JPH11233382A - Aluminum alloy foil for electrode of electrolytic capacitor - Google Patents

Aluminum alloy foil for electrode of electrolytic capacitor

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Publication number
JPH11233382A
JPH11233382A JP2840198A JP2840198A JPH11233382A JP H11233382 A JPH11233382 A JP H11233382A JP 2840198 A JP2840198 A JP 2840198A JP 2840198 A JP2840198 A JP 2840198A JP H11233382 A JPH11233382 A JP H11233382A
Authority
JP
Japan
Prior art keywords
foil
content
aluminum alloy
electrolytic capacitor
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2840198A
Other languages
Japanese (ja)
Inventor
Ichizo Tsukuda
市三 佃
Kazuo Toyoda
一雄 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Aluminum Can Corp
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2840198A priority Critical patent/JPH11233382A/en
Publication of JPH11233382A publication Critical patent/JPH11233382A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an aluminum alloy foil for the electrode of an electrolytic capacitor which is soft and has superior etching property. SOLUTION: A soft foil alloy composition has a composition of 99.9% or more Al purity, 0.0010 to 0.0100 wt.% for Si, 0.0010 to 0.0100 wt.% for Fe, 0.0005 to 0.050 wt.% for Cu, 0.0050 or less wt.% for Ga, and unavoidable impurities. The alloy satisfies the expression 0.15-20X<=Y<=0.70-20X, where Y is the ratio of the total amount of deposition of Fe and Si as measured by a thermal phenol dissolution method with respect to the total content of Fe and Si, and X is the Ga content (wt.%).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、電解コンデンサ
電極用アルミニウム合金箔に関する。
The present invention relates to an aluminum alloy foil for an electrode of an electrolytic capacitor.

【0002】[0002]

【従来の技術】アルミニウム電解コンデンサ用電極材と
して一般に用いられるアルミニウム箔には、その実効面
積を拡大して単位面積当たりの静電容量を増大するた
め、通常、電気化学的あるいは化学的エッチング処理が
施される。そして、エッチングによる拡面率の増大を図
る有効な手段として、FeおよびSiの析出量を制御す
ることは従来より知られているところであり、さらにエ
ッチング特性を改善するためにFeおよびSiの析出量
に加えて他の元素の析出量についても種々提案されてい
る。
2. Description of the Related Art An aluminum foil generally used as an electrode material for an aluminum electrolytic capacitor is usually subjected to an electrochemical or chemical etching treatment in order to increase its effective area and increase the capacitance per unit area. Will be applied. It is conventionally known to control the amounts of Fe and Si deposited as an effective means for increasing the surface area ratio by etching. In order to further improve the etching characteristics, the amounts of Fe and Si deposited are controlled. In addition to these, various proposals have been made regarding the precipitation amount of other elements.

【0003】例えば、特公平3−61333にはFeお
よびSiの析出量の合計がこれら元素の含有量の10〜
70%に規制されたアルミニウム合金箔が記載され、特
開平8−209275には、Fe、Si、Cuの析出量
が10〜70%に規制されたアルミニウム箔が開示され
ている。
[0003] For example, Japanese Patent Publication No. 3-61333 discloses that the total amount of Fe and Si deposited is 10 to 10% of the content of these elements.
An aluminum alloy foil regulated to 70% is described, and Japanese Patent Application Laid-Open No. Hei 8-209275 discloses an aluminum foil in which the amounts of Fe, Si and Cu deposited are regulated to 10 to 70%.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、O箔の
ような軟箔については、FeおよびSi、あるいはさら
にCuの含有量や析出量を制御するだけではエッチング
特性の改善が不十分で十分な静電容量を得られないこと
があった。
However, in the case of a soft foil such as an O foil, it is not sufficient to improve the etching characteristics simply by controlling the content and the precipitation amount of Fe and Si, or even Cu, so that a sufficient static property can be obtained. In some cases, the capacity could not be obtained.

【0005】この発明は、このような技術背景に鑑み、
軟箔であってエッチング特性の優れた電解コンデンサ電
極用アルミニウム合金箔の提供を目的とする。
The present invention has been made in view of such technical background,
An object of the present invention is to provide an aluminum alloy foil for an electrolytic capacitor electrode which is a soft foil and has excellent etching characteristics.

