JPH11217666A - Nitrogen-containing cr film, its production and machine member having this film - Google Patents

Nitrogen-containing cr film, its production and machine member having this film

Info

Publication number
JPH11217666A
JPH11217666A JP33024198A JP33024198A JPH11217666A JP H11217666 A JPH11217666 A JP H11217666A JP 33024198 A JP33024198 A JP 33024198A JP 33024198 A JP33024198 A JP 33024198A JP H11217666 A JPH11217666 A JP H11217666A
Authority
JP
Japan
Prior art keywords
film
nitrogen
atoms
coating
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33024198A
Other languages
Japanese (ja)
Other versions
JP3954739B2 (en
Inventor
Masuo Hitomi
満寿雄 人見
Fumito Suzuki
史人 鈴木
Masahiro Umehara
正博 梅原
Hiroshi Yamagata
博 山形
Akira Nogami
曜 野上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Priority to JP33024198A priority Critical patent/JP3954739B2/en
Publication of JPH11217666A publication Critical patent/JPH11217666A/en
Application granted granted Critical
Publication of JP3954739B2 publication Critical patent/JP3954739B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain a nitrogen-contg. Cr film excellent in wear resistance, seizure resistance and wear resistance. SOLUTION: In a nitrogen-contg. Cr film, CrXx NY crystals, per 100 atoms, contg. 50 to 99 chromium atomic and 50 to 1 nitrogen atoms are scattered. This film is formed by sputtering chromium in a nitrogen atmosphere. Furthermore, at the time of executing the sputtering, ion bombarding treatment is executed. Moreover, the surfaces of friction and abrasion parts of machine members, particularly motor bicycles, motor tricycles, motor waggons or the like are provided with the film.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、窒素含有Cr被膜
とその製造方法およびこの被膜を有する機械部材に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nitrogen-containing Cr film, a method for producing the same, and a machine member having the film.

【0002】[0002]

【従来の技術】金型をはじめとする多くの機械部材は過
酷な条件下で使用されるが、これらの機械部材に求めら
れる特性としては、耐摩耗性に優れること、耐食性に優
れること、耐焼き付き性に優れることなどが挙げられ
る。
2. Description of the Related Art Many mechanical members such as molds are used under severe conditions. The characteristics required of these mechanical members are excellent in abrasion resistance, excellent corrosion resistance, It has excellent seizure properties.

【0003】このような特性を付与するために、通常は
このような機械部材の母材であるSKD(工具鋼)など
に様々な表面処理を施している。その一つに硬質クロム
メッキがある。硬質クロムメッキは表面の硬度が平均H
v1000〜1100と高いものの、処理廃水に含まれ
る六価クロムが水質汚染の原因になっている。また、メ
ッキ被膜と母材との密着性に問題があった。
In order to impart such characteristics, various surface treatments are usually applied to SKD (tool steel) as a base material of such mechanical members. One of them is hard chrome plating. Hard chrome plating has an average surface hardness of H
Although it is as high as v1000-1100, hexavalent chromium contained in the treated wastewater causes water pollution. In addition, there was a problem in adhesion between the plating film and the base material.

【0004】また、PVD処理方法によって機械部材の
母材表面にCr単層被膜を形成した場合、母材と被膜と
の密着性は優れているものの、膜の硬度がHv500〜
600と低いなどの問題点があった。
Further, when a single-layer Cr film is formed on the surface of a base material of a machine member by a PVD processing method, although the adhesion between the base material and the film is excellent, the hardness of the film is Hv500-500.
There were problems such as a low of 600.

【0005】また、自動2輪車や自動4輪車等のエンジ
ンおよび変速機に使用される摩擦摩耗部品などの機械部
材には、高速回転体との摺動接触や打撃を繰り返し受け
るために高靱性、高い表面硬度及び低摩擦係数等の特性
が要求される。
Further, mechanical parts such as friction and wear parts used in engines and transmissions of motorcycles and four-wheeled vehicles are subject to repeated contact and impact with high-speed rotating bodies. Characteristics such as toughness, high surface hardness and low coefficient of friction are required.

