JPH11217524A - Specially brilliant foil powder and its production - Google Patents

Specially brilliant foil powder and its production

Info

Publication number
JPH11217524A
JPH11217524A JP3675498A JP3675498A JPH11217524A JP H11217524 A JPH11217524 A JP H11217524A JP 3675498 A JP3675498 A JP 3675498A JP 3675498 A JP3675498 A JP 3675498A JP H11217524 A JPH11217524 A JP H11217524A
Authority
JP
Japan
Prior art keywords
foil powder
layer
thickness
resin
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3675498A
Other languages
Japanese (ja)
Other versions
JP3732644B2 (en
Inventor
Shuichi Araki
修一 荒木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oike and Co Ltd
Original Assignee
Oike and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oike and Co Ltd filed Critical Oike and Co Ltd
Priority to JP03675498A priority Critical patent/JP3732644B2/en
Publication of JPH11217524A publication Critical patent/JPH11217524A/en
Application granted granted Critical
Publication of JP3732644B2 publication Critical patent/JP3732644B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To produce an extremely thin, flat, microfine foil powder that has iris-like specially brilliant and esthetical appearance and to provide its production method. SOLUTION: This is a foil powder that is prepared by laminating resin layers of a 0.2-5 μm thickness on both faces of a metallic thin layer (c) with a thickness of 10-300 nm in which at least one layer of the resin layers has a holographically processed surface. The specially brilliant foil powder is produced by forming at least an undercoat resin layer (b), a metallic thin layer (c), and a top coat resin layer (d) on a specially brilliant foil powder and a releasable base film (a), then releasing the base film to prepare a laminated body other than the base film. The resultant laminate body is crushed to give the objective foil powder in which at least one surface of (b) and (d) is subjected to the holographic processing.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ホログラムによる
金属薄膜の光輝性が特殊光輝性を発揮する箔または粉、
およびその製法に関する。
TECHNICAL FIELD The present invention relates to a foil or powder in which the luminosity of a metal thin film formed by a hologram exhibits a special luminosity.
And its manufacturing method.

【0002】[0002]

【従来の技術】従来、ホログラム加工されたフイルム基
材に金属薄膜を設けた積層体、またはこの積層体からの
細片や、グリッター、または転写箔が知られている。
2. Description of the Related Art Hitherto, there has been known a laminate in which a metal thin film is provided on a hologram-processed film substrate, or a strip, a glitter, or a transfer foil from the laminate.

【0003】[0003]

【発明が解決しようとする課題】前記した従来からの、
ホログラムと金属薄膜とによる特殊光輝性を有する細片
やグリッターは、フイルム基材と一体に細片化されたも
のでありフイルム基材の厚さを伴う分厚いものであっ
た。このためこれらの細片、グリッターを塗料に使用し
て塗装したとき塗装表面の平滑性に問題が多かった。ま
た、転写箔を利用したものは、平面等には使用できても
曲面部分特に、鋭角を有する曲面には、転写時に亀裂が
発生し折角の特殊光輝性を損なう場合が多かった。
SUMMARY OF THE INVENTION
Strips and glitters having special glittering properties due to the hologram and the metal thin film were formed into thin pieces integrally with the film base, and were thick with the thickness of the film base. For this reason, when these small pieces and glitter were used for coating, there were many problems in the smoothness of the coated surface. In addition, when the transfer foil is used, it can be used for a flat surface or the like, but a curved portion, particularly a curved surface having an acute angle, often has a crack at the time of transfer and impairs the special brilliancy of the bending angle.

【0004】本発明は、前記従来のホログラムと金属薄
膜とによる装飾材の有する問題点を解決し、いかなる曲
面にも対応しうる塗料に使用できる、しかも、箔粉とし
て極めて薄く、表面平滑性に影響を及ぼさない塗料の材
料等に使用できる等の特殊光輝性装飾材としての箔粉、
およびその製法を提供するものである。
[0004] The present invention solves the above-mentioned problems of the decorative material using the hologram and the metal thin film, and can be used for a paint that can be applied to any curved surface. Foil powder as a special bright decorative material, such as it can be used for paint materials that do not affect
And a method for producing the same.

