JPH11287456A - High frequency heating equipment - Google Patents

High frequency heating equipment

Info

Publication number
JPH11287456A
JPH11287456A JP10086588A JP8658898A JPH11287456A JP H11287456 A JPH11287456 A JP H11287456A JP 10086588 A JP10086588 A JP 10086588A JP 8658898 A JP8658898 A JP 8658898A JP H11287456 A JPH11287456 A JP H11287456A
Authority
JP
Japan
Prior art keywords
heated
frequency
power supply
heating chamber
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10086588A
Other languages
Japanese (ja)
Other versions
JP3517825B2 (en
Inventor
Takayuki Hiramitsu
隆幸 平光
Masashi Osada
正史 長田
Tetsuya Miyamae
哲也 宮前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Home Appliance Co Ltd
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Home Appliance Co Ltd
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Home Appliance Co Ltd, Mitsubishi Electric Corp filed Critical Mitsubishi Electric Home Appliance Co Ltd
Priority to JP08658898A priority Critical patent/JP3517825B2/en
Publication of JPH11287456A publication Critical patent/JPH11287456A/en
Application granted granted Critical
Publication of JP3517825B2 publication Critical patent/JP3517825B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B40/00Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers

Landscapes

  • Constitution Of High-Frequency Heating (AREA)
  • Electric Ovens (AREA)
  • Control Of High-Frequency Heating Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To enlarge an effective space of a heating chamber by making a waveguide which transmits high frequency waves generated by a high frequency wave generator to the heating chamber opened at an approximately central portion of a lower portion of the heating chamber and setting the opening portion as a feed plane and mounting a pedestal for installing material to be heated made of a low dielectric material on the feed plane. SOLUTION: A rectangular waveguide 6 which transmits high frequency waves 7 generated by a high frequency wave generator 3 to a heating chamber 2 is disposed at a lower portion of the heating chamber 2, and a feed plane 8 which defines a boundary between the heating chamber 2 and the waveguide 6 is disposed at the center of the bottom portion of the heating chamber 2. On this feed plane 8, a pedestal 12 for installing a material 1 to be heated which is made of a low dielectric material is mounted. Furthermore, a physical quantity detecting means 4 which detects the weight, the shape or the like of the material, 1 to be heated is provided. Based on the result of detection, the high frequency generator 3 is controlled by control means 5. In this manner, by directly irradiating the high frequency wave from the central portion of the bottom surface of the material 1 to be heated, the lower portion of the material 1 to be heated is massively heated and hence, provided that the material 1 to be heated is a liquid, this liquid can be uniformly heated.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、加熱室底面に給電
面を設け、被加熱物の下部から高周波を照射し、高効率
で加熱する高周波加熱装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency heating apparatus in which a power supply surface is provided on the bottom surface of a heating chamber, high-frequency radiation is applied from below a heated object, and heating is performed with high efficiency.

【0002】[0002]

【従来の技術】図13は例えば特開平8−321376
号公報に開示されている第1従来例の高周波加熱装置を
示す縦断面図である。
2. Description of the Related Art FIG. 13 shows, for example, Japanese Patent Application Laid-Open No. 8-321376.
FIG. 1 is a longitudinal sectional view showing a high frequency heating device of a first conventional example disclosed in Japanese Patent Application Publication No. JP-A-2006-133125.

【0003】図13において、1は被加熱物、2は加熱
室、3は高周波の発生源である高周波発生器、4は被加
熱物1の物理量を検出する物理量検出手段であり、重量
センサ、電界プローブセンサ等がある。5は物理量検出
手段4の検出結果に基づいて高周波発生器3を制御する
制御部、6は高周波発生器3から加熱室2に高周波7を
送出させる導波管、8は導波管6と加熱室2の境界にあ
る給電面、9はターンテーブル、11はターンテーブル
9を回動させるモータ、12はターンテーブル9に支持
されて被加熱物1を設置する設置台である。
In FIG. 13, reference numeral 1 denotes an object to be heated, reference numeral 2 denotes a heating chamber, reference numeral 3 denotes a high-frequency generator serving as a high-frequency generation source, and reference numeral 4 denotes physical quantity detecting means for detecting the physical quantity of the object 1 to be heated. There is an electric field probe sensor and the like. 5 is a control unit for controlling the high frequency generator 3 based on the detection result of the physical quantity detection means 4, 6 is a waveguide for sending the high frequency 7 from the high frequency generator 3 to the heating chamber 2, and 8 is a waveguide for heating the waveguide 6 and heating. A power supply surface at the boundary of the chamber 2, 9 is a turntable, 11 is a motor for rotating the turntable 9, and 12 is an installation table that is supported by the turntable 9 and on which the object to be heated 1 is installed.

【0004】この第1従来例の高周波加熱装置におい
て、高周波発生器3で発生した高周波7は、導波管6を
伝搬して上下2ヶ所の給電面8より加熱室2に伝搬し、
加熱室2の内壁面に入射や反射を繰り返しながら、回動
するターンテーブル9上の設置台12に置かれた被加熱
物1に照射する。これにより、被加熱物1が加熱され
る。
In the high frequency heating apparatus of the first conventional example, the high frequency wave 7 generated by the high frequency generator 3 propagates through the waveguide 6 and from the upper and lower two feeding surfaces 8 to the heating chamber 2.
The object to be heated 1 placed on the installation table 12 on the rotating turntable 9 is irradiated while repeating incidence and reflection on the inner wall surface of the heating chamber 2. Thereby, the object to be heated 1 is heated.

【0005】このように、前述の第1従来例において
は、導波管6が加熱室2の側面に設置されて、給電面8
と被加熱物1との距離が遠くなっているため、給電面8
から加熱室2に入射した高周波7が直接被加熱物1に吸
収されず、加熱室2の内壁面に入射反射を繰り返した後
に被加熱物1に吸収される。そのため、エネルギーロス
が生ずるという難点がある。
As described above, in the above-mentioned first conventional example, the waveguide 6 is provided on the side surface of the heating chamber 2 and the power supply surface 8 is provided.
The distance between the power supply surface 8 and the object 1 to be heated is long.
The high-frequency wave 7 that has entered the heating chamber 2 from above is not directly absorbed by the object 1 to be heated, but is absorbed by the object 1 after repeating the incident reflection on the inner wall surface of the heating chamber 2. Therefore, there is a disadvantage that energy loss occurs.

【0006】また、加熱室2の側面より高周波が入射さ
れるため、被加熱物1の側面や上面が加熱され易く、下
面や中心部が加熱され難いため、加熱ムラが発生する。
Further, since a high frequency is incident from the side surface of the heating chamber 2, the side surface and the upper surface of the object to be heated 1 are easily heated, and the lower surface and the central portion are hard to be heated.

【0007】そこで、例えば特開平9−210372号
公報に示されている高周波加熱装置のように、被加熱物
の下面中央部の温度を高くできるようにしたものが提案
されている。図14は同公報に開示されている第2従来
例の高周波加熱装置を示す縦断面図であり、図中、前述
の第1従来例(図13)のものに相当する部分には同一
符号を付し、その説明を省略する。
In view of the above, there has been proposed a device capable of increasing the temperature at the center of the lower surface of the object to be heated, such as a high-frequency heating device disclosed in Japanese Patent Application Laid-Open No. 9-210372. FIG. 14 is a longitudinal sectional view showing a high frequency heating apparatus of a second conventional example disclosed in the same publication, in which parts corresponding to those of the first conventional example (FIG. 13) are denoted by the same reference numerals. And description thereof is omitted.

【0008】この第2従来例の高周波加熱装置は、加熱
室2と導波管6の境界である給電面8を加熱室2の底面
に設けている。なお、21はターンテーブル9の周縁部
を下方で支持し、これを回動させるローラ、22はロー
ラ21を回転させる回転板、23は回転板22を支持回
転させる回転板支持ローラ、24は回転板支持ローラ2
3を駆動する駆動部である。
In the second conventional high-frequency heating apparatus, a power supply surface 8 which is a boundary between the heating chamber 2 and the waveguide 6 is provided on the bottom of the heating chamber 2. Reference numeral 21 denotes a roller for supporting the periphery of the turntable 9 below and rotating the same, reference numeral 22 denotes a rotating plate for rotating the roller 21, reference numeral 23 denotes a rotating plate supporting roller for supporting and rotating the rotating plate 22, and reference numeral 24 denotes a rotating plate. Plate support roller 2
3 is a driving unit that drives the driving unit 3.

【0009】この第2従来例の高周波加熱装置において
は、駆動部24により回転板支持ローラ23を回転させ
ることで回転板22を回転させ、回転板22が回転する
ことでローラ21が回転し、ターンテーブル9が回転す
る。このように、ターンテーブル9の外縁に沿った略円
周上に、これを回転させる機構を配置することで、給電
面8を下面に設置することができる。これにより、高周
波発生器3より発生した高周波7が加熱室2の底面中央
部から加熱室2内に伝搬する。したがって、被加熱物1
の下面中央部の温度を十分高くすることが可能になる。
In the high frequency heating apparatus of the second conventional example, the rotating plate 22 is rotated by rotating the rotating plate supporting roller 23 by the driving unit 24, and the roller 21 is rotated by rotating the rotating plate 22, The turntable 9 rotates. As described above, by disposing the mechanism for rotating the turntable 9 on the substantially circumference along the outer edge of the turntable 9, the power supply surface 8 can be installed on the lower surface. Thereby, the high frequency wave 7 generated by the high frequency generator 3 propagates into the heating chamber 2 from the center of the bottom surface of the heating chamber 2. Therefore, the object to be heated 1
, The temperature at the center of the lower surface can be made sufficiently high.

【0010】また、同様に給電面を加熱室の底面側に配
置したものとして、例えば特開平8−321378号公
報に示されているものを挙げることができる。図15は
同公報に開示されている第3従来例の高周波加熱装置を
示す縦断面図であり、図中、前述の第1従来例(図1
3)のものに相当する部分には同一符号を付し、その説
明を省略する。
[0010] Similarly, an example in which the power supply surface is disposed on the bottom side of the heating chamber is disclosed in Japanese Patent Application Laid-Open No. 8-321378. FIG. 15 is a vertical sectional view showing a third conventional high-frequency heating apparatus disclosed in the above publication.
Parts corresponding to those in 3) are denoted by the same reference numerals, and description thereof is omitted.