【0006】[0006]

【課題を解決するための手段】発明者らは、鋭意研究の
結果、Gaが軟箔のエッチング特性の向上に有効である
ことを見出だし、この発明の完成に至った。即ち、この
発明の電解コンデンサ電極用アルミニウム合金箔は、前
記目的を達成するために、箔合金組成において、アルミ
ニウム純度が99.9%以上であるとともに、Si:
0.0010〜0.0100wt%、Fe:0.0010
〜0.0100wt%、Cu:0.0005〜0.050
wt%、Ga:0.0050wt%以下および不可避不純物
を含有する軟箔であって、FeおよびSiの含有量の合
計に対し、熱フェノール溶解法により測定されるFeお
よびSiの析出量の合計の割合(Y)とGa含有量(wt
%)(X)とが, 0.15−20X≦Y≦0.70−20X の関係を満たすことを要旨とする。
Means for Solving the Problems As a result of earnest studies, the inventors have found that Ga is effective for improving the etching characteristics of a soft foil, and have completed the present invention. That is, in order to achieve the above object, the aluminum alloy foil for an electrolytic capacitor electrode of the present invention has an aluminum purity of 99.9% or more in a foil alloy composition and Si:
0.0010 to 0.0100 wt%, Fe: 0.0010
0.00.0100 wt%, Cu: 0.0005 to 0.050
wt.%, Ga: a soft foil containing 0.0050 wt.% or less and unavoidable impurities, wherein the total amount of Fe and Si measured by the hot phenol dissolution method is the total amount of Fe and Si Ratio (Y) and Ga content (wt
%) And (X) satisfy the relationship of 0.15-20X ≦ Y ≦ 0.70-20X.

【0007】この発明において対象とされるアルミニウ
ム合金箔は、冷間圧延後に熱処理を施した軟箔であり、
その代表的なものはO箔である。また、交流エッチング
によりスポンジ状エッチピッチを形成する低圧用箔とし
て好適に使用できる。
The aluminum alloy foil targeted in the present invention is a soft foil subjected to a heat treatment after cold rolling,
A typical example is an O foil. Further, it can be suitably used as a low-pressure foil for forming a sponge-like etch pitch by AC etching.

【0008】箔合金組成において、アルミニウム純度を
99.9%以上の高純度とするとともに、Fe、Si、
CuおよびGaの含有量を規制する。
[0008] In the foil alloy composition, while the aluminum purity is high purity of 99.9% or more, Fe, Si,
Regulate the content of Cu and Ga.

【0009】アルミニウム純度を99.9%以上とする
のは、99.9%未満では不純物量が多くなって、F
e、Si、CuおよびGa含有量やFeおよびSiの析
出量を制御しても、エッチング時に過溶解が生じやすく
なってエッチング特性が低下するためである。
The reason why the purity of aluminum is set to 99.9% or more is that if the purity is less than 99.9%, the amount of impurities increases, and
This is because, even if the contents of e, Si, Cu, and Ga and the amounts of Fe and Si deposited are controlled, overdissolution is likely to occur during etching, and the etching characteristics deteriorate.

【0010】Fe含有量およびSi含有量をそれぞれ
0.0010〜0.0100%とするのは、上限値を超
えると所定の析出量に制御することが困難となり、また
下限値未満にFeおよびSiを除去するには精製コスト
がかかるためである。Fe含有量の好ましい上限値は
0.0080wt%であり、Si含有量は好ましい上限値
は0.0080wt%である。
The reason why the content of Fe and the content of Si are set to 0.0010 to 0.0100%, respectively, is that if the content exceeds the upper limit, it becomes difficult to control the amount of precipitation to a predetermined value. This is because the cost of purification is high to remove. The preferred upper limit of the Fe content is 0.0080 wt%, and the preferred upper limit of the Si content is 0.0080 wt%.