【0005】[0005]

【課題を解決するための手段】すなわち本発明は、厚さ
10−300nm金属薄膜層(c)の、両面に厚さ0.
5−5ミクロンメーター(以下ミクロンと略記する)の
樹脂層が設けられた積層体からなる箔粉であって、樹脂
層の少なくとも一層がホログラム加工された面を有する
ことを特徴とする特殊光輝性箔粉であり、金属薄膜層
(c)の厚さが、20−150nmである前記の特殊光
輝性箔粉であり、樹脂層の厚さが0.3−3ミクロンで
ある前記の特殊光輝性箔粉である。また、剥離性ベース
フイルム(a)に、少なくともアンダーコート樹脂層
(b)、金属薄膜層(c)、トップコート樹脂層(d)
を形成し、後剥離性ベースフイルムを剥離し、少なくと
もbcdからなる積層体を得て、この積層体を粉砕によ
り箔粉を得るに際し、bdの少なくとも一面にホログラ
ム加工を施してなることを特徴とする特殊光輝性箔粉の
製法である。
That is, according to the present invention, a metal thin film layer (c) having a thickness of 10 to 300 nm has a thickness of 0.1 mm on both sides.
A special brilliancy which is a foil powder comprising a laminate provided with a resin layer of 5 to 5 micrometer (hereinafter abbreviated as "micron"), wherein at least one of the resin layers has a hologram-processed surface. The special glittering powder, wherein the thickness of the metal thin film layer (c) is 20-150 nm; and the special glittering property, wherein the thickness of the resin layer is 0.3-3 μm. It is foil powder. Further, at least an undercoat resin layer (b), a metal thin film layer (c), and a top coat resin layer (d) are formed on the peelable base film (a).
Is formed, a post-peelable base film is peeled off, a laminate comprising at least bcd is obtained, and at the time of obtaining a foil powder by pulverizing the laminate, hologram processing is performed on at least one surface of the bd. This is a method of producing special glittering foil powder.

【0006】[0006]

【発明の実施態様】本発明の剥離性ベースフイルム
(a)としては、ポリテトラフルオロエチレン、ポリエ
チレン、ポリプロピレン、ポリエチレンテレフタレー
ト,ポリエチレンナフタレート等のポリエステルフイル
ム、66ナイロン、6ナイロン等のポリアミドフイルム、
ポリカーボネートフイルム、トリアセテートフイルム、
ポリイミドフイルム等が挙げられるが特に限定されるも
のではない。これらの剥離性ベースフイルムは、アンダ
ーコート層や必要によって追加される樹脂層との関係で
剥離性が不十分な時にはこれらの層形成前に、シリコー
ン樹脂等の剥離層を予め形成したものでもよい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The peelable base film (a) of the present invention includes polyester films such as polytetrafluoroethylene, polyethylene, polypropylene, polyethylene terephthalate and polyethylene naphthalate; polyamide films such as 66 nylon and 6 nylon;
Polycarbonate film, triacetate film,
A polyimide film or the like may be used, but is not particularly limited. These peelable base films may be those in which a release layer of a silicone resin or the like is previously formed before formation of these layers when the peelability is insufficient in relation to the undercoat layer and the resin layer added as necessary. .

【0007】これらのフイルムの厚さは4ミクロンから
120ミクロンであり、4ミクロンに満たないものは、
金属薄膜形成工程等での取り扱い性に問題が多く、12
0ミクロンを超えると、柔軟性に乏しくなりまた剥離性
ベースフイルムを剥離する剥離工程で取り扱い性に問題
が多くなる。これらフイルムの厚さは6ミクロンから8
0ミクロンが特に好ましいものである。
[0007] The thickness of these films is from 4 microns to 120 microns, and less than 4 microns
There are many problems in handling properties in the metal thin film forming process and the like.
If the thickness exceeds 0 μm, the flexibility becomes poor, and the handling property is increased in the peeling step of peeling the peelable base film. The thickness of these films is from 6 microns to 8
0 microns is particularly preferred.

