JP4160005B2 - Manufacturing method of airtight parts - Google Patents

Manufacturing method of airtight parts Download PDF

Info

Publication number
JP4160005B2
JP4160005B2 JP2004059385A JP2004059385A JP4160005B2 JP 4160005 B2 JP4160005 B2 JP 4160005B2 JP 2004059385 A JP2004059385 A JP 2004059385A JP 2004059385 A JP2004059385 A JP 2004059385A JP 4160005 B2 JP4160005 B2 JP 4160005B2
Authority
JP
Japan
Prior art keywords
glass plate
glass
mold
manufacturing
airtight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004059385A
Other languages
Japanese (ja)
Other versions
JP2005251935A (en
Inventor
薫 山下
巧 臼井
智之 二川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2004059385A priority Critical patent/JP4160005B2/en
Publication of JP2005251935A publication Critical patent/JP2005251935A/en
Application granted granted Critical
Publication of JP4160005B2 publication Critical patent/JP4160005B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Description

本発明は、金属あるいはセラミックからなる基体とガラスとが当接する部分における気密性を確保した気密部品の製造方法に関する。
The present invention relates to a method for producing a gas-tight unit products to ensure airtightness and a substrate glass made of metal or ceramic in contact with the portion.

従来、例えば半導体装置用のキャップのような、金属基体に設けられた孔をガラスが覆った構造体において、金属基体とガラスの当接部における気密性を確保するために、種々の気密構造が用いられている。その一例として、特許文献1に記載された構造を図4に示す。   2. Description of the Related Art Conventionally, in a structure where glass covers a hole provided in a metal base, such as a cap for a semiconductor device, various airtight structures have been provided in order to ensure airtightness at a contact portion between the metal base and glass. It is used. As an example, the structure described in Patent Document 1 is shown in FIG.

図4において、102は金属製のキャップ本体であり、天板部104と筒状部105を有し、天板部104には透光用の窓孔103が設けられている。窓孔103の内側に、窓板ガラス108が固定されている。窓板ガラス108は、ガラス板101に、光学異方性により光源波長λに対してλ/4の位相差を有する樹脂製の位相差フィルム107が、樹脂製の透明な接着剤106を介して貼付けられたものである。窓板ガラス108は、キャップ本体102に、樹脂製の接着剤106を介して接着されている。また、樹脂製の接着剤106に代えて、低融点ガラスを用いる方法も広く知られている。   In FIG. 4, reference numeral 102 denotes a metal cap body, which has a top plate portion 104 and a cylindrical portion 105, and a light transmitting window hole 103 is provided in the top plate portion 104. A window glass 108 is fixed inside the window hole 103. The window glass 108 is affixed to a glass plate 101 with a resin phase difference film 107 having a phase difference of λ / 4 with respect to the light source wavelength λ due to optical anisotropy via a resin transparent adhesive 106. It is what was done. The window glass 108 is bonded to the cap body 102 via a resin adhesive 106. In addition, a method using low-melting glass instead of the resin adhesive 106 is also widely known.

接着剤を用いないで気密部品を構成する方法としては、金属外環に形成した酸化膜を介してガラスとの接着を行い気密性を保持する整合封止方法や、金属外環とガラスとの収縮差により気密性を保持する圧縮封止方法が、従来から広く知られている。   As a method for forming an airtight part without using an adhesive, an alignment sealing method for maintaining airtightness by bonding with glass through an oxide film formed on a metal outer ring, or a method for forming a metal outer ring with glass. A compression sealing method that maintains hermeticity due to a difference in shrinkage has been widely known.

