JPH11176965A - Airtight sealing method for semiconductor package and resistance welder used for the method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a resistance welder by which accuracy of airtight sealing is improved through the reduction in stresses onto a stem exerted at resistance welding of the semiconductor package. SOLUTION: The resistance welder is provided with a lower electrode jig 4, having a recessed contact part 4a on which a lower side M1 of a stem base 3 is placed and with an upper electrode jig 6 that clamps a flange 2 of a metal- made cap 1 and supports it, while being in press contact with an upper face M2 of the stem base 3 similarly to those of a conventional welder. However, a contact face of the recessed contact 4a has a curvature smaller than that of a bend of an outer circumferential part of the stem base 3 to press the outer circumferential part of the stem base 3 into contact in the case of pressing for resistance welding. In the pressing contact by the contact face of a recessed contact part 4a, stress is applied to the outer circumferential part of the stem base 3 in a direction inward and perpendicular to the pressing direction, and the contacting face of the recessed contact part 4a is formed to be a tapered curved face the radius of which a curvature R is 200 mm or more and which has a gradient downward toward the center direction of the stem.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention mainly relates to a semiconductor package such as a hermetic CAN package which hermetically seals a metal cap on a stem base surface of a stem having a semiconductor element mounted therein by resistance welding and hermetically seals the cap. The present invention relates to a hermetic sealing method and a resistance welding apparatus to which the method is applied.

[0002]

2. Description of the Related Art In general, a semiconductor package is for protecting a semiconductor element mounted therein from a change in an external environment or an impact. When airtight sealing is performed, a resistance welding as shown in FIG. Using a device, a flange 2 formed on the opening side outer periphery of a cap 1, which is a metal envelope, and a stem base 3 of a stem having a semiconductor element mounted therein are resistance-welded.

In this resistance welding apparatus, the lower electrode jig 4 '
The stem base 3 is installed in such a manner that the lower surface M1 of the stem base 3 is in contact with the electrode portion with respect to the concave contact portion 4a 'of the upper surface. While maintaining the contact state, an electric current is supplied at the time of resistance welding, and the flange 2 is fused to the upper surface M2 of the stem base 3 by Joule heat due to the contact resistance to hermetically seal.

A stem used for a semiconductor package includes a stem base 3, leads 8, and sealing glass 9.
Is formed from. Of these, when manufacturing the stem base 3 which is a metal part, it is often manufactured by press working because it is advantageous in terms of mass productivity and cost.

[0005] FIG. 4 is a side view of a main portion shown for explaining press working required for manufacturing the stem base 3.
FIG. 2A shows the state before the press working, and FIG. 2B shows the state after the press working. That is, in the press working of the stem base 3, as shown in FIG. 4A, the plate-shaped base material 12 placed on the mold 10 is cut out. This is performed by stamping out the base material 12 with the mold 10 as shown in b), and as a result, the stem base 3 is obtained. In the case of the stem base 3 obtained by such press working, warpage always occurs in the outer peripheral portion. The size of the convex portion of the warp in the outer peripheral portion is 5.6 mm in diameter φ.
In the case of the stem, it is about 20 μm at the maximum.

[0006] In the resistance welding apparatus, the lower electrode jig 4 '
The concave contact portion 4a 'is formed as a flat surface for easy processing, and is usually pressed with a load of about 80 kgf in order to make the welding area large and uniform during resistance welding. At this time, pressure is applied to the outer peripheral portion of the stem base 3.

Incidentally, as a well-known technique relating to the hermetic sealing of such a semiconductor package, for example, Japanese Unexamined Patent Publication No.
There are an encapsulating apparatus and an encapsulating method of a semiconductor package disclosed in Japanese Patent Publication No. 112152, and a method of hermetically sealing a semiconductor envelope disclosed in Japanese Patent Application Laid-Open No. 4-32255.

[0008]

In the case of hermetic sealing by resistance welding of the semiconductor package described above, the stem base forming the stem is manufactured by press working, and the outer periphery of the stem base is warped. When pressure is applied to the outer peripheral portion of the stem base during welding, there is a problem that interface peeling between the stem base and the sealing glass and cracks (cracks) in the sealing glass are generated in the stem and airtight defects are likely to occur.