【0011】この第3従来例の高周波加熱装置は、加熱
室2の底面の一側に給電室31を設け、給電室31内に
回転アンテナ32を設置している。なお、33は回転ア
ンテナ32を駆動する第1モータ、34はターンテーブ
ル9を駆動する第2モータ、35は高周波発生器3と第
1モータ33と第2モータ34を制御する制御部であ
る。
In the third conventional high-frequency heating apparatus, a power supply chamber 31 is provided on one side of the bottom surface of the heating chamber 2, and a rotating antenna 32 is installed in the power supply chamber 31. Reference numeral 33 denotes a first motor that drives the rotary antenna 32, reference numeral 34 denotes a second motor that drives the turntable 9, and reference numeral 35 denotes a control unit that controls the high-frequency generator 3, the first motor 33, and the second motor 34.

【0012】この第3従来例の高周波加熱装置におい
て、高周波発生器3で発生した高周波は、導波管6から
給電室31内の回転アンテナ32を介して加熱室2の底
面から加熱室2内に伝搬する。このとき、図示しない重
量センサや温度センサで被加熱物1の状態を検出し、検
出した被加熱物1の状態に応じ、回転アンテナ32を第
1モータ33で駆動して、高周波の指向性を制御してい
る。したがって、加熱分布を均一化することが可能にな
る。
In the high frequency heating apparatus of the third conventional example, the high frequency generated by the high frequency generator 3 is transmitted from the bottom of the heating chamber 2 to the inside of the heating chamber 2 via the rotating antenna 32 in the power supply chamber 31 from the waveguide 6. Propagate to At this time, the state of the object to be heated 1 is detected by a weight sensor or a temperature sensor (not shown), and the rotary antenna 32 is driven by the first motor 33 in accordance with the detected state of the object to be heated 1 so that the directivity of high frequency is improved. Controlling. Therefore, it is possible to make the heating distribution uniform.

【0013】また、同様に給電面を加熱室の底面側に配
置したものとして、例えば特開平9−22775号公報
に示されているものを挙げることができる。図16は同
公報に開示されている第4従来例の高周波加熱装置を示
す縦断面図であり、図中、前述の第1従来例(図13)
のものに相当する部分には同一符号を付し、その説明を
省略する。
Similarly, an example in which the power supply surface is disposed on the bottom surface side of the heating chamber is disclosed in Japanese Patent Application Laid-Open No. 9-22775. FIG. 16 is a longitudinal sectional view showing a fourth conventional high-frequency heating apparatus disclosed in the above publication, in which the first conventional example described above (FIG. 13) is shown.
The same reference numerals are given to the portions corresponding to those described above, and the description thereof will be omitted.

【0014】この第4従来例の高周波加熱装置は、有効
利用スペースの拡大や清掃性・操作性を向上させるため
に、加熱室2内にターンテーブルを設置せず、かつ加熱
室2と導波管6の境界である給電面8を加熱室2の底面
に設けている。なお、41は被加熱物1を載せる誘電体
板、42は導波管6の長さを変えるための導電性部材か
らなる移動体、43は移動体42を往復運動させるモー
タ、44は導波管6と加熱室2を連結する給電部で、複
数の開口部から構成されている。
The high frequency heating apparatus of the fourth conventional example does not have a turntable in the heating chamber 2 and is connected to the heating chamber 2 in order to increase the effective use space and to improve the cleanability and operability. A power supply surface 8 which is a boundary of the tube 6 is provided on the bottom surface of the heating chamber 2. Reference numeral 41 denotes a dielectric plate on which the object to be heated 1 is placed; 42, a moving body made of a conductive member for changing the length of the waveguide 6; 43, a motor for reciprocating the moving body 42; A power supply unit that connects the tube 6 and the heating chamber 2 and includes a plurality of openings.

【0015】この第4従来例の高周波加熱装置におい
て、高周波発生器3で発生した高周波は、導波管6を介
して複数の開口部44より加熱室2内に伝搬する。この
とき、導波管6の長さを規定する移動体42をモータ4
3で往復運動させることで、被加熱物1を下面より様々
な電界分布で加熱することができる。
In the high frequency heating apparatus of the fourth conventional example, the high frequency generated by the high frequency generator 3 propagates through the plurality of openings 44 through the waveguide 6 into the heating chamber 2. At this time, the moving body 42 that defines the length of the waveguide 6 is connected to the motor 4.
By reciprocating at 3, the object to be heated 1 can be heated from the lower surface with various electric field distributions.

【0016】[0016]

【発明が解決しようとする課題】しかしながら、前述の
第1乃至第3従来例のものにあっては、いずれも加熱室
2内にターンテーブル9が設置されているため、以下の
ような問題が存在していた。 ターンテーブル9を回転させるための構造が複雑で、
部品点数が増え、これに伴い故障率が高くなり、かつ電
波シールド機構が難かしくなり、信頼性に欠ける。 加熱室2内の有効利用スペースが減少し、かつ清掃性
も悪化する。 ターンテーブル9の回動により、被加熱物1を設置し
た位置・向きが変更され、取り出しにくくなり、操作性
が悪い。
However, in the above-described first to third conventional examples, since the turntable 9 is installed in the heating chamber 2, the following problems arise. Existed. The structure for rotating the turntable 9 is complicated,
The number of components is increased, the failure rate is increased, and the radio wave shielding mechanism becomes difficult, resulting in lack of reliability. The effective use space in the heating chamber 2 is reduced, and the cleaning property is also deteriorated. Due to the rotation of the turntable 9, the position and orientation of the object 1 to be heated are changed, making it difficult to take out the object 1 and deteriorating the operability.

【0017】また、前述の第1及び第3従来例のものに
あっては、加熱室2の底面中央部に給電面がないため被
加熱物1の中心を高効率で加熱することができないとい
う難点があった。
In the first and third prior arts described above, the center of the object to be heated 1 cannot be heated with high efficiency because there is no power supply surface at the center of the bottom of the heating chamber 2. There were difficulties.

【0018】また、前述の第4従来例のものにあって
は、給電部が複数の開口部44から構成されているた
め、中心部だけを集中的に加熱することができず、縦に
細長い被加熱物に対しては、高効率に加熱できないとい
う問題があった。
Further, in the above-mentioned fourth conventional example, since the power supply portion is constituted by the plurality of openings 44, only the central portion cannot be intensively heated, and is vertically elongated. There is a problem that the object to be heated cannot be efficiently heated.

【0019】本発明の技術的課題は、加熱室の有効スペ
ースを拡大でき、清掃性・操作性を向上させ得られ、か
つ被加熱物を高効率に加熱できるようにすることにあ
る。
[0019] It is a technical object of the present invention to increase the effective space of the heating chamber, improve the cleanability and operability, and heat the object to be heated with high efficiency.

【0020】[0020]

【課題を解決するための手段】本発明の請求項1に係る
高周波加熱装置は、被加熱物を収納する加熱室と、高周
波を発生する高周波発生器と、被加熱物の重量・形状等
を検出する物理量検出手段と、物理量検出手段の検出結
果に基づいて高周波発生器を制御する制御手段と、加熱
室下部に設けられ、高周波発生器から発生する高周波を
加熱室に伝送する導波管と、加熱室下部の略中央部と導
波管の境界に設けられ、ここに至るまでの導波管の幅と
同一か又はそれよりも広く設定された給電面と、低誘電
率材質からなり、給電面上に設けられて被加熱物を設置
する設置台と、を備えたものである。
According to a first aspect of the present invention, there is provided a high-frequency heating apparatus comprising: a heating chamber for storing an object to be heated; a high-frequency generator for generating a high frequency; and a weight and shape of the object to be heated. Physical quantity detecting means for detecting, control means for controlling the high frequency generator based on the detection result of the physical quantity detecting means, and a waveguide provided at the lower part of the heating chamber and transmitting the high frequency generated from the high frequency generator to the heating chamber, Provided at the boundary between the waveguide and the substantially central portion of the lower portion of the heating chamber, the power supply surface set to be equal to or wider than the width of the waveguide up to here, and made of a low dielectric constant material, And an installation table provided on the power supply surface for installing an object to be heated.

【0021】また、本発明の請求項2に係る高周波加熱
装置は、給電面につながる導波管の一端の壁を、平面的
にみて加熱室底面の略中央部を円弧の内側とする曲面ま
たは多面体に形成したものである。
In the high-frequency heating apparatus according to a second aspect of the present invention, the wall at one end of the waveguide connected to the power supply surface has a curved surface or a curved surface having a substantially central portion of the bottom surface of the heating chamber as an inner side of an arc when viewed in plan. It is formed in a polyhedron.

【0022】また、本発明の請求項3に係る高周波加熱
装置は、給電面につながる導波管の一端の壁を、平面的
にみて加熱室底面の略中央部を中心とする皿形に形成し
たものである。
In the high frequency heating apparatus according to a third aspect of the present invention, the wall at one end of the waveguide connected to the power supply surface is formed in a dish shape centered on a substantially central portion of the bottom surface of the heating chamber in plan view. It was done.

【0023】また、本発明の請求項4に係る高周波加熱
装置は、給電面を、加熱室底面の略中央部を中心とする
円形または多角形に形成したものである。
Further, in the high frequency heating apparatus according to a fourth aspect of the present invention, the power supply surface is formed in a circular or polygonal shape centered on a substantially central portion of the bottom surface of the heating chamber.

