JPH11131262A - Manufacture of etching parts - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of etching parts capable of providing the etching parts free from any defects even when a long strip shaped thin metallic sheet having burrs on its end is used as a stock. SOLUTION: In a manufacturing method of a shadow mask, a long strip- shaped metallic thin sheet 1 to be carried in strip is a stock, and a resist film is applied after burrs formed on a metallic thin sheet end part 6 to be carried in strip are removed in a manufacturing method of the etching parts having at least a process to apply the resist film on the metallic thin sheet, a process where the resist film having an exposed open hole part according to a prescribed pattern is formed, a process where etching is performed on the metallic thin sheet and a process to peel the resist film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shadow mask used for a color picture tube, a lead frame used for a semiconductor integrated circuit device, etc., made of a long strip-shaped thin metal plate by a known photo-etching method. And a method of manufacturing the etched part.

[0002]

2. Description of the Related Art Electronic parts such as a shadow mask used for a color picture tube or a lead frame used for a semiconductor integrated circuit device are mainly made of a thin metal plate and manufactured by a well-known photo-etching method. Has become.

First, as shown in FIG. 6A, the surface of a thin metal sheet 1 made of an iron alloy, copper, or the like is cleaned, leveled, and the like. Next, a photosensitive resin (photoresist) is applied to the metal thin plate 1 and then dried, hardened, and the like to form a photoresist film 2 to obtain FIG. 6B. Then, FIG.
As shown in (c), the photoresist film 2 is subjected to pattern exposure through an exposure pattern mask 3 having a predetermined light-shielding pattern. Next, the photoresist film 2 is subjected to development, hardening, and the like. Thereby, as shown in FIG. 6D, a resist film 2 (etching-resistant layer) in which the metal sheet is exposed according to a predetermined pattern is obtained.

[0004] Next, by using a ferric chloride solution or the like as an etching solution, the etching solution is brought into contact with the metal sheet 1 to selectively etch the metal sheet 1 exposed from the resist film 2 (etching resistant layer). Then, a predetermined etching pattern is formed on the metal sheet 1 to obtain FIG.

[0005] Next, the metal sheet 1 after the etching is completed.
After contacting with a stripping solution such as an alkali solution, washing and washing are performed to remove the resist film 2 (etching-resistant layer) formed on the thin metal plate 1 as shown in FIG. I do.

Thereafter, using a mold or the like, the metal sheet is cut, unnecessary portions are removed, and the like, and an etched part (part manufactured by a photoetching method) is obtained. The manufacture of an etched component using a photoetching method includes at least the above-described steps. When the etched part is a shadow mask, the etching process is divided into two stages, and after the first stage etching, an etching preventing varnish is applied to one surface of the metal sheet, and then the second stage etching is performed. Etching may be performed on the other surface.

[0007]

In the production of the above-mentioned etched parts, as shown in FIG.
In many cases, the above-described series of manufacturing steps is performed while using the long strip-shaped metal thin plate 1 supplied from the above as a raw material and transporting the long strip-shaped metal thin plate 1 on a transfer means such as a transfer roller 11.

That is, an etching part is continuously formed at a predetermined interval on the long strip-shaped metal sheet 1, and thereafter, the long strip-shaped metal sheet 1 is cut into sheets, unnecessary parts are removed, and the like. It is performed to make individual etching parts. By continuously forming the etching parts on the long strip-shaped thin metal plate 1, it is possible to increase the production efficiency.

Here, the long strip-shaped metal sheet 1 obtained through a manufacturing process such as rolling is applied to the left and right end portions 6 in the longitudinal direction (transport direction) at the longitudinal direction (transport direction). As shown in FIG. 4 which is a cross-sectional view as viewed from the (transport direction),
In many cases, burrs 4 projecting in the width direction are formed.

However, when the long strip-shaped thin metal plate having the burrs 4 described above is used as a material for an etching part, the following problems occur.

