JPH11151729A - Method and apparatus for producing highly accurate photosensitive resin panel - Google Patents

Method and apparatus for producing highly accurate photosensitive resin panel

Info

Publication number
JPH11151729A
JPH11151729A JP25779298A JP25779298A JPH11151729A JP H11151729 A JPH11151729 A JP H11151729A JP 25779298 A JP25779298 A JP 25779298A JP 25779298 A JP25779298 A JP 25779298A JP H11151729 A JPH11151729 A JP H11151729A
Authority
JP
Japan
Prior art keywords
molding
photosensitive resin
speed
mold
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25779298A
Other languages
Japanese (ja)
Inventor
Shinichi Kawatsuji
真一 川辻
Mitsuhiro Watanabe
光広 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP25779298A priority Critical patent/JPH11151729A/en
Publication of JPH11151729A publication Critical patent/JPH11151729A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To stably produce a thick and large panel high in thickness accuracy by providing a mold speed changing point at a position of a specific % of a molding distance, and subsequently reducing the mold speed continuously to mold a liquid photosensitive resin. SOLUTION: A mold initial speed A, a mold speed changing point B and a mold variable speed C are set at every panel thickness to perform molding. Especially, a mold speed is reduced continuously accompanied by the reduction of the residual amt. of the resin in the bucket of a mold latter half part. Concretely, The mold speed changing point is provided at a position of 30-80% of a molding distance and, thereafter, the mold speed is continuously reduced to mold a liquid photosensitive resin. By this constitution, by keeping the resin amt. before a doctor 6, the so-called 'bank amt.' almost constant, a method for stably producing a thick and large photosensitive resin panel having good thickness accuracy and an apparatus for executing this method can be obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はダンボール印刷、フ
ィルム印刷、シール・ラベル印刷のような凸版印刷用感
光性樹脂版の製造方法及び製版装置に関わるものであ
り、特に感光性樹脂版の版厚精度を改良するための方法
及び装置に関わるものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for producing a photosensitive resin plate for letterpress printing such as cardboard printing, film printing, and label printing, and more particularly to a plate thickness of the photosensitive resin plate. The present invention relates to a method and an apparatus for improving accuracy.

【0002】[0002]

【従来の技術】一般に、この液状感光性樹脂を用いて印
刷版を製造するには、先ず図1に示すように、下部透明
基版1の上にネガフィルム2及びカバーフィルム3を真
空等の手段により密着して置き、その上に図2に示すよ
うにボトムオープンバケット等により感光性樹脂層4′
を積層し、次いで、図3に示すようにベースフィルム7
とマスキングフィルム8を重ねる。その後、感光性樹脂
版の厚みを決めるためにセットされたスペーサー10の
上に置かれた上部透明基板11を通して活性光を照射し
てレリーフ部分の基部を形成させるためのマスキング露
光を行い、次にレリーフ部分の画像を形成させるために
下部透明基板1側からネガフィルム2を介して活性光を
照射してレリーフ露光を行なった後、マスキングフィル
ム8を取り除いて、形成されたレリーフ部をベースフィ
ルム7に安定的に固定させるためのバック露光を上部透
明基板11側から行なう。
2. Description of the Related Art Generally, in order to manufacture a printing plate using this liquid photosensitive resin, first, as shown in FIG. 1, a negative film 2 and a cover film 3 are placed on a lower transparent base plate 1 by vacuum or the like. The photosensitive resin layer 4 'is placed on the photosensitive resin layer 4' by means of a bottom open bucket or the like as shown in FIG.
And then, as shown in FIG.
And the masking film 8. Thereafter, masking exposure is performed to form a base of the relief portion by irradiating active light through the upper transparent substrate 11 placed on the spacer 10 set to determine the thickness of the photosensitive resin plate, and then In order to form an image of the relief portion, the lower transparent substrate 1 is irradiated with active light through the negative film 2 through the negative film 2 to perform relief exposure. Then, the masking film 8 is removed, and the formed relief portion is replaced with the base film 7. Back exposure is performed from the upper transparent substrate 11 side to stably fix the substrate.

