuses 1 and for each slot number of each exposure apparatus 1, and a series of manufacturing processes for each lot. In accordance with the mask management data and the progress management data, the operation of the automatic transport vehicle 8 and the exposure apparatus 1 is controlled in the exposure step, and the lot is exposed. Although not shown, the system management device 7 includes a unit for communicating with the automatic guided vehicle 8 via the communication transmission unit 11 and a unit for communicating with the system management device 7 via the communication transmission unit 12. And means for displaying a mask registration input screen and the like.

FIG. 1 is a diagram showing a communication and operation sequence of a semiconductor manufacturing system to which a mask registration method according to a first embodiment of the present invention is applied. In the figure, MP1 indicates a mask registration step, and EP1 indicates a lot exposure. The steps will be described.

The mask registration step MP1 will be described below.
An operator sets a mask in the slot 3 of the exposure apparatus 1 (step S1). On the mask registration input screen of the system management apparatus 7, the name of the set mask, the apparatus number of the exposure apparatus in which the mask is set, and the mask are set. When the set slot number is input (step S2), the system management device 7 sets the exposure device 1 of the input device number to the
To the input mask name and slot number, and send a collation instruction (step S3).

FIG. 4 is a view showing a mask registration input screen of the system management apparatus 7. The operator inputs the apparatus number of the exposure apparatus 1 in which the mask is set in the apparatus number input section 5 on the mask registration input screen 4 in FIG. 4, and inputs the mask name to the slot number in which the mask is set in the mask name input section 6. Enter In FIG. 4, a mask named "Mask A" is set in slot 3 of slot number 1 of exposure apparatus 1 of apparatus number 1, "Mask B" is set in slot number 2, and "Mask C" is set in slot number 3. This is a screen on which the user has input that is set.

Referring back to FIG. 1, when receiving the above collation instruction, the exposure apparatus 1 reads the mask name bar code printed on the mask set to the notified slot number, and reads the read mask name and the notification. The mask name is compared with the set mask name (step S4). If the two mask names do not match, the exposure apparatus 1
(Step S5). When the system management device 7 receives the inconsistency notification, it displays an error on the mask registration screen and prompts the operator to re-enter the mask name and reconfirm the set mask (step S6).

When the operator resets the mask in response to the error display (step S7) and re-enters the mask name, slot number, and device number (step S8), the system management device 7 resets the mask. The re-inputted mask name and slot number are notified to the exposure apparatus 1 of the input apparatus number, and a collation instruction is sent (step S).
9). Exposure apparatus 1 receives the above-mentioned collation instruction, reads the mask name barcode printed on the mask reset to the notified slot number, and again reads the read mask name and the notified mask name. (Step S10), and when the two mask names match, the system management device 7 is notified that the two mask names match as a result of the mask name comparison (step S11). When receiving the above-mentioned coincidence notification, the system management device 7 registers the re-input mask name, device number, and slot number in the mask management data (step S12). As described above, the mask name set in the exposure apparatus 1 is registered in the mask management data of the system management apparatus 7.

Next, the exposure step EP1 will be described below.
Based on the mask management data and the progress management data of the lot, the system management device 7 controls the exposure device 1 and the lot, that is, the exposure process that can be performed using the set mask, and the exposure process that is performed next, based on the mask management data and the lot progress management data. A lot is selected from the exposure apparatus 1 and the lot that matches (step S13), and a lot transfer instruction for setting the selected lot to the selected exposure apparatus 1 is sent to the automatic transport vehicle 8 (step S15).
The automatic transport vehicle 8 transports the designated lot, and when this lot is set in the designated exposure apparatus 1 (step S15), notifies the system management device 7 of the completion of the transport (step S16).

When the system management device 7 receives the above-mentioned transport end notification, it notifies the selected exposure device 1 of the name of the mask used for exposure and the slot number in which the mask is set, and issues a processing start instruction. Send (Step S1
7). Upon receiving the processing start instruction, the exposure apparatus 1 loads the mask set to the notified slot number into the processing chamber, and starts exposure of the lot set by the automatic transport vehicle 8 (step S18). . It should be noted that since the name of the mask set in the exposure apparatus 1 and the mask name registered in the system management apparatus 7 are matched in the mask registration process MP1 to confirm that the two mask names match, In the exposure step EP1, the exposure apparatus 1 starts exposure immediately after receiving the processing start instruction without checking the mask name. Therefore, in the exposure step EP1, the exposure apparatus 1 does not stop due to erroneous registration of the mask name.

