JPH11176685A - Manufacture of inductance element - Google Patents

Manufacture of inductance element

Info

Publication number
JPH11176685A
JPH11176685A JP36233597A JP36233597A JPH11176685A JP H11176685 A JPH11176685 A JP H11176685A JP 36233597 A JP36233597 A JP 36233597A JP 36233597 A JP36233597 A JP 36233597A JP H11176685 A JPH11176685 A JP H11176685A
Authority
JP
Japan
Prior art keywords
ferrite core
inductance element
conductor
glass layer
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP36233597A
Other languages
Japanese (ja)
Inventor
Chiho Morita
千穂 森田
Mitsuo Sakakura
光男 坂倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toko Inc
Original Assignee
Toko Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toko Inc filed Critical Toko Inc
Priority to JP36233597A priority Critical patent/JPH11176685A/en
Publication of JPH11176685A publication Critical patent/JPH11176685A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an inductance element which can get high inductance and Q, keeping property of a magnetic material of a ferrite core. SOLUTION: A conductor film is made at the flank of a columnar or prismatic ferrite core, and this conductor film is cut by laser to form a spiral conductor pattern. A glass layer 11 is made in advance between a conductor film 12 and a ferrite core 10, and it is so arranged that only the surfaces of the conductor film and the glass layer are cut when cutting it by laser. The magnetic material of the ferrite core 10 does not degenerate since it is not directly irradiated with laser, so it can keep the property of the magnetic material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、インダクタンス素
子の製造方法に係るもので、特に、フェライトコアの周
囲に導体膜のコイル形成用の導体パターンを形成するタ
イプのインダクタンス素子の特性を改善するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an inductance element, and more particularly to a method for improving the characteristics of an inductance element of a type in which a conductor pattern for forming a coil of a conductor film is formed around a ferrite core. It is.

【0002】[0002]

【従来の技術】インダクタンス素子は一般にフェライト
コアに導線を巻き回すものが用いられていたが、加工技
術の進歩等によって、巻線に代えて導体膜を形成する構
造のものが実用化されている。特に、レーザー加工技術
の進歩によって、精度の高い導体パターンが得られるよ
うになり、中高周波用のチップインダクタ等として適し
たものが得られるようになっている。
2. Description of the Related Art In general, an inductance element in which a conductive wire is wound around a ferrite core has been used. However, due to advances in processing techniques, a structure in which a conductor film is formed instead of a winding has been put to practical use. . In particular, with the advance of laser processing technology, highly accurate conductor patterns can be obtained, and those suitable as chip inductors for medium and high frequencies can be obtained.

【0003】このタイプのインダクタンス素子は、図3
に示したように、フェライトコア20の周囲に螺旋状の導
体パターン22を形成し、端子電極24を形成したものであ
る。製造する際には、フェライトコアの側面全体に無電
解めっきと電解めっきによってAg層を形成して導体膜を
形成し、この導体膜を切削してフェライト素体を露出さ
せ、螺旋状の導体パターンを残すようにするのが一般的
である。
[0003] This type of inductance element is shown in FIG.
As shown in FIG. 5, a spiral conductive pattern 22 is formed around a ferrite core 20, and a terminal electrode 24 is formed. When manufacturing, a conductive film is formed by forming an Ag layer on the entire side surface of the ferrite core by electroless plating and electrolytic plating, and this conductive film is cut to expose the ferrite body, and a spiral conductive pattern is formed. It is common to leave

【0004】導体膜の切削には、カッターに代えてレー
ザービームを照射して導体膜を除去する方法が採用され
るようになっている。これによって、精度よく導体パタ
ーンを形成できるようになった。
[0004] In order to cut the conductive film, a method of irradiating a laser beam instead of a cutter to remove the conductive film has been adopted. As a result, the conductor pattern can be formed accurately.

【0005】[0005]

【発明が解決しようとする課題】しかし、レーザー加工
による場合には、フェライトコア素体もレーザー照射に
より加熱されることになる。この加熱によってフェライ
トコアの表面の性質が変化し、絶縁性の高い酸化物が導
体化する問題も生じる。これによって、インダクタンス
素子のインダクタンス、Q等の劣化を生じる。また、銀
電極とフェライトコアの密着性も十分でなく、信頼性の
上でも問題がある。本発明は、このフェライトの特性の
劣化を防止して、特性の良好なインダクタンス素子を得
るものである。
However, in the case of laser processing, the ferrite core body is also heated by laser irradiation. Due to this heating, the properties of the surface of the ferrite core change, and a problem arises in that the oxide having a high insulating property turns into a conductor. As a result, the inductance, Q, etc. of the inductance element deteriorate. Further, the adhesion between the silver electrode and the ferrite core is not sufficient, and there is a problem in reliability. The present invention is to prevent deterioration of the ferrite characteristics and obtain an inductance element having good characteristics.