That is, usually, a long strip-shaped metal thin plate 1 is used.
Is transported on a cylindrical roller (for example, a transport roller 11 or the like rotated by a drive unit) while the lower surface of the thin metal plate and the roller surface are in contact with each other. But,
The application of the photosensitive resin (photoresist) to the metal thin plate 1 is often performed on both surfaces of the metal thin plate 1. In this case, after the application of the photosensitive resin (photoresist), a cylindrical shape is formed until the photoresist film 2 dries. The metal sheet 1 cannot be transported by the rollers. That is, if the photoresist film 2 applied on the thin metal plate 1 is in a dry state and comes into contact with a cylindrical roller, the photosensitive resin (photoresist) is transferred to the roller and the photoresist film 2 is damaged. is there.

For this reason, the long strip-shaped thin metal plate 1 on which the photoresist film 2 is applied at least on the lower surface by a dip coater or the like is used until the photoresist film 2 dries, especially in the central region where the etching pattern is formed. It is conveyed by a conveying means which prevents contact with the sheet.

As a transporting means for preventing contact with the central area where the etching pattern is formed, normally, the metal sheet 1 is held and transported at the end 6 of the metal sheet 1 which is an unnecessary portion where no etching pattern is formed. Means are taken, and a conveying means generally called a non-touch roller 5 shown in FIG. 3 is often used. The non-touch roller 5 is, for example, a frustoconical roller provided at both ends of the metal thin plate 1 as shown in the example of FIG. 3, and supports the end 6 of the metal thin plate 1 on the side surface of the roller. In addition, the metal sheet 1 is transported.

Here, as described above, the burrs 4 projecting in the width direction are formed at the end portions 6 of the thin metal plate 1, and the non-touch roller 5 and the burrs 4 come into contact with each other. When it comes into contact with the non-touch roller 5, the burr 4 is broken and peeled off from the thin metal plate 1, and the burr pieces adhere to the surface of the photoresist film 2 as foreign matter.

Since the burrs 4 protrude in the width direction, the burrs 4 do not come into contact with the cylindrical rollers even when the thin metal sheet is conveyed on the cylindrical rollers. After the application of (photoresist), when the metal sheet 1 is transported by the non-touch roller 5 or the like that holds (supports) the end 6 of the metal sheet 1 shown in FIG.
And contact with the roller occurs.

The four burrs adhering to the surface of the photoresist film 2 as foreign matter cause damage to the photoresist film 2, and are not necessary for the metal thin plate 1 because the etching solution enters from the damaged portion during etching. An etched pattern is formed, and an etched component is regarded as a defective product.

The pattern exposure performed after the formation of the photoresist film 2 is performed through the exposure pattern mask 3. The pattern exposure is performed in a state where the exposure pattern mask 3 and the photoresist film 2 are substantially in close contact with each other. Often done. Therefore, the burr 4 adhering to the photoresist film 2
The piece is transferred and attached to the pattern mask 3 for exposure.

As described above, the metal sheet 1 is continuously conveyed in a strip shape, and the pattern mask 3 for exposure also continuously performs pattern exposure on the metal sheet 1 at a predetermined interval. Therefore, four pieces of burrs adhere,
When the pattern mask for exposure 3 becomes a pattern defect,
The pattern exposure resulting in the pattern defect is continuously performed on the metal thin plate 1, and as a result, a large number of etched parts having a so-called common defect are manufactured.

The present invention has been made in view of the above-described problems, and is directed to the manufacture of an etched component that can obtain a defect-free etched component even when a long strip-shaped thin metal plate 1 having a burr 4 at an end 6 is used as a material. It is to provide a method.

[0020]

Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and have reached the present invention. That is, in order to achieve the above object in the present invention, first, in claim 1, a metal thin plate conveyed in a belt shape is used as a material, and a step of applying and forming a resist film on the metal thin plate is performed according to a predetermined pattern. In the method of manufacturing an etched component having at least a step of forming a resist film having an opening having an exposed metal thin plate, a step of performing etching on the metal thin plate, and a step of removing the resist film, the metal sheet is conveyed in a strip shape. A method of manufacturing a shadow mask, characterized in that after removing burrs formed at the end of a thin metal plate, a resist film is applied and formed.