前者の方法によれば、金属外環とガラスの熱膨張係数の差が略等しい材料を選定し、ガラスが流動性を有し金属外環を濡らすのに十分な温度に加熱し、内部に熱歪みを残留させない様に封着する。一方後者の方法によれば、金属外環とガラスの熱膨張係数に差が有る材料を選定し、ガラスの外側に当接する金属外環の熱膨張係数をガラスの熱膨張係数より大きくとり、ガラスを溶融させた後、冷却することで金属外環とガラスとの熱収縮差によりガラスを締め付ける力で封着する。   According to the former method, a material in which the difference between the coefficients of thermal expansion of the metal outer ring and the glass is substantially equal is selected, the glass is heated to a temperature sufficient to wet the metal outer ring, and the inside is heated. Seal so that no distortion remains. On the other hand, according to the latter method, a material having a difference in thermal expansion coefficient between the metal outer ring and the glass is selected, and the thermal expansion coefficient of the metal outer ring contacting the outside of the glass is made larger than the thermal expansion coefficient of the glass. After being melted, it is cooled and sealed with a force for tightening the glass due to the difference in thermal shrinkage between the metal outer ring and the glass.

ガラスを溶融させることが出来ない場合に、特許文献1のように、金属外環とガラスとを樹脂製の接着剤を介して接着する。
特開2003−37326号公報
When the glass cannot be melted, as in Patent Document 1, the metal outer ring and the glass are bonded via a resin adhesive.
JP 2003-37326 A

しかしながら、特許文献1記載の従来の構成では、キャップ本体と窓板ガラスとをUV硬化樹脂製や熱硬化樹脂製の接着剤により接着しているため、硬化後接着剤からアウトガスが発生したり、後に加わる熱により接着剤に亀裂が発生し、内包される電子部品の性能に悪影響を及ぼす。さらに樹脂製の接着剤は多孔質であり、気密性、耐湿性に劣る。また、低融点ガラスを用いる場合は、低融点ガラスに含まれる鉛やビスマスが環境負荷物質であるという課題を有していた。   However, in the conventional configuration described in Patent Document 1, since the cap body and the window glass are bonded with an adhesive made of UV curable resin or thermosetting resin, outgas is generated from the adhesive after curing, The applied heat causes cracks in the adhesive, which adversely affects the performance of the electronic components contained. Furthermore, the resin adhesive is porous and inferior in airtightness and moisture resistance. Moreover, when using low melting glass, it had the subject that lead and bismuth contained in low melting glass are environmentally hazardous substances.

また、整合封止方法、および圧縮封止方法の何れも、ガラスが溶融する温度900℃〜1100℃に加熱する必要があり、窓板ガラスの反射防止膜のコーティング、すなわちAR(Anti−Refrection)コートや、めっき前処理などの作業を封止後行う必要があるため、作業が煩雑になる。   Further, both the alignment sealing method and the compression sealing method need to be heated to a temperature at which the glass melts to 900 ° C. to 1100 ° C., and the coating of the antireflection film of the window glass, that is, the AR (Anti-Reflection) coating In addition, work such as pre-plating treatment needs to be performed after sealing, which makes the work complicated.

本発明は、従来の課題を解決するもので、アウトガスの発生や接着剤の亀裂を生じさせることなく、環境負荷物質を用いることがなく、また封止工程を煩雑にさせることのない気密部品の製造方法を提供することを目的とする。
The present invention is intended to solve the conventional problems, without causing a crack outgas generation and the adhesive, without the use of environmentally hazardous substances, also possible without airtight unit products for complicated sealing step It aims at providing the manufacturing method of.

本発明の気密部品の製造方法は、上記構成の気密部品を製造する方法であって、上金型と下金型とを含む金型に前記基体を載置し、前記ガラス板を前記基体内に、前記基体の一部により形成された内周面に前記ガラス板の外周面を対向させて載置し、前記金型近傍の温度を前記ガラス板の軟化点温度付近に加熱し、前記上金型と下金型とにより、前記ガラス板の周縁部、または前記基体と前記ガラス板の周縁部とを、前記ガラス板の厚み方向に挟圧し、挟圧した状態で冷却することを特徴とする。
A method for manufacturing an airtight part according to the present invention is a method for manufacturing an airtight part having the above-described configuration, wherein the base is placed on a mold including an upper mold and a lower mold, and the glass plate is placed in the base. And placing the outer peripheral surface of the glass plate facing the inner peripheral surface formed by a part of the base, heating the temperature near the mold near the softening point temperature of the glass plate, The peripheral edge of the glass plate or the base and the peripheral edge of the glass plate are clamped in the thickness direction of the glass plate by the mold and the lower mold, and cooled in the clamped state. To do.

