JPH11265959A - Package type semiconductor device - Google Patents

Package type semiconductor device

Info

Publication number
JPH11265959A
JPH11265959A JP6836898A JP6836898A JPH11265959A JP H11265959 A JPH11265959 A JP H11265959A JP 6836898 A JP6836898 A JP 6836898A JP 6836898 A JP6836898 A JP 6836898A JP H11265959 A JPH11265959 A JP H11265959A
Authority
JP
Japan
Prior art keywords
semiconductor chip
sheet member
internal connection
wiring
connection terminals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6836898A
Other languages
Japanese (ja)
Other versions
JP3912888B2 (en
Inventor
Katsuhiko Oyama
山 勝 彦 尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6836898A priority Critical patent/JP3912888B2/en
Publication of JPH11265959A publication Critical patent/JPH11265959A/en
Application granted granted Critical
Publication of JP3912888B2 publication Critical patent/JP3912888B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Abstract

PROBLEM TO BE SOLVED: To shorten the pitch of inner connection terminals, by a method wherein a wiring forming surface where wirings are formed so as to stop up different openings is made to face inward, the one end of the wiring forming surface is connected to the corresponding inner connection terminals of a semiconductor chip, and the outer connection terminals are inserted into the openings of a sheet member. SOLUTION: The one ends 23a of a wiring 23 are made to protrude outward from the edge of a sheet member 22, and when the centers of the sheet member 22 and a semiconductor chip 11 are aligned with each other, the ends 23a of the wiring 23 have the same pitch with the inner connection terminals 13 of the semiconductor chip 11, terminate so as to be nearly coincident with the outer edges of the inner connection terminals 13, and connected to the corresponding inner connection terminals 13. Outer connection terminals 31 of solder balls are provided nearly throughout all the wide plane surface of the sheet member 22 and connected to the other ends 23b of the wiring 23, whose one ends are made to protrude outward from the edge of the sheet member 22 and connected to the inner connection terminals 13 of the semiconductor chip 11. By this setup, a pitch between the inner connection terminals 13 can be reduced to 60 μm or so, and inner connection terminals of this constitution are capable of coping with a semiconductor of large capacity.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体チップに近
い構造にてプリント配線基板等の外部部材に装着するに
好適なパッケージ型半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package type semiconductor device suitable for mounting on an external member such as a printed circuit board in a structure close to a semiconductor chip.

【0002】[0002]

【従来の技術】例えば、集積回路カード、ゲーム用マス
クROMカード、小型携帯電話機などに使用される半導
体装置は、パッケージの小型化、薄型化に対する要求が
特に強い。このような要求に応じるべく、チップに近い
構造(Chip Scale Package) のパッケージ型半導体装置
の実装技術が発展しており、例えば、フリップチップ実
装が知られている。
2. Description of the Related Art For example, a semiconductor device used for an integrated circuit card, a mask ROM card for a game, a small portable telephone, etc. has a particularly strong demand for a smaller and thinner package. In order to meet such a demand, a packaging technology of a package type semiconductor device having a structure close to a chip (Chip Scale Package) has been developed. For example, flip chip mounting is known.

【0003】フリップチップ実装は、ベアチップの素子
形成面の金属バンプ電極を配線基板上の一面に形成され
ている電極パッドに押し付けて接続(フリップチップボ
ンディング)するものである。このフリップチップ実装
の具体的な構造が、例えば、特開平8−153739号
公報に開示されている。
In the flip chip mounting, a metal bump electrode on a device forming surface of a bare chip is pressed against an electrode pad formed on one surface of a wiring board to connect (flip chip bonding). A specific structure of the flip chip mounting is disclosed in, for example, Japanese Patent Application Laid-Open No. H8-153739.

【0004】図10は上記公報に開示されたパッケージ
型半導体装置の概略構成を示す縦断面図である。同図に
おいて、配線基板1と半導体チップ2とは別個に用意さ
れたものである。このうち、配線基板1は、その一面に
被接続部1bを含む配線1aを有し、被接続部1bから
例えばスルーホール配線3を介して他面側に導出、露出
され、格子状に配列された外部接続端子4を備えてい
る。半導体チップ2は、通常の製造工程により形成され
たものであり、その素子形成面の端子形成領域に導電性
物質、例えば、金属からなる内部接続端子としてのバン
プ電極2aが、例えば、銀ペーストをスクリーン印刷し
て形成されている。
FIG. 10 is a longitudinal sectional view showing a schematic configuration of the package type semiconductor device disclosed in the above publication. In FIG. 1, a wiring board 1 and a semiconductor chip 2 are separately prepared. Among these, the wiring board 1 has a wiring 1a including a connected portion 1b on one surface, and is led out from the connected portion 1b to the other surface via, for example, a through-hole wiring 3, is exposed, and is arranged in a grid. And an external connection terminal 4. The semiconductor chip 2 is formed by a normal manufacturing process, and a bump electrode 2a as an internal connection terminal made of a conductive material, for example, metal is formed on a terminal formation region of the element formation surface by, for example, silver paste. It is formed by screen printing.