【0011】Cuは、エッチングピットを均一に分布さ
せてエッチング特性を良好にする効果がある。Cu含有
量は、0.0005wt%未満では前記効果に乏しく、
0.0050wt%を超えると箔表面に過溶解を生じるた
め、0.0005〜0.050wt%とする必要がある。
Cu含有量の好ましい下限値は0.0008wt%であ
り、好ましい上限値は0.010wt%である。
Cu has the effect of uniformly distributing the etching pits and improving the etching characteristics. If the Cu content is less than 0.0005 wt%, the above effect is poor,
If it exceeds 0.0050 wt%, the foil surface will be over-dissolved, so it is necessary to make it 0.0005 to 0.050 wt%.
A preferred lower limit of the Cu content is 0.0008 wt%, and a preferred upper limit is 0.010 wt%.

【0012】Gaは、エッチングピットの成長を促進し
て拡面率を高める効果がある。Ga含有量は、増加に伴
い自然電極電位が貴な方向に以降しエッチピットの形成
が多くなるが、0.0050wt%を超えると箔表面に過
溶解を生じるため、0.0050wt%以下とする必要が
ある。Ga含有量の好ましい上限値は0.0040wt%
であり、また、拡面率を有効に向上させるために0.0
005wt%以上が好ましい。なお、含有量が0.005
0wt%以下であることから、Gaは析出せずにAlマト
リックスに固溶されていると考えられる。
Ga has the effect of promoting the growth of etching pits and increasing the area coverage. As the Ga content increases, the formation of etch pits increases in the direction in which the natural electrode potential becomes noble, but if it exceeds 0.0050 wt%, overdissolution occurs on the foil surface, so it is set to 0.0050 wt% or less. There is a need. The preferred upper limit of the Ga content is 0.0040 wt%.
And 0.0 in order to effectively improve the area coverage.
005 wt% or more is preferable. The content is 0.005
Since the content is 0 wt% or less, it is considered that Ga is dissolved in the Al matrix without being precipitated.

【0013】この発明においては、Fe、Si、Cuお
よびGaを上述の範囲に規定した上で、FeおよびSi
の析出量についても規定する。アルミニウム合金箔中に
おいて、FeおよびSiの一部はAl−Fe系析出物あ
るいはAl−Fe−Si系析出物として析出する。これ
らの析出物はアルミニウムマトリックスとの電位差によ
りエッチングの開始点となり、エッチピットの形成に重
要な役割を果たすものであって、析出量によってエッチ
ングによる拡面率が左右される。従って、この発明にお
いては、FeおよびSiの析出量をFe、SiおよびG
aの含有量との関係において次の(I)式の範囲を規定
する。また、図1に(I)式が示す範囲を斜線で図示す
る。
In the present invention, Fe, Si, Cu and Ga are defined within the above-mentioned ranges, and then Fe and Si are defined.
The amount of precipitation is also specified. In the aluminum alloy foil, some of Fe and Si precipitate as Al-Fe-based precipitates or Al-Fe-Si-based precipitates. These precipitates serve as a starting point of etching due to a potential difference from the aluminum matrix and play an important role in the formation of etch pits, and the amount of deposition affects the area coverage by etching. Therefore, in the present invention, the amounts of Fe and Si deposited are expressed as Fe, Si and G
The range of the following formula (I) is defined in relation to the content of a. In FIG. 1, the range indicated by the formula (I) is shown by oblique lines.

【0014】 0.15−20X≦Y≦0.70−20X …… (I) ただし、 X=Ga含有量(≦0.005wt%) Y=FeおよびSiの析出量の合計/FeおよびSiの
含有量の合計 析出量の割合を(I)式の範囲に規定するのは、析出量
の割合が増えてY>0.70−20Xになるとエッチン
グのスポンジ層が過溶解し、一方析出量の割合が減少し
てY<0.15−20Xになると溶解が進行せず拡面率
の向上が望めないためである。
0.15-20X ≦ Y ≦ 0.70-20X (I) where X = Ga content (≦ 0.005 wt%) Y = Total amount of Fe and Si deposited / Fe and Si The total content is defined as follows. The reason why the ratio of the amount of precipitation is defined in the range of the formula (I) is that when the ratio of the amount of deposition increases and Y> 0.70-20X, the sponge layer of the etching is over-dissolved. This is because if the ratio decreases and Y <0.15-20X, the dissolution does not proceed, and an improvement in the surface area cannot be expected.