【0008】本発明に用いられるアンダーコート層に使
用される塗料としては、例えばアクリル系樹脂、塩ビ・
酢ビ共重合体樹脂、エポキシ樹脂、ウレタン樹脂、ポリ
ビニルブチラール樹脂、セルロースアセテート樹脂、ニ
トロセルロース樹脂、ロジン変性マレイン酸樹脂、尿素
樹脂、メラミン樹脂、ノボラック型フェノール樹脂、シ
ェラック樹脂等の天然樹脂またはそれらの変性樹脂、ポ
リビニルアルコール、ナトリウムカルボキシメチルセル
ロース、カゼイン、でん粉、高級脂肪酸ソーダ塩の、一
種または二種以上の混合物の溶剤溶液が挙げられるがこ
れらに限定されるものではない。前記溶剤としては、ト
リクロロエチレン、メチルエチルケトン、メチルイソブ
チルケトン、酢酸エチル、酢酸ブチル、メタノール、エ
タノール、アソプロパノール、nブタノール、キシレ
ン、トルエン、セロソルブ等が挙げられるがこれらに限
定されるものではない。さらに塗料には、可塑剤や粘度
調節剤などを添加含有せしめてもよい。
[0008] As the paint used for the undercoat layer used in the present invention, for example, acrylic resin, vinyl chloride,
Natural resins such as vinyl acetate copolymer resin, epoxy resin, urethane resin, polyvinyl butyral resin, cellulose acetate resin, nitrocellulose resin, rosin-modified maleic resin, urea resin, melamine resin, novolac phenol resin, shellac resin and the like But not limited thereto, a solvent solution of one or a mixture of two or more of modified resins, polyvinyl alcohol, sodium carboxymethyl cellulose, casein, starch, and higher fatty acid soda salts. Examples of the solvent include, but are not limited to, trichloroethylene, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, butyl acetate, methanol, ethanol, asopropanol, n-butanol, xylene, toluene, cellosolve and the like. Further, a plasticizer or a viscosity modifier may be added to the paint.

【0009】アンダーコート層(トップコート層も同様
に)の厚さは0.2−5ミクロンであり好ましくは0.
3−3.0ミクロンであり、さらに好ましくは0.5−
1.5ミクロンである。0.2ミクロンに満たないとき
は、金属箔膜の保護に対して効果が小さく、5ミクロン
を超える場合は保護効果に対してもさほど増大せずかつ
経済的にも不利となり、なによりも最終的に得られる箔
粉の厚さが大きくなりすぎて本発明の目的に沿わないも
のとなる。これらのアンダーコート層、トップコート層
は上記したような樹脂を適宜選択して使用されるが、箔
粉の表面を改質しようとするときは、金属薄膜の光輝性
を保持したまま、樹脂の選択または樹脂への特性改良
剤、たとえば着色料、親水性付与剤、滑剤等を添加して
容易に実施しうる。さらに、アンダーコート層、トップ
コート層以外に、着色層、保護層等の層を追加して設け
てもよい。
[0009] The thickness of the undercoat layer (as well as the topcoat layer) is 0.2-5 microns, preferably 0.1-0.
3-3.0 microns, more preferably 0.5-
1.5 microns. When the thickness is less than 0.2 μm, the effect on the protection of the metal foil film is small, and when it exceeds 5 μm, the protection effect does not increase so much and becomes economically disadvantageous. The thickness of the finally obtained foil powder becomes too large and does not meet the object of the present invention. The undercoat layer and the top coat layer are used by appropriately selecting the above-described resin, but when the surface of the foil powder is to be modified, while maintaining the glitter of the metal thin film, Selection or addition of a property improving agent to the resin, for example, a coloring agent, a hydrophilicity-imparting agent, a lubricant or the like can be easily carried out. Further, in addition to the undercoat layer and the topcoat layer, layers such as a coloring layer and a protective layer may be additionally provided.

