JPH11268827A - Substrate processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To perform more stable delivering in a substrate conveying system as well as to perform more smooth and accurate adjustment. SOLUTION: Since a lifter device 31 and a conveying mechanism 9 are arranged on the same side, taking-out of a substrate 2 on respective substrate holding parts of the lifter device 31 and the conveying mechanism 9 can be adjusted from the same side by one operator, and maintenance work can be more smoothly and reliably performed. Moreover, since holding arms 32 or a pair of holding plates 29 as base plate holding parts have forward projecting cantilever structures, they are inclined downward by the gaps of their movable root parts or by the length in which they are made flex by holding many heavy substrates 2. However, the relative inclination of the holding arms 32 of the lifter device 31 and a pair of holding plates 28 of the conveying mechanism 9 are not added and drastically canceled in delivering of a plurality of substrates 21.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor wafer or a glass substrate for a liquid crystal display panel in a processing tank for storing a rinsing liquid such as a chemical liquid or pure water (a chemical liquid and a rinsing liquid are collectively referred to as a processing liquid). The present invention relates to a substrate processing apparatus that performs a predetermined process on a substrate by immersing a thin substrate such as the substrate.

[0002]

2. Description of the Related Art Conventionally, in a manufacturing process of a precision electronic substrate using a semiconductor wafer, a glass substrate for a liquid crystal display panel, or the like, various surface treatments are performed by immersing the substrate in a processing liquid. Such a surface treatment has a chemical solution tank storing a chemical solution such as an etching solution, and a washing tank storing pure water as a rinsing solution, and immerses the substrate sequentially in the chemical solution tank and further in the water washing tank. After the substrate is subjected to the chemical treatment, the substrate is further subjected to a rinsing treatment to wash away the chemical and particles adhered to the substrate in a washing tank.

FIG. 6 is a schematic diagram showing a schematic configuration of a main part in a conventional substrate processing apparatus.

[0006] In FIG. 6, a substrate processing apparatus 51 is an apparatus for processing a plurality of substrates at a time, and carries out a loading / unloading section (see FIG. 6) for transferring a predetermined number of substrates set in a cassette to / from the outside of the apparatus. Not-shown), a transport section 52 that receives and transports the substrate from the loading / unloading section (not shown), and transfers the substrate to a loading / unloading section (not shown).
While receiving the substrate from and performing predetermined processing on the substrate,
Each processing unit 53 transfers the processed substrate to the transport unit 52.

[0005] The transport section 52 is disposed on each of the upper and lower transport paths, and the direction in which the processing units 53 are disposed (X direction).
Transfer robots 52a and 52b respectively moving to
It has. Each of these transfer robots 52a and 52b has a direction perpendicular to the plane of FIG.
Each of the holding plates 54 is attached via a shaft member 54a (FIG. 7) extending in the Y direction (see FIG. 7), and the holding grooves (not shown) inside the pair of holding plates 54 stand upright. In a state where the plurality of substrates 55 are arranged in the Y direction, both side end surfaces thereof are sandwiched from both sides, and are received and held by the respective holding grooves.

Each processing unit 53 includes a chemical solution tank 56 storing a chemical solution such as an etching solution, and a chemical solution tank 5.
6, a washing tank 57 for washing the chemical solution or particles attached to the substrate 55, a chemical solution tank 58 storing the chemical solution, and a chemical solution or particles attached to the substrate 55 treated by the chemical solution tank 58 for washing. Washing tank 59
A drying tank 60 is provided for drying the substrate 55 that has been subjected to the water washing processing in the washing tank 59. A series of various processes such as a chemical solution treatment and a water washing process are performed on the substrate 55 by immersing a plurality of substrates 55 collectively and sequentially in the chemical solution tank 56, the washing tank 57, the chemical solution tank 58, and the washing tank 59. The substrate 55 after the processing is dried.

Further, each of the processing tanks of the chemical tanks 56 and 58 and the washing tanks 57 and 59 has a lifter device 6 respectively.
1, each of the lifter devices 61 is capable of mounting a plurality of substrates 55, and is configured to be vertically movable between the inside of the processing tank and the substrate delivery position. An outer member 62 is provided in each of the processing tanks of the chemical solution tanks 56 and 58 and the washing tanks 57 and 59, and upper surfaces of the outer member 62 and the drying tank 60 are respectively provided. An opening / closing door 63 capable of opening and closing the substrate introduction port is provided so as to face the upper opening port of the processing tank. Each of these opening / closing doors 63 is normally closed, and is configured to open on both sides in conjunction with the lowering of the lifter device 61 into the processing tank. It is configured to open.

An exhaust duct 64 is opened at an appropriate position of each of the outer shell members 62.
Is connected to an exhaust pump 66 via a flow control valve 65. Due to the exhaust in the outer member 62 due to this,
Even if the opening / closing door 63 of the substrate introduction port of the outer member 62 is opened, the external air flows in from the substrate introduction port, so that fumes (acids, alkalis, and the like) from the chemical solution tanks 56 and 58 pass through the substrate introduction port. (Mixed atmosphere) is prevented from diffusing to the outside.

[0009] Further, as shown in FIG.
1 and, for example, the transfer robot 52b are arranged side by side (FIG. 7).
A plurality of processing tanks arranged perpendicularly to the plane of FIG. 6 (X direction in FIG. 6) are disposed so as to face each other with both processing tanks being sandwiched from both sides in the width direction thereof. Similarly, the lifter device 61 and, for example, the transfer robot 52a are opposed to each other by sandwiching a plurality of processing tanks arranged side by side (in the X direction in FIG. 6 perpendicular to the plane of FIG. 7) from both sides in the width direction thereof. It is arranged in the state where it did.

With the above configuration, first, the transfer robot 52
b receives a substrate from a carry-in / out section (not shown) and conveys the substrate to the substrate delivery position above the chemical solution tank 56 of each processing unit 53 along the disposition direction (X direction). At this time,
As shown in FIG. 7, the pair of holding plates 54 of the transfer robot 52b hold and hold the two side end surfaces of the plurality of substrates 55 in the upright posture from both sides by a plurality of holding grooves inside them. doing. On the other hand, the lifter device 61 of the chemical solution tank 56 rises, and the plurality of substrates held by the transfer robot 52b are held by the plurality of holding grooves provided above the three holding arms 61a provided below. Receive from below. Thereafter, the pair of holding plates 5 of the transfer robot 52b
By rotating the transfer robots 4 in the vertical direction as indicated by solid lines, the holding of the transfer robot 52b on the plurality of substrates 55 is released, and the transfer of the plurality of substrates 55 to the lifter device 61 is completed.

