JPH11248719A - Displacement magnifying device and micro region scanning device using the device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To permit magnification of the displacement of a piezoelectric element by a lever and to suppress displacement which occurs in a direction different from the direction of main displacement. SOLUTION: A displacement magnifying device 201 is composed of a substrate 101, a piezoelectric element 103 fixed in parallel with the substrate 101, an input beam 104 fixed at the extending and contracting end of the piezoelectric element 103 in parallel with the substrate 101, two pairs of approximately parallel linkages which are symmetrically arranged with respect to the output axis of the piezoelectric element 103 and in which parts of the approximately parallel linkages elastically unite with the input beam 104 at rotational contrapositions, and an output beam 114 to unite the two opposed beams of the two pair of approximate parallel linkages. In addition, a micro region scanning device is constituted through the use of the displacement magnifying device 201.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a micro area used for scanning a sample or a probe of a scanning probe microscope (SPM) represented by an atomic force microscope (AFM) or a scanning near field microscope (SNOM). The present invention relates to a displacement enlarging device used for a scanning device and a minute area scanning device using the same.

[0002]

2. Description of the Related Art A scanning probe microscope (SPM) scans a sample surface with a mechanical probe (hereinafter, referred to as a probe) and detects an interaction between the probe and the sample surface to detect the sample. The physical quantity of the surface is expressed as nm (10-
9m) This is a device for observing in the following order. For example,
In a typical atomic force microscope (AFM) as one of the scanning probe microscopes (SPM), an atomic force acting between a probe and a sample surface is detected based on information of a change in the amount of deflection of the probe and is used. Thereby, the surface shape of the sample can be observed.

In such an apparatus, a mechanical device necessary for scanning a sample or a probe in a horizontal direction (hereinafter, referred to as XY direction) or in a horizontal direction and a height direction (hereinafter, referred to as Z direction) is a minute area scanning device. It is.

A small area scanning device used for a scanning probe microscope (SPM) requires a high resolution of 0.01 to 0.1 nm, and therefore uses a piezoelectric element. Typically, for example, US Pat. No. 5,306,919 (Eling)
s et al. ) Discloses a tube-type minute area scanning device. At the early stage of the development of the scanning probe microscope (SPM), an atomic image and the like are observed using such a small area scanning device.

[0005] Such a tube-type micro-area scanning device has advantages in that the structure is simple and the resonance frequency is high when the displacement amount is about 20 µm. However, when a displacement amount of more than, for example, 50 μm or more is required, the length of the tube is increased, the resonance frequency is lowered, and at the same time, the pitching at the time of scanning in the XY direction is increased. .

In recent years when the scanning probe microscope (SPM) has become widespread, observation of a larger sample such as a biological cell is required, and a movement amount in the XY direction of 50 to 200 μm is required. In addition, since observation on a normal optical microscope is required, there is a need for a small area scanning device that is thin in the Z direction. In line with these trends,
Instead of the conventional tube type, a displacement magnifying device that enlarges the displacement of the piezoelectric element several times by a combination of a piezoelectric element, an elastic hinge, and a lever, and a thin micro area scanning device using the same are manufactured.

As such a displacement enlarging device and a micro area scanning device using the same, for example, US Pat.
No. 51594 (Tsuda et al.). The displacement enlarging device disclosed herein is an application of the principle of leverage to a structure that is formally called a parallel spring. In this example, an elastic hinge is used instead of a leaf spring. In such a displacement enlarging device, the parallel spring, which also serves as a lever, tilts with the displacement of the piezoelectric element,
It is possible to obtain a displacement enlarged about 10 times on the stage surface.

FIG. 14 is a schematic diagram showing an example of the configuration of a conventional displacement enlarging device using a parallel spring structure. FIG.
In, the piezoelectric element 1401 is fixed on the base 1402. A ball 14 is provided on the elastic end side of the piezoelectric element 1401.
03 is fixed. A first elastic hinge 1404 is disposed on the base 1402, and a first beam 1405 is fixed to the first elastic hinge 1404 in a direction orthogonal to an output axis of the piezoelectric element 1401. The ball 1403 contacts at any one point of the first beam 1405. A second elastic hinge 1406 is fixed to a free end side of the first beam 1405. On both sides of the base 1402, third elastic hinges 140 are provided.
7 are arranged one by one. Third elastic hinge 1
In 407, second beams 1408 are provided one by one,
It is fixed in parallel with the first beam 1405. Second beam 140
The fourth elastic hinges 1409 are fixed one by one to the free ends 8. Two fourth elastic hinges 1409
Is fixed to the output beam 1410. A second elastic hinge 1406 is fixed to an arbitrary position of the output beam 1410.
By combining two of the displacement enlargement devices so as to be orthogonal to each other, it is possible to configure a small area scanning device in the XY directions.