【0010】本発明の箔粉におけるホログラム加工面の
例として、前記アンダーコート層(トップコート層も同
様に)の上にホログラム加工を施すが、その加工方法は
限定はされないが、微細加工用のポジ型フォトレジスト
を使用し、レーザー光により光の干渉縞を微細な凹凸と
して原版に刻印し賦型版を作製し、この賦型版をアンダ
ーコート層に密着し熱圧して該凹凸をアンダーコート層
の金属蒸着薄膜形成面に転写する方法が挙げられる。こ
の微細な凹凸としては、約0.1−0.2ミクロンの深
さのものであり、適宜微調整しうるものである。ホログ
ラム加工面の箔粉内での樹脂層面に存在する位置は、層
間相互の関係から見て表現すれば、上記したようにア
ンダーコート層と金属薄膜との間、またはアンダーコ
ート層と剥離性ベースフイルムとの間、または金属薄
膜層とトップコート層との間、またはトップコート層
の金属薄膜層側と反対の側、それにアンダーコート
層、トップコート層以外に必要に応じて追加される樹脂
層のいずれの面にあってもよいものであるが、箔粉製造
工程上また光輝性の点から好ましくはの場合である。
As an example of the hologram processing surface of the foil powder of the present invention, hologram processing is performed on the undercoat layer (similarly for the top coat layer). Using a positive type photoresist, laser light is used to imprint the interference fringes on the original plate as fine irregularities as a fine unevenness, and the imprinting plate is adhered to the undercoat layer and hot pressed to undercoat the unevenness. A method of transferring the layer to the surface on which the metal vapor deposition thin film is formed is exemplified. The fine irregularities have a depth of about 0.1 to 0.2 microns and can be finely adjusted as appropriate. The position existing on the resin layer surface in the foil powder on the hologram processing surface can be expressed in terms of the mutual relation between the layers, as described above, between the undercoat layer and the metal thin film, or between the undercoat layer and the peelable base. Between the film, or between the metal thin film layer and the top coat layer, or on the side of the top coat layer opposite to the metal thin film layer side, a resin layer added as necessary other than the undercoat layer and the top coat layer However, this is the preferred case in terms of the foil powder production process and from the viewpoint of glitter.

【0011】ホログラム加工されたアンダーコート層上
に虹彩状の特殊光輝を高めるために金属薄膜層を形成す
る。金属薄膜形成のための金属としては、金、銀、アル
ミニウム、ニッケル、錫、クロム、亜鉛等が使用される
がこれらに限定されるものではなく、前記金属の混合に
よる合金などまたこれら金属の酸化物、等から反射性、
透過性を調整して、適宜選定使用すればよい。またこれ
らの金属薄膜層の厚さは、10−300nmの範囲が好
ましく、10nmに満たないときは、光輝性においてそ
の性能は乏しく、300nmを超えるときは、これ以上
厚さを大きくしても反射性、光輝性等の影響が少ない上
に経済的にも得策ではない。該薄膜層の厚さは、特に好
ましくは20−150nmの範囲である。
A metal thin film layer is formed on the hologram-processed undercoat layer in order to enhance iris-like special brightness. As the metal for forming the metal thin film, gold, silver, aluminum, nickel, tin, chromium, zinc and the like are used, but not limited thereto, alloys of the above-mentioned metals mixed, and oxidation of these metals. Reflective from objects, etc.
The transmittance may be adjusted and appropriately selected and used. The thickness of these metal thin film layers is preferably in the range of 10-300 nm, and when it is less than 10 nm, its performance is poor in brilliancy. It is not economically advantageous in addition to being less affected by the properties and brilliancy. The thickness of the thin film layer is particularly preferably in the range of 20-150 nm.

【0012】この金属薄膜層の剥離性フイルム上(直接
にはアンダーコート層)への形成は、その方法において
特に限定されるものではなく、蒸着、スパッタリング、
イオンプレーテイングなど乾式薄膜形成法が好ましい。
この金属薄膜層薄膜形成後、トップコート層を形成す
る。トップコート層形成は前記したアンダーコート層作
製時の塗料を適宜選択して使用する。トップコート層、
アンダーコート層に加えて必要に応じて、これ以外の樹
脂層を別途形成してもよいが、最終的箔粉の厚みが8ミ
クロン、好ましくは6ミクロンを超えない範囲で形成使
用されなくてはならないものである。本発明において
は、例として上記したように、剥離性ベースフイルム、
アンダーコート層、アンダーコート層上のホログラム加
工面、該加工面上の金属薄膜層、トップコート層からな
る積層体Aが得られ、該積層体Aから剥離性ベースフイ
ルムのみを剥離して箔粉を構成する、アンダーコート
層、アンダーコート層上のホログラム加工面、該加工面
うえの金属薄膜層、トップコート層からなる積層体Bを
得て、この積層体Bを粉砕して箔粉を得る。
The method of forming the metal thin film layer on the peelable film (directly, the undercoat layer) is not particularly limited in the method.
A dry thin film forming method such as ion plating is preferred.
After forming the metal thin film layer, a top coat layer is formed. The top coat layer is formed by appropriately selecting and using the above-mentioned paint for preparing the undercoat layer. Top coat layer,
If necessary, other resin layers may be separately formed in addition to the undercoat layer. However, the final foil powder must be formed and used in a thickness not exceeding 8 microns, preferably not exceeding 6 microns. It must not be. In the present invention, as described above as an example, a peelable base film,
A laminate A comprising an undercoat layer, a hologram processed surface on the undercoat layer, a metal thin film layer on the processed surface, and a top coat layer is obtained, and only the peelable base film is peeled off from the laminate A to obtain a foil powder. To obtain a laminate B composed of an undercoat layer, a hologram processed surface on the undercoat layer, a metal thin film layer on the processed surface, and a top coat layer, and pulverize the laminate B to obtain foil powder. .