【0015】(I)式におけるFeおよびSiの析出量
は、熱フェノール溶解法により測定する。熱フェノール
溶解法とは、加熱したフェノールがアルミニウム合金中
の析出物以外の成分、即ちアルミニウムマトリックスお
よび固溶成分のみを溶解するが、析出物を溶解しないと
いう性質を利用して、アルミニウム合金箔から析出物を
分別した上で、析出物中の元素を定量分析する方法であ
る。また、析出量の測定方法として熱フェノール溶解法
を採用するのは、FeおよびSi以外にCuおよびGa
を含有し、さらには不可避不純物を含有するアルミニウ
ム合金箔においても、析出したFeおよびSiを選択的
に定量できるためである。
The amounts of Fe and Si deposited in the formula (I) are measured by a hot phenol dissolution method. The hot phenol dissolution method uses the property that heated phenol dissolves only components other than precipitates in the aluminum alloy, that is, the aluminum matrix and solid solution components, but does not dissolve the precipitates. This is a method in which the precipitate is separated and the elements in the precipitate are quantitatively analyzed. Also, the method of measuring the amount of precipitation using the hot phenol dissolution method is that Cu and Ga are used in addition to Fe and Si.
This is because even in an aluminum alloy foil containing unavoidable impurities, precipitated Fe and Si can be selectively quantified.

【0016】熱フェノール溶解法によるFeおよびSi
の析出量の測定手順の一例を次に示す。
Fe and Si by hot phenol dissolution method
An example of a procedure for measuring the amount of the precipitation of is shown below.

【0017】まず、供試片として、アルミニウム合金箔
を適宜切断し、表面に付着している汚れを洗浄除去して
秤量する。次に、供試片を170〜180℃に加熱した
フェノール中に投入して、加熱しながら析出物以外の成
分を溶解させる。加熱はフェノールの蒸発を防ぐために
還流させながら行う。次に、フェノール溶解液から不溶
成分である析出物を濾別し、析出物を酸に溶解させる。
そして、析出物の溶解液に対し、原子吸光法やICP発
光分析法などによりFeおよびSiの定量分析を行い、
FeおよびSiの個々の析出量を得る。
First, as a test piece, an aluminum alloy foil is appropriately cut, and dirt adhering to the surface is removed by washing and weighed. Next, the test piece is put into phenol heated to 170 to 180 ° C., and components other than the precipitate are dissolved while heating. Heating is performed while refluxing to prevent evaporation of the phenol. Next, the precipitate, which is an insoluble component, is separated from the phenol solution by filtration, and the precipitate is dissolved in an acid.
Then, the solution of the precipitate is subjected to quantitative analysis of Fe and Si by an atomic absorption method, an ICP emission analysis method, or the like,
The individual precipitation amounts of Fe and Si are obtained.

【0018】さらに、上記方法で求めたFeおよびSi
の析出量、供試片の重量および既知のFe含有量および
Si含有量を用いて、FeおよびSiの含有量の合計に
対するFeおよびSiの析出量の合計の割合(Y)を算
出し、さらに、既知のGa含有量(X)にもとづき、
(I)式を満たすかどうかを判定する。
Further, Fe and Si obtained by the above method are used.
Using the amount of precipitation, the weight of the test piece and the known Fe and Si contents, the ratio (Y) of the total amount of precipitation of Fe and Si to the total of the contents of Fe and Si was calculated. , Based on the known Ga content (X),
It is determined whether equation (I) is satisfied.

【0019】なお、FeおよびSiの析出量は、冷間圧
延の途中で行う中間焼鈍の温度および時間を調整するこ
とにより制御できる。
The amount of precipitation of Fe and Si can be controlled by adjusting the temperature and time of the intermediate annealing performed during the cold rolling.

【0020】この発明の電解コンデンサ電極用アルミニ
ウム合金箔は、アルミニウム純度、Fe、Si、Cuお
よびGa含有量が規定され、さらに所定の割合でFeお
よびSiを析出させることにより、エッチングによる箔
の十分な溶解がなされ、かつ過溶解が抑制される。
The aluminum alloy foil for an electrode of an electrolytic capacitor of the present invention has aluminum purity, Fe, Si, Cu and Ga contents which are defined, and furthermore, by precipitating Fe and Si at a predetermined ratio, the foil can be sufficiently etched. Dissolution is achieved and overdissolution is suppressed.