【0003】また、最後のバック露光を行なわない製版
方法も時には用いられる。次に、適当な洗剤で未硬化部
分を洗い出して現像し、後露光及び乾燥処理を施せば、
印刷版が得られる。また、その他の方法として、マスキ
ングフィルムを使用しないで、下部透明基板1の上にネ
ガフィルム2及びカバーフィルム3を密着して置き、そ
の上に感光性樹脂層4を積層し、これにベースフィルム
7を重ねる。その後、感光性樹脂版の厚みを決めるため
にセットされたスペーサー10の上に置かれた上部透明
基板11を通して活性光を照射して版の基部を形成させ
るためのバック露光を行い、次に下部透明基板1側から
ネガフィルム2を介して活性光を照射してレリーフ露光
を行ない、現像、後露光及び乾燥処理して版を得る方法
も広く用いられている。
[0005] A plate making method without performing the last back exposure is sometimes used. Next, if the uncured part is washed out with a suitable detergent, developed, and subjected to post-exposure and drying treatments,
A printing plate is obtained. As another method, a negative film 2 and a cover film 3 are placed on a lower transparent substrate 1 in close contact with each other without using a masking film, and a photosensitive resin layer 4 is laminated thereon, and a base film is Stack 7. Thereafter, a back exposure for irradiating active light through an upper transparent substrate 11 placed on a spacer 10 set to determine the thickness of the photosensitive resin plate to form a base of the plate is performed, and then a lower exposure is performed. A method of irradiating active light from the transparent substrate 1 side through a negative film 2 to perform relief exposure, and developing, post-exposure, and drying to obtain a plate is also widely used.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記の
技術で、ダンボール印刷等で一般的に用いられている厚
手(通常7mm)の大きなサイズ(長さ1m以上)の版
を製版すると、バケット内の樹脂が積層が進むにつれて
少なくなる事により、積層された樹脂厚分布が均一にな
らずに、特に積層後端部の版厚が異常に低下し、印刷不
良となる事が多かった。この現象は、バケット内樹脂量
が変動しているのにも関わらず、一定速度で樹脂を積層
する事に起因する。
However, when the thick plate (usually 7 mm) having a large size (1 m or more in length) generally used in cardboard printing or the like is made by the above-described technique, the inside of the bucket is not made. When the amount of the resin decreases as the lamination progresses, the thickness distribution of the laminated resin is not uniform, and the thickness of the plate particularly at the rear end of the lamination is abnormally reduced, which often results in poor printing. This phenomenon is caused by laminating the resin at a constant speed despite the fluctuation of the resin amount in the bucket.

【0005】従来、このような欠点を克服するために、
樹脂積層速度を途中で減速する方法が用いられてきた
が、より大きいサイズの版の製版には適さなかったり、
減速の影響が版厚に表れる等、必ずしも満足しうるもの
ではなかった。そこで本発明は、このような従来方法に
よる欠点を克服し、高い版厚精度の厚手大型版を安定的
に製版する方法を提供する事を目的とするものである。
本願発明と同様の目的を達成するために、米国特許第
4,383,759号のように、マルチマニホールドと
定量樹脂送液ポンプとの組み合わせにより樹脂成形する
方法が考案されているが、この方法では、多種の版厚の
製版を行うには版厚変更の際に数個所の調整又は設定変
更作業を必要とし、その作業が煩雑で間違いやすいとい
う問題があり、更には、版厚に応じて(薄手版・厚手
版)2種類の定量ポンプを必要とし複雑になり、装置が
高価になるという欠点を有している。
Conventionally, in order to overcome such disadvantages,
A method of reducing the resin laminating speed halfway has been used, but it is not suitable for plate making of a larger size plate,
It was not always satisfactory, for example, the effect of deceleration appeared on the plate thickness. Accordingly, an object of the present invention is to provide a method for overcoming the disadvantages of the conventional method and stably making a thick large plate with high plate thickness accuracy.
In order to achieve the same object as the present invention, a method of resin molding by combining a multi-manifold with a fixed-quantity resin feed pump has been devised as in US Pat. No. 4,383,759. In order to make a plate of various plate thicknesses, it is necessary to make adjustments or change settings in several places when changing the plate thickness, and the work is complicated and easy to make mistakes. (Thin plate / thick plate) There are drawbacks that two types of metering pumps are required, the system becomes complicated, and the apparatus becomes expensive.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上記課題
について鋭意検討した結果、成型初速、成型速度変速
点、及び成型変速度の3つのパラメータを制御すること
により、上記課題が解決できることを見出した。すなわ
ち、本願は以下の発明を提供する。 (1)バケットにより液状感光性樹脂を成型する工程を
有する感光材樹脂版の製造方法において、成型速度変速
点を成型距離の30%〜80%の位置に設け、その後連
続的に成型速度を減速させて液状感光性樹脂を成型する
ことを特徴とする感光性樹脂版の製造方法。 (2)バケットにより液状感光性樹脂を成型する手段を
有する感光材樹脂版の製版装置において、成型初速、成
型速度変速点、及び成型変速度の3つのパラメータを制
御する機構を有する感光性樹脂版の製版装置。
Means for Solving the Problems As a result of intensive studies on the above problems, the present inventors have found that the above problems can be solved by controlling three parameters of the initial molding speed, the molding speed shift point, and the molding variable speed. Was found. That is, the present application provides the following inventions. (1) In a method of manufacturing a photosensitive resin plate having a step of molding a liquid photosensitive resin with a bucket, a molding speed shift point is provided at a position of 30% to 80% of a molding distance, and thereafter the molding speed is continuously reduced. And producing a liquid photosensitive resin. (2) A photosensitive resin plate making apparatus having means for molding a liquid photosensitive resin with a bucket, the photosensitive resin plate having a mechanism for controlling three parameters of a molding initial speed, a molding speed shift point, and a molding speed variation. Plate making equipment.