【0013】剥離方法としては特に限定されないが、好
ましい一例を下記する。長尺の積層体Aの巻き上げ体で
あるロールAを、巻き戻しながら、巻き戻し方向に直交
して設けられたガイドバーにより剥離性ベースフイルム
のみがこのガイドバーを挟み込むようにして折り返され
て且つ延伸されながら巻き上げられる。該フイルムの延
伸によって、積層体Bが剥離性ベースフイルムの延伸に
追随できずかつその界面が剥離性であるため剥離性ベー
スフイルムから剥離される。剥離された積層体Bは剥離
性ベースフイルムが巻き上げられる方向とはほぼ反対方
向に剥離され集積される。集積された積層体は適宜の大
きさに粉砕される。上記したように好ましい剥離方法に
適応されるために、剥離性ベースフイルムは、0.1−
50%ていどの伸度を有するフイルムであることが望ま
しく、例えば無延伸または未延伸のポリプロピレンフイ
ルム等が挙げられる。延伸時には適宜加熱してもよい。
The method of peeling is not particularly limited, but a preferred example is described below. While rewinding the roll A, which is a rolled-up body of the long laminate A, only the peelable base film is folded back by the guide bar provided orthogonal to the rewinding direction so as to sandwich the guide bar, and It is wound up while being stretched. Due to the stretching of the film, the laminate B cannot follow the stretching of the peelable base film, and is peeled from the peelable base film because its interface is peelable. The peeled laminate B is peeled and collected in a direction substantially opposite to the direction in which the peelable base film is wound up. The stacked body is pulverized to an appropriate size. In order to be adapted to the preferred peeling method as described above, the peelable base film has a thickness of 0.1-.
A film having an elongation of 50% is desirable, and examples thereof include a non-stretched or unstretched polypropylene film. During stretching, heating may be performed as appropriate.

【0014】積層体Bとして得られた箔粉の前駆体を粉
砕して本発明の箔粉を得る。粉砕方法としては、特に限
定されないが、ジェットミル、ボールミル、リングロー
ルミル、ハンマーミル、チューブミルナドが挙げられ
る。かくして得られた箔粉は、篩い分けなどにより各粒
度の偏平箔粉とする。偏平箔粉の偏平面での最大平均長
さが5ミクロン微細箔粉から偏平面での最大平均長さが
数センチメーターの箔まで、しかもいずれも厚さが8ミ
クロンまでの箔粉や箔が、任意に得ることが出来る。本
発明の箔粉は極めて薄いものであり、印刷インク、塗料
等に使用されるが、塗布または印刷される表面に該箔粉
の表面が平行に配列され極めて薄い塗布量または印刷量
であっても美麗な、平滑性に優れた、耐摩耗性にも優れ
た膜面を形成する。本発明の箔粉は、一般的に、従来の
粉末(金属等)を使用した場合にくらべて10−50倍
の隠蔽能力を有するものであり、使用料は10分の1か
ら50分の1ですむことになる。
The precursor of the foil powder obtained as the laminate B is crushed to obtain the foil powder of the present invention. The pulverizing method is not particularly limited, and examples thereof include a jet mill, a ball mill, a ring roll mill, a hammer mill, and a tube mill nad. The foil powder thus obtained is made into flat foil powder of each particle size by sieving or the like. The maximum average length of the flat foil powder on the flat surface is 5 micron, and the maximum average length on the flat surface is several centimeters. , Can be obtained arbitrarily. The foil powder of the present invention is extremely thin, and is used for printing inks, paints, etc., but the surface of the foil powder is arranged in parallel to the surface to be applied or printed, and the amount of coating or printing is extremely thin. Also, it forms a beautiful film surface with excellent smoothness and excellent wear resistance. The foil powder of the present invention generally has 10-50 times the concealing ability as compared with the case where a conventional powder (metal or the like) is used, and the usage fee is 1/10 to 1/50. That would be fine.