FIG. 15 is a schematic diagram showing the operation of a conventional displacement enlarging device. FIG. 15 shows a state in which the piezoelectric element 1401 extends rightward with respect to the paper surface by L1. In this state, the first beam 1405 is pushed rightward by the ball 1403, and tilts about the first elastic hinge 1404 as a rotation center. At this time, the first elastic hinge 140
The distance between the first elastic hinge 1404 and the second elastic hinge 1406, that is, the length of the first beam 1405, is b. First beam 14
05 acts as a lever with the first elastic hinge 1404 as a fulcrum, the ball 1403 as a power point, and the second elastic hinge 1406 as a point of action, and the extension amount of the piezoelectric element 1401 is L
The displacement amount L2 of the second elastic hinge 1406 at 1 is L
2 = L1 · b / a. This second elastic hinge 140
6, the output beam 1410 moves to the right by the same displacement as the displacement of the second elastic hinge 1406. At this time,
Two second beams 1408 act as guides to keep output beam 1410 horizontal.

[0010]

[Problems to be solved by the invention]

However, in the conventional displacement enlarging device utilizing the parallel spring structure as described above, since the parallel spring performs a rotary motion about the fulcrum, it can be moved in a direction different from the main displacement direction. Displacement due to rotation occurs. Δh in FIG. 15 is the displacement due to this rotation.
This is more remarkable as the lever enlargement ratio increases. Further, when a minute area scanning device is constituted by using one or two axes of such a displacement enlarging device and is incorporated in a scanning probe microscope (SPM), there is a problem that an observed image is distorted.

Accordingly, an object of the present invention is to solve the above-mentioned problems of the conventional displacement enlarging device and the minute area scanning device using the parallel spring structure, and to increase the displacement enlarging rate of the piezoelectric element by leverage. Another object of the present invention is to realize a displacement enlarging device that does not generate a displacement in a direction different from the main displacement direction, and to realize a small area scanning device that does not cause distortion in an observed image by using the device.

[0013]

In order to solve the above-mentioned problems, the present invention provides a displacement magnifying device used for a micro area scanning device for scanning a sample or a probe of a scanning probe microscope (SPM), and using the displacement enlarging device. In the micro-area scanning device used, the structure of an approximate parallel motion chain is adopted in the parallel spring structure combined with the piezoelectric element, so that the output point of the parallel spring performs an approximate linear motion. Further, by connecting two pairs of the approximate parallel motion chains with a beam, an approximate linear displacement without an angular displacement can be obtained. In addition, by making a part of this approximate parallel motion chain also act as a lever, the displacement of the piezoelectric element is enlarged, and the enlarged displacement can be obtained as an approximate linear displacement. Also,
A minute area scanning device was constructed by combining the displacement magnifying devices.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. (1) First Embodiment FIGS. 1 and 2 are schematic views showing a first embodiment of the displacement enlarging device of the present invention.

FIG. 1 is a top view and FIG. 2 is a side view. 1 and 2, a first holder 102 on a base 101
Then, the base of the first piezoelectric element 103 is fixed. The fixing is performed in such a manner that the output shaft of the first piezoelectric element 103 and the base 101 are parallel to each other, and that the side surface of the first piezoelectric element 103 is not in contact with the base 101. A free end of the first piezoelectric element 103 is provided with a bifurcated input beam 10.
4 is fixed. On the base 101, two sets of approximate parallel motion chains arranged symmetrically with respect to the output axis of the piezoelectric element 103, and an output beam 114 connecting two opposing beams of the two sets of approximate parallel motion chains. Is arranged. The two sets of approximate parallel motion chains and the output beam 114 are all arranged on the same plane of the base 101.