【0007】本願発明の具体的実施態様としては、
(a)下部透明基板の上にネガフィルム、カバーフィル
ムを積層し、その上に液状感光性樹脂をバケットで積層
するに際して、成型初速(A)、成型速度変速点
(B)、成型変速度(C)の3パラメータ制御(以下、
3パラメーター法ともいう)により、液状感光性樹脂を
積層し、更にベースフィルム、マスキングフィルム、上
部透明基板をこの順序に積層し、先ず上部透明基板を通
してマスキング露光を行ない、次いで下部透明基板を通
してレリーフ露光を行ない、更にマスキングフィルムを
除去した上で、上部透明基板を通してバック露光を行な
った後、未硬化の液状感光性樹脂を除去して感光性樹脂
版を作成する方法、または、(b)下部透明基板の上に
ネガフィルム、カバーフィルムを積層し、その上に前記
3つのパラメータ制御により液状感光性樹脂を積層し、
更にベースフィルム上部透明基板を積層し、先ず上部透
明基板を通してバック露光を行ない、次いで下部透明基
板を通してレリーフ露光を行なった後、未硬化の液状感
光性樹脂を除去して感光性樹脂版を作成する方法が挙げ
られる。
As a specific embodiment of the present invention,
(A) When a negative film and a cover film are laminated on a lower transparent substrate and a liquid photosensitive resin is laminated on the negative film and a bucket, a molding initial speed (A), a molding speed shift point (B), and a molding speed change ( C) three-parameter control (hereinafter, referred to as C)
According to a three-parameter method), a liquid photosensitive resin is laminated, a base film, a masking film, and an upper transparent substrate are laminated in this order, first, masking exposure is performed through the upper transparent substrate, and then relief exposure is performed through the lower transparent substrate. After removing the masking film and performing back exposure through the upper transparent substrate, the uncured liquid photosensitive resin is removed to form a photosensitive resin plate. A negative film and a cover film are laminated on a substrate, and a liquid photosensitive resin is laminated thereon by controlling the three parameters,
Further, the base film upper transparent substrate is laminated, first, back exposure is performed through the upper transparent substrate, then relief exposure is performed through the lower transparent substrate, and then the uncured liquid photosensitive resin is removed to form a photosensitive resin plate. Method.

【0008】以下、本願発明を更に詳細に説明する。本
願発明の製版方法においては、例えば、特公昭52−7
761号、特開昭60−191237号、特開昭63−
88555号、特開平1−245245号、特開平7−
295218号公報等で示される、液状感光性樹脂を使
用する事ができ、また特開昭63−96661号公報で
示される感光性樹脂版製版装置を使用する事ができる。
Hereinafter, the present invention will be described in more detail. In the plate making method of the present invention, for example, JP-B-52-7
No. 761, JP-A-60-191237, JP-A-63-191
88555, JP-A-1-245245, JP-A-7-
For example, a liquid photosensitive resin disclosed in JP-A-295218 and the like can be used, and a photosensitive resin plate making apparatus disclosed in JP-A-63-96661 can be used.