【0021】[0021]

【実施例】次に、この発明の電解コンデンサ電極用アル
ミニウム合金箔の具体的実施例について説明する。
Next, specific examples of the aluminum alloy foil for an electrode of an electrolytic capacitor according to the present invention will be described.

【0022】まず、表1に示す実施例1〜4、比較例
5、6の合金組成のアルミニウムスラブを面削した後、
均質化処理を行い、熱間圧延開始温度530℃で熱間圧
延し、さらに常法により冷間圧延を施し、厚さ100μ
mの箔とした。さらに、実施例1〜4については350
℃×5時間の焼鈍を行い、比較例6は220℃×5時間
の焼鈍を行った。比較例5は圧延後の熱処理を行わなか
った。
First, after aluminum slabs having the alloy compositions of Examples 1 to 4 and Comparative Examples 5 and 6 shown in Table 1 were chamfered,
Homogenization treatment is performed, hot rolling is performed at a hot rolling start temperature of 530 ° C., and cold rolling is performed by a conventional method to obtain a thickness of 100 μ
m of foil. Furthermore, about Examples 1-4, 350
Annealing was performed at 5 ° C. × 5 hours, and in Comparative Example 6, annealing was performed at 220 ° C. × 5 hours. In Comparative Example 5, heat treatment after rolling was not performed.

【0023】次に、各アルミニウム箔について、熱フェ
ノール溶解法によりFeおよびSiの個々の析出量を測
定し、FeおよびSiの含有量の合計に対するFeおよ
びSiの析出量の合計の割合(Y)を計算により求め
た。さらに、この析出量の割合(Y)とGa含有量
(X)との関係を図1上に示す。
Next, for each aluminum foil, the amount of each of Fe and Si deposited was measured by the hot phenol dissolution method, and the ratio of the total amount of Fe and Si deposited to the total content of Fe and Si (Y) Was calculated. Further, the relationship between the ratio (Y) of the precipitation amount and the Ga content (X) is shown in FIG.

【0024】次に、各アルミニウム合金箔について、エ
ッチングおよび化成処理を行った。エッチング条件は、
35℃の17%塩酸+0.04%硫酸+0.3%リン酸
+0.6%硝酸+3%塩化アルミニウム溶液中にアルミ
ニウム合金箔を浸漬し、電流密度0.3%A/cm2
20Hzの正弦波交流を560秒間印加するものとし
た。また、化成条件は15%アジピン酸アンモニウム水
溶液中で22Vで処理するものとした。
Next, the respective aluminum alloy foils were subjected to etching and chemical conversion treatments. Etching conditions are
The aluminum alloy foil is immersed in a solution of 17% hydrochloric acid + 0.04% sulfuric acid + 0.3% phosphoric acid + 0.6% nitric acid + 3% aluminum chloride at 35 ° C., and a current density of 0.3% A / cm 2 and a sine of 20 Hz. Wave alternating current was applied for 560 seconds. In addition, the chemical conversion conditions were such that treatment was performed at 22 V in a 15% aqueous ammonium adipate solution.

【0025】次いで、化成処理した各アルミニウム合金
箔についてLCRメーターで静電容量を測定した。その
結果を、比較例6の静電容量を100としたときの相対
比較にて表1に示す。
Next, the capacitance of each chemically treated aluminum alloy foil was measured by an LCR meter. The results are shown in Table 1 as a relative comparison when the capacitance of Comparative Example 6 is set to 100.

【0026】[0026]

【表1】 [Table 1]

【0027】表1の結果から、FeおよびSiの析出量
の割合をこの発明の範囲内に規制した実施例1〜3は、
良好な静電容量が良好であることを確認できた。
From the results shown in Table 1, Examples 1 to 3 in which the proportions of the amounts of Fe and Si precipitated were controlled within the scope of the present invention,
It was confirmed that good capacitance was good.