Next, the lifter device 61 descends into the chemical solution tank 56 with the plurality of substrates held by the plurality of holding grooves above the three holding arms 61a. In conjunction with this downward movement, the open / close door 63 of the outer member 62 rises and opens on both sides as shown by phantom lines, and a plurality of substrates 5 are opened from the upper opening of the chemical solution tank 56.
The plurality of substrates 55 are subjected to a predetermined chemical treatment by immersing the holding arm 61a holding 5 in the chemical solution and leaving it to stand for a predetermined time. At this time, the opening and closing door 63 is closed, and the chemical solution tank 56 is substantially sealed by the outer shell member 62. Also,
The inside of the outer shell member 62 is exhausted by the exhaust
4 is exhausted.

Further, after a predetermined time, the lifter device 61
The plurality of substrates 55 after the chemical processing are lifted, and the opening / closing door 63 is raised and opened on both sides as shown by phantom lines in conjunction therewith, and a holding arm holding the plurality of substrates 55 from the upper opening of the chemical solution tank 56. 61 a is raised to the substrate delivery position above the chemical solution tank 56. At the substrate transfer position, the transfer robot 52b is on standby with the pair of holding plates 54 arranged vertically, and after the holding arm 61a holding the plurality of substrates 55 arrives at the substrate transfer position, the pair of paired holding plates 54 By rotating the lower sides of the holding plates 54 inward, the both end surfaces of the plurality of substrates 55 are sandwiched from both sides, respectively, and received and held by the holding grooves of the pair of holding plates 54.

Further, the lifter device 61 is connected to the holding arm 61.
a, and the substrate 55 is
After the transfer, the transfer robot 52b moves the plurality of substrates 5
5 is conveyed along the disposition direction (X direction) to the substrate delivery position above the washing tank 57 located next to the chemical tank 56. At this time, the pair of holding plates 54 of the transfer robot 52b respectively hold and hold the both side end surfaces of the plurality of substrates 55 in the upright posture from both sides by the plurality of holding grooves inside them. . On the other hand, the lifter device 61 of the washing tank 57 is raised, and the plurality of substrates held by the transfer robot 52b are held by the plurality of holding grooves on the upper side of the three holding arms 61a provided below. 55 is received from below. Thereafter, the pair of holding plates 54 of the transfer robot 52b are rotated so that their longitudinal directions are vertical, and the holding of the transfer robot 52b on the plurality of substrates 55 is released, and the lifter device 61 of the washing tank 57 is released.
The delivery of the plurality of substrates 55 to is completed.

Further, the lifter device 61 of the washing tank 57 descends toward the inside of the washing tank 57 while holding the plurality of substrates 55 in the plurality of holding grooves above the three holding arms 61a. At the same time, the transfer robot 52b in an empty state after the transfer of the substrate 55 moves along the disposing direction (X direction) to the substrate transfer position with respect to the carry-in / out portion (not shown), and a plurality of transfer robots 52b move from the carry-in / out portion. In preparation for delivery of the substrate 55.

The opening and closing door 63 of the outer member 62 is opened in conjunction with the lowering of the lifter device 61, and the holding arm 61a holding the plurality of substrates 55 is immersed in the pure water from the upper opening of the washing tank 57. The plurality of substrates 55 are subjected to a water washing process. At the time of this water washing process, the opening and closing door 63 is closed,
The inside of the outer member 62 of the washing tank 57 is sealed.

Further, after a predetermined time, the lifter device 61
The plurality of substrates 55 after the rinsing process are lifted, and the opening / closing door 63 is opened so as to be interlocked therewith, and the holding robot 61a holding the plurality of substrates 55 from the upper opening of the rinsing tank 57 is transferred to the transfer robot above the rinsing tank 57. It is raised to the upper substrate transfer position for 52a. At the board transfer position, the transfer robot 52a is on standby with the longitudinal direction of the pair of holding plates 54 set to the vertical direction, and after the holding arm 61a holding the plurality of boards 55 arrives at the board transfer position. By rotating the lower sides of the pair of holding plates 54 inward, respectively,
By holding both side end surfaces of the plurality of substrates 55 from both sides and receiving and holding the holding grooves in the respective holding grooves, the plurality of substrates 55 are held.
Delivery.

Thereafter, the transfer robot 52a moves the drying tank 6
The plurality of substrates 55 are conveyed to zero and the drying process is performed on the plurality of substrates 55 in the drying tank 60. In addition, the transfer robot 52b
While transferring the plurality of substrates 55 to and from the lifter device 61 of each processing tank, the same operation as described above is repeated to repeat the chemical liquid tank 56.
Further, the plurality of substrates 55 are transported so as to perform a series of processing by the washing tank 57.

Further, the transfer robot 52a, which has received the plurality of substrates 55 after the drying process from the lifter device 61 of the drying tank 60, moves the substrate 55 to a substrate transfer position with respect to a carry-in / out section (not shown) (X direction). A plurality of processed substrates 55 are conveyed along and the plurality of processed substrates 55 are delivered to the loading / unloading section.

[0019]

However, in the above-mentioned conventional configuration, as shown in FIG. 7, the lifter device 61 and, for example, the transfer robot 52b move the processing units 53 arranged side by side in their width direction. It is arranged in a state where it is sandwiched from both sides and faces each other. As described above, the lifter device 61 and the transfer robots 52a and 52b each have a cantilever structure in which the substrate holding portions (holding plate 54 and holding arm 61a) protrude forward (Y direction in FIG. 7 orthogonal to the transfer direction). As shown in FIG. 8, the holding plate 54, which is a substrate holding portion of each of the movable base portions, is bent by holding a large number of heavy substrates 55.
And the holding arms 61a are inclined downward in a state where they face each other. Assuming that the downward inclination of each of the substrate holding portions of the holding plate 54 and the holding arm 61a is θ1, θ2,
For example, when the plurality of substrates 55 are transferred from the holding grooves of the pair of holding plates 54 of the transfer robot 52b to the plurality of holding grooves above the three holding arms 61a of the lifter device 61, the relative positions of the holding plate 54 and the holding arms 61a are changed. Inclination is θ1 + θ
When the number of the substrate holding grooves to be transferred is increased when the plurality of substrates are transferred,
The held substrate pitch may not match, and the plurality of substrates 55 may be transported without being securely held in the substrate holding groove, and may be damaged by dropping from the holding plate 54 or the holding arm 61a. However, there is a problem that the delivery of the substrate becomes unstable.