As described above, according to the first embodiment, in the mask registration step MP1, a mask is set in the slot 3 of the exposure apparatus 1, and when the name of this mask is input to the system management apparatus 7, the mask is set. The mask name barcode printed on the mask is read by the exposure device 1, the input mask name is compared with the read mask name, and only when the two mask names match, the mask name is determined by the system. By registering the mask name in the management apparatus 7 and displaying an error when the two mask names do not match, an erroneous registration of the mask name can be prevented. 1 does not stop, and the operation rate of the exposure apparatus 1 can be improved.

Second Embodiment FIG. 5 is a diagram showing a communication and operation sequence of a semiconductor manufacturing system to which a mask registration method according to a second embodiment of the present invention is applied. MP2 in the figure indicates a mask registration step.
P2 indicates a lot exposure step. The configuration of the semiconductor manufacturing system to which the second embodiment is applied is the same as that of the semiconductor manufacturing system to which the first embodiment is applied (FIG. 2). A semiconductor manufacturing system to which the second embodiment is applied also has a plurality of exposure apparatuses 1.

The mask registration step MP2 will be described below.
When the operator sets the mask in the slot 3 of the exposure apparatus 1 (step S21), the exposure apparatus 1 reads the mask name barcode printed on the set mask (step S22), and reads the read mask name and the read mask name. The system management device 7 is notified of the slot number in which the mask is set (step S23). The system management device 7 registers the notified mask name and slot number and the device number of the exposure apparatus 1 that has transmitted the notification in the mask management data. (Step S24). From the above,
The mask name set in the exposure device 1 is automatically registered in the mask management data of the system management device 7. This allows
Even without performing the mask name comparison described in the first embodiment, the name of the mask set in the exposure apparatus 1 and the mask name registered in the system management apparatus 7 always match, and the mask name False registration can be prevented.

Next, the exposure step EP2 will be described below.
The system management apparatus 7 controls the exposure apparatus 1 whose exposure process matches based on the mask management data and the lot progress management data.
Then, a lot transfer instruction for setting the selected lot to the selected exposure apparatus 1 is sent to the automatic transfer vehicle 8 (step S26). The automatic transport vehicle 8 transports the designated lot, and after setting this lot in the designated exposure apparatus 1 (step S2).
7), the system management device 7 is notified of the end of the transport (step S28).

When the system management device 7 receives the transfer end notification, it sends a processing start instruction to the selected exposure device 1 (step S29). The exposure apparatus 1 starts exposure of the lot upon receiving the processing start instruction (step S30). Note that the name of the mask set in the exposure apparatus 1 always matches the mask name registered in the system management apparatus 7 according to the mask registration step MP2. Exposure starts immediately upon receiving the processing start instruction without checking the mask name. Therefore, in the exposure step EP2, the exposure apparatus 1 does not stop due to erroneous registration of the mask name.

According to the second embodiment, when a mask is set in the slot 3 of the exposure apparatus 1 in the mask registration step MP2, the mask name barcode printed on the set mask is exposed. By reading the mask name by the apparatus 1 and registering the mask name in the system management apparatus 7, erroneous registration of the mask name can be prevented. Therefore, in the exposure process EP2, the exposure apparatus 1 stops due to the erroneous registration of the mask name. Therefore, the operation rate of the exposure apparatus 1 can be improved. Further, the operation of inputting the mask name to the system management device 7 and the process of collating the name of the mask set in the exposure device 1 with the mask name input to the system management device 7 become unnecessary, so that a power saving effect can be expected. .

[0031]

As described above, according to the method of registering a mask in a semiconductor manufacturing system of the present invention, a mask is set in a slot of an exposure apparatus, and when the name of this mask is input to a system management apparatus, the mask is set. Read the name barcode attached to the mask by the exposure device,
The input mask name is compared with the read mask name, and only when both mask names match, by registering this mask name in the system management device, erroneous registration of the mask name can be prevented. In the exposure process, the exposure apparatus does not stop due to the incorrect registration of the mask name,
There is an effect that the operation rate of the exposure apparatus can be improved.

