JPH11216337A - Filter device for treatment liquid feeder - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a filter device wherein a member having a deaeration function and a gas dissolving function can be easily fitted also to the existing treatment liquid feed pipings, treatment of the piping satisfies at a minimum, interchangeability between devices can be kept, and a treatment liquid feeder can be miniaturized at a low cost. SOLUTION: A particle removal member 32 constituted of many capillary-like elements formed of a gas permeating membrane material which permeates only the gas, is arranged inside a hermetically sealed container 30 having a treating liquid inlet 52, a treating liquid discharge opening 64 and a vent 66. One end of many capillary elements is, in a passage manner, blockaded, and the other end is communicated to the vent of the hermetically sealed container.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a semiconductor wafer,
Developing solution on the surface of various substrates such as glass substrates for liquid crystal display devices, glass substrates for photomasks, and substrates for optical disks.
Supplying a processing liquid such as a coating liquid such as a photoresist liquid, a polyimide resin, and an SOG (silica-based film forming material) liquid, and a cleaning liquid such as pure water to a substrate processing apparatus that performs predetermined processing such as development, coating, and cleaning. The present invention relates to a filter device that is used and is disposed in a processing liquid supply pipe of a processing liquid supply device that supplies a processing liquid to the substrate processing apparatus.

[0002]

2. Description of the Related Art In a substrate processing apparatus, for example, a substrate rotary developing apparatus, an exposed photo-resist formed on a substrate surface while holding a substrate such as a semiconductor wafer in a horizontal position and rotating it around a vertical axis. When developing the resist film, the developing solution is supplied from the developing solution tank storing the developing solution to the discharging nozzle through the developing solution supply pipe to the discharging nozzle, and the developing solution is supplied from the discharging port of the discharging nozzle to the surface of the substrate. I have to. At this time, if particles are contained in the developing solution supplied to the surface of the substrate, inconveniences such as uneven development occur, so that particles contained in the developing solution are usually supplied to the developing solution supply pipe. In order to remove and clean the developer, a filter device having a built-in particle removing member is interposed.

However, in the developing solution, there are bubbles caused by air entrainment when the developing solution is pressure-fed from a developing solution tank through a developing solution supply pipe, and extremely fine bubbles dissolved from the beginning. There are cases. When the developing solution in which the gas is dissolved is supplied to the surface of the substrate from the discharge nozzle as it is, the gas in the developing solution adheres to the surface of the photoresist film on the substrate as bubbles. As a result,
The development processing at the site where the air bubbles are attached is hindered, resulting in poor development. A similar problem occurs not only in the substrate developing apparatus but also in various substrate processing apparatuses. For example, in a substrate coating apparatus, if bubbles are contained in the photoresist liquid supplied to the surface of the substrate, the film thickness of the applied part becomes extremely thin, or a part without any photoresist liquid (a so-called pinhole). ) To cause poor coating. Particularly, in recent years, semiconductor devices have been increasingly miniaturized. Therefore, if a gas is dissolved in a processing solution such as a developing solution or a photoresist solution, the adverse effect caused by the gas is very large.

Therefore, in order to eliminate processing defects caused by the gas being dissolved in the processing liquid, in addition to the filter device, a gas permeable membrane material (gas exchange membrane material, gas A deaerator with a built-in gas permeable member (deaeration module) in which an air passage is formed by a permeable membrane material or a deaeration membrane material,
The processing liquid supply pipe from the processing liquid tank to the discharge nozzle of the substrate processing apparatus is interposed. Then, the ventilation path of the gas permeable member is connected to a vacuum pump or the like to reduce the pressure in the ventilation path, and when the processing liquid passes through the deaerator, the gas in the processing liquid is passed through the gas permeable membrane material. The gas is removed from the processing liquid by moving to the inside of the passage.

In an apparatus that uses pure water, such as a substrate cleaning apparatus, since pure water has a very large specific resistance and is easily charged, for example, when pure water is supplied as a cleaning liquid to the surface of a substrate, the pure water becomes static. The electrical breakdown may damage a circuit pattern formed on the substrate. Therefore, in order to prevent such a problem from occurring, the specific resistance value of pure water is reduced to make it difficult to cause charging, and then pure water is supplied to the substrate surface. That is, the specific resistance of pure water is reduced by dissolving a gas having a high dielectric constant, for example, carbon dioxide, in pure water. Then, in order to dissolve carbon dioxide in pure water, a gas dissolving device having a gas permeable member as described above is used, and a gas passage of the gas permeable member is connected to a carbon dioxide gas cylinder or the like to form a gas passage. When pure water passes through the gas dissolving apparatus, carbon dioxide is transferred to pure water through a gas permeable membrane material.