A lifter device 61 and a transfer robot 52
The lifters 61a and 52b are arranged in such a manner that a plurality of processing tanks arranged side by side are opposed to each other while sandwiching them from both sides in the width direction.
For example, at the time of a maintenance operation for adjusting the arrangement of the substrates 55 in the respective substrate holding portions b, a plurality of substrates 55 are communicated with each other from both sides of the apparatus while communicating with each other.
This had to be adjusted, which hindered a smoother and more accurate adjustment.

An object of the present invention is to solve the above-mentioned conventional problems and to provide a substrate processing apparatus capable of performing smoother and more accurate adjustment and performing more stable substrate delivery in a substrate transport system. And

[0022]

According to a first aspect of the present invention, there is provided a substrate processing apparatus for performing a predetermined processing on a substrate, wherein the processing liquid is arranged in a predetermined direction, and a processing liquid for immersing the substrate in each of the processing liquids. A plurality of stored processing tanks, a first transfer unit that transfers the substrate along the plurality of processing tanks, and a vertically movable unit that moves the substrate between the first transfer unit and the processing tank. And a second transporting means for transporting, wherein the first transporting means and the second transporting means are respectively arranged on the same side with respect to the plurality of processing tanks.

According to this configuration, since the first transfer means and the second transfer means are respectively disposed on the same side with respect to the plurality of processing tanks, a cantilever structure in which the substrate holding portion protrudes forward. Therefore, the relative inclinations of the respective substrate holding portions of the first transport means and the second transport means are not added as in the related art, and are largely offset.

Further, the substrate processing apparatus according to claim 2 is
2. The substrate processing apparatus according to claim 1, wherein the first transfer unit includes a pair of holding units for holding the substrate, and wherein the second transfer unit includes a pair of the first transfer unit and the second transfer unit. 3. When a substrate is transferred between the pair of holding units, a movable holding unit that can move up and down between the pair of holding units and holds the substrate is provided.

According to this configuration, when the substrate is transferred between the first transport means and the second transport means, the movable holding part of the second transport means is moved between the pair of holding parts of the first transport means. Moves up and down, so that the substrate can be smoothly transferred.

[0026]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the substrate processing apparatus according to the present invention will be described with reference to the drawings, but the present invention is not limited to the embodiments described below.

FIG. 1 is a perspective view showing a schematic configuration of a main part of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a schematic configuration of a main part of the substrate processing apparatus of FIG. FIG.

In FIG. 1, a substrate processing apparatus 1 is an apparatus that collectively processes a plurality of substrates 2 such as wafers.
A loading / unloading unit 4 for transferring a predetermined number of substrates 2 set in the cassette 3 to / from the outside of the apparatus, receiving and transporting the unprocessed substrates 2 from the loading / unloading unit 4, and performing predetermined processing on the substrates 2 And a substrate processing unit 5 for transporting the processed substrate 2 and transferring it to the carry-in / out unit 4.

The loading / unloading section 4 includes a cassette loading table 6 for temporarily placing a plurality of loaded substrates 2 (or immediately before being loaded) in a state where the substrates 2 are set in the cassette 3, and both upper ends of the cassette 3. Two cantilevered cassette holding arms 7 projecting in a cantilever shape for receiving and holding the flange portions 3a from below, respectively, are movable in the cassette arrangement direction of the cassette mounting table 6, and the cassette holding arms 7
To take up and hold the cassette 3 or to place the cassette 3, and can be moved up and down in a vertical direction, and rotated around an axis parallel to the vertical direction (a support shaft that supports the mounting member of the cassette holding arm 7). Transfer robot 8 freely configured
A projecting portion 10 which pushes up only a plurality of substrates 2 in the cassette 3 placed from the cassette placing table 6 by the transfer robot 8 and transfers it to the transport mechanism 9;
And a cassette cleaning unit 11 for cleaning an empty cassette 3 placed from the protruding portion 10 by the cassette cleaning unit 11. The transfer robot 8 transports and places the cassette 3 from the cassette mounting table 6 to a predetermined position of the protrusion 10, and pushes up only the plurality of substrates 2 from the cassette 3 at the protrusion 10 and transfers it to the transfer mechanism 9. The subsequent empty cassette 3 is transferred to the cassette cleaning unit 11, and the plurality of processed substrates 2 is transferred to the empty cassette 3 cleaned by the cassette cleaning unit 11 by the transport mechanism 9.
Is transferred to a predetermined position where the protruding portion 10 is positioned again and waited for being transferred to the protruding portion 10 and collected in the cassette 3.

As shown in FIG. 2, the substrate processing unit 5 includes a plurality of substrate processing areas 1 in each of the tank outer members 16 (in the processing section) covering the plurality of processing tanks 12 to 15, respectively.
7, two second substrate transfer areas 18 and 19 provided above the plurality of substrate processing areas 17 and having a second transfer path for transferring between the respective substrate processing areas 17, and these second substrate transfer areas Substrates 2 for 18 and 19 respectively
Substrate transport area 20 having a first transport path for transporting
And transfer area outer members 21 as separation members (atmosphere blocking members) for separating and separating the second substrate transfer areas 18 and 19 and the first substrate transfer area 20, respectively. . This transport area outer member 21
In the upper position corresponding to (opposed to) the upper open port of one processing tank (the washing tank in the present embodiment), the space between the second substrate transfer area 18 and the first substrate transfer area 20 and the second substrate Each opening 22 capable of transporting a plurality of substrates 2 between the transport area 19 and the first substrate transport area 20 is provided. Further, an exhaust unit 23 is provided for exhausting the atmosphere in each of the substrate processing areas 17 and the second substrate transfer areas 18 and 19. As described above, the outer clean first substrate transfer area 20 partitioned by the transfer area outer member 21 and the second substrate inside the transfer area outer member 21 in which fumes are diffused by taking the plurality of substrates 2 in and out of the chemical solution. The transfer areas 18 and 19 and a substrate processing area 17 for actually processing a plurality of substrates 2 are divided into three areas, and the atmosphere in the substrate processing area 17 and the second substrate transfer areas 18 and 19 is evacuated by an exhaust unit 23. , The diffusion of fumes into the first substrate transfer area 20 is more reliably prevented.