【0024】また、本発明の請求項5に係る高周波加熱
装置は、給電面を、加熱室底面の略中央部を中心とする
円形給電面または多角形給電面と、その周囲に設けたス
ロット給電面とから形成するとともに、スロット給電面
を開閉するスロット開閉手段と、物理量検出手段の検出
結果に基づいてスロット開閉手段を駆動制御するスロッ
ト開閉制御手段とを設けたものである。
According to a fifth aspect of the present invention, in the high-frequency heating device, the power supply surface includes a circular power supply surface or a polygonal power supply surface centered on a substantially central portion of the bottom surface of the heating chamber and a slot power supply provided around the power supply surface. And a slot opening / closing means for opening and closing the slot feeding surface, and a slot opening / closing control means for controlling the driving of the slot opening / closing means based on the detection result of the physical quantity detecting means.

【0025】また、本発明の請求項6に係る高周波加熱
装置は、導波管内の給電面下方に、高周波を多方向にラ
ンダムに反射させる導体で構成された可動スタラを設け
るとともに、物理量検出手段の検出結果に基づいてスタ
ラを駆動制御するスタラ駆動制御手段を設けたものであ
る。
According to a sixth aspect of the present invention, there is provided a high-frequency heating apparatus having a movable stirrer formed of a conductor which randomly reflects high-frequency waves in multiple directions below a power supply surface in a waveguide, and a physical quantity detecting means. And a stirrer drive control means for controlling the drive of the stirrer based on the detection result.

【0026】また、本発明の請求項7に係る高周波加熱
装置は、導波管内の給電面下方に、高周波を受信して電
界を強くする高周波受信体を設けたものである。
A high-frequency heating device according to a seventh aspect of the present invention is provided with a high-frequency receiver for receiving a high frequency and strengthening an electric field below a power supply surface in the waveguide.

【0027】また、本発明の請求項8に係る高周波加熱
装置は、高周波受信体を可動機構に取付けるとともに、
物理量検出手段の検出結果に基づいて可動機構を駆動し
て高周波受信体の位置を制御する高周波受信体位置制御
手段を設けたものである。
[0027] In the high frequency heating apparatus according to claim 8 of the present invention, the high frequency receiver is attached to the movable mechanism.
There is provided high-frequency receiver position control means for controlling the position of the high-frequency receiver by driving the movable mechanism based on the detection result of the physical quantity detection means.

【0028】[0028]

【発明の実施の形態】実施形態1.以下、図示実施形態
により本発明を説明する。図1は本発明の請求項1に係
る高周波加熱装置を示す縦断面図であり、図中、前述の
第1従来例(図13)のものに相当する部分には同一符
号を付し、説明を省略する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 FIG. Hereinafter, the present invention will be described with reference to the illustrated embodiments. FIG. 1 is a longitudinal sectional view showing a high-frequency heating device according to claim 1 of the present invention. In the drawing, the same reference numerals are given to portions corresponding to those of the above-mentioned first conventional example (FIG. 13). Is omitted.

【0029】この第1実施形態の高周波加熱装置は、加
熱室2の下部に、高周波発生器3から発生する高周波7
を加熱室2に伝送する矩形導波管6を配置して、加熱室
2と導波管6の境界である給電面8を、加熱室2の底面
中央に設けている。また給電面8は、導波管6の幅(図
面垂直方向の寸法)と同一となる広さに設定されてい
る。つまり、給電面8が円形であれば、その直径が導波
管6の幅と同一となるように、また給電面8が矩形であ
れば、その図面垂直方向の寸法を導波管6の幅と同一と
なるように設定されている。給電面8の上には、低誘電
率材質から構成されて被加熱物1を設置する設置台12
が設けられている。なお、物理量検出手段4は、被加熱
物1の重量・形状等を検出し、制御手段5は、物理量検
出手段4の検出結果に基づいて高周波発生器3を制御す
る機能を有する。
The high-frequency heating device according to the first embodiment includes a high-frequency heating device
Is disposed in the center of the bottom surface of the heating chamber 2, which is a boundary between the heating chamber 2 and the waveguide 6. The power supply surface 8 is set to have the same width as the width of the waveguide 6 (dimension in the direction perpendicular to the drawing). In other words, if the power supply surface 8 is circular, the diameter is the same as the width of the waveguide 6, and if the power supply surface 8 is rectangular, the dimension in the direction perpendicular to the drawing is the width of the waveguide 6. Is set to be the same as. An installation table 12 made of a low dielectric constant material and on which the object to be heated 1 is installed is provided on the power supply surface 8.
Is provided. The physical quantity detection means 4 has a function of detecting the weight and shape of the article 1 to be heated, and the control means 5 has a function of controlling the high frequency generator 3 based on the detection result of the physical quantity detection means 4.

【0030】この第1実施形態の高周波加熱装置におい
て、高周波発生器3で発生した高周波7は、加熱室2下
部の導波管6を介し、加熱室2の底面中央部の導波管6
と同幅に設定された給電面8から加熱室2に伝搬し、設
置台12上の被加熱物1の底面中央部から直接照射す
る。このため高周波エネルギは、その大部分が直接被加
熱物1に照射され、高効率で被加熱物1に吸収される。
従って、被加熱物1を高効率で加熱することができ、エ
ネルギーロスを大幅に低減することができる。
In the high-frequency heating apparatus according to the first embodiment, the high-frequency wave 7 generated by the high-frequency generator 3 passes through the waveguide 6 below the heating chamber 2 and passes through the waveguide 6 at the center of the bottom of the heating chamber 2.
The light propagates from the power supply surface 8 set to the same width as the heating chamber 2 to the heating chamber 2, and is directly radiated from the center of the bottom surface of the article 1 to be heated on the installation table 12. Therefore, most of the high-frequency energy is directly applied to the object to be heated 1 and is absorbed by the object to be heated 1 with high efficiency.
Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be greatly reduced.

【0031】また、被加熱物1の底面中央部から直接高
周波を照射して、被加熱物1の下部を集中的に加熱する
ことで、被加熱物1がミルク、酒等の液体のものである
場合は、対流が発生し、加熱ムラがなくなって、全体的
に均一加熱することができる。更に被加熱物1が解凍
等、底面の大きいものである場合は、被加熱物1の中央
部を集中的に加熱するため、端煮え等のいわゆるランナ
ウェイ現象が発生することなく均一に加熱することがで
きる。
Further, by irradiating high frequency directly from the center of the bottom surface of the object to be heated 1 to intensively heat the lower portion of the object to be heated 1, the object to be heated 1 is made of a liquid such as milk or sake. In some cases, convection is generated and uneven heating is eliminated, and uniform heating can be performed as a whole. Furthermore, when the object to be heated 1 has a large bottom surface such as thawing or the like, the central part of the object to be heated 1 is heated intensively, so that the object 1 is uniformly heated without so-called runaway phenomena such as end boiling. be able to.

【0032】このように、この第1実施形態の高周波加
熱装置によれば、従来均一加熱を目的として使用されて
いたターンテーブルを不要にでき、被加熱物1を回転さ
せることなくこれを均一に加熱することができる。
As described above, according to the high-frequency heating apparatus of the first embodiment, the turntable conventionally used for uniform heating can be dispensed with, and the object 1 can be uniformly heated without rotating it. Can be heated.

【0033】また、ターンテーブルを不要とすること
で、装置コストを低減でき、かつ被加熱物1を収納する
有効スペースの拡大が図れ、清掃性・操作性も向上す
る。
Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the article to be heated 1 can be increased, and the cleaning and operability can be improved.

【0034】実施形態2.図2は本発明の請求項1,
2,4に係る高周波加熱装置を透過的に示す斜視図、図
3はその横断面図であり、各図中、前述の第1実施形態
(図1)のものと同一機能部には同一符号を付し、説明
を省略する。
Embodiment 2 FIG. 2 shows claim 1 of the present invention.
2 and 4 are transparent perspective views showing the high-frequency heating devices, and FIG. 3 is a cross-sectional view of the high-frequency heating devices. In each drawing, the same reference numerals denote the same functional portions as those in the first embodiment (FIG. 1). And the description is omitted.

【0035】この第2実施形態の高周波加熱装置は、給
電面8Aにつながる導波管6Aの一端の壁6aを、平面
的にみて加熱室2の底面略中央部を円弧の内側とする曲
面(ここでは加熱室の底面略中央部を中心とする直径が
導波管の幅と同一の円柱状)に形成するとともに、対応
する給電面8Aを、加熱室2の底面略中央部を中心とす
る円形に形成したものである。
In the high-frequency heating device according to the second embodiment, the wall 6a at one end of the waveguide 6A connected to the power supply surface 8A has a curved surface (in a plan view) where the substantially central portion of the bottom surface of the heating chamber 2 is inside the arc. Here, the heating chamber is formed in a cylindrical shape whose center is approximately the center of the bottom of the heating chamber, and the corresponding power supply surface 8A is centered on the center of the bottom of the heating chamber 2. It is formed in a circular shape.

【0036】この第2実施形態の高周波加熱装置におい
て、高周波発生器3で発生した高周波は、加熱室2下部
の導波管6Aに導かれてその先端、つまり加熱室2の底
面中央下部に形成されている円柱状部に進入して、円柱
状部の湾曲した壁6aの面により、円柱状部の中央部付
近Aに集められ、中央部付近Aに高周波エネルギが集中
する。そして、この中央部付近Aに集中した高周波エネ
ルギは、加熱室2の底面略中央部の円形の給電面8Aよ
り加熱室2に伝搬し、設置台12上に置かれた被加熱物
1の下面中央部に直接照射する。このため高周波エネル
ギは、その大部分が直接被加熱物1に照射され、高効率
で被加熱物1に吸収される。従って、被加熱物1を高効
率で加熱することができ、エネルギーロスを大幅に低減
することができる。
In the high-frequency heating apparatus according to the second embodiment, the high-frequency waves generated by the high-frequency generator 3 are guided to the waveguide 6A at the lower part of the heating chamber 2 and formed at the tip, that is, at the lower center of the bottom of the heating chamber 2. Into the cylindrical portion, and the surface of the curved wall 6a of the cylindrical portion is collected near the central portion A of the cylindrical portion, and high-frequency energy is concentrated on the central portion A. The high-frequency energy concentrated in the vicinity A of the central portion propagates to the heating chamber 2 from the circular power supply surface 8A substantially at the center of the bottom surface of the heating chamber 2, and the lower surface of the article 1 to be heated placed on the installation table 12. Irradiate directly in the center. Therefore, most of the high-frequency energy is directly applied to the object to be heated 1 and is absorbed by the object to be heated 1 with high efficiency. Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be greatly reduced.