【0006】これらの部品には、一般に低炭素鋼或いは
中炭素鋼等が用いられ、上記特性を付与するために、浸
炭、焼き入れ、窒化などの表面処理が施されているが、
更に、硬質クロムメッキやニッケル−リンメッキ、ショ
ットピーニング、各種金属の溶射などが行われ、耐摩耗
性、耐焼き付き性、潤滑性の改善を図っている。
[0006] These parts are generally made of low-carbon steel or medium-carbon steel, and are subjected to surface treatment such as carburizing, quenching, nitriding, etc. in order to impart the above characteristics.
Further, hard chromium plating, nickel-phosphorus plating, shot peening, thermal spraying of various metals, and the like are performed to improve wear resistance, seizure resistance, and lubricity.

【0007】然しながら、昨今の軽量化やエンジン出力
の増大化により、より過酷な環境下で使用されるように
なり、上記のような表面処理では要求特性を満足し得な
くなりつつある。また、以上の特性を満足するためにP
VD法のうちイオンプレーティング法によるTiN膜や
CrN膜が使用されつつあるが、この方法では処理温度
が400℃以上と高いために母材の硬度が低下し、満足
な特性が得られないという問題があった。
However, due to the recent weight reduction and increase in engine output, they have been used in more severe environments, and the required properties cannot be satisfied by the above-described surface treatment. Further, in order to satisfy the above characteristics, P
Among the VD methods, a TiN film or a CrN film formed by an ion plating method is being used. However, in this method, the processing temperature is as high as 400 ° C. or higher, so that the hardness of the base material is reduced and satisfactory characteristics cannot be obtained. There was a problem.

【0008】[0008]

【発明が解決しようとする課題】上記のように従来の機
械部材への表面処理方法やそれによって得られた表面被
膜では、耐摩耗性や耐食性、耐焼き付き性、潤滑性など
に問題があったため、部材自体の寿命が劣るという問題
があった。
As described above, the conventional surface treatment method for mechanical members and the surface coating obtained by the method had problems in abrasion resistance, corrosion resistance, seizure resistance, lubricity, and the like. However, there is a problem that the life of the member itself is inferior.

【0009】本発明はこのようなこれまでの表面処理方
法および被膜の問題点を解決すべくなされたものであ
る。
The present invention has been made to solve the problems of the conventional surface treatment method and coating film.

【0010】[0010]

【課題を解決するための手段】本発明の窒素含有Cr被
膜は、CrX Y 結晶が点在することを特徴とする。
The nitrogen-containing Cr film of the present invention is characterized in that Cr X N Y crystals are scattered.

【0011】上記被膜の製造方法は、窒素の雰囲気中で
クロムをスパッタリングすることによって形成すること
を特徴とする。
[0011] The method for producing a film is characterized in that the film is formed by sputtering chromium in a nitrogen atmosphere.

【0012】また、上記スパッタリングを行うに際し、
イオンボンバード処理を行うことを特徴とする。
In performing the above sputtering,
An ion bombardment process is performed.

【0013】また、本発明の機械部材は、CrX Y
晶が点在する窒素含有Cr被膜をその表面に形成したこ
とを特徴とする。
Further, the mechanical member of the present invention is characterized in that a nitrogen-containing Cr coating on which Cr X N Y crystals are scattered is formed on the surface.

【0014】上記CrX Y 結晶は100原子当たり5
0〜99のクロム原子及び50〜1の窒素原子を含むこ
とを特徴とする。
The above Cr X N Y crystal is 5 per 100 atoms.
It is characterized by containing 0 to 99 chromium atoms and 50 to 1 nitrogen atoms.

【0015】[0015]

【発明の実施の形態】以下図面によって本発明の被膜お
よびその製造方法、さらに被膜を有する機械部材の一例
として金型について説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a coating film according to the present invention;

【0016】図1は本発明の被膜を金型上に形成するた
めのスパッタリング装置の概略図を示し、1は円筒状ま
たは角形状の真空処理室、2はこの真空処理室1内を真
空とするための真空ポンプ、3は上記真空処理室1内の
中心部に配置した回転テーブル、4はこの回転テーブル
3上に治具5を介して載置した被処理部材である金型、
6はこの被処理金型4を取り囲むように配置した蒸発源
としてのクロムターゲット、7はこのクロムターゲット
6に夫々接続した直流のスパッタ電源、8は上記回転テ
ーブル3に接続した直流のイオンボンバード及びバイア
ス電源、9は上記真空処理室1内にアルゴン及び窒素ガ
スを導入するためのガス導入パイプである。
FIG. 1 is a schematic view of a sputtering apparatus for forming a coating film of the present invention on a mold, wherein 1 is a cylindrical or angular vacuum processing chamber, and 2 is a vacuum processing chamber. A rotary table 3 disposed at the center of the vacuum processing chamber 1; a mold 4 as a member to be processed placed on the rotary table 3 via a jig 5;
Reference numeral 6 denotes a chromium target as an evaporation source disposed so as to surround the die 4 to be processed, 7 denotes a DC sputtering power supply connected to the chromium target 6 respectively, 8 denotes a DC ion bombard connected to the rotary table 3 and A bias power supply 9 is a gas introduction pipe for introducing argon and nitrogen gas into the vacuum processing chamber 1.