According to a second aspect of the present invention, the burr is removed by bringing an abrasive cloth swinging back and forth in the transport direction of the thin metal sheet into contact with the end of the thin metal sheet. The method for manufacturing a shadow mask described in (1).

Further, in the third aspect, there is provided a means for appropriately changing a polishing cloth portion which comes into contact with an end portion of the thin metal plate, and the method of manufacturing a shadow mask according to the first or second aspect. It was done.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described with reference to the following drawings showing examples of embodiments of the present invention.

In the method of manufacturing an etched part according to the present invention, as described in the above section (Prior Art), an etched part is formed on a long strip-shaped thin metal plate 1 by a conventionally known photoetching method. Things.

Here, the feature of the method for manufacturing an etched part of the present invention is that before the photoresist film 2 is applied to the metal thin plate 1, that is, using the non-touch roller 5 or the like, the metal thin plate is formed at the end 6 of the metal thin plate. Before holding and transporting, the burrs 4 formed on the end portions 6 of the metal sheet 1 are removed. By the way, in this embodiment, burrs are removed before cleaning and flattening of the thin metal plate 1.

After removing the burrs 4 formed at the end portions 6 of the metal thin plate 1, a photoresist film 2 is applied to the metal thin plate 1, and thereafter, until the photoresist film 2 is dried.
If the end portion 6 of the metal sheet 1 is held and conveyed by the non-touch roller 5 or the like, no burr fragments are generated from the metal sheet 1 and the metal sheet 1 is peeled off from the metal sheet described in the section (Problems to be Solved by the Invention). It is possible to prevent defects of the etched component due to the formed burr pieces.

Next, the present invention also provides a means for removing the burrs formed at the ends of the above-mentioned thin metal plate, which will be described below with reference to the drawings.

That is, in the present invention, a polishing pad 7 (for example, "Imperial Wrapping Film" manufactured by Sumitomo 3M) is used for removing burrs. Polishing cloth 7
As shown in FIG. 1 and FIG. 2 which is a cross-sectional view taken along line XX ′ of FIG. 1, the end portion 6 of the thin metal plate 1 is brought into contact with a predetermined contact pressure (in this embodiment, the film tension is 6 kg / (contacted with the end 6 as cm ² ). In addition, the polishing cloth 7 is swung to scrape off the burrs 4 at the end portions 6. In the present invention, the polishing cloth 7 is swung in the front-rear direction in the transport direction of the thin metal plate 1 (in the present embodiment, the polishing cloth 7 is swung). , Rocking speed was 1000cpm). That is, when the polishing cloth 7 is swung up and down on the surface of the metal sheet 1, the conveyed metal sheet 1 meanders up and down in the conveying direction. This is because if it moves, meandering of the metal sheet 1 can be prevented.

Although FIGS. 1 and 2 show only one end 6 of the thin metal plate 1, the other end 6 is similarly brought into contact with the polishing pad 7 to remove the burr 4. Is what it is. In FIGS. 1 and 2, for convenience of explanation, a swinging unit composed of a motor and the like, and a rotating unit of a mounting roll 8 and a take-up roll 9 described later are not shown.

Next, in the present invention, the end 6
Means for appropriately changing the portion of the polishing pad 7 that comes into contact with the polishing pad. That is, the polishing force of the polishing pad 7 is reduced while the polishing pad 7 is in contact with the thin metal plate 1 to perform deburring. For this reason, it is desirable that the portion of the polishing cloth 7 that is in contact with the end portion 6 is appropriately set as a new portion, and that the deburring is performed at the portion of the polishing cloth 7 having a polishing force. If the same portion of the polishing pad 7 always keeps in contact with the end portion 6, it can be said that the burr pieces that have been cut off adhere to and accumulate on the polishing pad 7, and the collected burr pieces reattach to the metal sheet 1. For this reason, it is possible to appropriately change the portion of the polishing cloth 7 in contact with the metal sheet 1 and to which the burr pieces are adhered, and to appropriately contact the new polishing cloth 7 with the metal sheet end portion 6 by attaching the burr pieces to the metal sheet 1. Is desirable to prevent

In this embodiment, FIGS. 1 and 2
As shown in the figure, the polishing cloth 7 wound into a roll and mounted on the mounting roll 8 is fed at a feed speed of 20 mm / min. The cloth 7 is wound up.