【0037】このように、この第2実施形態の高周波加
熱装置においても、ターンテーブルを不要にでき、被加
熱物1を回転させることなくこれを均一に加熱すること
ができる。更にターンテーブルを不要とすることで、装
置コストを低減でき、かつ被加熱物1を収納する有効ス
ペースの拡大が図れ、清掃性・操作性も向上する。
As described above, also in the high-frequency heating device of the second embodiment, a turntable can be dispensed with and the object to be heated 1 can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated 1 can be increased, and the cleanability and operability can be improved.

【0038】なお、ここでは導波管6Aの一端の壁6a
を円柱状に、また給電面8Aを円形に、それぞれ形成し
たものを例に挙げて説明したが、これに限るものでな
く、例えば導波管6Aの一端の壁6aを、平面的にみて
加熱室2の底面略中央部を円弧の内側とする湾曲面や多
面体に、また給電面8Aを楕円や多角形に、それぞれ形
成しても同等の作用、効果が得られる。
Here, one end wall 6a of the waveguide 6A is used.
Is described as an example, and the feeding surface 8A is formed in a circular shape. However, the present invention is not limited to this. For example, the wall 6a at one end of the waveguide 6A may be heated in a plan view. The same operation and effect can be obtained even if the bottom surface of the chamber 2 is formed on a curved surface or a polyhedron having an arc inside, and the power supply surface 8A is formed on an ellipse or polygon.

【0039】実施形態3.図4は本発明の請求項1,3
に係る高周波加熱装置を透過的に示す斜視図、図5はそ
の縦断面図であり、各図中、前述の第1実施形態(図
1)のものと同一機能部には同一符号を付し、説明を省
略する。
Embodiment 3 FIG. 4 shows claims 1 and 3 of the present invention.
FIG. 5 is a longitudinal sectional view of the high-frequency heating device according to the first embodiment (FIG. 1). In each drawing, the same reference numerals are given to the same functional portions as those of the above-described first embodiment (FIG. 1). The description is omitted.

【0040】この第3実施形態の高周波加熱装置は、給
電面8Aにつながる導波管6Aの一端の壁6bを、平面
的にみて加熱室2の底面略中央部を中心とする皿形に形
成したものである。
In the high-frequency heating device of the third embodiment, the wall 6b at one end of the waveguide 6A connected to the power supply surface 8A is formed in a dish shape centered on the substantially central portion of the bottom surface of the heating chamber 2 when viewed in plan. It was done.

【0041】この第3実施形態の高周波加熱装置におい
て、高周波発生器3で発生した高周波は、加熱室2下部
の導波管6Aに導かれてその先端、つまり加熱室2の底
面中央下部に形成されている皿形状部に進入して、皿形
状部の湾曲したテーパ状壁6bの面によって上方に直接
反射され、加熱室2の底面略中央部の円形の給電面8A
より加熱室2に伝搬し、設置台12上に置かれた被加熱
物1の下面中央部に直接照射する。このため高周波エネ
ルギは、その大部分が直接被加熱物1に照射され、高効
率で被加熱物1に吸収される。従って、被加熱物1を高
効率で加熱することができ、エネルギーロスを大幅に低
減することができる。
In the high-frequency heating apparatus according to the third embodiment, the high-frequency waves generated by the high-frequency generator 3 are guided to the waveguide 6A below the heating chamber 2 and formed at the tip, that is, at the lower center of the bottom of the heating chamber 2. Into the dish-shaped portion, which is directly reflected upward by the curved tapered wall 6b of the dish-shaped portion, and a circular power supply surface 8A substantially at the center of the bottom surface of the heating chamber 2.
The light further propagates to the heating chamber 2 and directly irradiates the center of the lower surface of the object to be heated 1 placed on the installation table 12. Therefore, most of the high-frequency energy is directly applied to the object to be heated 1 and is absorbed by the object to be heated 1 with high efficiency. Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be greatly reduced.

【0042】このように、この第3実施形態の高周波加
熱装置においても、ターンテーブルを不要にでき、被加
熱物1を回転させることなくこれを均一に加熱すること
ができる。更にターンテーブルを不要とすることで、装
置コストを低減でき、かつ被加熱物1を収納する有効ス
ペースの拡大が図れ、清掃性・操作性も向上する。
As described above, also in the high-frequency heating device of the third embodiment, a turntable can be dispensed with and the object to be heated 1 can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated 1 can be increased, and the cleanability and operability can be improved.

【0043】実施形態4.図6は本発明の請求項1に係
る高周波加熱装置の他の例を示す横断面図であり、図
中、前述の第1実施形態(図1)のものと同一機能部に
は同一符号を付し、説明を省略する。
Embodiment 4 FIG. FIG. 6 is a cross-sectional view showing another example of the high-frequency heating device according to claim 1 of the present invention. In the drawing, the same reference numerals denote the same functional portions as those in the first embodiment (FIG. 1). And description thereof is omitted.

【0044】この第4実施形態の高周波加熱装置は、給
電面8Bにつながる導波管6Bの一端の壁6cを、平面
的にみて加熱室2の底面略中央部を円弧の内側とする曲
面(ここでは加熱室の底面略中央部を中心とする直径が
導波管の幅よりも大きい円柱状)に形成するとともに、
対応する給電面8Bを、加熱室2の底面略中央部を中心
とする直径の大きな円形に形成したものである。
In the high-frequency heating device according to the fourth embodiment, the wall 6c at one end of the waveguide 6B connected to the power supply surface 8B is formed into a curved surface (in a plan view) in which the substantially central portion of the bottom surface of the heating chamber 2 is located inside the arc. Here, the heating chamber is formed in a columnar shape whose center is approximately the center of the bottom of the heating chamber and whose diameter is larger than the width of the waveguide.
The corresponding power supply surface 8B is formed in a circular shape having a large diameter centered on a substantially central portion of the bottom surface of the heating chamber 2.

【0045】この第4実施形態の高周波加熱装置におい
て、高周波発生器3で発生した高周波は、加熱室2下部
の導波管6Bに導かれてその先端、つまり加熱室2の底
面中央下部に形成されている大径の円柱状部に進入し
て、円柱状部の湾曲した壁6cの面により、円柱状部の
中央部付近Bに集められ、中央部付近Bに高周波エネル
ギが集中する。そして、この中央部付近Bに集中した高
周波エネルギは、加熱室2の底面略中央部の円形(大径
の)の給電面8Bより加熱室2に伝搬し、図示しない設
置台上に置かれた被加熱物の下面中央部に直接照射す
る。このため高周波エネルギは、その大部分が直接被加
熱物に照射され、高効率で被加熱物に吸収される。従っ
て、被加熱物を高効率で加熱することができ、エネルギ
ーロスを大幅に低減することができる。
In the high-frequency heating apparatus according to the fourth embodiment, the high-frequency wave generated by the high-frequency generator 3 is guided to the waveguide 6B at the lower part of the heating chamber 2 and formed at the tip, that is, at the lower center of the bottom of the heating chamber 2. Into the large-diameter cylindrical portion, and is collected near the central portion B of the cylindrical portion by the surface of the curved wall 6c of the cylindrical portion, and high-frequency energy is concentrated at the central portion B near the central portion. The high-frequency energy concentrated near the central portion B propagates to the heating chamber 2 from a circular (large-diameter) power supply surface 8B substantially at the bottom of the heating chamber 2 and is placed on a mounting table (not shown). Irradiate directly to the center of the lower surface of the object to be heated. Therefore, most of the high-frequency energy is directly applied to the object to be heated, and is absorbed by the object with high efficiency. Therefore, the object to be heated can be heated with high efficiency, and the energy loss can be significantly reduced.

【0046】ところで、この第4実施形態の高周波加熱
装置は、前述の第2実施形態のものの高周波エネルギ集
中部となる円柱状部を導波管6Bの幅よりも大きくなる
ように設定したものである。従って、高周波エネルギ集
中部となるエリアBを前述の第2実施形態のものよりも
大きくすることができる。
The high-frequency heating device according to the fourth embodiment has a configuration in which the columnar portion serving as the high-frequency energy concentration portion of the second embodiment is set to be larger than the width of the waveguide 6B. is there. Therefore, the area B serving as the high-frequency energy concentration section can be made larger than that of the second embodiment.

【0047】このように、この第4実施形態の高周波加
熱装置においても、ターンテーブルを不要にでき、被加
熱物を回転させることなくこれを均一に加熱することが
できる。更にターンテーブルを不要とすることで、装置
コストを低減でき、かつ被加熱物を収納する有効スペー
スの拡大が図れ、清掃性・操作性も向上する。
As described above, also in the high-frequency heating apparatus according to the fourth embodiment, a turntable can be dispensed with and the object to be heated can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be increased, and the cleanability and operability are improved.

【0048】なお、ここでは導波管6Bの一端の壁6c
を円柱状に、また給電面8Bを円形に、それぞれ形成し
たものを例に挙げて説明したが、これに限るものでな
く、例えば導波管6Bの一端の壁6cを、平面的にみて
加熱室2の底面略中央部を円弧の内側とする湾曲面や多
面体に、また給電面8Bを楕円や多角形に、それぞれ形
成しても同等の作用、効果が得られる。
Here, the wall 6c at one end of the waveguide 6B is used.
Is described in the form of a column and the power supply surface 8B is formed in a circular shape. However, the present invention is not limited to this. For example, the wall 6c at one end of the waveguide 6B may be heated in a plan view. The same operation and effect can be obtained even if the bottom surface of the chamber 2 is formed on a curved surface or a polyhedron having an arc inside, and the power supply surface 8B is formed on an ellipse or polygon.

