JPH11242105A - Matrix for forming reflector and its production and reflector and its production as well as reflection type liquid crystal display device - Google Patents

Matrix for forming reflector and its production and reflector and its production as well as reflection type liquid crystal display device

Info

Publication number
JPH11242105A
JPH11242105A JP10042597A JP4259798A JPH11242105A JP H11242105 A JPH11242105 A JP H11242105A JP 10042597 A JP10042597 A JP 10042597A JP 4259798 A JP4259798 A JP 4259798A JP H11242105 A JPH11242105 A JP H11242105A
Authority
JP
Japan
Prior art keywords
reflector
matrix
range
recesses
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10042597A
Other languages
Japanese (ja)
Inventor
Tomomasa Takatsuka
智正 高塚
Tatsuya Moriike
達哉 森池
Koichi Umagami
幸一 馬上
Mitsuru Kano
満 鹿野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP10042597A priority Critical patent/JPH11242105A/en
Priority to TW087111807A priority patent/TW496992B/en
Priority to US09/123,909 priority patent/US6421106B1/en
Priority to KR1019980030306A priority patent/KR100272883B1/en
Priority to CN98117102A priority patent/CN1103937C/en
Publication of JPH11242105A publication Critical patent/JPH11242105A/en
Priority to US09/649,298 priority patent/US6429919B1/en
Withdrawn legal-status Critical Current

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  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a reflector with which high reflection efficiency is obtainable over a wide angle and is brighter and whiter than heretofore. SOLUTION: A presser is pressed to the surface of a base material for a matrix and the pressing is repeated while the position of the pressure on the surface of the base material for the matrix is changed, by which many recessed parts having their inside surfaces constituting part of spherical surfaces are continuously formed on the mold surface of the base material for the matrix. Such base material is formed as the matrix for forming the reflector. A transfer mold having the mold surface reversing the rugged shapes of the mold surface of such matrix is formed and the mold surface of the transfer mold is transferred to the surface of the base material for the reflector. The reflector 1 is thus formed. The depth of the recessed parts 4 of the reflector 1 is formed to a range of 0.6 to 1.2 μm, the inclination angle distribution on the inside surface of the recessed parts 4 to -8 to +8 deg. and the pitch of the adjacent recessed parts 4 to 26.5 to 33.5 μm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、広範囲にわたって
均一な明るさと白さを有する反射体とその製造方法、及
びその製造時に使用する母型とその製造方法、並びにそ
の反射体を用いた反射型液晶表示装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflector having uniform brightness and whiteness over a wide range, a method of manufacturing the same, a matrix used in the manufacture thereof, a method of manufacturing the same, and a reflection type using the reflector. The present invention relates to a liquid crystal display device.

【0002】[0002]

【従来の技術】近年、ハンディタイプのコンピュータな
どの表示部として、特に消費電力が小さいことから反射
型液晶表示装置が広く利用されている。この反射型液晶
表示装置には、表示面側から入射した光を反射させて表
示を行うための反射板が備えられている。そして、従来
の反射板には、表面が鏡面状態とされた反射板や表面に
ランダムな凹凸が形成された反射板が用いられていた。
このうち、図9に示すように、ランダムな凹凸面を備え
た従来の反射板60は、例えば厚さ300ないし500
μmのポリエステルフィルム61を加熱することによっ
てその表面に高さが数μmの凹凸からなる凹凸面61a
を形成し、さらに凹凸面61a上に蒸着等の方法を用い
てアルミニウムや銀等からなる反射膜62を成膜するこ
とにより形成したものである。
2. Description of the Related Art In recent years, a reflection type liquid crystal display device has been widely used as a display unit of a handy type computer or the like because of particularly low power consumption. This reflective liquid crystal display device includes a reflector for reflecting light incident from the display surface side to perform display. As a conventional reflector, a reflector having a mirror-finished surface or a reflector having random irregularities formed on the surface has been used.
Among them, as shown in FIG. 9, a conventional reflector 60 having a random uneven surface has a thickness of 300 to 500, for example.
By heating a polyester film 61 of μm, an uneven surface 61 a having a height of several μm
And a reflective film 62 made of aluminum, silver, or the like is formed on the uneven surface 61a by a method such as vapor deposition.

【0003】この種の反射板60を用いた従来の反射型
液晶表示装置は、図10に示すように、一対のガラス基
板51、52の各々の内面側に透明電極層53、54を
設け、さらにこれら透明電極層53、54の各々の上に
液晶の配向膜55、56を設け、これら配向膜55、5
6間に液晶層57を配設した構成となっている。そし
て、ガラス基板51、52の外側にそれぞれ第1、第2
の偏光板58、59を設け、第2の偏光板59の外側に
は反射板60を反射膜62側の面を第2の偏光板59側
に向けて取り付けている。
In a conventional reflection type liquid crystal display device using a reflection plate 60 of this type, as shown in FIG. 10, transparent electrode layers 53 and 54 are provided on the inner surfaces of a pair of glass substrates 51 and 52, respectively. Further, liquid crystal alignment films 55 and 56 are provided on the transparent electrode layers 53 and 54, respectively.
The liquid crystal layer 57 is disposed between the six. Then, the first and second portions are provided outside the glass substrates 51 and 52, respectively.
Are provided, and a reflection plate 60 is attached to the outside of the second polarization plate 59 with the surface on the reflection film 62 side facing the second polarization plate 59 side.

【0004】上記構成の反射型液晶表示装置50におい
て、第1の偏光板58に入射した光はこの偏光板58に
よって直線偏光され、偏光された光が液晶層57を透過
することによって楕円偏光される。そして、楕円偏光さ
れた光は第2の偏光板59によって再び直線偏光され、
この直線偏光された光が反射板60にて反射されて、再
び第2の偏光板59、液晶層57を透過して第1の偏光
板58から出射する。
In the reflection type liquid crystal display device 50 having the above-described structure, the light incident on the first polarizing plate 58 is linearly polarized by the polarizing plate 58, and the polarized light is elliptically polarized by transmitting through the liquid crystal layer 57. You. Then, the elliptically polarized light is linearly polarized again by the second polarizing plate 59, and
The linearly polarized light is reflected by the reflecting plate 60, passes through the second polarizing plate 59 and the liquid crystal layer 57, and exits from the first polarizing plate 58.

【0005】この反射板と反射型液晶表示装置は次のよ
うな反射特性を有している。例えば図9に示すように、
反射膜62上に配置した点光源からの入射光Jの入射角
度を反射膜62表面に対する法線に対して入射角度30
度に一定にし、反射光Kの反射角度θを0度から60度
に変化させた場合の反射率を測定すると、反射角度30
度での反射率をピークとして左右の反射角度20度以下
および40度以上では反射率がほぼ最低となることがわ
かった。そして、反射板単独での測定のみならず、この
反射板を備えた液晶表示装置全体として測定してもこの
傾向は同様であって、反射角度30度での反射率をピー
クとして反射角度23度以下ないし37度以上の範囲で
ほぼ0%に低下することが判明した。
The reflection plate and the reflection type liquid crystal display have the following reflection characteristics. For example, as shown in FIG.
The incident angle of the incident light J from the point light source disposed on the reflective film 62 is set to an incident angle 30 with respect to the normal to the surface of the reflective film 62.
When the reflectance is measured when the reflection angle θ of the reflected light K is changed from 0 degree to 60 degrees, the reflection angle 30
It was found that the reflectance was almost the lowest when the right and left reflection angles were 20 degrees or less and 40 degrees or more with the reflectance at the peak as the peak. This tendency is similar not only to the measurement using the reflection plate alone, but also to the measurement as a whole of the liquid crystal display device provided with this reflection plate. The reflection angle at a reflection angle of 30 degrees is a peak and the reflection angle is 23 degrees. It has been found that the temperature drops to almost 0% in the range from below to 37 degrees or more.