[0006]

By the way, in order to additionally mount the above-described degassing device or gas dissolving device on an existing substrate processing system, a space for the mounting is required. However, there is usually a problem in that there is little extra space in the system, which makes it very difficult to install additional devices or that the installation cannot be performed at all. Also, even if a degassing device or gas-dissolving device can be installed, the piping management becomes complicated, and even if the device is of the same model, the piping route is different from that of other devices. There is a problem that it becomes incompatible and loses compatibility.

[0007] Also, when a new substrate processing system including a deaerator and a gas dissolving device is newly designed, it is necessary to secure a space for mounting the deaerator and the gas dissolving device in addition to the filter device. Therefore, there is a problem that the space of the whole system becomes large and the manufacturing cost of the device becomes high.

The present invention has been made in view of the above circumstances, and a member having a deaeration function and a gas dissolving function is also provided in a processing liquid supply pipe of a processing liquid supply device of an existing substrate processing system. It can be easily installed, can maintain compatibility between devices, and if a new processing liquid supply device that has a degassing function and a gas dissolving function in addition to the particle removal function is installed, It is an object of the present invention to provide a filter device for a processing liquid supply device, which can reduce the size and cost of a filter.

[0009]

According to the present invention, there is provided a filter apparatus for a processing liquid supply device disposed between processing liquid supply pipes of a processing liquid supply apparatus for supplying a processing liquid to a substrate processing apparatus. A member having both a particle removing action of removing particles contained in a gas and a degassing action of removing gas dissolved in the processing liquid or a gas dissolving action of dissolving gas in the processing liquid. The use has achieved the above object. That is, claim 1
The invention according to the present invention, in a closed container having a processing liquid inlet, a processing liquid outlet, and a vent, only a gas is used to partition the inside into a processing liquid inflow side and a processing liquid outflow side in a flow path. A closed vessel is provided with a particle removing member composed of a large number of small tubular elements formed by a gas permeable membrane material to be permeated, and at least one end of the large number of small tubular elements constituting the particle removing member is closed. Characterized in that it is communicated with the vent hole.

According to a second aspect of the present invention, in the filter device according to the first aspect, a vent of the closed container is connected to a flow path of the pressure reducing means.

According to a third aspect of the present invention, in the filter device according to the first aspect, a vent of the closed container is connected to the gas supply means in a flow path.

According to a fourth aspect of the present invention, in the filter device according to any one of the first to third aspects, the particle removing member is formed in a cylindrical shape, and one end side of the cylindrical particle removing member is closed. The member is liquid-tightly closed and a cylindrical particle removing member is disposed inside the closed container so that the hollow portion thereof communicates with the processing liquid inlet or the processing liquid outlet of the closed container to remove particles. Each of the multiple small tubular elements constituting the member is arranged so as to face from one end of the particle removing member to the other end, and one end of each of the multiple small tubular elements is hermetically closed by the gas closing member. And the other end side is communicated with a vent of the closed container.

In the filter device according to the first aspect of the present invention, the processing liquid flowing into the closed container from the processing liquid supply pipe through the processing liquid inflow port is provided with a particle removing member disposed inside the closed container. Through which the particles are removed and the processing liquid from which the particles have been removed,
The liquid flows out of the closed vessel through the processing liquid outlet, and is supplied to the substrate processing apparatus through the processing liquid supply pipe. In this apparatus, since the particle removing member is composed of a large number of small tubular elements formed of a gas-permeable membrane material that allows only gas to pass through, the processing liquid passes through the small tubular member when passing through the particle removing member. The gas in the processing liquid moves through the gas permeable membrane material forming the tubular element into the inside of the tubular element that communicates with the vent of the closed vessel, and the gas is removed from the processing liquid, or the tubular element The gas moves from inside into the processing liquid through the gas permeable membrane material, and the gas is dissolved in the processing liquid.

In the filter device according to the second aspect of the present invention,
When the inside of a large number of the thin tubular elements communicating with the vents of the closed container is depressurized by the decompression means, when the processing liquid permeates the particle removing member constituted by the many thin tubular elements, The dissolved gas moves into the inside of the tubular element through the gas permeable membrane material, and the gas is removed from the processing liquid.