That is, in the present embodiment, the plurality of processing tanks 12 to 15 include a chemical tank 12 storing a chemical such as an etching liquid, and a substrate 2 processed by the chemical tank 12.
Rinse tank 13 to wash away chemicals and particles attached to
And a chemical tank 14 for storing a chemical, and a washing tank 15 for washing away the chemical and particles attached to the substrate 2 that has been processed by the chemical tank 14. One of the transfer area outer members 21 is a tank outer member 1 covering the chemical solution tank 12.
6 and a tank outer member 16 that covers the washing tank 13 and a second substrate transfer area 18 that can transfer a substrate between the respective tank outer members 16 (between the processing units). Have been. The other of the transfer area outer members 21 is a tank outer member 16 covering the chemical solution tank 14 and a washing tank 15.
And a second substrate transfer area 1 capable of transferring a substrate between the respective tank outer members 16,
9 is also covered. Furthermore, the chemical solution tank 1
Each of the substrate introduction ports 2 into which a plurality of substrates 2 can be introduced, respectively, is provided on the upper surface of each tank outer member 16 corresponding to (opposing to) each of the upper open ports of the washing tanks 13 and 15.
4 are provided respectively. Each of these substrate inlets 2
4, upper transport area outer members 2 corresponding to (facing) the respective substrate introduction ports 24 on the washing tanks 13 and 15 side.
Each of the openings 22 through which the plurality of substrates 2 can be introduced is provided only on the upper surface of the substrate 1. On the other hand, the chemical tank 12,
Substrate introduction ports 24 are respectively disposed above each of the upper open ports 14 so as to face each of the upper open ports, and further, each of the transport area outer members 21 above the substrate inlet ports 21 has no opening. This is not only the partition between the areas by the transfer area outer member 21 but also the second substrate transfer area 18,
The communication area (opening area) between the first substrate transfer area 20 and the first substrate transfer area 20 is made smaller to suppress the diffusion of fume into the first substrate transfer area 20, and the fumes to the first substrate transfer area 20 are exhausted by the exhaust means 23. This is because the atmosphere in the substrate processing area 17 and the second substrate transport areas 18 and 19 is evacuated to such an extent as to prevent the diffusion of the gas.

Further, a drying tank 25 for drying the substrate 2 that has been subjected to the water-washing treatment in the water-washing tank 15 is provided adjacent to the water-washing tank 15. A plurality of substrates 2 are subjected to a series of various processes such as a chemical solution treatment and a water washing process by sequentially immersing the plurality of substrates 2 in the respective treatment tanks in the chemical solution tank 12, the washing tank 13, and the like. The plurality of substrates 2 are dried in a drying tank 25. The drying tank 25 is a drying hot air having a predetermined temperature (the temperature may be raised by a heater or the like).
May be supplied, or reduced pressure drying using IPA (isopropyl alcohol) may be used.

Further, a plate-shaped opening / closing door 26 which slides each opening 22 to open and close, and an opening / closing drive means (not shown) for driving the opening / closing door 26 to open and close according to the substrate transport. Are disposed on the upper surface of the transfer area outer member 21. The opening / closing door 26 and the opening / closing drive means constitute shutter means, and can be opened and closed with respect to the substrate transfer opening 22. In addition, each inlet opening / closing door 27 that opens and closes the substrate inlet 24 of each tank outer member 16, and each inlet opening / closing door 2.
Inlet opening / closing driving means (not shown) for driving the opening / closing of the tank 7 in accordance with the transfer of the substrate (not shown) is disposed on the upper surface of each tank outer member 16. The reason why each inlet / outlet door 27 is provided in each of the outer shell members 16 is not only to prevent fume diffusion but also to minimize evaporation of volatile components contained in the liquid. Also, the opening / closing doors 26 are provided because the second substrate transport areas 18 and 1 are located on the first substrate transport area 20 side where high cleanliness is required.
This is to prevent fumes from being diffused from the 9 side as much as possible. From this viewpoint, each of these opening / closing doors 26
In addition, each inlet opening / closing door 27 is closed except during distribution of the plurality of substrates 2. Further, each inlet opening / closing door 28 for opening and closing the substrate inlet is also provided on the upper surface of the drying tank 25.

In the present embodiment, the opening / closing door 26 slides a predetermined distance along the upper surface of the transfer area outer member 21 and horizontally moves to open / close the opening 22. The door 27 is configured to open and close the substrate introduction port 24 by being rotationally driven on both sides in a double open manner. These opening and closing drive means and inlet opening and closing drive means may be constituted by, for example, an air cylinder (not shown). In this case, the tip of the rod of the air cylinder is attached to the opening / closing door 26, and the opening 22 is opened and closed by the expansion and contraction of the rod by a predetermined stroke. The inlet opening / closing door 27 is composed of two doors. One end of each arm is fixed to each of the doors, and each arm (not shown) is rotatably supported at the center of the arm. At the other end, the rod end of the air cylinder is attached, and the inlet opening / closing door 27 is extended and contracted by a predetermined stroke of the rod.
Is pivotally driven on both sides in an open manner via an arm (not shown) to open and close the substrate introduction port 24.
In this way, when the inlet opening / closing door 27 is opened for both sides to open and close each door, two air cylinders may be provided for driving each door.

Further, the transfer mechanism 9 is constituted by a transfer robot, and is provided with a pair of holding plates 29 which can move in the direction in which the plurality of processing tanks 12 to 15 are arranged (X direction) and can hold a plurality of substrates 2. Have. The pair of holding plates 29 are respectively fixed to shaft members 30 (FIG. 3) extending in a direction (Y direction in FIG. 3) orthogonal to the paper surface of FIG. Are connected to the transport mechanism main body 9a so as to be rotatable in opposite directions about the respective rotation centers. Further, a plurality of holding grooves (not shown) capable of holding a plurality of substrates 2 in a standing (vertical) posture at predetermined intervals are formed in the opposed inner sides of the pair of holding plates 29, respectively. ing. With the lower end portions of the pair of holding plates 29 approaching each other inside, the plurality of substrates 2 are arranged in the Y direction, and both side end surfaces thereof are sandwiched from both sides, respectively, and received and held by the respective holding grooves.

Further, lifter devices 31 for transporting a plurality of substrates 2 are provided in the chemical bath 12 and the washing bath 13 and in the chemical bath 14 and the washing bath 15, respectively. As shown in FIG. 3, each of the lifter devices 31 has a plurality of substrate holding grooves 32 a formed therein, and a plurality of substrate holding grooves 32 a which receive the plurality of substrates 2 from below in the respective substrate holding grooves 32 a and hold the substrates 2 in a standing posture. An arm 32, a movable holding plate 33 in which the three holding arms 32 are connected in an L-shape at the lower end, and a movable member 34 fixed to the back surface of the upper end of the movable holding plate 33 and capable of moving up and down and moving horizontally. And driving means (not shown) for vertically moving and horizontally moving the movable member 34 are provided, respectively. In addition, drying tank 2
5, each lifter device 35 for transporting a plurality of substrates 2 is provided, and the lifter device 35 has the same configuration as the lifter device 31.