【0006】なお、表面を鏡面とした反射板の反射特性
に関しては、一般に、表面にランダムな凹凸を持つ反射
板と比較して、入射角度に対する特定の反射角度におい
て非常に高い反射率を示す。しかしながら、反射率の高
い反射角度の範囲が極めて狭い、すなわち視野角が狭い
という特性を持っている。
[0006] With respect to the reflection characteristics of a reflector having a mirror-finished surface, the reflectivity generally shows a very high reflectance at a specific reflection angle with respect to the incident angle, as compared with a reflector having random irregularities on the surface. However, it has the characteristic that the range of the reflection angle with high reflectance is extremely narrow, that is, the viewing angle is narrow.

【0007】[0007]

【発明が解決しようとする課題】上述したように、ラン
ダムな凹凸反射面を持つ従来の反射板は、反射効率が悪
いために全体的に反射率が低く、入射光をより広範囲の
反射角度で効率良く反射させるという反射板のニーズに
充分に応えることができなかった。したがって、この種
の反射板を用いた反射型液晶表示装置は、表示面の明る
さが不充分であるという問題があった。また、反射板の
特性には明るさと同時に白さも求められるが、この種の
従来の反射板では種々の波長を持つ光が均一にバランス
良く反射しないため、反射面の白さという点でも不充分
であった。さらに、この種の反射板における反射角度や
反射光強度等の反射特性は、ランダムに形成される凹凸
によって自ずと決まってしまうものであり、光学的な設
計により制御されたものではなかった。
As described above, the conventional reflector having a random concave-convex reflecting surface has a low reflectance as a whole due to poor reflection efficiency, so that incident light can be reflected over a wider range of reflection angles. It has not been possible to sufficiently meet the need for a reflector that reflects light efficiently. Therefore, the reflection type liquid crystal display device using this type of reflection plate has a problem that the brightness of the display surface is insufficient. In addition, whiteness as well as brightness is required for the characteristics of the reflector, but this type of conventional reflector does not uniformly reflect light having various wavelengths in a well-balanced manner, and therefore is insufficient in terms of whiteness of the reflection surface. Met. Further, the reflection characteristics such as the reflection angle and the reflection light intensity of this type of reflection plate are determined automatically by randomly formed irregularities, and are not controlled by optical design.

【0008】そこで、これらの問題を解決するために、
表面に直線状に延びる多数のストライプ溝を形成した反
射板が提案されている。この種の反射板は、まず直線状
の多数のストライプ溝を有する母型を作成し、その母型
の型面を転写することにより作成することができる。し
かしながら、この反射板の場合、ストライプ溝に垂直な
方向に関しては、ある範囲の反射角度で所望の明るさが
得られるものの反射角度範囲が狭く、さらに、ストライ
プ溝に垂直な方向以外の方向に関しては、反射率がそも
そも低い上に反射角度も極めて狭いものであった。した
がって、この種の反射板を液晶表示装置に適用したとこ
ろで、特にストライプ溝に平行な方向において表示面の
明るさや白さが不充分である、といった上記の問題が解
決できなかった。
Therefore, in order to solve these problems,
A reflector having a large number of stripe grooves extending linearly on the surface has been proposed. This type of reflector can be prepared by first preparing a matrix having a large number of linear stripe grooves and transferring the mold surface of the matrix. However, in the case of this reflector, in the direction perpendicular to the stripe groove, although a desired brightness can be obtained at a certain range of reflection angle, the reflection angle range is narrow, and further, in the direction other than the direction perpendicular to the stripe groove, The reflectivity was originally low and the reflection angle was extremely narrow. Therefore, when this type of reflector is applied to a liquid crystal display device, the above-described problem that the brightness and whiteness of the display surface are insufficient, particularly in a direction parallel to the stripe groove, cannot be solved.

【0009】本発明は、上記の課題を解決するためにな
されたものであって、充分な明るさや白さを有する反射
体とその製造方法、およびその反射体製造時に使用する
母型とその製造方法、並びにより明るい表示面が得られ
る反射型液晶表示装置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and a reflector having sufficient brightness and whiteness, a method of manufacturing the same, a matrix used for manufacturing the reflector, and a method of manufacturing the same. It is an object of the present invention to provide a method and a reflective liquid crystal display device capable of obtaining a brighter display surface.

【0010】[0010]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明の反射体形成用母型は、母型用基材の表面
に内面が球面の一部をなす多数の凹部が連続して形成さ
れ、上記凹部の深さが0.6μmないし1.2μmの範
囲にあり、上記凹部内面の傾斜角分布が−8度ないし+
8度の範囲にあり、隣接する凹部のピッチが26.5μ
mないし33.5μmの範囲にあることを特徴とするも
のである。なお、上記の「凹部の深さ」とは母型用基材
表面から凹部の底部までの距離、「隣接する凹部のピッ
チ」とは平面視したときに一方向に隣接する凹部におい
て円形状となる凹部の中心間の距離のことである。ま
た、「凹部内面の傾斜角」とは、図8に示すように、凹
部4の内面の任意の箇所において0.5μm幅の微小な
範囲をとったときに、その微小範囲内における斜面の水
平面に対する角度θのことである。角度θの正負は、反
射体表面に立てた法線に対して例えば図8における右側
の斜面を正、左側の斜面を負と定義する。
In order to achieve the above-mentioned object, the reflector forming master of the present invention has a large number of recesses whose inner surface forms a part of a spherical surface formed on the surface of the base for the base. The depth of the recess is in the range of 0.6 μm to 1.2 μm, and the inclination angle distribution of the inner surface of the recess is −8 degrees to +
In the range of 8 degrees, and the pitch between adjacent concave portions is 26.5 μm.
m to 33.5 μm. In addition, the above-mentioned “depth of the concave portion” is a distance from the surface of the base material for a matrix to the bottom of the concave portion, and “a pitch of the adjacent concave portion” is a circular shape in the concave portion adjacent in one direction when viewed in plan. Means the distance between the centers of the concave portions. Further, as shown in FIG. 8, the “inclination angle of the inner surface of the concave portion” refers to the horizontal plane of the inclined surface within the minute range when a minute range of 0.5 μm width is taken at an arbitrary position on the inner surface of the concave portion 4. Angle θ with respect to The sign of the angle θ defines, for example, the right slope in FIG. 8 as positive and the left slope in FIG. 8 as negative with respect to the normal line on the reflector surface.

【0011】また、本発明の反射体形成用母型の製造方
法は、母型用基材の表面に先端が球面状の圧子を押圧
し、母型用基材表面における圧子の位置を変えながらこ
の圧子による押圧を繰り返すことにより、母型用基材の
型面にその内面が球面の一部をなす多数の凹部を連続し
て形成し、その際に圧子の押圧深さおよび移動ピッチを
制御することにより凹部の深さを0.6μmないし1.
2μmの範囲とし、凹部内面の傾斜角分布を−8度ない
し+8度の範囲とし、隣接する凹部のピッチを26.5
μmないし33.5μmの範囲とし、これら凹部を形成
した母型用基材を反射体形成用母型とすることを特徴と
するものである。
In the method of manufacturing a reflector forming mother die of the present invention, the indenter having a spherical tip is pressed against the surface of the mother substrate to change the position of the indenter on the surface of the mother substrate. By repeating the pressing with the indenter, a large number of concave portions whose inner surface forms a part of a spherical surface are continuously formed on the mold surface of the base material for the matrix, and at that time, the pressing depth and the moving pitch of the indenter are controlled. By doing so, the depth of the concave portion is set to 0.6 μm to 1.
2 μm, the inclination angle distribution of the inner surface of the concave portion is in a range of −8 degrees to +8 degrees, and the pitch of the adjacent concave portions is 26.5.
It is characterized in that it is in the range of μm to 33.5 μm, and the base material for the matrix having these recesses formed therein is a matrix for forming a reflector.