The structure of one set of approximate parallel motion chains among the two sets of approximate parallel motion chains will be described below. A first fulcrum 105 having a rotation axis perpendicular to the base 101 is fixed on the base 101. The first fulcrum 105 has the first beam 1
06 is rotatably fixed. This first beam 106
The first piezoelectric element 103 is arranged in a direction orthogonal to the output axis. The free end of the first beam 106 has a first rotating pair 1
07 is arranged. At an arbitrary position on the first beam 106,
The second rotating pair 108 is fixed. The fulcrum and the rotating pair are constituted by an elastic hinge having an integrated cutout structure. As the material of the elastic hinge, a material having high elasticity such as SUS, phosphor bronze, or polyacetal is used.

In this embodiment, SUS is used for all rotating pairs.
And a notch structure of the same shape. Here, when the distance from the first fulcrum 105 to the second rotating pair 108 is (c), and the distance from the first rotating pair 107 to the second rotating pair 108 is (d), FIG. In 1,
The second rotating pair 108 is located at a position where c: d = 1: 1.

The first rotating pair 107 has a second beam 10
9 is fixed to the first beam 106 at an arbitrary angle. In FIG. 1, it has an angle of 90 °. Second beam 1
A third rotating pair 110 and a fourth rotating pair 111 are fixed at an arbitrary position 09. In FIG. 1, a third rotating pair 110 is fixed to the end of the second beam 109, and a fourth rotating pair 111 is a second beam between the first rotating pair 107 and the third rotating pair 110. It is fixed at an arbitrary position on 109. The third rotating pair 110 includes a third beam 112.
Are fixed parallel to the first beam 106 and the third beam 112
Is fixed to a second fulcrum 113 having a rotation axis perpendicular to the base 101.

Here, the length of the first beam 106 is (A)
The length of the third beam 112 is (B), and the third rotating pair 1
The distance between 10 and the fourth rotating pair 111 is (a)
When the distance between the rotation pair 107 and the fourth rotation pair 111 is (b), a positional relationship of A: B = a: b is provided.

The above is the configuration of one set of approximate parallel motion chains. Two sets of the approximate parallel motion chains are symmetrically arranged on the base with respect to the output shaft of the piezoelectric element 103. The two opposing beams of the two sets of approximate parallel motion chains, that is, the two second beams 109 are formed by two opposing fourth rotating pairs 1
11, and is fixed by the output beam 114.

The free ends of the bifurcated input beam 104 are fixed to the two second rotating pairs 108 one by one. FIG.
FIG. 4 is a schematic diagram showing the operation of the first embodiment. FIG.
First, the first piezoelectric element 103
It shows a state of being stretched only. In this state, the input beam 10
4 moves to the right by L1, and accordingly, the second rotating pair 108 moves to the right by L1. Second rotating pair 10
8, the first beam 106 is moved to the first fulcrum 105
Rotate around the axis. That is, the second rotating pair 108 acts as an input point of the expansion and contraction displacement of the first piezoelectric element 103, whereby the first beam 106 acts as a lever around the first fulcrum 105 as an axis. The point of action of the lever is the first rotating pair 107. Here, as described with reference to FIG.
8 is (c), and the distance from the first rotating pair 107 to the second rotating pair 108 is (d), in FIG. 1, the position becomes c: d = 1: 1. The second rotating pair 108 is arranged. At this time, the first rotation pair 10
7 is L2, L2 = L1 · (c +
d) / c = 2 · L1.

Here, the first fulcrum 105, the first beam 106, the first rotating pair 107, the second beam 109, the third rotating pair 110, the fourth rotating pair 111, and the third beam Consider the relationship between 112 and the second fulcrum 113. As described with reference to FIG. 1, the length of the first beam 106 is (A), the length of the third beam 112 is (B), and the distance between the third rotation pair 110 and the fourth rotation pair 111 is (A), and the distance between the first rotating pair 107 and the fourth rotating pair 111 is (b), there is a positional relationship of A: B = a: b.

That is, this is an approximate parallel motion chain of Watts whose output point is the fourth rotating pair 111. Therefore, with the movement of the first beam 106, the second beam 109,
The third beam 112 moves in a chain, and the fourth beam 112 on the second beam 109
Perform an approximate linear motion. At this time, the fourth rotating pair 111 linearly displaces while slightly displacing the angle. Assuming that the output displacement of the fourth rotating pair 111 is L3, it is L3 L2.