In the filter device according to the third aspect of the present invention,
Gas, for example, carbon dioxide, is supplied from the gas supply means to the inside of a large number of small tubular elements communicating with the vents of the closed vessel, so that the processing liquid permeates the particle removing member composed of the large number of small tubular elements. In doing so, the carbon dioxide inside the tubular element moves through the gas permeable membrane material to a treatment liquid, for example, pure water, and carbon dioxide is dissolved in the pure water.

In the filter device of the invention according to claim 4,
The processing liquid flows from the processing liquid supply pipe through the processing liquid inflow port into the hollow portion of the cylindrical particle removing member disposed inside the closed container and having one end closed by the closing member. Through the particle removing member composed of a large number of thin tubular elements, flows into a liquid flow path formed by the inner surface of the closed container and the outer peripheral surface of the particle removing member, and seals from the liquid flow path. It flows out into the processing liquid supply pipe through the processing liquid outlet of the container. Alternatively, the processing liquid is supplied from the processing liquid supply pipe through the processing liquid inflow port to the inner surface of the closed container and the outer peripheral surface of the cylindrical particle removing member which is disposed inside the closed container and one end of which is closed by the closing member. Flows into the liquid flow path formed by the above, and from the liquid flow path, passes through the particle removing member composed of a number of narrow tubular elements, flows into the hollow portion of the particle removing member, and flows into the hollow portion. Out of the processing solution supply pipe through the processing solution outlet of the closed container. In addition, a large number of thin tubular elements constituting the particle removing member are respectively arranged so as to face from one end side to the other end side of the particle removing member, one end side is airtightly closed by a gas closing member, and the other end side is closed. By communicating with the vent of the container, the inside of the tubular element is depressurized, or gas is supplied to the inside of the tubular element.

[0017]

Preferred embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a diagram showing an example of a schematic configuration of a developing solution supply system that supplies a developing solution to a substrate rotary developing device, which is an example of a substrate processing apparatus. The substrate rotating type developing device 10 includes:
While the substrate W is held on the spin chuck 12 in a horizontal posture by suction, the developing solution is supplied from the discharge port of the discharge nozzle 14 to the surface of the substrate W while the substrate W is rotated about a vertical axis. The exposed photoresist film formed on the substrate is developed.

The developing solution supply system for supplying the developing solution to the discharge nozzle 14 of the developing device 10 comprises a closed container,
Tank 18 for storing nitrogen, a nitrogen gas supply pipe 20 for supplying nitrogen gas from an upper portion of the developer tank 18 to an upper space in the tank 18, and one end of the developer 16 in the developer tank 18. The developing device is provided with a developing solution supply pipe 22 which is inserted therein and whose other end is connected to the discharge nozzle 14 of the developing device 10. Then, from a nitrogen gas supply source such as a nitrogen gas cylinder,
By supplying nitrogen gas to the upper space in the developer tank 18 through the tank, the liquid level of the developer 16 in the tank 18 is pressed to send the developer 16 into the developer supply pipe 22, and the developer is supplied. The developer is fed under pressure to the discharge nozzle 14 through the pipe 22. Note that, instead of the configuration in which the developer is pumped by the pressure of the nitrogen gas, a configuration in which the developer is pumped by a pump or the like may be employed.

A developing solution supply pipe 22 extending from the developing solution tank 18 to the discharge nozzle 14 is provided with a structure as described below to remove particles contained in the developing solution, and a gas dissolved in the developing solution. Filter device 24 having a degassing function for removing water, a flow meter 26 for checking the flow rate of the developer flowing through the pipe 22, and an opening / closing control valve for switching between supplying and stopping the supply of the developer to the discharge nozzle 14. 28 are provided respectively.

The filter device 24 is shown in FIG.
As shown in FIG. 3 as a cross-sectional view taken along the line III-III of FIG. 2, a particle removing member 32 having a particle removing function and a degassing function inside a cylindrical closed container 30.
Built-in. The particle removing member 32 is formed in a cylindrical shape, and is fitted outside the tubular body 34 longer than the axial length of the particle removing member 32 in a concentric circular cross section with the tubular body 34. A number of small through holes 36 are formed in the tube wall of the tube 34. One end surface (the lower end surface in FIG. 2) of the particle removing member 32 is closed by a closing member 38 together with one end of the tube 34. Also,
On the other end surface side (the upper end surface side in FIG. 2) of the particle removing member 32, an annular member 40 tightly fitted to the other end portion (the upper end portion in FIG. 2) of the tube 34 is connected in a liquid-tight manner. Then, as shown in the external perspective view of FIG.
2. The tube 34, the closing member 38 and the annular member 40 are integrally formed.