【0012】すなわち、本発明の反射体形成用母型の製
造方法は、転造装置を用いて母型用基材の表面に先端が
球面状の圧子を押圧することで、内面が球面の一部をな
す多数の凹部を転造した反射体形成用母型を製造すると
いうものである。ここで用いる圧子は、黄銅、ステンレ
ス、工具鋼等の比較的硬度の高い金属材料からなる母型
用基材の表面を極めて多数回押圧するものであるから、
例えばダイヤモンド等、高い硬度の材料からなる圧子を
用いることが望ましい。また、転造装置は多数の凹部を
連続的に形成するために母型用基材表面における圧子の
位置を変えながら押圧を繰り返すが、その場合、母型用
基材と圧子が相対的に水平面内で移動すればよいのであ
るから、母型用基材と圧子のいずれが移動する構成であ
ってもよい。
That is, in the method for manufacturing a reflector forming master according to the present invention, the indenter having a spherical tip is pressed against the surface of the base material for the base using a rolling device, so that the inner surface is formed into a spherical surface. This is to manufacture a reflector forming matrix in which a number of concave portions are rolled. The indenter used here is one that presses the surface of the matrix base material made of a relatively high-hardness metal material such as brass, stainless steel, tool steel, etc. extremely many times,
For example, it is desirable to use an indenter made of a material having high hardness such as diamond. Further, the rolling device repeats pressing while changing the position of the indenter on the surface of the matrix base material in order to form a large number of recesses continuously, in which case the matrix base material and the indenter are relatively horizontal. Since it is only necessary to move the inside of the base member, any of the matrix base and the indenter may be moved.

【0013】また、上記凹部を形成する際には、転造装
置において圧子の上下動の距離、母型用基材と圧子との
相対移動距離、圧子の先端の径等を調整することによ
り、形成する凹部の深さを0.6ないし1.2μmの範
囲でランダムに形成し、隣接する凹部のピッチを26.
5ないし33.5μmの範囲でランダムに配置し、凹部
内面の傾斜角分布を−8ないし+8度の範囲に設定する
必要がある。
When forming the recess, the rolling device adjusts the vertical movement distance of the indenter, the relative movement distance between the matrix base material and the indenter, the diameter of the tip of the indenter, and the like. The depth of the recesses to be formed is randomly formed in the range of 0.6 to 1.2 μm, and the pitch between adjacent recesses is 26.
It is necessary to arrange them randomly in the range of 5 to 33.5 μm and set the inclination angle distribution of the inner surface of the concave portion in the range of −8 to +8 degrees.

【0014】次に、本発明の反射体は、表面に内面が球
面の一部をなす多数の凹部が連続して形成され、上記凹
部の深さが0.6μmないし1.2μmの範囲にあり、
凹部内面の傾斜角分布が−8度ないし+8度の範囲にあ
り、隣接する凹部のピッチが26.5μmないし33.
5μmの範囲にあることを特徴とするものである。この
反射体は、上記反射体形成用母型を用いて後述する製造
方法により作製することができる。特に、傾斜角分布を
−8ないし+8度の範囲に設定する点が重要である。な
ぜならば、凹部内面の傾斜角分布が−8度ないし+8度
の範囲を超えると、反射光の拡散角が広がりすぎて反射
強度が低下し、明るい反射板が得られない(反射光の拡
散角がエアー中で36度以上になり、液晶表示装置内部
の反射強度ピークが低下し、全反射ロスが大きくなる)
からである。また、凹部の深さに関しては、0.6μm
より浅くなると正反射が強くなり過ぎ、1.2μmより
深くなると後工程で平坦化が難しくなる。凹部のピッチ
に関しては、26.5μmより小さくなると反射体形成
用母型の製作時間が長く掛かり、33.5μmより大き
くなると凹部の形状が目視で視認され、反射体の品質が
低下する。
Next, in the reflector of the present invention, a large number of concave portions whose inner surface forms a part of a spherical surface are continuously formed on the surface, and the depth of the concave portions is in a range of 0.6 μm to 1.2 μm. ,
The inclination angle distribution of the inner surface of the concave portion is in the range of -8 degrees to +8 degrees, and the pitch of the adjacent concave portions is 26.5 µm to 33.
It is characterized by being in the range of 5 μm. This reflector can be manufactured by a manufacturing method described later using the above-mentioned reflector forming matrix. In particular, it is important to set the inclination angle distribution in the range of -8 to +8 degrees. This is because, when the inclination angle distribution of the inner surface of the concave portion exceeds the range of -8 degrees to +8 degrees, the diffusion angle of the reflected light becomes too wide, the reflection intensity decreases, and a bright reflector cannot be obtained (the diffusion angle of the reflected light). Becomes 36 degrees or more in air, the reflection intensity peak inside the liquid crystal display device decreases, and the total reflection loss increases.)
Because. Also, regarding the depth of the recess, 0.6 μm
If the depth is smaller, the regular reflection becomes too strong. With respect to the pitch of the concave portions, if the pitch is smaller than 26.5 μm, it takes a long time to fabricate the reflector forming matrix. If the pitch is larger than 33.5 μm, the shape of the concave portion is visually recognized, and the quality of the reflector deteriorates.

【0015】また、本発明の反射体の製造方法は、上記
反射体形成用母型の凹部を形成した型面の凹凸形状を反
対にした型面を持つ転写型を形成し、この転写型の型面
を反射体用基材の表面に転写し、ついで、反射体用基材
表面の凹凸上に反射膜を形成し、これを反射体とするこ
とを特徴とするものである。
In the method for manufacturing a reflector according to the present invention, a transfer mold having a mold surface having a shape opposite to that of the concave and convex portions of the concave portion of the reflector forming master mold is formed. The mold surface is transferred to the surface of the reflector base material, and then a reflection film is formed on the unevenness of the reflector base material surface, and this is used as a reflector.

【0016】すなわち、本方法により得られた反射体の
表面は、転写型を介して反射体形成用母型の型面がその
まま反映され、内面が球面の一部をなす多数の凹部が形
成された状態となる。したがって、反射光の反射角を支
配すると考えられる反射体の凹部内面の傾斜角(微小な
単位面積内での傾斜角)がある角度範囲内で一定の分布
を示すようになる。しかも、凹部内面が球面状であるこ
とから、その一定の傾斜角分布が反射体におけるある特
定の方向だけでなく、全方向にわたって実現される。し
たがって、この反射体においては、全方向にわたって一
様に高い反射効率が得られ、種々の波長を持つ光をバラ
ンス良く反射することができる。すなわち、従来の反射
体に比べて、どの方向から見てもより明るく白い反射板
を実現することができる。
That is, the surface of the reflector obtained by the present method reflects the mold surface of the reflector forming mother die as it is via the transfer mold, and a number of concave portions whose inner surface forms a part of a spherical surface are formed. State. Accordingly, the inclination angle (the inclination angle in a minute unit area) of the inner surface of the concave portion of the reflector, which is considered to dominate the reflection angle of the reflected light, exhibits a certain distribution within a certain angle range. Moreover, since the inner surface of the concave portion is spherical, the constant inclination angle distribution is realized not only in a specific direction but also in all directions in the reflector. Therefore, in this reflector, high reflection efficiency is obtained uniformly in all directions, and light having various wavelengths can be reflected in a well-balanced manner. That is, it is possible to realize a brighter and whiter reflector when viewed from any direction as compared with the conventional reflector.

【0017】また、本発明の反射型液晶表示装置は、上
記のような反射体、すなわち反射体表面にその内面が球
面の一部をなす凹部が多数形成され、凹部の深さが0.
6μmないし1.2μmの範囲にあり、凹部内面の傾斜
角分布が−8度ないし+8度の範囲にあり、隣接する凹
部のピッチが26.5μmないし33.5μmの範囲に
ある反射体を用いることを特徴とするものである。な
お、反射体の設置形態としては、液晶セルの外側に設置
する外付け型または液晶セルを構成する基板の内面に設
置する内蔵型のいずれのタイプとしてもよい。
Further, in the reflection type liquid crystal display device of the present invention, a large number of recesses whose inner surfaces form a part of a spherical surface are formed on the reflector, that is, the reflector surface, and the depth of the recess is 0.1 mm.
A reflector having a range of 6 μm to 1.2 μm, an inclination angle distribution of the inner surface of the recess in a range of −8 ° to + 8 °, and a pitch of adjacent recesses in a range of 26.5 μm to 33.5 μm is used. It is characterized by the following. The reflector may be installed in either an external type installed outside the liquid crystal cell or a built-in type installed on the inner surface of a substrate constituting the liquid crystal cell.