【0017】本発明においては、スパッタリングプロセ
スの前に真空脱ガスを実施せしめる。
In the present invention, vacuum degassing is performed before the sputtering process.

【0018】また、本発明においては真空処理室1内に
窒素ガスとアルゴンガスをガス導入パイプ9を介して導
入した後、被処理部材、例えば金型の表面にクロムをス
パッタリングし、金型の表面に窒素を含有するCr膜と
して100原子当たり50〜99のクロム原子及び50
〜1の窒素原子を含むCrX Y 結晶が点在した膜を生
成せしめる。上記スパッタリングに際しては、上記被膜
の厚さを均一ならしめるため、且つ被処理部材の温度を
その焼戻し温度以下に維持するため、ターゲットと被処
理材料間の間隔を例えば70mmに保つのが好ましい。
In the present invention, after nitrogen gas and argon gas are introduced into the vacuum processing chamber 1 through the gas introduction pipe 9, chromium is sputtered on the surface of a member to be processed, for example, a mold, and the mold is processed. As a Cr film containing nitrogen on the surface, 50 to 99 chromium atoms per 100 atoms and 50
A film is formed in which Cr X N Y crystals containing 窒 素 1 nitrogen atom are interspersed. At the time of the sputtering, it is preferable to keep the distance between the target and the material to be processed at, for example, 70 mm in order to make the thickness of the film uniform and to maintain the temperature of the member to be processed at or below the tempering temperature.

【0019】本発明においては、上記スパッタリングプ
ロセス前に必要に応じてイオンボンバード処理を行い、
かつプロセス温度を300℃未満とし、所定の被膜の厚
みに応じて処理時間を定め、被膜の組織調整はプロセス
中の圧力やバイアス電圧の変更によって行うようにす
る。なおプロセス温度が300℃以上になると、母材自
体の軟化が生じるので、本処理についてはなるべく低い
温度が好ましいが、室温以下で行うことは密着性の確保
が困難なので実用上得策でない。
In the present invention, an ion bombardment treatment is performed as required before the sputtering process,
In addition, the process temperature is set to less than 300 ° C., the treatment time is determined according to a predetermined thickness of the film, and the structure of the film is adjusted by changing the pressure and the bias voltage during the process. When the process temperature is 300 ° C. or higher, the base material itself is softened. Therefore, the temperature is preferably as low as possible in this treatment. However, it is not practically preferable to perform the treatment at room temperature or lower because it is difficult to secure adhesion.

【0020】なお、上記被膜の厚みは、最大100μm
までとするのが好ましい。
The thickness of the coating is 100 μm at the maximum.
It is preferable that

【0021】EPMAによって表面の膜の化学組成を調
べたところ、Cr72,N28及びCr52,N48な
どの比を示した。膜の特性については、耐焼き付き性、
耐摩耗性、摩擦係数、密着性などについて調査した。
When the chemical composition of the film on the surface was examined by EPMA, the ratio of Cr72, N28 and Cr52, N48 was shown. Regarding the properties of the film, seizure resistance,
The wear resistance, coefficient of friction, adhesion, etc. were investigated.

【0022】(比較例)(Comparative example)

【0023】比較例1,2としてはイオンプレーティン
グしたTiN膜および電解硬質クロムメッキの膜を用い
た。
In Comparative Examples 1 and 2, an ion-plated TiN film and a film of electrolytic hard chromium plating were used.