FIG. 5 is a side sectional view of a main portion for explaining resistance welding in the resistance welding apparatus using the warped stem base 3, and FIG. FIG. 4B relates to a state after fusion at the time of hermetic sealing. That is, before fusion at the time of airtight insertion, as shown in FIG.
Since the concave contact portion 4a ′ of ′ is a flat surface, a gap is formed between the outer peripheral portion of the stem base 3 and the lower electrode jig 4. Here, since the flange portion 2 serving as a pressing point at the time of resistance welding is located near the outer peripheral portion of the stem, the outer peripheral portion of the stem base 3 is pressurized at the time of resistance welding due to this gap. 5 so that the stem base 3 and the sealing glass 9 are pressed against the concave contact portion 4a 'of FIG.
(B) Tensile stress acts in an outward direction perpendicular to the pressing direction as indicated by the arrow direction in FIG.

[0010] Thus, after fusion at the time of hermetic sealing, as shown in FIG. 5 (b), the interface peeling occurs between the stem base 3 and the sealing glass 9 to form the interface peeling portion 5, or the sealing is performed. Cracks may occur in the glass 9, and in such a case, poor airtightness is caused.

SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and its technical problem is to reduce the stress applied to the stem during resistance welding of a semiconductor package and to improve the accuracy of hermetic sealing. An object of the present invention is to provide a method for hermetically sealing a semiconductor package to be obtained and a resistance welding apparatus to which the method is applied.

[0012]

According to the present invention, a metal package is hermetically sealed by sealing a metal envelope to a stem base surface of a stem having a semiconductor element mounted therein by resistance welding. A method of hermetically sealing a semiconductor package, comprising the step of pressurizing and contacting an outer peripheral portion of a stem base with a contact surface having a curvature smaller than a curvature of warpage of an outer peripheral portion of a stem base during pressurization during resistance welding. Is obtained.

According to the present invention, in the above-mentioned method for hermetically sealing a semiconductor package, the pressure contact by the contact surface is
A method of hermetically sealing a semiconductor package in which stress acts on the outer periphery of the stem base in an inward direction perpendicular to the pressing direction is obtained.

Further, according to the present invention, in the above method for hermetically sealing a semiconductor package, the contact surface has a radius of curvature of 2.
A method for hermetically sealing a semiconductor package having a tapered curved surface having a downward gradient toward the center of the stem with a length of 00 mm or more can be obtained.

On the other hand, according to the present invention, a lower electrode jig having a concave contact portion which can be installed so that the lower surface of a stem base of a stem having a semiconductor element mounted therein is in contact with the electrode portion, and a metal outer jig. An upper electrode jig for holding the flange of the enclosure in contact with the upper surface of the stem base while holding the flange in contact with the upper surface of the flange. In a resistance welding apparatus for performing hermetic sealing and hermetic sealing,
The contact surface of the concave contact portion has a curvature smaller than the curvature of the warp of the outer peripheral portion of the stem base, and a resistance welding apparatus that presses the outer peripheral portion of the stem base during pressure welding during resistance welding is used. can get.

Further, according to the present invention, in the above-described resistance welding apparatus, the pressure contact by the contact surface of the concave contact portion is such that the outer peripheral portion of the stem base exerts a stress in an inward direction perpendicular to the pressure direction. A welding device is obtained.

Furthermore, according to the present invention, in the resistance welding apparatus, the contact surface of the concave contact portion has a radius of curvature of 200 m.
A resistance welding apparatus having a tapered curved surface having a downward slope toward the center of the stem at m or more can be obtained.

[0018]

According to the method of sealing a semiconductor package of the present invention, the outer peripheral portion of the stem base is brought into pressure contact with the contact surface having a curvature smaller than the curvature of the warpage of the outer peripheral portion of the stem base during pressurization during resistance welding. ing. The pressure contact by this contact surface exerts a stress on the outer periphery of the stem base in an inward direction perpendicular to the pressing direction. The contact surface has a radius of curvature of 200 mm or more and is inclined downward toward the center of the stem. And a tapered curved surface. In a resistance welding device, since this contact surface is provided at the concave contact portion of the lower electrode jig which can be installed so that the lower surface of the stem base is in contact with the electrode portion, pressure is applied to the outer peripheral portion of the stem base during resistance welding. However, the peeling of the interface between the stem base and the sealing glass in the stem and the cracking of the sealing glass do not occur. Incidentally, Japanese Patent Application Laid-Open No. 3-112152 discloses that
Although a configuration is disclosed in which the corner of the concave contact portion where the lower surface of the stem base of the lower electrode jig contacts is rounded, here, the portion on which the outer peripheral portion of the stem base that is a pressure point during resistance welding is placed is placed. Because of the flat surface, in this configuration, if pressure is applied to the outer periphery of the stem base during resistance welding as in the conventional structure described with reference to FIG. 5, it is impossible to prevent interface peeling and cracking in the stem.

[0019]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for hermetically sealing a semiconductor package according to the present invention and a resistance welding apparatus to which the method is applied will be described in detail with reference to the drawings.