A driving means (not shown) for each of the lifter devices 31 and 35 is provided with a guide member (not shown) such as a rail.
And a vertical drive unit for moving the movable member 34 in the vertical direction along a guide member (not shown) such as a rail. For example, a pulley or a roll for driving a wire or a belt is rotated by a motor. The movable member 34 attached to a wire, a belt, or the like may be driven to move up and down. Further, the pinion and the rack may be driven by a motor to move the movable member 34 up and down, or the ball screw and the motor may be used to move the movable member 34 up and down. Various driving systems are conceivable. Further, the drive means (not shown) of each lifter device 31 has a horizontal drive unit for moving the movable member 34 in a horizontal direction together with the vertical drive unit along a guide member (not shown) such as a rail. Various drive systems such as a ball screw can be considered in the same manner as described above.

The inlet opening / closing door 27 is configured to open in conjunction with the lowering of each lifter device 31 into the processing tank, and the inlet opening / closing door 27 is linked in conjunction with the ascent from the processing tank.
Is configured to open. In addition, each lifter device 31
The opening / closing door 26 is configured to open in conjunction with the lowering into the second substrate transfer area 18 or the second substrate transfer area 19, and the second substrate transfer area 18 or the second substrate transfer The opening / closing door 26 is configured to open in conjunction with the rise from the inside of the area 19. further,
The inlet opening / closing door 28 is configured to open in conjunction with the lowering of the lifter device 35 into the drying tank 25, and the inlet opening / closing door 28 is opened in association with the ascent from the drying tank 25. It is configured. In other words, these opening / closing doors 26 and introduction opening / closing doors 27 and 28 are each opened only when a plurality of substrates 2 pass, and the other are closed.

Further, on the upper side wall of each tank outer member 16 (at the height position of the processing tank open port in FIG. 2), the exhaust port of each exhaust duct 37 opens in a rectangular shape across the width of the processing tank. The exhaust ports of the exhaust ducts 37 are connected to an exhaust pump 39 via a flow control valve 38. Further, the exhaust ports of the exhaust ducts 37 are respectively provided on the side walls of the transfer area outer members 21 covering the second substrate transfer areas 18 and 19, respectively.
The exhaust ports of the exhaust ducts 37 are also connected to an exhaust pump 39 via a flow control valve 38. The exhaust port of each of the transfer area outer members 21 is disposed on the innermost side wall of each of the second substrate transfer areas 18 at a position near and above the chemical solution tanks 12 and 14. These exhaust ducts 3
7, the exhaust means 23 is constituted by the flow control valve 38 and the exhaust pump 39, and the inside of each tank outer member 16 (substrate processing area 17) and each transport area outer member 2
1 (inside the second substrate transport area 18), the exhaust opening from the exhaust port provided by the exhaust unit 23 opens the opening / closing door 26 of each transport area outer member 21 or opens or closes the outer member 16 of each transport area outer member 21. Even when the substrate introduction opening / closing door 27 is opened, the outside air flows in through the opening 22 and the substrate introduction opening 24, so that the chemical solution tanks 12 and 14 and the chemical solution are attached through the opening 22 and the substrate introduction opening 24. Further, the diffusion of fumes (atmosphere in which an acid, an alkali, or the like is mixed) from the plurality of substrates 2 to the outside is prevented.

The exhaust means 23 is provided with an opening / closing door 2 which constitutes a shutter means which can be opened / closed with respect to the substrate carrying opening 22 of each carrying area outer member 21 as a separating member.
6 may have a control means (not shown) for controlling the switching of the output of the exhaust pump 39 between the high exhaust output and the low exhaust output in accordance with the open position and the closed position. That is, when the shutter unit closes the opening 22, the control unit controls the output of the exhaust pump 39 to a low exhaust output by detecting the opening with a limit switch (not shown) or the like. When the shutter 22 opens the opening 22 such as when transferring a substrate, such as when transferring a substrate, the opening is detected by a limit switch or the like, and the output of the exhaust pump 39 is controlled to a high exhaust output so that the fume is cleaned. It is also possible to configure so as not to diffuse to the first substrate transfer area 20 side.

Further, as shown in FIGS. 3 to 5, the lifter device 31 and the transport mechanism 9 are arranged on the same side with respect to a plurality of processing tanks 12 to 15, 25 arranged side by side. Has been established. In this case, these lifter devices 3
1 and the transport mechanism 9 are each provided with a substrate holding portion (holding plate 29
And three holding arms 32) have a cantilever structure protruding forward (in a direction perpendicular to the transport direction), so that they can hold gaps between their movable roots and hold a large number of heavy substrates 2. As shown in FIG. 5, the holding plate 29 and the holding arm 32, which are the respective substrate holding portions, are inclined downward in the same direction by the amount of bending. Assuming that the downward inclinations of the holding plate 29 and the holding arm 32 are θ3 and θ4, respectively, for example, a plurality of substrates above the three holding arms 32 of the lifter device 31 from the respective substrate holding grooves of the pair of holding plates 29. When the plurality of substrates 2 are transferred to the holding groove, the relative inclination of the pair of holding plates 29 and the holding arms 32 is not added to θ1 + θ2 and overlapped as shown in FIG. Alternatively, the absolute value of θ4−θ3 is greatly offset and reduced, and when the plurality of substrates 2 are transferred, the arrangement pitch of the transferred substrate holding grooves and the held substrate pitch more easily match. The plurality of substrates 2 are securely held by the substrate holding grooves and transported. For this reason, there is no possibility that the plurality of substrates 2 fall down from the pair of holding plates 29 and the holding arms 32 to be damaged, and more stable substrate delivery is achieved.

Further, a transfer area outer member 40 for preventing fume diffusion, which covers the first substrate transfer area 20 above each transfer area outer member 21, is provided. Vessel 12-1
A space portion of a substrate transport line (first transport path) for transporting a plurality of substrates 2 in the direction (X direction) in which 5, 25 are arranged. An opening 41 for allowing the movement of the plurality of substrates 2 held thereon together with the pair of holding plates 29 of the transfer mechanism 9 is provided on the side wall of the transfer area outer member 40.
The opening / closing door 42 for opening and closing the opening 41 is configured to be slidable along the side wall of the transfer area outer member 40. This door 42
Is normally closed, and is opened and closed by opening and closing drive means (not shown) so that it is opened only when the transport mechanism 9 passes through the opening 41. The opening / closing drive unit includes, for example, a door opening / closing cylinder, a detection unit that detects the transport mechanism 9, and an electromagnetic valve that switches to drive the cylinder when the transport mechanism 9 is detected by the detection unit. I have.