また、上記の気密部品の製造方法によれば、反射防止膜などの処理が施されたガラス板を、比較的低温で金属外環に直接封止することができる。   In addition, according to the above method for manufacturing an airtight component, a glass plate that has been subjected to a treatment such as an antireflection film can be directly sealed to the metal outer ring at a relatively low temperature.

本発明の気密部品の製造方法において、好ましくは前記挟圧する工程を複数の段階に分けて行い、後の段階になるに従い、前記金型近傍の温度を、前記ガラス板の軟化点温度付近から下降させる。   In the method for manufacturing an airtight part according to the present invention, preferably, the step of pressing is performed in a plurality of stages, and the temperature in the vicinity of the mold is lowered from the vicinity of the softening point temperature of the glass plate as the later stage is reached. Let

また、好ましくは、前記挟圧する工程を複数の段階に分けて行い、後の段階になるに従い、前記金型に加える加圧力を増大させる。   Preferably, the step of clamping is performed in a plurality of stages, and the pressure applied to the mold is increased as the later stage is reached.

以下本発明の実施の形態について、図面を参照しながら説明する。   Embodiments of the present invention will be described below with reference to the drawings.

(実施の形態1)
図1は、実施の形態1における気密部品の断面図である。1は硼珪酸系硬質ガラスからなる円板形に形成されたガラス板、2はアルミナを90%程度含有したアルミナ系セラミックからなる円盤状の基体である。基体2には窓孔部3が設けられ、ガラス板1は窓孔部3内に嵌め込まれている。それにより、窓孔部3の内周面とガラス板1の外周面の間に、垂直方向に延在した封止部4が形成されている。
(Embodiment 1)
1 is a cross-sectional view of an airtight component according to Embodiment 1. FIG. Reference numeral 1 denotes a glass plate formed in a disk shape made of borosilicate hard glass, and 2 denotes a disk-shaped substrate made of alumina ceramic containing about 90% alumina. The base 2 is provided with a window hole 3, and the glass plate 1 is fitted into the window hole 3. Thus, a sealing portion 4 extending in the vertical direction is formed between the inner peripheral surface of the window hole portion 3 and the outer peripheral surface of the glass plate 1.

各部の寸法の一例は次のとおりである。基体2の厚みは0.17mmであり、窓孔部3の内径は1.63mmである。ガラス板1は、直径1.59mm、厚さ0.19mmの円板形に形成されており、熱膨張係数は30×10-7/℃〜80×10-7/℃である。好適には、ガラス板1の熱膨張係数は57×10-7/℃で、少なくとも一面に反射防止膜としてARコート(図示せず)が施されている。基体2はアルミナ系セラミックで形成されており、熱膨張係数は67×10-7/℃である。 An example of the dimensions of each part is as follows. The substrate 2 has a thickness of 0.17 mm, and the window hole portion 3 has an inner diameter of 1.63 mm. The glass plate 1 is formed in a disk shape having a diameter of 1.59 mm and a thickness of 0.19 mm, and has a thermal expansion coefficient of 30 × 10 −7 / ° C. to 80 × 10 −7 / ° C. Preferably, the glass plate 1 has a thermal expansion coefficient of 57 × 10 −7 / ° C., and at least one surface is provided with an AR coating (not shown) as an antireflection film. The substrate 2 is made of alumina ceramic and has a thermal expansion coefficient of 67 × 10 −7 / ° C.

ガラス板1の外周面と基体2とは、他の接着剤等を介在させることなく、封止部4において直接封止されている。これによれば、従来の技術の課題であった硬化後接着剤からアウトガスが発生したり、後に加わる熱により接着剤に亀裂が発生することがない。   The outer peripheral surface of the glass plate 1 and the base 2 are directly sealed in the sealing portion 4 without interposing another adhesive or the like. According to this, outgas does not generate | occur | produce from the adhesive agent after hardening which was the subject of the prior art, and a crack does not generate | occur | produce in the adhesive agent by the heat added later.