【0018】本発明の反射型液晶表示装置の製造方法に
よれば、反射体自体が全方向にわたって反射効率が高
く、種々の波長を持つ光をバランス良く反射するという
特性を持っているため、従来の反射型液晶表示装置に比
べてより明るい表示面を有する反射型液晶表示装置を提
供することができる。
According to the method for manufacturing a reflection type liquid crystal display device of the present invention, the reflector itself has high reflection efficiency in all directions and has characteristics of reflecting light having various wavelengths in a well-balanced manner. It is possible to provide a reflective liquid crystal display device having a brighter display surface than the reflective liquid crystal display device.

【0019】[0019]

【発明の実施の形態】以下、本発明の一実施の形態を図
1ないし図7を参照して説明する。図1は本実施の形態
の反射体を示す図である。図1に示すように、この反射
体1は、例えばガラス等からなる基板2上に設けられた
感光性樹脂層等からなる平板状の樹脂基材3(反射体用
基材)の表面に、その内面が球面の一部をなす多数の凹
部4が重なり合うように連続して形成され、その上に例
えばアルミニウムや銀等の薄膜からなる反射膜5が蒸着
または印刷等により形成されたものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a diagram showing a reflector according to the present embodiment. As shown in FIG. 1, the reflector 1 is provided on a surface of a flat resin substrate 3 (substrate for reflector) made of a photosensitive resin layer or the like provided on a substrate 2 made of, for example, glass. The inner surface is formed continuously so that a number of concave portions 4 forming a part of a spherical surface overlap, and a reflective film 5 made of a thin film of, for example, aluminum or silver is formed thereon by vapor deposition or printing. .

【0020】上記凹部4の深さを0.6ないし1.2μ
mの範囲でランダムに形成し、隣接する凹部4のピッチ
を26.5ないし33.5μmの範囲でランダムに配置
し、上記凹部4内面の傾斜角分布を−8ないし+8度の
範囲に設定することが望ましい。特に、傾斜角分布を−
8ないし+8度の範囲に設定することが必要である。な
ぜならば、凹部内面の傾斜角分布が−8度ないし+8度
の範囲を超えると、反射光の拡散角が広がりすぎて反射
強度が低下し、明るい反射板が得られない(反射光の拡
散角がエアー中で36度以上になり、液晶表示装置内部
の反射強度ピークが低下し、全反射ロスが大きくなる)
からである。また、凹部の深さに関しては、0.6μm
より浅くなると正反射が強くなり過ぎ、1.2μmより
深くなると後工程で平坦化が難しくなる。凹部のピッチ
に関しては、26.5μmより小さくなると反射体形成
用母型の製作時間が長く掛かり、33.5μmより大き
くなると凹部の形状が目視で視認され、反射体の品質が
低下する。
The depth of the recess 4 is set to 0.6 to 1.2 μm.
m, the pitch of the adjacent recesses 4 is randomly arranged in the range of 26.5 to 33.5 μm, and the inclination angle distribution of the inner surface of the recesses 4 is set in the range of -8 to +8 degrees. It is desirable. In particular, the inclination angle distribution
It is necessary to set in the range of 8 to +8 degrees. This is because, when the inclination angle distribution of the inner surface of the concave portion exceeds the range of -8 degrees to +8 degrees, the diffusion angle of the reflected light becomes too wide, the reflection intensity decreases, and a bright reflector cannot be obtained (the diffusion angle of the reflected light). Becomes 36 degrees or more in air, the reflection intensity peak inside the liquid crystal display device decreases, and the total reflection loss increases.)
Because. Also, regarding the depth of the recess, 0.6 μm
When it is shallower, the regular reflection becomes too strong, and when it is deeper than 1.2 μm, it becomes difficult to planarize in a later step. With respect to the pitch of the concave portions, if the pitch is smaller than 26.5 μm, it takes a long time to manufacture the reflector forming matrix. If the pitch is larger than 33.5 μm, the shape of the concave portion is visually recognized and the quality of the reflector is deteriorated.

【0021】次に、上記構成の反射体の製造方法を図2
ないし図5を用いて説明する。反射体を製造するにあた
って、最初に、反射体の原版となる反射体形成用母型を
作成する。その方法についてまず説明する。図2(a)
に示すように、例えば黄銅、ステンレス、工具鋼等から
なる表面が平坦な平板状の母型用基材7を転造装置のテ
ーブル上に固定する。そして、先端が所定の径Rを持つ
球面形状のダイヤモンド圧子8で母型用基材7の表面を
押圧し、母型用基材7を水平方向に移動させてはダイヤ
モンド圧子8を上下動させて押圧するという操作を多数
回繰り返すことにより、深さや配列ピッチが異なる多数
の凹部7aを母型用基材7の表面に転造し、図2(b)
に示すような反射体形成用母型9とする。図3に示すよ
うに、ここで用いる転造装置は、母型用基材7を固定す
るテーブルが0.1μmの分解能で水平面内のX方向、
Y方向に移動し、ダイヤモンド圧子8が1μmの分解能
で鉛直方向(Z方向)に移動する機能を持つものであ
る。なお、ダイヤモンド圧子8の先端の径Rは、例えば
135μm程度のものを用いるとよい。
Next, a method of manufacturing the reflector having the above-described structure will be described with reference to FIG.
This will be described with reference to FIG. In manufacturing the reflector, first, a master for forming a reflector, which is an original plate of the reflector, is prepared. The method will be described first. FIG. 2 (a)
As shown in (1), a flat plate-shaped base material 7 made of, for example, brass, stainless steel, tool steel, or the like is fixed on a table of a rolling device. Then, the surface of the matrix substrate 7 is pressed by a spherical diamond indenter 8 having a predetermined diameter R at the tip, and the matrix substrate 7 is moved in the horizontal direction, and the diamond indenter 8 is moved up and down. By repeatedly performing the pressing and pressing operation a number of times, a large number of recesses 7a having different depths and arrangement pitches are rolled on the surface of the base material 7 for a matrix, and FIG.
And a matrix 9 for forming a reflector as shown in FIG. As shown in FIG. 3, the rolling device used here has a table for fixing the matrix base material 7 with a resolution of 0.1 μm in the X direction in the horizontal plane.
It has a function of moving in the Y direction and moving the diamond indenter 8 in the vertical direction (Z direction) with a resolution of 1 μm. The diameter R of the tip of the diamond indenter 8 may be, for example, about 135 μm.

【0022】また、ダイヤモンド圧子による転造の手順
は次の通りである。図4は転造のパターンを示す平面図
であるが、この図に示すように、横一行において隣接す
る凹部のピッチは、上から数えて1行目、3行目、…と
いうように奇数行目では左端から順にt1( =33.5
μm)、t2(=30μm)、t3(=26.5μm)、
t2 の繰り返しとなっている。また、上から数えて2行
目、4行目、…というように偶数行目では左端から順に
t2、t1、t2、t3の繰り返しとなっており、奇数行目
の凹部の位置と偶数行目の凹部の位置は横方向に凹部の
径の半分程度ずれている。また、縦方向における行間の
ピッチは、上から順にs3(=17μm)、s2(=19
μm)、s2、s1(=20μm)の繰り返しとなってい
る。そして、凹部の深さを0.6ないし1.2μmの範
囲で4種類設定して(図中d1、d2、d3、d4 と示す
)押圧することにより、押圧後の圧痕である円形の凹
部の半径もr1、r2、r3、r4の4種類となる。例えば
最上行における凹部の深さは、左端から順にd1、d2、
d3、d4、d1、d2、d3、d4、d1 となる。
The procedure of rolling with a diamond indenter is as follows. FIG. 4 is a plan view showing a rolling pattern. As shown in FIG. 4, the pitches of the adjacent concave portions in one horizontal row are odd rows such as the first row, the third row,. In the eyes, t1 (= 33.5) in order from the left end
μm), t2 (= 30 μm), t3 (= 26.5 μm),
This is the repetition of t2. .., T2, t2, and t3 are repeated in order from the left end in the even-numbered row, such as the second row, the fourth row, and so on, counting from the top. The positions of the concave portions are shifted by about half the diameter of the concave portions in the lateral direction. The pitch between rows in the vertical direction is s3 (= 17 μm) and s2 (= 19
μm), s2, and s1 (= 20 μm). Then, by setting four kinds of depths of the concave portions in the range of 0.6 to 1.2 μm (indicated as d1, d2, d3 and d4 in the figure) and pressing, the circular concave portions which are the indentations after pressing are formed. There are also four types of radii, r1, r2, r3, and r4. For example, the depth of the concave portion in the top row is d1, d2,
d3, d4, d1, d2, d3, d4, d1.