The particle removing member 32 is formed by weaving a number of tubular elements 42 formed of a gas-permeable membrane material made of, for example, a polyethylene resin, as shown in FIG. ing. As shown in FIG. 6, a partially enlarged cross-sectional view of the inside of the particle removing member 32, the inside of each of the narrow tubular elements 42 becomes a ventilation path 44, and the narrow tubular element 42, the narrow tubular element 42 Between the liquid passage 46
Becomes Each of the thin tubular elements 42 has a large number of fine holes 48 that allow only gas to pass and no liquid to pass, and when the developing solution flows through the liquid passage 46 outside the thin tubular element 42, Only dissolved gas permeates through the gas permeable membrane material and moves into the air passage 44 inside the tubular element 42. A large number of the thin tubular elements 42 constituting the particle removing member 32 are respectively arranged (in the vertical direction in FIG. 2) from one end to the other end of the particle removing member 32. In the illustrated example, the thin tubular element 42 is woven like a woven fabric, and a plurality of layers are formed into a cylindrical shape, and the cylindrical particle removing member 32 is formed.
However, in order to constitute the particle removing member from a large number of thin tubular elements, other methods may be used. The particle removing member may be configured to be formed and held in a cylindrical shape by a frame or the like.

One end (the lower end in FIG. 2) of each of the air passages 44 inside the many tubular elements 42 constituting the particle removing member 32 is closed air-tight by a closing member 38. In addition, the particle removing member 3
The upper end surface side of 2 is connected to an annular member 40 integrally formed with the particle removing member 32, and a ventilation chamber 50 formed of an annular concave portion opened on the connecting surface side with the particle removing member 32 is formed. The other end (the upper end in FIG. 2) of the ventilation path 44 inside the many small tubular elements 42 constituting the cylindrical particle removing member 32 communicates with the ventilation chamber 50. In the illustrated example, one end of the ventilation path 44 inside the many thin tubular elements 42 of the particle removing member 32 is air-tightly closed by the closing member 38 that closes one end surface of the particle removing member 32 and one end of the tube 34. However, one end of each of the multiple tubular elements 42 may be closed by an individual gas closing member.

A developer inlet 52 is provided at one end (the lower end in FIG. 2) of the cylindrical closed container 30. In the center of the other end surface (the upper end surface in FIG. 2) of the sealed container 30, an opening 5 in which a female screw 56 is threaded in a part of the inner peripheral portion is provided.
A male screw 58 screwed into a female screw 56 is screwed into a part of the outer peripheral portion of the opening 54 to form a tube body 34.
Mounting member 5 tightly fitted and fixed to the outer peripheral surface of the upper end of the
8 is screwed. An O-ring 62 is provided between the lower end surface of the mounting member 58 and the upper end surface of the annular member 40 to maintain a liquid-tight state. Then, the particle removing member 32 is provided inside the closed container 30 so that the end of the tube 34 protrudes from the end surface of the closed container 30.
A tube 3 in which an integrated component of the tube 34, the closing member 38 and the annular member 40 is housed and protrudes from the end surface of the closed container 30
The end of 4 serves as a developer outlet 64. In addition, closed container 3
Reference numeral 0 denotes a structure that can be divided into upper and lower portions so that an integrated component including the particle removing member 32 and the like can be stored therein, but illustration thereof is omitted. In a state where the integrated component including the particle removing member 32 and the like is stored in the closed container 30, the closed container 30
The liquid flow paths are formed between the inner surface of one end side (the lower end side in FIG. 2) and the closing member 38 and between the inner peripheral surface of the sealed container 30 and the outer peripheral surface of the particle removing member 32, respectively. Then, the respective dimensions of the axial length and the outer diameter of the particle removing member 32 are set. Further, a ventilation path 68 having an opening 66 at the end face of the closed container 30 is formed around the opening 54 of the closed container 30, and a ventilation chamber formed in the ventilation path 68 and the annular member 40. And 50 are in communication. As shown in FIG.
The vacuum pump 70 is connected to the flow path as shown in FIG. In addition, instead of using the vacuum pump 70, a closed container 3 is attached to a vacuum utility provided in a clean room or the like.
The zero ventilation port 66 may be connected to the flow path.