なお、基体2としては、アルミナ系セラミックに限らず、鉄や鉄合金を用いることも可能である。   The substrate 2 is not limited to alumina ceramic, and iron or iron alloy can also be used.

(実施の形態2)
図2は、実施の形態2における気密部品の断面図である。6は硼珪酸系硬質ガラスからなる円板形に形成されたガラス板である。7は鉄−ニッケル合金からなるキャップ本体であり、基体を構成する。キャップ本体7は、天板部8、および天板部8から垂直方向に延在した筒状部9を有する。天板部8には、窓孔部10が設けられている。ガラス板6は、窓孔部10に密接させて、筒上部9に嵌め込まれ、ガラス板6の外周面と筒上部9の内周面の間に、封止部11が形成されている。
(Embodiment 2)
FIG. 2 is a cross-sectional view of the hermetic component in the second embodiment. Reference numeral 6 denotes a glass plate formed in a disc shape made of borosilicate hard glass. Reference numeral 7 denotes a cap body made of an iron-nickel alloy, which constitutes a base. The cap body 7 includes a top plate portion 8 and a cylindrical portion 9 extending from the top plate portion 8 in the vertical direction. A window hole portion 10 is provided in the top plate portion 8. The glass plate 6 is fitted into the tube upper portion 9 in close contact with the window hole portion 10, and a sealing portion 11 is formed between the outer peripheral surface of the glass plate 6 and the inner peripheral surface of the tube upper portion 9.

各部の寸法の一例は次のとおりである。筒状部9の内径は3.3mmであり、ガラス板6は直径3.25mm、厚さ0.25mmの円板形に形成され、熱膨張係数は30×10-7/℃〜80×10-7/℃である。好適には、ガラス板の熱膨張係数は657×10-7/℃で、少なくとも一面に反射防止膜としてARコート(図示せず)が施されている。キャップ本体7は鉄−ニッケル合金で形成されており、熱膨張係数は97×10-7/℃である。 An example of the dimensions of each part is as follows. The cylindrical portion 9 has an inner diameter of 3.3 mm, the glass plate 6 is formed in a disk shape with a diameter of 3.25 mm and a thickness of 0.25 mm, and a thermal expansion coefficient of 30 × 10 −7 / ° C. to 80 × 10. -7 / ° C. Preferably, the glass plate has a thermal expansion coefficient of 657 × 10 −7 / ° C., and at least one surface is coated with an AR coating (not shown) as an antireflection film. The cap body 7 is made of an iron-nickel alloy and has a thermal expansion coefficient of 97 × 10 −7 / ° C.

ガラス板6の外周面とキャップ本体7とは、筒状部9の封止部11において直接封止されている。これによれば、従来の技術の課題であった硬化後接着剤からアウトガスが発生したり、後に加わる熱により接着剤に亀裂が発生することがない。   The outer peripheral surface of the glass plate 6 and the cap body 7 are directly sealed at the sealing portion 11 of the cylindrical portion 9. According to this, outgas does not generate | occur | produce from the adhesive agent after hardening which was the subject of the prior art, and a crack does not generate | occur | produce in an adhesive agent by the heat added later.

なお、基体7としては、鉄−ニッケル合金に限らずアルミナ系セラミックを用いることも可能である。   The substrate 7 is not limited to an iron-nickel alloy, and an alumina ceramic can be used.

(実施の形態3)
図3(a)〜(c)は、実施の形態3における気密部品の製造方法の工程を示す断面図である。この製造方法は、実施の形態2の気密部品を製造する方法であり、半導体装置用キャップの製造工程を示す。図3において、図2と同じ構成要素については同じ符号を用い、説明を省略する。
(Embodiment 3)
FIGS. 3A to 3C are cross-sectional views showing the steps of the method for manufacturing the hermetic component in the third embodiment. This manufacturing method is a method for manufacturing the hermetic component of the second embodiment, and shows a manufacturing process of a cap for a semiconductor device. 3, the same components as those in FIG. 2 are denoted by the same reference numerals, and description thereof is omitted.