【0005】配線基板1に半導体チップ2を接続するに
当たり、半導体チップ2を真空吸着し得る機構を有する
ボンディング装置及び配線基板1を保持して水平駆動す
る基板駆動装置を用いて、配線基板1に対して半導体チ
ップ2をフェースダウン型に実装するためにフリップチ
ップボンディングを行う。この場合、配線基板1に対し
て半導体チップ2を対向させ、配線基板1の被接続部1
bに対して半導体チップ2の対応するバンプ電極2aが
対向するように位置合わせをし、ボンディングヘッドを
押し下げることにより被接続部1bにバンプ電極2aの
少なくとも先端部を埋め込むように圧入して両者を固定
させ、この状態で例えば接続パッド1b用の銀ペースト
を熱硬化させることにより両者を接合する。
When connecting the semiconductor chip 2 to the wiring board 1, a bonding apparatus having a mechanism capable of vacuum-sucking the semiconductor chip 2 and a substrate driving apparatus for holding and horizontally driving the wiring board 1 are connected to the wiring board 1. On the other hand, flip-chip bonding is performed to mount the semiconductor chip 2 face-down. In this case, the semiconductor chip 2 is opposed to the wiring board 1, and the connected portion 1 of the wiring board 1 is
b, the corresponding bump electrodes 2a of the semiconductor chip 2 are positioned so as to face each other, and the bonding head is pressed down so that at least the tip of the bump electrode 2a is buried in the connected portion 1b so that both are pressed. In this state, the two are joined by, for example, thermally curing a silver paste for the connection pad 1b.

【0006】この後、半導体チップ2と配線基板1との
間に封止用樹脂を充填した後、樹脂を例えば熱により硬
化させることにより樹脂層5を形成する。この半導体チ
ップ2と配線基板1との間に充填させた樹脂を硬化させ
る際、半導体チップ2と配線基板1との間に荷重を加え
て半導体チップのバンプ電極と基板の接続パッドとの位
置ずれを防ぎながら樹脂を硬化させる。
Thereafter, a sealing resin is filled between the semiconductor chip 2 and the wiring board 1, and then the resin is cured by, for example, heat to form a resin layer 5. When the resin filled between the semiconductor chip 2 and the wiring board 1 is cured, a load is applied between the semiconductor chip 2 and the wiring board 1 to displace the bump electrodes of the semiconductor chip and the connection pads of the board. The resin is cured while preventing.

【0007】[0007]

【発明が解決しようとする課題】上述した従来のパッケ
ージ型半導体装置にあっては、バンプ電極2aに対応さ
せて被接続部1bを形成すると共に、スルーホール配線
3を介して他面側に外部接続端子4を導出、露出させる
構成になっているため、バンプ電極2aのピッチは約2
50μm程度にしか縮めることができず、半導体装置の
大容量化に伴うピッチの縮小要求には十分に対応できな
いという問題があった。
In the above-mentioned conventional package type semiconductor device, the connected portion 1b is formed corresponding to the bump electrode 2a, and the external portion is formed on the other surface through the through-hole wiring 3. Since the connection terminals 4 are led out and exposed, the pitch of the bump electrodes 2a is about 2
There is a problem that the pitch can be reduced to only about 50 μm, and it is not possible to sufficiently cope with a demand for a reduction in pitch accompanying an increase in the capacity of a semiconductor device.

【0008】また、従来のパッケージ型半導体装置で
は、毛細管現象を利用して樹脂を充填させるので、使用
可能な樹脂は低粘度のものに限定されるという問題もあ
った。
Further, in the conventional package type semiconductor device, since the resin is filled by utilizing the capillary phenomenon, there is a problem that usable resins are limited to those having low viscosity.

【0009】さらに、従来のパッケージ型半導体装置で
は、半導体チップ2と配線基板1との熱収縮量の違いか
ら接点の接合状態の悪化を招くという問題もあった。
Further, in the conventional package type semiconductor device, there is a problem that a difference in the amount of heat shrinkage between the semiconductor chip 2 and the wiring board 1 causes deterioration of the junction state of the contacts.

【0010】本発明は上記の課題を解決するためになさ
れたもので、その目的は半導体チップ上に形成される内
部接続端子のピッチを短縮することが可能なパッケージ
型半導体装置を提供するにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a package-type semiconductor device capable of reducing the pitch of internal connection terminals formed on a semiconductor chip. .

【0011】本発明の他の目的は低粘度の樹脂に限定さ
れずに、より広範な樹脂材料の選択を可能にするパッケ
ージ型半導体装置を提供するにある。
Another object of the present invention is to provide a package type semiconductor device which allows a wider selection of resin materials without being limited to a resin having a low viscosity.

【0012】本発明のもう一つ他の目的は内部接続端子
の接続状態を良好に保持することのできるパッケージ型
半導体装置を提供するにある。
Another object of the present invention is to provide a package type semiconductor device capable of maintaining a good connection state of internal connection terminals.

【0013】[0013]

【課題を解決するための手段】請求項1に係る発明は、
所定の端子形成領域に複数の内部接続端子が列状に形成
された半導体チップと、外部の所定の被接続位置に対応
して複数の開口が形成された絶縁性のシート部材とシー
ト部材の一面に配設されると共に、一端部が内部接続端
子に対応する間隔にてシート部材の縁部から延出し、他
端部が互いに異なる開口を塞ぐように形成された複数の
配線とを含み、配線の形成面を半導体チップ側にして配
線の一端部がそれぞれ対応する半導体チップの内部接続
端子に接続された配線基板と、配線の他端部に接続する
状態でシート部材の開口にそれぞれ嵌着され、表面部が
シート部材の他面から突出する外部接続端子と、内部接
続端子に配線の一端部が接続された部位を被覆、保護す
る絶縁性の被覆部と、を備えたパッケージ型半導体装置
にある。
The invention according to claim 1 is
A semiconductor chip in which a plurality of internal connection terminals are formed in a row in a predetermined terminal formation region; an insulating sheet member in which a plurality of openings are formed corresponding to predetermined external connection positions; and one surface of the sheet member And a plurality of wirings, one end of which extends from the edge of the sheet member at an interval corresponding to the internal connection terminal, and the other end of which is formed so as to cover different openings. One end of the wiring is connected to the internal connection terminal of the corresponding semiconductor chip, and the other end of the wiring is connected to the opening of the sheet member while being connected to the other end of the wiring. A package-type semiconductor device, comprising: an external connection terminal having a surface portion protruding from the other surface of the sheet member; and an insulating coating portion that covers and protects a portion where one end of the wiring is connected to the internal connection terminal. is there.