According to the mask registration method of another semiconductor manufacturing system of the present invention, when a mask is set in the slot of the exposure apparatus, the name bar code of the set mask is read by the exposure apparatus, and the mask is read. By registering the name in the system management device, incorrect registration of the mask name can be prevented, so that the exposure device does not stop due to the incorrect registration of the mask name in the exposure process, improving the operation rate of the exposure device There is an effect that can be made.
In addition, the work of inputting the mask name to the system management device,
In addition, since a step of collating the name of the mask set in the exposure apparatus with the name of the mask input to the system management apparatus becomes unnecessary, a labor-saving effect can be expected.

[Brief description of the drawings]

FIG. 1 is a diagram showing a communication and operation sequence of a semiconductor manufacturing system to which a mask registration method according to a first embodiment of the present invention is applied.

FIG. 2 is a configuration diagram of a semiconductor manufacturing system to which a mask registration method of the present invention is applied.

FIG. 3 is a schematic configuration diagram of an exposure apparatus.

FIG. 4 is a diagram showing a mask registration input screen of the system management apparatus.

FIG. 5 is a diagram showing a communication and operation sequence of a semiconductor manufacturing system to which a mask registration method according to a second embodiment of the present invention is applied.

FIG. 6 is a diagram showing a communication and operation sequence of a semiconductor manufacturing system to which a conventional mask registration method is applied.

[Explanation of symbols]

1 exposure apparatus, 3 slots, 7 system management apparatus, 12 communication transmission means, MP1, MP2 mask registration process.

Claims (7)

[Claims] 1. A mask registration method for a semiconductor manufacturing system, comprising: registering a mask set in an exposure apparatus of a semiconductor manufacturing system having an exposure apparatus and a system management apparatus in the system management apparatus. When the name of the mask is input from the outside of the system to the system management device, a step of reading the name barcode attached to the mask by an exposure device, and the input mask name and the read mask name A method of registering a mask in a semiconductor manufacturing system, comprising the steps of: collating; and registering the mask name in a system management apparatus only when both mask names match as a result of the collation. 2. The exposure apparatus has a plurality of slots in which a mask is set. In the step of reading the name bar code, the mask is set in the exposure apparatus, and the name of the mask and the set slot number are set. Is input from the outside of the system to the system management device, the name barcode attached to the mask is read by the exposure device, and the step of registering the mask name comprises: 2. The method according to claim 1, wherein the mask name and the slot number are registered in the system management device only when the addresses match. 3. The semiconductor manufacturing system has a plurality of exposure apparatuses, and in the step of reading the name bar code, a mask is set on the exposure apparatus, and the name of the mask, the set slot number, and the set mask number are set. When the device number of the exposed exposure device is input to the system management device from outside the system,
The name bar code attached to the mask is read by an exposure device, and the step of registering the mask name is performed only when both mask names match as a result of the comparison, the mask name,
3. The method according to claim 2, wherein the slot number and the device number are registered in a system management device. 4. The method according to claim 1, wherein the step of registering the mask name notifies an error outside the system when the two mask names do not match according to the result of the comparison. 3. The method for registering a mask in a semiconductor manufacturing system according to any one of 3. 5. A mask registering method for a semiconductor manufacturing system, comprising: registering a mask set in the exposure apparatus of a semiconductor manufacturing system having an exposure apparatus and a system management apparatus in the system management apparatus, wherein the mask is set in the exposure apparatus. Then, a method of reading a name barcode attached to the mask by an exposure device, and a step of registering the read mask name in a system management device, comprising: 6. The exposure apparatus has a plurality of slots in which a mask is set, and the step of registering the mask name includes the step of registering the read mask name and the slot number in which the mask is set. 6. A method for registering a mask in a semiconductor manufacturing system according to claim 5, wherein: 7. The semiconductor manufacturing system has a plurality of exposure apparatuses, and the step of registering the mask name includes the step of registering the read mask name, the slot number in which the mask is set, and the mask being set. 7. The method according to claim 6, wherein the device number is registered in a system management device.