【0049】また、この第4実施形態の技術思想、つま
り給電面8Bにつながる導波管6Bの端部を、ここに至
るまでの導波管6Bの幅よりも大きく設定して、広い給
電面8Bを得ることは、前述の第1乃至第3実施形態へ
の適用はもとより、後述の全ての実施形態への適用が可
能である。
Further, the technical idea of the fourth embodiment, that is, the end of the waveguide 6B connected to the power supply surface 8B is set to be larger than the width of the waveguide 6B up to here, so that a wide power supply surface is provided. Obtaining 8B can be applied not only to the above-described first to third embodiments, but also to all the embodiments described below.

【0050】実施形態5.図7は本発明の請求項1,
2,3,5に係る高周波加熱装置の給電面部分を拡大し
て示す平面図で、図7(a)はスロット給電面が全開し
ている状態の図、図7(b)はスロット給電面が全閉し
ている状態の図、図8はそのスロット開閉板を示す平面
図、図9はそのスロット開閉手段を含む装置全体構成を
示す縦断面図であり、各図中、前述の第1実施形態(図
1)のものと同一機能部には同一符号を付し、説明を省
略する。
Embodiment 5 FIG. FIG. 7 shows claim 1 of the present invention.
FIGS. 7A and 7B are enlarged plan views showing power supply surfaces of the high-frequency heating devices according to 2, 3 and 5; FIG. 7A shows a state in which the slot power supply surface is fully opened; FIG. 8 is a plan view showing the slot opening / closing plate, and FIG. 9 is a longitudinal sectional view showing the entire configuration of the apparatus including the slot opening / closing means. The same reference numerals are given to the same functional units as those of the embodiment (FIG. 1), and the description is omitted.

【0051】この第5実施形態の高周波加熱装置は、給
電面を、加熱室2の底面略中央部を中心とする円形給電
面(又は多角形給電面)8Cと、その周囲4箇所(90
度毎に)に設けたスロット給電面8Dとから形成すると
ともに、各スロット給電面8Dを開閉するスロット開閉
手段50と、物理量検出手段4の検出結果に基づいてス
ロット開閉手段50を駆動制御するスロット開閉制御機
能が付加された制御手段5Aとを備えている。
In the high-frequency heating apparatus according to the fifth embodiment, the power supply surfaces are a circular power supply surface (or polygonal power supply surface) 8C centered on the substantially central portion of the bottom surface of the heating chamber 2 and four peripheral portions (90).
Slot opening and closing means 50 for opening and closing each slot feeding surface 8D, and a slot for driving and controlling the slot opening and closing means 50 based on the detection result of the physical quantity detection means 4. Control means 5A to which an open / close control function is added.

【0052】これを更に詳述すると、スロット開閉手段
50は、給電面の下方に重ねて配置されたリング状のス
ロット開閉板51と、スロット開閉板51を回動させる
駆動機構52とから構成されている。
More specifically, the slot opening / closing means 50 is composed of a ring-shaped slot opening / closing plate 51 arranged below the power supply surface and a driving mechanism 52 for rotating the slot opening / closing plate 51. ing.

【0053】スロット開閉板51は図8に示すようにリ
ング状のプレートからなり、その中央孔51aは、円形
給電面(又は多角形部)8Cと同形状、寸法に設定され
ている。またスロット開閉板51の面内の周方向4箇所
には、スロット給電面8Dと同形状、寸法に設定された
弧状穴51bが形成されており、各弧状穴51bによっ
て各スロット給電面8Dを同時に開放できるようになっ
ているとともに、各弧状穴51b間の各面部51cによ
って各スロット給電面8Dを同時に閉塞できるようにな
っている。更にスロット開閉板51の外周の一部にはセ
クタギヤ51dが形成され、駆動機構52のモータ53
の出力軸に取り付けたピニオン54と噛み合っている。
The slot opening / closing plate 51 is formed of a ring-shaped plate as shown in FIG. 8, and the center hole 51a is set to the same shape and size as the circular power supply surface (or polygonal portion) 8C. Further, arc-shaped holes 51b having the same shape and size as the slot power supply surface 8D are formed at four circumferential positions in the plane of the slot opening / closing plate 51, and each slot power supply surface 8D is simultaneously formed by each arc-shaped hole 51b. Each slot power supply surface 8D can be simultaneously closed by each surface portion 51c between each arc-shaped hole 51b. Further, a sector gear 51d is formed on a part of the outer periphery of the slot opening / closing plate 51, and the motor 53 of the drive mechanism 52
And the pinion 54 attached to the output shaft.

【0054】この第5実施形態の高周波加熱装置におい
ては、モータ53によりピニオン54を往復回動させる
ことで、スロット開閉板51を往復回動させる。すなわ
ち、物理量検出手段4で、検出した被加熱物の形状・個
数により、底面が広い被加熱物や複数個の被加熱物があ
る場合は、図7(a)に示す如く各スロット給電面8D
を全開させる。これにより、高周波発生器3で発生し、
加熱室2下部の導波管6を伝搬してきた高周波は、スロ
ット開閉板51の中央孔51aと各弧状穴51bから、
加熱室2の底面中央下部に形成されている円形給電面
(又は多角形給電面)8Cと各スロット給電面8Dに進
入し、円形給電面(又は多角形給電面)8Cと各スロッ
ト給電面8Dより加熱室2に伝搬し、設置台12上に置
かれた被加熱物の下面中央部に直接照射する。またミル
ク・酒等の被加熱物が1個のみある場合は、駆動機構5
2によってスロット開閉板51を45度回転させ、図7
(b)に示す如くスロット開閉板51の各面部51cに
よって各スロット給電面8Dを閉塞し、高周波を中央部
の円形給電面(又は多角形給電面)8Cからのみ被加熱
物の下面中央部に直接照射する。このため高周波エネル
ギは、その大部分が直接被加熱物に照射され、高効率で
被加熱物に吸収される。従って、被加熱物を高効率で加
熱することができ、エネルギーロスを大幅に低減するこ
とができる。
In the high-frequency heating device of the fifth embodiment, the slot 53 is reciprocated by reciprocating the pinion 54 by the motor 53. That is, depending on the shape and number of the objects to be heated detected by the physical quantity detecting means 4, if there is an object to be heated having a wide bottom surface or a plurality of objects to be heated, as shown in FIG.
Fully open. Thereby, it is generated by the high frequency generator 3,
The high frequency wave propagating through the waveguide 6 below the heating chamber 2 is transmitted from the central hole 51a of the slot opening / closing plate 51 and the respective arc holes 51b.
It enters the circular power supply surface (or polygonal power supply surface) 8C and each slot power supply surface 8D formed at the lower center of the bottom surface of the heating chamber 2, and enters the circular power supply surface (or polygonal power supply surface) 8C and each slot power supply surface 8D. The light further propagates to the heating chamber 2 and directly irradiates the center of the lower surface of the object to be heated placed on the installation table 12. If there is only one heated object such as milk or sake, the driving mechanism 5
2 rotates the slot opening / closing plate 51 by 45 degrees, and FIG.
As shown in (b), each slot power supply surface 8D is closed by each surface portion 51c of the slot opening / closing plate 51, and a high frequency is applied only from the central circular power supply surface (or polygonal power supply surface) 8C to the lower surface central portion of the object to be heated. Irradiate directly. Therefore, most of the high-frequency energy is directly applied to the object to be heated, and is absorbed by the object with high efficiency. Therefore, the object to be heated can be heated with high efficiency, and the energy loss can be significantly reduced.

【0055】このように、この第5実施形態の高周波加
熱装置においても、ターンテーブルを不要にでき、被加
熱物を回転させることなくこれを均一に加熱することが
できる。更にターンテーブルを不要とすることで、装置
コストを低減でき、かつ被加熱物を収納する有効スペー
スの拡大が図れ、清掃性・操作性も向上する。
As described above, also in the high-frequency heating apparatus of the fifth embodiment, a turntable can be dispensed with and the object to be heated can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be increased, and the cleanability and operability are improved.

【0056】また、各スロット給電面8D部を開閉自在
にしたため、被加熱物の位置、大きさ、種類等に対し
て、高効率に最適な開口パターンで加熱することができ
る。
Further, since each slot power supply surface 8D is made openable and closable, the object to be heated can be heated with high efficiency and in an optimal opening pattern with respect to the position, size and type of the object to be heated.

【0057】実施形態6.図10は本発明の請求項1,
2,3,4,5,6に係る高周波加熱装置を示す縦断面
図であり、図中、前述の第1実施形態(図1)のものと
同一機能部には同一符号を付し、説明を省略する。
Embodiment 6 FIG. FIG. 10 shows claim 1 of the present invention.
It is a longitudinal cross-sectional view which shows the high frequency heating apparatus which concerns on 2,3,4,5,6, In the figure, the same code | symbol is attached | subjected to the same function part as the thing of 1st Embodiment (FIG. 1) mentioned above, and description Is omitted.

【0058】この第6実施形態の高周波加熱装置は、導
波管6内の給電面8の下方に、高周波を多方向にランダ
ムに反射させる導体で構成された可動スタラ61とこの
スタラ61を駆動するモータ62を設けるとともに、物
理量検出手段4の検出結果に基づいてスタラ61を駆動
制御するスタラ駆動制御機能が付加された制御手段5B
を設けたものである。
The high-frequency heating device according to the sixth embodiment has a movable stirrer 61 formed of a conductor that randomly reflects high-frequency waves in multiple directions and drives the stirrer 61 below the power supply surface 8 in the waveguide 6. Means 5B provided with a motor 62 for controlling the operation of the stirrer 61 based on the detection result of the physical quantity detecting means 4
Is provided.