【0024】耐焼き付け性については、図2に示すよう
なファビリー試験機を用いて行った。即ち、直径約6.
4mmのSCM415に浸炭焼き入れ焼き戻し研磨仕上
げしたテストピン10に、それぞれ6μmの本発明被膜
を付け、SCM415に浸炭焼き入れ焼き戻し表面研磨
仕上げしたVブロック11を用い、締め付け加重を60
0Kgf一定として断続運転を行った。断続運転は2秒
ON,10秒OFF、すべり速度0.1m/sec,無
潤滑の条件である。評価の方法は、膜が破壊するまでの
断続回数を焼き付き性として評価した。
The seizure resistance was measured using a Fabry tester as shown in FIG. That is, the diameter is about 6.
A test pin 10 carburized, quenched and tempered on a 4 mm SCM 415 was coated with the coating of the present invention having a thickness of 6 μm.
The intermittent operation was performed at 0 Kgf constant. The intermittent operation is ON for 2 seconds, OFF for 10 seconds, a sliding speed of 0.1 m / sec, and no lubrication. As an evaluation method, the number of intermittent operations until the film was broken was evaluated as the image sticking property.

【0025】なお、12はテストピン10を例えば30
0rpmで回転せしめる駆動機、13は駆動機12にテ
ストピン10を固定するためのシアーピンである。
Reference numeral 12 denotes a test pin, for example, 30
A driving machine 13 rotates at 0 rpm, and 13 is a shear pin for fixing the test pin 10 to the driving machine 12.

【0026】また、摩耗特性としては、耐アグレッシブ
特性を評価した。スガ式摩耗試験器(NUS−ISO−
3型)を用いて、#400のダイヤモンド電着研磨布を
用いて、往復運動摩耗試験を行った。母材はいずれもS
US440Cを鏡面仕上げしたものである。試験片の総
荷重は9.8Nであり往復のストローク長さは60mm
である。摩耗特性の評価はサンプルの摩耗量(×10-5
g/cm)として評価した。
Further, as the wear characteristics, aggressive resistance characteristics were evaluated. Suga type wear tester (NUS-ISO-
(Type 3), a reciprocating motion wear test was performed using a # 400 diamond electrodeposited polishing cloth. Base material is S
US440C is mirror finished. The total load of the test piece is 9.8N and the reciprocating stroke length is 60mm
It is. The wear characteristics were evaluated by measuring the wear amount of the sample (× 10 −5).
g / cm).

【0027】表1にその結果を示す。Table 1 shows the results.

【0028】[0028]

【表1】 [Table 1]

【0029】なお、表1において、例えば破壊までの回
数30<とは30回以上を示し、5>とは5回以下を示
す。
In Table 1, for example, the number of times until destruction is 30 <indicates 30 times or more, and 5> indicates 5 times or less.

【0030】さらに、本発明被膜を有する部材の一例と
して、金型にスパッタリング処理を施した。
Further, as an example of a member having the coating of the present invention, a metal mold was subjected to a sputtering treatment.

【0031】本発明におけるイオンボンバード処理は、
Ar雰囲気中で2×10-2torrとして、1250V
×0.01mAで約40分行った。
In the present invention, the ion bombardment treatment
1250 V at 2 × 10 -2 torr in an Ar atmosphere
X 0.01 mA for about 40 minutes.

【0032】また、スパッタリング処理は、雰囲気中の
ガス分圧をAr:1.2×10-3torr,N2:0.
2×10-3torr,バイアス電圧:−90〜−100
Vとし、処理時間を約100分とした。
In the sputtering process, the partial pressure of the gas in the atmosphere is set to Ar: 1.2 × 10 −3 torr, N 2: 0.
2 × 10 −3 torr, bias voltage: −90 to −100
V and the processing time was about 100 minutes.

【0033】本発明においては以上の条件で母材である
工具鋼にスパッタリングターゲット処理を施した金型を
作成した。
In the present invention, a die was prepared by subjecting tool steel as a base material to a sputtering target treatment under the above conditions.

【0034】なお、上記の条件については、母材の材
料、寸法や形状によって変更される。本実施例の場合は
上記条件をはずれると、被膜の密着性や膜の特性が劣
る。
The above conditions are changed depending on the material, dimensions and shape of the base material. In the case of this embodiment, if the above conditions are not satisfied, the adhesion of the film and the characteristics of the film are inferior.

【0035】この条件によって得られた膜は、硬度がH
v=1700〜2000であり、得られた膜の厚さは1
0μmであった。
The film obtained under these conditions has a hardness of H
v = 1700-2000, and the thickness of the obtained film is 1
It was 0 μm.

