JPH11152586A - Production of etching parts - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance the production efficiency of etching parts and to increase a production quantity by providing a process capable of executing a series of production stages continuously as far as possible by preventing the supply stop of metallic sheets in consequence of trouble in a pattern exposure stage in a process for producing the etching parts by an inline treatment. SOLUTION: In the process for producing the etching parts by the inline treatment using the long-sized belt-like metallic sheet as a blank and using a photoetching method, the delivery rate to a developing stage, which is the ensuing stage, is in some cases insufficient with the accumulated component of an accumulator interposed between a pattern exposure stage and the developing stage when three stages of the pattern etching, developing and film curing treatment are continuously inline treated. In such a case, the metallic sheet is subjected to idle printing holding the continuity of resist patterns by a pattern exposure machine and thereafter the metallic sheet is delivered. The deficient delivery rate described above is thus made up.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shadow mask used for a color picture tube or a lead frame used for a semiconductor integrated circuit device by a photo-etching method using a long thin metal sheet as a material. The present invention relates to a method for manufacturing a part.

[0002]

2. Description of the Related Art Electronic parts such as a shadow mask used for a color picture tube or a lead frame used for a semiconductor integrated circuit device are mainly made of a thin metal plate and manufactured by a well-known photo-etching method. Has become.

First, as shown in FIG. 7A, the surface of a thin metal plate 1 made of an iron alloy, copper, or the like is cleaned, surface-leveled, and the like. Next, after applying a photosensitive resin (photoresist) on the metal thin plate 1, drying and the like are performed to form a photoresist film 2.
Is formed, and FIG. 7B is obtained. Then, FIGS. 6 and 7
As shown in (c), an exposure pattern mask 3 having a predetermined light-shielding pattern (in most cases, two masks on both sides)
Is aligned and then brought into close contact with the thin metal plate 1, and then the photoresist film 2 is subjected to pattern exposure. Next, the photoresist film 2 is subjected to development, hardening, and the like. As a result, at the time of pattern exposure, the unexposed and uncured portions of the photoresist film 2 are dissolved and removed, and as shown in FIG. An etching layer 4) is obtained.

Then, by using a ferric chloride solution or the like as an etchant and bringing the etchant into contact with the metal thin plate 1, the portion of the metal thin plate 1 exposed from the etching-resistant layer 4 is selectively etched, and the metal thin plate 1 is etched. FIG. 7E in which a predetermined etching pattern is formed on FIG.

[0005] Next, the metal sheet 1 after the etching is completed.
After contacting a stripping solution such as an alkali solution with the substrate, the substrate is washed with water and washed, so that the etching-resistant layer 4 formed on the thin metal plate 1 is stripped as shown in FIG.

Thereafter, using a mold or the like, the metal sheet 1 is cut, unnecessary portions are removed, and the like to obtain an etched part (part manufactured by a photo-etching method). The manufacture of an etched component using a photoetching method includes at least the above-described steps. If the etched component is a shadow mask, the etching process is divided into two stages, and after the first stage etching,
Applying an etching prevention varnish to one surface of the metal sheet 1;
Thereafter, after the second stage etching is performed from the other surface, a film removing step may be performed.

In the manufacture of the etched parts, as shown in FIG. 5, the long strip-shaped metal sheet 1 supplied from the winding roll 13 is used as a raw material, and the long strip-shaped metal sheet 1 is used as a transport roller 5 or the like. In many cases, the above-described manufacturing process is continuously performed while being transported on the transport unit.

That is, an etching part is continuously formed at a predetermined interval on the long strip-shaped metal sheet 1, and thereafter, the long strip-shaped metal sheet 1 is cut into sheets, unnecessary portions are removed, and the like. To form individual etched parts. The production efficiency is improved and the production quantity is increased by manufacturing the etching parts by so-called in-line processing in which the etching parts are formed by a continuous manufacturing process using the long strip-shaped metal thin plate 1.

Here, among the above-described continuous processes,
The steps of pattern exposure, development, and hardening require continuous processing. That is, if it takes time until the development after the pattern exposure on the resist film 3, a problem such as a latent image regression of the exposed pattern occurs.