【0009】通常、版厚が4mm以上のいわゆる厚手版
を製造する場合は、先ず図3に示すように、透明基板1
の上にネガフィルム2及びカバーフィルム3を重ねて置
き、透明基板1に加工された穴・溝及び真空配管により
ネガフィルム2、カバーフィルム3を透明基板1に真空
密着する。その上に感光性樹脂4を積層するに際して、
成型初速度(A)、成型速度変速点(B)、成型変速度
(C)を版厚に応じて適切に設定して、感光性樹脂層を
積層する。次いで、ベースフィルム7とマスキングフィ
ルム8を重ねる。その後、感光性樹脂版の厚みを決定す
るためにセットされたスペーサー10の上に透明基板1
1を乗せ、この透明基板11を通して活性光を照射して
レリーフ部分の基部を形成させるための背面露光(マス
キング露光)を行ない、次いで画像のレリーフ部分を形
成させるために透明基板1側からネガフィルム2を介し
て活性光を照射するレリーフ露光を行なう。次にマスキ
ングフィルム8を取り除いて、形成されたレリーフ部と
ベースフィルムとを固定させるためのバック露光を透明
基板11側から行なう。
Usually, when manufacturing a so-called thick plate having a plate thickness of 4 mm or more, first, as shown in FIG.
The negative film 2 and the cover film 3 are placed on top of each other, and the negative film 2 and the cover film 3 are vacuum-adhered to the transparent substrate 1 by holes and grooves formed in the transparent substrate 1 and vacuum piping. When laminating the photosensitive resin 4 thereon,
The photosensitive resin layer is laminated by appropriately setting the initial molding speed (A), the molding speed shift point (B), and the molding speed change (C) according to the plate thickness. Next, the base film 7 and the masking film 8 are stacked. Thereafter, the transparent substrate 1 is placed on the spacer 10 set for determining the thickness of the photosensitive resin plate.
The substrate 1 is then exposed to actinic light through the transparent substrate 11 to perform back exposure (masking exposure) to form the base of the relief portion, and then to form a relief portion of an image from the side of the transparent substrate 1 to form a negative film. Relief exposure for irradiating actinic light through 2 is performed. Next, the masking film 8 is removed, and back exposure for fixing the formed relief portion and the base film is performed from the transparent substrate 11 side.

【0010】また、バック露光を行なわないで感光性樹
脂版を製造する事も可能である。次に、適当な洗剤で未
硬化の感光性樹脂を洗浄除去し、後露光及び乾燥処理を
施す事により、印刷版が得られる。又、比較的薄い版を
製造する場合には、上記したマスキングフィルム8を使
用しないで、先ず透明基板11を通して版全面にレリー
フ部分の基部を形成させるための背面露光(バック露
光)を行ない、次いで画像のレリーフ部分を形成させる
ために透明基板1側からレリーフ露光を行なう方法が行
なわれる。
It is also possible to produce a photosensitive resin plate without performing back exposure. Next, the printing plate is obtained by washing and removing the uncured photosensitive resin with a suitable detergent and performing post-exposure and drying treatments. When a relatively thin plate is to be manufactured, first, a back exposure (back exposure) for forming a base of a relief portion on the entire surface of the plate through the transparent substrate 11 is performed without using the masking film 8 described above. In order to form a relief portion of an image, a method of performing relief exposure from the transparent substrate 1 side is performed.

【0011】次に、本願発明の3パラメーター法につい
て詳細に説明する。従来、小サイズの液状感光性樹脂版
の製版においては、図4のaのような定速成型法が、大
サイズ版に対しては、図4のbのような二段減速成型法
が主に用いられてきた。しかしながら、近年になって市
場から求められてきているような、長さ1mを越えるよ
うな大型の版厚7mmを中心とする厚手版を製版する場
合には、従来の二段減速成型法でも十分な版厚精度が得
にくいのが実態であった。
Next, the three-parameter method of the present invention will be described in detail. Conventionally, in plate making of a small-sized liquid photosensitive resin plate, a constant-speed molding method as shown in FIG. 4A is mainly used, and for a large-sized plate, a two-step reduction molding method as shown in FIG. Has been used for However, in the case where a thick plate having a thickness of more than 1 m and a thick plate having a thickness of 7 mm as a center, which is required from the market in recent years, is required, the conventional two-stage reduction molding method is sufficient. In reality, it was difficult to obtain a high plate thickness accuracy.