【0006】[0006]

【課題を解決するための手段】本発明は、導体膜とフェ
ライトコアとの間にガラス層を形成し、切削する深さを
ガラスまでに止めることによって、上記の課題を解決す
るものである。
The present invention solves the above-mentioned problems by forming a glass layer between a conductor film and a ferrite core and stopping the cutting depth to the glass.

【0007】すなわち、角柱または円柱形のフェライト
コアの側面に導体膜を形成し、その導体膜の一部をレー
ザー加工によって切削してフェライトコアの周囲に螺旋
状の導体パターンを形成するインダクタンス素子の製造
方法において、螺旋状の導体パターンを形成する部分の
フェライトコアの表面にガラス層を形成し、ガラス層上
に導体膜を形成し、レーザー加工によって導体膜の一部
を切削して、フェライトコアの周囲に螺旋状の導体パタ
ーンを形成することに特徴を有するものである。
That is, a conductor film is formed on a side surface of a prismatic or cylindrical ferrite core, and a part of the conductor film is cut by laser processing to form a spiral conductor pattern around the ferrite core. In the manufacturing method, a ferrite core is formed by forming a glass layer on the surface of the ferrite core where a spiral conductor pattern is formed, forming a conductive film on the glass layer, and cutting a part of the conductive film by laser processing. Is characterized in that a spiral conductor pattern is formed around the periphery.

【0008】[0008]

【発明の実施の形態】本発明によるインダクタンス素子
の製造方法のプロセスを図2に示す。Ni-Zn系またはNi-
Cu-Zn系のフェライトを所定の形状に成形し、焼成して
フェライトコアを得る。このフェライトコアの螺旋状の
導体パターンを形成する部分にガラス層を形成する。こ
のフェライトコアの側面にニッケル合金等の下地電極層
を形成し、その上に銀等の導体膜を形成する。この導体
膜をレーザビームを走査させながら所定のパターンで切
削して、所定のパターンの導体膜を残す。
FIG. 2 shows a process of a method for manufacturing an inductance element according to the present invention. Ni-Zn or Ni-
A Cu-Zn ferrite is formed into a predetermined shape and fired to obtain a ferrite core. A glass layer is formed on a portion of the ferrite core where a spiral conductive pattern is to be formed. A base electrode layer of a nickel alloy or the like is formed on the side surface of the ferrite core, and a conductive film of silver or the like is formed thereon. This conductor film is cut in a predetermined pattern while scanning with a laser beam, leaving a conductor film of a predetermined pattern.

【0009】[0009]

【実施例】通信機器用等の中高周波用のインダクタンス
素子の材料としてはNi-Zn 系あるいはNi-Cu-Zn系等のフ
ェライトが用いられる。これらの材料の酸化物とFe2O3
とを所定の量混合した材料を成形し、焼成してフェライ
トコアを得る。一般的に上記の系のコアは高い抵抗率を
有している。このフェライトコアの螺旋状の導体パター
ンを形成する側面にガラスペーストを塗布し、焼き付け
てガラス層を形成する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As a material for an inductance element for medium and high frequencies such as for communication equipment, a ferrite of Ni-Zn or Ni-Cu-Zn is used. Oxides of these materials and Fe 2 O 3
A material obtained by mixing the above components in a predetermined amount is molded and fired to obtain a ferrite core. Generally, the cores of the above systems have a high resistivity. A glass paste is applied to the side surface of the ferrite core on which the spiral conductive pattern is to be formed, and is baked to form a glass layer.

【0010】このガラス層を具えたフェライトコアに、
無電解めっきによってニッケルまたはニッケル合金等の
導体膜を形成する。その表面に更に電解メッキによって
銀の導体層を形成する。この導体膜の材料としては、他
に銅を用いたりすることもでき、異なる金属を多層に形
成するようにしてもよい。
[0010] The ferrite core provided with this glass layer,
A conductive film such as nickel or a nickel alloy is formed by electroless plating. A silver conductor layer is further formed on the surface by electrolytic plating. As a material of the conductor film, copper can be used in addition, and different metals may be formed in multiple layers.

