JPH11160854A - Liner for pellicle and pellicle using that - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a liner for a pellicle having excellent adaptability for an automounter without causing transfer of a release agent to the adhesive layer side by applying a fluorine-modified silicone as a release agent in a specified amt. on at least one surface of a sheet base body. SOLUTION: A fluorine-modified silicone as a release agent is applied by 0.1 to 1.0 g/m<2> on at least one surface of a sheet base body. Especially, its amt. is preferably 0.3 to 0.6 g/m<2> . If the coating amt. is <0.1 g/m<2> , uniform coating is hardly realized and the release property is unstable. If the amt. exceeds 1.0 g/m<2> , the release agent drops from the base body to produce a foreign matter, or the release agent is transferred to the pellicle adhesive layer side to make the adhesion of the pellicle unstable. The base body of the liner for a pellicle is properly selected from a sheet base body having no dusting property, and usually, a polyethylene terephthalate (PET) film is used.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an LSI,
In the process of manufacturing a semiconductor device such as a semiconductor device or a liquid crystal display device, when performing lithography using a mask pattern for exposure, the lithography used to prevent dust from adhering to a photomask on which the pattern is drawn. The present invention relates to a pellicle, and more particularly, to a pellicle liner for protecting an adhesive layer of a pellicle frame in order to surely attach an pellicle to a photomask by an auto mounter.

[0002]

2. Description of the Related Art In the manufacture of semiconductor devices such as LSIs and VLSIs or liquid crystal display devices, a semiconductor wafer such as a silicon wafer or a liquid crystal master is exposed through a pattern-formed master (photomask) to form a pattern. The lithography for transferring is performed. In this case, if dust is attached to the feto mask, the dust absorbs or bends the light, so that the pattern transferred onto the semiconductor wafer or the original liquid crystal plate is deformed or the edges are roughened. As a result, the performance, production yield, and the like of semiconductor devices and liquid crystal display devices are reduced.

Therefore, lithography is usually performed in a clean room, but it is difficult to keep a photomask completely clean even in a clean room. Therefore, a pellicle composed of a pellicle film and a frame is conventionally mounted on a photomask. When the pellicle is attached to the photomask in this way, dust adheres to the pellicle film without directly adhering to the photomask. Therefore, as long as the focus is adjusted to the pattern on the image plane of the photomask during lithography, the pellicle film The dust on the top does not affect the pattern transfer at all and becomes irrelevant.

As shown in FIG. 1, such a pellicle has a pellicle film 1 on one end face (upper end face) of a frame 2.
And the other end of the frame (lower end)
Is provided with an adhesive layer 6 to be attached to a photomask. The pellicle film 1 is made of a material that transmits light well, for example, a cellulosic polymer such as nitrocellulose or cellulose acetate or a transparent fluororesin polymer. The frame 2 is made of aluminum, stainless steel, polyethylene, or the like. As the pressure-sensitive adhesive layer, a polybutene resin, an acrylic resin, or a silicone resin is used.

[0005] The pellicle film 1 and the frame 2 are bonded using an adhesive such as an acrylic resin or an epoxy resin. Further, the pressure-sensitive adhesive layer 6 is covered with a liner as a protective sheet until the pellicle is mounted on the photomask. Further, the pellicle frame is provided with a pressure adjusting hole with a filter or for fixing dust inside the frame 2 so that a pressure difference does not occur inside and outside the pellicle when the pellicle is attached to the photomask. Of the inner pressure-sensitive adhesive layer 7.

The above-mentioned liner is formed by applying a release agent to at least one surface of a sheet-like base material. The liner has a sufficient release property with respect to an adhesive layer of a pellicle. It is required that dust is not easily generated by scratching or the like. The range of use of the release agent is limited depending on the type of the pressure-sensitive adhesive used for the pellicle. For example, it is preferable to use a fluorine-modified silicone release agent for a silicone-based pressure-sensitive adhesive excellent in light resistance.

[0007]

However, when a fluorine-modified silicone release agent is used for a liner,
Even when applied under the same conditions as ordinary silicone release agents, the force required for peeling can often be excessive, which causes peeling errors when attaching the pellicle to the filter using an automounter. There were drawbacks. Accordingly, a first object of the present invention is to provide a pellicle liner which does not transfer the release agent to the pressure-sensitive adhesive layer side and has excellent auto-mounter suitability. A second object of the present invention is to provide a pellicle that can be securely and easily attached to a photomask by an automounter.

[0008]

SUMMARY OF THE INVENTION The above objects of the present invention are as follows.
This is achieved by a pellicle liner characterized in that fluorine-modified silicone is applied as a release agent to at least one surface of a sheet-like substrate at 0.1 to 1.0 g / m ² .