【0012】そこで本願発明は、図5で示すように、成
型初速度(A)、成型速度変速点(B)、成型変速度
(C)を版厚毎に設定して成型する事により、特に、成
型後半部のバケット内レジン残量の減少に伴って、連続
的に成型速度を減速する、具体的には、成型速度変速点
を成型距離の30%〜80%の位置に設け、その後連続
的に成型速度を減速させて液状感光性樹脂を成型するこ
とにより、ドクター6前のレジン量、いわゆる「バンク
量」をほぼ一定に保つことによって、良好な版厚精度を
有する厚手大型の感光性樹脂版を安定的に製造する方法
及びその方法を実施するための装置を提供するものであ
る。ここで成型初速度とは、樹脂供給バケットにより感
光性樹脂を所定の厚さに成型する際のバケットを含む成
型手段の実質的な初期移動速度である。ここで実質的と
は、停止状態から所定の移動速度に加速する領域の速度
を含まない、一定速度になった時点の速度を意味する。
Therefore, as shown in FIG. 5, the present invention sets a molding initial speed (A), a molding speed shift point (B), and a molding speed change (C) for each plate thickness to perform molding. The molding speed is continuously reduced in accordance with a decrease in the amount of resin remaining in the bucket in the latter half of the molding. Specifically, the molding speed shift point is provided at a position of 30% to 80% of the molding distance, and then continuously. By thickening the liquid photosensitive resin by gradually reducing the molding speed, the amount of resin before the doctor 6, the so-called "bank amount" is kept almost constant, so that a thick large photosensitive material having good plate thickness accuracy is obtained. An object of the present invention is to provide a method for stably producing a resin plate and an apparatus for performing the method. Here, the molding initial speed is a substantial initial moving speed of the molding means including the bucket when the photosensitive resin is molded to a predetermined thickness by the resin supply bucket. Here, “substantially” means a speed at a time when the speed becomes a constant speed, not including a speed in a region where the vehicle is accelerated from a stopped state to a predetermined moving speed.

【0013】また成型速度変速点とは、成型開始位置か
ら、前記成型初速度から成型速度が変速を開始する成型
手段の位置までの距離を表す。言うなれば、成型速度の
変速が開始される成型手段の位置を表すことになる。時
間的な点、すなわち時点で表すことも可能であるが、相
対位置で表す方が制御上都合がよいので、本願ではこち
らを用いる。つぎに成型変速度とは、最終成型位置での
成型速度の成型初速度との差を表し、成型速度の変速の
度合いを表す。例えば、成型初速度が20mm/秒、最
終成型速度が12mm/秒の時、成型変速度は8mm/
秒となる。つぎに成型距離とは、感光性樹脂を所定の厚
さに成型する長さであり、具体的には成型手段が移動す
る方向の感光性樹脂成型長さのことで、製版しようとす
る感光性樹脂版の長さより3%〜15%程度長い成型距
離がとられるのが一般的である。速度を連続的に減速さ
せる手段としては、機械的な手段もとり得るが、より精
密な制御を行うためには、電気的速度制御手段が用いら
れ、インバーター又はインバーター及びシーケンサー
(プログラマブル・コントローラー)により速度制御さ
れるのが一般的である。
The molding speed shift point represents the distance from the molding start position to the position of the molding means where the molding speed starts shifting from the molding initial speed to the molding speed. In other words, it indicates the position of the molding means at which the speed change of the molding speed is started. Although it is possible to represent the time point, that is, the time point, it is more convenient to represent the relative position in terms of control. Next, the molding speed is the difference between the molding speed at the final molding position and the initial molding speed, and indicates the degree of speed change of the molding speed. For example, when the initial molding speed is 20 mm / sec and the final molding speed is 12 mm / sec, the molding speed is 8 mm / sec.
Seconds. Next, the molding distance is a length for molding the photosensitive resin to a predetermined thickness, and specifically, a photosensitive resin molding length in a direction in which the molding means moves. Generally, a molding distance that is about 3% to 15% longer than the length of the resin plate is taken. The means for continuously reducing the speed may be a mechanical means, but for more precise control, an electric speed control means is used, and the speed is controlled by an inverter or an inverter and a sequencer (programmable controller). It is generally controlled.

【0014】このようにして得られた厚手大型の印刷版
は、従来の方法によって製造された版に比べて、成型前
半部と成型後半部の版厚の差が極めて少なく、特に成型
後半部の外周の版厚低下のない版であって、印刷時の印
圧変動が少ない事から、鮮明でしかもゲインの小さい、
原稿に対して高度の再現性を有する印刷画像を与えるこ
とができる。
The thick and large printing plate thus obtained has a very small difference in plate thickness between the first half of molding and the second half of molding as compared with the plate manufactured by the conventional method. It is a plate with no reduction in the plate thickness on the outer circumference, and has a small printing pressure fluctuation during printing.
A printed image having a high degree of reproducibility can be given to a document.