【0023】また、実際の転造の順番としては、例え
ば、最上行において左端から右端に向けて順に凹部を形
成した後、上から2行目、3行目、…と同様の操作を繰
り返せばよい。もしくは、左端の凹部を上から下に向け
て順に形成した後、左から2列目、3列目、…と同様の
操作を繰り返してもよい。このようにして、パターン内
の全ての凹部を形成していく。なお、理想的には凹部の
深さやピッチが全くランダムに配列されることが望まし
いが、それは製造技術上困難であるため、このようなパ
ターンの繰り返しにより反射体全体が構成されることに
なる。この繰り返し周期は150μm以上あることが望
ましく、周期が長い方がよい。また、図4に示したよう
に、隣接する凹部の圧痕は一部重なるため、転造作業が
全て終わった後の凹部全体の平面形状は図5に示すよう
になる。このようにして、反射体形成用母型9が完成す
る。以降、反射体を製造する際にはこの母型9を繰り返
し使用して多数の反射体を製造することができる。
For the actual rolling order, for example, after forming concave portions in order from the left end to the right end in the uppermost row, the same operation as the second row, the third row,... Good. Alternatively, after forming the concave portion at the left end in order from top to bottom, the same operation as the second column, third column,... From the left may be repeated. Thus, all the concave portions in the pattern are formed. Ideally, it is desirable that the depths and pitches of the concave portions are arranged completely at random. However, since it is difficult in terms of manufacturing technology, the entire reflector is formed by repeating such a pattern. This repetition period is desirably 150 μm or more, and the longer the period, the better. Further, as shown in FIG. 4, since the indentations of the adjacent concave portions partially overlap, the planar shape of the entire concave portion after all the rolling operations are completed is as shown in FIG. Thus, the reflector forming matrix 9 is completed. Thereafter, when manufacturing a reflector, a large number of reflectors can be manufactured by repeatedly using the matrix 9.

【0024】なお、上記転造装置の場合、母型用基材を
固定したテーブルが水平面内で移動する構成であるが、
母型用基材表面におけるダイヤモンド圧子の位置が移動
しさえすればよいのであるから、圧子側が水平方向に移
動する構成であってもよい。また、母型用基材の材料と
しては、黄銅、ステンレス、工具鋼等に限らず、硬度の
高い種々の金属材料を用いることが可能である。また、
その母型用基材を押圧する圧子も、高い硬度の材料から
なるものであればダイヤモンドに限ることはない。
In the case of the above-described rolling device, the table on which the base material for the matrix is fixed moves in a horizontal plane.
It is only necessary to move the position of the diamond indenter on the surface of the matrix substrate, so that the indenter side may move in the horizontal direction. The material of the base material for the matrix is not limited to brass, stainless steel, tool steel, and the like, and various metal materials having high hardness can be used. Also,
The indenter that presses the matrix substrate is not limited to diamond as long as it is made of a material having high hardness.

【0025】その後、図2(c)に示すように、母型9
を箱形容器10に収納、配置し、容器10に例えばシリ
コーンなどの樹脂材料11を流し込んで、常温にて放
置、硬化させ、この硬化した樹脂製品を容器10から取
り出して不要な部分を切除し、図2(d)に示すよう
に、母型9の型面をなす多数の凹部と逆の凹凸形状であ
る多数の凸部を持つ型面12aを有する転写型12を作
成する。
Thereafter, as shown in FIG.
Is placed and placed in a box-shaped container 10, a resin material 11 such as silicone is poured into the container 10, left to cure at room temperature, and the cured resin product is taken out of the container 10 and unnecessary portions are cut off. As shown in FIG. 2D, a transfer mold 12 having a mold surface 12a having a large number of concave portions forming the mold surface of the matrix 9 and a large number of convex portions having the opposite concave and convex shape is formed.

【0026】次に、ガラス基板の上面に、アクリル系レ
ジスト、ポリスチレン系レジスト、アジドゴム系レジス
ト、イミド系レジスト等の感光性樹脂液をスピンコート
法、スクリーン印刷法、吹き付け法等の塗布法により塗
布する。そして、塗布終了後、加熱炉またはホットプレ
ート等の加熱装置を用いて基板上の感光性樹脂液を例え
ば80〜100℃の温度範囲で1分以上加熱するプリベ
ークを行って基板上に感光性樹脂層を形成する。ただ
し、用いる感光性樹脂の種類によってプリベーク条件は
異なるため、上記範囲外の温度と時間で処理してもよい
ことは勿論である。なお、ここで形成する感光性樹脂層
の膜厚は2〜5μmの範囲とすることが好ましい。
Next, a photosensitive resin liquid such as an acrylic resist, a polystyrene resist, an azide rubber resist, or an imide resist is applied on the upper surface of the glass substrate by a coating method such as spin coating, screen printing, or spraying. I do. After completion of the coating, the photosensitive resin liquid on the substrate is prebaked by using a heating device such as a heating furnace or a hot plate in a temperature range of, for example, 80 to 100 ° C. for 1 minute or more. Form a layer. However, since the pre-bake conditions differ depending on the type of the photosensitive resin used, it is needless to say that the treatment may be performed at a temperature and a time outside the above range. The thickness of the photosensitive resin layer formed here is preferably in the range of 2 to 5 μm.

【0027】その後、図2(e)に示すように、図2
(d)に示した転写型12を用い、この転写型12の型
面12aをガラス基板上の感光性樹脂層3に一定時間押
し付けた後、転写型12を感光性樹脂層3から外す。こ
のようにして、図2(f)に示すように、感光性樹脂層
3の表面に転写型型面12aの凸部を転写して多数の凹
部4を形成する。また、型押し時のプレス圧は用いる感
光性樹脂の種類にあった値を選択することが好ましく、
例えば30〜50kg/cm2 程度の圧力とするのがよ
い。プレス時間についても用いる感光性樹脂の種類にあ
った値を選択することが好ましく、例えば30秒〜10
分程度の時間とする。
Thereafter, as shown in FIG.
After using the transfer mold 12 shown in (d) and pressing the mold surface 12a of the transfer mold 12 against the photosensitive resin layer 3 on the glass substrate for a predetermined time, the transfer mold 12 is removed from the photosensitive resin layer 3. In this way, as shown in FIG. 2 (f), the convex portions of the transfer mold surface 12a are transferred to the surface of the photosensitive resin layer 3 to form a large number of concave portions 4. Further, it is preferable to select a value corresponding to the type of the photosensitive resin to be used for the pressing pressure at the time of embossing,
For example, the pressure is preferably about 30 to 50 kg / cm 2 . It is preferable to select a value corresponding to the type of the photosensitive resin to be used for the pressing time, for example, 30 seconds to 10 seconds.
It takes about a minute.

【0028】その後、透明なガラス基板の裏面側から感
光性樹脂層3を硬化させるための紫外線(g、h、i
線)等の光線を照射し、感光性樹脂層3を硬化させる。
ここで照射する紫外線等の光線は、上記種類の感光性樹
脂層の場合、50mJ/cm2以上の強度であれば感光
性樹脂層を硬化させるのに充分であるが、感光性樹脂層
の種類によってはこれ以外の強度で照射してもよいこと
は勿論である。そして、プリベークで用いたのと同様の
加熱炉、ホットプレート等の加熱装置を用いてガラス基
板上の感光性樹脂層3を例えば240℃程度で1分以上
加熱するポストベークを行ってガラス基板上の感光性樹
脂層3を焼成する。
Thereafter, ultraviolet rays (g, h, i) for curing the photosensitive resin layer 3 from the back side of the transparent glass substrate.
The photosensitive resin layer 3 is cured by irradiating a light beam such as a line).
In the case of a photosensitive resin layer of the above type, the intensity of 50 mJ / cm 2 or more is sufficient to cure the photosensitive resin layer. It is needless to say that the irradiation may be performed at other intensity depending on the case. Then, the photosensitive resin layer 3 on the glass substrate is post-baked by heating the photosensitive resin layer 3 on the glass substrate at, for example, about 240 ° C. for 1 minute or more by using a heating device such as a heating furnace or a hot plate used in the pre-baking. Is baked.