図3において、12は上金型であり、Rms0.03μm以下の平坦度を備えた非磁性耐食性の超硬合金に、DLC(Diamond Like Carbon)をコーティングしたものである。13は下金型であり、凹形状を備えた非磁性耐食性の超硬合金にDLCコーティングしたものである。下金型13の周縁部には、ガラス板6に直接圧力を加える押さえ部14が形成され、その内側領域には、ガラス板6に直接圧力が加わることを防ぐ空隙部15が形成されている。   In FIG. 3, reference numeral 12 denotes an upper die, which is a nonmagnetic corrosion-resistant cemented carbide having a flatness of Rms 0.03 μm or less coated with DLC (Diamond Like Carbon). Reference numeral 13 denotes a lower die, which is a nonmagnetic corrosion-resistant cemented carbide having a concave shape and is DLC coated. A pressing portion 14 that directly applies pressure to the glass plate 6 is formed in the peripheral portion of the lower mold 13, and a gap portion 15 that prevents direct pressure from being applied to the glass plate 6 is formed in an inner region thereof. .

DLCコーティングは、上下金型12、13とガラス板6との離型性、および上下金型12、13の寿命向上に有効である。   The DLC coating is effective for releasing the upper and lower molds 12 and 13 and the glass plate 6 and improving the life of the upper and lower molds 12 and 13.

まず、図3(a)に示すように、キャップ本体7の天板部8の内側にガラス板6を装着して下金型13の上に載置し、上金型12をキャップ本体7の上部に配置する。このとき、上下金型12、13およびその近傍は、ガラス板6の軟化点近傍の温度に加熱する。例えば、軟化点が736℃の硼珪酸系硬質ガラスを用いる場合、600℃から736℃に加熱する。   First, as shown in FIG. 3A, the glass plate 6 is mounted inside the top plate portion 8 of the cap body 7 and placed on the lower mold 13, and the upper mold 12 is attached to the cap body 7. Place at the top. At this time, the upper and lower molds 12 and 13 and the vicinity thereof are heated to a temperature in the vicinity of the softening point of the glass plate 6. For example, when a borosilicate hard glass having a softening point of 736 ° C. is used, it is heated from 600 ° C. to 736 ° C.

次に、図3(b)に示すように、キャップ本体7の天板部8を上金型12で、ガラス板6を下金型13の押さえ部14で挟持し押圧する。その挟持・押圧は、(表1)に示した条件により、加熱・除冷を伴って行う。すなわち、この工程を複数の段階に分けて行い、後の段階になるに従い、金型近傍の温度を、ガラス板6の軟化点温度付近から下降させる。また、後の段階になるに従い、上下金型12、13に加える加圧力を増大させる。その結果、図3(c)に示す半導体装置用キャップが得られる。   Next, as shown in FIG. 3 (b), the top plate portion 8 of the cap body 7 is sandwiched and pressed by the upper mold 12 and the glass plate 6 is sandwiched and pressed by the pressing portion 14 of the lower mold 13. The clamping / pressing is performed with heating and cooling under the conditions shown in Table 1. That is, this process is performed in a plurality of stages, and the temperature in the vicinity of the mold is lowered from the vicinity of the softening point temperature of the glass plate 6 in the later stage. Further, the pressure applied to the upper and lower molds 12 and 13 is increased in the later stage. As a result, the cap for a semiconductor device shown in FIG.

Figure 0004160005
Figure 0004160005

このような工程によれば、軟化したガラス板6の周縁部は、挟持・押圧により封止部11へ広がる。さらに、圧力を加えた状態で冷却するので、ガラス板6は筒状部9へ向かって押し広げる力を保った状態で封止部9で支持されることになる。さらに、ガラス板6とキャップ本体7との熱膨張係数の差により、ガラス板6はキャップ本体7により締め付けられて封止が強固なものとなる。   According to such a process, the peripheral part of the softened glass plate 6 spreads to the sealing part 11 by clamping and pressing. Furthermore, since it cools in the state which applied the pressure, the glass plate 6 will be supported by the sealing part 9 in the state which maintained the force which spreads toward the cylindrical part 9. FIG. Further, due to the difference in thermal expansion coefficient between the glass plate 6 and the cap body 7, the glass plate 6 is tightened by the cap body 7 and the sealing becomes strong.