【0028】[0028]

【発明の効果】以上の次第で、この発明の電解コンデン
サ電極用アルミニウム合金箔は、箔合金組成において、
アルミニウム純度が99.9%以上であるとともに、S
i:0.0010〜0.0100wt%、Fe:0.00
10〜0.0100wt%、Cu:0.0005〜0.0
50wt%、Ga:0.0050wt%以下および不可避不
純物を含有する軟箔であって、FeおよびSiの含有量
の合計に対し、熱フェノール溶解法により測定されるF
eおよびSiの析出量の合計の割合(Y)とGa含有量
(wt%)(X)とが, 0.15−20X≦Y≦0.70−20X の関係を満たすものであるから、エッチングによる箔の
十分な溶解がなされかつ過溶解が抑制され、エッチピッ
トの形成が適正に行われ、静電容量の増大を図ることが
できる。
As described above, according to the present invention, the aluminum alloy foil for an electrolytic capacitor electrode according to the present invention has
Aluminum purity is not less than 99.9% and S
i: 0.0010 to 0.0100 wt%, Fe: 0.00
10-0.0100 wt%, Cu: 0.0005-0.0
Soft foil containing 50 wt%, Ga: 0.0050 wt% or less and unavoidable impurities, wherein F is measured by a hot phenol dissolution method based on the total content of Fe and Si.
Since the ratio (Y) of the total amount of e and Si deposited and the Ga content (wt%) (X) satisfy the relationship of 0.15-20X ≦ Y ≦ 0.70-20X, the etching is performed. Thus, the foil is sufficiently dissolved and the overdissolution is suppressed, the etch pits are properly formed, and the capacitance can be increased.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の電解コンデンサ電極用アルミニウム
合金箔において、FeおよびSiの析出量の割合を示す
グラフである。
FIG. 1 is a graph showing the ratio of the precipitation amount of Fe and Si in an aluminum alloy foil for an electrolytic capacitor electrode of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 箔合金組成において、アルミニウム純度
が99.9%以上であるとともに、Si:0.0010
〜0.0100wt%、Fe:0.0010〜0.010
0wt%、Cu:0.0005〜0.050wt%、Ga:
0.0050wt%以下および不可避不純物を含有する軟
箔であって、FeおよびSiの含有量の合計に対し、熱
フェノール溶解法により測定されるFeおよびSiの析
出量の合計の割合(Y)とGa含有量(wt%)(X)と
が, 0.15−20X≦Y≦0.70−20X の関係を満たすことを特徴とする電解コンデンサ電極用
アルミニウム合金箔。
1. A foil alloy composition having an aluminum purity of 99.9% or more and a Si content of 0.0010%.
-0.0100 wt%, Fe: 0.0010-0.010
0 wt%, Cu: 0.0005 to 0.050 wt%, Ga:
A soft foil containing 0.0050 wt% or less and unavoidable impurities, wherein the ratio (Y) of the total amount of precipitation of Fe and Si measured by the hot phenol dissolution method to the total content of Fe and Si, An aluminum alloy foil for an electrolytic capacitor electrode, wherein the Ga content (wt%) (X) satisfies the following relationship: 0.15-20X ≦ Y ≦ 0.70-20X.
JP2840198A 1998-02-10 1998-02-10 Aluminum alloy foil for electrode of electrolytic capacitor Pending JPH11233382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2840198A JPH11233382A (en) 1998-02-10 1998-02-10 Aluminum alloy foil for electrode of electrolytic capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2840198A JPH11233382A (en) 1998-02-10 1998-02-10 Aluminum alloy foil for electrode of electrolytic capacitor

Publications (1)

Publication Number Publication Date
JPH11233382A true JPH11233382A (en) 1999-08-27

Family

ID=12247652

Family Applications (1)

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006169629A (en) * 2004-11-22 2006-06-29 Showa Denko Kk Aluminum alloy material for electrolytic capacitor, method for producing the same, method for producing electrode material for electrolytic capacitor, anode material for electrolytic capacitor and aluminum electrolytic capacitor
CN110938768A (en) * 2019-11-30 2020-03-31 河南科源电子铝箔有限公司 High-voltage electronic aluminum foil without generation of coarse grains and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006169629A (en) * 2004-11-22 2006-06-29 Showa Denko Kk Aluminum alloy material for electrolytic capacitor, method for producing the same, method for producing electrode material for electrolytic capacitor, anode material for electrolytic capacitor and aluminum electrolytic capacitor
CN110938768A (en) * 2019-11-30 2020-03-31 河南科源电子铝箔有限公司 High-voltage electronic aluminum foil without generation of coarse grains and preparation method thereof

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