The base material of the pellicle liner of the present invention is appropriately selected from known sheet-like base materials having no dust-generating properties, and usually a polyethylene terephthalate (PET) film is used. The fluorine-modified silicone pressure-sensitive adhesive may be appropriately selected from those known in the art, and those having good releasability with respect to the pressure-sensitive adhesive layer used for the pellicle frame. In addition, as the adhesive used for the pellicle frame,
In recent years, since the wavelength of light for photomask exposure has been significantly shortened, it is particularly preferable to use a silicone-based pressure-sensitive adhesive excellent in light resistance.

The coating amount of the release agent in the pellicle liner of the present invention is from 0.1 to 1.0 g / m ² , and particularly preferably from 0.3 to 0.6 g / m ² . When the coating amount is less than 0.1 g / m ² , uniform coating becomes difficult, so that the releasability becomes unstable. Conversely, if applied at more than 1.0 g / m ² , the release agent may fall off the substrate and become a foreign substance, or may transfer to the pellicle adhesive layer side, thereby making the pellicle sticking unstable. is there.

As described above, the pellicle liner of the present invention, in which the amount of the fluorine-modified silicone release agent applied is limited, is not only excellent in releasability, but also does not cause foreign matter. Therefore, the pellicle having the liner of the present invention as a protective sheet for the pressure-sensitive adhesive layer is suitable for an auto mounter, and is efficiently attached to a photomask.

[0012]

The pellicle liner of the present invention using the pellicle liner of the present invention is not only capable of having a stable and good release property with respect to the pressure-sensitive adhesive layer of the pellicle but also not generating foreign matter. Is extremely suitable for automounters. Therefore, by using the pellicle of the present invention, the production yield of semiconductor devices and the like can be improved.

[0013]

EXAMPLES The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the invention is limited thereto. Embodiment 1 FIG. Forty-five PET films each having a thickness of 100 μm are prepared, divided into nine sets of five sheets, and a fluorine-modified silicone release agent (X-70-201, Shin-Etsu Chemical Co., Ltd.) is assembled on each side by a bar coating method. After applying a different amount each time, and performing a heat treatment at 150 ° C. for 60 seconds, the length × width 1
00x100mm, 10x10m in one corner of 3mm width frame
Punching was performed to form a liner having a m-shaped tab (FIG. 1). In addition, the coating amount was measured by a fluorescent X-ray analyzer.

Next, length × width × width = 100 × 100 × 2 m
A silicone pressure-sensitive adhesive (X-40-3004A, Shin-Etsu Chemical Co., Ltd.) was applied to the bottom surface of 45 aluminum frames having a length of m, and the above-mentioned liner was attached after heat treatment. Thereafter, a load of 500 g was applied from the upper surface of the frame for 5 minutes to sufficiently adhere the adhesive and the liner (FIG. 2). Then, the frame was set on the base of the load cell, and the liner was rotated at a speed of 10 mm / sec. The peel force was measured. The relationship between the peeling force and the coating amount at that time is summarized in Table 1. When the coating amount exceeds 0.1 g / m ² , the peeling force becomes sufficiently small and further exceeds 0.3 g / m ² . And the peeling force was found to be stable.

[0015]

[Table 1]

Embodiment 2 FIG. A 2 μm-thick nitrocellulose film was formed on the upper surface of the frame produced in the same manner as in Example 1.
The pellicle film was affixed to a pellicle case. Then, according to the sine wave vibration test method of JISC0040, the frequency is 10 to 500 Hz, the number of sweep cycles is 10,
A vibration test was performed under the conditions of a durability test time of 2 hours, and the number of foreign substances on the film before and after the vibration test was measured in an illuminance of 400,000 L in a dark room.
Observation was performed using a lux condensing lamp and counted. Table 2 shows the results. In addition, regarding the increased foreign substances, E
Elemental analysis by PMA revealed that fluorine and silicon were detected, and it was found that a part of the release agent had adhered to the film.

[0017]

[Table 2]

[Brief description of the drawings]

FIG. 1 is a configuration diagram of a liner.

FIG. 2 is a schematic diagram of a pellicle.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Liner 2 Substrate 3 Release agent 4 Pellicle film 5 Pellicle frame 6 Adhesive layer

Claims (3)

[Claims] (1) at least one surface of a sheet-like substrate,
0.1 to 1.0 g using a fluorine-modified silicone as a release agent
/ M ² pellicle liner characterized by being coated. 2. A coating amount of a release agent of 0.3 to 0.6 g / m.
^The pellicle liner according to claim 1, which is ² . 3. A pellicle frame having two end faces,
A pellicle comprising a pellicle film attached to one end surface of the frame, and a silicone-based adhesive layer provided on the other end surface, and a release liner for protecting the adhesive layer, wherein the release liner Is a pellicle liner according to claim 1 or 2.