【0015】[0015]

【実施例】**実施例1 厚さ30ミクロンの未延伸ポリプロピレンフイルム
(a)に、塩ビ・酢ビ共重合樹脂20部(重量部、以下
同じ)、酢酸エチル25部、メチルエチルケトン25
部、トルエン30部からなる塗料をグラビヤ方式で塗布
し、厚さ1ミクロンのアンダーコート層(b)を形成し
た。このアンダーコート層(b)のフイルム(a)と反
対の面を以下のホログラム加工をした。O−ナフトキノ
ンジアジド系化合物を感光材料とするポジ型フォトレジ
ストを作製し、レーザー光で光の干渉縞を微細な凹凸と
して原版に刻印し賦型版とし、アンダーコート層(b)
のフイルム(a)と反対の面に該凹凸を熱圧転写した。
得られた凹凸面に、真空蒸着機においてアルミニウムを
80nmの厚さに金属薄膜層(c)として蒸着形成し
た。得られたこのアルミニウム金属薄膜層(c)に、ト
ップコート層(d)として前記のアンダーコート層と同
じ塗料を使用して同様に1ミクロン厚さの樹脂層を形成
した。。こうして虹彩様の特殊光輝性の長尺ロール積層
体(A)を得、トップコート層(d)側を下にして該長
尺ロール積層体(A)を、巻き戻し方向に直交して配さ
れたガイドバーの下側を通過させながら巻き戻し、フイ
ルム(a)のみをこのガイドバーを挟み込むようにし5
%延伸を施しながら上向きに巻き戻し、他のbcdから
なる積層体Bをフイルム(a)と反対側に剥離し振り落
とし集積した。得られた積層体Bを粉砕し篩い分け、平
均最長片長さで10ミクロン、厚さ2ミクロンの偏平な
特殊光輝性の美麗な箔粉を得た。
EXAMPLES ** Example 1 An unstretched polypropylene film (a) having a thickness of 30 μm, 20 parts (by weight, hereinafter the same) of polyvinyl chloride / vinyl acetate copolymer resin, 25 parts of ethyl acetate, 25 parts of methyl ethyl ketone
And a coating of 30 parts of toluene were applied by a gravure method to form an undercoat layer (b) having a thickness of 1 micron. The surface of the undercoat layer (b) opposite to the film (a) was subjected to the following hologram processing. A positive photoresist using an O-naphthoquinonediazide-based compound as a photosensitive material is produced, and an interference fringe of light is engraved on a master as fine irregularities by a laser beam to form a mold, and an undercoat layer (b)
Was transferred by heat and pressure to the surface opposite to the film (a).
Aluminum was vapor-deposited and formed on the obtained uneven surface as a metal thin film layer (c) to a thickness of 80 nm using a vacuum vapor deposition machine. A resin layer having a thickness of 1 micron was similarly formed on the obtained aluminum metal thin film layer (c) as the top coat layer (d) using the same paint as the undercoat layer. . In this way, a long roll laminate (A) having an iris-like special brilliancy is obtained, and the long roll laminate (A) is disposed with the top coat layer (d) side down, orthogonal to the rewinding direction. The film (a) is rewound while passing through the lower side of the guide bar.
The laminate B made of another bcd was peeled off on the side opposite to the film (a), shaken off, and accumulated. The obtained laminate B was pulverized and sieved to obtain a beautiful flat glittering foil powder having an average longest piece length of 10 μm and a thickness of 2 μm.

【0016】**実施例2 厚さ20ミクロンの未延伸ポリプロピレンフイルム
(a)に、ポリウレタン樹脂20部、酢酸エチル30
部、トルエン30部、エチルアルコール20部からなる
塗料を使用してグラビヤ方式で厚さ1ミクロンのアンダ
ーコート層(b)を形成した。以下実施例1と同じよう
に、ホログラム加工、アルミニウム金属薄膜層(c)の
形成、トップコート層(d)の形成を実施し、実施例1
と同様にして箔粉を得た。
** Example 2 20 parts of a polyurethane resin and 30 parts of ethyl acetate were added to an unstretched polypropylene film (a) having a thickness of 20 μm.
1 part of toluene, 30 parts of ethyl alcohol, and 20 parts of ethyl alcohol, a 1 micron thick undercoat layer (b) was formed by a gravure method. The hologram processing, the formation of the aluminum metal thin film layer (c), and the formation of the top coat layer (d) were carried out in the same manner as in Example 1.
A foil powder was obtained in the same manner as described above.