【0059】この第6実施形態の高周波加熱装置におい
ては、モータ62により加熱室2の底面中央下部に配置
されているスタラ61を回転させる。これにより、高周
波発生器3で発生し、加熱室2下部の導波管6を伝搬し
てきた高周波を、スタラ61によって多方向に反射さ
せ、加熱室2の底面略中央部の給電面8より加熱室2に
伝搬し、設置台12上に置かれた被加熱物1に対して直
接ランダムに照射する。従って、底面の広い被加熱物や
複数個の被加熱物を加熱する際に被加熱物を高効率で、
かつ加熱ムラを押さえて加熱することができる。このよ
うに高周波エネルギは、その大部分が直接被加熱物1に
照射され、高効率で被加熱物1に吸収される。このた
め、被加熱物1を高効率で加熱することができ、エネル
ギーロスを大幅に低減することができる。
In the high-frequency heating device according to the sixth embodiment, a motor 62 rotates a stirrer 61 disposed at the lower center of the bottom of the heating chamber 2. Thus, the high frequency generated by the high frequency generator 3 and propagated through the waveguide 6 below the heating chamber 2 is reflected in multiple directions by the stirrer 61, and is heated from the power supply surface 8 substantially at the bottom of the heating chamber 2. The light propagates to the chamber 2 and is directly and randomly irradiated on the object to be heated 1 placed on the installation table 12. Therefore, when heating an object to be heated having a wide bottom surface or a plurality of objects to be heated, the object to be heated is highly efficient,
In addition, heating can be performed while suppressing uneven heating. As described above, most of the high-frequency energy is directly applied to the object to be heated 1 and is absorbed by the object to be heated 1 with high efficiency. Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be significantly reduced.

【0060】このように、この第6実施形態の高周波加
熱装置においても、ターンテーブルを不要にでき、被加
熱物を回転させることなくこれを均一に加熱することが
できる。更にターンテーブルを不要とすることで、装置
コストを低減でき、かつ被加熱物を収納する有効スペー
スの拡大が図れ、清掃性・操作性も向上する。
As described above, also in the high-frequency heating device of the sixth embodiment, a turntable can be dispensed with and the object to be heated can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be increased, and the cleanability and operability are improved.

【0061】実施形態7.図11は本発明の請求項1,
2,3,4,5,7に係る高周波加熱装置を示す縦断面
図であり、図中、前述の第1実施形態(図1)のものと
同一機能部には同一符号を付し、説明を省略する。
Embodiment 7 FIG. 11 shows claim 1 of the present invention.
It is a longitudinal cross-sectional view which shows the high frequency heating apparatus which concerns on 2,3,4,5,7, In the figure, the same code | symbol is attached | subjected to the same function part as the thing of 1st Embodiment (FIG. 1) mentioned above, and description Is omitted.

【0062】この第7実施形態の高周波加熱装置は、導
波管6内の給電面8の下方に、高周波を受信して電界を
強くする波長の1/4以上の長さに設定された高周波受
信体71を設けたものである。
The high-frequency heating apparatus according to the seventh embodiment has a high-frequency heating device set below the power supply surface 8 in the waveguide 6 so as to have a length equal to or more than 波長 of the wavelength at which the high-frequency is received and the electric field is strengthened. The receiver 71 is provided.

【0063】この第7実施形態の高周波加熱装置におい
て、高周波発生器3で発生した高周波は、加熱室2下部
の導波管6を伝搬して、加熱室2の底面略中央部の給電
面8より加熱室2に伝搬し、設置台12上に置かれた被
加熱物1の底面に直接照射する。このとき、導波管6を
伝搬してきた高周波は、一旦、高周波受信体71に受信
される。このため、高周波受信体71周りに強電界域C
が発生し、被加熱物1の底面への照射効率が向上する。
従って高周波エネルギは、その大部分が直接被加熱物1
に照射され、高効率で被加熱物1に吸収される。このた
め、被加熱物1を高効率で加熱することができ、エネル
ギーロスを大幅に低減することができる。
In the high-frequency heating device of the seventh embodiment, the high-frequency wave generated by the high-frequency generator 3 propagates through the waveguide 6 below the heating chamber 2, and the power supply surface 8 substantially at the center of the bottom surface of the heating chamber 2. The light further propagates to the heating chamber 2 and directly irradiates the bottom surface of the object to be heated 1 placed on the installation table 12. At this time, the high frequency propagating through the waveguide 6 is once received by the high frequency receiver 71. Therefore, the strong electric field region C
Is generated, and the efficiency of irradiation on the bottom surface of the article to be heated 1 is improved.
Therefore, most of the high frequency energy is directly transmitted to the object 1 to be heated.
And is absorbed by the object to be heated 1 with high efficiency. Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be significantly reduced.

【0064】このように、この第7実施形態の高周波加
熱装置においても、ターンテーブルを不要にでき、被加
熱物を回転させることなくこれを均一に加熱することが
できる。更にターンテーブルを不要とすることで、装置
コストを低減でき、かつ被加熱物を収納する有効スペー
スの拡大が図れ、清掃性・操作性も向上する。
As described above, also in the high-frequency heating device of the seventh embodiment, a turntable can be dispensed with and the object to be heated can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be increased, and the cleanability and operability are improved.

【0065】実施形態8.図12は本発明の請求項1,
2,3,4,5,7,8に係る高周波加熱装置を示す縦
断面図であり、図中、前述の第7実施形態(図11)の
ものと同一機能部には同一符号を付し、説明を省略す
る。
Embodiment 8 FIG. FIG. 12 shows claim 1 of the present invention.
It is a longitudinal cross-sectional view which shows the high frequency heating apparatus which concerns on 2,3,4,5,7,8. In the figure, the same code | symbol is attached | subjected to the same function part as the thing of said 7th embodiment (FIG. 11). The description is omitted.

【0066】この第8実施形態の高周波加熱装置は、高
周波を受信して電界を強くする波長の1/4以上の長さ
に設定されて導波管6内の給電面8の下方に配置される
高周波受信体71を、水平回転板72に取り付け、回転
板72をモータ73により駆動できるようにするととも
に、物理量検出手段4の検出結果に基づいて回転板72
を駆動制御して高周波受信体71の位置を制御する高周
波受信体駆動制御機能が付加された制御手段5Cを設け
たものである。
The high-frequency heating device according to the eighth embodiment is set below the power supply surface 8 in the waveguide 6 and is set to have a length equal to or longer than の of the wavelength at which the high frequency is received and the electric field is strengthened. The high-frequency receiver 71 is mounted on a horizontal rotary plate 72 so that the rotary plate 72 can be driven by a motor 73, and based on the detection result of the physical quantity detection means 4,
Is provided with a control means 5C to which a high-frequency receiver driving control function for controlling the position of the high-frequency receiver 71 by driving is controlled.

【0067】この第8実施形態の高周波加熱装置におい
ては、モータ73により回転板72を回転させて高周波
受信体71の位置を変えることで、高周波を受信する場
所を任意に指定でき、任意の加熱分布にすることができ
る。これにより、任意の被加熱物1に対して高効率で、
かつ加熱ムラを押さえて加熱することができる。すなわ
ち、被加熱物1に対して高効率で高周波エネルギを直接
照射することができる。このため、被加熱物1を高効率
で加熱することができ、エネルギーロスを大幅に低減す
ることができる。
In the high-frequency heating apparatus according to the eighth embodiment, by rotating the rotary plate 72 by the motor 73 and changing the position of the high-frequency receiver 71, the location for receiving the high-frequency can be arbitrarily specified, and the arbitrary heating can be performed. Can be distributed. As a result, with high efficiency with respect to any object 1 to be heated,
In addition, heating can be performed while suppressing uneven heating. That is, high-frequency energy can be directly applied to the object to be heated 1 with high efficiency. Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be significantly reduced.

【0068】また、この第8実施形態の高周波加熱装置
においても、ターンテーブルを不要にでき、被加熱物を
回転させることなくこれを均一に加熱することができ
る。更にターンテーブルを不要とすることで、装置コス
トを低減でき、かつ被加熱物を収納する有効スペースの
拡大が図れ、清掃性・操作性も向上する。
Also in the high-frequency heating device of the eighth embodiment, a turntable can be dispensed with and the object to be heated can be heated uniformly without rotating it. Further, by eliminating the need for a turntable, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be increased, and the cleanability and operability are improved.

【0069】[0069]

【発明の効果】以上述べたように、請求項1の発明によ
れば、加熱室下部の略中央部と導波管の境界に、ここに
至るまでの導波管の幅と同一か又はそれよりも広い給電
面を設定したので、高周波エネルギの大部分を直接被加
熱物に照射することができて、高効率で被加熱物に吸収
させることができる。このため、被加熱物を高効率で加
熱することができ、エネルギーロスを大幅に低減するこ
とができるとともに、ランナウェイ現象の発生を防ぎ、
均一に加熱することができる。更にターンテーブルを不
要とすることができて、装置コストを低減でき、かつ被
加熱物を収納する有効スペースの拡大が図れ、清掃性・
操作性を向上させることができる。
As described above, according to the first aspect of the present invention, the width of the waveguide equal to or smaller than the width of the waveguide up to the center of the lower portion of the heating chamber and the boundary between the waveguide and the waveguide. Since a wider power supply surface is set, most of the high-frequency energy can be directly radiated to the object to be heated, and can be absorbed by the object to be heated with high efficiency. Therefore, the object to be heated can be heated with high efficiency, the energy loss can be greatly reduced, and the runaway phenomenon can be prevented.
It can be heated uniformly. Furthermore, a turntable can be dispensed with, the equipment cost can be reduced, and the effective space for accommodating the object to be heated can be enlarged, and the cleaning property can be improved.
Operability can be improved.

【0070】また、請求項2の発明によれば、給電面に
つながる導波管の一端の壁を、平面的にみて加熱室底面
の略中央部を円弧の内側とする曲面または多面体に形成
したので、加熱室底面の中央部付近に高周波エネルギを
集中させることができて、被加熱物を高効率で加熱する
ことができる。このため、エネルギーロスを大幅に低減
することができるとともに、ランナウェイ現象の発生を
防ぎ、均一に加熱することができる。更にターンテーブ
ルを不要とすることができて、装置コストを低減でき、
かつ被加熱物を収納する有効スペースの拡大が図れ、清
掃性・操作性を向上させることができる。
According to the second aspect of the present invention, the wall at one end of the waveguide connected to the power supply surface is formed into a curved surface or a polyhedron having a substantially central portion of the bottom surface of the heating chamber as an inside of an arc when viewed in plan. Therefore, high-frequency energy can be concentrated near the center of the bottom surface of the heating chamber, and the object to be heated can be heated with high efficiency. For this reason, energy loss can be significantly reduced, the runaway phenomenon can be prevented, and uniform heating can be achieved. Furthermore, a turntable can be dispensed with, the equipment cost can be reduced,
In addition, the effective space for storing the object to be heated can be enlarged, and the cleanability and operability can be improved.