【0036】表2に従来の金型との使用上の比較例を示
す。寿命については実際にパンチをした際に金型の離れ
が悪くなった際の成型品のショット数で本発明と従来金
型の比較を行ったものである。
Table 2 shows a comparative example in use with a conventional mold. The service life is a comparison between the present invention and the conventional mold based on the number of shots of the molded product when the separation of the mold deteriorates when the punch is actually performed.

【0037】表2は、種々の材質の金型及びパンチの使
用寿命を示す。
Table 2 shows the service life of dies and punches of various materials.

【0038】[0038]

【表2】 [Table 2]

【0039】なお、表2において、例えば寿命倍率10
<とは従来のものに比べ寿命が10倍延びたことを示
す。また、SKD(HQT)は、焼入・焼戻しのSKD
材を示す。
Note that, in Table 2, for example, a life magnification of 10
<Indicates that the life was extended 10 times as compared with the conventional one. SKD (HQT) is the SKD of quenching and tempering.
Shows the material.

【0040】以下本発明の被膜を自動2輪車及び自動4
輪車等のエンジン及び変速機に使用される摩擦摩耗部品
に適用した本発明の他の実施例を説明する。
The coating of the present invention is applied to a motorcycle and
Another embodiment of the present invention applied to a friction and wear part used for an engine such as a wheeled vehicle and a transmission will be described.

【0041】比較例3,4,5としてはイオンプレーテ
ィングしたTiN膜とCrN膜及び電解硬質クロムメッ
キの膜を用いた。
As Comparative Examples 3, 4, and 5, an ion-plated TiN film and a CrN film and a film of electrolytic hard chromium plating were used.

【0042】摩擦係数及び耐焼き付き性については、図
2に示すような、ファビリー試験機を用いて行った。即
ち、直径6.4mmのSCM415に浸炭焼き入れ、焼
き戻し研磨仕上げしたテストピン10に、夫々10μm
の本発明被膜を着け、SCM415に浸炭焼き入れ、焼
き戻し表面研磨仕上げしたVブロック11を用い、締付
け荷重を0から25kg/秒で増加する試験を行った。
試験は油中で実施し、このときの摩擦係数と耐焼付き荷
重を評価した。表3にその結果を示す。
The friction coefficient and the seizure resistance were measured using a Fabry tester as shown in FIG. That is, the test pins 10 which were carburized and quenched in SCM415 having a diameter of 6.4 mm and tempered and polished were each 10 μm thick.
A test was conducted in which the tightening load was increased from 0 to 25 kg / sec using a V-block 11 which was provided with the coating of the present invention, carburized and quenched in SCM415, and tempered and polished.
The test was performed in oil, and the coefficient of friction and the seizure resistance at this time were evaluated. Table 3 shows the results.

【0043】[0043]

【表3】 [Table 3]

【0044】また、本発明被膜を摩擦摩耗部品である自
動2輪車用シフトフォークに適用することを考慮して、
摩擦摩耗試験を行ない、本発明品の摩耗量を比較例6〜
9のそれと比較した。この時の被膜条件は、母材がSC
M415の浸炭焼き入れ焼き戻し品を研磨ラップ仕上し
表面粗さをRa0.2に調整し、この上に本発明被膜を
5〜10μm厚さで処理した。また、摩擦摩耗試験は実
際の自動2輪車ではシフトフォークの相手方の材料(シ
フター)との摩擦摩耗を調べるのであるが、ここでは、
摩擦摩耗試験としてプレイトオンディスク試験を行な
い、シフターに相当する部分の表面処理は、機械加工
し、浸炭し,ショットブラスト処理したものを用いた。
In consideration of applying the coating of the present invention to a motorcycle shift fork which is a friction and wear part,
A friction wear test was performed to determine the wear amount of the product of the present invention in Comparative Examples 6 to
Compared to 9 At this time, the coating conditions are as follows:
An M415 carburized, quenched and tempered product was finished with a polishing lap to adjust the surface roughness to Ra 0.2, and the coating of the present invention was treated thereon to a thickness of 5 to 10 μm. In a friction and wear test, the friction and wear of a shift fork with a material (shifter) on the other side of an actual motorcycle are examined.
A plate-on-disk test was performed as a friction and wear test, and the surface treatment of a portion corresponding to the shifter was performed by machining, carburizing, and shot blasting.