Here, the pattern exposure process is, as shown in FIGS. 3 and 6, intermittently carrying the metal sheet 1 into the pattern exposure machine 7 and aligning the exposure pattern mask 3 (usually, two sheets for the front and back sides). ), A vacuum suction, a pattern exposure, a vacuum release, and a pattern exposure machine 7 for bringing the exposure pattern mask 3 after the alignment into close contact with the metal sheet 1.
It consists of many processes such as intermittent unloading from

Normally, when a long strip-shaped metal sheet 1 is used as a raw material and a product is manufactured continuously on the long strip-shaped metal sheet 1 in a continuous processing step, it is necessary for each processing performed on the metal sheet 1 to be performed. In consideration of the difference in the processing time, a storage mechanism for the metal sheet 1 (hereinafter, the storage mechanism for the metal sheet 1 is referred to as an accumulator 14) is provided between each processing. In FIG. 5, the accumulator is not shown for convenience of explanation.

FIG. 4 shows an example of the accumulator 14, in which a vertically movable dancing roll 11 (floating roll) is provided between a plurality of fixed rolls 10, and the belt-shaped metal sheet 1 to be conveyed and supplied. Is passed between each roll.
Here, when the dancing rolls 11 are lowered, the metal sheets 1 are accumulated between the rolls. Conversely, as the dancing rolls 11 are raised, the accumulated metal sheets 1 are released.

FIG. 4 shows an example in which an accumulator 14 is provided between the pattern exposing machine 7 and the developing machine 8.
Even if the transport of the metal sheet 1 from the printer to the developing machine 8 is temporarily stopped, the metal sheet 1 stored in the accumulator
Are successively sent to the developing machine 8 so that the manufacturing process after the developing machine 8 is performed without interruption.

However, as described above, since the pattern exposure step includes many steps, the rate of occurrence of troubles is high, and the pattern exposure often stops. This is because, for example, foreign matter adheres to the alignment mark (alignment mark) formed on the exposure pattern mask 3 and the alignment mark cannot be detected.
Cannot be adjusted, or the exposure unit itself has failed. Whenever a trouble occurs in the pattern exposure process, removal of foreign matter, repair of the exposure machine, and the like must be performed each time. During that time, the pattern exposure machine 7 stops, and the supply of the metal sheet 1 to the developing machine 8 also stops. Will be.

That is, in the pattern exposure process, troubles are likely to occur frequently, and the pattern exposure process is often stopped for a long time. In this case, no matter how much the accumulator 14 is provided between the pattern exposure step and the developing machine 8, when the accumulated amount in the accumulator 14 is exhausted, the metal thin plate 1 cannot be supplied to the developing machine 8 in the next step. Consequently, the manufacturing process after the developing machine 8 is stopped. At this time, even if a good etching part is formed on the metal sheet 1 stopped in the process after the developing machine 8, it cannot be taken out of the manufacturing process, and the production quantity is reduced.

[0016]

SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and is directed to an etching part which uses a long strip-shaped thin metal sheet supplied from a long winding roll as a material and continuously performs each manufacturing process. In the manufacturing method, it is possible to prevent a supply stop of the metal sheet due to a trouble in the pattern exposure step, and to provide a method of manufacturing an etched part capable of performing a series of manufacturing steps as continuously as possible, thereby improving the production efficiency of the etched part. And increase the production volume.

[0017]

Means for Solving the Problems The present inventors have made intensive studies to solve the above problems. As a result, when a predetermined pattern exposure cannot be performed and the exposure process is stopped because a foreign substance adheres to an alignment mark (alignment mark) formed on the exposure pattern mask and the alignment mark cannot be detected, a predetermined value is obtained. This is based on the idea that the metal sheet 1 is sent to the developing machine 8 without performing pattern exposure. That is, even if the predetermined pattern exposure cannot be performed due to a defect in the exposure process, if the metal sheet 1 is sent out to the developing machine 8 without stopping the supply of the metal sheet 1, the manufacturing process after the developing machine 8 can be performed. This is because an etched part that has not been stopped and has been subjected to pattern exposure at least until a failure occurs in the exposure step can be secured as a non-defective product.

However, even if the thin metal sheet 1 is supplied to the developing device 8 without performing a predetermined pattern exposure, if the thin metal sheet 1 is sent out while the resist film 2 is not exposed, the cutting of the thin metal sheet 1 is performed. Will happen. This is because, as described in the above section (prior art), when the resist film 2 is developed, the resist film 2 at the unexposed portion is developed.
The part is dissolved and removed. Therefore, when the unexposed portion of the resist film 2 exists so as to cross the metal sheet 1, the metal sheet 1 exposed from the etching resistant layer 4
This is because the metal sheet 1 is cut at the site when the site is dissolved.