この方法によれば、従来の整合封止や圧縮封止のように、ガラス溶融温度まで加熱する必要が無く、ガラス板6の少なくとも一面に形成したARコート(図示せず)に及ぼす影響も少ない。   According to this method, unlike the conventional alignment sealing and compression sealing, it is not necessary to heat to the glass melting temperature, and the influence on the AR coating (not shown) formed on at least one surface of the glass plate 6 is small. .

実施の形態1における気密部品の製造にも、本実施の形態と同様、ガラス板を上下金型で挟持・押圧して、基体の内周面との間に封止部を形成する方法を適用することができる。   As in this embodiment, a method of forming a sealing portion between the inner peripheral surface of the substrate by sandwiching and pressing a glass plate with upper and lower molds is applied to the manufacture of the airtight component in the first embodiment. can do.

なお、本実施の形態の製造方法を適用する半導体装置用キャップ等の材質としては、硼珪酸系硬質ガラスと鉄−ニッケルとの組み合わせに限らず、金属またはセラミックとガラスとの気密封止に適用する事が出来る。   The material of the cap for a semiconductor device to which the manufacturing method of the present embodiment is applied is not limited to the combination of borosilicate hard glass and iron-nickel, but is applied to hermetic sealing of metal or ceramic and glass. I can do it.

本発明の気密部品の構成によれば、ガラスと、金属あるいはセラミックとの気密封止を、ガラスを溶融させることなし行うことができるので、半導体装置用のキャップ等に有用である。   According to the configuration of the hermetic component of the present invention, hermetic sealing between glass and metal or ceramic can be performed without melting the glass, which is useful for a cap for a semiconductor device or the like.

実施の形態1における気密部品の断面図Sectional drawing of the airtight components in Embodiment 1 実施の形態2における気密部品の断面図Sectional drawing of the airtight components in Embodiment 2 実施の形態3における気密部品の製造方法の工程を示す断面図Sectional drawing which shows the process of the manufacturing method of the airtight components in Embodiment 3 従来の気密部品の断面図Cross section of conventional airtight parts

符号の説明Explanation of symbols

1 ガラス板
2 基体
3 窓孔
4 封止部
6 ガラス板
7 キャップ本体
8 天板部
9 筒状部
10 窓孔部
11 封止部
12 上金型
13 下金型
14 押さえ部
15 空隙部
101 ガラス板
102 キャップ本体
103 窓孔
104 天板部
105 筒状部
106 接着剤
107 位相差フィルム
108 窓板ガラス
DESCRIPTION OF SYMBOLS 1 Glass plate 2 Base | substrate 3 Window hole 4 Sealing part 6 Glass plate 7 Cap main body 8 Top plate part 9 Cylindrical part 10 Window hole part 11 Sealing part 12 Upper metal mold 13 Lower metal mold 14 Holding part 15 Space | gap part 101 Glass Plate 102 Cap body 103 Window hole 104 Top plate portion 105 Cylindrical portion 106 Adhesive 107 Retardation film 108 Window plate glass

Claims (3)