【0029】最後に、感光性樹脂層3の表面に例えばア
ルミニウムをエレクトロンビーム蒸着等によって成膜し
て凹部の表面に沿って反射膜1を形成することにより、
本実施の形態の反射体1が完成する。
Finally, for example, aluminum is formed on the surface of the photosensitive resin layer 3 by electron beam evaporation or the like, and the reflection film 1 is formed along the surface of the concave portion.
The reflector 1 of the present embodiment is completed.

【0030】本実施の形態の製造方法により得られた反
射体1においては、内面が球面の一部である多数の凹部
4が表面に形成され、しかも凹部4の深さ、隣接する凹
部4のピッチ等の値が上記の範囲に設定されたことによ
り、凹部内面の傾斜角がある角度範囲で一定の分布を示
すようになる。図6はこの反射体1における凹部内面の
傾斜角の分布を実際に測定した結果を示すものであり、
横軸は傾斜角、縦軸はその傾斜角が存在する頻度を示し
ている。この図に示すように、傾斜角は−8ないし+8
度の範囲、特に−4ないし+5度の範囲においてほぼ一
定の分布を示している。また、凹部4の内面は球面であ
り、全方向に対して対称形であるから、この一定の傾斜
角分布は、反射体におけるある特定の方向だけでなく、
全方向にわたって実現される。凹部内面の傾斜角はその
凹部内面における反射光の反射角を支配すると考えら
れ、本実施の形態の場合、反射体の全方向に対して傾斜
角分布が一定であることから、全方向に対して一様な反
射角および反射効率が得られることになり、種々の波長
を持つ光をバランス良く反射することができる。すなわ
ち、従来の反射体に比べて、どの方向から見てもより明
るく白い反射板を実現することができる。
In the reflector 1 obtained by the manufacturing method of the present embodiment, a large number of recesses 4 whose inner surfaces are part of a spherical surface are formed on the surface, and the depth of the recess 4 and the depth of the adjacent recess 4 By setting the value of the pitch or the like in the above range, the inclination of the inner surface of the concave portion shows a constant distribution in a certain angle range. FIG. 6 shows the result of actually measuring the distribution of the inclination angle of the inner surface of the concave portion of the reflector 1.
The horizontal axis indicates the inclination angle, and the vertical axis indicates the frequency at which the inclination angle exists. As shown in this figure, the inclination angle is -8 to +8.
It shows a substantially constant distribution in the range of degrees, especially in the range of -4 to +5 degrees. Further, since the inner surface of the concave portion 4 is spherical and symmetrical with respect to all directions, this constant inclination angle distribution is not only in a specific direction in the reflector, but also in a certain direction.
Realized in all directions. It is considered that the inclination angle of the inner surface of the concave portion governs the reflection angle of the reflected light on the inner surface of the concave portion. In the case of this embodiment, since the inclination angle distribution is constant in all directions of the reflector, As a result, uniform reflection angles and reflection efficiencies can be obtained, and light having various wavelengths can be reflected in a well-balanced manner. That is, it is possible to realize a brighter and whiter reflector when viewed from any direction as compared with the conventional reflector.

【0031】また、本実施の形態の反射体形成用母型の
製造方法においては、凹部を形成する際にダイヤモンド
圧子8を上下動させて母型用基材7の表面を押圧するだ
けであるから、ダイヤモンド圧子8と母型用基材7が擦
れ合うようなことがない。その結果、ダイヤモンド圧子
8先端の表面状態が母型9側に確実に転写され、圧子8
の先端を鏡面状態としておけば母型9の凹部内面、ひい
ては反射体の凹部内面も容易に鏡面状態とすることがで
きる。さらに、ポリエステル等の樹脂フィルムを加熱す
ることで凹凸面を形成していた従来の反射体と異なり、
本実施の形態の反射体1における凹部の深さ、径、ピッ
チ等の寸法、凹部内面の表面状態等は全て制御されたも
のであり、高精度の転造装置の使用により反射板の凹部
形状をほぼ設計通りに作成することができる。したがっ
て、本方法によれば、作成する反射板の反射角度、反射
効率等の反射特性が従来に比べてより制御しやすいもの
となり、所望の反射体を得ることができる。
In the method of manufacturing the reflector forming die according to the present embodiment, the diamond indenter 8 is moved up and down to press the surface of the substrate 7 for forming the concave portion. Therefore, the diamond indenter 8 does not rub against the base material 7 for a matrix. As a result, the surface state of the tip of the diamond indenter 8 is reliably transferred to the matrix 9 side, and the indenter 8
If the tip of the mirror is mirror-finished, the inner surface of the concave portion of the matrix 9 and, consequently, the inner surface of the concave portion of the reflector can be easily mirror-finished. Furthermore, unlike conventional reflectors that have formed an uneven surface by heating a resin film such as polyester,
The depth, diameter, pitch, and other dimensions of the recess in the reflector 1 of the present embodiment, the surface condition of the inner surface of the recess, and the like are all controlled, and the concave shape of the reflector is increased by using a high-precision rolling device. Can be created almost as designed. Therefore, according to the present method, the reflection characteristics such as the reflection angle and the reflection efficiency of the reflection plate to be produced become easier to control than in the past, and a desired reflector can be obtained.

【0032】なお、本実施の形態における反射体1の凹
部4の深さ、径、ピッチ等の具体的な数値や図4に示し
た凹部の転造パターンはほんの一例に過ぎず、適宜設計
変更が可能なことは勿論である。また、反射体用基材、
母型用基材等の各種基材の材料、転写型の構成材料等に
関しても適宜変更が可能である。
It should be noted that specific numerical values such as the depth, diameter, pitch and the like of the concave portion 4 of the reflector 1 in the present embodiment and the rolling pattern of the concave portion shown in FIG. Is of course possible. Also, a substrate for a reflector,
The materials of various base materials such as the base material for the matrix, the constituent materials of the transfer mold, and the like can be appropriately changed.

【0033】次に、上記の反射体を備えたSTN(Supe
r Twisted Nematic )方式の反射型液晶表示装置につい
て説明する。図7に示すように、この反射型液晶表示装
置は、例えば厚さ0.7mmの一対の表示側ガラス基板
13と背面側ガラス基板14との間に液晶層15が設け
られ、表示側ガラス基板13の上面側にポリカーボネー
ト樹脂やポリアリレート樹脂等からなる1枚の位相差板
16が設けられ、さらに位相差板16の上面側に第1の
偏光板17が配設されている。また、背面側ガラス基板
14の下面側には、第2の偏光板18、上記方法により
予め製造しておいた図1に示した反射体1が順次設けら
れている。
Next, an STN (Supe) equipped with the above-mentioned reflector is used.
r Twisted Nematic) type reflective liquid crystal display device will be described. As shown in FIG. 7, this reflection type liquid crystal display device has a liquid crystal layer 15 provided between a pair of display side glass substrates 13 and a rear side glass substrate 14 having a thickness of, for example, 0.7 mm. One phase difference plate 16 made of a polycarbonate resin, a polyarylate resin, or the like is provided on the upper surface side of 13, and a first polarizing plate 17 is provided on the upper surface side of the phase difference plate 16. On the lower surface side of the rear glass substrate 14, a second polarizing plate 18 and the reflector 1 shown in FIG. 1 manufactured in advance by the above-described method are sequentially provided.