For this reason, the present inventors further studied and, when the predetermined pattern exposure could not be performed, instead of sending out the metal thin plate 1 from the exposing machine 7 while leaving the resist film 2 unexposed, the resist pattern ( The resist film 2 is subjected to dry baking (solid pattern exposure) so as to maintain the continuity of the etching resistant layer 4) (that is, to prevent at least the unexposed resist film portion from crossing the metal sheet). It is something which was imagined.

Naturally, the part of the metal sheet 1 that has been baked is not useful as a product and must be discarded, resulting in waste of material. Therefore, even if the predetermined pattern exposure cannot be performed due to the occurrence of the defect, the defect can be easily resolved, and the accumulator can be easily removed.
Even if normal pattern exposure can be resumed before the accumulated amount of 14 is exhausted, if the baking is performed, there is a possibility that material waste will be remarkable.

Therefore, at the stage where the pattern exposure is stopped and the accumulated amount of the accumulator 14 provided in front of the developing machine 8 is used up, the above-described dry baking is performed to supply the metal sheet 1. It is suggested to do.

That is, according to the present invention, a process of coating and forming a resist film on a thin metal sheet using a long strip-shaped metal sheet supplied from a long winding roll, and performing pattern exposure, development and hardening treatment on the resist film. Performing a step of forming a resist film having an opening which exposes the metal sheet according to a predetermined pattern; a step of etching the metal sheet; and a step of stripping the resist film. When at least the three steps of pattern exposure, development, and hardening are continuously performed in-line, the accumulated amount of the accumulator interposed between the pattern exposure step and the development step is sent to the next development step. When the amount is insufficient, the metal sheet is subjected to baking to maintain the continuity of the resist pattern with a pattern exposure machine, Ridashi is obtained by the manufacturing method of etching component characterized in that it satisfies the feed amount that the shortage.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described with reference to the following drawings showing an embodiment of the present invention.

In the method for manufacturing an etched part according to the present invention, as described in the above section (prior art), a long strip-shaped metal thin plate 1 is used as a material by a conventionally known photoetching method. As shown in FIG. 5, an etching component is manufactured by a continuous manufacturing process (in-line process).

First, the surface of the long strip-shaped metal sheet 1 made of an iron alloy, copper, or the like is cleaned, surface-leveled, and the like. Then
The metal thin plate 1 is conveyed to a photosensitive resin (photoresist) application step, where application and drying of the photosensitive resin (photoresist) are performed to form a photoresist film 2, and FIG. 7 (b)
Get. Next, as shown in FIG. 6 and FIG.
After aligning the exposure pattern mask 3 (in many cases, two masks for front and back) having a predetermined light-shielding pattern, which is inserted into the mask frame 6, the mask is brought into close contact with the thin metal plate 1 to form a photoresist film. 2 is subjected to pattern exposure. Next, as shown in FIG. 4, the metal sheet 1 subjected to the pattern exposure is transported to the developing machine 8 via the accumulator 14.

Here, in this embodiment, the accumulator 14
The accumulator 14 is provided with means (not shown) for detecting whether the metal sheet 1 accumulated in the accumulator 14 has been used up or is insufficient (not shown). A detection signal (insufficient signal) is output when 1 has been used up or when the accumulated amount is insufficient. In addition, a photo sensor or
It is conceivable to use a limit switch to output a detection signal (insufficient signal) when the dancing roll 11 rises above a predetermined position.

When the detecting means outputs a detection signal (insufficient signal), it means that foreign matter adheres to the alignment mark (alignment mark) formed on the exposure pattern mask 3 and the alignment mark cannot be detected. This is because the pattern exposure machine 7, which is a pre-process of the developing machine 8, is stopped and the supply of the metal sheet 1 from the pattern exposure machine 7 is stopped because the position of the pattern mask 3 cannot be adjusted.

Therefore, according to the present invention, when the shortage signal is output, as shown in the processing flowchart of FIG. 1 and FIG.
The pattern exposure mask 3 is separated from the metal sheet 1 carried into the pattern exposure machine 7 (mask plate separation), and the metal sheet 1 is baked (solid pattern exposure). One is sent out.