貫通孔を有する基体と、前記貫通孔を気密封止したガラス板とを備えた気密部品を製造する方法において、
上金型と下金型とを含む金型に前記基体を載置し、
前記ガラス板を前記基体内に、前記基体の一部により形成された内周面に前記ガラス板の外周面を対向させて載置し、
前記金型近傍の温度を前記ガラス板の軟化点温度付近に加熱し、
前記上金型と下金型とにより、前記ガラス板の周縁部、または前記基体と前記ガラス板の周縁部とを、前記ガラス板の厚み方向に挟圧し、
挟圧した状態で冷却することを特徴とする気密部品の製造方法。
In a method of manufacturing an airtight component comprising a substrate having a through hole and a glass plate hermetically sealing the through hole,
The base is placed on a mold including an upper mold and a lower mold,
The glass plate is placed in the base, with the outer peripheral surface of the glass plate facing the inner peripheral surface formed by a part of the base,
Heating the temperature near the mold near the softening point temperature of the glass plate,
The said upper die and the lower die, the periphery of the glass plate, or a peripheral portion of said substrate and said glass plate, nipped in the thickness direction of the glass plate,
A method for manufacturing an airtight part, wherein the cooling is performed in a pinched state.
前記挟圧する工程を複数の段階に分けて行い、後の段階になるに従い、前記金型近傍の温度を、前記ガラス板の軟化点温度付近から下降させる請求項に記載の気密部品の製造方法。 Performed dividing the clamping pressure step in a plurality of stages, in accordance becomes a later stage, the temperature of the mold near a process for producing gas-tight component according to claim 1 is lowered from the vicinity softening point temperature of said glass plate . 前記挟圧する工程を複数の段階に分けて行い、後の段階になるに従い、前記金型に加える加圧力を増大させる請求項またはに記載の気密部品の製造方法。 The method for manufacturing an airtight part according to claim 1 or 2 , wherein the clamping step is performed in a plurality of stages, and the pressure applied to the mold is increased as the subsequent stage is reached.
JP2004059385A 2004-03-03 2004-03-03 Manufacturing method of airtight parts Expired - Fee Related JP4160005B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004059385A JP4160005B2 (en) 2004-03-03 2004-03-03 Manufacturing method of airtight parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004059385A JP4160005B2 (en) 2004-03-03 2004-03-03 Manufacturing method of airtight parts

Publications (2)

Publication Number Publication Date
JP2005251935A JP2005251935A (en) 2005-09-15
JP4160005B2 true JP4160005B2 (en) 2008-10-01

Family

ID=35032140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004059385A Expired - Fee Related JP4160005B2 (en) 2004-03-03 2004-03-03 Manufacturing method of airtight parts

Country Status (1)

Country Link
JP (1) JP4160005B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018131339A (en) * 2017-02-13 2018-08-23 日本電気硝子株式会社 Optical cap component

Also Published As

Publication number Publication date
JP2005251935A (en) 2005-09-15

Similar Documents

Publication Publication Date Title
JP5500904B2 (en) Method for manufacturing light emitting device
JP4891235B2 (en) Circuit board, manufacturing method thereof, and electronic component using the same
JPH08274204A (en) Hermetic seal system and hermetic seal method for device
JP2009514240A (en) Method for joining electronic components
JP6150249B2 (en) Glass sealing method for electronic device
JP2018518060A (en) Method for repairing equipment parts used in semiconductor processing
JPH0263300B2 (en)
JP5500927B2 (en) Method for manufacturing light emitting device
JP4160005B2 (en) Manufacturing method of airtight parts
US20060042182A1 (en) Evacuated glass panel and method of fixing support means, disposed therein
JP2007103673A (en) Lid and manufacturing method thereof, and manufacturing method of glass molded body
JP4829877B2 (en) Semiconductor element mounting member and semiconductor device using the same
JP2017092791A (en) Method for manufacturing composite board
US20190074416A1 (en) Silica glass member, process for producing the same, and process for bonding ceramic and silica glass
TW202013773A (en) Ultraviolet device package
JP4077108B2 (en) Semiconductor device
CN113294698A (en) Airtight packaging structure integrating plane optical window and spherical lens and manufacturing method
JP4550369B2 (en) Airtight solder sealing method for cavities with vents
JP2006303128A (en) Manufacturing method of hollow semiconductor package
JP2019043836A (en) Silica glass member, production method thereof and joint method of ceramic and silica glass
JP4471208B2 (en) Manufacturing method of low melting point brazing clad material
JP2000149790A (en) Sealed container, sealing method, sealing device, and image forming device
JP2010008800A (en) Optical component and optical device
JP2007115878A (en) Solid-state image sensing device and manufacturing method therefor
JPH0229167B2 (en) TOKOMADO

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051117

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070529

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080410

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080603

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080624

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080716

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110725

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110725

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120725

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees