JPH11145352A - Heat spreader - Google Patents

Heat spreader

Info

Publication number
JPH11145352A
JPH11145352A JP9302039A JP30203997A JPH11145352A JP H11145352 A JPH11145352 A JP H11145352A JP 9302039 A JP9302039 A JP 9302039A JP 30203997 A JP30203997 A JP 30203997A JP H11145352 A JPH11145352 A JP H11145352A
Authority
JP
Japan
Prior art keywords
copper
heat
plate
thermal conductivity
heat spreader
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9302039A
Other languages
Japanese (ja)
Inventor
Hiroshi Hirayama
浩士 平山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP9302039A priority Critical patent/JPH11145352A/en
Publication of JPH11145352A publication Critical patent/JPH11145352A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PROBLEM TO BE SOLVED: To obtain high cooling capability by forming a chemically treated roughened surface on at least a heat dissipating surface of a plate composed of copper or alloy, whose main component is copper, and treating the surface to be black. SOLUTION: A heat spreader 1 is constituted of a plate 3 of a copper member and a roughened surface 4, which is subjected to chemical treatment on the main plane of the plate 3. A plastic substrate 5, on which a wiring layer is arranged and a semiconductor element 6 accommodated in the substrate 5 are bonded on a surface facing a heat dissipating surface of the plate 3, by using a high polymer thermoplastic adhesive agent 7 of high thermal conductivity in which AlN fine particles are contained, and they are collectively formed in an integral body. Since thermal conductivity of copper is higher than that of aluminum, heat dissipating capability can be improved greatly. Since the roughed surface 4 is turned into CuO by alkaline treatment and simply blacked, thermal radiation capability can be improved. Since the high thermal conductivity adhesive agent 7 is used for bonding the semiconductor element 6 and the heat spreader 1, good thermal conductivity can be obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置におい
て半導体素子からの熱を大気中に放散するための放熱部
材としてのヒートスプレッダーに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat spreader as a heat dissipating member for dissipating heat from a semiconductor element to the atmosphere in a semiconductor device.

【0002】[0002]

【従来の技術】LSI等の半導体素子を実装した半導体
装置において、高速で動作する半導体素子は、大きな発
熱量の熱を発生するため、発生した熱を効率よく逃がす
ために放熱部材としてヒートスプレッダーが使用されて
いる。
2. Description of the Related Art In a semiconductor device on which a semiconductor element such as an LSI is mounted, a semiconductor element operating at a high speed generates a large amount of heat, and a heat spreader is used as a heat radiating member to efficiently release the generated heat. in use.

【0003】従来のヒートスプレッダーには、アルミニ
ウム材が一般的に使用されており、アルミニウム材を板
状のまま単独で使用したり、板状のアルミニウム材の上
に更に熱放散能力を向上させるため、フィン状に加工し
たアルミニウム材を熱伝導の良好な接着剤により接着し
て使用されている。
[0003] Aluminum materials are generally used in conventional heat spreaders. In order to use the aluminum material alone in a plate shape or to further improve the heat dissipation capability on the plate-like aluminum material. A fin-shaped aluminum material is used by bonding it with an adhesive having good heat conductivity.

【0004】また、これらのヒートスプレッダーに用い
られるアルミニウム材の表面には、電気的に絶縁し、耐
熱・耐熱疲労特性などの安全性を確保するために、アル
マイト処理により絶縁層が形成されている。この絶縁層
を形成させる際には、ヒートスプレッダーに、高い熱輻
射能を与えながら高級感を持たせるために、黒色に着色
されたアルマイトが好まれ、汎用されている。
In addition, an insulating layer is formed on the surface of the aluminum material used for these heat spreaders by alumite treatment in order to electrically insulate and ensure safety such as heat resistance and heat fatigue resistance. . When forming this insulating layer, black anodized alumite is preferred and widely used in order to give the heat spreader a high-grade feeling while giving high heat radiation capability.

【0005】しかしながら、最近の半導体装置のさらな
る高速化、高出力化に伴い、アルミニウム材からなるヒ
ートスプレッダーの熱放散能力では、十分ではなくなっ
てきた。
However, with the recent increase in speed and output of semiconductor devices, the heat dissipation capability of a heat spreader made of an aluminum material has become insufficient.

【0006】この熱放散能力を向上させるためには、ア
ルミニウム材に比較して、大幅に高い熱輻射能力(冷却
能力)を有する銅または銅を主成分とする合金材のヒー
トスプレッダーを使用することが効果的であるが、銅ま
たは銅を主成分とする材料(以後、銅系材料と略す)は
表面が変色しやすく、素地のままでは使用できなかっ
た。
In order to improve the heat dissipating ability, a heat spreader made of copper or an alloy material containing copper as a main component, which has a significantly higher heat radiating ability (cooling ability) than aluminum material, is used. However, copper or a material containing copper as a main component (hereinafter, abbreviated as a copper-based material) easily discolors on the surface and cannot be used as it is.

【0007】銅系材料の表面酸化を防止するためには、
表面にNiメッキ等のメッキ処理することが考えられ
る。しかし、メッキ処理では電子デバイスのパッケージ
カラーとして好まれる黒色を呈する表面処理は困難であ
った。また、パッケージ内に樹脂を注入し、パッケージ
ングする場合に、Niメッキ面は樹脂との密着が悪く、
ボイドの発生等の問題が生じていた。
In order to prevent surface oxidation of copper-based materials,
It is conceivable to perform a plating process such as Ni plating on the surface. However, in the plating process, it was difficult to perform a surface treatment exhibiting black, which is preferred as a package color of an electronic device. Also, when injecting resin into the package and packaging, the Ni-plated surface has poor adhesion to the resin,
Problems such as generation of voids have occurred.

【0008】[0008]

【発明が解決しようとする課題】本発明は、高い冷却能
力を有する銅系材料のヒートスプレッダーにおいて、表
面が黒色に処理され、かつ、パッケージ用樹脂との密着
性にも優れたヒートスプレッダーを提供することを目的
とする。
SUMMARY OF THE INVENTION The present invention provides a heat spreader made of a copper-based material having a high cooling capacity, the surface of which is treated black, and which has excellent adhesion to a package resin. The purpose is to do.

【0009】[0009]

【課題を解決するための手段】本発明のヒートスプレッ
ダーでは、銅または銅を主成分とする合金からなる板の
少なくとも放熱面に化学処理による粗化面を形成してい
る。さらには、前記粗化面をCuOから構成することに
より、黒色としている。
In the heat spreader of the present invention, at least a heat-radiating surface of a plate made of copper or an alloy containing copper as a main component is formed with a roughened surface by a chemical treatment. Further, the roughened surface is made of CuO so as to be black.

【0010】[0010]

【本発明の実施の形態】本発明による半導体装置用のヒ
ートスプレッダーとして使用される銅または銅合金の板
厚は、取り付けられる半導体装置の熱放散設計により決
定されるが、通常、0.3mmから1.5mm程度であ
る。
BEST MODE FOR CARRYING OUT THE INVENTION The thickness of copper or a copper alloy used as a heat spreader for a semiconductor device according to the present invention is determined by a heat dissipation design of a semiconductor device to be mounted. It is about 1.5 mm.

【0011】銅の熱伝導率は、約400W/m・Kであ
り、アルミニウムの約2倍の熱伝導率を有しているた
め、従来のアルミニウム製のヒートスプレッダーに比べ
て、大幅に熱放散能力を向上させることができる。
[0011] Copper has a thermal conductivity of about 400 W / m · K, which is about twice as high as that of aluminum. Ability can be improved.

【0012】銅または銅合金の放熱面に形成される粗化
面は、熱輻射能を高めるために黒色がよい。本発明では
アルカリ処理により上記粗化面をCuOとすることで、
簡単に黒色化することができる。また、粗化処理が化学
処理によって行われるため、放熱面以外の面に対しても
同時に粗化処理を施すことができる。そのため、放熱面
以外の主平面をも粗化処理した場合には、パッケージ内
に樹脂を注入し、パッケージングする際に、パッケージ
封止用樹脂との密着性を向上させることができる。
The roughened surface formed on the heat radiating surface of copper or a copper alloy is preferably black in order to increase the heat radiation ability. In the present invention, by making the roughened surface CuO by alkali treatment,
It can be easily blackened. In addition, since the roughening process is performed by a chemical process, it is possible to simultaneously perform the roughening process on a surface other than the heat radiation surface. Therefore, when the main plane other than the heat radiation surface is also subjected to the roughening treatment, it is possible to improve the adhesion to the package sealing resin when injecting the resin into the package and packaging.

【0013】半導体素子とヒートスプレッダーとの接合
には、熱抵抗の低減のために、熱伝導性の良好なAlN
等の微粒子を含有した高熱伝導性接着剤か、錫、銅合金
等の金属ソルダーを用いる。本発明のヒートスプレッダ
ーは、上記接着剤や金属ソルダーとの接合性に優れるた
め、接合部分でも良好な熱伝導性を得ることかできる。
For joining the semiconductor element and the heat spreader, AlN having good thermal conductivity is used to reduce the thermal resistance.
A highly heat-conductive adhesive containing fine particles such as, or a metal solder such as a tin or copper alloy is used. Since the heat spreader of the present invention has excellent bonding properties with the above-mentioned adhesive and metal solder, good thermal conductivity can be obtained even at the bonding portion.

【0014】[0014]

【実施例】図面をもとに本発明の実施例を詳細に説明す
る。図1は、本発明による板状のヒートスプレッダー1
を有する半導体装置2の断面図の一例である。
An embodiment of the present invention will be described in detail with reference to the drawings. FIG. 1 shows a plate-like heat spreader 1 according to the present invention.
FIG. 1 is an example of a cross-sectional view of a semiconductor device 2 having the following.

【0015】ヒートスプレッダー1は、銅材の板3と該
板の主平面に形成された粗化面4とから構成されてい
る。板3の放熱面と対向する面には、配線層が設けられ
たプラスチック基板5およびこのプラスチック基板5の
内部に収納された半導体素子6がAlN微粒子を含有さ
せた高熱伝導タイプの高分子熱可塑性の接着剤7によっ
て接着され、それらと一体化している。
The heat spreader 1 comprises a copper plate 3 and a roughened surface 4 formed on the main plane of the plate. On the surface of the plate 3 facing the heat radiation surface, a plastic substrate 5 provided with a wiring layer and a semiconductor element 6 housed inside the plastic substrate 5 are made of a high thermal conductivity type polymer thermoplastic resin containing AlN fine particles. And is integrated with them.

【0016】なお、半導体素子6は、ボンディングワイ
ヤ8によってプラスチック基板5の一端に電気的に接続
されており、さらにプラスチック基板5内の配線層を介
して半田ボール9と電気的に接続されている。また、半
導体素子6のボンディングワイヤ8結線面およびボンデ
ィングワイヤ8は、保護のため樹脂10により覆われて
いる。
The semiconductor element 6 is electrically connected to one end of the plastic substrate 5 by a bonding wire 8, and is further electrically connected to a solder ball 9 via a wiring layer in the plastic substrate 5. . The connection surface of the bonding wires 8 of the semiconductor element 6 and the bonding wires 8 are covered with a resin 10 for protection.

【0017】本実施例では板3に、厚さ1mmの銅板を
用いた。
In this embodiment, a 1 mm thick copper plate is used as the plate 3.

【0018】まず、該銅板の表面を、LSIチップ6に
対する面接触を良好な状態とするために、湿式バフ研磨
法により清浄化した。次に、亜塩素酸ナトリウム31g
/リットル、水酸化ナトリウム15g/リットル、リン
酸三ナトリウム10g/リットルからなるアルカリ性の
処理液に95℃で2分間浸せきし、表面を粗化すると共
に、CuOからなる黒色の粗化面を形成した。最後に、
打ち抜き加工によって、外形寸法として、30mm角の
正方形の板状のヒートスプレッダー1を作成した。
First, the surface of the copper plate was cleaned by a wet buffing method in order to make good surface contact with the LSI chip 6. Next, 31 g of sodium chlorite
/ L, 15 g / L of sodium hydroxide, and 10 g / L of trisodium phosphate at 95 ° C for 2 minutes to roughen the surface and form a black roughened surface made of CuO. . Finally,
A 30 mm square square plate-like heat spreader 1 was formed by punching.

【0019】以上のように作製した本発明によるヒート
スプレッダー1を使用した半導体装置2は、良好な放熱
特性が得られた。
The semiconductor device 2 using the heat spreader 1 according to the present invention produced as described above has good heat radiation characteristics.

【0020】[0020]

【発明の効果】本発明によるヒートスプレッダーを用い
れぱ、銅または銅を主成分とする合金の優れた熱輻射能
力によって、熱放散性の極めて優れた半導体装置を製造
することができる。さらに、銅または銅を主成分とする
合金の板の放熱面に化学処理によりCuOからなる粗化
面を形成することにより、黒色系のヒートスプレッダー
を安価に提供することができる。
By using the heat spreader according to the present invention, a semiconductor device having extremely excellent heat dissipation can be manufactured by the excellent heat radiation ability of copper or an alloy containing copper as a main component. Further, by forming a roughened surface made of CuO on the heat radiation surface of a plate of copper or an alloy containing copper as a main component by chemical treatment, a black heat spreader can be provided at low cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のヒートスプレッダーを用いた半導体装
置の断面図の一例である。
FIG. 1 is an example of a sectional view of a semiconductor device using a heat spreader of the present invention.

【符号の説明】[Explanation of symbols]

1 ヒートスプレッダー 2 半導体装置 3 板 4 粗化面 5 プラスチック基板 6 半導体素子 7 接着剤 8 ボンディングワイヤ 9 半田ボール 10 樹脂 DESCRIPTION OF SYMBOLS 1 Heat spreader 2 Semiconductor device 3 Board 4 Roughened surface 5 Plastic substrate 6 Semiconductor element 7 Adhesive 8 Bonding wire 9 Solder ball 10 Resin

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 半導体装置用のヒートスプレッダーであ
って、銅または銅を主成分とする合金からなる板の少な
くとも放熱面に化学処理による粗化面が形成されている
ことを特徴とするヒートスプレッダー。
1. A heat spreader for a semiconductor device, wherein a roughened surface by chemical treatment is formed on at least a heat radiation surface of a plate made of copper or an alloy containing copper as a main component. .
【請求項2】 前記粗化面が黒色のCuOからなること
を特徴とする請求項1記載のヒートスプレッダー。
2. The heat spreader according to claim 1, wherein the roughened surface is made of black CuO.
JP9302039A 1997-11-04 1997-11-04 Heat spreader Pending JPH11145352A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9302039A JPH11145352A (en) 1997-11-04 1997-11-04 Heat spreader

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9302039A JPH11145352A (en) 1997-11-04 1997-11-04 Heat spreader

Publications (1)

Publication Number Publication Date
JPH11145352A true JPH11145352A (en) 1999-05-28

Family

ID=17904180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9302039A Pending JPH11145352A (en) 1997-11-04 1997-11-04 Heat spreader

Country Status (1)

Country Link
JP (1) JPH11145352A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1592059A2 (en) * 2004-04-29 2005-11-02 Lg Electronics Inc. Heat sink and method for processing surfaces thereof
US7524702B2 (en) 2003-04-16 2009-04-28 Shinko Electric Industries Co., Ltd. Conductor substrate, semiconductor device and production method thereof
JP2009239249A (en) * 2008-03-07 2009-10-15 Denso Corp Semiconductor device, and method of manufacturing the same
JP2010098286A (en) * 2008-10-20 2010-04-30 Samsung Electro-Mechanics Co Ltd Printed circuit board and its manufacturing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7524702B2 (en) 2003-04-16 2009-04-28 Shinko Electric Industries Co., Ltd. Conductor substrate, semiconductor device and production method thereof
KR101089201B1 (en) 2003-04-16 2011-12-02 신꼬오덴기 고교 가부시키가이샤 Conductor substrate, semiconductor device and production method thereof
EP1592059A2 (en) * 2004-04-29 2005-11-02 Lg Electronics Inc. Heat sink and method for processing surfaces thereof
EP1592059A3 (en) * 2004-04-29 2011-01-26 LG Electronics, Inc. Heat sink and method for processing surfaces thereof
JP2009239249A (en) * 2008-03-07 2009-10-15 Denso Corp Semiconductor device, and method of manufacturing the same
JP4539773B2 (en) * 2008-03-07 2010-09-08 株式会社デンソー Semiconductor device and manufacturing method thereof
US7932132B2 (en) 2008-03-07 2011-04-26 Denso Corporation Semiconductor device and method of manufacturing the same
US8008768B2 (en) 2008-03-07 2011-08-30 Denso Corporation Semiconductor device having heat radiating configuration
JP2010098286A (en) * 2008-10-20 2010-04-30 Samsung Electro-Mechanics Co Ltd Printed circuit board and its manufacturing method

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