【0015】A、B、C各パラメータとしては、7mm
版については、バケット形状や感光性樹脂の粘度等によ
り異なるが、成型初速度Aは通常20mm/秒から40
mm/秒、好ましくは28mm/秒から35mm/秒、
成型方向で1.3m以上の長さの版に対しては、成型変
速点Bは成型長さの30%〜80%、好ましくは50%
から70%の位置に設け、同じく1.3m以上の版に対
する成型変速度Cは3mm/秒〜20mm/秒、好まし
くは5mm/秒〜15mm/秒の範囲が、均一な樹脂成
型厚みが得られる、有効性・実用性の高い条件である。
また6mm版については、Aは25mm/秒から30m
m/秒、Bは同じく成型長さの40%〜70%、Cは同
じく5mm/秒から12mm/秒、5mm版について
は、Aは23mm/秒から28mm/秒、Bは同じく成
型長さの40%〜70%、Cは同じく3mm/秒から1
2mm/秒、4mm版については、Aは20mm/秒か
ら28mm/秒、Bは同じく成型長さの40%〜70
%、Cは同じく3mm/秒から10mm/秒の範囲が有
効性・実用性の高い条件である。
A, B, and C parameters are 7 mm
Although the printing plate varies depending on the bucket shape and the viscosity of the photosensitive resin, the initial molding speed A is usually from 20 mm / sec to 40 mm.
mm / sec, preferably 28 mm / sec to 35 mm / sec,
For a plate having a length of 1.3 m or more in the molding direction, the molding shift point B is 30% to 80%, preferably 50% of the molding length.
From 70 to 70%, and the molding deformation speed C for a plate of 1.3 m or more is also in the range of 3 mm / sec to 20 mm / sec, preferably 5 mm / sec to 15 mm / sec, so that a uniform resin molding thickness can be obtained. It is a condition with high effectiveness and practicality.
For the 6 mm version, A is 25 mm / sec to 30 m
m / sec, B is also 40% to 70% of the molding length, C is also 5 mm / sec to 12 mm / sec, and for the 5 mm version, A is 23 mm / sec to 28 mm / sec, and B is also the molding length. 40% to 70%, C is also 3 mm / sec to 1
For the 2 mm / sec and 4 mm plates, A is 20 mm / sec to 28 mm / sec, and B is also 40% to 70% of the molding length.
% And C are also in the range of 3 mm / sec to 10 mm / sec, which are the conditions with high effectiveness and practicality.

【0016】本発明の製造方法において使用される透明
基板としては、ガラス及びクリスタル(石英ガラス)、
アクリル樹脂、ポリカーボネート樹脂、ポリ塩化ビニル
樹脂などのプラスチックや透明セラミックが用いられ
る。また、本発明の製造方法において使用される成型手
段としては図1及び2で示されるのボトムオープン型バ
ケット5、また、図6に示される回転型バケット13等
が用いられる。
The transparent substrate used in the manufacturing method of the present invention includes glass and crystal (quartz glass),
Plastics such as acrylic resins, polycarbonate resins, and polyvinyl chloride resins and transparent ceramics are used. As the molding means used in the manufacturing method of the present invention, the bottom-open type bucket 5 shown in FIGS. 1 and 2 and the rotary type bucket 13 shown in FIG. 6 are used.

【0017】[0017]

【発明の実施の形態】以下、本発明の例を実施例に基づ
き、具体的に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be specifically described based on embodiments.

【0018】[0018]

【実施例1】高い平面精度に研磨されたパイレックスガ
ラス製下部硬質透明基板の上にネガフィルム及びカバー
フィルムを真空密着した上に、液状感光性樹脂APR
(登録商標)F−91(旭化成工業株式会社製)を、成
型初速度31mm/秒、変速点900mm、変速度8m
m/秒、の条件で積層して厚さ7mmの感光性樹脂層を
形成させ、その上にポリエステル製ベースフィルム及び
マスキングフィルムを介して高い平面精度に研磨された
パイレックスガラス製上部硬質基板を載置し、2枚の硬
質基板の間隔はスペーサにより保持した。次いで上部硬
質基板より真空吸引して、マスキングフィルム及びベー
スフィルムの密着性を保ちながら3分保持した後、上部
透明基板及びマスキングフィルムを透して活性光を照射
してマスキング露光を150秒行なった後に、下部透明
基板及びネガフィルムを透して活性光を照射するレリー
フ露光を130秒行ない、マスキングフィルムを除去し
た。次に、上部透明基板を透して活性光を照射するバッ
ク露光を20秒行ない画像形成露光を完了した。
Example 1 A negative film and a cover film were vacuum-adhered on a Pyrex glass lower rigid transparent substrate polished to high plane accuracy, and a liquid photosensitive resin APR was used.
(Registered trademark) F-91 (manufactured by Asahi Kasei Kogyo Co., Ltd.) at an initial molding speed of 31 mm / sec, a shift point of 900 mm, and a speed of 8 m
The photosensitive resin layer having a thickness of 7 mm was formed by laminating under a condition of m / sec, and a pyrex glass upper hard substrate polished with high flatness through a polyester base film and a masking film was mounted thereon. The gap between the two hard substrates was maintained by a spacer. Next, vacuum suction was performed from the upper hard substrate, and after holding for 3 minutes while maintaining the adhesion between the masking film and the base film, masking exposure was performed by irradiating active light through the upper transparent substrate and the masking film for 150 seconds. Thereafter, relief exposure for irradiating active light through the lower transparent substrate and the negative film was performed for 130 seconds to remove the masking film. Next, back exposure for irradiating active light through the upper transparent substrate was performed for 20 seconds to complete image forming exposure.