【0017】[0017]

【発明の効果】本発明の特殊光輝性箔粉は、ホログラム
と金属薄膜とによる虹彩様の特殊光輝性外観を有し、か
つ極めて薄い偏平な微細箔粉であるため、塗料として、
インクとして特殊光輝性の装飾に極めて広く使用するこ
とが出来る。
The special glittering foil powder of the present invention has an iris-like special glittering appearance by a hologram and a metal thin film and is an extremely thin flat fine foil powder.
It can be used very widely for special glitter decoration as ink.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 厚さ10−300nm金属薄膜層(c)
の、両面に厚さ0.2−5ミクロンメーターの樹脂層が
設けられた積層体からなる箔粉であって、樹脂層の少な
くとも一層がホログラム加工された面を有することを特
徴とする特殊光輝性箔粉。
1. A metal thin film layer (c) having a thickness of 10 to 300 nm.
A foil powder comprising a laminate having a resin layer having a thickness of 0.2-5 μm on both surfaces thereof, wherein at least one of the resin layers has a hologram-processed surface. Foil powder.
【請求項2】 金属薄膜層(c)の厚さが、20−15
0nmである請求項1記載の特殊光輝性箔粉。
2. The thickness of the metal thin film layer (c) is 20-15.
The special glitter foil powder according to claim 1, which has a thickness of 0 nm.
【請求項3】 樹脂層の厚さが0.3−3ミクロンメー
ターである請求項1記載の特殊光輝性箔粉。
3. The special glitter foil powder according to claim 1, wherein the thickness of the resin layer is 0.3-3 μm.
【請求項4】 剥離性ベースフイルム(a)に、少な
くともアンダーコート樹脂層(b)、金属薄膜層
(c)、トップコート樹脂層(d)を形成し、後剥離性
ベースフイルムを剥離し、少なくともbcdからなる積
層体を得て、この積層体を粉砕により箔粉を得るに際
し、bdの少なくとも一面にホログラム加工を施してな
すことを特徴とする特殊光輝性箔粉の製法。
4. At least an undercoat resin layer (b), a metal thin film layer (c) and a top coat resin layer (d) are formed on a peelable base film (a), and the peelable base film is peeled off. A method for producing a special glittering foil powder, characterized in that a laminate comprising at least bcd is obtained, and a hologram processing is performed on at least one surface of the bd when pulverizing the laminate to obtain a foil powder.
JP03675498A 1998-02-03 1998-02-03 Special glitter foil powder and its manufacturing method Expired - Fee Related JP3732644B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03675498A JP3732644B2 (en) 1998-02-03 1998-02-03 Special glitter foil powder and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03675498A JP3732644B2 (en) 1998-02-03 1998-02-03 Special glitter foil powder and its manufacturing method

Publications (2)

Publication Number Publication Date
JPH11217524A true JPH11217524A (en) 1999-08-10
JP3732644B2 JP3732644B2 (en) 2006-01-05

Family

ID=12478537

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3732644B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
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KR20210014372A (en) 2019-07-30 2021-02-09 주식회사 엘지화학 Manufacturing method for thermoplastic resin composite material, thermoplastic resin composite material and article comprising same
KR20210023208A (en) 2019-08-22 2021-03-04 주식회사 엘지화학 Manufacturing method for thermoplastic resin composite material, thermoplastic resin composite material and article comprising same
KR20210147703A (en) 2020-05-29 2021-12-07 주식회사 엘지화학 Resin composite, manufacturing method for same and molded product comprising same
KR20210148489A (en) 2020-05-28 2021-12-08 주식회사 엘지화학 Resin composition, manufacturing method for same and molded product comprising same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210014372A (en) 2019-07-30 2021-02-09 주식회사 엘지화학 Manufacturing method for thermoplastic resin composite material, thermoplastic resin composite material and article comprising same
KR20210023208A (en) 2019-08-22 2021-03-04 주식회사 엘지화학 Manufacturing method for thermoplastic resin composite material, thermoplastic resin composite material and article comprising same
KR20210148489A (en) 2020-05-28 2021-12-08 주식회사 엘지화학 Resin composition, manufacturing method for same and molded product comprising same
KR20210147703A (en) 2020-05-29 2021-12-07 주식회사 엘지화학 Resin composite, manufacturing method for same and molded product comprising same

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