First, the outline of the method for hermetically sealing a semiconductor package according to the present invention will be briefly described. This hermetic sealing method is used to seal the metal enclosure to the stem base surface of the stem with the semiconductor element mounted inside by resistance welding and hermetic sealing, and to apply pressure during resistance welding. The step of bringing the outer peripheral portion of the stem base into pressure contact with the contact surface having a curvature smaller than the curvature of the warp of the outer peripheral portion of the stem base is executed. However, the pressure contact by this contact surface is
The outer peripheral portion of the stem base exerts a stress in an inward direction perpendicular to the pressing direction.
A tapered curved surface having a slope of 00 mm or more and having a downward slope toward the center of the stem.

FIG. 1 is a side sectional view showing the configuration of a main part of a resistance welding apparatus to which the hermetic sealing method is applied. Also in this resistance welding apparatus, the basic configuration is the same as that of the conventional apparatus, and a lower portion having a concave contact portion 4a which can be installed so that the lower surface M1 of the stem base 3 of the stem in which the semiconductor element is mounted is brought into contact with the electrode portion. The electrode jig 4 is sandwiched between the flange 2 of the metal cap 1 and the upper surface M of the stem base 3.
And an upper electrode jig 6 which is held in a state in which the flange 2 is held in contact with the upper surface M2, and a current is supplied at the time of resistance welding, and the flange 2 is fusion-bonded to the upper surface M2 of the stem base 3 by Joule heat due to contact resistance. It is designed to stop.

However, in this resistance welding apparatus, the contact surface of the concave contact portion 4a has a curvature smaller than the curvature of the warp of the outer peripheral portion of the stem base 3 so that the outer peripheral portion of the stem base 3 is pressurized during resistance welding. Is brought into pressure contact. The press contact by the contact surface of the concave contact portion 4a exerts a stress on the outer peripheral portion of the stem base 3 in an inward direction perpendicular to the pressing direction, and the contact surface of the concave contact portion 4a has a curvature. R has a radius of 200 mm or more and has a tapered curved surface having a downward slope toward the center of the stem.

The stem here is also the stem base 3,
It is formed from a lead 8 and a sealing glass 9.

That is, in the case of this resistance welding apparatus, in the conventional apparatus shown in FIG. 3, the interface peeling between the stem base 3 and the sealing glass 9 causes the sealing glass 9 to be pulled outward in a direction perpendicular to the pressing direction. The taper (gradient) of the contact surface of the concave contact portion 4a is determined so that stress is applied to the sealing glass 9 in an inward direction perpendicular to the pressing direction in consideration of the occurrence of the stress when the stress is applied. ing.

More specifically, the size of the convex portion of the warp on the outer peripheral portion of the stem base 3 is about 20 μm at the maximum in the case of a stem having a diameter φ of 5.6 mm. If the taper is made larger than the gradient of the convex portion of the warp, a stem having a diameter φ of 5.6 mm forms a tapered surface having a depth of 20 μm or more. The outermost periphery of the concave contact portion 4a) comes into contact with the electrode portion, and a stress in the compression direction is applied to the sealing glass 9.

FIG. 2 is a side sectional view of an essential part for explaining resistance welding in the resistance welding apparatus in the case where the stem base 3 having such a warp is used. ) Relates to a state before fusion at the time of hermetic sealing, and FIG. 2B relates to a state after fusion at the time of hermetic sealing. That is, before fusion at the time of hermetic sealing, the concave contact portion 4a of the lower electrode jig 4 has a tapered surface as shown in FIG. 4 and a slight gap is formed. Here, since the flange portion 2 serving as a pressing point at the time of resistance welding is located near the outer peripheral portion of the stem, the outer peripheral portion of the stem base 3 is pressurized at the time of resistance welding due to this small gap. 4
Of the stem base 3 and the sealing glass 9 so as to be pressed against the concave contact portion 4a with its outermost periphery as a fulcrum.
, A stress acts in an inward compression direction perpendicular to the pressurization direction as shown by the arrow direction in FIG.

Here, the concave contact portion 4 of the lower electrode jig 4
Since the contact surface a is formed as a tapered curved surface according to the shape of the warped convex portion of the external phase portion of the stem base 3,
The gap between the stem base 3 and the lower electrode jig 4 is small, and the amount of deformation at the time of pressurization is greatly suppressed as compared with the conventional apparatus.

Therefore, if this resistance welding apparatus is used, the peeling of the interface between the stem base 3 and the sealing glass 9 in the stem and the cracking of the sealing glass 9 can be prevented, and as a result, the poor airtightness can be reduced to one third of the conventional one. be able to. In particular, such an effect is extremely effective for a stem having a large lead through hole for improving the stray capacitance.