The filter device 2 having the above configuration
4, the developer supply pipe 22 is not shown so that the developer inlet 52 is on the upstream side, that is, the developer tank 18 side, and the developer outlet 64 is on the downstream side, that is, the discharge nozzle 14 side of the developing device 10. Connected via a pipe joint. Further, the ventilation port 66 of the sealed container 30 is
The particle removing member 32 is connected to a pipe 72 connected through a pipe joint (not shown) so as to reduce the pressure inside the air passage 44 inside the many small tubular elements 42 of the particle removing member 32 to a predetermined pressure. When the developer flows into the developer supply pipe 22, the developer flows from the developer supply pipe 22 through the developer inlet 52 into the closed container 30, as indicated by the arrow in FIG. And flows through the liquid passage formed between the inner surface of the sealed container 30 and the outer peripheral surface of the particle removing member 32 and the closing member 38, and penetrates through the particle removing member 32 from the liquid passage and penetrates. Small hole 36
, And flows into the tube 34. At this time, the particles contained in the developing solution are removed by the particle removing member 32, and the gas dissolved in the developing solution forms the thin tubular element 42 constituting the particle removing member 32. The gas moves through the gas permeable membrane material into the air passage 44 inside the reduced-pressure tubular element 42 to remove gas from the developer. The developer that has been cleaned and degassed by removing particles passes through the tube 34, flows out of the filter device 24 through the developer outlet 64, passes through the developer supply pipe 22, It is sent to the discharge nozzle 14 of the developing device 10.

The filter device 24 has a built-in particle removing member 32 having a particle removing function and a degassing function inside the closed container 30, so that the filter device having only the particle removing function is connected to the developer supply pipe. In order to add a degassing function for removing gas dissolved in the developing solution to the existing developing solution supply system, replace the filter device 24 with a filter device having only a particle removing function. It should just be arranged. Therefore, it is not necessary to add a deaerator to the developer supply pipe separately from the filter device as in the related art, so that an extra space for mounting the deaerator is required. And never. Further, when a developer supply system having a degassing function together with a particle removing function is newly designed, a space for mounting a degassing device in addition to a filter device is secured as in the related art. Since there is no need, the installation space for the developer supply system can be reduced, and the cost is also advantageous.

In the above-described embodiment, in the filter device 24, the developer is supplied from one end side (the lower end side in FIG. 2) of the sealed container 30 to the inner surface of the sealed container 30, the outer peripheral surface of the particle removing member 32, and the closing member. 38, the liquid flows through the particle removing member 32 through the liquid flow path and flows into the tube 34, and the end (the upper end in FIG. ), But the filter device 24 shown in FIG.
The developer inlet 52 is used as the developer outlet and the developer outlet 6 is used as the developer outlet.
4 may be used as a developing solution inlet, and the developing solution may flow in a direction opposite to the direction indicated by the arrow. In this case, the developer flows in through the developer inlet at the end (the upper end in FIG. 2) of the tube 34, passes through the tube 34, and from the inside of the tube 34 to the small through hole 36. Through the particle removing member 32, flows into a liquid flow path formed between the inner surface of the closed container 30 and the outer peripheral surface of the particle removing member 32 and the closing member 38, and from the liquid flow path, the closed container One end (Fig. 2
In this case, it flows out through the developer outlet at the lower end).

In the above-described embodiment, the air passage 4
Although one end of the air passage 4 is air-tightly closed by a closing member 38 and the other end of the air passage 44 is connected to the vacuum pump 70, the invention is not limited thereto. A communication path for communicating the vacuum pump 70 with the vacuum pump 70 may be formed, and both ends of the ventilation path 44 may be connected to the vacuum pump 70.

In the above-described embodiment, the present invention is applied to the developing solution supply system for supplying the developing solution to the substrate rotary developing device, and the particle removing member 32 provided in the closed container 30 of the filter device 24 is constituted. Although the example in which the vacuum pump 70 is connected to the ventilation port 66 communicating with the ventilation path 44 inside the thin tubular element 42 is described, the present invention is, for example, discharging pure water as a cleaning liquid to the surface of the substrate. When the present invention is applied to a cleaning liquid supply system for supplying a cleaning liquid (pure water) to a substrate cleaning apparatus, a ventilation port 66 provided in the closed container 30 of the filter device 24 as shown in FIG. For example, a gas supply means composed of a gas cylinder 74 filled with liquefied carbon dioxide and a gas generator 76 for vaporizing liquefied carbon dioxide is passed through a gas supply pipe 78 To continue. In the case of such a configuration, carbon dioxide can be supplied into the air passage 44 inside the narrow tubular element 42 constituting the particle removing member 32, and the carbon dioxide in the air passage 44 is removed by the particles. The gas permeable membrane material is transferred to pure water passing through the removing member 32 to dissolve carbon dioxide in the pure water. This makes it possible to supply the pure water to the substrate surface after lowering the specific resistance value of the pure water to make the charging less likely to occur. The gas dissolved in pure water is not limited to carbon dioxide, but may be any gas having a high dielectric constant.