【0034】反射体1は、第2の偏光板18の下面側に
凹部4を形成した面が対向するように取り付けられ、第
2の偏光板18と反射体1との間にはグリセリン等の光
の屈折率に悪影響を与えることのない材料からなる粘着
体19が充填される。両ガラス基板13、14の対向面
側にはITO(インジウムスズ酸化物)等からなる透明
電極層20、21がそれぞれ形成され、透明電極層2
0、21上にポリイミド樹脂等からなる配向膜22、2
3がそれぞれ設けられている。これら配向膜22、23
の関係により液晶層15中の液晶は240度捻れた配置
となっている。
The reflector 1 is mounted on the lower surface side of the second polarizing plate 18 such that the surfaces on which the recesses 4 are formed face each other, and a gap between the second polarizing plate 18 and the reflector 1 such as glycerin is provided. An adhesive 19 made of a material that does not adversely affect the refractive index of light is filled. Transparent electrode layers 20 and 21 made of ITO (indium tin oxide) or the like are formed on the facing surfaces of the two glass substrates 13 and 14, respectively.
Alignment films 22 and 2 made of polyimide resin or the like on 0 and 21
3 are provided. These alignment films 22 and 23
The liquid crystal in the liquid crystal layer 15 is arranged to be twisted by 240 degrees due to the relationship (1).

【0035】また、前記背面側ガラス基板14と透明電
極層21との間に、図示していないカラーフィルタを印
刷等で形成することにより、この液晶表示装置をカラー
表示できるようにしてもよい。
Further, a color filter (not shown) may be formed between the rear glass substrate 14 and the transparent electrode layer 21 by printing or the like, so that the liquid crystal display device can perform color display.

【0036】本実施の形態の製造方法により得られた反
射型液晶表示装置においては、上述したように、使用す
る反射体1自体が全方向にわたって入射光の反射角度が
広く、反射効率が高いという特性を持っているため、使
用者が表示面をいずれの方向から見た場合においても、
従来の液晶表示装置に比べて明るい表示面を有する液晶
表示装置を提供することができる。
In the reflection type liquid crystal display device obtained by the manufacturing method of the present embodiment, as described above, the reflector 1 used has a wide reflection angle of incident light in all directions and a high reflection efficiency. Due to its characteristics, even if the user sees the display surface from any direction,
A liquid crystal display device having a brighter display surface than a conventional liquid crystal display device can be provided.

【0037】なお、本実施の形態の方法では、反射板を
第2の偏光板の外側に配設する、いわゆる外付けの反射
板とする例を説明したが、背面側ガラス基板の対向面側
に配設して内蔵型としてもよい。また、液晶表示装置の
例としてSTN方式のもので説明したが、液晶層の液晶
分子の捻れ角を90度に設定したTN(Twisted Nemati
c )方式の液晶表示装置にも本発明の反射体を適用し得
ることは勿論である。
In the method of the present embodiment, an example has been described in which the reflection plate is provided outside the second polarizing plate, that is, a so-called external reflection plate. And may be built-in type. In addition, although the description has been given of the STN mode as an example of the liquid crystal display device, a TN (Twisted Nemati) in which the twist angle of the liquid crystal molecules of the liquid crystal layer is set to 90 degrees.
Of course, the reflector of the present invention can be applied to the liquid crystal display device of the c) type.

【0038】[0038]

【発明の効果】以上、詳細に説明したように、本発明の
反射体においては、内面が球面の一部である多数の凹部
が表面に形成され、凹部の深さやピッチが一定の範囲内
に制御されたことにより、反射体の全方向に対して凹部
内面の傾斜角分布が−8度ないし+8度の角度範囲でほ
ぼ一定となるため、全方向に対して一様な反射効率が得
られ、種々の波長を持つ光をバランス良く反射すること
ができる。すなわち、本製造方法によれば、従来の反射
体に比べてどの方向から見てもより明るく白い反射板を
実現することができる。また、反射体形成用母型の製造
方法においては、凹部を形成する際に圧子を用いて母型
用基材の表面を押圧するだけであり、圧子と母型用基材
が擦れ合うようなことがない。その結果、圧子先端の表
面状態が母型側に確実に転写され、例えば圧子の先端を
鏡面状態としておけば母型の凹部内面、ひいては反射体
の凹部内面も容易に鏡面状態とすることができる。さら
に、従来の反射体と異なり、本発明による反射体の凹部
の深さ、径、ピッチ等の寸法、凹部内面の表面状態等は
全て制御されたものであり、反射板の凹部形状をほぼ設
計通りに作成することができる。したがって、本方法に
より得られた反射体形成用母型を用いれば、作成する反
射板の反射角度、反射効率等の反射特性が従来に比べて
より制御しやすいものとなり、所望の反射体を得ること
ができる。そして、本発明の反射型液晶表示装置によれ
ば、上記のような優れた特性を持つ反射体を用いること
により、より明るく白い表示面を有する液晶表示装置を
実現することができる。
As described above in detail, in the reflector of the present invention, a large number of concave portions whose inner surfaces are part of a spherical surface are formed on the surface, and the depth and pitch of the concave portions are within a certain range. By the control, the inclination angle distribution of the inner surface of the concave portion becomes almost constant in the angle range of -8 degrees to +8 degrees with respect to all directions of the reflector, so that uniform reflection efficiency can be obtained in all directions. And light having various wavelengths can be reflected in a well-balanced manner. That is, according to the present manufacturing method, it is possible to realize a brighter and whiter reflector when viewed from any direction as compared with the conventional reflector. In addition, in the method of manufacturing a reflector forming master, it is only necessary to press the surface of the master base using an indenter when forming the concave portion, so that the indenter and the master base are rubbed. There is no. As a result, the surface state of the tip of the indenter is reliably transferred to the matrix side. For example, if the tip of the indenter is set to the mirror state, the inner surface of the concave portion of the mother mold, and eventually the inner surface of the concave portion of the reflector can be easily made to the mirror surface state. . Further, unlike the conventional reflector, the depth, diameter, pitch, and other dimensions of the recess of the reflector according to the present invention, the surface condition of the inner surface of the recess, and the like are all controlled, and the recess shape of the reflector is almost designed. Can be created as street. Therefore, using the reflector forming matrix obtained by the present method makes it easier to control the reflection characteristics such as the reflection angle and the reflection efficiency of the reflector to be produced as compared with the related art, and obtains a desired reflector. be able to. According to the reflection type liquid crystal display device of the present invention, a liquid crystal display device having a brighter white display surface can be realized by using the reflector having the above excellent characteristics.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の一実施の形態である反射体を示す斜
視図である。
FIG. 1 is a perspective view showing a reflector according to an embodiment of the present invention.

【図2】 同、反射体の製造過程を順を追って示したプ
ロセスフロー図である。
FIG. 2 is a process flow chart showing a manufacturing process of the reflector in order.

【図3】 同、反射体の形成に用いる母型の製造一過程
を示す図であって、ダイヤモンド圧子で母型用基材を押
圧している状態を示す図である。
FIG. 3 is a view showing one process of manufacturing a matrix used for forming a reflector, showing a state in which a matrix for a matrix is pressed by a diamond indenter.

【図4】 同、母型の製造過程においてダイヤモンド圧
子による転造のパターンを示す平面図である。
FIG. 4 is a plan view showing a pattern of rolling by a diamond indenter in a manufacturing process of the matrix.

【図5】 同、転造後の凹部全体の形状を示す平面図で
ある。
FIG. 5 is a plan view showing the shape of the entire recess after rolling.

【図6】 同、反射体における凹部内面の傾斜角の分布
を示す図である。
FIG. 6 is a diagram showing a distribution of an inclination angle of an inner surface of a concave portion in the reflector.

【図7】 本発明の一実施の形態である反射型液晶表示
装置を示す断面図である。
FIG. 7 is a cross-sectional view illustrating a reflective liquid crystal display device according to an embodiment of the present invention.

【図8】 本発明に係る反射体の凹部内面の傾斜角を説
明するための図である。
FIG. 8 is a view for explaining an inclination angle of an inner surface of a concave portion of the reflector according to the present invention.

【図9】 従来の反射体の一例を示す斜視図である。FIG. 9 is a perspective view showing an example of a conventional reflector.

【図10】 従来の反射型液晶表示装置の一例を示す断
面図である。
FIG. 10 is a cross-sectional view illustrating an example of a conventional reflective liquid crystal display device.