Next, in the method of manufacturing an etched part according to the present invention, application of a resist film, pattern exposure, development, etching, and peeling are performed on the thin metal plate 1 from which the end 6 has been deburred by the above-described means. Steps such as film cutting and cutting are performed to obtain an etched part.

Although the embodiment of the present invention has been described above, the embodiment of the present invention is not limited to the above-described drawings and description, and various modifications may be made based on the spirit of the present invention. It goes without saying that it does not matter. For example, the type of the polishing cloth, the contact pressure between the polishing cloth and the metal sheet, the swing speed, the feed rate of the polishing cloth, and the like may be appropriately changed depending on the material of the metal sheet, the size of the burrs to be shaved, and the like. It is.

[0034]

As described above, in the method of manufacturing an etched part according to the present invention, after removing burrs formed at the ends of a thin metal plate, a photoresist film is applied to the thin metal plate. Thereby, after coating and forming the photoresist film, until the photoresist film is dried, even if the edge of the thin metal plate is held and transported by a non-touch roller or the like,
No burrs are generated from the metal sheet. Therefore, it is possible to prevent the resist film from being damaged by the burrs and the pattern defect of the exposure mask due to the attachment of the burrs, which is a problem in the conventional manufacturing method of the etching parts, and to obtain a high quality etching part without pattern defects. Becomes possible.

Further, as a further effect of the present invention, since the contact between the non-touch roller and the burrs at the ends of the thin metal plate is eliminated, the non-touch roller can be prevented from being scratched and scraped, and the durability of the non-touch roller is prolonged. Conventionally, the manufacturing process was frequently interrupted to replace the non-touch roller, which had a short durability due to the occurrence of scratches and shavings. Since the number of times the manufacturing process is interrupted is reduced, there is an effect that the production efficiency of the etched component is improved.

[0036]

[Brief description of the drawings]

FIG. 1 is a perspective view showing a main part of one embodiment of an etching component of the present invention.

FIG. 2 is a sectional view showing a main part of one embodiment of the etching component of the present invention.

FIG. 3 is a cross-sectional view showing an example of the attachment of burrs to a thin metal plate.

FIG. 4 is a sectional view showing an example of a burr formed on a thin metal plate.

FIG. 5 is an explanatory view showing an example of a manufacturing process of an etching component.

FIGS. 6A to 6F are explanatory views showing an example of a method for manufacturing an etched component in the order of steps.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 metal thin plate 2 resist film 3 pattern mask 4 burr 5 non-touch roller 6 end 7 polishing cloth 8 mounting roll 9 take-up roll 10 holding plate 11 transport roller 12 metal roll

Claims (3)

[Claims] 1. A step of applying a resist film on a thin metal sheet using a long strip-shaped thin metal sheet conveyed as a material, and a resist film having an opening exposing the thin metal sheet according to a predetermined pattern. And a step of performing etching on the metal sheet, and a method of manufacturing an etched component having at least a step of removing the resist film. In the method for manufacturing an etched component, a burr formed at an end of the metal sheet conveyed in a strip shape is removed. Thereafter, a method of manufacturing a shadow mask, wherein a resist film is applied and formed. 2. The method of manufacturing a shadow mask according to claim 1, wherein a burr is removed by bringing an abrasive cloth swinging back and forth in the transport direction of the metal sheet into contact with an end of the metal sheet. Method. 3. A polishing machine according to claim 1, further comprising means for appropriately changing a portion of the polishing cloth in contact with the end of the thin metal plate, so that a new portion of the polishing cloth contacts the end of the thin metal plate. Method of manufacturing shadow mask.