【0019】次に、このようにして露光処理した感光層
を常法に従って洗浄液で洗い出し、現像したのち、後露
光し、乾燥することにより、版厚7mm幅700mm長
さ1300mmの印刷版を得た。この版の版厚精度を表
1に示す。
Next, the photosensitive layer exposed in this manner was washed out with a cleaning solution according to a conventional method, developed, post-exposed, and dried to obtain a printing plate having a plate thickness of 7 mm, a width of 700 mm and a length of 1300 mm. . Table 1 shows the plate thickness accuracy of this plate.

【0020】[0020]

【比較例1】実施例1において、成型初速度31mm/
秒、変速点930mm、二次成型速度27mm/秒とい
う、いわゆる「二段変速法」で感光性樹脂を積層した以
外は、実施例1と全く同様にして7mmの印刷版を得
た。その結果を表1に示す。
Comparative Example 1 In Example 1, the initial molding speed was 31 mm /
A printing plate of 7 mm was obtained in exactly the same manner as in Example 1, except that the photosensitive resin was laminated by the so-called "two-step speed change method" in which the speed, the shift point was 930 mm, and the secondary molding speed was 27 mm / sec. Table 1 shows the results.

【0021】[0021]

【比較例2】実施例1において、成型速度31mm/秒
という定速で感光性樹脂を積層した以外は、実施例1と
全く同様にして7mmの印刷版を得た。その結果を表1
に示す。
Comparative Example 2 A 7 mm printing plate was obtained in the same manner as in Example 1 except that the photosensitive resin was laminated at a constant molding speed of 31 mm / sec. Table 1 shows the results.
Shown in

【0022】[0022]

【表1】 [Table 1]

【0023】[0023]

【実施例2】実施例1と同様に、液状感光性樹脂APR
(同前)F−300(同前)を、成型初速度A、変速点
B、変速度Cを適切に設定して、幅900mm長さ1,
300mmの印刷版を得た。その結果を表2に示す。
Example 2 As in Example 1, the liquid photosensitive resin APR
(Same as above) F-300 (Same as before) was set appropriately at initial molding speed A, shift point B, and variable speed C, with a width of 900 mm and a length of 1,
A 300 mm printing plate was obtained. Table 2 shows the results.

【0024】[0024]

【表2】 [Table 2]

【0025】[0025]

【発明の効果】本発明によれば、版面画像面積の大小に
関係なく良好なインキの着肉性及び転移性を示し、全体
にわたって鮮明でしかも印圧過多によるゲインの少な
い、原稿に対する忠実度の高い印刷画像を与える厚手大
型感光性樹脂版が、作業者の負担や製版時間を増す事な
く得られるので、本発明は、ダンボール印刷用、フィル
ム印刷用、ラベル印刷用などの印刷版の製版方法、製版
装置として好適である。
According to the present invention, good ink inking property and transferability are exhibited regardless of the size of the plate image area, and the fidelity with respect to the original is clear over the whole, and the gain due to excessive printing pressure is small. The present invention provides a printing plate making method for cardboard printing, film printing, label printing, etc., because a thick large photosensitive resin plate giving a high print image can be obtained without increasing the burden on the operator and the time required for plate making. It is suitable as a plate making device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】ボトムオープン型バケットによる感光性樹脂の
成型(積層)前の状態の説明用断面図
FIG. 1 is a cross-sectional view for explaining a state before a photosensitive resin is molded (laminated) by a bottom-open type bucket.

【図2】液状感光性樹脂成型(積層)工程の断面図。FIG. 2 is a sectional view of a liquid photosensitive resin molding (lamination) step.