【0045】本発明で用いた摩擦摩耗試験では、シフタ
ーに相当するターンテーブルの上に、シフトフォークに
相当する被処理品を所定の荷重で押圧した状態でターン
テーブルのみを所定時間回転させた後、被処理品の摩耗
量を測定し、この摩耗量を試験片の摩擦面の被膜の膜厚
の減少量として評価する。
In the friction and wear test used in the present invention, after the workpiece corresponding to the shift fork is pressed with a predetermined load on the turntable corresponding to the shifter, only the turntable is rotated for a predetermined time, Then, the wear amount of the article to be treated is measured, and this wear amount is evaluated as the amount of decrease in the film thickness of the film on the friction surface of the test piece.

【0046】具体的には、被処理品:SCM415の母
材を浸炭焼き入れ焼き戻しした後に、研磨ラップ仕上げ
し、表面粗さをRa=0.2に調整し、この上に本発明
の方法によって得られる窒素含有被膜を5μm厚さでつ
けたものを試験品として用い、相手方のターンテーブル
には、被処理品と接触する面の表面を機械加工仕上げの
後、浸炭を行ない、ショットブラスト処理によって得ら
れたものを用いた。なお、荷重負荷は80Kgf,すべ
り速度は13m/sec,時間は20時間とした。
Specifically, after the base material of the article to be treated: SCM415 is carburized, quenched and tempered, it is finished with a polishing lap, the surface roughness is adjusted to Ra = 0.2, and the method of the present invention is further carried out. The nitrogen-containing coating obtained by the above method is applied as a test product with a thickness of 5 μm. The other turntable is machined on the surface in contact with the workpiece, then carburized and shot blasted. The one obtained by was used. The load was 80 kgf, the sliding speed was 13 m / sec, and the time was 20 hours.

【0047】摩擦条件は、最大荷重80kgf、すべり
速度最大13m/秒で20時間の耐久試験を実施した。
As for friction conditions, a durability test was carried out at a maximum load of 80 kgf and a maximum sliding speed of 13 m / sec for 20 hours.

【0048】試験後の評価は、摩擦面の摩耗量を膜厚の
減少量として評価した。本評価結果を表4に示す。
In the evaluation after the test, the amount of wear on the friction surface was evaluated as the amount of decrease in film thickness. Table 4 shows the evaluation results.

【0049】[0049]

【表4】 [Table 4]

【0050】表4中に比較例6として硬質クロムメッキ
(膜厚30μm)、比較例7としてイオンプレーティン
グ製(以下IPと略す)TiN(膜厚5μm)、比較例
8としてIP製CrN(膜厚6μm)及び比較例9とし
てMo溶射(膜厚100μm)品を用いた。
In Table 4, hard chromium plating (thickness: 30 μm) was used as Comparative Example 6, TiN (film thickness: 5 μm) made by ion plating was used as Comparative Example 7, and CrN (film was made) was used as Comparative Example 8: Mo-sprayed (film thickness: 100 μm) product was used as Comparative Example 9 (thickness: 6 μm).

【0051】[0051]

【発明の効果】上記のように本発明の機械部材によれ
ば、機械部材の寿命を大きく延ばすことができるのみな
らず、その離型性も向上し、資源の有効的活用と公害問
題の軽減にも大きく貢献できる等大きな利益がある。
As described above, according to the mechanical member of the present invention, not only the life of the mechanical member can be greatly extended, but also the releasability is improved, and the effective use of resources and reduction of pollution problems are achieved. Has a great benefit, such as making a significant contribution to

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の機械部材の表面処理装置の説明図であ
る。
FIG. 1 is an explanatory view of a surface treating apparatus for a mechanical member of the present invention.

【図2】ファビリー試験機の説明図である。FIG. 2 is an explanatory diagram of a Fabry test machine.