In the above-described embodiment, the case where the cap is used as the envelope has been described. However, in addition to the cap, a type such as a holder used in a coaxial optical semiconductor module which is resistance-welded on a stem or the like may be used. Similar effects can be obtained.

[0030]

As described above, according to the present invention, when pressurizing at the time of resistance welding, the outer peripheral portion of the stem base is brought into pressure contact with the contact surface having a curvature smaller than the curvature of the warpage of the outer peripheral portion of the stem base. Because the stress applied to the stem is changed from the tensile direction to the compressive direction and the stress applied to the stem during resistance welding of the semiconductor package is reduced, interface peeling and cracking in the stem are prevented. Thus, the accuracy of hermetic sealing can be improved. Further, since the stress on the stem is reduced, it is possible to increase the diameter of the lead through-hole for improving the floating capacitance without risk of airtight failure. This is because simply increasing the diameter of the lead through hole increases the contact area between the stem base and the sealing glass and increases the stress applied to the sealing glass when the stem base is deformed. This is because the stress applied to the sealing glass at the time of resistance welding can be reduced more than before under the conditions improved by reducing the temperature.

[Brief description of the drawings]

FIG. 1 is a side sectional view showing a configuration of a main part of a resistance welding apparatus to which a method for hermetically sealing a semiconductor package according to the present invention is applied.

FIG. 2 is a side sectional view of a main part for explaining resistance welding in the resistance welding apparatus shown in FIG. 1 using a warped stem base, wherein (a) is a view before fusion at the time of hermetic sealing; (B) relates to the state after fusion at the time of hermetic sealing.

FIG. 3 is a side cross-sectional view showing a main configuration of a resistance welding apparatus used for hermetically sealing a conventional semiconductor package.

4A and 4B are side views of a main portion for explaining press working required for manufacturing a stem base mounted on the resistance welding apparatus shown in FIG. 3, wherein FIG. ) Relates to after press working.

FIG. 5 is a side sectional view of a main part shown for explaining resistance welding in the resistance welding apparatus using the warped stem base described in FIG. 4, and FIG. (B) relates to a state before fusion at the time of hermetic sealing.

[Description of Signs] 1 Cap 2 Flange 3 Stem base 4, 4 'Lower electrode jig 4a, 4a' Concave contact part 5 Interface peeling part 6 Upper electrode jig 8 Lead 9 Sealing glass 10 Press mold 12 Base material M1 Lower surface M2 Upper surface

Claims (6)

[Claims] 1. A method for hermetically sealing a semiconductor package in which a metal envelope is fused and hermetically sealed by resistance welding to a stem base surface of a stem having a semiconductor element mounted therein. A method for hermetically sealing a semiconductor package, comprising the step of pressing an outer peripheral portion of a stem base with a contact surface having a curvature smaller than a curvature of curvature of an outer peripheral portion of the stem base during pressurization. 2. The method for hermetically sealing a semiconductor package according to claim 1, wherein the pressure contact by the contact surface exerts a stress on an outer peripheral portion of the stem base in a direction inward perpendicular to the pressure direction. A method for hermetically sealing a semiconductor package. 3. The method of claim 2, wherein the contact surface has a radius of curvature of 200 m.
a hermetic sealing method for a semiconductor package, characterized in that it is a tapered curved surface having a downward gradient toward the center of the stem at a distance of at least m. 4. A lower electrode jig having a concave contact portion which can be installed so that a lower surface of a stem base of a stem having a semiconductor element mounted therein is in contact with an electrode portion, and a flange of a metal envelope is sandwiched. And an upper electrode jig that holds the stem base in contact with the upper surface of the stem base. Current is supplied during resistance welding, and the flange is fused to the upper surface of the stem base by Joule heat due to contact resistance. A contact surface of the concave contact portion has a curvature smaller than a curvature of a warp of an outer peripheral portion of the stem base, and the stem has a curvature at the time of resistance welding. A resistance welding apparatus wherein an outer peripheral portion of a base is brought into pressure contact with the base. 5. The resistance welding apparatus according to claim 4, wherein
The resistance welding apparatus according to claim 1, wherein the pressure contact by the contact surface of the concave contact portion exerts a stress on the outer peripheral portion of the stem base in an inward direction perpendicular to the pressure direction. 6. The resistance welding apparatus according to claim 5, wherein
The contact welding surface of the concave contact portion is a tapered curved surface having a radius of curvature of 200 mm or more and having a downward slope toward the center of the stem.