Further, in the above description, the shape of the particle removing member 32 is cylindrical. However, the particle removing member can be formed into various shapes. A member may be formed, and the inside of the closed container may be divided into two sections by the plate-like particle removing member.

[0031]

According to the first aspect of the present invention, there is provided a filter apparatus having only a particle removing function in a processing liquid supply pipe of an existing processing liquid supply apparatus of a substrate processing system. By simply replacing the equipment, the degassing function and gas dissolving function can be easily added, and piping management is minimized, so that compatibility between devices of the same model can be maintained. When a processing liquid supply device is newly installed, the size and cost of the device can be reduced.

When the filter device according to the second aspect of the present invention is used, it becomes possible to remove gas from the processing liquid.

When the filter device according to the third aspect of the present invention is used, it becomes possible to dissolve carbon dioxide in a gas, for example, pure water, in the treatment liquid.

In the filter device according to the fourth aspect of the present invention,
Since the particle removing member provided inside the closed container has a cylindrical shape, the apparatus is compact.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating an example of a schematic configuration of a developing solution supply system that supplies a developing solution to a substrate rotary developing device, which is an example of a substrate processing apparatus.

FIG. 2 is a longitudinal sectional view of a filter device showing one embodiment of the present invention.

FIG. 3 is a cross-sectional view taken along the line III-III of FIG. 2;

FIG. 4 is an external perspective view of an integrated component of a particle removing member, a tube, a closing member, and an annular member, which are components of the filter device shown in FIG.

5 is an enlarged view of a portion A in FIG. 4 and is an enlarged view showing a surface of a particle removing member. FIG.

FIG. 6 is a sectional view showing a part of a particle removing member in a further enlarged manner.

[Explanation of symbols]

W Substrate 10 Substrate rotary developing device 12 Spin chuck 14 Discharge nozzle 16 Developing solution 18 Developing solution tank 20 Nitrogen gas supply pipe 22 Developing solution supply pipe 24 Filter device 30 Sealed container 32 Particle removal member 34 Tube 36 Small penetration of tube Hole 38 closing member 40 annular member 42 thin tubular element formed of a gas permeable membrane material 44 air passage inside the thin tubular element 46 liquid passage 48 minute hole 50 ventilation chamber 52 developer inlet 54 opening 58 attachment member 64 developing Liquid inlet 66 Vent 68 Vent 70 Vacuum pump 72 Piping 74 Gas cylinder filled with liquefied carbon dioxide 76 Gas generator 78 Gas supply piping

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁶ Identification code FI H01L 21/31 H01L 21/30 564Z

Claims (4)

[Claims] 1. A processing liquid supply device filter device disposed in a processing liquid supply pipe of a processing liquid supply device for supplying a processing liquid to a substrate processing apparatus, comprising: a processing liquid inlet, a processing liquid outlet, A large number of tubular elements formed by a gas-permeable membrane material that allows only gas to pass therethrough so as to partition the inside into a processing liquid inflow side and a processing liquid outflow side inside a closed container having a vent. Wherein a plurality of narrow tubular elements constituting the particle removing member are communicated with at least one end thereof through a vent of the closed container. Filter device for equipment. 2. The filter device for a processing liquid supply device according to claim 1, wherein a vent of the closed container is connected to a flow path of the pressure reducing means. 3. The filter device for a processing liquid supply device according to claim 1, wherein a ventilation port of the closed container is connected to the gas supply means in a flow path. 4. A particle removing member having a cylindrical shape,
One end side of the cylindrical particle removing member is closed in a liquid-tight manner by the closing member, and the cylindrical particle removing member communicates between the hollow portion and the processing liquid inlet or the processing liquid outlet of the closed container. Are disposed inside the closed container, and each of a large number of small tubular elements constituting the particle removing member are arranged so as to face from one end side to the other end side of the particle removing member, and each of the large number of small tubular elements. 4. The filter device for a processing liquid supply device according to claim 1, wherein one end of the filter is hermetically closed by a gas closing member, and the other end of the filter is connected to a vent of the closed container.