The operation of the above configuration will be described below.

First, the transport mechanism 9 receives the substrate 2 from the loading / unloading section (not shown) and transports the first substrate to the substrate transfer position above the opening 22 of the first substrate transport area 18 where the first processing unit is located. The sheet is transported along the transport path in the area 20 along the transport path direction (X direction). At this board transfer position, as shown in FIG. 2, the pair of holding plates 29 of the transport mechanism 9 are respectively provided with a plurality of holding grooves on their inner sides to respectively hold both side end surfaces of the plurality of boards 2 in the standing posture from both sides. It is sandwiched and received and held. On the other hand, the lifter device 31 rises to the substrate delivery position, and the plurality of holding grooves on the upper side of the three holding arms 32 provided below the lifter device 31 hold the plurality of holding grooves held by the transport mechanism 9. The substrate 2 is received from below. Thereafter, the pair of holding plates 2 of the transport mechanism 9
9 are respectively rotated so as to be in the vertical directions, and the holding of the plurality of substrates 2 by the transport mechanism 9 is released.
The delivery of the plurality of substrates 2 onto the three holding arms 32 of the lifter device 31 is completed.

Next, the lifter device 31 converts the plurality of substrates 2 into 3
When the descent is started while being held by the plurality of holding grooves on one holding arm 32, the opening / closing door 26 of the transport area outer member 21 is opened in conjunction with the descent, and the plurality of substrates 2 are passed through the opening 22 together with the plurality of substrates 2. The lifter device 31 enters the second substrate transfer area 18. In the second substrate transfer area 18, the lifter device 31 is horizontally moved with the plurality of substrates 2 to a position above the chemical solution processing section, and then the chemical solution tank 12 is moved.
Begins to descend into the chemical solution processing section with the gas. In conjunction with this lowering, the substrate introduction opening / closing door 27 of the tank outer member 16 opens, and the three holding arms 32 holding the plurality of substrates 2 enter the substrate processing area 17 through the substrate introduction opening 24, and further, A plurality of substrates 2 from the upper opening of the chemical tank 12
The holding arm 32 holding the substrate 2 is immersed in the chemical solution, and is left in that state for a predetermined time to perform a predetermined chemical treatment on the surfaces of the plurality of substrates 2.

When the substrate is transported in the series of second substrate transport areas 18 or when a chemical solution is processed, the transport area outer member 2
The opening 22 is closed by an opening / closing door 26, and the substrate introduction ports 24 of the tank outer members 16 on the chemical solution tank 12 and the washing tank 13 are also provided with the substrate introduction into the substrate processing area 17. At other times, the doors are closed by the respective substrate introduction opening / closing doors 27. In addition, the exhaust means 23 may always exhaust gas with a constant exhaust capacity. In this case, the exhaust means 23 is also externally opened when the opening 22 and the substrate introduction ports 24 are opened (when the substrate is transported between the areas). Must have high exhaust capacity without fume diffusion.
Therefore, when the opening 22 and each of the substrate introduction ports 24 are opened, the exhaust pump 39 is driven at a high exhaust output to exhaust the internal atmosphere, and when one of the opening 22 and each of the substrate introduction ports 24 is opened, the medium is discharged. The exhaust pump 39 is driven by the exhaust output to exhaust the internal atmosphere. When the opening 22 and the substrate introduction port 24 are closed (when the substrate is transported in the area and when the substrate is processed), the exhaust pump 39 is exhausted with a low exhaust output. May be a three-stage power-saving drive. When at least one of the opening 22 and each of the substrate introduction ports 24 is opened, the exhaust pump 39 is driven at a high exhaust output to exhaust the internal atmosphere, and when the opening 22 and the substrate introduction port 24 are closed (in the area). The exhaust pump 39 may be evacuated with a low exhaust output (during substrate transport and substrate processing) to perform two-stage power-saving driving.

Further, after the treatment with the chemical solution after a predetermined time, the lifter device 31 raises the holding arm 32 holding the plurality of substrates 2, and opens and closes the opening and closing door 27 on both sides as shown by the phantom line in conjunction with the lifting arm 32. Then, the holding arm 32 holding the plurality of substrates 2 is lifted from the upper opening of the chemical solution tank 12 through the substrate introduction port 24 to above the chemical solution tank 12, and is horizontally horizontally moved to a position above the washing section having the washing tank 13. Move. After that, the lifter device 31 holds the plurality of substrates 2 having the chemical solution on the surface of the substrate 2 after the chemical solution treatment,
2 is lowered together with the tank outer member 1
6, the substrate inlet opening / closing door 27 opens, and the substrate inlet 24
The holding arm 32 holding the plurality of substrates 2 is introduced into the substrate processing area 17 of the rinsing tank 13. In the substrate processing area 17, the lifter device 31 immerses the plurality of substrates 2 in the chemical solution from the upper opening of the washing tank 13,
A water washing process is performed to wash out the chemicals attached to the surfaces of the plurality of substrates 2.

As described above, the opening 22 of the transfer area outer member 21 is closed by the opening / closing door 26 during the transfer of the substrate in the series of second substrate transfer areas 18 and the rinsing process. Tank 12 and washing tank 1
The substrate introduction port 24 of each of the outer shell members 16 on the substrate 3 is also
Except when the substrate is introduced into each of the substrate processing areas 17, each of the substrates is closed by each of the substrate introduction opening / closing doors 27. At the time of transporting the substrate, the exhaust atmosphere may be exhausted by driving the exhaust pump 39 at a high exhaust output so as to exhaust the fumes from the plurality of substrates 2 with the chemical solution.

Further, after the rinsing process after a predetermined time, the lifter device 31 raises the holding arm 32 holding the plurality of substrates 2, opens the opening / closing door 27 on both sides in conjunction with the lifting arm 32, and lifts the upper portion of the rinsing tank 13. The holding arm 32 holding the plurality of substrates 2 is raised from the opening through the substrate introduction port 24,
The opening / closing door 26 is opened so as to be linked with the rise, and the plurality of substrates 2 are passed through the opening 22 of the transfer area outer member 21.
Is raised to the substrate delivery position.

At the substrate transfer position in the first processing unit covered by the transfer area outer member 21, the pair of holding plates 29 of the transfer mechanism 9 are standing by in a vertical position to hold the plurality of substrates 2. After the holding arms 32 arrive between the pair of holding plates 29, the lower sides of the pair of holding plates 29 are respectively turned inward, and the both end surfaces of the plurality of substrates 2 are sandwiched from both sides. Each holding groove receives and holds it.

Further, the lifter device 31 is connected to the holding arm 32.
After retreating downward, together with the pair of holding plates 29 of the transport mechanism 9 holding the plurality of substrates 2, the substrate above the opening 22 of the second substrate transport area 19 where the next second processing unit is located. The transfer path in the first substrate transfer area 20 is transferred to the delivery position along the transfer path direction (X direction). At this time, the pair of holding plates 29 of the transport mechanism 9 sandwich the both end surfaces of the plurality of substrates 2 in the upright posture from both sides by the plurality of holding grooves on the inner side thereof and receive them by the respective holding grooves. keeping. On the other hand, the lifter device 31 of the second processing unit rises, and is held by the pair of holding plates 29 in the plurality of holding grooves above the three holding arms 32 provided below the lifter device 31. Are received from below. Thereafter, the pair of holding plates 29 are rotated so as to be vertical, respectively, to release the holding of the pair of holding plates 29 to the plurality of substrates 2, and the pair of holding plates 29 of the transport mechanism 9 are released.
Then, the delivery of the plurality of substrates 2 to the lifter device 31 of the second processing unit is completed.

Further, the plurality of substrates 2 transferred to the lifter device 31 of the second processing unit are
By means of 1, it is introduced into the second substrate transfer area 19. On the other hand, the empty transport mechanism 9 returns to the loading / unloading section, receives the substrate 2, and transports the plurality of substrates 2 to the substrate transfer position above the opening 22 of the transport area outer member 21 of the first processing unit. Then, the plurality of substrates 2 are transferred to the lifter device 31 so as to be introduced into the second substrate transfer area 19.

Further, as described above, the second substrate transfer area 1
Each of the plurality of substrates 2 introduced into each of the first and second processing units 8 and 19 performs the operations of the first processing unit and the second processing unit, such as the transfer of each substrate, the opening and closing of the door, and the evacuation. The operations are performed in the same manner as the respective operations for the chemical solution treatment and the water washing treatment in the unit.

Further, the lifter device 31 of the second processing unit raises the plurality of substrates 2 after the rinsing process after a predetermined time, opens and closes the opening and closing door 27 in conjunction therewith, and opens the upper opening of the rinsing tank 15. Then, the holding arm 32 holding the plurality of substrates 2 is raised through the substrate introduction port 24, the opening / closing door 26 is opened so as to interlock with the raising, and the plurality of substrates 2 are transferred through the opening 22 of the transfer area outer member 21. The held holding arm 32 is raised to the substrate delivery position of the second processing unit. At the board delivery position, the transport mechanism 9
Waits for the pair of holding plates 29 in the vertical posture, respectively, and after the holding arm 32 holding the plurality of substrates 2 arrives at the substrate transfer position between the pair of holding plates 29, the pair of holding plates 29 By rotating the lower ends of the 29 inward,
The transport mechanism 9 of the substrate 2 is held by sandwiching both end surfaces of the plurality of substrates 2 from both sides and receiving and holding the holding grooves in the respective holding grooves.
Delivery to

Thereafter, the pair of holding plates 29 of the transport mechanism 9
Transfers a plurality of substrates 2 that have been processed by the second processing unit to the lifter device 35 of the drying tank 25. Further, the plurality of substrates 2 on which the processing of the first processing unit has been completed are received from the lifter device 31 of the first processing unit to the pair of holding plates 29, and the pair of holding plates 29 are used to receive the plurality of substrates 2 of the second processing unit. The plurality of substrates 2 are delivered to the lifter device 31. Further, the lifter device 31 of the second processing unit
Are transferred to the second substrate transfer area 19
The transport mechanism 9 returns to the loading / unloading section to receive the substrate 2, and transports the substrate 2 to a substrate transfer position above the opening 22 of the first processing unit. Delivery of the plurality of substrates 2 to the lifter device 31 is performed. On the other hand, the plurality of substrates 2 are lowered together with the holding arm 32 by the lifter device 31 of the drying processing unit, and in conjunction with the lowering, the opening / closing door 28 is opened, and the plurality of substrates 2 are introduced into the drying tank 25 to perform the drying process. Done.

Thus, the second substrate transfer area 1
8, 19, each of the plurality of substrates 2 introduced into the drying processing unit is subjected to operations such as substrate transport in the first processing unit and the second processing unit, and substrate transport in the drying processing unit, opening and closing of the door, and exhausting. .

Further, the plurality of substrates 2 after the drying process are again lifted from the inside of the drying tank 25 to the substrate transfer position above the drying tank 25 by the lifter device 35, and are transferred between the pair of holding plates 29 of the transfer mechanism 9 and transferred. The plurality of substrates 2 after the drying process are transported by the mechanism 9 to the substrate delivery position with respect to the loading / unloading unit (not shown) along the arrangement direction (X direction) of each processing unit. Then, the plurality of processed substrates 2 are delivered to the loading / unloading section.

As described above, the pair of holding plates 2 of the transport mechanism 9
9 transfers the plurality of substrates 2 that have been processed by the second processing unit to the lifter device 35 of the drying tank 25, and performs processing of the first processing unit from the lifter device 31 of the first processing unit. The plurality of substrates 2 that have been completed are received, and the plurality of substrates 2 are transferred from the pair of holding plates 29 to the lifter device 31 of the second processing unit. Further, the plurality of substrates 2 delivered to the lifter device 31 of the second processing unit are introduced into the second substrate transport area 19, and the transport mechanism 9 returns to the loading / unloading section to receive the plurality of substrates 2. Then, the substrate 2 is transported to the substrate transfer position above the opening 22 of the first processing unit, and the plurality of substrates 2 are transferred to the lifter device 31 of the first processing unit. The above operations are sequentially repeated as described above, and a predetermined process is performed on the plurality of substrates 2.

As described above, since the lifter device 31 (second transfer means) and the transfer mechanism (first transfer means) 9 are disposed on the same side, the holding arm 3 serving as a substrate holding portion thereof is provided.
Since the two or a pair of holding plates 29 have a cantilever structure protruding forward, they can be tilted downward by an amount corresponding to the gap between their movable root portions and the amount by which a large number of heavy substrates 2 are held and bent. However, when the plurality of substrates 2 are delivered, the holding arm 32 of the lifter device 31 and the pair of holding plates 29 of the transport mechanism 9 have the same inclination direction (deflection direction). For this reason,
The relative inclination of each other is not added as in the conventional case, but is largely cancelled, and the mismatch between the transferred substrate holding groove arrangement pitch and the held substrate pitch is also largely canceled out, making them more aligned with each other. Therefore, it is possible to prevent the substrate 2 from falling off from each substrate holding portion, and it is possible to more stably transfer the substrate 2.

Further, since the lifter device 31 and the transfer mechanism 9 are disposed on the same side, one operator from the same side can adjust the connection of the substrate 2 of each substrate holding portion of the lifter device 31 and the transfer mechanism 9 together. The maintenance work can be performed more smoothly and accurately. Further, since the lifter device 31 and the transport mechanism 9 are disposed on the same side and the other does not include the lifter device 31, maintenance of each processing tank can be easily performed.

In this embodiment, the substrate processing area 1
7 and the atmosphere in the second substrate transfer areas 18 and 19 are exhausted by the exhaust means 23 through the exhaust duct 37. The exhaust output of the exhaust pump 39 of the exhaust means 23 is controlled by the opening 22 and the introduction of each substrate. This is performed according to the opening and closing of the port 24, and the washing tanks 13 and 15 are
During the transfer of the substrate in the series of second substrate transfer areas 18 and 19 leading to the above, the exhaust output was increased in order to exhaust the fumes from the plurality of substrates 2 with the chemical solution, but the present invention is not limited to this. Different exhaust means may be provided for the tanks 12 and 14, the rinsing tanks 13 and 15, and the second substrate transfer areas 18 and 19, and the exhaust outputs may be controlled as described above. In this case, the chemical tanks 12, 14 and the washing tank 1
In the exhaust power control in the substrate processing areas 3 and 15, the fumes themselves are different, and different exhaust means are used so that the exhaust output is controlled accordingly (for example, the exhaust output may be low if the fume concentration is low). Can be controlled. In the exhaust output control in the substrate processing area 17 and the second substrate transfer areas 18 and 19, the opening / closing door 2
6 and the substrate introduction port opening / closing door 27 are opened, the exhaust gas output is set to be the highest, and thereafter, the output is gradually reduced to such an extent that there is no fume diffusion.
In the exhaust gas output control at steps 8 and 19, the exhaust gas output is set to the highest when taken out of the chemical solution tanks 12 and 14 into the second substrate transfer areas 18 and 19, and thereafter, the output gradually decreases to the extent that fume diffusion does not occur. In such a manner, different exhaust means can be controlled.

In this embodiment, a case is described in which the present invention in which the lifter device 31 and the transfer mechanism 9 are arranged on the same side is applied to a batch type substrate processing apparatus for processing a plurality of substrates 2 at a time. However, the present invention is also applicable to a substrate processing apparatus of a sheet type for processing the substrates 2 one by one.

[0063]

As described above, according to the first aspect of the present invention, the first transfer means and the second transfer means are disposed on the same side with respect to the plurality of processing tanks, respectively. Since the substrate holding portion has a cantilever structure that protrudes forward, it is inclined downward by an amount corresponding to the gap between the movable root portions and the amount by which a large number of heavy substrates are held and bent. At the time of delivery of the substrate, the relative inclinations of the respective substrate holding portions of the first transfer means and the second transfer means are not added as in the related art, but are largely offset, and the arrangement pitch of the transferred substrate holding grooves, Since the inconsistency with the held substrate pitch is largely canceled out and the substrates are more aligned with each other, it is possible to prevent the substrate from falling off from each substrate holding portion, and to achieve more stable substrate delivery. Also, the first transport means and the second transport means are operated by one operator from the same side.
The arrangement of the substrates in the substrate holding portions of the transfer means can be adjusted, and the maintenance work can be performed more smoothly and accurately.

According to the second aspect of the present invention, when a substrate is transferred between the first transporting means and the second transporting means, the second transporting means is provided between the pair of holding portions of the first transporting means. Since the movable holding portion of the transfer means moves up and down, the first transfer means and the second transfer means do not come into contact with each other, and the transfer of the substrate can be performed smoothly.

[Brief description of the drawings]

FIG. 1 is a perspective view illustrating a schematic main configuration of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a schematic main part configuration diagram of a section AA of the substrate processing apparatus of FIG. 1 as viewed from the back.

FIG. 3 is a perspective view showing a schematic configuration of a substrate transfer state between the lifter device and a transport mechanism in FIG. 2;

FIG. 4 is a side view illustrating a schematic configuration of a substrate delivery state between the lifter device and a transport mechanism in FIG. 2;

FIG. 5 is a view showing the inclination of a holding arm of the lifter device of FIG. 4 and a holding plate of the transport mechanism.

FIG. 6 is a schematic diagram showing a schematic configuration of a main part in a conventional substrate processing apparatus.

FIG. 7 is a side view illustrating a schematic configuration of a substrate delivery state between the lifter device and the transfer robot in FIG. 5;

FIG. 8 is a diagram showing the inclination of a holding arm of the lifter device of FIG. 7 and a holding plate of the transport mechanism.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Substrate 5 Substrate processing unit 9 Transport mechanism 12, 14 Chemical solution tank 13, 15 Rinse tank 16 Tank outer member 17 Substrate processing area 18, 19 Second substrate transport area 20 First substrate transport area 21, 40 Transport area Outer shell members 22, 41 Opening 23 Exhaust means 24 Substrate introduction port 25 Drying tank 26 Opening opening / closing door 27, 28 Inlet opening / closing door 29 Holding plate 31, 35 Lifter device 32 Holding arm 37 Exhaust duct 38 Flow control valve 39 Exhaust pump 42 Door

Claims (2)

[Claims] 1. A substrate processing apparatus for performing a predetermined process on a substrate, comprising: a plurality of processing tanks arranged in a predetermined direction and each storing a processing liquid for immersing the substrate therein; A first transfer unit that transfers the substrate along the first transfer unit; and a second transfer unit that is vertically movable and transfers the substrate between the first transfer unit and the processing tank. And the second transfer means is disposed on the same side of each of the plurality of processing tanks. 2. The substrate processing apparatus according to claim 1, wherein the first transfer unit includes a pair of holding units for holding a substrate, and the second transfer unit includes a pair of the first transfer unit and the first transfer unit. 2. A substrate processing apparatus, comprising: a movable holding unit that can move up and down between the pair of holding units when transferring a substrate to and from the two transfer units, and that holds a substrate. .