As a result, a continuous resist pattern (etching-resistant layer 4) is formed on the metal sheet 1 after development, so that even if the metal sheet 1 is etched, the metal sheet 1 is cut. Can be prevented.

In the present invention, the steps subsequent to the developing machine 8 are the same as the conventional ones, such as etching, film stripping, etc., and finally, the long strip-shaped thin metal plate 1 is cut and the like. To obtain an etched part.

Naturally, while performing the above-described dry baking (solid pattern exposure) on the thin metal plate 1, the defect caused in the pattern exposure step is repaired. At this stage, the conventional pattern exposure is restarted, and the metal sheet 1 is fed to the developing machine 8.

Although the embodiment of the present invention has been described above, the embodiment of the present invention is not limited to the above-described drawings and description, and various modifications may be made based on the spirit of the present invention. It goes without saying that it does not matter.

For example, in the above description, the detecting means is provided in the accumulator 14, and the thin metal plate 1 is used up.
Alternatively, a detection signal (insufficient signal) is output at the stage when the accumulated amount becomes insufficient. However, the accumulator 14 is not provided with a detecting means, and the pattern exposure device 7
May be provided with a timer for measuring the stop time of the operation. In this case, when the feeding of the metal sheet 1 from the pattern exposure machine 7 is stopped, the time until the metal sheet 1 accumulated in the accumulator 14 is completely conveyed to the developing machine 8 is calculated in advance and measured by a timer. When the stop time of the pattern exposure machine 7 exceeds the calculated time, the above-described blank printing on the metal sheet 1 is performed.

[0034]

As described above, in the method of manufacturing an etched part according to the present invention, even if the manufacturing process is a series of continuous processing steps (in-line processing), a defect occurs in the pattern exposure step, When the process stops,
It becomes possible to supply the metal sheet after the developing process. Therefore, it is possible to take out a normal etched part formed up to the occurrence of a defect in the pattern exposure step from the manufacturing step. In addition, the present invention prevents the cutting of the metal sheet in the etching process by forming a continuous resist film on the metal sheet to be supplied after the developing device process, and enables the continuous supply of the metal sheet to the developing device process and thereafter. It is what it was. Furthermore, at the time when the defect of the pattern exposure step is repaired, it is possible to return to the regular pattern exposure step and continue manufacturing the etched part without stopping the production line, and the present invention It can be said that it is practically excellent in realizing an improvement in the yield of etched parts.

[0035]

[Brief description of the drawings]

FIG. 1 is a process flowchart showing a main part of one embodiment of an etching part of the present invention.

FIG. 2 is an explanatory perspective view showing a main part of one embodiment of the etching component of the present invention.

FIG. 3 is a process flowchart showing an example of a pattern exposure process in a conventional method for manufacturing an etched component.

FIG. 4 is an explanatory diagram showing an example of an accumulator.

FIG. 5 is an explanatory view showing an example of a manufacturing process of an etching component.

FIG. 6 is an explanatory perspective view showing a main part of the pattern exposure machine.

FIGS. 7A to 7F are cross-sectional views illustrating an example of a method for manufacturing an etched component in the order of steps.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 metal thin plate 2 resist film 3 pattern mask 4 etching resistant layer 5 transport roller 6 mask frame 7 exposure machine 8 developing machine 9 developer 10 fixed roll 11 dancing roll 12 exposure lamp 13 winding roll 14 accumulator

Claims (1)

[Claims] 1. A process in which a long strip-shaped metal sheet supplied from a long roll is used as a material, and a resist film is coated and formed on the metal sheet, and the resist film is subjected to pattern exposure, development, and hardening processing, and A step of forming a resist film having an opening that exposes the metal thin plate according to the pattern of, a step of etching the metal thin plate, and a method of manufacturing an etched component having at least a step of stripping the resist film, at least, When the three steps of pattern exposure, development, and hardening are continuously performed in-line, the amount of accumulator interposed between the pattern exposure step and the development step is insufficient for the next step of the development step. When performing the baking to maintain the continuity of the resist pattern on the metal sheet with a pattern exposure machine, the metal sheet is sent out, Manufacturing method of etching component characterized in that it satisfies the sent out amount.