【符号の説明】[Explanation of symbols]

1 真空処理室 2 真空ポンプ 3 回転テーブル 4 被処理金型 5 治具 6 クロムターゲット 7 スパッタ電源 8 直流のバイアス電源 9 ガス導入パイプ 10 テストピン 11 Vブロック 12 駆動機 13 シアーピン DESCRIPTION OF SYMBOLS 1 Vacuum processing chamber 2 Vacuum pump 3 Rotary table 4 Die to be processed 5 Jig 6 Chromium target 7 Sputter power supply 8 DC bias power supply 9 Gas introduction pipe 10 Test pin 11 V block 12 Drive unit 13 Shear pin

───────────────────────────────────────────────────── フロントページの続き (72)発明者 山形 博 神奈川県横浜市泉区中田北三丁目3−8− 104号 (72)発明者 野上 曜 神奈川県横浜市泉区中田北三丁目3−8− 205号 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Hiroshi Yamagata 3-3-104 Nakatakita, Izumi-ku, Yokohama-shi, Kanagawa Prefecture (72) Inventor You No 3-3-205 Nakatakita, Izumi-ku, Yokohama-shi, Kanagawa 205 issue

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 CrX Y 結晶が点在することを特徴と
する窒素含有Cr被膜。
1. A nitrogen-containing Cr coating characterized by scattered Cr X N Y crystals.
【請求項2】 上記CrX Y 結晶は100原子当たり
50〜99のクロム原子及び50〜1の窒素原子を含む
ことを特徴とする請求項1記載の窒素含有Cr被膜。
2. The nitrogen-containing Cr coating according to claim 1, wherein said Cr X N Y crystal contains 50 to 99 chromium atoms and 50 to 1 nitrogen atoms per 100 atoms.
【請求項3】 窒素の雰囲気中でクロムをスパッタリン
グすることによってCrX Y 結晶が点在する窒素含有
Cr被膜を形成することを特徴とする窒素含有Cr被膜
の製造方法。
3. A method for producing a nitrogen-containing Cr coating, comprising forming a nitrogen-containing Cr coating in which Cr X N Y crystals are scattered by sputtering chromium in a nitrogen atmosphere.
【請求項4】 上記スパッタリングを行うに際し、イオ
ンボンバード処理を行うことを特徴とする請求項3記載
の窒素含有Cr被膜の製造方法。
4. The method for producing a nitrogen-containing Cr film according to claim 3, wherein an ion bombardment treatment is performed during the sputtering.
【請求項5】 CrX Y 結晶が点在する窒素含有Cr
被膜をその表面に形成したことを特徴とする機械部材。
5. Nitrogen-containing Cr in which Cr X N Y crystals are interspersed
A mechanical member having a coating formed on its surface.
【請求項6】 上記CrX Y 結晶は100原子当り5
0〜99のクロム原子及び50〜1の窒素原子を含むこ
とを特徴とする請求項5記載の機械部材。
6. The Cr X N Y crystal according to claim 5, wherein said crystal is 5 x 100 atoms.
6. The mechanical member according to claim 5, comprising 0 to 99 chromium atoms and 50 to 1 nitrogen atoms.
JP33024198A 1997-11-06 1998-11-06 Method for producing nitrogen-containing Cr coating Expired - Lifetime JP3954739B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33024198A JP3954739B2 (en) 1997-11-06 1998-11-06 Method for producing nitrogen-containing Cr coating

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-319181 1997-11-06
JP31918197 1997-11-06
JP33024198A JP3954739B2 (en) 1997-11-06 1998-11-06 Method for producing nitrogen-containing Cr coating

Related Child Applications (1)

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JP2006281965A Division JP4877502B2 (en) 1997-11-06 2006-10-16 Nitrogen-containing Cr coating and mechanical member having this coating

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JPH11217666A true JPH11217666A (en) 1999-08-10
JP3954739B2 JP3954739B2 (en) 2007-08-08

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Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006283055A (en) * 2005-03-31 2006-10-19 Dowa Mining Co Ltd Nitrogen-containing vanadium film, manufacturing method therefor and machine component
JP2007031797A (en) * 2005-07-28 2007-02-08 Dowa Holdings Co Ltd Diamond-like carbon coated member, and its manufacturing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010163694A (en) * 1997-11-06 2010-07-29 Dowa Holdings Co Ltd NITROGEN-CONTAINING Cr FILM, AND MACHINE MEMBER HAVING THE FILM

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006283055A (en) * 2005-03-31 2006-10-19 Dowa Mining Co Ltd Nitrogen-containing vanadium film, manufacturing method therefor and machine component
JP2007031797A (en) * 2005-07-28 2007-02-08 Dowa Holdings Co Ltd Diamond-like carbon coated member, and its manufacturing method

Also Published As

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