【0071】また、請求項3の発明によれば、給電面に
つながる導波管の一端の壁を、平面的にみて加熱室底面
の略中央部を中心とする皿形に形成したので、加熱室下
部の導波管に導かれてきた高周波エネルギを、皿形状部
の湾曲したテーパ状壁の面によって上方に直接反射さ
せ、加熱室の底面略中央部の円形の給電面より加熱室に
直接反射させて伝搬させることができる。このため、加
熱室底面の中央部付近に高周波エネルギを集中させるこ
とができて、被加熱物を高効率で加熱することができ
る。またエネルギーロスを大幅に低減することができる
とともに、ランナウェイ現象の発生を防ぎ、均一に加熱
することができる。更にターンテーブルを不要とするこ
とができて、装置コストを低減でき、かつ被加熱物を収
納する有効スペースの拡大が図れ、清掃性・操作性を向
上させることができる。
According to the third aspect of the present invention, the wall at one end of the waveguide connected to the power supply surface is formed in a dish shape centered on the substantially central portion of the bottom surface of the heating chamber when viewed in a plan view. The high-frequency energy guided to the waveguide at the lower part of the chamber is directly reflected upward by the curved tapered wall surface of the dish-shaped portion, and is directly transmitted to the heating chamber from the circular power supply surface substantially at the center of the bottom of the heating chamber. It can be reflected and propagated. Therefore, high-frequency energy can be concentrated near the center of the bottom surface of the heating chamber, and the object to be heated can be heated with high efficiency. In addition, energy loss can be greatly reduced, and the runaway phenomenon can be prevented and uniform heating can be performed. Further, a turntable can be eliminated, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be expanded, and the cleanability and operability can be improved.

【0072】また、請求項4の発明によれば、給電面
を、加熱室底面の略中央部を中心とする円形または多角
形に形成したので、下方の導波管からの高周波エネルギ
を効率よく加熱室内に伝搬させることができる。更にタ
ーンテーブルを不要とすることができて、装置コストを
低減でき、かつ被加熱物を収納する有効スペースの拡大
が図れ、清掃性・操作性を向上させることができる。
According to the fourth aspect of the present invention, since the power supply surface is formed in a circular or polygonal shape centered on the substantially central portion of the bottom surface of the heating chamber, high-frequency energy from the lower waveguide can be efficiently used. It can propagate into the heating chamber. Further, a turntable can be eliminated, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be expanded, and the cleanability and operability can be improved.

【0073】また、請求項5の発明によれば、給電面
を、加熱室底面の略中央部を中心とする円形給電面また
は多角形給電面と、その周囲に設けたスロット給電面と
から形成するとともに、スロット給電面を開閉するスロ
ット開閉手段と、物理量検出手段の検出結果に基づいて
スロット開閉手段を駆動制御するスロット開閉制御手段
とを設けたので、被加熱物の位置、大きさ、種類等に対
して、高効率に最適な開口パターンで加熱することがで
きる。また下方の導波管からの高周波エネルギを、加熱
室底面の略中央部を中心とする円形または多角形に形成
された給電面より、下方の導波管からの高周波エネルギ
を効率よく加熱室内に伝搬させることができる。更にタ
ーンテーブルを不要とすることができて、装置コストを
低減でき、かつ被加熱物を収納する有効スペースの拡大
が図れ、清掃性・操作性を向上させることができる。
According to the fifth aspect of the present invention, the power supply surface is formed of a circular power supply surface or a polygonal power supply surface centered on a substantially central portion of the bottom surface of the heating chamber, and a slot power supply surface provided therearound. And the slot opening / closing means for opening / closing the slot power supply surface and the slot opening / closing control means for driving and controlling the slot opening / closing means based on the detection result of the physical quantity detecting means, so that the position, size and type of the object to be heated are provided. In contrast, heating can be performed with an optimum opening pattern with high efficiency. In addition, high-frequency energy from the lower waveguide is efficiently transferred from the lower waveguide to the heating chamber from a circular or polygonal power supply surface centered on the approximate center of the bottom of the heating chamber. Can be propagated. Further, a turntable can be eliminated, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be expanded, and the cleanability and operability can be improved.

【0074】また、請求項6の発明によれば、導波管内
の給電面下方に、高周波を多方向にランダムに反射させ
る導体で構成された可動スタラを設けるとともに、物理
量検出手段の検出結果に基づいてスタラを駆動制御する
スタラ駆動制御手段を設けたので、加熱室下部の導波管
を伝搬してきた高周波を、スタラによって多方向に反射
させて、加熱室の底面略中央部の給電面より加熱室に伝
搬させ、設置台上に置かれた被加熱物に対して直接ラン
ダムに照射させることができる。このため、底面の広い
被加熱物や複数個の被加熱物を加熱する際に被加熱物を
高効率で、かつ加熱ムラを押さえて加熱することができ
る。このように高周波エネルギは、その大部分が直接被
加熱物1に照射され、高効率で被加熱物に吸収される。
このため、被加熱物1を高効率で加熱することができ、
エネルギーロスを大幅に低減することができる。更にタ
ーンテーブルを不要とすることができて、装置コストを
低減でき、かつ被加熱物を収納する有効スペースの拡大
が図れ、清掃性・操作性を向上させることができる。
According to the present invention, a movable stirrer composed of a conductor that randomly reflects high frequency waves in multiple directions is provided below the power supply surface in the waveguide, and the detection result of the physical quantity detection means is provided. Since the stirrer drive control means for driving and controlling the stirrer is provided, the high frequency propagating through the waveguide at the lower portion of the heating chamber is reflected in multiple directions by the stirrer. The light is propagated to the heating chamber, and can be directly and randomly irradiated on the object to be heated placed on the installation table. For this reason, when heating an object to be heated having a wide bottom surface or a plurality of objects to be heated, the object to be heated can be heated with high efficiency and with reduced heating unevenness. As described above, most of the high-frequency energy is directly applied to the object to be heated 1 and is absorbed by the object to be heated with high efficiency.
Therefore, the object to be heated 1 can be heated with high efficiency,
Energy loss can be significantly reduced. Further, a turntable can be eliminated, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be expanded, and the cleanability and operability can be improved.

【0075】また、請求項7の発明によれば、導波管内
の給電面下方に、高周波を受信して電界を強くする高周
波受信体を設けたので、高周波受信体周り強電界域が発
生し、被加熱物の底面への照射効率が向上する。従って
高周波エネルギは、その大部分が直接被加熱物に照射さ
れ、高効率で被加熱物に吸収される。このため、被加熱
物1を高効率で加熱することができ、エネルギーロスを
大幅に低減することができる。更にターンテーブルを不
要とすることができて、装置コストを低減でき、かつ被
加熱物を収納する有効スペースの拡大が図れ、清掃性・
操作性を向上させることができる。
According to the seventh aspect of the present invention, since the high frequency receiver for receiving the high frequency and strengthening the electric field is provided below the power supply surface in the waveguide, a strong electric field area around the high frequency receiver is generated. The efficiency of irradiation on the bottom surface of the object to be heated is improved. Therefore, most of the high-frequency energy is directly applied to the object to be heated, and is absorbed by the object with high efficiency. Therefore, the object to be heated 1 can be heated with high efficiency, and the energy loss can be significantly reduced. Furthermore, a turntable can be dispensed with, the equipment cost can be reduced, and the effective space for accommodating the object to be heated can be enlarged, and the cleaning property can be improved.
Operability can be improved.

【0076】また、請求項8の発明によれば、高周波受
信体を可動機構に取付けるとともに、物理量検出手段の
検出結果に基づいて可動機構を駆動して高周波受信体の
位置を制御する高周波受信体位置制御手段を設けたの
で、高周波を受信する場所を任意に指定でき、任意の加
熱分布にすることができる。このため、任意の被加熱物
に対して高効率で、かつ加熱ムラを押さえて加熱するこ
とができる。また、被加熱物に対して高効率で高周波エ
ネルギを直接照射することができて、被加熱物を高効率
で加熱することができ、エネルギーロスを大幅に低減す
ることができる。更にターンテーブルを不要とすること
ができて、装置コストを低減でき、かつ被加熱物を収納
する有効スペースの拡大が図れ、清掃性・操作性を向上
させることができる。
According to the eighth aspect of the present invention, the high frequency receiver is mounted on the movable mechanism, and the high frequency receiver controls the position of the high frequency receiver by driving the movable mechanism based on the detection result of the physical quantity detecting means. Since the position control means is provided, a place for receiving the high frequency can be arbitrarily specified, and an arbitrary heating distribution can be obtained. For this reason, it is possible to heat any object to be heated with high efficiency and with reduced heating unevenness. In addition, high-frequency energy can be directly applied to the object to be heated with high efficiency, the object to be heated can be heated with high efficiency, and energy loss can be significantly reduced. Further, a turntable can be eliminated, the cost of the apparatus can be reduced, the effective space for storing the object to be heated can be expanded, and the cleanability and operability can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の第1実施形態に係る高周波加熱装置
の縦断面図である。
FIG. 1 is a longitudinal sectional view of a high-frequency heating device according to a first embodiment of the present invention.

【図2】 本発明の第2実施形態に高周波加熱装置を透
過的に示す斜視図である。
FIG. 2 is a perspective view transparently showing a high-frequency heating device according to a second embodiment of the present invention.

【図3】 第2実施形態に係る高周波加熱装置の構成図
である。
FIG. 3 is a configuration diagram of a high-frequency heating device according to a second embodiment.