In the present invention, two sets of the approximate parallel motion chains of watts are symmetrically arranged on the base with reference to the output shaft of the first piezoelectric element 103, and two opposing fourth rotating pairs 111 are arranged. Are connected by an output beam 114. Thus, the influence of the angular displacement of the fourth rotating pair 111 is absorbed by the elasticity of the fourth rotating pair 111 itself, and the output beam 11
4, only the linear displacement can be extracted. at the same time,
The output beam 114 contributes to the improvement of the rigidity of the two sets of approximate parallel motion chains, and also has the effect of preventing the second beam 109 from being twisted. The displacement output direction of the output beam 114 is the first piezoelectric element 10
3 is the same direction as the output shaft.

FIG. 4 is a sectional view of each beam of the first embodiment. 4A is a cross-sectional view of the first beam 106 near the first fulcrum 105, and FIG. 4B is a cross-sectional view of the third beam 112 near the second fulcrum 113. I have. FIG.
FIG. 4C is a cross-sectional view of the second beam 109 near the first rotating pair 107, and FIG. 4D is a cross-sectional view of the second beam 109 near the fourth rotating pair 111. Cross section (a),
(B), (c), and (d) show that the bending stiffness in the vertical direction is (a) = (b) by changing the cross-sectional shape and the cross-sectional area.
= (C) = (d), and the unit mass is (a) =
The configuration has a mass gradient such that (b)>(c)> (d). The mass gradient is continuous and smooth. That is, the rigidity is set so as to decrease the mass as approaching the output beam 114, whereby the deflection amount of each beam due to its own weight can be minimized. In the first embodiment, an I-shaped cross section is used, but a round hollow cross section or a square hollow cross section can also be used. Further, it is also possible to realize the mass gradient not by the change of the sectional area but by the change of the component of the material.

FIG. 5 is a perspective view schematically showing a state in which the cross section of the beam described in FIG. 4 changes. (2) Second Embodiment FIGS. 6 and 7 are schematic views showing a second embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention. 6 shows a top view and FIG. 7 shows a side view. 6 and 7, the base of the first piezoelectric element 103 is fixed to the first holder 102 on the base 101. Fixing is the first
So that the output shaft of the piezoelectric element 103 is parallel to the base 101 and the side surface of the first piezoelectric element 103 is
Is performed in a non-contact positional relationship. First piezoelectric element 1
A bifurcated input beam 104 is fixed to the telescopic end of 03. On the base 101, two sets of approximate parallel motion chains symmetrically arranged with respect to the output axis of the first piezoelectric element 103 and two opposing beams of the two sets of approximate parallel motion chains are connected. An output beam 114 is arranged. The two sets of approximate parallel motion chains and the output beam 114 are all arranged on the same plane of the base 101. The output beam 114 has the second holder 1
15 is fixed, and the base of a second piezoelectric element 116 having an output axis orthogonal to the output axis of the first piezoelectric element 103 is fixed to the second holder 115. Fixing is the second
The output axis of the piezoelectric element 116 and the output beam 114 are parallel to each other, and the side surface of the second piezoelectric element 116 is
14 is performed in a non-contact positional relationship. A sample stage 117 is fixed to the expansion and contraction end of the second piezoelectric element 116.

The structure of one set of approximate parallel motion chains among the two sets of approximate parallel motion chains will be described below. A first fulcrum 105 having a rotation axis perpendicular to the base 101 is fixed on the base 101. The first fulcrum 105 has the first beam 1
06 is rotatably fixed. This first beam 106
The first piezoelectric element 103 is arranged in a direction orthogonal to the output axis. The free end of the first beam 106 has a first rotating pair 1
07 is arranged. At an arbitrary position on the first beam 106,
The second rotating pair 108 is fixed. The fulcrum and the rotating pair are constituted by an elastic hinge having an integrated cutout structure. As the material of the elastic hinge, a material having high elasticity such as SUS, phosphor bronze, or polyacetal is used.

In this embodiment, SUS is used for all the rotating pairs.
And a notch structure of the same shape. Here, when the distance from the first fulcrum 105 to the second rotating pair 108 is (c), and the distance from the first rotating pair 107 to the second rotating pair 108 is (d), FIG. In 6,
The second rotating pair 108 is arranged at a position where c: d = 1: 1.