【0011】フェライトコアに形成された導体膜は、レ
ーザー加工によって切削される。レーザービームによっ
て導体膜を焼き切るもので、導体膜とともにその下地の
ガラスの表面の一部も焼き切られることになる。しか
し、ガラス層が介在するのでフェライトコアがレーザに
照射されて切削されることはない。
[0011] The conductor film formed on the ferrite core is cut by laser processing. The conductor film is burned off by the laser beam, and a part of the surface of the underlying glass is burned off together with the conductor film. However, since the glass layer is interposed, the ferrite core is not irradiated with the laser and cut.

【0012】本発明により製造されたインダクタンス素
子の正面断面図を図1に示す。フェライトコア10の一部
にガラス層11が形成され、その上に下地層としてニッケ
ル層12が形成され、その上に導体層として銀層13が形成
されている。銀層13とニッケル層12およびガラス層11の
表面部分がレーザで切削され、螺旋状の導体パターンを
残したものである。
FIG. 1 is a front sectional view of an inductance element manufactured according to the present invention. A glass layer 11 is formed on a part of the ferrite core 10, a nickel layer 12 is formed thereon as a base layer, and a silver layer 13 is formed thereon as a conductor layer. The surface portions of the silver layer 13, the nickel layer 12, and the glass layer 11 are cut by a laser to leave a spiral conductor pattern.

【0013】なお、上記のように処理されたフェライト
コアの導体パターンを外部回路と接続するための端子電
極14を形成するが、最初に形成した金属膜をそのまま下
地電極として利用することもできる。端子電極の部分に
は半田食われの防止のためにニッケル、半田めっきを施
しておくとよい。また、フェライトコアの側面に形成さ
れた導体パターンの表面には樹脂等によって保護膜を形
成することが望ましい。
Although the terminal electrode 14 for connecting the conductor pattern of the ferrite core treated as described above to an external circuit is formed, the metal film formed first can be used as a base electrode as it is. It is preferable to apply nickel or solder plating to the terminal electrode portion to prevent solder erosion. Further, it is desirable to form a protective film with a resin or the like on the surface of the conductor pattern formed on the side surface of the ferrite core.

【0014】本発明は、上記の例に限られるものではな
く、フェライトコアに導体膜を形成してレーザー加工に
よって所定の導体パターンを得るインダクタンス素子全
般に利用できる。
The present invention is not limited to the above example, but can be applied to all inductance elements in which a conductor film is formed on a ferrite core to obtain a predetermined conductor pattern by laser processing.

【0015】[0015]

【発明の効果】本発明によれば、フェライトコアの特性
の劣化を防止することができるので、インダクタンスや
Qが高く、特性の良好なインダクタンス素子が得られ
る。
According to the present invention, deterioration of the characteristics of the ferrite core can be prevented, so that an inductance element having high inductance and Q and excellent characteristics can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明により得られたインダクタンス素子の
正面断面図
FIG. 1 is a front sectional view of an inductance element obtained according to the present invention.

【図2】 本発明の工程の説明図FIG. 2 is an explanatory view of the process of the present invention.

【図3】 インダクタンス素子の正面図FIG. 3 is a front view of an inductance element.

【符号の説明】[Explanation of symbols]

10:フェライトコア 11:ガラス層 12:13:導体層 10: Ferrite core 11: Glass layer 12: 13: Conductive layer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 角柱または円柱形のフェライトコアの側
面に導体膜を形成し、その導体膜の一部をレーザー加工
によって切削してフェライトコアの周囲に螺旋状の導体
パターンを形成するインダクタンス素子の製造方法にお
いて、螺旋状の導体パターンを形成する部分のフェライ
トコアの表面にガラス層を形成し、ガラス層上に導体膜
を形成し、レーザー加工によって導体膜の一部を切削し
て、フェライトコアの周囲に螺旋状の導体パターンを形
成することを特徴とするインダクタンス素子の製造方
法。
1. An inductance element comprising: a conductor film formed on a side surface of a prismatic or cylindrical ferrite core; and a part of the conductor film being cut by laser processing to form a spiral conductor pattern around the ferrite core. In the manufacturing method, a ferrite core is formed by forming a glass layer on the surface of the ferrite core where a spiral conductor pattern is formed, forming a conductive film on the glass layer, and cutting a part of the conductive film by laser processing. Forming a spiral conductor pattern around the periphery of the substrate.
【請求項2】 角柱または円柱形のフェライトコアの側
面に導体膜を形成し、その導体膜の一部をレーザー加工
によって切削してフェライトコアの周囲に螺旋状の導体
パターンを形成するインダクタンス素子の製造方法にお
いて、螺旋状の導体パターンを形成する部分のフェライ
トコアの表面にガラス層を形成し、ガラス層上に無電解
めっきによって下地電極層を形成し、その表面に電解め
っきによって導体膜を形成して二層の導体膜を形成し、
レーザー加工によって導体膜の一部を切削して、フェラ
イトコアの周囲に螺旋状の導体パターンを形成すること
を特徴とするインダクタンス素子の製造方法。
2. An inductance element comprising: a conductor film formed on a side surface of a prismatic or cylindrical ferrite core; and a part of the conductor film is cut by laser processing to form a spiral conductor pattern around the ferrite core. In the manufacturing method, a glass layer is formed on the surface of the ferrite core where a spiral conductive pattern is formed, a base electrode layer is formed on the glass layer by electroless plating, and a conductive film is formed on the surface by electrolytic plating. To form a two-layer conductor film,
A method for manufacturing an inductance element, wherein a part of a conductive film is cut by laser processing to form a spiral conductive pattern around a ferrite core.
【請求項3】 切削する深さを導体膜とガラス層とを合
わせた厚みよりも小さくする請求項1または請求項2記
載のインダクタンス素子の製造方法。
3. The method for manufacturing an inductance element according to claim 1, wherein the cutting depth is smaller than the total thickness of the conductive film and the glass layer.
JP36233597A 1997-12-12 1997-12-12 Manufacture of inductance element Withdrawn JPH11176685A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36233597A JPH11176685A (en) 1997-12-12 1997-12-12 Manufacture of inductance element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36233597A JPH11176685A (en) 1997-12-12 1997-12-12 Manufacture of inductance element