【符号の説明】[Explanation of symbols]

1 反射体 2 基板 3 樹脂基材(反射体用基材) 4,7a 凹部 5 反射膜 7 母型用基材 8 ダイヤモンド圧子 9 反射体形成用母型 12 転写型 DESCRIPTION OF SYMBOLS 1 Reflector 2 Substrate 3 Resin base material (reflector base material) 4,7a recessed part 5 Reflective film 7 Matrix base material 8 Diamond indenter 9 Reflector forming base mold 12 Transfer mold

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鹿野 満 東京都大田区雪谷大塚町1番7号 アルプ ス電気株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Mitsuru Kano 1-7 Yukitani-Otsuka-cho, Ota-ku, Tokyo Alps Electric Co., Ltd.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 母型用基材の表面に内面が球面の一部を
なす多数の凹部が連続して形成され、前記凹部の深さが
0.6μmないし1.2μmの範囲にあり、前記凹部内
面の傾斜角分布が−8度ないし+8度の範囲にあり、隣
接する凹部のピッチが26.5μmないし33.5μm
の範囲にあることを特徴とする反射体形成用母型。
1. A large number of recesses having an inner surface forming a part of a spherical surface are continuously formed on a surface of a matrix substrate, and a depth of the recesses is in a range of 0.6 μm to 1.2 μm. The inclination angle distribution of the inner surface of the concave portion is in the range of -8 degrees to +8 degrees, and the pitch of adjacent concave portions is 26.5 μm to 33.5 μm.
A reflector forming matrix.
【請求項2】 母型用基材の表面に先端が球面状の圧子
を押圧し、前記母型用基材表面における圧子の位置を変
えながらこの圧子による押圧を繰り返すことにより、前
記母型用基材の型面にその内面が球面の一部をなす多数
の凹部を連続して形成し、その際に前記圧子の押圧深さ
および移動ピッチを制御することにより前記凹部の深さ
を0.6μmないし1.2μmの範囲とし、前記凹部内
面の傾斜角分布を−8度ないし+8度の範囲とし、隣接
する凹部のピッチを26.5μmないし33.5μmの
範囲とし、これら凹部を形成した母型用基材を反射体形
成用母型とすることを特徴とする反射体形成用母型の製
造方法。
2. An indenter having a spherical tip is pressed against the surface of the matrix substrate, and the pressing by the indenter is repeated while changing the position of the indenter on the surface of the matrix substrate. A large number of recesses whose inner surface forms a part of a spherical surface are continuously formed on the mold surface of the base material. At this time, the depth of the recesses is set to 0. 0 by controlling the pressing depth and the moving pitch of the indenter. The range of 6 μm to 1.2 μm, the inclination angle distribution of the inner surface of the recesses in the range of −8 ° to + 8 °, the pitch of adjacent recesses in the range of 26.5 μm to 33.5 μm, A method for producing a reflector forming matrix, wherein the mold base is a reflector forming matrix.
【請求項3】 表面に内面が球面の一部をなす多数の凹
部が連続して形成され、前記凹部の深さが0.6μmな
いし1.2μmの範囲にあり、前記凹部内面の傾斜角分
布が−8度ないし+8度の範囲にあり、隣接する凹部の
ピッチが26.5μmないし33.5μmの範囲にある
ことを特徴とする反射体。
3. A plurality of recesses whose inner surface forms a part of a spherical surface are continuously formed on the surface, the depth of the recesses is in a range of 0.6 μm to 1.2 μm, and the inclination angle distribution of the inner surface of the recesses. Wherein the pitch of adjacent concave portions is in a range of 26.5 μm to 33.5 μm.
【請求項4】 請求項1に記載の反射体形成用母型の前
記凹部を形成した型面の凹凸形状を反対にした型面を持
つ転写型を形成し、該転写型の型面を反射体用基材の表
面に転写し、ついで、該反射体用基材表面の凹凸上に反
射膜を形成し、これを反射体とすることを特徴とする反
射体の製造方法。
4. A transfer mold having a mold surface having a shape opposite to that of the mold surface on which the concave portion is formed in the master for forming a reflector according to claim 1, and reflecting the mold surface of the transfer mold. A method for producing a reflector, comprising transferring the film onto a surface of a body for a body, forming a reflection film on the unevenness of the surface of the body for a reflector, and using the film as a reflector.
【請求項5】 請求項3に記載の反射体を備えたことを
特徴とする反射型液晶表示装置。
5. A reflective liquid crystal display device comprising the reflector according to claim 3.
JP10042597A 1997-07-29 1998-02-24 Matrix for forming reflector and its production and reflector and its production as well as reflection type liquid crystal display device Withdrawn JPH11242105A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP10042597A JPH11242105A (en) 1998-02-24 1998-02-24 Matrix for forming reflector and its production and reflector and its production as well as reflection type liquid crystal display device
TW087111807A TW496992B (en) 1997-07-29 1998-07-20 Reflector having pits and projections on a surface thereof, manufacturing method for the same, and reflection type liquid crystal display device using the same
US09/123,909 US6421106B1 (en) 1997-07-29 1998-07-28 Reflector having pits and projections on a surface thereof, manufacturing method for the same, and reflection type liquid crystal display device employing the reflector
KR1019980030306A KR100272883B1 (en) 1997-07-29 1998-07-28 Reflector having a convex and concave surface, netyhod of producing the reflector, and reflection-type lcd apparatus using the reflector
CN98117102A CN1103937C (en) 1997-07-29 1998-07-29 Reflector with convex-concave surface, mfg. method and liquid crystal display device using said reflector
US09/649,298 US6429919B1 (en) 1997-07-29 2000-08-28 Reflector having pits and projection on a surface thereof, manufacturing method for the same, and reflection-type liquid crystal display device employing the reflector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10042597A JPH11242105A (en) 1998-02-24 1998-02-24 Matrix for forming reflector and its production and reflector and its production as well as reflection type liquid crystal display device

Publications (1)

Publication Number Publication Date
JPH11242105A true JPH11242105A (en) 1999-09-07

Family

ID=12640477

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH11242105A (en)

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WO2001029585A1 (en) * 1999-10-21 2001-04-26 Matsushita Electric Industrial Co., Ltd. Reflecting plate, method for manufacturing the same, display element, and display device
WO2001035129A1 (en) * 1999-11-09 2001-05-17 Omron Corporation Reflecting member and light reflecting method
JP2001133614A (en) * 1999-10-29 2001-05-18 Hitachi Chem Co Ltd Diffused reflection plate, transfer master die thereof, method of producing the same, base film using the same, transfer film, and method of producing the diffused reflection plate using them
JP2002022912A (en) * 2000-07-03 2002-01-23 Alps Electric Co Ltd Reflector and reflection type liquid crystal display device
JP2002022913A (en) * 2000-07-03 2002-01-23 Alps Electric Co Ltd Reflector and reflection type liquid crystal display device
EP1174735A2 (en) * 2000-07-03 2002-01-23 Alps Electric Co., Ltd. Reflector and reflection type liquid crystal display device using the same
EP1189097A2 (en) * 2000-09-18 2002-03-20 Alps Electric Co., Ltd. Transflective liquid crystal display with backlight and reflection film
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US6695454B2 (en) 2001-06-28 2004-02-24 Alps Electric Co., Ltd. Reflector which exhibits good reflectance over wide angle range and liquid crystal display using the same
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US7372527B2 (en) 2001-12-27 2008-05-13 Seiko Epson Corporation Display substrate, liquid crystal device using display substrate, electronic appliances comprising liquid crystal device, and method for manufacturing thereof
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JP2003229012A (en) * 2002-02-05 2003-08-15 Alps Electric Co Ltd Lighting system and liquid crystal display device
EP1521114A1 (en) * 2003-10-02 2005-04-06 Alps Electric Co., Ltd. Reflector and liquid crystal display device using the same
JP2005254608A (en) * 2004-03-11 2005-09-22 Fukushima Prefecture Manufacturing method for matrix for forming inner-surface diffuse reflector, and inner-surface diffuse reflector
CN100432710C (en) * 2004-03-30 2008-11-12 阿尔卑斯电气株式会社 Reflector and liquid crystal display
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