The first rotating pair 107 has the second beam 10
9 is fixed to the first beam 106 at an arbitrary angle. In FIG. 6, the angle is 90 °. Second beam 1
A third rotating pair 110 and a fourth rotating pair 111 are fixed at an arbitrary position 09. In FIG. 6, the fourth rotating pair 111 is fixed to the end of the second beam 109, and the third rotating pair 110 is a second beam between the first rotating pair 107 and the fourth rotating pair 111. It is fixed at an arbitrary position on 109. The positions of the third 110 and the fourth rotating pair 111 are different from those of the first embodiment. Third rotating pair 11
At 0, the third beam 112 is fixed in parallel with the first beam 106, and the other end of the third beam 112 is fixed to a second fulcrum 113 having a rotation axis perpendicular to the base 101. You.

Here, the length of the first beam 106 is (A)
The length of the third beam 112 is (B), and the third rotating pair 1
The distance between 10 and the fourth rotating pair 111 is (a)
When the distance between the rotation pair 107 and the fourth rotation pair 111 is (b), a positional relationship of A: B = a: b is provided. The above is the configuration of one set of approximate parallel motion chains. Two sets of the approximate parallel motion chains are symmetrically arranged on the base with respect to the output axis of the first piezoelectric element 103.

The two opposing beams of the two sets of approximate parallel motion chains, that is, the two second beams 109 are fixed to the output beam 114 via the two opposing fourth rotating pairs 111. Is done. The free ends of the bifurcated input beam 104 are fixed to the two second rotating pairs 108 one by one.

FIG. 8 is a schematic diagram showing the operation of the second embodiment. FIG. 8 shows a state in which the first piezoelectric element 103 extends rightward with respect to the paper surface by L1. In this state, the input beam 104 moves to the right by L1, and accordingly, the second rotating pair 108 moves to the right by L1. Second
With the movement of the rotating pair 108, the first beam 106 performs a rotating motion about the first fulcrum 105 as an axis. That is,
The second rotating pair 108 serves as an input point of the expansion and contraction displacement of the first piezoelectric element 103, and thereby the first beam 10
6 acts as a lever around the first fulcrum 105 as an axis. The operating point of the lever is the first rotating pair 107. Here, as described with reference to FIG. 6, the distance from the first fulcrum 105 to the second rotating pair 108 is (c), and the distance from the first rotating pair 107 to the second rotating pair 108 is ((c)). d), the second position is at a position where c: d = 1: 1.
Are located. At this time, if the output displacement amount of the first rotating pair 107 is L2, L2 = L1 ·
(C + d) / c = 2 · L1.

Here, the first fulcrum 105, the first beam 106, the first rotating pair 107, the second beam 109, the third rotating pair 110, the fourth rotating pair 111, the third beam Consider the relationship between 112 and the second fulcrum 113. As described in FIG. 6, the length of the first beam 106 is (A), the length of the third beam 112 is (B), and the length between the third rotating pair 110 and the fourth rotating pair 111 is set. (A), and the distance between the first rotating pair 107 and the fourth rotating pair 111 is (b), there is a positional relationship of A: B = a: b.

This is an approximate parallel motion chain of Watts with the output point of the fourth rotating pair 111. Therefore, with the movement of the first beam 106, the second beam 109,
The third beam 112 moves in a chain, and the fourth beam 112 on the second beam 109
Perform an approximate linear motion. At this time, the fourth rotating pair 111 linearly displaces while slightly displacing the angle. Assuming that the output displacement of the fourth rotating pair 111 is L3, it is L3 L2.

In the present invention, two sets of the approximate parallel motion chain of watts are symmetrically arranged on the base with reference to the output shaft of the first piezoelectric element 103, and two opposing fourth rotating pairs 111 are arranged. Are connected by an output beam 114. Thus, the influence of the angular displacement of the fourth rotating pair 111 is absorbed by the elasticity of the fourth rotating pair 111 itself, and the output beam 11
4, only the linear displacement can be extracted. at the same time,
The output beam 114 contributes to the improvement of the rigidity of the two sets of approximate parallel motion chains, and also has the effect of preventing the second beam 109 from being twisted. The displacement output direction of the output beam 114 is the first piezoelectric element 10
3 is the same direction as the output shaft. Second piezoelectric element 116 fixed to second holder 115 of output beam 114
Has an output axis orthogonal to the output axis of the first piezoelectric element 103, and the sample stage 117 can be moved by expanding and contracting the second piezoelectric element 116. In this example, the state where the second piezoelectric element 116 is extended by L4 is shown, and as a result, the sample stage 117 moves L3 to the right and L4 upward from the position before the movement. in this way,
By controlling the first piezoelectric element 103 and the second piezoelectric element 116 separately, the sample stage 117 can be scanned in two axial directions. (3) Third Embodiment FIGS. 9 and 10 are schematic views showing a third embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention. 9 shows a top view and FIG. 10 shows a side view. 9 and 10, the output beam 11 of the displacement magnifying device 201 is shown.
4, the base 101 of the second displacement enlarging device 202 is fixed. The first displacement magnifying device 201 and the second displacement magnifying device 202 have the same configuration as the displacement magnifying device described in the first embodiment or the second embodiment. The output axis directions of the first displacement magnifying device 201 and the second displacement magnifying device 202 are orthogonal to each other, and a sample stage 117 is fixed to the output beam 114 of the second displacement magnifying device 202.

FIG. 11 is a schematic diagram showing the operation of the third embodiment. In FIG. 11, the first piezoelectric element 103 of the first displacement magnifying device 201 extends rightward in the drawing by L1 and the piezoelectric element 103 of the second displacement magnifying device first 202 faces the paper. The upper side shows a state extended by L1. In this state, the output beam 114 of the first displacement magnifying device 201 is displaced to the right by L3, whereby the second displacement magnifying device 202 is displaced to the right by L3. At the same time, the second
The output beam 114 of the displacement magnifying device 202 extends L3 upward. As a result, the sample stage 117 fixed to the output beam 114 of the second displacement enlarging device 202 moves L3 to the right and L3 upward from the position before the movement. (4) Fourth Embodiment FIGS. 12 and 13 are schematic views showing a fourth embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention. FIG. 12 shows a top view, and FIG. 13 shows a side view. 12 and 13, the output beam 114 of the displacement magnifying device 201 is attached to the base 101 of the second displacement magnifying device 202.
Is fixed. The first displacement magnifying device 201 and the second displacement magnifying device 202 have the same configuration as the displacement magnifying device described in the first embodiment or the second embodiment. The output axes of the first displacement magnifying device 201 and the second displacement magnifying device 202 are orthogonal, and the output beam 11 of the second displacement magnifying device 202 is
4, a third holder 118 is fixed, and a Z-axis piezoelectric element 119 is fixed thereon. Piezoelectric element for Z axis 1
A sample stage 117 is fixed to the 19 expansion and contraction ends.

[0037]

As described above, the present invention relates to a displacement magnifying apparatus used for a micro area scanning apparatus for scanning a sample or a probe of a scanning probe microscope (SPM) and a micro area scanning apparatus using the same. , A base, a piezoelectric element fixed parallel to the base, an input beam fixed parallel to the base at the expansion and contraction ends of the piezoelectric element, and two sets of symmetrically arranged with respect to the output axis of the piezoelectric element. A displacement magnifying device was constituted by an approximate parallel kinematic chain and an output beam connecting two opposing beams of the two sets of approximate parallel kinematic chains, and a micro area scanning device was constituted by using the displacement magnifying device.

With the above configuration, the following effects can be obtained. (1) By introducing the structure of the approximate parallel motion chain into the parallel spring structure of the displacement magnifying device, it is possible to cause the output point of the parallel spring to perform an approximate linear motion, and further, two sets of the approximate parallel motion chain are opposed to each other. Approximate linear displacement without angular displacement can be taken out by joining with a beam. (2) In addition, by making a part of this approximate parallel motion chain also act as a lever, the displacement of the piezoelectric element is enlarged, and this enlarged displacement is obtained as an approximate linear displacement. (3) A displacement enlargement device in which a displacement in a direction different from the main displacement direction does not occur while increasing the displacement enlargement ratio of the piezoelectric element by leverage by forming a micro area scanning device by combining this displacement enlargement device. , And using this, it is possible to realize a minute area scanning device that does not cause distortion in the observation image.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing an example of the configuration of a first embodiment of the displacement enlarging device of the present invention.

FIG. 2 is a schematic diagram showing an example of the configuration of the first embodiment of the displacement enlarging device of the present invention.

FIG. 3 is a schematic view showing the operation of the first embodiment of the displacement enlarging device of the present invention.

FIG. 4 is a sectional view of a beam according to the first embodiment of the displacement magnifying apparatus of the present invention.

FIG. 5 is a perspective view of a beam of the first embodiment of the displacement enlarging device of the present invention.

FIG. 6 is a schematic diagram showing an example of the configuration of a second embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention.

FIG. 7 is a schematic diagram showing an example of the configuration of a second embodiment of the displacement enlarging device of the present invention and the minute area scanning device using the same.

FIG. 8 is a schematic diagram showing the operation of a second embodiment of the displacement enlarging device of the present invention and the micro area scanning device using the same.

FIG. 9 is a schematic diagram showing an example of the configuration of a third embodiment of the displacement enlarging device of the present invention and the minute area scanning device using the same.

FIG. 10 is a schematic diagram showing an example of a configuration of a third embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention.

FIG. 11 is a schematic view showing the operation of a third embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention.

FIG. 12 is a schematic diagram showing an example of the configuration of a fourth embodiment of the displacement enlarging device of the present invention and a minute area scanning device using the same.

FIG. 13 is a schematic diagram showing an example of the configuration of a fourth embodiment of the displacement enlarging device and the minute area scanning device using the same according to the present invention.

FIG. 14 is a schematic diagram showing an example of a configuration of a conventional minute area scanning device according to the present invention.

FIG. 15 is a schematic view showing the operation of a conventional minute area scanning device according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 101 Base 102 First holder 103 First piezoelectric element 104 Input beam 105 First fulcrum 106 First beam 107 First rotating pair 108 Second rotating pair 109 Second beam 110 Third rotating pair 111 Fourth rotating pair 112 Third beam 113 Second fulcrum 114 Output beam 115 Second holder 116 Second piezoelectric element 117 Sample stage 118 Third holder 119 Z-axis piezoelectric element 201 First displacement magnifying device 202 Second displacement magnifying device 1401 Piezoelectric element 1402 Base 1403 Ball 1404 First elastic hinge 1405 First beam 1406 Second elastic hinge 1407 Third elastic hinge 1408 Second beam 1409 Fourth elastic hinge 1410 Output Beam

Claims (7)

[Claims] 1. A base, a piezoelectric element fixed in parallel with the base, an input beam fixed to a telescopic end of the piezoelectric element in parallel with the base, and symmetrical with respect to an output axis of the piezoelectric element. Two approximate parallel kinematic chains arranged in
A displacement magnifying device comprising an output beam connecting two opposing beams of a set of approximate parallel motion chains. 2. A set of each of the two sets of approximate parallel motion chains is fixed on the base and has a first fulcrum having a rotation axis perpendicular to the substrate and a first fulcrum. A first beam rotatably fixed and extending in a direction perpendicular to the output axis of the piezoelectric element; a first rotating pair fixed to a free end of the first beam; and fixed to the first beam A second rotating pair located at an arbitrary point between the first fulcrum and the free end; and a second fixed to the first rotating pair at an arbitrary angle with the first beam. A second beam, a third rotating pair fixed to an arbitrary position of the second beam, a fourth rotating pair fixed to an arbitrary position of the second beam, and the third rotation A third beam fixed to the pair and arranged in parallel with the first beam, and the other end of the third beam is rotatably fixed to the third beam; A second fulcrum fixed and having an axis of rotation perpendicular to the base; and b) the length of the first beam (A) and the length of the third beam (B). Is the ratio of the distance (a) between the third pair of rotations and the fourth pair of rotations and the distance (b) between the first pair of rotations and the fourth pair of rotations. C) the input beam is fixed to the second rotating pair, and both ends of the output beam are opposed to each other by the two sets of approximate parallel motion chains. The displacement enlarging device according to claim 1, wherein the displacement enlarging device is fixed to the two fourth rotating pairs. 3. The first fulcrum, the second fulcrum,
The said 1st rotation pair, the 2nd rotation pair, the 3rd rotation pair, and the 4th rotation pair are comprised by the elastic hinge, The Claim 1 or 2 characterized by the above-mentioned. Displacement enlargement device. 4. The displacement enlarging device according to claim 1, wherein a mass gradient is present from the input beam to the output beam. 5. A small area scanning device comprising at least one of the displacement enlarging devices according to claim 1 and a second piezoelectric element. 6. A minute area scanning device comprising at least two of the displacement magnifying devices according to claim 1. 7. The small area scanning device according to claim 5, further comprising a Z-axis piezoelectric element.