【図3】液状感光性樹脂版の製版方法における露光工程
の断面図。
FIG. 3 is a cross-sectional view of an exposure step in a method for making a liquid photosensitive resin plate.

【図4】従来法の感光性樹脂成型速度線図。FIG. 4 is a photosensitive resin molding speed diagram of a conventional method.

【図5】本発明の3パラメーター法における感光性樹脂
成型速度線図。
FIG. 5 is a photosensitive resin molding speed diagram in the three-parameter method of the present invention.

【図6】回転型バケットの説明用断面図。FIG. 6 is an explanatory sectional view of a rotary bucket.

【符号の説明】[Explanation of symbols]

1.下部透明基板 2.ネガフィルム 3.カバーフィルム 4.液状感光性樹脂(層) 5.バケット(ボトムオープン型) 6.ドクター 7.ベースフィルム 8.マスキングフィルム 9.スポンジテープ 10.スペーサー 11.上部透明基板 12.ラミネーションロール 13.バケット(回転型) 1. 1. Lower transparent substrate Negative film 3. Cover film 4. 4. Liquid photosensitive resin (layer) Bucket (bottom open type) 6. Doctor 7 Base film 8. Masking film 9. Sponge tape 10. Spacer 11. Upper transparent substrate 12. Lamination roll 13. Bucket (rotary type)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 バケットにより液状感光性樹脂を成型す
る工程を有する感光材樹脂版の製造方法において、成型
速度変速点を成型距離の30%〜80%の位置に設け、
その後連続的に成型速度を減速させて液状感光性樹脂を
成型することを特徴とする感光性樹脂版の製造方法。
1. A method of manufacturing a photosensitive resin plate having a step of molding a liquid photosensitive resin with a bucket, wherein a molding speed shift point is provided at a position of 30% to 80% of a molding distance.
Thereafter, the molding speed is continuously reduced to mold the liquid photosensitive resin.
【請求項2】 バケットにより液状感光性樹脂を成型す
る手段を有する感光材樹脂版の製版装置において、成型
初速、成型速度変速点、及び成型変速度の3つのパラメ
ータを制御する機構を有する感光性樹脂版の製版装置。
2. A plate making apparatus for a photosensitive resin plate having means for molding a liquid photosensitive resin by means of a bucket, comprising a mechanism for controlling three parameters of a molding initial speed, a molding speed shift point, and a molding variable speed. Plate making machine for resin plate.
JP25779298A 1997-09-11 1998-09-11 Method and apparatus for producing highly accurate photosensitive resin panel Pending JPH11151729A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25779298A JPH11151729A (en) 1997-09-11 1998-09-11 Method and apparatus for producing highly accurate photosensitive resin panel

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP24720797 1997-09-11
JP9-247207 1997-09-11
JP25779298A JPH11151729A (en) 1997-09-11 1998-09-11 Method and apparatus for producing highly accurate photosensitive resin panel

Publications (1)

Publication Number Publication Date
JPH11151729A true JPH11151729A (en) 1999-06-08

Family

ID=26538138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25779298A Pending JPH11151729A (en) 1997-09-11 1998-09-11 Method and apparatus for producing highly accurate photosensitive resin panel

Country Status (1)

Country Link
JP (1) JPH11151729A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001188354A (en) * 1999-12-28 2001-07-10 Asahi Kasei Corp Method for manufacturing photosensitive resin letterpress and apparatus for manufacturing the same
JP2002268230A (en) * 2001-03-09 2002-09-18 Asahi Kasei Corp Method and device for manufacturing photosensitive resin letterpress
JP2010091867A (en) * 2008-10-09 2010-04-22 Asahi Kasei E-Materials Corp Method for manufacturing photosensitive resin letterpress plate, and apparatus for manufacturing photosensitive resin letterpress plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001188354A (en) * 1999-12-28 2001-07-10 Asahi Kasei Corp Method for manufacturing photosensitive resin letterpress and apparatus for manufacturing the same
JP2002268230A (en) * 2001-03-09 2002-09-18 Asahi Kasei Corp Method and device for manufacturing photosensitive resin letterpress
JP4698044B2 (en) * 2001-03-09 2011-06-08 旭化成イーマテリアルズ株式会社 Manufacturing method and apparatus for photosensitive resin relief printing plate
JP2010091867A (en) * 2008-10-09 2010-04-22 Asahi Kasei E-Materials Corp Method for manufacturing photosensitive resin letterpress plate, and apparatus for manufacturing photosensitive resin letterpress plate

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