【図4】 本発明の第第3実施形態に係る高周波加熱装
置を透過的に示す斜視図である。
FIG. 4 is a perspective view transparently showing a high-frequency heating device according to a third embodiment of the present invention.

【図5】 第3実施形態に係る高周波加熱装置の縦断面
図である。
FIG. 5 is a longitudinal sectional view of a high-frequency heating device according to a third embodiment.

【図6】 本発明の第4実施形態に係る高周波加熱装置
の横断面図である。
FIG. 6 is a cross-sectional view of a high-frequency heating device according to a fourth embodiment of the present invention.

【図7】 本発明の第5実施形態に係る高周波加熱装置
の給電面部分を拡大して示す平面図である。
FIG. 7 is an enlarged plan view showing a power supply surface portion of a high-frequency heating device according to a fifth embodiment of the present invention.

【図8】 第5実施形態に係る高周波加熱装置のスロッ
ト開閉板を示す平面図である。
FIG. 8 is a plan view showing a slot opening / closing plate of a high-frequency heating device according to a fifth embodiment.

【図9】 第5実施形態に係る高周波加熱装置の全体構
成を示す縦断面図である。
FIG. 9 is a longitudinal sectional view showing the entire configuration of a high-frequency heating device according to a fifth embodiment.

【図10】 本発明の第6実施形態に係る高周波加熱装
置の縦断面図である。
FIG. 10 is a longitudinal sectional view of a high-frequency heating device according to a sixth embodiment of the present invention.

【図11】 本発明の第7実施形態に係る高周波加熱装
置の縦断面図である。
FIG. 11 is a longitudinal sectional view of a high-frequency heating device according to a seventh embodiment of the present invention.

【図12】 本発明の第8実施形態に係る高周波加熱装
置の縦断面図である。
FIG. 12 is a longitudinal sectional view of a high-frequency heating device according to an eighth embodiment of the present invention.

【図13】 第1従来例の高周波加熱装置を示す縦断面
図である。
FIG. 13 is a longitudinal sectional view showing a high frequency heating device of a first conventional example.

【図14】 第2従来例の高周波加熱装置を示す縦断面
図である。
FIG. 14 is a longitudinal sectional view showing a high frequency heating device of a second conventional example.

【図15】 第3従来例の高周波加熱装置を示す縦断面
図である。
FIG. 15 is a longitudinal sectional view showing a high frequency heating device of a third conventional example.

【図16】 第4従来例の高周波加熱装置を示す縦断面
図である。
FIG. 16 is a longitudinal sectional view showing a high frequency heating device of a fourth conventional example.

【符号の説明】[Explanation of symbols]

1 被加熱物、2 加熱室、3 高周波発生器、4 物
理量検出手段、5 制御手段、5A 制御手段(スロッ
ト開閉制御手段)、5B 制御手段(スタラ駆動制御手
段)、5C 制御手段(高周波受信体位置制御手段)、
6,6A,6B導波管、6a,6b,6c 導波管の一
端の壁、7 高周波、8,8A,8B給電面、8C 円
形給電面、8D スロット給電面、12 設置台、50
スロット開閉手段、61 可動スタラ、71 高周波
受信体、72 水平回転板(高周波受信体可動機構)。
REFERENCE SIGNS LIST 1 object to be heated, 2 heating chamber, 3 high-frequency generator, 4 physical quantity detection means, 5 control means, 5A control means (slot open / close control means), 5B control means (stirrer drive control means), 5C control means (high-frequency receiver Position control means),
6, 6A, 6B waveguide, 6a, 6b, 6c One end wall of waveguide, 7 high frequency, 8, 8A, 8B power supply surface, 8C circular power supply surface, 8D slot power supply surface, 12 mounting table, 50
Slot opening / closing means, 61 movable stirrer, 71 high frequency receiver, 72 horizontal rotating plate (high frequency receiver movable mechanism).

───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮前 哲也 埼玉県大里郡花園町大字小前田1728番地1 三菱電機ホーム機器株式会社内 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Tetsuya Miyamae 1728-1 Komaeda, Hanazono-cho, Osato-gun, Saitama Prefecture Mitsubishi Electric Home Equipment Co., Ltd.

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 被加熱物を収納する加熱室と、 高周波を発生する高周波発生器と、 被加熱物の重量・形状等を検出する物理量検出手段と、 該物理量検出手段の検出結果に基づいて前記高周波発生
器を制御する制御手段と、 前記加熱室下部に設けられ、前記高周波発生器から発生
する高周波を前記加熱室に伝送する導波管と、 前記加熱室下部の略中央部と前記導波管の境界に設けら
れ、ここに至るまでの導波管の幅と同一か又はそれより
も広く設定された給電面と、 低誘電率材質からなり、前記給電面上に設けられて被加
熱物を設置する設置台と、を備えたことを特徴とする高
周波加熱装置。
1. A heating chamber for accommodating an object to be heated, a high frequency generator for generating a high frequency, a physical quantity detecting means for detecting a weight and a shape of the object to be heated, and based on a detection result of the physical quantity detecting means. Control means for controlling the high-frequency generator; a waveguide provided in the lower part of the heating chamber, for transmitting a high-frequency wave generated from the high-frequency generator to the heating chamber; A power supply surface that is provided at the boundary of the waveguide and that is set to be equal to or wider than the width of the waveguide up to the waveguide; and a low-dielectric-constant material that is provided on the power supply surface and is heated. A high-frequency heating device comprising: an installation table on which an object is installed.
【請求項2】 給電面につながる導波管の一端の壁を、
平面的にみて加熱室底面の略中央部を円弧の内側とする
曲面または多面体に形成したことを特徴とする請求項1
記載の高周波加熱装置。
2. A wall at one end of a waveguide connected to a power supply surface,
2. A curved surface or a polyhedron having a substantially central portion of a bottom surface of the heating chamber as an inner side of a circular arc in a plan view.
The high-frequency heating device as described.
【請求項3】 給電面につながる導波管の一端の壁を、
平面的にみて加熱室底面の略中央部を中心とする皿形に
形成したことを特徴とする請求項1記載の高周波加熱装
置。
3. A wall at one end of a waveguide connected to a power supply surface,
2. The high-frequency heating device according to claim 1, wherein the heating device is formed in a dish shape centered on a substantially central portion of a bottom surface of the heating chamber when viewed in plan.
【請求項4】 給電面を、加熱室底面の略中央部を中心
とする円形または多角形に形成したことを特徴とする請
求項1乃至請求項3のいずれかに記載の高周波加熱装
置。
4. The high-frequency heating apparatus according to claim 1, wherein the power supply surface is formed in a circular or polygonal shape centered on a substantially central portion of the bottom surface of the heating chamber.
【請求項5】 給電面を、加熱室底面の略中央部を中心
とする円形給電面または多角形給電面と、その周囲に設
けたスロット給電面とから形成するとともに、 該スロット給電面を開閉するスロット開閉手段と、 物理量検出手段の検出結果に基づいて前記スロット開閉
手段を駆動制御するスロット開閉制御手段と、を設けた
ことを特徴とする請求項1乃至請求項3のいずれかに記
載の高周波加熱装置。
5. The power supply surface is formed of a circular power supply surface or a polygonal power supply surface centered on a substantially central portion of the bottom surface of the heating chamber, and a slot power supply surface provided therearound. 4. A slot opening / closing means for controlling the slot opening / closing means based on a detection result of the physical quantity detecting means. High frequency heating device.
【請求項6】 導波管内の給電面下方に、高周波を多方
向にランダムに反射させる導体で構成された可動スタラ
を設けるとともに、 物理量検出手段の検出結果に基づいて前記スタラを駆動
制御するスタラ駆動制御手段を設けたことを特徴とする
請求項1乃至請求項5のいずれかに記載の高周波加熱装
置。
6. A stirrer provided below a power supply surface in a waveguide, the movable stirrer being constituted by a conductor that randomly reflects high frequency waves in multiple directions, and a stirrer that drives and controls the stirrer based on a detection result of a physical quantity detection unit. The high-frequency heating device according to any one of claims 1 to 5, further comprising a drive control unit.
【請求項7】 導波管内の給電面下方に、高周波を受信
して電界を強くする高周波受信体を設けたことを特徴と
する請求項1乃至請求項5のいずれかに記載の高周波加
熱装置。
7. The high-frequency heating apparatus according to claim 1, further comprising a high-frequency receiver for receiving a high-frequency wave and increasing an electric field below the power supply surface in the waveguide. .
【請求項8】 高周波受信体を可動機構に取付けるとと
もに、 物理量検出手段の検出結果に基づいて前記可動機構を駆
動して前記高周波受信体の位置を制御する高周波受信体
位置制御手段を設けたことを特徴とする請求項7記載の
高周波加熱装置。
8. A high-frequency receiver position control means for attaching the high-frequency receiver to the movable mechanism and driving the movable mechanism based on the detection result of the physical quantity detection means to control the position of the high-frequency receiver. The high-frequency heating device according to claim 7, wherein:
JP08658898A 1998-03-31 1998-03-31 High frequency heating equipment Expired - Fee Related JP3517825B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP08658898A JP3517825B2 (en) 1998-03-31 1998-03-31 High frequency heating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08658898A JP3517825B2 (en) 1998-03-31 1998-03-31 High frequency heating equipment

Publications (2)

Publication Number Publication Date
JPH11287456A true JPH11287456A (en) 1999-10-19
JP3517825B2 JP3517825B2 (en) 2004-04-12

Family

ID=13891178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08658898A Expired - Fee Related JP3517825B2 (en) 1998-03-31 1998-03-31 High frequency heating equipment

Country Status (1)

Country Link
JP (1) JP3517825B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007026738A (en) * 2005-07-13 2007-02-01 Mitsubishi Electric Corp High frequency heating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007026738A (en) * 2005-07-13 2007-02-01 Mitsubishi Electric Corp High frequency heating device

Also Published As

Publication number Publication date
JP3517825B2 (en) 2004-04-12

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