Publications (1)

Publication Number Publication Date
JPH11176685A true JPH11176685A (en) 1999-07-02

Family

ID=18476590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36233597A Withdrawn JPH11176685A (en) 1997-12-12 1997-12-12 Manufacture of inductance element

Country Status (1)

Country Link
JP (1) JPH11176685A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001237135A (en) * 1999-12-14 2001-08-31 Murata Mfg Co Ltd Method and device for forming glass film, and metallic film, and method for manufacturing electronic parts
KR100376221B1 (en) * 2000-07-31 2003-03-15 주식회사 쎄라텍 Method for manufacturing surface mounted chip inductor
US6538547B2 (en) 2000-05-09 2003-03-25 Murata Manufactruing Co., Ltd. Chip inductor and manufacturing method therefor
US6650529B1 (en) 1998-12-21 2003-11-18 Murata Manufacturing Co., Ltd. Inductor and method of manufacturing same
JP2014019594A (en) * 2012-07-13 2014-02-03 Tdk Corp Ferrite substrate and process of producing the same
KR20160148459A (en) 2015-06-16 2016-12-26 가부시키가이샤 무라타 세이사쿠쇼 Method for manufacturing ceramic electronic component, and ceramic electronic component
KR20180068865A (en) * 2016-12-14 2018-06-22 가부시키가이샤 무라타 세이사쿠쇼 Ceramic electronic component and manufacturing method thereof
US11821090B2 (en) 2016-04-26 2023-11-21 Murata Manufacturing Co., Ltd. Method of manufacturing ceramic electronic component

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6650529B1 (en) 1998-12-21 2003-11-18 Murata Manufacturing Co., Ltd. Inductor and method of manufacturing same
JP2001237135A (en) * 1999-12-14 2001-08-31 Murata Mfg Co Ltd Method and device for forming glass film, and metallic film, and method for manufacturing electronic parts
US6538547B2 (en) 2000-05-09 2003-03-25 Murata Manufactruing Co., Ltd. Chip inductor and manufacturing method therefor
KR100376221B1 (en) * 2000-07-31 2003-03-15 주식회사 쎄라텍 Method for manufacturing surface mounted chip inductor
JP2014019594A (en) * 2012-07-13 2014-02-03 Tdk Corp Ferrite substrate and process of producing the same
KR20160148459A (en) 2015-06-16 2016-12-26 가부시키가이샤 무라타 세이사쿠쇼 Method for manufacturing ceramic electronic component, and ceramic electronic component
US10242789B2 (en) 2015-06-16 2019-03-26 Murata Manufacturing Co., Ltd. Method for manufacturing ceramic electronic component, and ceramic electronic component
US11322293B2 (en) 2015-06-16 2022-05-03 Murata Manufacturing Co., Ltd. Method for manufacturing ceramic electronic component, and ceramic electronic component
US11821090B2 (en) 2016-04-26 2023-11-21 Murata Manufacturing Co., Ltd. Method of manufacturing ceramic electronic component
KR20180068865A (en) * 2016-12-14 2018-06-22 가부시키가이샤 무라타 세이사쿠쇼 Ceramic electronic component and manufacturing method thereof

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