【0014】請求項2に係る発明は、請求項1に記載の
パッケージ型半導体装置において、半導体チップは矩形
の平面形状をなし、四辺の各縁端部に端子形成領域を有
し、内部接続端子は端子形成領域にそれぞれ形成される
と共に、半導体チップの表面よりも所定値だけ高く形成
され、被覆部は半導体チップの縁端部に枠状に形成され
たものである。
According to a second aspect of the present invention, in the package type semiconductor device according to the first aspect, the semiconductor chip has a rectangular planar shape, has a terminal forming region at each of four edges, and has an internal connection terminal. Are formed in the terminal formation regions, respectively, and are formed higher by a predetermined value than the surface of the semiconductor chip, and the covering portion is formed in a frame shape at the edge of the semiconductor chip.

【0015】請求項3に係る発明は、請求項1又は2に
記載のパッケージ型半導体装置において、被覆部は熱硬
化性樹脂でなるものである。
According to a third aspect of the present invention, in the package type semiconductor device according to the first or second aspect, the covering portion is made of a thermosetting resin.

【0016】請求項4に係る発明は、請求項2又は3に
記載のパッケージ型半導体装置において、内部接続端子
と略同一の高さを有し、かつ、平面方向で見て内部接続
端子の内側にて被覆部の形成領域を確定する絶縁性の枠
形部材を備えたものである。
According to a fourth aspect of the present invention, in the package type semiconductor device according to the second or third aspect, the semiconductor device has substantially the same height as the internal connection terminal, and is located inside the internal connection terminal when viewed in a plane direction. And an insulating frame-shaped member for defining the formation area of the covering portion.

【0017】請求項5に係る発明は、請求項1乃至4の
いずれかに記載のパッケージ型半導体装置において、配
線基板は被覆部が形成される領域の内側に空気の流通口
を備えたものである。
According to a fifth aspect of the present invention, in the package type semiconductor device according to any one of the first to fourth aspects, the wiring board has an air flow port inside a region where the covering portion is formed. is there.

【0018】[0018]

【発明の実施の形態】以下、本発明を好適な実施形態に
基づいて詳細に説明する。図1は本発明の第1の実施形
態の概略構成を示すもので、(a)はその縦断面図を、
(b)は積層されるものを順次その一部を除去して示し
た平面図である。これら各図において、半導体チップ1
1は略正方形の平面形状を有し、表面の四つの各縁端部
が端子形成領域12になっており、これらの端子形成領
域12にチップの縁と平行にして多数の内部接続端子1
3が一列に配置されている。ここでは図面の簡単化のた
めに四つの端子形成領域にそれぞれ6個の内部接続端子
13が配置されたように示してある。内部接続端子13
は70×70〜100μmの矩形の平面形状にて高さ2
0μmになるように金メッキにより形成される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on preferred embodiments. FIG. 1 shows a schematic configuration of a first embodiment of the present invention.
FIG. 2B is a plan view showing a stacked structure in which a part thereof is sequentially removed. In each of these figures, a semiconductor chip 1
Numeral 1 has a substantially square planar shape, and each of the four edges of the surface is a terminal forming region 12, and a large number of internal connection terminals 1 are formed in these terminal forming regions 12 in parallel with the edge of the chip.
3 are arranged in a line. Here, for simplification of the drawing, it is shown that six internal connection terminals 13 are arranged in four terminal formation regions, respectively. Internal connection terminal 13
Is a rectangular planar shape of 70 × 70-100 μm and height 2
It is formed by gold plating to have a thickness of 0 μm.

【0019】配線基板21はその厚みが75μm程度
の、例えば、ポリイミドでなるシート部材22と、この
シート部材22の一面に配設された配線23とで構成さ
れている。このうち、シート部材22は恰も半導体チッ
プ11の端子形成領域12の分だけ縮小したように、半
導体チップと比較して一回り小さな略正方形の平面形状
を有している。このシート部材22には内部接続端子1
3の個数に匹敵する開口24が全面に亘って格子状に形
成されている。開口24の直径は約0.5mmである。
シート部材22の一面、すなわち、図1(a)で見て上
方で、図1(b)で見てその裏側に配線23が形成され
ている。
The wiring board 21 includes a sheet member 22 having a thickness of about 75 μm, for example, made of polyimide, and wiring 23 provided on one surface of the sheet member 22. Of these, the sheet member 22 has a substantially square planar shape slightly smaller than the semiconductor chip, as if reduced by the terminal formation region 12 of the semiconductor chip 11. This sheet member 22 has internal connection terminals 1
The openings 24 corresponding to the number 3 are formed in a grid pattern over the entire surface. The diameter of the opening 24 is about 0.5 mm.
The wiring 23 is formed on one surface of the sheet member 22, that is, on the upper side as viewed in FIG. 1A and on the back side as viewed in FIG. 1B.

【0020】これらの配線23の一端部23aはシート
部材22の端縁部から外方に突出し、他端部23bは互
いに異なる開口24を覆って円形に形成されている。配
線23は幅が約20μm、厚さが約10μmの銅(C
u)箔でなり、その表面に0.2μm程度の錫(Sn)
メッキを施したもので、シート部材22から突出する部
位は内部接続端子13と同一のピッチを有し、かつ、互
いの中心部を位置合わせしたとき、内部接続端子13の
外側縁と略一致するように終端している。なお、シート
部材22の開口24を覆う配線の他端部23bは約0.
7mm程度の直径を有している。そして、配線の一端部
23aはそれぞれ対応する内部接続端子13に接合され
ている。
One end 23a of these wirings 23 protrudes outward from the edge of the sheet member 22, and the other end 23b is formed in a circular shape so as to cover openings 24 different from each other. The wiring 23 is made of copper (C) having a width of about 20 μm and a thickness of about 10 μm.
u) It is made of foil and its surface has tin (Sn) of about 0.2 μm.
The portions that are plated and that project from the sheet member 22 have the same pitch as the internal connection terminals 13, and substantially coincide with the outer edges of the internal connection terminals 13 when the centers are aligned with each other. Is terminated. Note that the other end 23b of the wiring covering the opening 24 of the sheet member 22 is approximately 0.1 mm.
It has a diameter of about 7 mm. The one end 23a of the wiring is joined to the corresponding internal connection terminal 13.

【0021】また、シート部材22の開口24にはそれ
ぞれ半田ボールでなる外部接続端子31が嵌着され、こ
の外部接続端子31は配線の他端部23bに接合され、
かつ、シート部材22の他面、すなわち、図1(a)で
見て下方、図1(b)で見て表側に半球状に突出してい
る。なお、半球状の突出部は平面上で略0.65mmの
直径を有している。一方、配線基板21の外周縁部に、
配線の一端部23aと内部接続端子13との接続部を保
護する絶縁性の被覆部32が枠状に形成されている。な
お、被覆部32はシート部材22の外側縁より内側に浸
透し、その内側は半導体チップ11と、シート部材22
と、被覆部32とで囲まれた空間33になっている。
External connection terminals 31 made of solder balls are fitted into the openings 24 of the sheet member 22, respectively. The external connection terminals 31 are joined to the other end 23b of the wiring.
Further, the sheet member 22 protrudes in a hemispherical shape on the other surface, that is, on the lower side in FIG. 1A and on the front side in FIG. 1B. The hemispherical projection has a diameter of about 0.65 mm on a plane. On the other hand, on the outer peripheral edge of the wiring board 21,
An insulating covering portion 32 for protecting a connection portion between one end 23a of the wiring and the internal connection terminal 13 is formed in a frame shape. The covering portion 32 penetrates inward from the outer edge of the sheet member 22, and the inside thereof covers the semiconductor chip 11 and the sheet member 22.
, And a space 33 surrounded by the covering portion 32.

【0022】因みに、図1(b)中の大円部は外部接続
端子31の突出部であり、斜線を施した円形部は外部接
続端子31の断面を示し、小円部は外部接続端子31を
除去してシート部材22に形成された開口24を示し、
この開口24の奥に配線の他端部が露呈した状態を示し
ている。
Incidentally, a large circle in FIG. 1B is a protruding portion of the external connection terminal 31, a hatched circular portion indicates a cross section of the external connection terminal 31, and a small circle indicates the external connection terminal 31. Removed to show an opening 24 formed in the sheet member 22,
The state where the other end of the wiring is exposed at the back of the opening 24 is shown.

【0023】次に、図1に示した第1の実施形態に係る
パッケージ型半導体装置の製造方法について図2乃至図
7をも参照して以下に説明する。先ず、図2に示したよ
うに、略正方形の平面形状を有し、周縁端部の端子形成
領域にそれぞれ内部接続端子13が形成された半導体チ
ップ11と、図3に示したように、半導体チップ11と
比較して端子形成領域12の分だけ寸法の小さい略正方
形の平面形状を有し、一端部23aが内部接続端子13
に対応する間隔にてシート部材22の縁部から外方に延
出し、他端部23bが互いに異なる開口24を塞ぐよう
に形成された複数の配線23とを含む配線基板21とを
別個に用意する。
Next, a method of manufacturing the package type semiconductor device according to the first embodiment shown in FIG. 1 will be described below with reference to FIGS. First, as shown in FIG. 2, a semiconductor chip 11 having a substantially square planar shape and having an internal connection terminal 13 formed in a terminal forming region at a peripheral edge portion, and a semiconductor chip 11 as shown in FIG. 3. It has a substantially square planar shape smaller in size by the terminal forming region 12 than the chip 11, and one end 23 a is connected to the internal connection terminal 13.
And a plurality of wirings 23 extending outward from the edge of the sheet member 22 at intervals corresponding to the above, and a plurality of wirings 23 formed so that the other ends 23b cover different openings 24. I do.

【0024】次に、図4に示すように、厚さが75μm
のシート部材22に対してこれより僅かに深い80μm
の深さを有し、底面が平坦でかつシート部材22を位置
決めし得る窪み41が形成されたステージ42と、この
ステージ42に対向して上下動可能なボンディングヘッ
ド43とでなるボンディング装置40を用意し、このう
ち、ステージ42の窪み41にシート部材22を嵌め込
み、配線23が上面に位置するように配線基板21を装
着する。
Next, as shown in FIG.
80 μm slightly deeper than the sheet member 22
The bonding apparatus 40 includes a stage 42 having a depth of, a flat bottom surface, and a depression 41 capable of positioning the sheet member 22, and a bonding head 43 that can move up and down in opposition to the stage 42. The sheet member 22 is fitted into the depression 41 of the stage 42, and the wiring board 21 is mounted so that the wiring 23 is located on the upper surface.

【0025】一方、半導体チップ11の内部接続端子1
1が下向きになるようにボンディングヘッド43が内部
接続端子13の形成面とは反対の面を真空吸引し、さら
に、互いに接続されるべき配線の一端部23aと内部接
続端子11とが対向するようにステージ42又はボンデ
ィングヘッド43を移動させる。続いて、ボンデイグヘ
ッド43を下降させ、例えば接合温度500℃、一つの
内部接続端子につき20gfの荷重が加わるように押圧
することによって、図5に示すように、配線基板21に
形成された全ての配線の一端部23aを対応する半導体
チップ11の内部接続端子13に接続する。
On the other hand, the internal connection terminals 1 of the semiconductor chip 11
The bonding head 43 evacuates the surface opposite to the surface on which the internal connection terminals 13 are formed so that 1 faces downward, and the one end 23a of the wiring to be connected to each other and the internal connection terminals 11 face each other. Then, the stage 42 or the bonding head 43 is moved. Subsequently, the bonding head 43 is lowered and pressed to apply a load of 20 gf to one internal connection terminal, for example, at a joining temperature of 500 ° C., so that all the components formed on the wiring board 21 are formed as shown in FIG. Is connected to the internal connection terminal 13 of the corresponding semiconductor chip 11.

【0026】次に、図6に示すように、半導体チップ1
1が下に位置し、配線基板21が上に位置するようにこ
れらの組み立て体を固定し、シリンジ51を用いてエポ
キシ系の樹脂52を内部接続端子13と配線の一端部2
3aとの接続部位に連続的に塗布し、例えば、150
℃、1時間という条件でキュアすることにより、図7に
示すように、半導体チップ11の周縁端部に内部接続端
子13と配線の一端部23aとの接続部を被覆、保護す
る枠型の被覆部32が形成される。
Next, as shown in FIG.
1 is positioned below and the wiring board 21 is positioned above, the assembly is fixed, and the epoxy resin 52 is connected using the syringe 51 to the internal connection terminal 13 and one end 2 of the wiring.
3a, and is continuously applied to the connection portion with, for example, 150
As shown in FIG. 7, by curing under the condition of 1 ° C. for one hour, a frame-shaped coating for covering and protecting the connection between the internal connection terminal 13 and one end 23a of the wiring at the peripheral edge of the semiconductor chip 11. A part 32 is formed.

【0027】最後に、図7中に実線の円で示したよう
に、配線基板21を形成するシート部材22の各開口2
4(図1参照)に、例えば、ロジン系のフラックスを球
面の一部に転写した直径0.65mmの半田ボールを配
置し、最高温度240℃、時間20秒の条件にてリフロ
ーさせることにより、図1に示した形状の外部接続端子
31を有するパッケージ型半導体装置が得られる。
Finally, as shown by the solid circle in FIG. 7, each opening 2 of the sheet member 22 forming the wiring board 21 is formed.
In FIG. 4 (see FIG. 1), for example, a solder ball having a diameter of 0.65 mm obtained by transferring a rosin-based flux to a part of a spherical surface is arranged and reflowed at a maximum temperature of 240 ° C. for a time of 20 seconds. A package type semiconductor device having the external connection terminals 31 having the shape shown in FIG. 1 is obtained.

【0028】かくして、第1の実施形態によれば、シー
ト部材22の略全面に亘る広い平面領域に外部接続端子
31が設けられ、この外部接続端子31に他端部23b
が接続された配線の一端部23aをシート部材22の縁
部から延出させると共に、半導体チップ11の内部接続
端子13に接続する構成としたので、内部接続端子13
間のピッチを60μm程度まで短縮することができ、2
50μmまでしか短縮できなかったフリップチップボン
ディング法を採用した従来のパッケージ型半導体装置と
比較して大容量の半導体装置に対応できる効果がある。
Thus, according to the first embodiment, the external connection terminal 31 is provided in a wide plane area over substantially the entire surface of the sheet member 22, and the external connection terminal 31 is provided at the other end 23b.
Is connected to the internal connection terminal 13 of the semiconductor chip 11 while extending the one end 23a of the wiring connected to the internal connection terminal 13 of the semiconductor chip 11.
The pitch between them can be reduced to about 60 μm.
There is an effect that it is possible to cope with a large-capacity semiconductor device as compared with a conventional package-type semiconductor device employing a flip-chip bonding method, which can only be reduced to 50 μm.

【0029】また、シート部材22から外部に延出させ
た配線の一端部23aと内部接続端子13との接続部位
を保護するに当たり、エポキシ系の樹脂52を塗布して
枠状の被覆部32を形成するだけであるため、低粘度の
樹脂に限定されずに、より広範な樹脂材料の選択が可能
である。
To protect the connection between the one end 23a of the wiring extending from the sheet member 22 to the outside and the internal connection terminal 13, an epoxy resin 52 is applied to cover the frame-shaped cover 32. Since it is only formed, a wider range of resin materials can be selected without being limited to low-viscosity resins.

【0030】さらに、シート部材22の縁端部から外部
に延出させた配線の一端部23aと内部接続端子13と
を接続し、被覆部32と、半導体チップ11と、シート
部材22とで囲まれた空間33が形成されるので、半導
体チップ11と配線基板21との間に熱収縮の違いがあ
ったとしても、配線基板21の中心部の起伏によって吸
収することができるため、内部接続端子13と配線の一
端部23aとの接続状態を良好に保持することができ
る。
Further, one end 23a of the wiring extending from the edge of the sheet member 22 to the outside is connected to the internal connection terminal 13, and is surrounded by the covering portion 32, the semiconductor chip 11, and the sheet member 22. Since the recessed space 33 is formed, even if there is a difference in heat shrinkage between the semiconductor chip 11 and the wiring board 21, the difference can be absorbed by the undulation of the central portion of the wiring board 21. 13 and the one end 23a of the wiring can be maintained in a good connection state.

【0031】図8(a),(b)は本発明に係るパッケ
ージ型半導体装置の第2の実施形態の構成を示す平面図
である。この場合、(a)に示すように、配線基板21
の配線23が形成された部位以外の平面領域に、複数の
空気流通口25を形成し、最終的には(b)に示したよ
うに半田ボールでなる外部接続端子31間に複数の空気
流通口25を備えるパッケージ型半導体装置が得られ
る。
FIGS. 8A and 8B are plan views showing the configuration of a second embodiment of the package type semiconductor device according to the present invention. In this case, as shown in FIG.
A plurality of air circulation ports 25 are formed in a plane area other than the portion where the wiring 23 is formed, and finally a plurality of air circulation ports 25 are formed between the external connection terminals 31 formed of solder balls as shown in FIG. A packaged semiconductor device having the opening 25 is obtained.

【0032】この第2の実施形態によれば、外部接続端
子31を形成したり、被接続部品に接続したりする場合
に、半田ボールをリフローさせる場合に空間33の空気
膨張によるシート部材22の破裂を未然に防ぐことがで
きる。
According to the second embodiment, when the external connection terminals 31 are formed or connected to the parts to be connected, the solder balls are reflowed. Burst can be prevented beforehand.

【0033】図9(a),(b)は本発明に係るパッケ
ージ型半導体装置の第3の実施形態の構成を示す断面図
及び平面図である。図中、従来装置を示す図1と同一の
要素には同一の符号を付してその説明を省略する。この
実施形態は被覆部32を形成する場合のエポキシ樹脂が
シート部材22の外縁より僅かに内側に止まらずにさら
に内部まで浸透する事態を防ぐもので、予め決められた
被覆部32の形成領域の内側に、例えば、シリコンゴム
でなり、幅が0.5〜1.0mmで厚さが25μm程度
の枠型部材34を半導体チップ11に貼付け、その後で
内部接続端子13と配線の一端部23aとの接続、並び
に、エポキシ系の樹脂52による被覆部32の形成の各
工程を実施するものである。
FIGS. 9A and 9B are a sectional view and a plan view showing the structure of a third embodiment of the package type semiconductor device according to the present invention. In the figure, the same elements as those in FIG. 1 showing the conventional apparatus are denoted by the same reference numerals, and description thereof will be omitted. This embodiment prevents the epoxy resin when forming the covering portion 32 from penetrating further into the sheet member 22 without stopping slightly inside the outer edge of the sheet member 22. On the inside, for example, a frame member 34 made of, for example, silicon rubber, having a width of 0.5 to 1.0 mm and a thickness of about 25 μm is attached to the semiconductor chip 11, and then the internal connection terminal 13 and one end 23a of the wiring are attached. And the steps of forming the covering portion 32 with the epoxy-based resin 52 are performed.

【0034】この第3の実施形態によれば、被覆部32
を形成するために塗布された樹脂52が、半導体チップ
11とシート部材22との間隙に奥深くまで侵入するこ
とを阻止し、領域が確定された空間を形成することがで
きる。
According to the third embodiment, the covering portion 32
Is prevented from penetrating deeply into the gap between the semiconductor chip 11 and the sheet member 22 to form a space in which the region is defined.

【0035】なお、第3の実施形態におけるシート部材
22に図8に示したと同様な空気流通口25を形成する
ことによって、シート部材22の破裂を未然に防ぐこと
ができる。
It should be noted that by forming an air flow opening 25 similar to that shown in FIG. 8 in the sheet member 22 in the third embodiment, the rupture of the sheet member 22 can be prevented.

【0036】なお、上記各実施形態では、半導体チップ
11の端子形成領域12に金メッキ法によって内部接続
端子13を形成したが、この代わりに、ボールボンディ
ング装置によりスタッドバンプを形成する方法を採用し
ても良い。また、上記各実施形態では絶縁基板上に形成
される配線23に錫(Sn)メッキを施したが、錫(S
n)メッキの代わりに金(Au)メッキを施しても良
い。さらにまた、上記各実施形態では、半導体チップを
単層のものとして説明したが、GNDブレーンを付加し
た多層構造のものにも本発明を適用することができる。
In the above embodiments, the internal connection terminals 13 are formed in the terminal formation region 12 of the semiconductor chip 11 by the gold plating method. Instead, a method of forming stud bumps by a ball bonding apparatus is adopted. Is also good. In the above embodiments, the wiring 23 formed on the insulating substrate is plated with tin (Sn).
n) Gold (Au) plating may be applied instead of plating. Furthermore, in each of the embodiments described above, the semiconductor chip is described as having a single layer, but the present invention can also be applied to a multilayer structure having a GND plane.

【0037】また、上記各実施形態では被覆部としてエ
ポキシ樹脂を用いたが、この代わりにシリコーン系樹脂
を用いても良い。さらに、上記各実施形態では平面形状
が略正方形の半導体チップを対象としたが本発明はこれ
に適用を限定されるものではなく、平面形状が矩形の殆
どの半導体チップに適用することができる。
In each of the above embodiments, an epoxy resin is used as the covering portion. However, a silicone resin may be used instead. Further, in each of the above embodiments, a semiconductor chip having a substantially square planar shape is targeted, but the present invention is not limited to this, and can be applied to most semiconductor chips having a rectangular planar shape.

【0038】[0038]

【発明の効果】以上の説明によって明らかなように、請
求項1に係る発明によれば、一端部が半導体チップの内
部接続端子に対応する間隔にて絶縁性のシート部材の縁
部から延出し、他端部が被接続位置に対応して形成され
た開口のうち互いに異なる開口を塞ぐように形成された
複数の配線を含む配線基板を用い、配線形成面を内側に
してその一端部をそれぞれ対応する半導体チップの内部
接続端子に接続し、さらに、シート部材の開口にそれぞ
れ外部接続端子を嵌着する構成としたので、チップ上に
形成される内部接続端子のピッチを従来装置と比較して
大幅に短縮することができる。
As apparent from the above description, according to the first aspect of the present invention, one end extends from the edge of the insulating sheet member at an interval corresponding to the internal connection terminal of the semiconductor chip. Using a wiring board including a plurality of wirings formed so that the other ends of the openings formed corresponding to the connection positions are different from each other, with the wiring forming surface inside and one end thereof It is connected to the internal connection terminal of the corresponding semiconductor chip, and further, the external connection terminal is fitted into the opening of the sheet member, so that the pitch of the internal connection terminal formed on the chip is compared with the conventional device. It can be greatly reduced.

【0039】請求項2に係る発明によれば、矩形の平面
形状をなす半導体チップの各端縁部にて内部接続端子と
配線の一端部とを接続し、接続部位を枠状の被覆部で覆
う構成としたので、被覆部と、半導体チップと、シート
部材とで囲まれた空間が形成され、半導体チップと配線
基板との間に熱収縮率の違いがあったとしても、配線基
板の中心部の起伏によってその応力を吸収することがで
きるため、内部接続端子と配線の一端部との接続状態を
良好に保持することができる効果もある。
According to the second aspect of the present invention, the internal connection terminal is connected to one end of the wiring at each edge of the semiconductor chip having a rectangular planar shape, and the connection portion is formed by a frame-shaped covering portion. Because of the configuration of covering, a space surrounded by the covering portion, the semiconductor chip, and the sheet member is formed, and even if there is a difference in the heat shrinkage between the semiconductor chip and the wiring board, the center of the wiring board is Since the stress can be absorbed by the undulation of the portion, there is also an effect that the connection state between the internal connection terminal and one end of the wiring can be favorably maintained.

【0040】請求項3に係る発明によれば、被覆部は熱
硬化性樹脂によって枠状の被覆部を形成したので、低粘
度の樹脂に限定されず、より広範な樹脂材料を選択使用
することができる効果もある。
According to the third aspect of the present invention, since the covering portion has a frame-like covering portion made of a thermosetting resin, it is not limited to a low-viscosity resin, and a wider range of resin materials can be selected and used. There is also an effect that can be done.

【0041】請求項4に係る発明によれば、内部接続端
子の内側にて被覆部の形成領域を確定する絶縁性の枠形
部材を備えているので、被覆部を形成するために塗布さ
れた熱硬化性樹脂が、半導体チップとシート部材との間
隙に奥深くまで侵入することを阻止し、領域が確定され
た空間を形成することができる効果もある。
According to the fourth aspect of the present invention, since the insulating frame-shaped member for defining the formation region of the covering portion inside the internal connection terminal is provided, the coating is applied to form the covering portion. There is also an effect that it is possible to prevent the thermosetting resin from penetrating deep into the gap between the semiconductor chip and the sheet member, and to form a space in which the region is defined.

【0042】請求項5に係る発明によれば、被覆部が形
成される領域の内側に空気流通口を備えた配線基板を用
いるので、空間内の空気の膨張に起因するシート部材の
破裂を未然に防ぐことができる効果もある。
According to the fifth aspect of the present invention, since the wiring board having the air circulation port inside the area where the covering portion is formed is used, the rupture of the sheet member due to the expansion of the air in the space is prevented. There is also an effect that can be prevented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施形態の概略構成を示す縦断
面図及び積層されるものを順次その一部を除去して示し
た平面図。
FIG. 1 is a longitudinal sectional view showing a schematic configuration of a first embodiment of the present invention, and a plan view showing a laminated structure in which a part thereof is sequentially removed.

【図2】図1に示した第1の実施形態を構成する半導体
チップの縦断面図及び平面図。
FIG. 2 is a longitudinal sectional view and a plan view of a semiconductor chip constituting the first embodiment shown in FIG. 1;

【図3】図1に示した第1の実施形態を構成する配線基
板の縦断面図及び平面図。
FIGS. 3A and 3B are a vertical sectional view and a plan view of a wiring board constituting the first embodiment shown in FIG. 1;

【図4】図1に示した第1の実施形態の製造方法を説明
するためのボンディング装置の概略構成を示す図。
FIG. 4 is a view showing a schematic configuration of a bonding apparatus for explaining the manufacturing method of the first embodiment shown in FIG. 1;

【図5】図1に示した第1の実施形態の製造方法を説明
するために、半導体チップと配線基板との接続状態を示
した平面図。
FIG. 5 is a plan view showing a connection state between a semiconductor chip and a wiring board for explaining the manufacturing method of the first embodiment shown in FIG. 1;

【図6】図1に示した第1の実施形態の製造方法を説明
するために、被覆部を形成するエポキシ樹脂の塗布状態
を示す説明図。
FIG. 6 is an explanatory view showing an applied state of an epoxy resin for forming a covering portion for explaining the manufacturing method of the first embodiment shown in FIG. 1;

【図7】図1に示した第1の実施形態の製造方法を説明
するために、外部接続端子の装着状態を示す平面図。
FIG. 7 is a plan view showing an attached state of the external connection terminal for explaining the manufacturing method of the first embodiment shown in FIG. 1;

【図8】本発明の第2の実施形態を構成する配線基板の
平面図及びその組立て状態を示す平面図。
FIG. 8 is a plan view of a wiring board constituting a second embodiment of the present invention and a plan view showing an assembled state thereof.

【図9】本発明の第3の実施形態の概略構成を示す縦断
面図及び積層されるものを順次その一部を除去して示し
た平面図。
FIG. 9 is a longitudinal sectional view showing a schematic configuration of a third embodiment of the present invention, and a plan view showing a laminated structure in which a part thereof is sequentially removed.

【図10】従来のパッケージ型半導体装置の概略構成を
示す縦断面図。
FIG. 10 is a longitudinal sectional view showing a schematic configuration of a conventional package type semiconductor device.

【符号の説明】[Explanation of symbols]

11 半導体チップ 12 端子形成領域 13 内部接続端子 21 配線基板 22 シート部材 23 配線 23a 配線の一端部 23b 配線の他端部 24 開口 25 空気流通口 31 外部接続端子 32 被覆部 33 空間 34 枠型部材 40 ボンディング装置 41 窪み 42 ステージ 43 ボンディングヘッド 51 シリンジ 52 樹脂 DESCRIPTION OF SYMBOLS 11 Semiconductor chip 12 Terminal formation area 13 Internal connection terminal 21 Wiring board 22 Sheet member 23 Wiring 23a One end of wiring 23b The other end of wiring 24 Opening 25 Air circulation port 31 External connection terminal 32 Covering part 33 Space 34 Frame type member 40 Bonding device 41 Depression 42 Stage 43 Bonding head 51 Syringe 52 Resin

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】所定の端子形成領域に複数の内部接続端子
が列状に形成された半導体チップと、 外部の所定の被接続位置に対応して複数の開口が形成さ
れた絶縁性のシート部材と前記シート部材の一面に配設
されると共に、一端部が前記内部接続端子に対応する間
隔にて前記シート部材の縁部から延出し、他端部が互い
に異なる前記開口を塞ぐように形成された複数の配線と
を含み、前記配線の形成面を前記半導体チップ側にして
前記配線の一端部がそれぞれ対応する前記半導体チップ
の内部接続端子に接続された配線基板と、 前記配線の他端部に接続する状態で前記シート部材の開
口にそれぞれ嵌着され、表面部が前記シート部材の他面
から突出する外部接続端子と、 前記内部接続端子に前記配線の一端部が接続された部位
を被覆、保護する絶縁性の被覆部と、 を備えたパッケージ型半導体装置。
1. A semiconductor chip having a plurality of internal connection terminals formed in a row in a predetermined terminal formation region, and an insulating sheet member having a plurality of openings formed corresponding to predetermined external connection positions. And one end is formed to extend from an edge of the sheet member at an interval corresponding to the internal connection terminal, and the other end is formed so as to close the different openings. A plurality of wirings, a wiring board having one end of each of the wirings connected to an internal connection terminal of the corresponding semiconductor chip, with the formation surface of the wiring being the semiconductor chip side, and the other end of the wirings And an external connection terminal having a surface portion protruding from the other surface of the sheet member and covering a portion where one end of the wiring is connected to the internal connection terminal. , Protect Packaged semiconductor device and an insulating covering part.
【請求項2】前記半導体チップは矩形の平面形状をな
し、四辺の各縁端部に前記端子形成領域を有し、前記内
部接続端子は前記端子形成領域にそれぞれ形成されると
共に、前記半導体チップの表面よりも所定値だけ高く形
成され、前記被覆部は前記半導体チップの縁端部に枠状
に形成された請求項1に記載のパッケージ型半導体装
置。
2. The semiconductor chip according to claim 1, wherein said semiconductor chip has a rectangular planar shape, has said terminal forming region at each edge of four sides, and said internal connection terminals are respectively formed in said terminal forming region. 2. The package-type semiconductor device according to claim 1, wherein the cover is formed to be higher than a surface of the semiconductor chip by a predetermined value, and the covering portion is formed in a frame shape at an edge of the semiconductor chip.
【請求項3】前記被覆部は熱硬化性樹脂でなる請求項1
又は2に記載のパッケージ型半導体装置。
3. The method according to claim 1, wherein the coating is made of a thermosetting resin.
Or the package type semiconductor device according to 2.
【請求項4】前記内部接続端子と略同一の高さを有し、
かつ、平面方向で見て前記内部接続端子の内側にて前記
被覆部の形成領域を確定する絶縁性の枠形部材を備えた
請求項2又は3に記載のパッケージ型半導体装置。
4. It has substantially the same height as said internal connection terminal,
The package-type semiconductor device according to claim 2, further comprising an insulating frame-shaped member that determines a formation region of the covering portion inside the internal connection terminal when viewed in a plane direction.
【請求項5】前記配線基板は前記被覆部が形成される領
域の内側に空気の流通口を備えた請求項1乃至4のいず
れかに記載のパッケージ型半導体装置。
5. The package type semiconductor device according to claim 1, wherein said wiring board has an air flow port inside a region where said covering portion is formed.
JP6836898A 1998-03-18 1998-03-18 Package type semiconductor device Expired - Fee Related JP3912888B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6836898A JP3912888B2 (en) 1998-03-18 1998-03-18 Package type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6836898A JP3912888B2 (en) 1998-03-18 1998-03-18 Package type semiconductor device

Publications (2)

Publication Number Publication Date
JPH11265959A true JPH11265959A (en) 1999-09-28
JP3912888B2 JP3912888B2 (en) 2007-05-09

Family

ID=13371771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6836898A Expired - Fee Related JP3912888B2 (en) 1998-03-18 1998-03-18 Package type semiconductor device

Country Status (1)

Country Link
JP (1) JP3912888B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009158801A (en) * 2007-12-27 2009-07-16 Elpida Memory Inc Method of manufacturing semiconductor device, and semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009158801A (en) * 2007-12-27 2009-07-16 Elpida Memory Inc Method of manufacturing semiconductor device, and semiconductor device

Also Published As

Publication number Publication date
JP3912888B2 (en) 2007-05-09

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